JPH0134430Y2 - - Google Patents
Info
- Publication number
- JPH0134430Y2 JPH0134430Y2 JP18266482U JP18266482U JPH0134430Y2 JP H0134430 Y2 JPH0134430 Y2 JP H0134430Y2 JP 18266482 U JP18266482 U JP 18266482U JP 18266482 U JP18266482 U JP 18266482U JP H0134430 Y2 JPH0134430 Y2 JP H0134430Y2
- Authority
- JP
- Japan
- Prior art keywords
- fixed contact
- contact
- contacts
- delay line
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 22
- 230000007797 corrosion Effects 0.000 claims description 10
- 238000005260 corrosion Methods 0.000 claims description 10
- 239000011241 protective layer Substances 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 claims description 4
- 239000004020 conductor Substances 0.000 description 31
- 238000007747 plating Methods 0.000 description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 229910052759 nickel Inorganic materials 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Landscapes
- Filters And Equalizers (AREA)
- Adjustable Resistors (AREA)
Description
【考案の詳細な説明】
本考案はインダクタおよび容量を組合せてなる
遅延特性の変化可能な超高速可変遅延線の改良に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in an ultrahigh-speed variable delay line whose delay characteristics can be changed by combining an inductor and a capacitor.
従来この種の可変遅延線は、ボビンに導体条を
ソレノイド状に形成して構成したインダクタに固
定接点列を設け、この固定接点列に可動接点とし
ての摺動ばねを摺動可能に接触させ、その摺動ば
ねを固定接点列に沿つて摺動させることにより、
個々の固定接点と摺動ばねの単接触と、隣合う固
定接点間に摺動ばねを落込むようにして隣合う固
定接点と摺動ばねの複接触とを交互に切換てなる
構造を有している。 Conventionally, this type of variable delay line has been constructed by providing a fixed contact array on an inductor formed by forming a conductor strip in the shape of a solenoid on a bobbin, and slidingly contacting a sliding spring as a movable contact with the fixed contact array. By sliding the sliding spring along the fixed contact row,
It has a structure in which single contact between an individual fixed contact and a sliding spring and double contact between adjacent fixed contacts and a sliding spring are alternately switched by dropping the sliding spring between adjacent fixed contacts.
そして、摺動ばねは、一担所定の固定接点を選
択した後には可変遅延線に加わる振動や衝撃等に
より移動して特性が変動しないように、摺動ばね
に付勢力を与えて固定接点列上を摺動させてい
る。 After the sliding spring has selected a predetermined fixed contact, a biasing force is applied to the sliding spring to prevent the fixed contact from moving due to vibrations, shocks, etc. applied to the variable delay line and changing the characteristics. The top is sliding.
また、第1図に示すように、ボビン1上に形成
された固定接点列2を構成する各固定接点2a,
2b,2c……は、導体条3上にニツケルメツキ
層4を形成した上に更にメツキ層5を形成するこ
とにより、導体条3の腐食を抑えて摺動ばねとの
接触抵抗を低く保つようにしている。 Further, as shown in FIG. 1, each fixed contact 2a, which constitutes the fixed contact row 2 formed on the bobbin 1,
2b, 2c... are formed by forming a nickel plating layer 4 on the conductor strip 3 and further forming a plating layer 5 to suppress corrosion of the conductor strip 3 and keep the contact resistance with the sliding spring low. ing.
しかしながらこのように構成された可変遅延線
は、第2図に示すよう付勢された状態で固定接点
列2を摺動する摺動ばね6が、各固定接点2a,
2b,2c……との単接触および、摺動ばね6を
隣合う固定接点2a,2b,2c……間に落し込
むことによる複接触を繰り返すので、摺動ばね6
が固定接点2a,2b,2c……間に落込む際や
固定接点2a,2b,2c……上に乗り上げる際
に、各固定接点2a,2b,2c……の上端縁部
が摩耗して導体条3の露出した傾斜部8が形成さ
れ易い。 However, in the variable delay line configured in this way, as shown in FIG.
