JPH0196938A - Capillary for wire bonding - Google Patents

Capillary for wire bonding

Info

Publication number
JPH0196938A
JPH0196938A JP62255072A JP25507287A JPH0196938A JP H0196938 A JPH0196938 A JP H0196938A JP 62255072 A JP62255072 A JP 62255072A JP 25507287 A JP25507287 A JP 25507287A JP H0196938 A JPH0196938 A JP H0196938A
Authority
JP
Japan
Prior art keywords
wire
bonding
capillary
bonded
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62255072A
Other languages
Japanese (ja)
Inventor
Shigetoshi Ito
伊藤 重寿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP62255072A priority Critical patent/JPH0196938A/en
Publication of JPH0196938A publication Critical patent/JPH0196938A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/0711—Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/0711—Apparatus therefor
    • H10W72/07141—Means for applying energy, e.g. ovens or lasers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07521—Aligning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07531—Techniques
    • H10W72/07532—Compression bonding, e.g. thermocompression bonding
    • H10W72/07533—Ultrasonic bonding, e.g. thermosonic bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07551—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/531—Shapes of wire connectors
    • H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/531—Shapes of wire connectors
    • H10W72/5363—Shapes of wire connectors the connected ends being wedge-shaped
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/551—Materials of bond wires
    • H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/59—Bond pads specially adapted therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/951—Materials of bond pads
    • H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/753—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE:To enable a highly reliable stitch bonding to be made by providing the first and second press parts in the direction of outer periphery of tip surface of capillary, by allowing the first wire press part to protrude toward the part to be bonded as compared with the second wire press part, and by setting the slope angle of the second wire press part surface to an angle exceeding 15 degrees in reference to the main surface of the part to be bonded. CONSTITUTION:A wire 5 is stitch-bonded to the second part to be bonded 4 after bonding. The wire 5 is pressed at the first and second wire press parts 21 and 22 and is crushed so that a thick part 25 and a thin part 20 are produced. Also, the thin part 26 is made to be wider than the thick part 27. The second part to be bonded 4 is heated on this stitch bonding and supersonic vibration is applied to a capillary 6 horizontally to perform thermal contact bonding which also uses supersonic. Thus, an alloy layer of Au-A1 16 is produced. And the wire 5 is cut at the edge of a wire delivery hole 7 of the thin part 26.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、集極回路等を製造する時に信頼性の高いワイ
ヤボンディングを行うことが可能なキャピラリに関する
◎ 〔従来の技術〕 例えば、パワートランジスタテップ1上のA1電極から
成る第1の被ボンディング部分2と駆動用モノリシック
ICチップ3のAI’lE極から成る第2の被ボンディ
ング部分4とをAu細線から成るワイヤ5で接続するこ
とがある。この種のワイヤボンディングを行う場合には
、筐ず、第9四回に示す如く、ワイヤボンダのキャピラ
リ6の中央のワイヤ繰り出し孔7から導出されているワ
イヤ5の先端に1!気スパークまたは水素炎にてボール
8を形成する。ここで、ボール8の直径はワイヤ8の直
径の2〜3倍である。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a capillary that allows highly reliable wire bonding when manufacturing a concentrator circuit, etc. [Prior Art] For example, a power transistor The first bonded portion 2 consisting of the A1 electrode on the step 1 and the second bonded portion 4 consisting of the AI'lE electrode of the driving monolithic IC chip 3 may be connected by a wire 5 made of a thin Au wire. . When performing this type of wire bonding, as shown in Part 94, it is necessary to attach a 1. A ball 8 is formed using a gas spark or a hydrogen flame. Here, the diameter of the ball 8 is two to three times the diameter of the wire 8.

次に、第9図CB+に示すように、パワートランジスタ
テップ1の第1の被ボンディング部分2にボール8をキ
ャピラリ6の先端加圧面9で押し付ける。このとぎ、第
1の被ボンディング部分2は加熱すれており、キャピラ
リ6には第1の被ホンディング部分2の表面と平行する
方向に超音波による振動が加えられている。こうして、
熱圧着ボンディングと超音波ボンディングの併用により
、第1の被ボンディング部分2にワイヤ5が釘頭状に接
続された第1のボンディング部10が形成される。
Next, as shown in FIG. 9 CB+, the ball 8 is pressed against the first bonding target portion 2 of the power transistor TEP 1 by the tip pressurizing surface 9 of the capillary 6. At this time, the first bonded portion 2 is heated, and ultrasonic vibrations are applied to the capillary 6 in a direction parallel to the surface of the first bonded portion 2. thus,
By using thermocompression bonding and ultrasonic bonding in combination, a first bonding portion 10 is formed in which a wire 5 is connected in a nail-head shape to the first bonded portion 2 .

