JPH0189955U - - Google Patents
Info
- Publication number
- JPH0189955U JPH0189955U JP18521887U JP18521887U JPH0189955U JP H0189955 U JPH0189955 U JP H0189955U JP 18521887 U JP18521887 U JP 18521887U JP 18521887 U JP18521887 U JP 18521887U JP H0189955 U JPH0189955 U JP H0189955U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- evaporation
- crucible
- continuous vacuum
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図ａ，ｂ，ｃは本考案の一実施例としての
連続真空蒸着装置の構成図、第２図ａ，ｂ及び第
３図ａ，ｂは従来の連続真空蒸着装置の構成図で
ある。
１……蒸着基板、２……真空シール装置、３…
…蒸着室、４，５……デフレクタロール、６……
蒸発るつぼ、７……蒸着金属、８……電子銃、９
……電子ビーム、１０……電子ビーム鉛直偏向装
置（小型電磁コイル）、１１……磁場空間（装置
１０による）、１２……真空排気装置。
Figures 1 a, b, and c are block diagrams of a continuous vacuum evaporation apparatus as an embodiment of the present invention, and Figures 2 a, b, and 3 a, b are block diagrams of a conventional continuous vacuum evaporation apparatus. . 1... Vapor deposition substrate, 2... Vacuum sealing device, 3...
...Deposition chamber, 4, 5...Deflector roll, 6...
Evaporation crucible, 7... Evaporated metal, 8... Electron gun, 9
... Electron beam, 10 ... Electron beam vertical deflection device (small electromagnetic coil), 11 ... Magnetic field space (by device 10), 12 ... Vacuum exhaust device.
Claims (1)
ツキする連続真空蒸着装置において、蒸発用加熱
源である電子銃、及び該電子銃と蒸発るつぼとの
間に電子ビーム偏向装置を複数個備え、電子ビー
ムを鉛直偏向させる際に電子ビーム進行方向に細
長いるつぼの全面に電子ビームを照射されるよう
に、鉛直偏向用コイルを複数個備えたことを特徴
とする連続真空蒸着装置。 A continuous vacuum evaporation apparatus that continuously evaporates and plating metal films on evaporation substrates such as steel strips is equipped with an electron gun as a heating source for evaporation, and a plurality of electron beam deflection devices between the electron gun and the evaporation crucible. 1. A continuous vacuum evaporation apparatus comprising a plurality of vertical deflection coils so that the entire surface of a crucible elongated in the electron beam traveling direction is irradiated with the electron beam when vertically deflecting the electron beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18521887U JPH0189955U (en) | 1987-12-04 | 1987-12-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18521887U JPH0189955U (en) | 1987-12-04 | 1987-12-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0189955U true JPH0189955U (en) | 1989-06-13 |
Family
ID=31476544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18521887U Pending JPH0189955U (en) | 1987-12-04 | 1987-12-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0189955U (en) |
-
1987
- 1987-12-04 JP JP18521887U patent/JPH0189955U/ja active Pending
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