2b, 2c..., and double contact by dropping the sliding spring 6 between adjacent fixed contacts 2a, 2b, 2c..., so that the sliding spring 6
When the fixed contacts 2a, 2b, 2c... fall between the fixed contacts 2a, 2b, 2c... or ride on the fixed contacts 2a, 2b, 2c..., the upper edge of each fixed contact 2a, 2b, 2c... wears out and the conductor An exposed inclined portion 8 of the strip 3 is likely to be formed.
しかも導体条3は、銅等の電気的良導体で形成
されることから導体条3の傾斜部8には酸化皮膜
が生じ易くなつて摺動ばね6との接触抵抗が大き
くなり、損失の増大および遅延特性の不安定化を
まねく欠点があり、極端な場合には接触不良によ
る動作不能をもたらすこともある。 Moreover, since the conductor strip 3 is formed of a good electrical conductor such as copper, an oxide film is likely to form on the sloped portion 8 of the conductor strip 3, resulting in increased contact resistance with the sliding spring 6, resulting in increased loss and It has the disadvantage of causing instability of the delay characteristics, and in extreme cases may lead to inoperability due to poor contact.
特に、摺動ばね6と隣合う固定接点2a,2
b,2cとの複接触時には接触不良を生じ易く、
良好な複接触状態を確保し難い。 In particular, the fixed contacts 2a, 2 adjacent to the sliding spring 6
Contact failure is likely to occur when making multiple contacts with b and 2c,
It is difficult to ensure good multiple contact conditions.
また、固定接点2a,2b,2c……の上端縁
部が摩耗する場合には、摺動ばね6の摩耗も伴う
ので、摺動ばね6表面状態が悪化し、遅延特性の
劣化を早める難点がある。 In addition, when the upper edges of the fixed contacts 2a, 2b, 2c... wear out, the sliding spring 6 also wears out, which deteriorates the surface condition of the sliding spring 6 and accelerates the deterioration of the delay characteristics. be.
本考案はこのような従来の欠点を解決するため
になされたもので、固定接点および可動接点の摩
耗が少く、固定接点と可動接点間の接触抵抗を経
時的に安定かつ低く抑えることが可能で、遅延特
性の切換えが安定かつ確実な超高速の小形可変遅
延線の提供を目的とする。 The present invention was developed to solve these conventional drawbacks, and it is possible to reduce wear on the fixed and movable contacts, and to keep the contact resistance between the fixed and movable contacts stable and low over time. The purpose of this invention is to provide an ultra-high-speed, compact variable delay line whose delay characteristics can be switched stably and reliably.
この目的を達成するために本考案は、インダク
タと、このインダクタに組合せて遅延線を形成す
る容量と、そのインダクタに形成された固定接点
列と、この固定接点列を摺動する可動接点を備え
てなる可変遅延線において、その固定接点におけ
る上記可動接点の接触する上端縁部に傾斜部を形
成し、隣合う固定接点の両傾斜部に可動接点が同
時に接触するように形成し、その傾斜部を含む上
記固定接点に耐食性の良好な導電性保護層を形成
してなることを特徴とし、可動接点の摺動に伴な
う固定接点の上端縁部の摩耗と化学的変化を抑え
たものである。 To achieve this objective, the present invention includes an inductor, a capacitor that is combined with the inductor to form a delay line, a fixed contact array formed on the inductor, and a movable contact that slides on the fixed contact array. In a variable delay line consisting of a fixed contact, a sloped portion is formed at the upper end edge of the fixed contact that is in contact with the movable contact, and the movable contact is formed so that it simultaneously contacts both sloped portions of the adjacent fixed contact, and the sloped portion A conductive protective layer with good corrosion resistance is formed on the above-mentioned fixed contact, which suppresses wear and chemical changes on the upper edge of the fixed contact caused by sliding of the movable contact. be.
以下本考案の詳細を説明する。なお従来例と共
通する部分には共通の符号を付す。 The details of the present invention will be explained below. Note that parts common to the conventional example are given the same reference numerals.
