JPH0189958U

JPH0189958U -

Info

Publication number: JPH0189958U
Application number: JP18614087U
Authority: JP
Priority date: 1987-12-07
Filing date: 1987-12-07
Publication date: 1989-06-13

Description

[Brief explanation of drawings]

第１図〜第９図は本考案の実施例を示すもので
あつて、第１図は連続処理装置の搬送方向に沿う
断面図、第２図は第１図の―線矢視側面図、
第３図は第１図の―線矢視断面図、第４図は
移動ビーム及び被処理物の運動を説明するための
概略図で、同図ａは概略部分正面図、同図ｂは概
略側面図、第５図は移動ビームの変位運動要領を
説明するための説明図、第６図は霧化部の概略図
、第７図はノズル部の断面図、第８図は第７図の
―線矢視側面図、第９図は被処理物の入炉か
らの経過時間と被処理物の温度との関係を示すグ
ラフである。第１０図は従来のスプレー方式の連
続表面処理装置の搬送方向に沿う部分断面図であ
る。なお、図面に示された符号に於いて、１……装
置本体、２，３４……ヒータ、６……固定ビーム
、９……移動ビーム、２４Ａ……上下動駆動機構
、２４Ｂ……前進、後退駆動機構、３１……表面
処理手段、３２……霧化部、３３，３６……容器
、３７……超音波振動子、４０……表面処理材料
の溶液、４０Ａ……溶液からの蒸気、４０Ｂ……
霧状溶液、４０Ｃ……帯電した霧状溶液、４１…
…帯電電極、４２……ノズル部、４３……集束電
極、Ｗ……被処理物（ガラス基板）、ＣＦ……透
明導電膜、である。 1 to 9 show an embodiment of the present invention, in which FIG. 1 is a cross-sectional view along the conveyance direction of the continuous processing apparatus, FIG. 2 is a side view taken along the line arrow - in FIG.
Fig. 3 is a sectional view taken along the line - - of Fig. 1, and Fig. 4 is a schematic diagram for explaining the movement of the moving beam and the object to be processed. A side view, FIG. 5 is an explanatory diagram for explaining the displacement movement of the moving beam, FIG. 6 is a schematic diagram of the atomizing section, FIG. 7 is a sectional view of the nozzle section, and FIG. 8 is the same as that of FIG. FIG. 9 is a graph showing the relationship between the time elapsed since the workpiece entered the furnace and the temperature of the workpiece. FIG. 10 is a partial cross-sectional view of a conventional spray type continuous surface treatment apparatus taken along the conveyance direction. In addition, in the symbols shown in the drawings, 1... device main body, 2, 34... heater, 6... fixed beam, 9... moving beam, 24A... vertical movement drive mechanism, 24B... forward movement, Retraction drive mechanism, 31...Surface treatment means, 32...Atomization section, 33, 36...Container, 37...Ultrasonic vibrator, 40...Surface treatment material solution, 40A...Steam from the solution, 40B...
Atomized solution, 40C... Charged atomized solution, 41...
... Charged electrode, 42 ... Nozzle part, 43 ... Focusing electrode, W ... Processing object (glass substrate), CF ... Transparent conductive film.

Claims

[Claims for Utility Model Registration] A main body of the processing device; a means for placing an object to be processed comprising a first placing member and a movable second placing member;
The second mounting member is repeatedly displaced with respect to the first mounting member, whereby the objects to be processed are alternately placed between the first and second mounting members. A drive means for transporting the object to be treated; and a surface treatment means for surface treating the object, the surface treatment means comprising: (a) atomization for atomizing the material for the surface treatment; (b) a charging unit that charges the atomized material; and (c) a focusing unit that focuses the charged material on the surface of the object.