JPH0143423B2 - - Google Patents

Info

Publication number
JPH0143423B2
JPH0143423B2 JP55000419A JP41980A JPH0143423B2 JP H0143423 B2 JPH0143423 B2 JP H0143423B2 JP 55000419 A JP55000419 A JP 55000419A JP 41980 A JP41980 A JP 41980A JP H0143423 B2 JPH0143423 B2 JP H0143423B2
Authority
JP
Japan
Prior art keywords
electrode
focusing
electrodes
electron
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55000419A
Other languages
Japanese (ja)
Other versions
JPS5697948A (en
Inventor
Kazuaki Naiki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP41980A priority Critical patent/JPS5697948A/en
Publication of JPS5697948A publication Critical patent/JPS5697948A/en
Publication of JPH0143423B2 publication Critical patent/JPH0143423B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/485Construction of the gun or of parts thereof

Description

【発明の詳細な説明】 本発明は複数の電子ビームを発生するカラー陰
極線管の多電子銃電極構体、特に電気的、構造的
に共通で各電子ビーム通路には実質的に個別、或
いは共通の電子レンズを形成する一体化電極を備
えた電子銃電極構体に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multi-electron gun electrode structure for a color cathode ray tube that generates a plurality of electron beams. The present invention relates to an electron gun electrode assembly with an integrated electrode forming an electron lens.

電子銃電極構体の組立作業の簡易化、組立精度
の向上、或いはカラー陰極線管の電子銃が封止さ
れる硝子外囲器頚部の径小化に伴う電子銃電極構
体の占有体積の縮小化を実現する手段として電気
的、構造的に共通で各電子ビーム通路には実質的
に個別、或いは共通の電子ビームを形成する一体
化電極を備えた電子銃電極構体が一般に用いられ
ている。更に電子ビームに対する電子銃主電子レ
ンズの集束特性を大幅に改善する手段として、一
つの主電子レンズによらず複数の電子レンズを組
合せた多段集束型電子レンズを備えた電子銃電極
構体が用いられているが、その電極構成によつて
は電極の軸方向長さが対向電極間隙と同程度、或
いはそれ以下となる電極があり、その電極の熱容
量は他の電極と比べて著しく小さくなる。
Simplify the assembly work of the electron gun electrode assembly, improve assembly accuracy, or reduce the volume occupied by the electron gun electrode assembly due to the reduction in the diameter of the neck of the glass envelope in which the electron gun of a color cathode ray tube is sealed. As a means of achieving this, an electron gun electrode structure is generally used which is electrically and structurally common and includes an integrated electrode for each electron beam path to form a substantially separate or common electron beam. Furthermore, as a means to significantly improve the focusing characteristics of the main electron lens of the electron gun for the electron beam, an electron gun electrode assembly is used which is equipped with a multi-stage focusing electron lens that combines multiple electron lenses instead of just one main electron lens. However, depending on the electrode configuration, there are some electrodes whose axial length is equal to or less than the gap between opposing electrodes, and the heat capacity of these electrodes is significantly smaller than that of other electrodes.

電子銃の動作時には電極間に異つた高電圧が印
加されて各対向電極間に大きな電位差が生じるた
め、電極相互間の耐電圧特性は良好でなければな
らない。従がつて陰極線管製造工程中、上述の高
電位差の生じる電極間の耐電圧特性を向上させる
ために高電圧処理が行われるが、複数の電極間に
大きな熱容量の差があると、電極間を十分高電圧
処理が出来ず、電極相互間の耐電圧特性は著しく
劣化する。
During operation of the electron gun, different high voltages are applied between the electrodes, creating a large potential difference between the opposing electrodes, so the voltage resistance characteristics between the electrodes must be good. Therefore, during the cathode ray tube manufacturing process, high voltage treatment is performed to improve the withstand voltage characteristics between the electrodes where the above-mentioned high potential difference occurs, but if there is a large difference in heat capacity between multiple electrodes, Sufficiently high voltage processing is not possible, and the withstand voltage characteristics between the electrodes deteriorate significantly.