第3図は本考案の一実施例を示す縦断面図であ
る。符号1は横断面が長方形の棒状非磁性ボビン
であり、横置きされその長手方向上面には接地電
極9が形成され、この接地電極9上に誘電体層1
0が形成されている。 FIG. 3 is a longitudinal sectional view showing an embodiment of the present invention. Reference numeral 1 designates a rod-shaped non-magnetic bobbin with a rectangular cross section, which is placed horizontally and has a ground electrode 9 formed on its upper surface in the longitudinal direction, and a dielectric layer 1 on the ground electrode 9.
0 is formed.
ボビン1の外周には、銅からなる導体条3を所
定のピツチで単層ソレノイド状にスペース巻きし
たインダクタ11が形成されており、第4図に示
すように、隣合う導体条3間は凹陥部となつてい
る。インダクタ11において、誘電体層10上の
導体条3とこれに対向する接地電極9によつてイ
ンダクタ11の各ターン毎に容量Cが導体条3に
接続された状態で形成され、1ターンを1区間分
のインダクタンスLとしてその容量Cと組合せた
複数区間からなる集中定数型遅延線12が構成さ
れている。 On the outer periphery of the bobbin 1, an inductor 11 is formed by space-wound conductor strips 3 made of copper at a predetermined pitch in the shape of a single-layer solenoid.As shown in FIG. 4, there are recesses between adjacent conductor strips 3. It has become a department. In the inductor 11, a capacitance C is formed in each turn of the inductor 11 by the conductor strip 3 on the dielectric layer 10 and the ground electrode 9 facing the conductor strip 3, with each turn being connected to the conductor strip 3. A lumped constant type delay line 12 is constructed of a plurality of sections in which the inductance L for each section is combined with the capacitance C thereof.
また、インダクタ11の導体条3は、両上端縁
部に傾斜部13を有し、この傾斜部13を含む導
体条3の上面にはニツケルメツキ層4が形成さ
れ、さらにこのニツケルメツキ層4の上に金メツ
キ層5が形成されている。 Further, the conductor strip 3 of the inductor 11 has sloped portions 13 at both upper end edges, and a nickel plating layer 4 is formed on the upper surface of the conductor strip 3 including the sloped portions 13, and further on the nickel plating layer 4. A gold plating layer 5 is formed.
そして、インダクタ11における上側の導体条
3は、後述する可動接点としての摺動ばね6が接
触する固定接点2a,2b,2c……となつてお
り、これら固定接点2a,2b,2c……によつ
て固定接点列2が構成されている。なお、導体条
3における傾斜部13、ニツケルメツキ層4およ
び金メツキ層5は、摺動ばね6の接触する部分も
しくはその近傍に形成することも可能であり、形
成個所を限定すれば各メツキ層4,5の材料の節
約ができる。 The upper conductor strip 3 of the inductor 11 has fixed contacts 2a, 2b, 2c, . Thus, a fixed contact array 2 is configured. Incidentally, the inclined portion 13, the nickel plating layer 4, and the gold plating layer 5 in the conductor strip 3 can also be formed at or near the portion where the sliding spring 6 contacts, and if the formation location is limited, each plating layer 4 can be formed. , 5 materials can be saved.
第3図においてボビン1は、下面すなわち容量
Cの形成された面に対向する面を筐体14の底部
15内側に固定され、接地電極9がボビン1の両
端面近傍を経て筐体14の底部15に植設された
入出力接地端子16,17に接続され、インダク
タ11の導体条3の巻終わりが同様に底部15に
植設された出力端子18に接続されている。な
お、導体条3の巻始めは終端抵抗を介して入力接
地端子16に接続されている。 In FIG. 3, the lower surface of the bobbin 1, that is, the surface opposite to the surface on which the capacitor C is formed, is fixed to the inside of the bottom 15 of the casing 14, and the ground electrode 9 passes through the vicinity of both end surfaces of the bobbin 1 to the bottom of the casing 14. The winding end of the conductor strip 3 of the inductor 11 is connected to an output terminal 18 that is similarly planted on the bottom 15. Note that the beginning of the winding of the conductor strip 3 is connected to the input ground terminal 16 via a terminating resistor.
