JPH0156520B2 - - Google Patents
Info
- Publication number
- JPH0156520B2 JPH0156520B2 JP55044828A JP4482880A JPH0156520B2 JP H0156520 B2 JPH0156520 B2 JP H0156520B2 JP 55044828 A JP55044828 A JP 55044828A JP 4482880 A JP4482880 A JP 4482880A JP H0156520 B2 JPH0156520 B2 JP H0156520B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- grid
- filament
- power supply
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- X-Ray Techniques (AREA)
Description
【発明の詳細な説明】
本発明は種々な分析装置に用いられるX線発生
装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an X-ray generator used in various analytical devices.
X線発生装置はアノードと陰極フイラメントよ
りなつており、アノードは陰極フイラメント材料
の蒸着或はX線発生装置内の残溜ガスの付着によ
つて使用中に次第に表面が汚染されX線出力が低
下して来る。X線出力の低下はX線を用いる分析
装置の感度低下となつて表れる。X線発生装置が
開放管であれば分析装置を分解してX線発生装置
のアノード表面の清浄化は可能であるが実際上、
そのような作業は甚だ繁雑である。 The X-ray generator consists of an anode and a cathode filament, and the surface of the anode gradually becomes contaminated during use due to deposition of cathode filament material or adhesion of residual gas inside the X-ray generator, resulting in a decrease in X-ray output. I'll come. A decrease in X-ray output appears as a decrease in the sensitivity of an analyzer that uses X-rays. If the X-ray generator is an open tube, it is possible to disassemble the analyzer and clean the anode surface of the X-ray generator, but in practice,
Such work is extremely complicated.
従つて本発明はX線を用いる分析装置で、分析
装置を分解してX線発生装置を取出すようなこと
をしなくても、X線発生装置を分析装置に取付け
たまゝ外部からの操作のみによつてX線発生装置
のアノードの浄化ができるようにしたX線発生装
置を得ることを目的としてなされた。 Therefore, the present invention is an analyzer that uses X-rays, and the X-ray generator can be operated only from the outside while it is attached to the analyzer, without having to disassemble the analyzer and take out the X-ray generator. The purpose of this invention was to obtain an X-ray generator in which the anode of the X-ray generator can be purified by the method.
本発明は陰極フイラメントの周囲にグリツドを
設け、切換えによつてアノードには陰極フイラメ
ントに対し負高圧及び正高圧の何れをも印加でき
るようにし、グリツドには陰極フイラメントに対
し正電圧を印加できるようにし、装置内にはイオ
ン生成用のガスを導入出来るようにしアノードを
イオン衝撃によつて清浄化し得るようにしたX線
発生装置を提供するものである。以下実施例によ
つて本発明を説明する。 In the present invention, a grid is provided around the cathode filament, and by switching, the anode can be applied with either a negative high voltage or a positive high voltage, and the grid can be applied with a positive voltage to the cathode filament. The present invention provides an X-ray generating device in which an ion generating gas can be introduced into the device and the anode can be cleaned by ion bombardment. The present invention will be explained below with reference to Examples.
図は本発明をX線光電子分析装置に適用した実
施例を示す。1は分析装置の本体真空容器で排気
系2が接続されている。本体1内で点線で囲んだ
部分3がX線発生装置である。点線はX線発生装
置全体を指示するための図面上の便宜手段で具体
的に存在するものではない。X線発生装置はアノ
ードAと陰極フイラメントFとウエネルト電極W
とフイルタ板S、それに陰極フイラメントFを囲
んで設けられたグリツドG及びリペラプレートR
よりなつている。こゝでグリツドGとリペラプレ
ートRとは本発明に特有のものである。4は試料
でアノードAから放射されるX線に照射される。
X線照射によつて試料4から放出された光電子は
電子エネルギー分析器5に入射し、運動エネルギ
ーによつて選別されて検出器6に入射し検出され
る。7は検出器6の出力をエネルギーを横軸にと
つて記録する記録計である。9は本体1内にイオ
ン化用ガスを導入する管で、10は管9に設けた
バルブである。 The figure shows an embodiment in which the present invention is applied to an X-ray photoelectron analyzer. Reference numeral 1 denotes a main vacuum vessel of the analyzer, to which an exhaust system 2 is connected. A portion 3 surrounded by a dotted line within the main body 1 is an X-ray generator. The dotted line is a convenient means on the drawing to indicate the entire X-ray generator and does not specifically exist. The X-ray generator consists of an anode A, a cathode filament F, and a Wehnelt electrode W.
and a filter plate S, and a grid G and a repeller plate R provided surrounding the cathode filament F.