次いで、第9図(C)に示すように、キャピラリ6をワ
イヤ5を繰9出しながら上昇ζセて大きく引き口重よう
にして、モノリシックICチップ6上の第2の被ボンデ
ィング部分4に向って移動する。
Next, as shown in FIG. 9(C), the capillary 6 is raised while letting out the wire 5, and the capillary 6 is pulled wide so that the capillary 6 is pulled out toward the second bonding target portion 4 on the monolithic IC chip 6. and move.

続いて、第9図[F]に示すように、第2の被ボンディ
ング部分4に対してワイヤ5をギヤピラリ6の加圧面9
にて押し当て、ワイヤ5a−押し潰して第2の被ボンデ
ィング部分4に接続する。これにより、第2のボンディ
ング部11が形成される。
Subsequently, as shown in FIG. 9 [F], the wire 5 is connected to the pressure surface 9 of the gear pillar 6 against the second bonding target portion 4.
The wire 5a is crushed and connected to the second bonded portion 4. As a result, the second bonding portion 11 is formed.

このとぎ、第2の被ボンディング部分4は加熱ばれてお
り、キャピラリ6には前述のように超音波振動が加えら
れている。
At this time, the second bonded portion 4 is heated, and the capillary 6 is subjected to ultrasonic vibrations as described above.

最後に、第9図■に示すように、キャピラリ6を所定の
高さまで上昇させ、ワイヤ5をギヤピラIJ 6から繰
り出ざないように固定した状態としてキャピラリ6ケ更
に上昇させてワイヤ5を切断する。
Finally, as shown in Fig. 9 (■), the capillary 6 is raised to a predetermined height, the wire 5 is fixed so that it does not come out from the gear pillar IJ 6, and the capillary 6 is further raised to cut the wire 5. do.

通常、第1のボンティング部10を形成するボンディン
グtボールボンディングと称し、第2のボンディング部
11を形成するボンディングをステッチボンディングと
称する。
Usually, the bonding that forms the first bonding part 10 is called t-ball bonding, and the bonding that forms the second bonding part 11 is called stitch bonding.

[発明が解決りようとする問題点] ところで、従来のキャピラリ6の先端面9は第10図に
拡大図示するように形成されている。即ち、先細状細管
から成るキャピラリ6の先端面9は、ワイヤ繰り出し孔
7の出口の面取り部12の外側に被ボンディング部分4
の主面に対して7変相度の傾斜角度を有するワイヤ加圧
部13を有し、この外側にキャピラリ側面15と先端面
9どの間の面取り部14を有する。
[Problems to be Solved by the Invention] Incidentally, the tip end surface 9 of the conventional capillary 6 is formed as shown in an enlarged view in FIG. That is, the tip surface 9 of the capillary 6 made of a tapered tube has the bonded portion 4 outside the chamfered portion 12 at the outlet of the wire feeding hole 7.
It has a wire pressurizing part 13 having an inclination angle of 7 degrees of phase change with respect to the main surface of the capillary, and has a chamfered part 14 between the capillary side surface 15 and the tip surface 9 on the outside thereof.

キャピラリ6の先端面9を第10図の様に形成した場合
、第9図(81に示すボールボンディングによる第1の
ボンディング部10は問題なく得られるが、第9図■■
に示すステッチボンディングによる第2のボンディング
部11を高い信頼性を有して得ることが困難であった。
When the tip surface 9 of the capillary 6 is formed as shown in FIG. 10, the first bonding part 10 by ball bonding shown in FIG.
It was difficult to obtain the second bonding portion 11 by stitch bonding shown in FIG. 1 with high reliability.

これを次に詳しく説明する。This will be explained in detail next.

Al系の電極にAu系のリード細線を接続すると、その
接合界面にAuA12 ’P AuAlから成るAu 
−A1合金層が形成されることは周知である。第11図
は従来のギヤビラ1J6Y使用してAI電極から成る第
2の被ボンディング部分4にAu細線から成るワイヤ5
ykニスチツチボンディングすることによって得られた
第2のボンディング部11を示す。この第2のボンディ
ング部11にはAu−Al合金層16が生じる。この様
な第2のボンディング部11を有する半導体装置を高温
放置試験(200℃。
When an Au-based thin lead wire is connected to an Al-based electrode, an Au layer consisting of AuA12'P AuAl is formed at the bonding interface.
It is well known that -A1 alloy layers are formed. FIG. 11 shows a wire 5 made of thin Au wire attached to a second bonded part 4 made of an AI electrode using a conventional gear villa 1J6Y.
The second bonding portion 11 obtained by YK-uniform bonding is shown. An Au-Al alloy layer 16 is formed in this second bonding portion 11 . A semiconductor device having such a second bonding portion 11 was subjected to a high temperature storage test (200° C.).