従来用いられている多段集束型電子レンズを備
えた電子銃電極構体の一つについて第1図〜第3
図に従がつて説明する。第1図及び第2図は従来
用いられている同一平面内に互に電気的に絶縁さ
れて等間隔距離を保つて陰極が配列されたインラ
イン型で、主電子レンズが3個のバイ・ポテンシ
ヤル・フオーカス電子レンズを積重ねた多段集束
型電子レンズ方式を採る電子銃電極構体1の夫々
正面図及び側面図、第3図は第1図に示すA−A
断面を示す。電子銃電極構体1は、同一平面内に
互に絶縁されて等間隔距離を保つて一列に配列さ
れた陰極構体10と、これに対向して電子ビーム
進行方向に順次配置される電気的に共通な制御電
極であるG1電極11、及び陰極より射出された
熱電子ビームの加速電極であるG2電極12、電
気的、構造的に共通で各電子ビーム通路には実質
的に独立した電子レンズを形成する一体化電極か
らなる第1集束電極であるG3電極13、第1陽
極電極であるG4電極14、第2集束電極である
G5電極15、第2陽極電極であるG6電極16で
構成されている。各電極は絶縁物支持杆19との
融着強度を高めるために複数の切欠部18Aを先
端に設けた支持子18(第3図参照)を持ち、支
持子18の切欠部18Aを二本の直方柱状絶縁物
支持杆19へ埋込んで融着することにより各電極
間隔が所定寸法に保持固定されている。G4電極
14とG6電極16は給電線17Aにより同電位
となるように接続され、図示しないが電子銃電極
構体1が封止される陰極線管硝子外囲器漏斗状部
に配設された陽極端子に接続された内部導電性被
膜から20〜30KV程度の高電圧の陽極電圧が供給
され、G3電極13とG5電極15は給電線17B
により同電位とされ、図示されていないが電子銃
電極構体1が支持固定されるステムの給電ピンか
ら陽極電圧の20〜40%程度の集束電圧が供給さ
れ、他の電極もステムの給電ピンより所定電圧が
供給される様に互にステムの給電ピンに接続され
る。陰極10より放射された電子ビームはG1電
極11とG2電極12付近に形成されるクロス・
オーバ点より発散され、G2電極12とG3電極1
3間に形成されるプリ・フオーカス・レンズで予
備集束された後、G3電極13とG4電極14、G4
電極14とG5電極15、G5電極15とG6電極1
6の電極間隙に形成される主フオーカス・レンズ
となる夫々独立した3個のバイ・ポテンシヤル型
レンズで三段に、順次集束され、螢光面上で最小
のビーム・スポツト断面積を持つように集束電極
であるG3電極13及びG5電極15に印加される
集束電圧が調整される。プリーフオーカス・レン
ズで予備集束された電子ビームは3個の主フオー
カス・レンズで三段に集束されるため、主フオー
カス・レンズは従来用いられている電子銃に於け
る1個からなる主フオーカス・レンズより夫々の
レンズ強度は弱く出来る。従がつて3個の主レン
ズで徐々に電子ビームを集束出来て、主レンズ系
の球面収差は極めて小さくなり、陰極線管動作時
の大ビーム電流時に於ても電子ビーム束は各主電
子レンズの収差の小さい中心部を通過することな
り、尖鋭なビーム束が得られ、螢光面上には高輝
度画面であつても高解像度の受像画像が得られ
る。
Figures 1 to 3 show one of the conventionally used electron gun electrode structures equipped with multistage focusing electron lenses.
This will be explained according to the diagram. Figures 1 and 2 show a conventional in-line type in which cathodes are arranged on the same plane, electrically insulated from each other and spaced at equal distances, and the main electron lens is a bi-potential type with three main electron lenses.・A front view and a side view of the electron gun electrode structure 1 which adopts a multi-stage focusing electron lens system in which focus electron lenses are stacked, respectively, and FIG. 3 is A-A shown in FIG. 1.
A cross section is shown. The electron gun electrode assembly 1 includes cathode assemblies 10 which are insulated from each other and arranged in a line at equal intervals in the same plane, and electrically common cathode assemblies 10 which are arranged in sequence in the electron beam traveling direction in opposition to the cathode assemblies 10. The G1 electrode 11, which is a control electrode, and the G2 electrode 12, which is an acceleration electrode for the thermionic beam emitted from the cathode, are electrically and structurally common and form substantially independent electron lenses in each electron beam path. The G3 electrode 13 is a first focusing electrode, the G4 electrode 14 is a first anode electrode, and the second focusing electrode is an integrated electrode.
It is composed of a G5 electrode 15 and a G6 electrode 16 which is a second anode electrode. Each electrode has a supporter 18 (see FIG. 3) with a plurality of notches 18A at its tip to increase the strength of the fusion bond with the insulator support rod 19. By embedding it in the rectangular columnar insulator support rod 19 and fusing it, the distance between each electrode is maintained and fixed at a predetermined dimension. The G4 electrode 14 and the G6 electrode 16 are connected to have the same potential by a power supply line 17A, and an anode terminal (not shown) is provided in the funnel-shaped part of the cathode ray tube glass envelope in which the electron gun electrode structure 1 is sealed. A high anode voltage of about 20 to 30 KV is supplied from the internal conductive coating connected to the G3 electrode 13 and G5 electrode 15,
Although not shown, a focused voltage of about 20 to 40% of the anode voltage is supplied from the power supply pin of the stem on which the electron gun electrode assembly 1 is supported and fixed, and the other electrodes are also at the same potential from the power supply pin of the stem. They are mutually connected to the power supply pins of the stem so that a predetermined voltage is supplied. The electron beam emitted from the cathode 10 crosses the electron beam formed near the G1 electrode 11 and G2 electrode 12.
Divergent from the over point, G2 electrode 12 and G3 electrode 1
After pre-focusing with the pre-focus lens formed between G3 electrode 13 and G4 electrode 14, G4
Electrode 14 and G5 electrode 15, G5 electrode 15 and G6 electrode 1
The beam is sequentially focused in three stages by three independent bi-potential type lenses, each of which serves as the main focus lens, formed in the gap between the two electrodes, so that the beam spot has the smallest cross-sectional area on the fluorescent surface. The focusing voltages applied to the G3 electrode 13 and the G5 electrode 15, which are focusing electrodes, are adjusted. The electron beam prefocused by the prefocus lens is focused in three stages by three main focus lenses, so the main focus lens is different from the one main focus lens in the conventional electron gun.・The strength of each lens can be weaker than the other lenses. Therefore, the electron beam can be gradually focused by the three main lenses, and the spherical aberration of the main lens system becomes extremely small, and even when the beam current is large during cathode ray tube operation, the electron beam flux remains the same as that of each main electron lens. Since the beam passes through the center with small aberrations, a sharp beam bundle is obtained, and a high-resolution received image can be obtained on the fluorescent surface even on a high-brightness screen.

