JPH0189740U - - Google Patents

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Publication number
JPH0189740U
JPH0189740U JP18508987U JP18508987U JPH0189740U JP H0189740 U JPH0189740 U JP H0189740U JP 18508987 U JP18508987 U JP 18508987U JP 18508987 U JP18508987 U JP 18508987U JP H0189740 U JPH0189740 U JP H0189740U
Authority
JP
Japan
Prior art keywords
buffer
heat treatment
type heat
treatment furnace
furnace according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18508987U
Other languages
Japanese (ja)
Other versions
JPH069504Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987185089U priority Critical patent/JPH069504Y2/en
Publication of JPH0189740U publication Critical patent/JPH0189740U/ja
Application granted granted Critical
Publication of JPH069504Y2 publication Critical patent/JPH069504Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Formation Of Insulating Films (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図〜第５図は、この考案の実施例を示す図
で、第１図は、第１実施例を示す正面図、第２図
は、第１図の―線拡大断面図、第３図は、第
２実施例を示す左側面図で第２図に相当する図、
第４図は、第３実施例を示す左側面図で第２図に
相当する図、第５図は、第４図の―線拡大断
面図、第６図は、第４実施例を示す拡大断面図で
、第４図に相当する図である。 ３……ガス入口、５……反応室、６……バツフ
ア、８……ガス通孔。 1 to 5 are views showing an embodiment of this invention, in which FIG. 1 is a front view showing the first embodiment, FIG. 2 is an enlarged cross-sectional view taken along the line - The figure is a left side view showing the second embodiment and corresponds to FIG.
FIG. 4 is a left side view showing the third embodiment and corresponds to FIG. 2, FIG. This is a cross-sectional view and corresponds to FIG. 4. 3... Gas inlet, 5... Reaction chamber, 6... Buffer, 8... Gas vent.

Claims (1)

【実用新案登録請求の範囲】 (1) 反応管内のガス入口側に、燃焼室形成用の
ガス通孔付バツフアを設けたことを特徴とするバ
ツフア型熱処理炉。 (2) バツフアが、摺動自在であることを特徴と
する実用新案登録請求の範囲第１項記載のバツフ
ア型熱処理炉。 (3) バツフアが、断面略円弧状であることを特
徴とする実用新案登録請求の範囲第１項記載のバ
ツフア型熱処理炉。 (4) バツフアが、断面略Ｕ字状であることを特
徴とする実用新案登録請求の範囲第１項記載のバ
ツフア型熱処理炉。 (5) ガス通孔が、１個であることを特徴とする
実用新案登録請求の範囲第１項記載のバツフア型
熱処理炉。 (6) ガス通孔が、複数個であることを特徴とす
る実用新案登録請求の範囲第１項記載のバツフア
型熱処理炉。[Scope of Claim for Utility Model Registration] (1) A buffer type heat treatment furnace characterized in that a buffer with gas holes for forming a combustion chamber is provided on the gas inlet side of the reaction tube. (2) The buffer type heat treatment furnace according to claim 1, wherein the buffer is slidable. (3) The buffer type heat treatment furnace according to claim 1, wherein the buffer has a substantially arcuate cross section. (4) The buffer type heat treatment furnace according to claim 1, wherein the buffer has a substantially U-shaped cross section. (5) The buffer type heat treatment furnace according to claim 1 of the utility model registration, characterized in that the number of gas holes is one. (6) The buffer type heat treatment furnace according to claim 1 of the utility model registration, characterized in that there is a plurality of gas vents.
JP1987185089U 1987-12-04 1987-12-04 Buffer type heat treatment furnace Expired - Lifetime JPH069504Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987185089U JPH069504Y2 (en) 1987-12-04 1987-12-04 Buffer type heat treatment furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987185089U JPH069504Y2 (en) 1987-12-04 1987-12-04 Buffer type heat treatment furnace

Publications (2)

Publication Number Publication Date
JPH0189740U true JPH0189740U (en) 1989-06-13
JPH069504Y2 JPH069504Y2 (en) 1994-03-09

Family

ID=31476417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987185089U Expired - Lifetime JPH069504Y2 (en) 1987-12-04 1987-12-04 Buffer type heat treatment furnace

Country Status (1)

Country Link
JP (1) JPH069504Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016163025A (en) * 2015-03-05 2016-09-05 三菱電機株式会社 Semiconductor manufacturing apparatus and semiconductor device manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5325364A (en) * 1976-08-23 1978-03-09 Hitachi Ltd Hydrogen combustion type oxidation furnace
JPS58116737A (en) * 1981-12-30 1983-07-12 Oki Electric Ind Co Ltd Semiconductor wafer thermal processing apparatus
JPS6218039A (en) * 1985-07-17 1987-01-27 Tdk Corp Oxidizing device for semiconductor wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5325364A (en) * 1976-08-23 1978-03-09 Hitachi Ltd Hydrogen combustion type oxidation furnace
JPS58116737A (en) * 1981-12-30 1983-07-12 Oki Electric Ind Co Ltd Semiconductor wafer thermal processing apparatus
JPS6218039A (en) * 1985-07-17 1987-01-27 Tdk Corp Oxidizing device for semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016163025A (en) * 2015-03-05 2016-09-05 三菱電機株式会社 Semiconductor manufacturing apparatus and semiconductor device manufacturing method

Also Published As

Publication number Publication date
JPH069504Y2 (en) 1994-03-09

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