20時間放e)にかけると第12図に示す如<Au−A
l合金層16が成長し、第2のボンディング部11のほ
ぼ全体がAl−Au合金層16になる。この結果、Au
 −A1合金7)16とAual線に基づ<Au層との
間にクラックが発住し、第2のボンディング部11のγ
−プン状態又はこれに近い状態になることがある。なお
、第1のボンディング部10はポールボンディングで形
成ざTするため、第2のボンディング部11よりははる
かに肉厚となってお0.接続の信頼性が高い。
When exposed to air for 20 hours, as shown in Figure 12, <Au-A
The Al alloy layer 16 grows, and almost the entire second bonding part 11 becomes the Al-Au alloy layer 16. As a result, Au
-A1 alloy 7) A crack develops between the <Au layer based on the Aual wire 16 and the γ of the second bonding part 11.
- You may be in a flat state or a state close to this. Note that, since the first bonding part 10 is formed by pole bonding, it is much thicker than the second bonding part 11, and has a thickness of 0.5 mm. Highly reliable connection.

ところで、本件出願人は、高温放置試験におけるAu 
−A1合金層16の成長を調べたところ、厚さ10βm
程度までは急激に成長するが、その後の成長は緩やかに
なることが判明した。また、Au−A1合金層16の上
に、第11図に示す如くワイヤ5に基づ< Au層が残
存していれば、接続不良の発生が少なく、一方、第12
図に示す如<Au−Al合金層16の土にAuMが残存
しないと、接続不良の発生が多くなることも判明(、た
。そこで。
By the way, the applicant has reported that Au
- When the growth of the A1 alloy layer 16 was investigated, it was found that the thickness was 10βm.
It was found that the growth rate is rapid up to a certain point, but the growth after that becomes slower. Furthermore, if an Au layer remains on the Au-A1 alloy layer 16 based on the wire 5 as shown in FIG.
As shown in the figure, it was also found that if no AuM remained in the soil of the Au-Al alloy layer 16, connection failures would occur more frequently.

第10図のキャピラリ6の先端面9におけるワイヤ刀り
圧部16の傾斜角度を大きくし、第2のポンディング部
11の最大の淳さが10μml’越えるようにした。L
かし、傾斜角度を大きくすると。
The inclination angle of the wire blade pressure part 16 on the tip surface 9 of the capillary 6 shown in FIG. 10 was increased so that the maximum thickness of the second pounding part 11 exceeded 10 μml'. L
However, when the inclination angle is increased.

ワイヤ加圧部16によるワイヤ5の径方向C潰す方向)
の押圧力が弱くなり、接続が不完全になった。
radial direction C crushing direction of the wire 5 by the wire pressurizing section 16)
The pressing force became weak and the connection became incomplete.

今、AIRIに対するAuワイヤの接続について述べた
が1合金層が形成される他の金属の組入合せの場合にも
同様な問題が生じる。!た。高温放置試験における加熱
に限ることなく、別な目的の加熱においても同様な問題
が住じる。
Although we have just described the connection of Au wires to AIRI, similar problems arise when other metals are incorporated into one alloy layer. ! Ta. Similar problems occur not only in heating for high-temperature storage tests, but also in heating for other purposes.

そこで、本発明の目的は信頼性の高いステッチポンディ
ングを行うことが可能なキャピラリを提供することにあ
る。
Therefore, an object of the present invention is to provide a capillary capable of performing highly reliable stitch bonding.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点な解決し、上記目的を達成する念めの本発明
は、実施例を示す図面の符号を参照して説明すると、ワ
イヤ5を被ボンディング部4に向って抑圧する念めの先
端面12を有し、この先端面12の中央部に前記ワイヤ
5を繰り出すための孔7’&有し、少なくともステッチ
ポンディングを行うことができるように構成されている
ワイヤポンディング用キャピラリにおいて、前記先端面
12に第1のワイヤ加圧部21と第2のワイヤ加圧部2
2とが設けられ、前記第1のワイヤ加圧部21は前記孔
7の近傍に配置され且つ前記第2のワイヤ加圧部22よ
りも前記被ボンディング部分4に向って突出してお9、
前記第2のワイヤ加圧部22は前記第1のワイヤ加圧部
21よりも前記孔7から離れ喪位置に設けられ、前記第
2のワイヤ加圧部22を前記被ボンディング領域4に対
して前記第1のワイヤ加圧部21よりも離間させるため
に前記第1のワイヤ加圧部21と前記第2のワイヤ加圧
部22との間に段差部23が設けられており、前記第2
のワイヤ加圧部22の主要部の前記孔7に近い側の端と
前記孔7から遠い側の端とを結ぶ直線の前記被ボンディ
ング部分4の主面に対する傾斜角度が15度以下とされ
、前記段差部23の主要部の一端と他端とを結ぶ直線の
前記被ボンディング部分4の主面に対する傾斜角度が1
5度よりも大きく設定されていることを特徴とするワイ
ヤボンディング用キャピラリに係わるものである。
To solve the above problems and achieve the above object, the present invention will be described with reference to the reference numerals in the drawings showing the embodiments. 12, and has a hole 7' for feeding out the wire 5 in the center of the tip surface 12, and is configured to perform at least stitch bonding. A first wire pressure section 21 and a second wire pressure section 2 are provided on the tip surface 12.
2, the first wire pressure section 21 is disposed near the hole 7 and protrudes toward the bonded portion 4 from the second wire pressure section 22;
The second wire pressurizing part 22 is provided at a position farther from the hole 7 than the first wire pressurizing part 21, and the second wire pressurizing part 22 is placed at a position farther away from the hole 7 than the first wire pressurizing part 21, and A stepped portion 23 is provided between the first wire pressing portion 21 and the second wire pressing portion 22 so that the first wire pressing portion 21 and the second wire pressing portion 22 are spaced apart from each other.
The inclination angle of the straight line connecting the end of the main part of the wire pressurizing part 22 closer to the hole 7 and the end farther from the hole 7 with respect to the main surface of the bonded part 4 is 15 degrees or less, The angle of inclination of the straight line connecting one end and the other end of the main portion of the stepped portion 23 with respect to the main surface of the bonded portion 4 is 1.
The present invention relates to a capillary for wire bonding characterized in that the angle is set larger than 5 degrees.