上述の様にG4電極14とG6電極16に高電圧
の陽極電圧が、G3電極13とG5電極15には集
束電圧として陽極電圧の20〜40%程度の中高電圧
が印加される。即ちG3電極13及至G6電極16
迄の電極間には高電圧の陽極電圧と中高電圧の集
束電圧とが周期的に印加されて、G3電極13と
G4電極14、G4電極14とG5電極15及びG5
電極15とG6電極16間には大きな電位差を生
じるため、対向する電極相互間隔及び絶縁物支持
杆19に埋設される支持子相互間隔の大きさは耐
電圧特性に大きく影響する。G3電極13とG4電
極14、G4電極14とG5電極15及びG5電極1
5とG6電極16の各電極相互間隔a1,a2,a3
耐電圧特性上大きい程よいが、余り大きいと外部
電界の侵入の影響を受け、電子ビーム通過中の電
子ビーム径路を不所望に曲げてしまうため、この
影響を受けない程度の大きさで、且つ等しい大き
さ通常選定されている。又G3電極13、G4電極
14、G5電極15、G6電極16の各電極支持子
18相互間の耐電圧特性は絶縁物支持杆19の組
成による固有抵抗値及び表面状態等による表面抵
抗値に応じて流れる微少漏洩電流で決まるため、
各電極支持子18相互間距離は可能の限り大きい
ことが望ましいが、これはフオーカス特性から決
まる各電極の軸方向長さ、及び電極相互間隔a1
a2,a3で決定される。一方フオーカス特性から決
まる電極構成によつては、或る電極の軸方向長さ
が、他の電極と比べて著しく短くなり、場合によ
つては対向電極間隙と同程度、或いはそれ以下と
なることがあり、その電極の熱容量は他の電極に
対し極めて小さくなる。第1図、第2図に示す電
子銃電極構体ではG4電極14がこれに相当する。
As described above, a high anode voltage is applied to the G4 electrode 14 and the G6 electrode 16, and a medium-high voltage of about 20 to 40% of the anode voltage is applied to the G3 electrode 13 and the G5 electrode 15 as a focusing voltage. That is, G3 electrode 13 to G6 electrode 16
A high voltage anode voltage and a medium-high voltage focusing voltage are periodically applied between the G3 electrode 13 and the G3 electrode 13.
G4 electrode 14, G4 electrode 14 and G5 electrode 15 and G5
Since a large potential difference is generated between the electrode 15 and the G6 electrode 16, the distance between the opposing electrodes and the distance between the supports embedded in the insulating support rod 19 greatly affect withstand voltage characteristics. G3 electrode 13 and G4 electrode 14, G4 electrode 14 and G5 electrode 15, and G5 electrode 1
The larger the distances a 1 , a 2 , and a 3 between the electrodes 5 and 16, the better in terms of withstand voltage characteristics, but if they are too large, they will be affected by the penetration of an external electric field, and the electron beam path during the electron beam passage may become undesirable. Therefore, a size that is not affected by this and the same size is usually selected. In addition, the withstand voltage characteristics between the electrode supports 18 of the G3 electrode 13, G4 electrode 14, G5 electrode 15, and G6 electrode 16 depend on the specific resistance value due to the composition of the insulator support rod 19 and the surface resistance value due to the surface condition, etc. It is determined by the minute leakage current flowing through the
It is desirable that the distance between each electrode supporter 18 is as large as possible, but this is determined by the axial length of each electrode determined from the focus characteristics and the mutual electrode spacing a 1 ,
Determined by a 2 and a 3 . On the other hand, depending on the electrode configuration determined by the focus characteristics, the axial length of a certain electrode may be significantly shorter than other electrodes, and in some cases, it may be equal to or less than the gap between opposing electrodes. , and the heat capacity of that electrode is extremely small compared to other electrodes. In the electron gun electrode structure shown in FIGS. 1 and 2, the G4 electrode 14 corresponds to this.

