JPH0159112B2 - - Google Patents

Info

Publication number
JPH0159112B2
JPH0159112B2 JP56113960A JP11396081A JPH0159112B2 JP H0159112 B2 JPH0159112 B2 JP H0159112B2 JP 56113960 A JP56113960 A JP 56113960A JP 11396081 A JP11396081 A JP 11396081A JP H0159112 B2 JPH0159112 B2 JP H0159112B2
Authority
JP
Japan
Prior art keywords
heating element
head
substrate
multilayer wiring
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56113960A
Other languages
Japanese (ja)
Other versions
JPS5814779A (en
Inventor
Masaji Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56113960A priority Critical patent/JPS5814779A/en
Publication of JPS5814779A publication Critical patent/JPS5814779A/en
Publication of JPH0159112B2 publication Critical patent/JPH0159112B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors

Landscapes

  • Electronic Switches (AREA)

Description

【発明の詳細な説明】 本発明は、感熱記録用サーマルヘツドに関する
ものであり、特に発熱体を形成する基板と、発熱
体を駆動するための半導体デバイスの多層配線部
を形成する基板とを分離し、これらを一つの基台
に一体化、保持して成る感熱記録用ヘツドの発熱
体基板と基台の接着構成に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thermal head for heat-sensitive recording, and in particular, a substrate forming a heating element and a substrate forming a multilayer wiring section of a semiconductor device for driving the heating element are separated. The present invention relates to an adhesive structure between a heating element substrate and a base of a heat-sensitive recording head in which these are integrated and held on one base.

周知のように、感熱記録方式は、メインテナン
ス・フリーのハード・コピーを得る方式として
種々の分野に応用されている。
As is well known, the thermal recording method is applied in various fields as a method for obtaining maintenance-free hard copies.

これらの各種サーマルヘツドの中でも、多数の
発熱体を一列に並べたものは、フアクシミリに非
常に多く用いられるようになつてきたが、この種
のヘツドの非常に重要な問題は、ヘツドの低価格
である。
Among these various types of thermal heads, those with a large number of heating elements arranged in a row have become very popular in facsimile machines, but a very important problem with these types of heads is the low price of the heads. It is.

多数の発熱体を一列に並べたサーマルヘツドに
於ては、発熱体の駆動を便ならしめるために、発
熱体と直列に各種の半導体デバイス(半導体装
置)が接続される。現在、この半導体デバイスと
してはダイオード、サイリスタ或いはシフト、レ
ジスタ、ラツチおよびトランジスタから成るIC
等が用いられている。これらのいずれの半導体デ
バイスに於ても半導体デバイスの発熱体と接続さ
れる端子以外の端子に多数配線が必要とされる。
In a thermal head in which a large number of heating elements are arranged in a line, various semiconductor devices (semiconductor devices) are connected in series with the heating elements to facilitate driving of the heating elements. Currently, these semiconductor devices include ICs consisting of diodes, thyristors or shifters, registers, latches, and transistors.
etc. are used. In any of these semiconductor devices, multiple wirings are required for terminals other than the terminals connected to the heating element of the semiconductor device.

半導体デバイスとして、ダイオードを用いる場
合、いわゆる共通ダイオード方式の場合には、ダ
イオードの一端が共通接続されるので、この場合
には、発熱体のダイオードと接続されない端子例
に於て多層配線が必要となる。
When using diodes as semiconductor devices, in the case of the so-called common diode method, one end of the diodes is commonly connected, so in this case, multilayer wiring is required for terminals that are not connected to the diode of the heating element. Become.

