JPH0176031U - - Google Patents
Info
- Publication number
- JPH0176031U JPH0176031U JP1987171838U JP17183887U JPH0176031U JP H0176031 U JPH0176031 U JP H0176031U JP 1987171838 U JP1987171838 U JP 1987171838U JP 17183887 U JP17183887 U JP 17183887U JP H0176031 U JPH0176031 U JP H0176031U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- lens barrel
- vacuum chamber
- beam direct
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 238000013016 damping Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Description
第１図ａは本考案の一実施例を示す断面図、ｂ
は同平面図、第２図は電子線直接描画装置の鏡筒
頂点とステージとの相対変位の制振処理の有無に
よる特性図、第３図は電子線直接描画装置の固有
振動による変形を示す特性図である。
１…鏡筒、２…ステージ、３…真空チヤンバー
、４…ウエハー、５…制振材料層。
Fig. 1a is a sectional view showing an embodiment of the present invention, b
is the same plan view, Figure 2 is a characteristic diagram of the relative displacement between the apex of the lens barrel of the electron beam direct lithography system and the stage with and without vibration damping processing, and Figure 3 shows the deformation due to the natural vibration of the electron beam direct lithography system. It is a characteristic diagram. DESCRIPTION OF SYMBOLS 1... Lens barrel, 2... Stage, 3... Vacuum chamber, 4... Wafer, 5... Damping material layer.
Claims (1)
ー内のウエハー上に照射して回路パターンを描画
する電子線直接描画装置において、前記真空チヤ
ンバー及び鏡筒の少くとも一方に制振材の層を付
設したことを特徴とする電子線直接描画装置。 In an electron beam direct drawing device that draws a circuit pattern by irradiating a high-speed electron beam onto a wafer in a vacuum chamber through a lens barrel, a layer of damping material is attached to at least one of the vacuum chamber and the lens barrel. An electron beam direct writing device featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171838U JPH0176031U (en) | 1987-11-09 | 1987-11-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171838U JPH0176031U (en) | 1987-11-09 | 1987-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0176031U true JPH0176031U (en) | 1989-05-23 |
Family
ID=31463843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987171838U Pending JPH0176031U (en) | 1987-11-09 | 1987-11-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0176031U (en) |
-
1987
- 1987-11-09 JP JP1987171838U patent/JPH0176031U/ja active Pending
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