JPH0192376A - Resist ink for electroless plating - Google Patents

Resist ink for electroless plating

Info

Publication number
JPH0192376A
JPH0192376A JP62246960A JP24696087A JPH0192376A JP H0192376 A JPH0192376 A JP H0192376A JP 62246960 A JP62246960 A JP 62246960A JP 24696087 A JP24696087 A JP 24696087A JP H0192376 A JPH0192376 A JP H0192376A
Authority
JP
Japan
Prior art keywords
component
resist ink
components
resin
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62246960A
Other languages
Japanese (ja)
Other versions
JPH0745716B2 (en
Inventor
Osamu Ogitani
荻谷 修
Tsuyoshi Kobayashi
強 小林
Ryuichi Fujii
隆一 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP24696087A priority Critical patent/JPH0745716B2/en
Publication of JPH0192376A publication Critical patent/JPH0192376A/en
Publication of JPH0745716B2 publication Critical patent/JPH0745716B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1605Process or apparatus coating on selected surface areas by masking
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To manufacture resist ink for electroless plating causing no crack to fine pattern by incorporating phenolnovolak-type epoxy resin, aliphatic polyol polyglycidyl ether, phenolnovolak resin, montmorilonite organic complex compound, thermosetting reaction-accelerating catalyst, and organic solvent. CONSTITUTION:Resist ink is prepared by using [A] phenolnovolak-type epoxy resin, [B] aliphatic polyol polyglycidyl ether, [C] phenolnovolak resin, [D] montmorilonite organic complex compound, [E] thermosetting reaction- accelerating catalyst, and [F] organic solvent. Moreover, respective contents of the above components are regulated so that the component B is about 10-100wt.% based on the component A, the number of phenolyc hydroxyl groups in the component C per piece of epoxy group in the components A, B is about 0.5-2.0, the component D is 3-25wt.% based on the total content of the components, A, B, C, and E, the component E is about 0.5-10wt.% based on the total content of the components A, B, and C, and the component F is about 20-80wt.% based on the total content of the components A, B, and C.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は無電解メッキによってプリント基板を製造する
際に使用されるレジストインキに関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a resist ink used when manufacturing printed circuit boards by electroless plating.

(従来技術と問題点) 従来、無電解メッキ用レジストとしては、例えば、エポ
キシ樹脂、無機フィラー及び有機溶剤を配合した主剤と
、芳香族ポリアミン化合物及び有機溶剤を配合した硬化
剤とからなる2液温合型のレジストインキが知られてい
る。
(Prior art and problems) Conventionally, resists for electroless plating have been made using two liquids, for example, consisting of a main ingredient containing an epoxy resin, an inorganic filler, and an organic solvent, and a curing agent containing an aromatic polyamine compound and an organic solvent. Warming type resist inks are known.

従来品は、耐化学薬品性、基板との密着性、耐熱性とい
った点でかなり高い性能に達しているものの、まだ性能
が十分なものとはいえない。特に、従来品に対して下記
のような欠点が指摘されている。
Although conventional products have achieved fairly high performance in terms of chemical resistance, adhesion to substrates, and heat resistance, their performance is still not sufficient. In particular, the following drawbacks have been pointed out compared to conventional products.

■ インキの粘性、特にチキソトロピーが変化しやす(
、安定した印刷性が得られにくい。
■ Ink viscosity, especially thixotropy, changes easily (
, it is difficult to obtain stable printability.

■ スクリーン印刷時、パターンの再現性が十分でなく
、微細パターンへの対応がむずかしい。
■ When screen printing, pattern reproducibility is not sufficient, making it difficult to handle fine patterns.

すなわち、約200μmの線幅のパターンになると、そ
の再現性が不十分である。
That is, when a pattern has a line width of approximately 200 μm, its reproducibility is insufficient.

■ 硬化したレジスト膜の耐化学薬品性が、最近の厳し
い薬品処理条件下ではまだ十分でない。
■ The chemical resistance of the cured resist film is still insufficient under today's harsh chemical processing conditions.