このような各種サーマルヘツドの低価格化のた
めには、種々の観点からアプローチが可能である
が、発熱体を従来の薄膜形成技術で形成する、い
わゆる薄膜型サーマルヘツドの場合には、発熱体
形成用基板と多層配線用基板とを別々に形成し、
半導体デバイスの実装の際に、この2つの基板を
サーマルヘツド基台に一体化保持する方式により
発熱体基板の形成コストを1/2以下にすることが
提案されている。
In order to reduce the price of these various thermal heads, approaches can be taken from various viewpoints, but in the case of so-called thin-film thermal heads, in which the heating element is formed using conventional thin film formation technology, A formation substrate and a multilayer wiring substrate are formed separately,
It has been proposed to reduce the cost of forming a heating element substrate by half or less by integrating and holding these two substrates on a thermal head base when semiconductor devices are mounted.

このような構成の感熱記録用サーマルヘツドに
於ては、多層配線用基板形成と、発熱体基板と多
層配線用基板の一体化保持はヘツド製造コストの
上昇要因となる。
In a thermal head for heat-sensitive recording having such a configuration, the formation of a multilayer wiring board and the integral holding of the heating element board and the multilayer wiring board become factors that increase the manufacturing cost of the head.

しかし、発熱体と多層配線部を一つの基板上に
形成する方式に対して、上軌の方式は、発熱体基
板寸法が1/2以下になるので、発熱体形成プロセ
ス即ち、発熱体、電極の薄膜形成、発熱体と電極
のパターン形成、耐摩耗層の形成のための各製造
装置能力が2倍以上になることの効果は、ヘツド
全体としてのコスト低減効果が非常に大きい。
However, compared to the method in which the heating element and multilayer wiring are formed on one substrate, the upper rail method reduces the heating element substrate size by half or less, so the heating element formation process, that is, the heating element, electrode The effect of more than doubling the capacity of each of the manufacturing equipment for thin film formation, heating element and electrode pattern formation, and wear-resistant layer formation has a significant cost reduction effect for the head as a whole.

本発明は、上記の発熱体基板と多層配線用基板
とを分離して形成した後、この2つの基板を基台
に接着する時に発生する問題を合理的に処理する
発熱体基板と基台の接着構成に関するものであ
る。
The present invention provides a combination of a heating element substrate and a base that rationally solves the problem that occurs when the above-mentioned heating element substrate and multilayer wiring substrate are formed separately and then bonded to the base. This relates to adhesive configurations.

本発明の理解を容易するため、以下、従来の感
熱記録用サーマルヘツドの問題点を図面に従つて
説明する。
In order to facilitate understanding of the present invention, problems with conventional thermal heads for heat-sensitive recording will be explained below with reference to the drawings.

第1図は、半導体デバイスとして、分離型ダイ
オードを用いる場合の発熱体とダイオードの結線
図であり、1は発熱体、2はダイオード、3は多
層配線部である。
FIG. 1 is a wiring diagram of a heating element and a diode when a separate diode is used as a semiconductor device, where 1 is a heating element, 2 is a diode, and 3 is a multilayer wiring section.

第2図に第1図に対応するヘツドの構成例を示
す。
FIG. 2 shows an example of the configuration of the head corresponding to FIG. 1.

第2図に於て、4は発熱体1と共通電極6a、
個別電極6bを形成する基板、5は多層配線用基
板であり、多層配線用基板5の上には、多層配線
用導体9が形成されている。一般に、発熱体1の
上には耐摩耗層を形成するが、第2図では、この
耐摩耗層は省略した。2aは複数個のダイオード
(第2図の場合、5個)を形成した半導体チツプ
であり、各ダイオードには可撓性の電気絶縁性フ
イルム7a,7bにより保持されている。直線状
およびL型状リード8a,8bがリード付けされ
ている。
In FIG. 2, 4 indicates the heating element 1 and the common electrode 6a,
The substrate 5 on which the individual electrodes 6b are formed is a multilayer wiring substrate, and on the multilayer wiring substrate 5, a multilayer wiring conductor 9 is formed. Generally, a wear-resistant layer is formed on the heating element 1, but this wear-resistant layer is omitted in FIG. 2. 2a is a semiconductor chip on which a plurality of diodes (five in the case of FIG. 2) are formed, and each diode is supported by flexible electrically insulating films 7a and 7b. Straight and L-shaped leads 8a and 8b are attached.

