JPH0178021U - - Google Patents

Info

Publication number
JPH0178021U
JPH0178021U JP1987173850U JP17385087U JPH0178021U JP H0178021 U JPH0178021 U JP H0178021U JP 1987173850 U JP1987173850 U JP 1987173850U JP 17385087 U JP17385087 U JP 17385087U JP H0178021 U JPH0178021 U JP H0178021U
Authority
JP
Japan
Prior art keywords
vacuum chamber
chamber
evacuated
cut valve
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987173850U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987173850U priority Critical patent/JPH0178021U/ja
Publication of JPH0178021U publication Critical patent/JPH0178021U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は本考案の真空処理装置の一実施例の縦
断面図、第２図は第１図で吸着した塵埃を外部に
排出している状態を示す縦断面図である。 １……塵埃吸着部、２……アーム機構、３……
真空室、４……再生室、５，６，７……カツトバ
ルブ、８……製品、９……製品台、１０〜１３…
…バルブ、１４……塵埃、１５……ダクト。

Claims (1)

    【実用新案登録請求の範囲】
  1. 処理される製品をセツトして内部を真空排気可
    能な真空室と、この真空室に連設される一方で真
    空室とはカツトバルブで隔絶され、かつ内部をブ
    ロー排気可能な再生室と、この再生室に設けられ
    前記カツトバルブの開放時にアーム機構によつて
    前記真空室内に進退可能な塵埃吸着部とを備え、
    この塵埃吸着部は静電気の帯電、放電を任意に制
    御可能に構成したことを特徴とする真空処理装置
    。
JP1987173850U 1987-11-16 1987-11-16 Pending JPH0178021U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987173850U JPH0178021U (ja) 1987-11-16 1987-11-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987173850U JPH0178021U (ja) 1987-11-16 1987-11-16

Publications (1)

Publication Number Publication Date
JPH0178021U true JPH0178021U (ja) 1989-05-25

Family

ID=31465739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987173850U Pending JPH0178021U (ja) 1987-11-16 1987-11-16

Country Status (1)

Country Link
JP (1) JPH0178021U (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0286824A (ja) * 1988-06-21 1990-03-27 Anelva Corp 真空蒸着装置
WO2008111184A1 (ja) * 2007-03-14 2008-09-18 Fujitsu Microelectronics Limited 半導体製造装置とそのクリーニング方法、及びクリーニング用ウエハ
JP2020053494A (ja) * 2018-09-26 2020-04-02 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0286824A (ja) * 1988-06-21 1990-03-27 Anelva Corp 真空蒸着装置
WO2008111184A1 (ja) * 2007-03-14 2008-09-18 Fujitsu Microelectronics Limited 半導体製造装置とそのクリーニング方法、及びクリーニング用ウエハ
JP2020053494A (ja) * 2018-09-26 2020-04-02 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

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