筐体14はその天井部19内側にボビン1の固
定接点列2に沿つて形成された摺動電極20を有
しており、筐体14の内側面を経てその底部15
に植設された入力端子21に接続されている。 The housing 14 has a sliding electrode 20 formed along the fixed contact row 2 of the bobbin 1 inside the ceiling part 19, and the sliding electrode 20 is formed along the fixed contact row 2 of the bobbin 1.
The input terminal 21 is connected to the input terminal 21 installed in the input terminal 21 .
筐体14の天井部19には、この天井部19に
固定接点列2に沿つて設けた摺動溝21からつま
み22を突出させたつまみ付きばねホルダ23が
配置され、このつまみ付きばねホルダ23は固定
接点列2方向に開くように形成された収納部24
に、摺動電極20および固定接点列2へ付勢され
た状態で接触する摺動ばね6を収納し、可変遅延
線が構成されている。なお、摺動ばね6は、ベリ
リウム銅等のように比較的硬く加工が容易な帯状
導体を湾曲もしくは折曲加工して、例えば逆山形
に形成され、必要り応じて耐食性の良好なメツキ
層(図示せず)で覆われている。 A spring holder 23 with a knob is disposed on the ceiling 19 of the housing 14 and has a knob 22 protruding from a sliding groove 21 provided in the ceiling 19 along the fixed contact row 2. is a housing section 24 formed to open in two directions of the fixed contact array.
A variable delay line is constructed by housing a sliding spring 6 that contacts the sliding electrode 20 and the fixed contact array 2 in a biased state. The sliding spring 6 is formed by curving or bending a band-shaped conductor that is relatively hard and easy to work with, such as beryllium copper, to form, for example, an inverted mountain shape, and is optionally coated with a plating layer (with good corrosion resistance). (not shown).
第5図は上述の可変遅延線の等価回路図であ
り、図中符号PGはパルス信号源、Csは浮遊容量、
Lwは摺動電極20や摺動ばね6等の結結インダ
クタンス、Rpは終端抵抗、そしてaはインダク
タ11の各ターン間の結合係数を示している。 FIG. 5 is an equivalent circuit diagram of the above-mentioned variable delay line, where the symbol PG is a pulse signal source, C s is a stray capacitance,
L w represents the coupling inductance of the sliding electrode 20, the sliding spring 6, etc., R p represents the terminating resistance, and a represents the coupling coefficient between each turn of the inductor 11.
この可変遅延線は、ばねホルダ23のつまみ2
2を筐体14の摺動溝21内で移動させることに
より、摺動ばね6が摺動電極20に接触しなが
ら、固定接点列2の個々固定接点2a,2b,2
c……との単接触と、隣合う固定接点2a,2
b,2c……間の凹陥部への凹陥による隣合う固
定接点2a,2b,2cにおける傾斜部13との
複接点とを繰返しながら摺動して切換わり、所定
の細い時間差で階段状に変化する可変遅延特性が
得られる。 This variable delay line is connected to the knob 2 of the spring holder 23.
2 within the sliding groove 21 of the housing 14, the sliding spring 6 contacts the sliding electrode 20, and the individual fixed contacts 2a, 2b, 2 of the fixed contact row 2 are moved.
Single contact with c... and adjacent fixed contacts 2a, 2
b, 2c... By recessing into the recessed portion between adjacent fixed contacts 2a, 2b, 2c, the multiple contact points with the inclined portion 13 are repeatedly slid and switched, changing stepwise with a predetermined narrow time difference. This results in variable delay characteristics.
このように構成された可変遅延線は、固定接点
列2を構成する個々の固定接点2a,2b,2c
……が、少なくとも摺動ばね6の接触する上端縁
に予め傾斜部13を有しているので、摺動ばね6
が固定接点2a,2b,2c……間に凹陥する際
や固定接点2a,2b,2c……上面に乗り上げ
る際に、摩耗しにくいうえ、傾斜部13を含めて
固定接点2a,2b,2c……がニツケルメツキ
層4および金メツキ層5で覆われているので、さ
らに摩耗しにくく耐食性が良好となる。 The variable delay line configured in this way has individual fixed contacts 2a, 2b, 2c constituting the fixed contact array 2.