It's getting more familiar. Here, the grid G and the repeller plate R are unique to the present invention. A sample 4 is irradiated with X-rays emitted from anode A.
Photoelectrons emitted from the sample 4 by X-ray irradiation enter an electron energy analyzer 5, are sorted by kinetic energy, enter a detector 6, and are detected. 7 is a recorder that records the output of the detector 6 with energy on the horizontal axis. 9 is a tube for introducing ionizing gas into the main body 1, and 10 is a valve provided on the tube 9.
8はX線発生装置の電源装置でX線発生用高圧
電源Pxと陰極フイラメントFの加熱用電源Pfと
グリツドG用電源Pgとよりなる。X線発生用高
圧電源Pxは正端子aと負端子bを有し、正端子
は正の0〜数十KVの電圧を出力し、負端子は負
の0〜数十KVの電圧を出力する。これらの高電
圧は切換スイツチSw1によつて正負何れかがア
ノードAに印加されるようになつている。グリツ
ド用電源Pgは0〜数百Vの正の電圧を発生し、
切換スイツチSW2を接点c側に接続することに
グリツドGにその電圧が印加される。/スイツチ
Sw1,Sw2は連動させてあり、Sw1を端子a
に接触させたときSw2は接点d側に接しSw1を
端子bに接触させたときSw2は接点c側に接す
る。X線を発生させる場合はスイツチSW1を端
子a側に切換えスイツチSW2を接点d側にす
る。このときアノードAには正の高電圧が印加さ
れフイラメントFから放射された電子は大体図示
eの軌跡を画いてアノードAに衝突する。この実
施例では今の場合グリツドGは高抵抗rを通して
アースされており、フイラメントFから出た熱電
子が付着して負電位になりそれ自身ウエネルト電
極の作用を呈する。 Reference numeral 8 denotes a power supply device for the X-ray generator, which includes a high-voltage power supply Px for generating X-rays, a power supply Pf for heating the cathode filament F, and a power supply Pg for the grid G. The high voltage power supply Px for generating X-rays has a positive terminal a and a negative terminal b, the positive terminal outputs a positive voltage of 0 to several tens of KV, and the negative terminal outputs a negative voltage of 0 to several tens of KV. . Either the positive or negative voltage of these high voltages is applied to the anode A by a changeover switch Sw1. The grid power supply Pg generates a positive voltage of 0 to several hundred V,
The voltage is applied to the grid G by connecting the changeover switch SW2 to the contact c side. /Switch
Sw1 and Sw2 are linked, and Sw1 is connected to terminal a.
When Sw1 is brought into contact with terminal b, Sw2 is brought into contact with the contact d side, and when Sw1 is brought into contact with terminal b, Sw2 is brought into contact with the contact c side. When generating X-rays, switch SW1 is set to the terminal a side and switch SW2 is set to the contact d side. At this time, a positive high voltage is applied to the anode A, and the electrons emitted from the filament F collide with the anode A, following a trajectory approximately as shown in the figure e. In this embodiment, the grid G is currently grounded through a high resistance r, and the hot electrons emitted from the filament F adhere thereto, resulting in a negative potential, which itself acts as a Wehnelt electrode.