然るに陰極線管製造工程中、上述の高電位差の
生じる電極間の耐電圧特性を向上させるために、
実際に使用される陽極定格電圧の数倍以上の高電
圧を陽極電極であるG6電極16、G4電極14に
印加し、これ以外の他電極、即ち集束電極である
G5電極15、G3電極13及びG2電極12、G1
電極11、陰極10を接地電位とし、電極表面の
微小突起や、汚れ等を除去する高電圧処理工程が
ある。主電子レンズ電極相互間隔a1,a2,a3は通
常0.8〜1.5mm程度で、高電圧処理電圧は80〜
50KV程度であり、従がつて主電子レンズ電極相
互間には100〜50MV/mの強電界がかかること
になり、いわゆる冷陰極放出作用により高電位電
極であるG6電極16、G4電極14から接地電位
にあるG5電極15、G3電極13に向う冷陰極放
出電流が流入する。換言すれば、第2図中矢印B
で示す様に冷陰極放出電子が接地電位にあるG5
電極15、G3電極13から高電位にあるG6電極
16、G4電極14へ流入することになり、しか
も電子は強電界で高速度に加速され、G6電極1
6、G4電極14の接地電位にある電極に対向す
る電極表面に激突し、電子の運動エネルギは熱に
変換され、その熱で高電圧処理中電極は加熱され
続け、G6電極16、G4電極14の電極表面温度
は急激に上昇していく。特に第2図中矢印Bで示
す様に高電圧処理工程中、接地電位電極にはさま
れたG4電極14はG5電極15とG3電極13から
放出された電子が激突し、両面が加熱されること
になり、片面だけ加熱されるG6電極16より2
倍加熱される。更に主電子レンズ電極構成の設計
寸法から決定される電極の軸方向長さが、他の電
極や、電極間隔に対して著しく短い第2図に示す
G4電極14は他の電極と比べ熱容量も著しく小
さいため、激突する電子により赤熱するに至る迄
加熱され、その電極支持部18も赤熱され、その
局部的熱で絶縁物支持杆19を局部的に歪ませ、
その結果これに割目を形成したり、或いは破壊す
るまでに至り、電子銃電極構体1を機械的、電気
的不良にしてしまう。従がつて高電圧処理の条件
はG4電極14に対向するG3電極13、G5電極1
5の電極間の処理条件に制限され、その結果耐電
圧品位は不十分であつた。
However, during the cathode ray tube manufacturing process, in order to improve the withstand voltage characteristics between the electrodes where the above-mentioned high potential difference occurs,
A high voltage several times higher than the anode rated voltage actually used is applied to the G6 electrode 16 and G4 electrode 14, which are the anode electrodes, and other electrodes, that is, the focusing electrodes.
G5 electrode 15, G3 electrode 13 and G2 electrode 12, G1
There is a high voltage treatment process in which the electrode 11 and the cathode 10 are set at a ground potential to remove minute protrusions, dirt, etc. from the electrode surface. The main electron lens electrode mutual spacing a 1 , a 2 , a 3 is usually about 0.8 ~ 1.5 mm, and the high voltage processing voltage is 80 ~
As a result, a strong electric field of 100 to 50 MV/m is applied between the main electron lens electrodes, and due to the so-called cold cathode emission effect, the high potential electrodes G6 electrode 16 and G4 electrode 14 are grounded. A cold cathode emission current flows toward the G5 electrode 15 and the G3 electrode 13, which are at potential. In other words, arrow B in Figure 2
As shown in G5, the cold cathode emitted electrons are at ground potential.
The electrons flow from the electrode 15 and the G3 electrode 13 to the G6 electrode 16 and the G4 electrode 14, which are at high potential.
6. The electrons collide with the surface of the electrode opposite to the electrode at ground potential of the G4 electrode 14, and the kinetic energy of the electrons is converted into heat, which continues to heat the electrode during high voltage processing, causing the G6 electrode 16 and the G4 electrode 14 to The electrode surface temperature rises rapidly. In particular, as shown by arrow B in Figure 2, during the high voltage treatment process, the G4 electrode 14 sandwiched between the ground potential electrodes is heated by the electrons emitted from the G5 electrode 15 and the G3 electrode 13, and both sides are heated. Therefore, 2 from the G6 electrode 16, which is heated only on one side.
It is heated twice as much. Furthermore, the axial length of the electrode, determined from the design dimensions of the main electron lens electrode configuration, is significantly shorter than other electrodes and the electrode spacing, as shown in Figure 2.
Since the G4 electrode 14 has a significantly smaller heat capacity than other electrodes, it is heated until it becomes red hot by the colliding electrons, and its electrode support part 18 is also red hot, and the local heat locally damages the insulator support rod 19. distort,
As a result, cracks are formed or even broken, resulting in mechanical and electrical failure of the electron gun electrode assembly 1. Therefore, the conditions for high voltage treatment are G3 electrode 13 facing G4 electrode 14 and G5 electrode 1.
As a result, the withstand voltage quality was insufficient.