. . . has an inclined portion 13 in advance at least on the upper end edge that the sliding spring 6 contacts, so that the sliding spring 6
When the fixed contacts 2a, 2b, 2c... are depressed, or when the fixed contacts 2a, 2b, 2c... ride on the upper surface, they are not easily worn, and the fixed contacts 2a, 2b, 2c... including the inclined portion 13 are not easily worn out. Since... is covered with the nickel plating layer 4 and the gold plating layer 5, it is more difficult to wear and has good corrosion resistance.
そのため、摺動ばね6と固定接点列2間の接触
抵抗を経時的に低く抑えることが可能で、安定し
た遅延特性を得ることができるばかりか、切換え
も確実となる。 Therefore, it is possible to keep the contact resistance between the sliding spring 6 and the fixed contact array 2 low over time, and not only can stable delay characteristics be obtained, but also reliable switching can be achieved.
なお、上述の実施においては、インダクタ11
としてボビン1を用いる例を示したが、ボビン1
を省略して導体条3によつて構成することも可能
であり、ボビン1を用いる場合にあつても、ボビ
ン1に導線を巻回したものに限らず、例えばアル
ミナ磁器ボビンの表面に導電体層を形成し、フオ
トエツチングやレーザービームによつてソレノイ
ド状の導体条3を形成することができる。 Note that in the above implementation, the inductor 11
In this example, bobbin 1 is used as bobbin 1.
It is also possible to omit the conductor strip 3, and even when using the bobbin 1, it is not limited to the bobbin 1 in which the conductor wire is wound. A solenoid-like conductor strip 3 can be formed by forming a layer and using photoetching or a laser beam.
もつとも、本考案における導体条3は、固定接
点2a,2b,2c……上での摺動ばね6の安定
性を確保するために、上面が平らな、例えば平角
線状のものが適する。そして導体条3の上端縁に
形成する傾斜部13は、メツキ層4,5を形成す
る前に加圧手法や腐食等の化学的手法によつて簡
単に形成することが可能である。 However, in order to ensure the stability of the sliding spring 6 on the fixed contacts 2a, 2b, 2c, . . ., the conductor strip 3 in the present invention is suitably a rectangular wire-shaped conductor strip with a flat upper surface, for example. The inclined portion 13 formed at the upper end edge of the conductor strip 3 can be easily formed by a pressure method or a chemical method such as corrosion before forming the plating layers 4 and 5.
さらに、導体条3に形成するニツケルメツキ層
4は、導体条3の材質によつて選定すればよく、
耐摩耗性の良好な導電性材料をメツキすれば本考
案の目的達成が可能であるが、導体条3の材質に
よつてはその省略も可能である。ニツケルメツキ
層4上に形成するメツキ層5は、金等のほか耐食
性の良好な導電材質を保護層として形成すればよ
い。 Furthermore, the nickel plating layer 4 formed on the conductor strip 3 may be selected depending on the material of the conductor strip 3.
Although the object of the present invention can be achieved by plating with a conductive material having good wear resistance, it may be omitted depending on the material of the conductor strips 3. The plating layer 5 formed on the nickel plating layer 4 may be formed of a conductive material with good corrosion resistance, such as gold, as a protective layer.
以上説明したように本考案の可変遅延線は、イ
ンダクタに設けた固定接点において、可動接点が
同時に接触する隣合う固定接点の各上端縁部に傾
斜部を形成するとともに、この傾斜部を含む固定
接点に耐食性の良好な導電性保護層を形成してな
るので、固定接点および可動接点の摩耗や酸化等
の化学変化が少なく、接触抵抗を低く抑えること
ができる。特に、複接触時における可動接点の安
定性の確保および接触不良の改善を図ることがで
きる。 As explained above, in the variable delay line of the present invention, in the fixed contacts provided in the inductor, an inclined part is formed at the upper edge of each adjacent fixed contact that the movable contact simultaneously contacts, and the fixed contact including this inclined part is Since a conductive protective layer with good corrosion resistance is formed on the contact, chemical changes such as wear and oxidation of the fixed contact and the movable contact are small, and contact resistance can be kept low. In particular, it is possible to ensure the stability of the movable contact and to improve poor contact during multiple contacts.