〔作 用〕[For production]

上記発明における第1のワイヤ加圧部21は段差部26
を介して突出しているので、第2のワイヤ加圧部22と
被ボンディング部分4との間の距離ヲ決メるためのスペ
ーサのような機能を有する。
The first wire pressure section 21 in the above invention has a stepped section 26.
Since it protrudes through the wire, it has a function like a spacer for determining the distance between the second wire pressurizing part 22 and the bonded part 4.

従って、ステッチポンディングした時に被ポンディング
部分4の上に第1のワイヤ加圧部21の突出量以上の肉
厚部分を有するボンディング部11が生じる。ボンディ
ング部11の肉厚を所定範囲に収めれば、必要なワイヤ
押圧力が得られ、且つ必要な接続強度及び信頼性が得ら
れる。
Therefore, when stitch bonding is performed, a bonding portion 11 having a wall thickness greater than the protrusion amount of the first wire pressurizing portion 21 is generated on the bonded portion 4 . If the thickness of the bonding portion 11 is kept within a predetermined range, the necessary wire pressing force can be obtained, and the necessary connection strength and reliability can be obtained.

〔実施例〕〔Example〕

次に1本発明の一実施例に係わるキャピラリ及びこれを
使用したワイヤポンディング方法を第1図〜第7図によ
って説明する。但し、第1図〜第7図において、第8図
〜第12図と実質的に同一な部分には同一の符号ケ付し
てその説明を省略する。
Next, a capillary according to an embodiment of the present invention and a wire bonding method using the same will be explained with reference to FIGS. 1 to 7. However, in FIGS. 1 to 7, parts that are substantially the same as those in FIGS. 8 to 12 are given the same reference numerals, and their explanations will be omitted.

この実施例のキャピラリ6の先端面9には、ワイヤ繰り
出し孔7の出口の面取9部12を埋伏に囲むように第1
のワイヤ加圧部21が設けられ。
In this embodiment, the tip surface 9 of the capillary 6 has a first groove so as to surround the chamfered portion 12 at the outlet of the wire feeding hole 7.
A wire pressure section 21 is provided.

この外側に段差部23t/介して第2のワイヤ加圧部2
2が設けられ、更にこの外側に側面部15と第2のワイ
ヤ加圧部22との間の面取り部14が設けられている。
A second wire pressure section 2 is provided on the outside of this via a stepped section 23t/
2 is provided, and furthermore, a chamfered portion 14 between the side surface portion 15 and the second wire pressurizing portion 22 is provided on the outside thereof.

ワイヤ繰り出し孔7、面取り部12、第1のワイヤ加圧
部211段差部23.第2のワイヤ加圧部22.及び面
取り部14は第2図に示す如く同心円状に配設されてい
る。
Wire feeding hole 7, chamfered portion 12, first wire pressing portion 211 step portion 23. Second wire pressure section 22. The chamfered portions 14 are arranged concentrically as shown in FIG.