上述した可撓性フイルム7a,7bに保持され
るリード8a,8bに半導体チツプ2aをリード
付けする方式は、フイルム・キヤリア方式として
知られる方法により行なわれる。半導体チツプに
接続されている直線状およびL型リードの他端を
各々発熱体の個別電極6bおよび多層配線用導体
9に接続することにより、第1図に対応するサー
マルヘツドが形成される。
The semiconductor chip 2a is attached to the leads 8a, 8b held by the flexible films 7a, 7b as described above by a method known as a film carrier method. A thermal head corresponding to FIG. 1 is formed by connecting the other ends of the straight and L-shaped leads connected to the semiconductor chip to the individual electrodes 6b of the heating element and the multilayer wiring conductor 9, respectively.

但し、発熱体基板4および多層配線用基板5は
ヘツド基台10に一体化した後、この接続を行な
う。発熱体基板は、発熱体に要求される性質から
表面にガラス層を形成したアルミナ基板等が適し
ており、多層配線用基板5には、アルミナ基板よ
り安価なプリント基板等が用いられる。ヘツド基
台10には、ヘツド装置への取付け等を考慮し
て、金属板(鉄板、アルミ板etc)が用いられる。
第2図のヘツドを製造するため、発熱体基板4と
ヘツド基台10を接着する場合において、発熱体
基板上の発熱体形成面(実際には耐摩耗層表面)
をできる限り完全な平面にする要求(この要求は
記録紙と発熱体との完全な接触を行なうために必
要である)を満たすことは意外にむづかしい。
However, this connection is made after the heating element substrate 4 and the multilayer wiring substrate 5 are integrated into the head base 10. As the heating element substrate, an alumina substrate or the like having a glass layer formed on the surface is suitable because of the properties required of the heating element, and a printed circuit board or the like which is cheaper than the alumina substrate is used as the multilayer wiring board 5. For the head base 10, a metal plate (iron plate, aluminum plate, etc.) is used in consideration of attachment to the head device.
When bonding the heating element substrate 4 and the head base 10 to manufacture the head shown in Fig. 2, the heating element forming surface (actually the wear-resistant layer surface) on the heating element substrate
It is surprisingly difficult to satisfy the requirement that the recording paper be as perfectly flat as possible (this requirement is necessary for perfect contact between the recording paper and the heating element).

従来のサーマルヘツドではこの問題を重要視せ
ずに単に接着するか、または第3図に示すような
方法によりこの目的を達しようとしていた。
Conventional thermal heads have attempted to achieve this objective by simply bonding or by a method as shown in FIG. 3 without attaching importance to this problem.

第3図に於て、13は発熱体基板4と同じアル
ミナ基板である。第3図に示すようにヘツド基台
10の上下面に、発熱体基板4と平面度補償用基
板13を接着すれば、ヘツド基台10と発熱体基
板4の熱膨張係数差に関係なく、接着時、或いは
ヘツド使用中の温度上昇による耐摩耗層表面の平
面度を、感熱記録に問題のない範囲に保ち得る。
しかし、この構成は、実際のヘツド製造時に平面
度補償用基板13を付加するのが面倒であること
或いは、平面度補償用基板13の存在によりヘツ
ドを固定する場合の障害になること等の欠点があ
る。
In FIG. 3, 13 is the same alumina substrate as the heating element substrate 4. As shown in FIG. 3, if the heating element substrate 4 and the flatness compensation substrate 13 are bonded to the upper and lower surfaces of the head base 10, regardless of the difference in thermal expansion coefficient between the head base 10 and the heating element substrate 4, The flatness of the surface of the abrasion resistant layer due to temperature rise during adhesion or use of the head can be maintained within a range that does not cause problems for thermal recording.
However, this configuration has drawbacks such as the fact that it is troublesome to add the flatness compensation board 13 during actual head manufacture, and the presence of the flatness compensation board 13 becomes an obstacle when fixing the head. There is.