■ 無電解メッキ処理中に、メッキレジスト上にも銅が
析出して付着しやすく、いわゆる「銅ふり」現象を起こ
しやすい。析出した銅が成長すると、ライン間を短絡さ
せる原因となる。
■ During electroless plating, copper tends to precipitate and adhere to the plating resist, causing the so-called "copper flaking" phenomenon. When the deposited copper grows, it causes a short circuit between lines.

本発明者らは、さきに、これらの欠点を克服した無電解
メッキ用レジストインキを開発し、特許出願(特願昭6
1−308926号)をした。
The present inventors have previously developed a resist ink for electroless plating that overcomes these drawbacks, and have filed a patent application (patent application filed in 1983).
1-308926).

このレジストインキは、満足のいくものであったが、そ
の後の検討によると、基板製造中に種々のストレスが加
わった場合微細パターンにクランクが発生する傾向のあ
ることがわかり、これへの対応が新たに要望されること
になった。
Although this resist ink was satisfactory, subsequent studies revealed that there was a tendency for cracks to occur in the fine patterns when various stresses were applied during substrate manufacturing, and measures were needed to deal with this problem. A new request has been made.

(発明の目的) 本発明は、上記の要望にこたえるべく、微細パターンに
クランクを生じさせることがなく、かつ良好な耐化学薬
品性、非銅ふり性を兼ね備えたレジストインキを提供し
ようとするものである。
(Object of the invention) In order to meet the above-mentioned demands, the present invention aims to provide a resist ink that does not cause cranking in fine patterns and has good chemical resistance and copper-free property. It is.

(発明の構成) 本発明は下記のとおりのものである。(Structure of the invention) The present invention is as follows.

下記成分〔A〕〜〔F〕 〔A〕フェノールノボラック型エポキシ樹脂〔B〕脂肪
族ポリオールポリグリシジルエーテル〔C〕フェノール
ノボラック樹脂 〔D〕モンモリロナイト有機複合体、 〔E〕熱硬化反応促進触媒 〔F〕有機溶剤 を含有してなる無電解メッキ用レジストインキ。
The following components [A] to [F] [A] Phenol novolac type epoxy resin [B] Aliphatic polyol polyglycidyl ether [C] Phenol novolac resin [D] Montmorillonite organic composite, [E] Thermosetting reaction accelerating catalyst [F] ]A resist ink for electroless plating containing an organic solvent.

かかる構成の本発明は、本発明者らが得た下記の知見に
基づき完成されたものである。
The present invention having such a configuration was completed based on the following findings obtained by the present inventors.

■ 微細パターンにおけるクラック発生の防止には、基
本的には、レジスト膜を構成する樹脂が柔軟性を有する
ことが重要である。
(2) To prevent the occurrence of cracks in fine patterns, it is basically important that the resin constituting the resist film has flexibility.

■ レジスト膜の耐化学薬品性の向上やレジスト膜への
銅ふり現象の防止には、基本的にはレジスト膜を構成す
る樹脂の耐化学薬品性を向上させることが重要である。
■ In order to improve the chemical resistance of the resist film and to prevent the phenomenon of copper flaking on the resist film, it is basically important to improve the chemical resistance of the resin that makes up the resist film.

■ レジスト膜を構成する樹脂が柔軟性を有すると、一
般に耐化学薬品性が低下する。
(2) If the resin constituting the resist film has flexibility, chemical resistance generally decreases.

■ 本発明における特定の組合わせ成分、特に脂肪族ポ
リオールポリグリシジルエーテルを使用することによっ
て、クラック発生及び銅ふり現象が有効に防止できる。
(2) By using a specific combination of components in the present invention, particularly aliphatic polyol polyglycidyl ether, cracking and copper flaking phenomena can be effectively prevented.

以下、本発明の構成について詳述する。Hereinafter, the configuration of the present invention will be explained in detail.

成分(A〕 フェノールノボラック型エポキシ樹脂とは、フェノール
、クレゾール、ビスフェノールAなどのフェノール類と
ホルムアルデヒドなどとを酸性触媒の存在下で縮合して
得られるフェノールノボラック樹脂を、さらにアルカリ
触媒の存在下でエピクロルヒドリンと反応して得られる
もので、好ましくは、エポキシ当量170〜250のも
のである。
Component (A) Phenol novolak type epoxy resin is a phenol novolak resin obtained by condensing phenols such as phenol, cresol, and bisphenol A with formaldehyde, etc. in the presence of an acidic catalyst, and further condensing the resin in the presence of an alkali catalyst. It is obtained by reacting with epichlorohydrin, and preferably has an epoxy equivalent of 170 to 250.

