JPH0188942U - - Google Patents
Info
- Publication number
- JPH0188942U JPH0188942U JP18296587U JP18296587U JPH0188942U JP H0188942 U JPH0188942 U JP H0188942U JP 18296587 U JP18296587 U JP 18296587U JP 18296587 U JP18296587 U JP 18296587U JP H0188942 U JPH0188942 U JP H0188942U
- Authority
- JP
- Japan
- Prior art keywords
- developed
- developing device
- developer
- pouring
- rotated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims 2
- 230000002950 deficient Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
Description
第１図は本考案の一実施例を示す概略図、第２
図は本考案のノズル部を示す断面図、第３図は従
来例を説明するための欠陥部分の拡大模型図、第
４図は第３図の断面図、第５図は本考案の効果を
示す欠陥部分の拡大模型図、第６図は第５図の断
面図を示す。
１３……洗浄用ノズル、１５……超音波振動子
、２０……超音波発振器、３１……現像された記
録ピツト、３２……異物、３３……未現像の欠陥
部分。
Fig. 1 is a schematic diagram showing an embodiment of the present invention;
The figure is a sectional view showing the nozzle part of the present invention, Figure 3 is an enlarged model diagram of a defective part to explain the conventional example, Figure 4 is a sectional view of Figure 3, and Figure 5 shows the effect of the present invention. FIG. 6 is an enlarged schematic diagram of the defective portion shown in FIG. 5, and FIG. 6 is a cross-sectional view of FIG. 13... Cleaning nozzle, 15... Ultrasonic vibrator, 20... Ultrasonic oscillator, 31... Developed recording pit, 32... Foreign matter, 33... Undeveloped defective portion.
Claims (1)
現像物に現像液及び洗浄液の液流を注いで現像処
理を行う現像装置において、被現像物の上記洗浄
液に超音波振動を付与することを特徴とする現像
装置。 In a developing device that performs development processing by pouring a liquid stream of a developer and a cleaning solution onto an object to be developed that is detachably fixed on a rotary table and rotated, it is possible to apply ultrasonic vibration to the cleaning liquid of the object to be developed. Characteristic developing device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18296587U JPH0188942U (en) | 1987-12-02 | 1987-12-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18296587U JPH0188942U (en) | 1987-12-02 | 1987-12-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0188942U true JPH0188942U (en) | 1989-06-12 |
Family
ID=31474403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18296587U Pending JPH0188942U (en) | 1987-12-02 | 1987-12-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0188942U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461867A (en) * | 1977-10-26 | 1979-05-18 | Sony Corp | Production of semiconductor wafer |
| JPS551114A (en) * | 1978-06-19 | 1980-01-07 | Hitachi Ltd | Method and device for washing wafer |
-
1987
- 1987-12-02 JP JP18296587U patent/JPH0188942U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461867A (en) * | 1977-10-26 | 1979-05-18 | Sony Corp | Production of semiconductor wafer |
| JPS551114A (en) * | 1978-06-19 | 1980-01-07 | Hitachi Ltd | Method and device for washing wafer |
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