JPH0132032Y2 - - Google Patents
Info
- Publication number
- JPH0132032Y2 JPH0132032Y2 JP14245679U JP14245679U JPH0132032Y2 JP H0132032 Y2 JPH0132032 Y2 JP H0132032Y2 JP 14245679 U JP14245679 U JP 14245679U JP 14245679 U JP14245679 U JP 14245679U JP H0132032 Y2 JPH0132032 Y2 JP H0132032Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- elliptical
- reflector
- reflecting mirror
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005286 illumination Methods 0.000 claims description 16
- 239000011521 glass Substances 0.000 claims description 15
- 230000004907 flux Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Landscapes
- Exposure Or Original Feeding In Electrophotography (AREA)
- Optical Systems Of Projection Type Copiers (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Description
【考案の詳細な説明】
本考案はスリツト露光型照明装置に係り、特に
原稿面ガラスに対して低入射角で照明を行なうの
に好適なスリツト露光型照明装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a slit exposure type illumination device, and more particularly to a slit exposure type illumination device suitable for illuminating a document surface glass at a low angle of incidence.
第1図は従来の代表的な複写機の照明装置を示
すもので、楕円反射鏡2の一方の焦点位置に光源
1を配置し、この光源1からの光束を楕円反射鏡
2で反射させて楕円反射鏡2の他方の焦点に集光
させるようにしている。 FIG. 1 shows a typical lighting system for a conventional copying machine, in which a light source 1 is placed at one focal point of an elliptical reflector 2, and the light beam from the light source 1 is reflected by the ellipse reflector 2. The light is focused on the other focal point of the elliptical reflecting mirror 2.
しかしながらこの種の装置においては、楕円反
射鏡2のA部で反射した光束は原稿面ガラス3に
大きな入射角で入ることになる。原稿面ガラス3
に対する光束の透過率は、第2図bに示すように
第2図aに示す入射角θが60度以上になると原稿
面ガラス3で反射して急激に低下し、照明効率が
大巾に低下するという難点がある。また、第1図
に示すB部は反射光束が光源1自体によつてけら
れてその分だけ照明効率が低下する。反射鏡の頂
点付近のB部の反射光束は集光性の悪い欠点があ
る。さらに、第1図に示すCの光束は照明スリツ
ト4外を照射し、スリツト露光に有効に寄与しな
いのみならず外部に光が漏れて有害な作用を及ぼ
すおそれがある。 However, in this type of apparatus, the light beam reflected by the portion A of the elliptical reflecting mirror 2 enters the document surface glass 3 at a large angle of incidence. Original glass 3
As shown in Fig. 2b, when the incident angle θ shown in Fig. 2a exceeds 60 degrees, the transmittance of the luminous flux is reflected by the document surface glass 3, and the transmittance of the light beam decreases sharply, resulting in a significant decrease in illumination efficiency. There is a difficulty in doing so. Further, in the part B shown in FIG. 1, the reflected light beam is deflected by the light source 1 itself, and the illumination efficiency is reduced accordingly. The reflected light beam in part B near the apex of the reflecting mirror has a disadvantage of poor condensing ability. Furthermore, the light beam C shown in FIG. 1 illuminates the outside of the illumination slit 4, and not only does it not contribute effectively to slit exposure, but also the light may leak to the outside and cause harmful effects.
そこでこの対策として、第3図に示すように異
なつた形状の楕円反射鏡5,6を光源1の背面側
にそれぞれ配置し、楕円反射鏡5での反射光束に
より照明スリツト4を直接照明するとともに、入
射角の大きくなる楕円反射鏡6での反射光は平面
ミラー7を介して入射角を小さくして照明スリツ
ト4を照明する方法が提案されている。 As a countermeasure against this problem, elliptical reflectors 5 and 6 of different shapes are arranged on the back side of the light source 1, respectively, as shown in FIG. A method has been proposed in which the light reflected by the elliptical reflector 6, which has a large incident angle, is passed through a plane mirror 7 to reduce the incident angle and illuminate the illumination slit 4.
