JPH02102038A - Corrosion resistant metal plate - Google Patents

Corrosion resistant metal plate

Info

Publication number
JPH02102038A
JPH02102038A JP25478788A JP25478788A JPH02102038A JP H02102038 A JPH02102038 A JP H02102038A JP 25478788 A JP25478788 A JP 25478788A JP 25478788 A JP25478788 A JP 25478788A JP H02102038 A JPH02102038 A JP H02102038A
Authority
JP
Japan
Prior art keywords
film
metal plate
organic
inorganic
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25478788A
Other languages
Japanese (ja)
Inventor
Toshihiro Yoshida
吉田 敏裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Aluminum Co Ltd
Original Assignee
Furukawa Aluminum Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Aluminum Co Ltd filed Critical Furukawa Aluminum Co Ltd
Priority to JP25478788A priority Critical patent/JPH02102038A/en
Publication of JPH02102038A publication Critical patent/JPH02102038A/en
Pending legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To form a composite film durable against an external damage and having excellent corrosion resistant effect on a metal plate by forming inorganic or organic film, or an inorganic-organic composite film on the surface of the plate, and forming a thin and dense plasma polymerizable film thereon. CONSTITUTION:An inorganic or organic film, or an inorganic-organic film is provided on a metal plate, and a plasma polymerizable film is provided thereon. In this case, it is desirable to form by varying the material of the polymerizable film in a sectional direction. The plate is desirably made of aluminum or aluminum alloy. Thus, the plate has excellent corrosion resistance, no corrosion even in acid or alkaline atmosphere, and the film can endure against an external damage.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、複合皮膜を表面に有する耐食性に優れた金属
板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a metal plate having excellent corrosion resistance and having a composite coating on its surface.

(従来の技術) 従来、金属板の耐食性を改善するため表面に皮膜を形成
することが行われており、例えばアルミニウム又はアル
ミニウム合金板(以下単にアルミニウム板という)表面
に、アルマイト皮膜、ベーマイト皮膜やリン酸クロメー
ト皮膜等の無機系皮膜又は有機塗料皮膜の有機系皮膜、
あるいは無機系と有機系皮膜から成る複合皮膜を形成す
ることが行われている。
(Prior Art) Conventionally, a film has been formed on the surface of a metal plate to improve its corrosion resistance. For example, an alumite film, a boehmite film, or Inorganic films such as phosphoric acid chromate films or organic films such as organic paint films,
Alternatively, a composite film consisting of an inorganic film and an organic film is formed.

(発明が解決しようとする課題) ところが、これらの皮膜中には、アルミニウム板表面に
介在している不純物や、塗料の乾燥時の溶剤の蒸散等に
起因するピンホールが数多く含まれており、所望する耐
食性の効果が得にくい、また、これらの皮膜は、アルカ
リや酸により溶解あるいはふくれを生じやすく、これら
の雰囲気中での従来のアルミニウム板材の活用は困難で
あった。
(Problem to be Solved by the Invention) However, these films contain many pinholes caused by impurities present on the surface of the aluminum plate and evaporation of the solvent during drying of the paint. It is difficult to obtain the desired corrosion resistance effect, and these films tend to dissolve or blister due to alkali or acid, making it difficult to utilize conventional aluminum plate materials in these atmospheres.

本発明はかかる問題点を解決すべく、金属板表面に緻密
でピンホールをほとんど含まず、アルカリ及び酸に安定
な皮膜を形成させた。耐食性に優れた金属板を提供する
ものである。
In order to solve this problem, the present invention forms a dense film on the surface of a metal plate that contains almost no pinholes and is stable against alkalis and acids. The present invention provides a metal plate with excellent corrosion resistance.

(課題を解決するための手段) 本発明者らは、上記の目的を達成するため種々検討を重
ねた結果、有機モノマーガスを電界中又は不活性ガス等
のプラズマ中にさらすことにより得られる有機モノマー
の活性種が固体表面で重合反応することにより形成され
るプラズマ重合膜が、高度に架橋した緻密な分子構造を
有しており、ピンホールをほとんど含まず化学的に安定
であり、その成膜速度が極めて遅((<0.IILm/
m1n)、プラズマ重合膜単独で外傷に耐える厚さとす
るのは経済的でないが、金属板表面にある程度の厚さの
無機もしくは有機皮膜又は無機・有機複合皮膜を形成さ
せ、その上に緻密なプラズマ重合膜を薄く形成させるこ
とにより、金属板上に、外傷に耐え、かつ、防食効果の
優れた複合皮膜を形成しうることを見出し、この知見に
基づき本発明を完成するに至った。
(Means for Solving the Problem) As a result of various studies to achieve the above object, the present inventors have discovered that an organic monomer gas can be obtained by exposing an organic monomer gas to an electric field or plasma such as an inert gas. The plasma-polymerized film, which is formed by the polymerization reaction of active species of monomers on the solid surface, has a highly crosslinked, dense molecular structure, contains almost no pinholes, is chemically stable, and is The film speed is extremely slow ((<0.IILm/
m1n), it is not economical to make a plasma polymerized film alone to a thickness that can withstand external damage, but it is possible to form an inorganic or organic film or an inorganic/organic composite film of a certain thickness on the surface of a metal plate, and then apply dense plasma polymerization on top of it. The inventors have discovered that by forming a thin polymer film, it is possible to form a composite film on a metal plate that is resistant to external damage and has an excellent anticorrosion effect, and based on this knowledge, the present invention has been completed.