従つて、経時的に安定で良好な遅延特性を得る
ことができるし、遅延時間の切換えを確実に行な
うことができる。 Therefore, it is possible to obtain stable and good delay characteristics over time, and it is possible to reliably switch the delay time.
第1図および第2図は従来の可変遅延線の固定
接点列を示す部分断面図、第3図および第4図は
本考案の可変遅延線の一実施例を示す縦断面図お
よびその固定接点列を示す部分断面図、第5図は
可変遅延線の等価回路図である。
1……ボビン、2……固定接点列、2a,2
b,2c……固定接点、3……導体条、4……耐
摩耗性の良好な導電層(ニツケルメツキ層)、5
……耐食性の良好な導電保護層(金メツキ層)、
6……可動接点(摺動ばね)、8,13……傾斜
部、11……インダクタ、12……集中定数型遅
延線。
1 and 2 are partial sectional views showing a fixed contact array of a conventional variable delay line, and FIGS. 3 and 4 are longitudinal sectional views showing an embodiment of the variable delay line of the present invention and its fixed contacts. FIG. 5, which is a partial cross-sectional view showing the column, is an equivalent circuit diagram of the variable delay line. 1...Bobbin, 2...Fixed contact row, 2a, 2
b, 2c... fixed contact, 3... conductor strip, 4... conductive layer with good wear resistance (nickel plating layer), 5
...Conductive protective layer (gold plating layer) with good corrosion resistance,
6... Movable contact (sliding spring), 8, 13... Inclined portion, 11... Inductor, 12... Lumped constant type delay line.
Claims (1)
延線を形成する容量と、前記インダクタに形成
された固定接点列と、この固定接点列を摺動す
る可動接点を備え、この可動接点の摺動によつ
て前記固定接点列から任意の固定接点を選択し
て遅延特性を変化させる可変遅延線において、
前記固定接点の前記可動接点が接触する上端縁
部に傾斜部を形成し、隣合う固定接点の両傾斜
部に可動接点が同時に接触するように形成し、
前記傾斜部を含む前記固定接点に耐食性の良好
な導電性保護層を形成してなることを特徴とす
る可変遅延線。 (2) 耐食性の良好な導電性保護層が、耐摩耗性の
良好な導電層を介して形成されてなる実用新案
登録請求の範囲第(1)項記載の可変遅延線。[Claims for Utility Model Registration] (1) An inductor, a capacitor that forms a delay line in combination with the inductor, a fixed contact array formed on the inductor, and a movable contact that slides on the fixed contact array. , in a variable delay line in which an arbitrary fixed contact is selected from the fixed contact array to change the delay characteristic by sliding the movable contact,
forming a sloped portion on the upper end edge of the fixed contact that the movable contact contacts, and forming the movable contact so that it simultaneously contacts both sloped portions of adjacent fixed contacts;
A variable delay line characterized in that a conductive protective layer having good corrosion resistance is formed on the fixed contact including the inclined portion. (2) The variable delay line according to claim (1), wherein the conductive protective layer with good corrosion resistance is formed through a conductive layer with good wear resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18266482U JPS5986724U (en) | 1982-12-02 | 1982-12-02 | variable delay line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18266482U JPS5986724U (en) | 1982-12-02 | 1982-12-02 | variable delay line |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5986724U JPS5986724U (en) | 1984-06-12 |
| JPH0134430Y2 true JPH0134430Y2 (en) | 1989-10-19 |
Family
ID=30395522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18266482U Granted JPS5986724U (en) | 1982-12-02 | 1982-12-02 | variable delay line |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5986724U (en) |
-
1982
- 1982-12-02 JP JP18266482U patent/JPS5986724U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5986724U (en) | 1984-06-12 |
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