具体的には、エピコート154 〔油化シェルエポキシ
(株)製〕等を挙げることができる。
Specific examples include Epicoat 154 (manufactured by Yuka Shell Epoxy Co., Ltd.).

成分〔B〕 脂肪族ポリオールポリグリシジルエーテルとは、(ポリ
)エチレングリコール、1,6−ヘキサンジオール、ト
リメチロールプロパンなどのポリオール類とエピクロル
ヒドリンとをアルカリ触媒の存在下で反応して得られる
もので、好ましくはエポキシ当量100〜400のもの
である。
Component [B] Aliphatic polyol polyglycidyl ether is obtained by reacting polyols such as (poly)ethylene glycol, 1,6-hexanediol, and trimethylolpropane with epichlorohydrin in the presence of an alkali catalyst. , preferably having an epoxy equivalent of 100 to 400.

具体的には、(ポリ)エチレングリコールジグリシジル
エーテル、(ポリ)プロピレングリコールジグリシジル
エーテル、ネオペンチルグリコールジグリシジルエーテ
ル、■、4−ブタンジオールジグリシジルエーテル、1
.6−ヘキサンシオールジグリシジルエーテル、(ポリ
)グリセロールポリグリシジルエーテル、トリメチロー
ルプロパンポリグリシジルエーテル、ソルビトールポリ
グリシジルエーテル、及びこれらのハロゲン化物等を挙
げることができる。市販品としてエボライト80MF(
共栄社油脂化学工業(株)製〕等がある。
Specifically, (poly)ethylene glycol diglycidyl ether, (poly)propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, ■, 4-butanediol diglycidyl ether, 1
.. Examples include 6-hexanesiol diglycidyl ether, (poly)glycerol polyglycidyl ether, trimethylolpropane polyglycidyl ether, sorbitol polyglycidyl ether, and halogenated products thereof. Evolite 80MF (
manufactured by Kyoeisha Yushi Kagaku Kogyo Co., Ltd.), etc.

成分〔C〕 フェノールノボラック樹脂とは、フェノール、クレゾー
ル、ビスフェノールAなどのフェノール類とホルムアル
デヒドなどとを酸性触媒の存在下で縮合して得られるも
ので、好ましくは、水酸基当量100−150、軟化点
60〜130℃のものである。
Component [C] Phenol novolak resin is obtained by condensing phenols such as phenol, cresol, and bisphenol A with formaldehyde, etc. in the presence of an acidic catalyst, and preferably has a hydroxyl equivalent of 100-150 and a softening point. The temperature is 60 to 130°C.

市販品の具体例は、BRG−556(昭和高分子(株)
製〕である。
A specific example of a commercial product is BRG-556 (Showa Kobunshi Co., Ltd.)
Made in Japan.

成分〔D〕 モンモリロナイト有機複合体とは、モンモリロナイトと
有機物質との複合体であって、市販品として、オルベン
〔白石工業(株)製〕、二ニーDオルベン〔同前〕、ニ
スベン〔豊順洋行(株)製〕等を挙げることができる。
Component [D] Montmorillonite organic complex is a complex of montmorillonite and an organic substance, and commercially available products include Olben [manufactured by Shiraishi Kogyo Co., Ltd.], Nini D Olben [same as above], and Nisben [Hojun]. manufactured by Yoko Co., Ltd.).

成分〔E〕 熱硬化反応促進用触媒は、〔A〕のエポキシ樹脂及び〔
B〕のフェノールノボラック樹脂の熱硬化反応促進する
作用を有するものである。
Component [E] The catalyst for promoting thermosetting reaction is the epoxy resin of [A] and [
B] has the effect of accelerating the thermosetting reaction of the phenol novolak resin.