アノードの清浄化を行う場合はスイツチSw1
を端子b側に切換え、スイツチSw2を接点c側
にする。このようにするとグリツドGは数100V
の正電位になり、アノードAは負高電位になる。
フイラメントFはウエネルト電極W、リペラプレ
ートRと共に0電位(フイラメントはウエネルト
やリペラより平均して2〜3V高い)であり、フ
イラメントFから放出された熱電子はグリツドG
に引かれて加速され、一部はグリツドGに吸収さ
れるが大部分はグリツドGを通過し、ウエネルト
W及びリペラR付近に至り反射される。かくして
電子はフイラメントFとウエネルトW及びリペラ
Rとの間で往復振動を行いながら次第にグリツド
Gに流入して行く。他方アノード清浄化の場合は
バルブ10を開いてイオン化用希ガスを本体1内
に導入する(排気系2は作動させたまゝにしてお
く)。導入されたガス分子はフイラメントFとウ
エネルトW及びリペラRとの間で振動している電
子と衝突しイオン化される。この場合電子が往復
運動を行つているので、導入ガスの本体1内の圧
力が低くてもイオン化される機会が増加してい
る。イオンの発生はグリツドGの周辺で多く、グ
リツドGがイオン光学的なイオン源となる。導入
ガスの圧力が余り高いと、イオン発生が過多とな
り、フイラメントFの周囲に鞘を作るので却つて
好ましくない。導入ガスの本体1内の適当な圧力
は10-5torr位である。上述したようにしてイオン
発生源はイオン光学的にはグリツドGと見なせ
る。このことは次のような意味を持つている。X
線発生の際グリツドGは電子の付着によつて負電
位になつており、フイラメントFから或る初速度
分布を持つて飛出した電子はグリツドGの周辺に
溜つて空間電荷を形成し、そこが電位の谷になつ
て電子光学的な電子線源となつている。従つてX
線発生時の電子線源とアノード清浄化の場合のイ
オン源の位置が同じになる。そこでX線発生時と
絶対値が同じて負極性の電圧をアノードAに印加
すると、イオンは電子と略同し軌道を画きイオン
はX線発生時の電子と同じ位置でアノードと衝突
することになる。アノードの清浄化はイオン衝撃
によるアノード表面のエツチング作用によつてい
るのであるから、実際にX線が発生している部位
を選択的にイオンエツチングできることによつて
アノードの清浄化が能率的に行えることになる。 When cleaning the anode, switch Sw1
switch to the terminal b side, and switch Sw2 to the contact c side. In this way, the grid G will be several 100V
becomes a positive potential, and the anode A becomes a negative high potential.
The filament F, together with the Wehnelt electrode W and the repeller plate R, is at 0 potential (the filament is 2 to 3 V higher on average than the Wehnelt and repeller), and the thermoelectrons emitted from the filament F are at the grid G.
Some of it is absorbed by grid G, but most of it passes through grid G, reaches near Wehnelt W and repeller R, and is reflected. In this way, the electrons gradually flow into the grid G while reciprocating vibration between the filament F, Wehnelt W, and repeller R. On the other hand, in the case of anode cleaning, the valve 10 is opened to introduce the ionizing rare gas into the main body 1 (the exhaust system 2 is left in operation). The introduced gas molecules collide with electrons vibrating between the filament F, Wehnelt W, and repeller R, and are ionized. In this case, since the electrons are reciprocating, there is an increased chance of ionization even if the pressure within the main body 1 of the introduced gas is low. Most ions are generated around grid G, and grid G serves as an ion optical ion source. If the pressure of the introduced gas is too high, excessive ions will be generated and a sheath will be formed around the filament F, which is rather undesirable. A suitable pressure within the body 1 of the introduced gas is on the order of 10 -5 torr. As described above, the ion source can be regarded as a grid G from an ion optical perspective. This has the following meaning. X
When a line is generated, the grid G has a negative potential due to the attachment of electrons, and the electrons that fly out from the filament F with a certain initial velocity distribution accumulate around the grid G, forming a space charge there. becomes a potential valley and becomes an electro-optical electron beam source. Therefore, X
The positions of the electron beam source during beam generation and the ion source during anode cleaning are the same. Therefore, when a voltage with the same absolute value and negative polarity as when X-rays are generated is applied to anode A, the ions follow approximately the same orbit as the electrons, and the ions collide with the anode at the same position as the electrons when X-rays are generated. Become. Cleaning of the anode relies on the etching action of the anode surface caused by ion bombardment, so by selectively etching the areas where X-rays are actually generated, the anode can be cleaned efficiently. It turns out.