第1のワイヤ加圧部21はA1電極から成る被ボンディ
ング部分4の主面に対してほぼ平行に形成され、第2の
ワイヤ加圧部22は従来のワイヤ加圧部15と同様に約
7度の傾斜を有する。第1のワイヤ加圧面21と第2の
ワイヤ加圧面22との間の段差部23#−tMボンディ
ング部分4に対して約45度の傾斜角度を有し、垂直方
向の高言成分は約15μmである。従って、第1のワイ
ヤ加圧部21は第2のワイヤ加圧部22の内周側端から
下方に15μm突出している。第1のワイヤ加圧部21
の半径方向の幅WIは約10μmであり、第2のワイヤ
加圧部22の半径方向のsW、は約50μmである。な
お、幅WIは10〜20μm、幅W2#240〜60μ
m程度にすることが望ましい。ま念、段差部26の半径
方向の幅をWsと丁れば、(Wl + Ws ) / 
Wzを1/6〜2/3程度にすることが好ましく、11
5〜1/2程度にすることが一層好ましい。Wzをワイ
ヤ5の直径りとの関係で考えると。
The first wire pressing section 21 is formed approximately parallel to the main surface of the bonded portion 4 made of the A1 electrode, and the second wire pressing section 22 is approximately It has a degree of slope. The stepped portion 23#-tM between the first wire pressing surface 21 and the second wire pressing surface 22 has an inclination angle of approximately 45 degrees with respect to the bonding portion 4, and the vertical component is approximately 15 μm. It is. Therefore, the first wire pressing section 21 protrudes downward by 15 μm from the inner circumferential end of the second wire pressing section 22. First wire pressure section 21
The radial width WI of the second wire pressing section 22 is approximately 10 μm, and the radial width sW of the second wire pressurizing portion 22 is approximately 50 μm. Note that the width WI is 10 to 20 μm, and the width W2 is 240 to 60 μm.
It is desirable to set it to about m. Just to be sure, if we divide the width of the stepped portion 26 in the radial direction by Ws, then (Wl + Ws) /
It is preferable to set Wz to about 1/6 to 2/3, and 11
It is more preferable to set it to about 5 to 1/2. Considering Wz in relation to the diameter of the wire 5.

W!/D ’!+’ 1〜2にすることが好ましい。W! /D'! +' It is preferable to set it to 1-2.

次に、このキャピラリ6を使用して第8図と同様なワイ
ヤボンディングを行う方法及びボンディング状態を説明
する。
Next, a method of performing wire bonding similar to that shown in FIG. 8 using this capillary 6 and a bonding state will be described.

ワイヤボンディングの方法は従来と同様であり。The wire bonding method is the same as the conventional method.

ます、トランジスタチップ1のA1電極から成る厚ざ3
〜5μmの第1の被ボンディング部分2に直径30μm
のAu細線から成るワイヤ5をボールボンディングする
。第7図はボールボンディング後の状態を示す。ボール
はキャピラリ6の先端面9の第1及び第2のワイヤ7)
0圧部21,22で押圧されるために、第1のワイヤ加
圧面21に対応して環状#1124が少じる。第1のボ
ンディング部10の環状溝24の部分は他の部分よりも
肉薄になるが、ワイヤ5の直径の2〜6倍のボールに基
づく第1のボンディング部10は第2のボンディング部
11に比べて厚いので、#124に基づく接続強度の低
下はほとんど生じない。
The thickness 3 consisting of the A1 electrode of the transistor chip 1
~5μm first bonded part 2 with a diameter of 30μm
A wire 5 made of thin Au wire is ball-bonded. FIG. 7 shows the state after ball bonding. The balls are connected to the first and second wires 7 on the tip surface 9 of the capillary 6)
Since it is pressed by the zero pressure parts 21 and 22, the annular #1124 is slightly reduced corresponding to the first wire pressing surface 21. Although the annular groove 24 portion of the first bonding portion 10 is thinner than other portions, the first bonding portion 10 based on the ball 2 to 6 times the diameter of the wire 5 is connected to the second bonding portion 11. Since it is thicker than #124, there is almost no reduction in connection strength due to #124.

次に、ICチップ3の厚さ3〜5μmのAItiから成
る第2の被ボンディング部分4の士にキャピラリ6を第
9図■及び第1図に示すように移動し、第2の被ボンデ
ィング部分4にワイヤ5をステッチボンディングする。
Next, the capillary 6 is moved between the second bonded parts 4 made of AIti with a thickness of 3 to 5 μm of the IC chip 3 as shown in FIG. Stitch bond the wire 5 to 4.

ワイヤ5は第1及び第2のワイヤ加圧部21.22で押
圧され、厚さ15μm以上の肉厚部25とこれよりも1
5μm薄い肉薄部26とが生じるよ5に潰これる。なH
1肉薄部26は肉厚部27よりも幅広になる。このステ
ッチボンディングの時も従来と同様に第2の被ボンディ
ング部分4を刃口熱し、キャピラリ6には水平方向の超
音波振動を与え、超音波併用熱圧着ボンディングを行う
。このため、第5図に示す如<Au−Al合金層16が
生じる。
The wire 5 is pressed by the first and second wire pressurizing parts 21, 22, and a thick part 25 with a thickness of 15 μm or more and a thick part 15 μm thicker than this are pressed.
It collapses into 5 so that a 5 μm thin wall portion 26 is formed. NaH
1. The thinner part 26 is wider than the thicker part 27. At the time of this stitch bonding, the second bonded portion 4 is heated at the cutting edge, and horizontal ultrasonic vibration is applied to the capillary 6, so that ultrasonic thermocompression bonding is performed. Therefore, an Au--Al alloy layer 16 is formed as shown in FIG.