具体例として、2−メチルイミダゾール、2−フェニル
イミダゾール、2−ヘプタデシルイミダゾール、2−ウ
ンデシルイミダゾール、2−エチル−4−メチルイミダ
ゾール、2,4−ジメチルイミダゾール、2−イソプロ
ピルイミダゾール、2−フェニル−4−メチルイミダゾ
ールなどを挙げることができる。また、トリフェニルホ
スフィン、1,8−ジアザ−ビシクロ(5・4・0)ウ
ンデセン−7、又はそのフェノール塩、2−エチルヘキ
サン酸塩、炭酸塩なども使用できる。
Specific examples include 2-methylimidazole, 2-phenylimidazole, 2-heptadecylimidazole, 2-undecylimidazole, 2-ethyl-4-methylimidazole, 2,4-dimethylimidazole, 2-isopropylimidazole, 2-phenyl. -4-methylimidazole and the like can be mentioned. Further, triphenylphosphine, 1,8-diaza-bicyclo(5.4.0)undecene-7, or its phenol salt, 2-ethylhexanoate, carbonate, etc. can also be used.

成分〔F〕 有機溶剤は、成分〔A〕のエポキシ樹脂及び成分〔B〕
のフェノールノボラック樹脂を溶解するもので、好まし
くは、インキの硬化反応がかなり高い温度(通常150
〜250℃)で行われる関係上、沸点の比較的高いもの
である。
Component [F] The organic solvent is the epoxy resin of component [A] and the component [B].
of phenolic novolak resin, preferably at a temperature at which the curing reaction of the ink is quite high (usually 150
It has a relatively high boiling point because it is carried out at a temperature of ~250°C).

具体的には、エチルセロソルブ、ブチルセロソルブ、フ
ェニルセロソルブ等のセロソルブ類、これらのアセテー
トエステル類、エチルカルピトール、ブチルカルピトー
ル、フェニルカルピトール等のカルピトール類、ベンジ
ルアルコール等のアラルキルアルコール類などを挙げる
ことができる。
Specifically, cellosolves such as ethyl cellosolve, butyl cellosolve, and phenyl cellosolve, their acetate esters, carpitols such as ethyl carpitol, butyl carpitol, and phenyl carpitol, and aralkyl alcohols such as benzyl alcohol may be mentioned. Can be done.

これらを1種車用又は2種以上併用する。These can be used in one type of vehicle or in combination of two or more types.

主剤に使用する有機溶剤と硬化剤系に使用するそれとは
同種でも異種でもよい。
The organic solvent used in the base resin and the organic solvent used in the curing agent system may be the same or different.

本発明における各成分の含有量は、好ましくは、下記の
とおりである。
The content of each component in the present invention is preferably as follows.

成分〔B〕は、成分〔A〕に対して10〜100重量%
である。成分〔C〕は、成分〔A〕及び〔C〕のエポキ
シ基1個当り成分〔C〕のフェノール性水酸基が0.5
〜2,0個となる割合で用いる。
Component [B] is 10 to 100% by weight based on component [A]
It is. In component [C], the number of phenolic hydroxyl groups in component [C] is 0.5 per epoxy group in components [A] and [C].
Use at a ratio of ~2.0 pieces.

成分〔D〕は、成分〔A〕、〔B〕、〔C〕及び〔E〕
の合計量に対して3〜25重量%である。
Component [D] is component [A], [B], [C] and [E]
3 to 25% by weight based on the total amount.

成分〔E〕は、成分〔A〕、〔B〕及び〔C〕の合計量
に対して0.5〜lO重量%である。成分〔F〕は、成
分〔A〕、(I3)及び〔C〕の合計量に対して20〜
80重量%である。
Component [E] is 0.5 to 10% by weight based on the total amount of components [A], [B] and [C]. Component [F] is 20 to 20% of the total amount of components [A], (I3) and [C].
It is 80% by weight.

レジストインキが上記含有量の範囲にあるとき、とりわ
け優れた性能を発揮することができる。特に成分〔B〕
脂肪族ポリオールポリグリシジルエーテルが上記10〜
100重量%の範囲にあるとき、耐クランク性及び耐化
学薬品性と、再現性のあるスクリーン印刷性とを兼ね備
えた優れたレジストインキが得られる。
When the resist ink has a content within the above range, particularly excellent performance can be exhibited. Especially component [B]
The aliphatic polyol polyglycidyl ether is the above 10-
When the amount is in the range of 100% by weight, an excellent resist ink having both crank resistance and chemical resistance and reproducible screen printability can be obtained.