本発明X線発生装置は構造上は陰極の周囲にグ
リツドを設けて正電圧を印加できるようにし、ア
ノードに正負の高圧を印加できるようにすると共
に本体真空容器にイオン化用ガスを導入できるよ
うにしたもので、従来のX線発生装置に比し構造
上複雑化する程度は少なく、スイツチ切換えとバ
ルブ操作だけでアノードの清浄化が行えるので、
装置を一々分解してアノードを研磨すると云つた
方法に比し清浄化作業は著しく簡略化、能率化さ
れる。 Structurally, the X-ray generator of the present invention has a grid around the cathode so that a positive voltage can be applied, and high positive and negative voltages can be applied to the anode, and ionizing gas can be introduced into the main vacuum container. The structure is less complicated than conventional X-ray generators, and the anode can be cleaned by simply switching a switch and operating a valve.
Compared to the method of disassembling the device one by one and polishing the anode, the cleaning work is significantly simplified and streamlined.
図面は本発明の一実施例装置の縦断側面図であ
る。
1…本体真空容器、2…排気系、3…X線源、
4…試料、5…電子エネルギー分析器、6…検出
器、7…記録計、8…X線発生装置電源、9…イ
オン化用ガス導入管、A…アノード、F…陰極フ
イラメント、S…フイルタ、W…ウエネルト電
極、R…リペラプレート、G…グリツド。
The drawing is a longitudinal sectional side view of an apparatus according to an embodiment of the present invention. 1...Main vacuum vessel, 2...Exhaust system, 3...X-ray source,
4... Sample, 5... Electron energy analyzer, 6... Detector, 7... Recorder, 8... X-ray generator power supply, 9... Ionization gas introduction tube, A... Anode, F... Cathode filament, S... Filter, W...Wehnelt electrode, R...repeller plate, G...grid.
Claims (1)
オン化用ガスを導入し得る管を設け、上記本体内
にアノードと陰極フイラメントと、アノードと陰
極フイラメントとの間に設けたウエネルト電極
と、陰極フイラメントとウエネルト電極との間に
設けたグリツドとによつてX線発生部を構成し、
上記アノードに正負の電圧を任意に切換えて印加
し得る高圧電源と、フイラメント電源と、アノー
ドに負高圧を印加したときオンとなるスイツチを
介して上記グリツドに正電圧を印加する電源を設
けたX線発生装置。1 A tube capable of optionally introducing ionizing gas is provided in the main body vacuum container connected to the exhaust system, and an anode and a cathode filament are provided in the main body, a Wehnelt electrode provided between the anode and the cathode filament, and a cathode filament. and a grid provided between the Wehnelt electrode and the X-ray generating section,
A high-voltage power supply capable of arbitrarily switching and applying positive and negative voltages to the anode, a filament power supply, and a power supply applying a positive voltage to the grid via a switch that is turned on when negative high voltage is applied to the anode. Line generator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4482880A JPS56141157A (en) | 1980-04-04 | 1980-04-04 | X-ray generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4482880A JPS56141157A (en) | 1980-04-04 | 1980-04-04 | X-ray generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56141157A JPS56141157A (en) | 1981-11-04 |
| JPH0156520B2 true JPH0156520B2 (en) | 1989-11-30 |
Family
ID=12702309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4482880A Granted JPS56141157A (en) | 1980-04-04 | 1980-04-04 | X-ray generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56141157A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6558908B2 (en) * | 2015-02-09 | 2019-08-14 | 株式会社大阪真空機器製作所 | Target mount for X-ray generator and X-ray generator provided with the same |
-
1980
- 1980-04-04 JP JP4482880A patent/JPS56141157A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56141157A (en) | 1981-11-04 |
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