本発明の目的は、上述の欠点を除去し、電極相
互間の耐電圧処理を良好に行なえる電子銃電極構
体を提供することである。
SUMMARY OF THE INVENTION An object of the present invention is to provide an electron gun electrode structure that eliminates the above-mentioned drawbacks and allows good voltage resistance between the electrodes.

本発明は、高電圧の陽極電圧が印加される陽極
電極と、陽極電圧より低い集束電圧が印加される
集束電極とを交互に配設して主集束電子レンズを
形成する陰極線管電子銃電極構体において、両側
に対向集束電極が配置された陽極電極と集束電極
との相互の対向面間隔は、片側にのみ対向集束電
極が配置された陽極電極と集束電極との相互の対
向面間隔より大きく設定されていることを特徴と
する。
The present invention provides a cathode ray tube electron gun electrode structure in which an anode electrode to which a high voltage anode voltage is applied and a focusing electrode to which a focusing voltage lower than the anode voltage is arranged alternately to form a main focusing electron lens. In this case, the distance between opposing surfaces of the anode electrode and the focusing electrode in which opposing focusing electrodes are arranged on both sides is set to be larger than the distance between the opposing surfaces of the anode electrode and the focusing electrode in which opposing focusing electrodes are arranged only on one side. It is characterized by being

以下図面を参照してこの発明の一実施例を詳細
に説明する。第4図は本発明を示す電子銃電極構
体の側面図であり、説明を簡略にするため第1〜
第3図の従来例と同一のものには同一符号を付け
てある。
An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 4 is a side view of the electron gun electrode structure showing the present invention, and for the sake of simplicity, the first to
Components that are the same as those in the conventional example shown in FIG. 3 are given the same reference numerals.