この方法においては、高入射角光束の問題が解
消され、また光漏れも減少する効果が期待でき
る。また光源1によるけられ部も、その反射鏡形
状を光源1位置を中心とする円筒反射鏡8として
反射光束を光源1に戻すようにしている。光源1
に光束を戻す方式は、ハロゲンランプ等の輻射熱
放射の放射エネルギが光源フイラメント部に戻つ
てフイラメントを熱するため、再び放射エネルギ
に還元でき効率がよい。 This method can be expected to solve the problem of high incident angle luminous flux and reduce light leakage. Furthermore, the eclipse caused by the light source 1 also has a reflecting mirror shape as a cylindrical reflecting mirror 8 centered at the position of the light source 1 to return the reflected light flux to the light source 1. light source 1
In the method of returning the luminous flux to , the radiant energy of the radiant heat radiation of a halogen lamp or the like returns to the light source filament section and heats the filament, so it can be returned to radiant energy again and is efficient.
しかしながらこの改良装置においては、楕円反
射鏡6での反射光束は平面ミラー7を介して照明
スリツト4を照明するようになつているため、楕
円反射鏡の焦点間距離が長くなつて集光性が低下
するとともに、平面ミラーの反射率によつて光量
が低下するという問題がある。 However, in this improved device, the light beam reflected by the elliptical reflector 6 illuminates the illumination slit 4 via the plane mirror 7, so the distance between the focal points of the elliptical reflector becomes longer and the light condensing ability becomes poorer. In addition, there is a problem in that the amount of light decreases due to the reflectance of the plane mirror.
本考案はかかる現況に鑑み創案されたもので、
その目的とするところは、高入射角の光束をなく
して直接眼に入る光束を少なくすることができる
とともに、コンパクトな装置で光量を増大させる
ことができるスリツト露光型照明装置を提供する
にある。 This invention was devised in view of the current situation.
The purpose is to provide a slit exposure type illumination device that can reduce the amount of light that directly enters the eye by eliminating light beams at high incident angles, and can increase the amount of light with a compact device.
そのため本考案においては、原稿面ガラスの下
方に下向きに配置される円筒反射鏡の開放縁一方
端に続いてこの円筒反射鏡の下面側に位置する楕
円反射鏡を連設し、前記円筒反射鏡の中心でかつ
前記楕円反射鏡の一次焦点位置にフイラメントタ
イプの光源を配置し、前記楕円反射鏡の二次焦点
位置を原稿面ガラスの上面近傍とし、楕円反射鏡
により反射して60゜以下の入射角のスリツト状光
束で原稿面を照射するようにしたことを特徴とす
るもので、高入射角の光束をなくして光量増大を
図るようにしたものである。 Therefore, in the present invention, an elliptical reflector located on the lower surface side of the cylindrical reflector is connected to one end of the open edge of the cylindrical reflector disposed downward under the original surface glass, and the cylindrical reflector is A filament-type light source is placed at the center of the elliptical reflector and at the primary focus position of the elliptical reflector, and the secondary focus position of the elliptical reflector is near the top surface of the document surface glass, and the light is reflected by the elliptical reflector to a light angle of 60° or less. It is characterized in that the document surface is irradiated with a slit-shaped light beam having a high incidence angle, and the amount of light is increased by eliminating the light beam having a high incidence angle.
以下本考案の実施例を添付図面に基づいて説明
する。 Embodiments of the present invention will be described below with reference to the accompanying drawings.
第4図において11はハロゲンランプ等のフイ
ラメントタイプの光源であり、この光源11は原
稿面ガラス12の下方に配設されている。この光
源11と原稿面ガラス12との間には、光源11
位置に焦点を有する円筒反射鏡13がほゞ下向き
に配されているとともに、光源11の下面側に
は、光源11位置に一次焦点を有する楕円反射鏡
14が円筒反射鏡13とその突合わせ面で一体に
連結されている。 In FIG. 4, reference numeral 11 denotes a filament type light source such as a halogen lamp, and this light source 11 is disposed below the document surface glass 12. As shown in FIG. The light source 11 is located between the light source 11 and the document surface glass 12.
A cylindrical reflecting mirror 13 having a focal point at the position is disposed substantially downward, and an elliptical reflecting mirror 14 having a primary focus at the position of the light source 11 is arranged on the lower surface side of the light source 11 between the cylindrical reflecting mirror 13 and its abutting surface. are connected together.