成分〔B〕が成分〔A〕に対して10重量%未満の場合
は、柔軟性を出すことが困難であり、また、100重景
重量の場合は、耐化学薬品性が低下する傾向がある。
When component [B] is less than 10% by weight relative to component [A], it is difficult to achieve flexibility, and when the weight is 100%, chemical resistance tends to decrease. .

本発明においては、以上の成分〔A〕〜〔F〕のほかに
、所望により他の成分を配合してもよい。
In the present invention, in addition to the above components [A] to [F], other components may be blended as desired.

例えば、レジスト膜の識別を容易にするために着色料と
して青色顔料、緑色顔料、カーボンブラックなどを適宜
配合することができる。着色料の配合量は、通常、成分
〔A〕〜〔E〕に対し0.5〜10重量%の範囲である
For example, in order to facilitate identification of the resist film, a blue pigment, a green pigment, carbon black, or the like may be appropriately added as a coloring agent. The blending amount of the colorant is usually in the range of 0.5 to 10% by weight based on components [A] to [E].

本発明のレジストインキは、下記のように主剤と硬化剤
系とを別々に調製し、しかる後、両者を混合して製造す
るのが好適である。
The resist ink of the present invention is preferably manufactured by separately preparing the base agent and the curing agent system as described below, and then mixing the two.

〔主剤〕[Main agent]

フェノールノボラック型エポキシ樹脂を約50〜120
℃に加熱し、流動化させて所定量を計り取り、ここへ所
定量の脂肪族ポリオールポリグリシジルエーテル、有機
溶剤及びモンモリロナイト有機複合体を加えて、デイシ
ルバーなどにより均一に混合する。得られた混合物を室
温まで冷却した後、三本ロールなどの混練機を使用して
フィラー類をよく混合、分散してインキ化し、最後に必
要に応じて所定量の有機溶剤を適宜加え、デイシルバー
などでよく混合して所定の粘性を示す主剤とする。
Approximately 50 to 120 phenol novolac type epoxy resin
C. to fluidize and measure a predetermined amount, add a predetermined amount of aliphatic polyol polyglycidyl ether, an organic solvent, and a montmorillonite organic composite, and mix uniformly using a day silver or the like. After cooling the obtained mixture to room temperature, fillers are thoroughly mixed and dispersed using a kneading machine such as a three-roll mill to form an ink.Finally, a predetermined amount of organic solvent is added as needed, and dye Mix well with silver or the like to form a main ingredient that exhibits a predetermined viscosity.

このように、本発明で使用するフィラーのモンモリロナ
イト有機複合体は主剤の方に添加しておく方が好ましい
が、必ずしもこれに限定されるものではなく、場合によ
り、硬化剤系の方に添加して使用することも可能である
As described above, it is preferable to add the montmorillonite organic composite filler used in the present invention to the main agent, but it is not necessarily limited to this, and in some cases, it may be added to the curing agent system. It is also possible to use

〔硬化剤系〕[Curing agent system]

上記主剤とは別に、フェノールノボラック樹脂を、通常
は、あらかじめ約50〜130℃に加熱した有機溶剤に
撹拌しながら加えて溶解させ、ついで、熱硬化反応促進
用触媒を加えて均一化して硬化剤系とする。
Separately from the above-mentioned main agent, the phenol novolak resin is usually added to an organic solvent preheated to about 50 to 130°C with stirring to dissolve it, and then a catalyst for accelerating the thermosetting reaction is added and homogenized to form a curing agent. system.

以上のようにして調製した主剤と硬化剤系とをそれぞれ
計り取って、これを撹拌機等によって十分混合し均一化
してレジストインキを製造する。
The base agent and curing agent system prepared as described above are each weighed out and thoroughly mixed using a stirrer or the like to make the mixture uniform, thereby producing a resist ink.