しかる後、従来と同様な方法でワイヤ5を切断する。ワ
イヤ5は第5図に示す如く肉薄部26のワイヤ繰り出し
孔7側の端で切断される。
Thereafter, the wire 5 is cut in a conventional manner. The wire 5 is cut at the end of the thin portion 26 on the wire feeding hole 7 side, as shown in FIG.

本実施例は次の利点を有する。This embodiment has the following advantages.

+I+  第1のワイヤ加圧部21と第2のワイヤ加圧
部22との間に約15μmの段差があるので。
+I+ Because there is a level difference of about 15 μm between the first wire pressure section 21 and the second wire pressure section 22.

第2のボンディング部11に肉厚部25y!−確実に得
ることができる。このため、高温放置試験(200℃、
20時間放置)が行われても、第6図に示す如(Au−
A1合金層16の上部にAu層5aを残存ざセることが
でき、接続不良の発生率が少なくなる。
Thick part 25y in second bonding part 11! - You can definitely get it. For this reason, high temperature storage tests (200℃,
Even if left for 20 hours, the Au-
The Au layer 5a can be left on top of the A1 alloy layer 16, and the incidence of connection failures is reduced.

(21第2のワイヤ加圧部22の傾斜角度を7度として
いるので、ここでワイヤ5を径方向に十分に抑圧するこ
とができる。従って、良好なステッチボンディングが達
成される。
(21) Since the inclination angle of the second wire pressurizing portion 22 is 7 degrees, the wire 5 can be sufficiently suppressed in the radial direction. Therefore, good stitch bonding is achieved.

〔変形例〕[Modified example]

本発明は上記の実施例に限定されるものではなく1例え
ば次の変形が可能なものである。
The present invention is not limited to the above-described embodiments, but can be modified, for example, as follows.

(II  第2のワイヤ加圧部22の被ボンティング部
分4に対する傾斜角度は15度以下であることが好fL
<、5〜10度の範囲が更に好ましいことが確認されて
いる。15度を越えると加圧不足となり、良好なステッ
チボンディングが不可能になる。実施例ではこの角度を
7度としたが、上記範囲で種々変えることができる。
(II) It is preferable that the inclination angle of the second wire pressurizing part 22 with respect to the bonded part 4 is 15 degrees or less.
It has been confirmed that a range of <, 5 to 10 degrees is more preferable. If it exceeds 15 degrees, the pressure will be insufficient and good stitch bonding will not be possible. In the embodiment, this angle was set to 7 degrees, but it can be varied within the above range.

(2)段差部23の被ボンディング部分4に対する角度
は第2のワイヤ加圧部22の角度よりも大きいこと即ち
15度よりも大きいことが必要であり、少ない面積で必
要な段差を得るために、60〜60度の範囲が好ましい
。実施例では45度とされているが上記範囲で適宜変え
ても差し支えない。
(2) The angle of the step portion 23 with respect to the bonding target portion 4 needs to be larger than the angle of the second wire pressurizing portion 22, that is, larger than 15 degrees, in order to obtain the necessary step with a small area. , preferably in the range of 60 to 60 degrees. Although the angle is set at 45 degrees in the embodiment, it may be changed as appropriate within the above range.

(31直径30μmのワイヤ5をステッチボンディング
する場合、肉厚部25の厚ざを15〜20μm、肉薄部
の厚ざを6〜5μm程度にすると。
(31 When stitch-bonding the wire 5 with a diameter of 30 μm, the thickness of the thick portion 25 is set to 15 to 20 μm, and the thickness of the thin portion is set to approximately 6 to 5 μm.

良好なワイヤボンディングが可能である。従って。Good wire bonding is possible. Therefore.

第1のワイヤ加圧部21と第2のワイヤ加圧部22との
段差V10〜20μm程度にすることが好ましい。即ち
段差はワイヤ゛5の太ばの1/3〜2/3程度が好オし
い。
It is preferable that the step difference V between the first wire pressure section 21 and the second wire pressure section 22 be approximately 10 to 20 μm. That is, it is preferable that the level difference is about 1/3 to 2/3 of the width of the wire 5.

(4)第1のワイヤ加圧部21の平坦面を有ζない形状
であってもよい。即ち段差部23と第1のワイヤ加圧面
21と面取り部12aとを合せて断面半円状の突出部、
又は2次曲線状突出部等にしてもよい。又、第1のワイ
ヤ加圧部21も被ボンディング部分4に対して適当な峻
斜角度を有していてもよい。
(4) The first wire pressurizing portion 21 may have a shape without a flat surface. That is, the stepped portion 23, the first wire pressure surface 21, and the chamfered portion 12a are combined to form a protruding portion having a semicircular cross section;
Alternatively, it may be a quadratic curved protrusion. Further, the first wire pressurizing portion 21 may also have an appropriate steep angle with respect to the bonding target portion 4.