しかして、光源11からの放射光束は楕円反射
鏡14で反射してスリツト光束となり、楕円反射
鏡14の二次焦点位置である原稿面ガラス12の
上面近傍に集光して照明スリツト15を照射する
とともに、円筒反射鏡13で反射した光束は再び
光源11に戻るようになつている。この円筒反射
鏡13で反射される光束は原稿面ガラス12に対
して高入射角となる光束である。 The emitted light flux from the light source 11 is reflected by the elliptical reflector 14 to become a slit light flux, and is focused near the upper surface of the original glass 12, which is the secondary focus position of the elliptical reflector 14, and illuminates the illumination slit 15. At the same time, the light beam reflected by the cylindrical reflecting mirror 13 returns to the light source 11 again. The light beam reflected by this cylindrical reflecting mirror 13 has a high incident angle with respect to the document surface glass 12.
この際、円筒反射鏡13の反射光束のうち第4
図に斜線を施した部分の光束は単に光源11に戻
るだけであるが、網目模様を施した部分の光束は
そのうちの約30%が光源11を通過する。そし
て、この通過した光束は一度光源11位置で集光
しているので、楕円反射鏡14の反射光束の増加
分となつて現われる。 At this time, the fourth of the light beams reflected by the cylindrical reflecting mirror 13
The light flux in the shaded area in the figure simply returns to the light source 11, but about 30% of the light flux in the meshed area passes through the light source 11. Since the passed light flux is once condensed at the light source 11 position, it appears as an increase in the light flux reflected by the elliptical reflecting mirror 14.
なお、第4図において破線Lは、第1図および
第3図の場合と同様、レンズとスリツト巾とから
決定される結像光束及び正反射限界線であり、こ
の中に照明光学系を設置するとフレア等が生じ画
質上好ましくなく、したがつて、本実施例におい
ても図示するように照明光学系は正反射限界線L
外に設置している。 In addition, in FIG. 4, the broken line L is the imaging light flux and specular reflection limit line determined from the lens and slit width, as in the case of FIGS. 1 and 3, and the illumination optical system is installed within this line. This causes flare, etc., which is unfavorable in terms of image quality. Therefore, in this embodiment, as shown in the figure, the illumination optical system is set to the specular reflection limit line L.
It is installed outside.
第5図は本考案の他の実施例を示すもので、第
4図に示す構成に加えて楕円反射鏡16を設置
し、円筒反射鏡13で反射した光束の一部を前記
楕円反射鏡16で反射させ、円筒反射鏡13に続
く楕円反射鏡14からの反射光束とともにスリツ
ト光束として照明スリツト15を照明するように
したものである。 FIG. 5 shows another embodiment of the present invention, in which an elliptical reflector 16 is installed in addition to the configuration shown in FIG. The illumination slit 15 is illuminated as a slit light flux together with the reflected light flux from the elliptical reflector 14 following the cylindrical reflector 13.
このように構成すれば、光量がより増大され、
一層照明効率の向上を図ることができる。 With this configuration, the amount of light can be further increased,
It is possible to further improve lighting efficiency.
以上説明したように本考案によれば、円筒反射
鏡を下向きに配置し、この反射鏡の開放縁一方端
に続けて楕円反射鏡を連設した構成とし、この円
筒反射鏡の中心でかつ楕円反射鏡の一次焦点位置
にフイラメントタイプの光源を配置した構成とし
ているので、原稿面ガラスに対し高入射角となる
光束は円筒反射鏡で反射され、平面反射鏡を併用
することなく高入射角の光束をなくして直接眼に
入る光を少なくすることができる。また平面反射
鏡を併用することなくすべての反射光を原稿面に
スリツト光束として照射させることができるの
で、原稿面までの光路長が短かくでき、集光性が
よくなるばかりでなく光量損失が防がれ、これと
併せて円筒反射鏡により反射された光束は光源が
フイラメントタイプであることからその反射光束
の通過が妨げられずにこれを通過し、これらの光
束のすべてが楕円反射鏡で反射されて原稿面へ向
かうので一層照明光量が増し、円筒反射鏡で反射
された光束は光源に戻されるので輻射熱放射の放
射エネルギが光源のフイラメント部に戻されてこ
れを熱し、再び放射エネルギに還元させることが
効率よくでき、照明効率を高めることができる。
さらに構成が簡単であつて小型にできるのでこれ
らにより複写機への組込みスペースをとらず、コ
ンパクトな装置で光量が大きく照明効率のよい照
明装置とすることができる。 As explained above, according to the present invention, a cylindrical reflecting mirror is arranged facing downward, and an elliptical reflecting mirror is connected to one end of the open edge of this reflecting mirror. Since the configuration has a filament type light source placed at the primary focus position of the reflector, the light beam with a high incidence angle to the original glass is reflected by the cylindrical reflector, and it is possible to achieve a high incidence angle without using a flat reflector. By eliminating the luminous flux, it is possible to reduce the amount of light that directly enters the eyes. In addition, since all the reflected light can be irradiated onto the document surface as a slit beam without using a flat reflector, the optical path length to the document surface can be shortened, which not only improves light convergence but also prevents light loss. Because the light source is a filament type, the light beam reflected by the cylindrical reflector passes through it without being hindered, and all of these light beams are reflected by the elliptical reflector. The light beam is reflected by the cylindrical reflector and is returned to the light source, so the radiant energy of the radiant heat is returned to the filament of the light source, heating it and returning it to radiant energy. This can be done efficiently and the lighting efficiency can be increased.