電子銃電極構体2は同一平面内に互に絶縁され
て等間隔距離を保つて一列に配列された陰極構体
10と、これに対向して電子ビーム進行方向に順
次配置される電気的に共通な制御電極であるG1
電極11、及び陰極より射出された熱電子ビーム
の加速電極であるG2電極12、電気的、構造的
に共通で各電子ビーム通路には実質的に独立した
電子レンズを形成する一体化電極からなる第1集
束電極であるG3電極23、第1陽極電極である
G4電極24、第2集束電極であるG5電極25、
第2陽極電極であるG6電極26で従来と同様に
構成されている。各電極は絶縁物支持杆19への
埋設部の形成された支持子18を持ち、各支持子
18の埋設部を二本の絶縁物支持杆19へ埋込ん
で融着することにより各電極間隔が所定寸法に保
持固定されている。従来と同様にG4電極24と
G6電極26は図示されていないが給電線で同電
位とされ、20〜30KV程度の高電圧の陽極電圧が
供給され、G3電極23とG5電極25は給電線に
より同電位とされ陽極電圧の20〜40%程度の集束
電圧が供給される。
The electron gun electrode assembly 2 includes cathode assemblies 10 which are insulated from each other and arranged in a line at equal distances in the same plane, and electrically common cathode assemblies 10 which are arranged in sequence in the electron beam traveling direction in opposition to the cathode assemblies 10. G1, the control electrode
The electrode 11 and the G2 electrode 12, which is an accelerating electrode for the thermionic beam emitted from the cathode, are electrically and structurally common, and each electron beam path is composed of an integrated electrode that forms a substantially independent electron lens. G3 electrode 23 is the first focusing electrode, and the first anode electrode
G4 electrode 24, G5 electrode 25 which is a second focusing electrode,
It is constructed in the same manner as the conventional one with a G6 electrode 26 which is a second anode electrode. Each electrode has a supporter 18 in which a part embedded in the insulator support rod 19 is formed, and the buried part of each supporter 18 is embedded in two insulator support rods 19 and fused, so that each electrode is spaced apart. is held and fixed at a predetermined size. As before, with G4 electrode 24
Although not shown, the G6 electrode 26 is made to have the same potential through a power supply line, and is supplied with a high anode voltage of about 20 to 30 KV. A focusing voltage of ~40% is provided.

然るにG3電極23、G4電極24、G5電極25
及びG6電極26の軸方向の全長、電極構造は従
来と全く同様であるが、G3電極23とG4電極2
4、G4電極24とG5電極25及びG5電極25と
G6電極26の各電極相互間隔を夫々b1,b2,b3
とし、対応する従来の電子銃電極構体1の電極間
隔をa1=a2=a3=aとすると b1=b2a、b3<b2=b1 となる様に電極相互間隔が設定されている。
However, G3 electrode 23, G4 electrode 24, G5 electrode 25
The total axial length and electrode structure of the G6 electrode 26 are completely the same as before, but the G3 electrode 23 and the G4 electrode 2
4. G4 electrode 24, G5 electrode 25, and G5 electrode 25
The distance between each electrode of the G6 electrode 26 is b 1 , b 2 , b 3 , respectively.
If the electrode spacing of the corresponding conventional electron gun electrode assembly 1 is a 1 = a 2 = a 3 = a, then the electrode spacing is set so that b 1 = b 2 a, b 3 < b 2 = b 1 . It is set.