(5)  被ボンディング部分4がAI 、ワイヤ5が
んの場合のワイヤボンティングに好都合であるが。
(5) This is convenient for wire bonding when the bonded portion 4 is made of AI and the wire 5 is made of cancer.

同様な問題が生じる他の金属の組み合せの場合にも適用
可能である。又、合金による問題がない場合においても
、所定値以上の厚ざの肉厚部25yill−得ることが
できるので、良好なワイヤボンディングが可能になる。
It is also applicable to other metal combinations where similar problems occur. Further, even if there is no problem due to the alloy, it is possible to obtain a thick wall portion 25yill with a thickness greater than a predetermined value, making it possible to perform good wire bonding.

〔発明の効果〕〔Effect of the invention〕

上述のように本発明によれば、信頼性の高いワイヤボン
ディングを行うことが可能なキャピラリを提供すること
ができる。
As described above, according to the present invention, a capillary capable of performing highly reliable wire bonding can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例に係わるキャピラリを第2図の
I−1線に相当する部分で示す断面図。 第2図は第1図のキャピラリの先端面を示す底面図。 第6図は第1図のキャピラリでステッチボンディングを
行う状態を示す断面図。 第4図は第1図のキャピラリによる第2のボンディング
部を示す平面図。 第5図は第1図のキャピラリによる第2のボぐディング
部の断面図。 第6図は第5図のものを高温数fIt試験した後の状態
を示す断面図、 第7図は第1図の羊ヤビラリによる第1のボンディング
部を示す断面図。 第8図はワイヤボンディングを行う半導体装置の一部を
示す正面図。 第9図(At(Bj(C)Ω■はワイヤボンディングの
方法をステップ順に説明するための断面図、第10図は
従来のキャピラリによるステッチボンティングを示す断
面図。 第11図は従来のキャピラリによるステッチボンディン
グ部の断面内、 第12図は第11図のものを高温放置試験した後の状態
を示す断面図である゛。 2・・・第1の被ボンディング部分、4・・・第2の被
ボンディング部分、5・・・ワイヤ、6・・・キャピラ
リ、7・・・ワイヤ繰り出し孔、 10−・・第1のボ
ンディング部、 11 ・・・第2のボンディング部、
21・・・第1のワイヤ加圧部、22・・・第2のワイ
ヤ加圧部、26・・・段差部。 代  理  人   高  野  則  次第1図 フ 第8図 第8図 第9図 (C)             (D)]1 (E) 手続補正書(自発) 昭和62年12月30日 1、 7IG件の表示 昭和62  年 籍 肝   III  第25507
2号2、発明の名称  ワイヤボンディング用キャピラ
リ3、補正をする考 事件との関係   出願人 住fat     埼玉県新座市北野三丁目6爵3号4
、代理人 5、補正命令の日付  自 発 6、補正により増加する発明の数 +11  明細書第2頁第18行の「例えば、」の後に
「第9図Ωに示すように」を加入する。
FIG. 1 is a sectional view showing a capillary according to an embodiment of the present invention at a portion corresponding to line I-1 in FIG. 2. FIG. 2 is a bottom view showing the tip of the capillary shown in FIG. 1. FIG. 6 is a sectional view showing a state in which stitch bonding is performed using the capillary of FIG. 1. FIG. 4 is a plan view showing a second bonding portion using the capillary of FIG. 1; FIG. 5 is a sectional view of the second bogging portion by the capillary of FIG. 1. FIG. 6 is a sectional view showing the state of the item shown in FIG. 5 after being subjected to a high-temperature fIt test, and FIG. 7 is a sectional view showing the first bonding portion by the sheep yabbirari in FIG. 1. FIG. 8 is a front view showing a part of a semiconductor device that performs wire bonding. Figure 9 (At(Bj(C)Ω) is a cross-sectional view for explaining the wire bonding method step by step. Figure 10 is a cross-sectional view showing stitch bonding using a conventional capillary. Figure 11 is a cross-sectional view showing stitch bonding using a conventional capillary. Fig. 12 is a sectional view showing the state of the stitch bonding part shown in Fig. 11 after being subjected to a high-temperature storage test. 2...first bonded part, 4...second part 5... wire, 6... capillary, 7... wire feeding hole, 10-... first bonding part, 11... second bonding part,
21... First wire pressure section, 22... Second wire pressure section, 26... Step portion. Agent Nori Takano Figure 1 Figure 8 Figure 8 Figure 9 (C) (D)] 1 (E) Procedural amendment (voluntary) December 30, 1988 1, 7 IG indication Showa 62 years Registration Liver III No. 25507
No. 2 No. 2, Title of the invention Wire bonding capillary 3, Relationship to the case to be amended Applicant residence fat 3-4 No. 6, Kitano 3-chome, Niiza City, Saitama Prefecture
, Agent 5, Date of amendment order Voluntary 6, Number of inventions increased by amendment + 11 Add ``as shown in Figure 9 Ω'' after ``for example'' on page 2, line 18 of the specification.

