JPH0167733U - - Google Patents
Info
- Publication number
- JPH0167733U JPH0167733U JP1987161356U JP16135687U JPH0167733U JP H0167733 U JPH0167733 U JP H0167733U JP 1987161356 U JP1987161356 U JP 1987161356U JP 16135687 U JP16135687 U JP 16135687U JP H0167733 U JPH0167733 U JP H0167733U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- light
- irradiating
- moving table
- lithography apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 4
- 238000000609 electron-beam lithography Methods 0.000 claims 3
- 239000007787 solid Substances 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Electron Beam Exposure (AREA)
Description
第１図は本案の全体構成図、第２図は電子ビー
ムによるマーク検出方法を示す図、第３図は光に
よるマーク検出方法を示す図である。
１……電子ビーム、２……レンズ、３……偏向
器、４……反射電子検出器、５……光源、６……
イメージセンサ、７……標準マーク、８……ミラ
ー、９……駆動系、１０……ステージ、１１，１
２……レーザ干渉計、１３……ステージ制御系、
１４……コンピユータ、１５……偏向制御系、１
６，１７……マーク検出回路、１８……試料、１
９……マーク。
FIG. 1 is a diagram showing the overall configuration of the present invention, FIG. 2 is a diagram showing a mark detection method using an electron beam, and FIG. 3 is a diagram showing a mark detection method using light. 1... Electron beam, 2... Lens, 3... Deflector, 4... Backscattered electron detector, 5... Light source, 6...
Image sensor, 7... Standard mark, 8... Mirror, 9... Drive system, 10... Stage, 11, 1
2... Laser interferometer, 13... Stage control system,
14...computer, 15...deflection control system, 1
6, 17...mark detection circuit, 18...sample, 1
9...Mark.
Claims (1)
ための電子レンズと、該電子ビームを所望の位置
に照射するための電子ビーム偏向器と、該電子ビ
ームを固体表面上の所望の位置に照射するための
移動台と該移動台の位置計測を行なう光干渉計を
有する電子線描画装置において、発光体から発生
する光を上記固体表面上に照射し、反射光を検出
する手段を有し、あらかじめ上記固体上に作成さ
れた基準マーク位置を光を照射して検出する場合
と電子ビームを用いて検出する場合の上記移動台
の位置差をレーザ干渉計で計測、記憶し、マーク
の種類によつて光と電子ビームを使い分けて位置
検出し、光を用いる場合は上記位置差を加算する
ことを特徴とした電子線描画装置。 An electron lens for controlling an electron beam to a desired shape and current density, an electron beam deflector for irradiating the electron beam to a desired position, and an electron beam for irradiating the electron beam to a desired position on a solid surface. In an electron beam lithography apparatus having a moving table and an optical interferometer for measuring the position of the moving table, the electron beam lithography apparatus has a means for irradiating light emitted from a light emitting body onto the solid surface and detecting reflected light; The positional difference of the above-mentioned moving table when detecting the reference mark position created on the above-mentioned solid by irradiating light and using an electron beam is measured and memorized by a laser interferometer, and the An electron beam lithography apparatus characterized in that a light beam and an electron beam are used for position detection, and when light is used, the position difference is added.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987161356U JPH0167733U (en) | 1987-10-23 | 1987-10-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987161356U JPH0167733U (en) | 1987-10-23 | 1987-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0167733U true JPH0167733U (en) | 1989-05-01 |
Family
ID=31444218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987161356U Pending JPH0167733U (en) | 1987-10-23 | 1987-10-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0167733U (en) |
-
1987
- 1987-10-23 JP JP1987161356U patent/JPH0167733U/ja active Pending
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