熱硬化反応促進用触媒は、通常、硬化剤系の中にあらか
じめ添加、混合されているが、そうしないで、例えば、
該触媒を有機溶剤に熔解した溶液として調製しておき、
主剤と硬化剤系とを混合してインキを製造する際に、こ
の触媒溶液を同時に加えることもできる。
Catalysts for promoting thermal curing reactions are usually added and mixed into the curing agent system in advance, but if they are not, e.g.
Prepare the catalyst as a solution dissolved in an organic solvent,
This catalyst solution can also be added at the same time when the base agent and curing agent system are mixed to produce an ink.

主剤と硬化剤系とを混合してレジストインキの製造を行
う場合のそれぞれの使用量は、成分〔A〕及び〔B〕の
エポキシ基1個当り成分〔C〕のフェノール性水酸基が
0.5〜260個、好ましくは0.8〜1.2個となる
ように割合で用いるのがよい。
When manufacturing a resist ink by mixing the base agent and the curing agent system, the amount of each used is 0.5 phenolic hydroxyl group of component [C] per epoxy group of components [A] and [B]. It is preferable to use a proportion of ~260 pieces, preferably 0.8~1.2 pieces.

この範囲で用いると、硬化したレジスト膜の耐クランク
性、耐熱性及び耐化学薬品性が良好となる。
When used within this range, the cured resist film will have good crank resistance, heat resistance, and chemical resistance.

(発明の効果) 本発明のレジストインキは、後記第3表の結果から明ら
かなように、耐クラツク性、耐化学薬品性、非銅ふり性
において優れており、これら特性を兼ね備えた無電解メ
ッキ用レジストとして極めて有用なものである。
(Effects of the Invention) As is clear from the results in Table 3 below, the resist ink of the present invention is excellent in crack resistance, chemical resistance, and non-copper flaking property, and electroless plating that has all of these properties. It is extremely useful as a resist for commercial use.

(実施例と比較例) 実施例1.2及び比較例1.2 第1表に示す処方で主剤〔イ〕〜〔二〕をそれぞれ調製
した。これと別に、第2表に示す処方で硬化剤系を調製
した。得られた各主剤と各硬化剤系とを第3表に示す組
合わせで配合してレジストインキを製造した。
(Examples and Comparative Examples) Example 1.2 and Comparative Example 1.2 Base ingredients [A] to [II] were prepared according to the formulations shown in Table 1, respectively. Separately, a curing agent system was prepared with the formulation shown in Table 2. Each of the obtained main ingredients and each curing agent system were blended in the combinations shown in Table 3 to produce resist inks.

このレジストインキの特性を調べたところ、第3表に示
す結果を得た。
When the characteristics of this resist ink were investigated, the results shown in Table 3 were obtained.

特性の測定方法は次のとおりである。The method for measuring the characteristics is as follows.

〔耐クランク性〕[Crank resistance]

ACL基板(10(lnx500關X1.Q@m)上に
線幅150μ、厚さ20μでスクリーン印刷を施し、硬
化(150℃、30分)した後、基板を長尺方向に、中
心部が両端よりも200mm上になるように反らせ、ク
ランクが発生するかどうかを測定する。
Screen printing was performed on an ACL substrate (10 (ln x 500 x 1.Q@m) with a line width of 150 μm and a thickness of 20 μm, and after curing (150°C, 30 minutes), the center part was placed at both ends in the longitudinal direction. Warp it 200mm higher than that and measure whether a crank occurs.

〔耐化学薬品性及び銅ぷり量〕[Chemical resistance and copper content]

レジストパターン印刷を硬化した後、さらに化学粗化、
無電解メッキ処理を行い、化学粗化液に対する耐化学薬
品性と、20倍ルーペで観察しろる銅粒子数(1crA
当り)を銅ふり量として測定した。
After curing the resist pattern printing, further chemical roughening,
Electroless plating treatment is performed to improve chemical resistance to chemical roughening solutions and the number of copper particles (1crA) that can be observed with a 20x magnifying glass.
(per hit) was measured as the amount of copper sprinkled.