尚、多層配線用基板はプリント基板の如く、発
熱体基板よりも軟かい材料を用いることにより、
発熱体の平面度への影響を小さくすることができ
る。
In addition, by using a softer material than the heating element board for the multilayer wiring board, like a printed circuit board,
The influence on the flatness of the heating element can be reduced.

本発明は、上述したような発熱体基板と多層配
線用基板を分割したサーマルヘツドに於て、この
2つの基板間に接続される半導体素子のリード、
或いは、リード接続部への影響(断線、リードは
づれ等)が少なく、且つ、発熱体基板の平面度を
確保するための発熱体基台とヘツド基台の接着構
成を有する感熱記録用サーマルヘツドを提供する
ものである。
The present invention provides a thermal head that is divided into a heating element board and a multilayer wiring board as described above, and provides semiconductor element leads connected between the two boards.
Alternatively, there is a thermal head for heat-sensitive recording which has a bonding structure between a heating element base and a head base to ensure the flatness of the heating element substrate and less influence on the lead connection part (broken wire, lead separation, etc.). It provides:

すなわち、本発明は、発熱体基板の中央部を硬
化型接着剤で、また周辺部を粘着型接着剤でそれ
ぞれヘツド基台に接着するものである。
That is, in the present invention, the central portion of the heating element substrate is adhered to the head base using a curable adhesive, and the peripheral portion thereof is adhered to the head base using an adhesive adhesive.

以下、本発明の実施例を図面に従つて説明す
る。なお、以下の説明において、従来の感熱記録
用サーマルヘツドと同一箇所には、同一番号を付
している。
Embodiments of the present invention will be described below with reference to the drawings. In the following description, the same numbers are given to the same parts as in the conventional thermal head for heat-sensitive recording.

第4図は、本発明の一実施例による発熱体基板
とヘツド基台の接着構成を示す図であり、既に従
来例で説明したのと同様に、4は発熱体基板、5
は多層配線用基台、10はヘツド基台である。但
し、発熱体基板4および多層配線板上には、発熱
体に接線される半導体デバイスがダイオードの場
合には、第2図に示すような、また他の半導体デ
バイスの場合には、各々のデバイス適した導体パ
ターンが形成されるが、これらの導体パターンは
本発明は直接的に関係がないので、第4図では、
これらを省略している。
FIG. 4 is a diagram showing a bonding structure between a heating element substrate and a head base according to an embodiment of the present invention, in which numeral 4 indicates a heating element substrate, and 5
1 is a multilayer wiring base, and 10 is a head base. However, on the heating element substrate 4 and the multilayer wiring board, if the semiconductor device connected to the heating element is a diode, there is a diode as shown in FIG. 2, and in the case of other semiconductor devices, each device is Suitable conductor patterns are formed, but since these conductor patterns are not directly related to the present invention, in FIG.
These are omitted.

第4図に於て、発熱体基板4、多層配線用基板
5は、ヘツド基台10の表面11,12の部分に
接着保持される。本実施例に於ては、この接着、
特に接着部11を第4図に示すように、2つの部
分11a,11bに分け、この部分に異なる接着
を行なう。即ち、接着部11aには粘着性(非硬
化型)テープを塗布し、接着部11bには硬化性
樹脂を塗布し、発熱体基板4を接着保持する。こ
のような接着構成により、発熱体面の平面度は、
予め平面度が確保されているヘツド基台の接着面
11の平面度にならうようにすることができ、且
つ、従来例に示す第3図におけるような平面度を
確保するための基板13を不要にすることができ
る。
In FIG. 4, a heating element substrate 4 and a multilayer wiring substrate 5 are adhesively held on surfaces 11 and 12 of a head base 10. As shown in FIG. In this example, this adhesion,
In particular, as shown in FIG. 4, the adhesive part 11 is divided into two parts 11a and 11b, and different adhesives are applied to these parts. That is, an adhesive (non-curing type) tape is applied to the adhesive part 11a, a curable resin is applied to the adhesive part 11b, and the heating element substrate 4 is adhesively held. With this adhesive configuration, the flatness of the heating element surface is
The flatness of the substrate 13 can be made to follow the flatness of the bonding surface 11 of the head base whose flatness has been secured in advance, and the flatness of the substrate 13 can be made to ensure the flatness as shown in FIG. 3 in the conventional example. It can be made unnecessary.