即ち高電圧処理時に接地電位にされるG3電極
23、G5電極25に両側からはさまる高電位電
極となるG4電極24に対向する電極間隔b1,b2
を従来の対応する電極間隔と等しいか或はそれ以
上とし、接地電位にされるG5電極25と片側だ
け対向する高電位電極であるG6電極26との電
極間隔b3を電極間隔b1,b2より小さく設定する。
但し電極相互間隔b1,b2は余り大きいと外部電界
の侵入の影響を受け、電子ビーム通過孔中の電子
ビーム径路を不所望に曲げてしまうため、この影
響を受けない大きさに選定し、b3は余り小さいと
電極相互間の耐電圧特性を劣化させるため、これ
を劣化させることのない大きさに選定されてい
る。
That is, the electrode spacing b 1 , b 2 facing the G3 electrode 23, which is set to the ground potential during high voltage processing, and the G4 electrode 24, which is a high potential electrode that is sandwiched from both sides by the G5 electrode 25.
is equal to or larger than the corresponding conventional electrode spacing, and the electrode spacing b 3 between the G5 electrode 25, which is at ground potential, and the G6 electrode 26, which is a high potential electrode facing only one side, is the electrode spacing b 1 , b Set smaller than 2 .
However, if the inter-electrode spacings b 1 and b 2 are too large, they will be affected by the penetration of external electric fields and undesirably bend the electron beam path in the electron beam passage hole, so they should be selected to a size that will not be affected by this. , b3 deteriorates the withstand voltage characteristics between the electrodes if they are too small, so they are selected to a size that does not cause this deterioration.

上述した様に本発明の実施例によれば、高電圧
処理時に接地電位にされるG3電極23とG5電極
25の二つの電極に両面からはさまれる高電位に
されるG4電極24はその対向電極間隔b1,b2
接地電位にされるG5電極25に片面だけ対向す
る高電位にされるG6電極26との対向電極間隔
b3より大きく設定されているため、G3電極23
とG4電極24及びG4電極24とG5電極25間の
電界強度を、G5電極25とG6電極26間の電界
強度より弱く出来る。従がつて強電界による冷陰
極放出作用によるG4電極24からG3電極23、
G5電極25へ流入する冷陰極放出電流はG6電極
26からG5電極25へ流入するより小さくなる。
即ちG3電極23、G5電極25から放出されG4電
極24表面に激突する電子の量及びその運動エネ
ルギーの夫々はG5電極25から放出されG6電極
26表面に激突する電子の量及び運動エネルギー
より小さくなるため、G4電極24の熱容量がG6
電極26と比べて著しく小さくても、高電圧処理
電圧を上昇させることによりG4電極24が異常
に加熱されることはなく、従がつて高電圧処理条
件を全ての電極間で一致出来るため、その耐電圧
品位は均一となり、更に高電圧処理電圧を高く出
来るため電極間の耐電圧特性は著しく向上する。
As described above, according to the embodiment of the present invention, the G4 electrode 24, which is held at a high potential and is sandwiched from both sides by the two electrodes, the G3 electrode 23 and the G5 electrode 25, which are held at the ground potential during high voltage processing, is placed at the opposite side. The electrode spacing b 1 , b 2 is the opposing electrode spacing between the G5 electrode 25, which is set to ground potential, and the G6 electrode 26, which is set to high potential and faces only on one side.
b Since it is set larger than 3 , the G3 electrode 23
The electric field strength between the G4 electrode 24 and the G5 electrode 25 can be made weaker than the electric field strength between the G5 electrode 25 and the G6 electrode 26. Therefore, the G4 electrode 24 to the G3 electrode 23 due to the cold cathode emission effect due to the strong electric field,
The cold cathode emission current flowing into the G5 electrode 25 is smaller than that flowing into the G5 electrode 25 from the G6 electrode 26.
That is, the amount and kinetic energy of electrons emitted from the G3 electrode 23 and G5 electrode 25 and colliding with the surface of the G4 electrode 24 are smaller than the amount and kinetic energy of electrons emitted from the G5 electrode 25 and colliding with the surface of the G6 electrode 26. Therefore, the heat capacity of G4 electrode 24 is G6
Even if it is significantly smaller than the electrode 26, the G4 electrode 24 will not be heated abnormally by increasing the high voltage processing voltage, and therefore the high voltage processing conditions can be matched among all electrodes. The withstand voltage quality becomes uniform, and since the high voltage processing voltage can be further increased, the withstand voltage characteristics between the electrodes are significantly improved.