Furthermore, since the structure is simple and can be made compact, it does not take up much space to be incorporated into a copying machine, and it is possible to provide a compact illumination device with a large amount of light and good illumination efficiency.
第1図は従来例を示す概要図、第2図aは原稿
面ガラスに対する入射角の説明図、同図bは入射
角に対する透過率の関係を示すグラフ、第3図は
改良型の従来例を示す概要図、第4図は本考案の
一実施例を示す概要図、第5図は本考案の他の実
施例を示す概要図である。
11……光源、12……原稿面ガラス、13…
…円筒反射鏡、14……楕円反射鏡、15……照
明スリツト、16……楕円反射鏡、L……正反射
限界線。
Figure 1 is a schematic diagram showing a conventional example, Figure 2a is an explanatory diagram of the angle of incidence on the document surface glass, Figure b is a graph showing the relationship between transmittance and angle of incidence, and Figure 3 is an improved conventional example. FIG. 4 is a schematic diagram showing one embodiment of the present invention, and FIG. 5 is a schematic diagram showing another embodiment of the present invention. 11...Light source, 12...Document surface glass, 13...
...Cylindrical reflector, 14...Elliptical reflector, 15...Illumination slit, 16...Elliptical reflector, L...Specular reflection limit line.
Claims (1)
反射鏡の開放縁一方端に続いてこの円筒反射鏡の
下面側に位置する楕円反射鏡を連設し、前記円筒
反射鏡の中心でかつ前記楕円反射鏡の一次焦点位
置にフイラメントタイプの光源を配置し、前記楕
円反射鏡の二次焦点位置を原稿面ガラスの上面近
傍とし、楕円反射鏡により反射して60゜以下の入
射角のスリツト状光束で原稿面を照射するように
したことを特徴とするスリツト露光型照明装置。 An elliptical reflector located on the lower surface side of the cylindrical reflector is connected to one end of the open edge of a cylindrical reflector disposed facing downward below the document surface glass, and the elliptical reflector is located at the center of the cylindrical reflector and the elliptical A filament type light source is placed at the primary focal point of the reflecting mirror, the secondary focal point of the elliptical reflecting mirror is near the top surface of the original glass, and the elliptical reflecting mirror reflects the light into a slit-shaped light beam with an incident angle of 60° or less. A slit exposure type illumination device characterized in that the surface of a document is irradiated with light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14245679U JPH0132032Y2 (en) | 1979-10-15 | 1979-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14245679U JPH0132032Y2 (en) | 1979-10-15 | 1979-10-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5660947U JPS5660947U (en) | 1981-05-23 |
| JPH0132032Y2 true JPH0132032Y2 (en) | 1989-10-02 |
Family
ID=29373738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14245679U Expired JPH0132032Y2 (en) | 1979-10-15 | 1979-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0132032Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2026003952A (en) * | 2024-06-25 | 2026-01-14 | 株式会社日立ハイテク | Spectroscopic analysis device and method for adjusting light source position of spectroscopic analysis device |
-
1979
- 1979-10-15 JP JP14245679U patent/JPH0132032Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5660947U (en) | 1981-05-23 |
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