発熱体基板のほゞ中央の接着部11bの面積は
発熱体基台4とヘツド基台10の接着時(特に硬
化性樹性による接着時)の熱処理、或いは感熱記
録時の発熱体基板およびヘツド基台の温度上昇等
の温度変化による発熱体平面度の反りが問題にな
らぬような大きさにする。
The area of the adhesive portion 11b at the center of the heating element substrate is determined by heat treatment during adhesion between the heating element base 4 and the head base 10 (particularly when adhering with curable resin), or when the heating element substrate and head are bonded during thermal recording. The size should be such that warping of the flatness of the heating element due to temperature changes such as a rise in the temperature of the base will not be a problem.

これらの温度変化により、発熱体基板と基台の
伸びの差は、接着部11aの部分では、第4図の
xy平面内のずれとなるが、このずれは粘着性接
着剤の中で吸収され、発熱体の平面度は記録に問
題のない範囲に押さえられる。
Due to these temperature changes, the difference in elongation between the heating element substrate and the base is as shown in Fig. 4 at the adhesive part 11a.
Although this is a deviation in the xy plane, this deviation is absorbed by the adhesive, and the flatness of the heating element is kept within a range that does not cause any recording problems.

一方、多層配線用基板5の接着に於ては、プリ
ント基板等を用いることにより、接着面12の全
体を硬化性樹脂により接着を行つても、発熱体の
平面度に与える影響は微小である。若し、多層配
線用基板5として発熱体基板と同じような材料を
用いる場合には、第4図の発熱体基板と同様な接
着により、平面度への影響をさけることができ
る。
On the other hand, when bonding the multilayer wiring board 5, even if the entire bonding surface 12 is bonded with a curable resin by using a printed circuit board, the effect on the flatness of the heating element is minimal. . If the same material as the heating element substrate is used as the multilayer wiring board 5, the effect on flatness can be avoided by adhesion similar to that of the heating element substrate in FIG.

第4図の如き接着構成のヘツドに於て、感熱記
録の際に紙との接触摩耗のために接着面に発生す
るy方向若しくはx、y面内のせん断応力に対し
て、接着部11bの強度を補強するためにストツ
パ14を設けることは有効である。このストツパ
14の形は、実際のヘツドの形状により種々の形
に構成し得る。
In a head with an adhesive structure as shown in FIG. 4, the adhesive part 11b is resistant to shear stress in the y direction or in the x, y plane that is generated on the adhesive surface due to contact abrasion with paper during thermal recording. Providing the stopper 14 is effective for reinforcing the strength. The shape of this stopper 14 can be configured in various shapes depending on the actual shape of the head.

このように実際のヘツドに於ては種々の変形が
あるが、発熱体基板とヘツド基板をほゞ発熱体基
板の中心の硬化性接着剤(例エポキシ系)とその
周辺の粘着性接着剤(例通常粘着テープと呼ばれ
る接着剤)によりヘツド基台に接着し発熱体の平
面度を基台の平面度に等しくすると共に、この平
面度が温度変化しないようにするのが、本発明の
基本である。
Although there are various variations in actual heads, the heating element substrate and the head substrate are generally connected by a hardening adhesive (e.g. epoxy) in the center of the heating element substrate and an adhesive adhesive (e.g. epoxy) around it. The basic idea of the present invention is to make the flatness of the heating element equal to the flatness of the base by adhering it to the head base using an adhesive (usually called adhesive tape), and to prevent this flatness from changing with temperature. be.