以上の説明では、主電子レンズ電極が4個から
なる電子銃電極構体について説明したが、これ以
上の電極構成であつて、高電圧の陽極電圧と中高
電圧の集束電圧が交互に印加される電子銃電極構
体にも本願が適用出来ることはいうまでもない。
In the above explanation, an electron gun electrode structure consisting of four main electron lens electrodes has been described. It goes without saying that the present application can also be applied to gun electrode structures.

又、上述の説明では、一体化電極を備えたイン
ライン型電子銃電極構体について説明したが、デ
ルタ型電子銃、或いは単電子銃電極構体にも本願
が適用出来ることはいうまでもない。
Further, in the above description, an in-line type electron gun electrode structure including an integrated electrode has been described, but it goes without saying that the present application can also be applied to a delta type electron gun or a single electron gun electrode structure.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図は従来の多段集束型電子レンズ
を備えたインライン型電子銃電極構体の夫々正面
図、側面図、第3図は第1図に示すA−A′断面
図、第4図は本発明の一実施例を示す多段集束型
電子レンズを備えたインライン型電子銃電極構体
の側面図を示す。 10……陰極構体、11……G1電極、12…
…G2電極、13-1,13-2,23-1,23-2……
G3電極、14-1,14-2,24……G4電極、1
-1,15-2,25……G5電極、16,26…
…G6電極、18……電極支持子、19……絶縁
物支持杆。
1 and 2 are a front view and a side view, respectively, of an in-line electron gun electrode structure equipped with a conventional multi-stage focusing electron lens, and FIG. The figure shows a side view of an in-line electron gun electrode structure equipped with a multi-stage focusing electron lens, showing one embodiment of the present invention. 10... Cathode structure, 11... G1 electrode, 12...
...G2 electrode, 13 -1 , 13 -2 , 23 -1 , 23 -2 ...
G3 electrode, 14 -1 , 14 -2 , 24...G4 electrode, 1
5 -1 , 15 -2 , 25...G5 electrode, 16, 26...
...G6 electrode, 18... electrode supporter, 19... insulator support rod.

Claims (1)

【特許請求の範囲】[Claims] 1 高電圧の陽極電圧が印加される陽極電極と、
陽極電圧より低い集束電圧が印加される集束電極
とを交互に配設して主集束電子レンズを形成する
陰極線管電子銃電極構体において、両側に対向集
束電極が配置された陽極電極と集束電極との相互
の対向面間隔は、片側にのみ対向集束電極が配置
された陽極電極と集束電極との相互の対向面間隔
より大きく設定されていることを特徴とする陰極
線管電子銃電極構体。
1 an anode electrode to which a high anode voltage is applied;
In a cathode ray tube electron gun electrode structure in which a main focusing electron lens is formed by alternately arranging focusing electrodes to which a focusing voltage lower than an anode voltage is applied, an anode electrode and a focusing electrode with opposing focusing electrodes arranged on both sides. A cathode ray tube electron gun electrode assembly characterized in that a distance between mutually facing surfaces of the anode electrode and a focusing electrode is set to be larger than a distance between mutually facing surfaces of an anode electrode and a focusing electrode in which a facing focusing electrode is arranged only on one side.
JP41980A 1980-01-07 1980-01-07 Electron gun electrode frame for cathode-ray tube Granted JPS5697948A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP41980A JPS5697948A (en) 1980-01-07 1980-01-07 Electron gun electrode frame for cathode-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP41980A JPS5697948A (en) 1980-01-07 1980-01-07 Electron gun electrode frame for cathode-ray tube

Publications (2)

Publication Number Publication Date
JPS5697948A JPS5697948A (en) 1981-08-07
JPH0143423B2 true JPH0143423B2 (en) 1989-09-20

Family

ID=11473274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41980A Granted JPS5697948A (en) 1980-01-07 1980-01-07 Electron gun electrode frame for cathode-ray tube

Country Status (1)

Country Link
JP (1) JPS5697948A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59148245A (en) * 1983-02-15 1984-08-24 Nec Corp Electron gun electrode structure
FR2652678B1 (en) * 1989-09-29 1996-05-15 Thomson Tubes Electroniques REDUCED CAPACITY ELECTRON CANON FOR CATHODE RAY TUBE.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5396756A (en) * 1977-02-04 1978-08-24 Matsushita Electronics Corp Picture tube unit

Also Published As

Publication number Publication date
JPS5697948A (en) 1981-08-07

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