JPH0170218U - - Google Patents
Info
- Publication number
- JPH0170218U JPH0170218U JP1987166042U JP16604287U JPH0170218U JP H0170218 U JPH0170218 U JP H0170218U JP 1987166042 U JP1987166042 U JP 1987166042U JP 16604287 U JP16604287 U JP 16604287U JP H0170218 U JPH0170218 U JP H0170218U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- superconducting thin
- electromagnetic waves
- waves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012806 monitoring device Methods 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 3
- 239000010409 thin film Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Description
第１図はこの考案の監視装置を設けた真空蒸着
装置の例を示す図である。
FIG. 1 is a diagram showing an example of a vacuum evaporation apparatus equipped with a monitoring device of this invention.
Claims (1)
タリング法などにより超伝導薄膜を作製する装置
において、 上記基板上の超伝導薄膜にマイクロ波あるいは
遠赤外領域の電磁波を入射させる電磁波発生源と
、 上記電磁波の反射波を検出する検出器と、 上記基板の温度を制御する手段とを具備する超
伝導薄膜作製用監視装置。[Scope of Claim for Utility Model Registration] In an apparatus for producing a superconducting thin film on a substrate by vacuum evaporation or sputtering in a vacuum container, microwave or far-infrared electromagnetic waves are applied to the superconducting thin film on the substrate. A monitoring device for superconducting thin film production, comprising: an electromagnetic wave generation source, a detector for detecting reflected waves of the electromagnetic waves, and means for controlling the temperature of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987166042U JPH0170218U (en) | 1987-10-28 | 1987-10-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987166042U JPH0170218U (en) | 1987-10-28 | 1987-10-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0170218U true JPH0170218U (en) | 1989-05-10 |
Family
ID=31453074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987166042U Pending JPH0170218U (en) | 1987-10-28 | 1987-10-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0170218U (en) |
-
1987
- 1987-10-28 JP JP1987166042U patent/JPH0170218U/ja active Pending