Claims (1)

【特許請求の範囲】 〔1〕ワイヤ(5)を被ボンディング部(4)に向つて
押圧するための先端面(12)を有し、この先端面(1
2)の中央部に前記ワイヤ(5)を繰り出すための孔(
7)を有し、少なくともステッチボンディングを行うこ
とができるように構成されているワイヤボンディング用
キャピラリにおいて、 前記先端面(12)に第1のワイヤ加圧部(21)と第
2のワイヤ加圧部(22)とが設けられ、 前記第1のワイヤ加圧部(21)は前記孔(7)の近傍
に配置され且つ前記第2のワイヤ加圧部(22)よりも
前記被ボンディング部分(4)に向つて突出しており、
前記第2のワイヤ加圧部(22)は前記第1のワイヤ加
圧部(21)よりも前記孔(7)から離れた位置に設け
られ、 前記第2のワイヤ加圧部(22)を前記被ボンディング
領域(4)に対して前記第1のワイヤ加圧部(21)よ
りも離間させるために前記第1のワイヤ加圧部(21)
と前記第2のワイヤ加圧部(22)との間に段差部(2
3)が設けられており、 前記第2のワイヤ加圧部(22)の主要部の前記孔(7
)に近い側の端と前記孔(7)から遠い側の端とを結ぶ
直線の前記被ボンディング部分(4)の主面に対する傾
斜角度が15度とされ、 前記段差部(23)の主要部の一端と他端とを結ぶ直線
の前記被ボンディング部分(4)の主面に対する傾斜角
度が15度よりも大きく設定されていることを特徴とす
るワイヤボンディング用キャピラリ。
[Scope of Claims] [1] It has a tip end surface (12) for pressing the wire (5) toward the bonding target part (4), and the tip end surface (1
2) has a hole (
7) and is configured to perform at least stitch bonding, the tip surface (12) having a first wire pressurizing part (21) and a second wire pressurizing part (21). a portion (22), and the first wire pressing portion (21) is disposed near the hole (7) and is located closer to the bonded portion (22) than the second wire pressing portion (22). 4) protrudes toward
The second wire pressurizing part (22) is provided at a position farther from the hole (7) than the first wire pressurizing part (21), and the second wire pressurizing part (22) The first wire pressure section (21) is spaced apart from the bonding region (4) more than the first wire pressure section (21).
and the second wire pressure section (22).
3) is provided, and the hole (7) in the main part of the second wire pressurizing part (22) is provided.
) and the end far from the hole (7), the inclination angle of the straight line connecting the end near the hole (7) with respect to the main surface of the bonded part (4) is 15 degrees, and the main part of the step part (23) A capillary for wire bonding, characterized in that an inclination angle of a straight line connecting one end and the other end with respect to the main surface of the bonded portion (4) is set to be larger than 15 degrees.
JP62255072A 1987-10-09 1987-10-09 Capillary for wire bonding Pending JPH0196938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62255072A JPH0196938A (en) 1987-10-09 1987-10-09 Capillary for wire bonding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62255072A JPH0196938A (en) 1987-10-09 1987-10-09 Capillary for wire bonding

Publications (1)

Publication Number Publication Date
JPH0196938A true JPH0196938A (en) 1989-04-14

Family

ID=17273745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62255072A Pending JPH0196938A (en) 1987-10-09 1987-10-09 Capillary for wire bonding

Country Status (1)

Country Link
JP (1) JPH0196938A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5029747A (en) * 1989-12-20 1991-07-09 Microelectronics And Computer Technology Corporation Apparatus for replacing defective electronic components
US5485949A (en) * 1993-04-30 1996-01-23 Matsushita Electric Industrial Co., Ltd. Capillary for a wire bonding apparatus and a method for forming an electric connection bump using the capillary

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6027434B2 (en) * 1978-02-17 1985-06-28 カシオ計算機株式会社 Aggregation method in electronic cash register

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6027434B2 (en) * 1978-02-17 1985-06-28 カシオ計算機株式会社 Aggregation method in electronic cash register

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5029747A (en) * 1989-12-20 1991-07-09 Microelectronics And Computer Technology Corporation Apparatus for replacing defective electronic components
US5485949A (en) * 1993-04-30 1996-01-23 Matsushita Electric Industrial Co., Ltd. Capillary for a wire bonding apparatus and a method for forming an electric connection bump using the capillary

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