〔注(第1表及び第2表)〕 (1)油化シェルエポキシ■製 フェノールノボラック
型樹脂、エポキシ当量176〜181(2)共栄社油脂
化学工業側製 グリセリンジグリシンエーテル、エポキ
シ当量140〜170(3)共栄社油脂化学工業側製 
トリメチロールプロパントリグリシジルエーテル 量135〜165 (4)白石工業■製 モンモリロナイト有機複合体(5
)三菱化成■製 カーボンブランク(黒色顔料)(6)
昭和高分子側型 フェノールノボラック樹脂、軟化点8
0℃
[Notes (Tables 1 and 2)] (1) Phenol novolak type resin manufactured by Yuka Shell Epoxy■, epoxy equivalent 176-181 (2) Glycerin diglycine ether manufactured by Kyoeisha Yushi Chemical Industry, epoxy equivalent 140-170 (3) Manufactured by Kyoeisha Oil and Fat Chemical Industry
Trimethylolpropane triglycidyl ether amount 135-165 (4) Montmorillonite organic composite manufactured by Shiraishi Kogyo ■ (5
)Mitsubishi Kasei Carbon blank (black pigment) (6)
Showa Kobunshi side type phenol novolac resin, softening point 8
0℃

Claims (3)

【特許請求の範囲】[Claims] (1)下記成分〔A〕〜〔F〕 〔A〕フェノールノボラック型エポキシ樹脂〔B〕脂肪
族ポリオールポリグリシジルエーテル 〔C〕フェノールノボラック樹脂 〔D〕モンモリロナイト有機複合体 〔E〕熱硬化反応促進触媒 〔F〕有機溶剤 を含有してなる無電解メッキ用レジストインキ。
(1) The following components [A] to [F] [A] Phenol novolak type epoxy resin [B] Aliphatic polyol polyglycidyl ether [C] Phenol novolac resin [D] Montmorillonite organic composite [E] Thermosetting reaction accelerating catalyst [F] Resist ink for electroless plating containing an organic solvent.
(2)成分〔A〕フェノールノボラック型エポキシ樹脂
、〔B〕脂肪族ポリオールポリグリシジルエーテル、〔
D〕モンモリロナイト有機複合体、〔F〕有機溶剤を含
有する主剤と、〔C〕フェノールノボラック樹脂、〔E
〕熱硬化反応促進触媒、〔F〕有機溶剤、所望により〔
D〕モンモリロナイト有機複合体を含有する硬化剤系と
を配合してなる特許請求の範囲(1)のレジストインキ
(2) Component [A] Phenol novolac type epoxy resin, [B] Aliphatic polyol polyglycidyl ether, [
D] montmorillonite organic composite, [F] main agent containing organic solvent, [C] phenol novolac resin, [E
[Thermosetting reaction accelerating catalyst, [F] Organic solvent, if desired [
D] The resist ink according to claim (1), which is blended with a curing agent system containing a montmorillonite organic composite.
(3)成分〔B〕脂肪族ポリオールポリグリシジルエー
テルを、〔A〕に対して10〜100重量%含有してな
る特許請求の範囲(1)のレジストインキ。
(3) The resist ink according to claim (1), which contains component [B] 10 to 100% by weight of aliphatic polyol polyglycidyl ether based on [A].
JP24696087A 1987-09-30 1987-09-30 Resist ink for electroless plating Expired - Fee Related JPH0745716B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24696087A JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24696087A JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Publications (2)

Publication Number Publication Date
JPH0192376A true JPH0192376A (en) 1989-04-11
JPH0745716B2 JPH0745716B2 (en) 1995-05-17

Family

ID=17156284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24696087A Expired - Fee Related JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Country Status (1)

Country Link
JP (1) JPH0745716B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061744A (en) * 1989-07-05 1991-10-29 Somar Corporation Resist ink composition
WO2012169384A1 (en) * 2011-06-07 2012-12-13 太陽ホールディングス株式会社 Resin composition for plating resist, and multilayer printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061744A (en) * 1989-07-05 1991-10-29 Somar Corporation Resist ink composition
WO2012169384A1 (en) * 2011-06-07 2012-12-13 太陽ホールディングス株式会社 Resin composition for plating resist, and multilayer printed wiring board

Also Published As

Publication number Publication date
JPH0745716B2 (en) 1995-05-17

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