以上、説明したように、本発明は発熱体基板と
多層配線用基板を分割して、発熱体と発熱体駆動
用デバイスを一体したサーマルヘツドの発熱体平
面度を確保するために、非常に有用な発熱体基板
とヘツド基台の接着構成を提供するものであり、
更に次のような効果をもつ。
As explained above, the present invention is very useful for separating the heating element substrate and the multilayer wiring board to ensure the flatness of the heating element of a thermal head in which the heating element and the heating element driving device are integrated. This provides an adhesive structure between the heating element board and the head base.
Furthermore, it has the following effects.

(i) ヘツド基台の選択の自由 本発明によれば、発熱体基板とヘツド基台の
熱膨張係数の差が大きい場合にも必要な平面度
を確保することができる。即ち、ヘツド基台と
してAのような安価かつ軽量基板を採用する
ことができ、従つてヘツド全体の軽量化に役立
つ。
(i) Freedom of choice of head base According to the present invention, the necessary flatness can be ensured even when there is a large difference in the coefficient of thermal expansion between the heating element substrate and the head base. That is, an inexpensive and lightweight board like A can be used as the head base, which helps to reduce the weight of the entire head.

これに対して、従来の第3図のような構成に
於て、A基台を用いると、接着剤の強度不足
により基板のハガレを生ずることがある。
On the other hand, if the A base is used in the conventional configuration as shown in FIG. 3, the substrate may peel off due to insufficient strength of the adhesive.

(ii) ヘツド製造プロセスの合理化 実際のサーマルヘツドに於ては、感熱記録中
のヘツド温度上昇の対策として、各種放熱フイ
ン等をつける場合が多い。
(ii) Rationalization of the head manufacturing process In actual thermal heads, various types of heat dissipation fins are often installed as a measure against the rise in head temperature during thermal recording.

この場合、発熱体基板と多層配線用基板を分
割してこの2つの基板を直接、放熱効果を兼用
するヘツド基台に接着すると、半導体デバイス
のリード接続用装置の設計が難かしくなる。
In this case, if the heating element substrate and the multilayer wiring substrate are separated and these two substrates are directly bonded to a head base that also serves as a heat dissipation effect, it becomes difficult to design a device for connecting leads of a semiconductor device.

これに対して、本発明では、一且、第4図の
接着と半導体デバイスをヘツドに実装するため
のリード接続を行なつた後に、各種放熱フイン
を取けることにより上記装置設計が容易にな
る。勿論、発熱体基板と多層配線用基板を分離
しないヘツドでは、放熱フインのついたヘツド
基台に直接発熱体基板を接着するほうが簡単で
ある。しかし、発熱体基板と多層配線用基板を
分離するヘツドでは、半導体装置のリード線接
続のため、発熱体基板と多層配線用基板の接着
位置精度を保ち、旦つ発熱体基板の平面性を保
つことが必要なために、このような放熱フイン
を後からつけるようなヘツドの組立方法が有用
になる場合も多い。
In contrast, in the present invention, the above-mentioned device design is facilitated by being able to remove various heat dissipation fins after the adhesion shown in FIG. 4 and the lead connection for mounting the semiconductor device on the head. . Of course, in the case of a head in which the heat generating board and the multilayer wiring board are not separated, it is easier to directly bond the heat generating board to the head base with heat dissipation fins. However, in the head that separates the heating element board and the multilayer wiring board, in order to connect the lead wires of the semiconductor device, the adhesion position accuracy of the heating element board and the multilayer wiring board is maintained, and the flatness of the heating element board is maintained. Because of this need, it is often useful to assemble the head in such a way that such heat dissipation fins are attached later.

尚、第4図の如き接着構成のヘツドに於ける
半導体デバイスのリード接続の信頼性は、第3
図の場合と殆んど同じであることも実験的に確
保されている。
Furthermore, the reliability of the lead connection of a semiconductor device in a head with an adhesive structure as shown in Fig. 4 is as follows.
It has also been experimentally confirmed that the case is almost the same as the case shown in the figure.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、感熱記録用サーマルヘツドの基本的
な回路図、第2図は同サーマルヘツドの実体的構
成を示す図、第3図は従来の感熱記録用サーマル
ヘツドの構成を示す斜視図、第4図は本発明の一
実施例における感熱記録用サーマルヘツドの分解
斜視図である。 4……発熱体基板、5……多層配線用基台、1
0……ヘツド基台、11,11a,11b、12
……接着部。
FIG. 1 is a basic circuit diagram of a thermal head for heat-sensitive recording, FIG. 2 is a diagram showing the actual structure of the thermal head, and FIG. 3 is a perspective view showing the structure of a conventional thermal head for heat-sensitive recording. FIG. 4 is an exploded perspective view of a thermal head for heat-sensitive recording in one embodiment of the present invention. 4...Heating element board, 5...Multilayer wiring base, 1
0...Head base, 11, 11a, 11b, 12
...Adhesive part.

Claims (1)

【特許請求の範囲】[Claims] 1 発熱抵抗体が形成された発熱体基板と、半導
体装置の多層配線用基板とをヘツド基台に固定し
てなる感熱記録用サーマルヘツドにおいて、前記
発熱体基板の中央部を硬化型接着剤で、またその
周辺を粘着型接着剤でそれぞれヘツド基台に接着
し、フイルム・キヤリア方式により形成された半
導体装置のリードを前記発熱抵抗体と前記多層配
線用基板上の導体に接続したことを特徴とする感
熱記録用サーマルヘツド。
1. In a thermal head for heat-sensitive recording, which is formed by fixing a heating element substrate on which a heating resistor is formed and a multilayer wiring board for a semiconductor device to a head base, the central part of the heating element substrate is fixed with a curable adhesive. , and its periphery is adhered to the head base with adhesive type adhesive, and the leads of the semiconductor device formed by the film carrier method are connected to the heating resistor and the conductor on the multilayer wiring board. A thermal head for heat-sensitive recording.
JP56113960A 1981-07-20 1981-07-20 Thermal head for heat-sensitive recording Granted JPS5814779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56113960A JPS5814779A (en) 1981-07-20 1981-07-20 Thermal head for heat-sensitive recording

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56113960A JPS5814779A (en) 1981-07-20 1981-07-20 Thermal head for heat-sensitive recording

Publications (2)

Publication Number Publication Date
JPS5814779A JPS5814779A (en) 1983-01-27
JPH0159112B2 true JPH0159112B2 (en) 1989-12-14

Family

ID=14625513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56113960A Granted JPS5814779A (en) 1981-07-20 1981-07-20 Thermal head for heat-sensitive recording

Country Status (1)

Country Link
JP (1) JPS5814779A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176555U (en) * 1983-05-13 1984-11-26 ティーディーケイ株式会社 thermal head
JPS605840U (en) * 1983-06-07 1985-01-16 ロ−ム株式会社 thermal printing head
JPS60105150U (en) * 1983-12-22 1985-07-18 ティーディーケイ株式会社 thermal head
JPS60162042U (en) * 1984-04-04 1985-10-28 株式会社リコー thermal head
JP2793230B2 (en) * 1989-03-01 1998-09-03 京セラ株式会社 Thermal head

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133464U (en) * 1980-03-11 1981-10-09
JPS5724272A (en) * 1980-07-18 1982-02-08 Ricoh Co Ltd Thermal head

Also Published As

Publication number Publication date
JPS5814779A (en) 1983-01-27

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