すなわち本発明は、(1)金属板表面に無機もしくは有
機皮膜又は無機・有機複合皮膜を設け、その上にプラズ
マ重合膜を設けてなることを特徴とする耐食性金属板、
(2)プラズマ重合膜の膜質が断面方向に変化してなる
前記(1)記載の耐食性金属板、及び(3)金属板がア
ルミニウム又はアルミニウム合金板である前記(1)又
は(2)記載の耐食性金属板を提供するものである。
That is, the present invention provides (1) a corrosion-resistant metal plate characterized in that an inorganic or organic film or an inorganic/organic composite film is provided on the surface of the metal plate, and a plasma polymerized film is provided thereon;
(2) the corrosion-resistant metal plate described in (1) above, in which the film quality of the plasma polymerized film changes in the cross-sectional direction; and (3) the corrosion-resistant metal plate described in (1) or (2) above, wherein the metal plate is an aluminum or aluminum alloy plate. The present invention provides a corrosion-resistant metal plate.

本発明の金属板とは、鋼板、銅板、アルミニウム板、マ
グネシウム板、ステンレス板、これらの合金板などであ
り、これらはその合金板を包含し腐食性を有する金属な
らば全てのものを包含する。また金属板の厚さ、形態は
特に制限されるものではない。
The metal plate of the present invention includes a steel plate, a copper plate, an aluminum plate, a magnesium plate, a stainless steel plate, an alloy plate thereof, etc., and these include alloy plates thereof, and include all corrosive metals. . Further, the thickness and shape of the metal plate are not particularly limited.

また、本発明において、金属板表面に形成される無機皮
膜としては、例えばアルマイト皮膜。
In the present invention, the inorganic film formed on the surface of the metal plate is, for example, an alumite film.

ベーマイト皮膜、リン酸クロメート皮膜等であり、また
有機皮膜としては、例えばアクリル系、エポキシ系、ポ
リエステル系、ウレタン系等の熱硬化型有機塗料により
得られる塗膜である。これらの膜厚はベーマイト皮膜及
びリン酸クロメート皮膜を除いて0.5〜10ILm、
特に1〜5pmの範囲が好ましい、この膜厚が薄すぎる
と皮膜の機械強度が乏しく、傷が付きやすく、また厚す
ぎると経済的でなくなるのと同時にプラズマ重合膜の形
成が困難となる。ベーマイト皮膜及びリン酸クロメート
皮膜の場合は0.01〜0.5JLmの範囲が好ましい
These include a boehmite film, a phosphoric acid chromate film, and the like. Examples of organic films include coatings obtained using thermosetting organic paints such as acrylic, epoxy, polyester, and urethane paints. The thickness of these films is 0.5 to 10 ILm, excluding the boehmite film and phosphoric acid chromate film.
In particular, a range of 1 to 5 pm is preferable. If the film thickness is too thin, the film will have poor mechanical strength and will be easily scratched. If it is too thick, it will become uneconomical and at the same time it will be difficult to form a plasma polymerized film. In the case of a boehmite film and a phosphoric acid chromate film, the range is preferably from 0.01 to 0.5 JLm.

また、無機・有機複合皮膜とする場合には、上記にあげ
た無機、有機膜を任意に組合わせればよい。
Further, in the case of forming an inorganic/organic composite film, the above-mentioned inorganic and organic films may be arbitrarily combined.

また、プラズマ重合膜は1例えば真空容器中を排気後、
この中に有機モノマーガス、あるいはキャリアガスと有
機モノマーガスを導入し、容器中に設けである平行平板
型の電極に高周波を印加してこの電極間にプラズマを発
生させ形成することができる。このとき無機、有機又は
無機・有機複合皮膜を表面に有した金属板の位置は、ガ
ス導入口の位置により変化するが、多くの場合は対向電
極板間又は電極板上とする。
In addition, the plasma polymerized film can be prepared by
An organic monomer gas or a carrier gas and an organic monomer gas are introduced into the container, and a high frequency is applied to parallel plate electrodes provided in the container to generate plasma between the electrodes. At this time, the position of the metal plate having an inorganic, organic, or inorganic/organic composite film on its surface varies depending on the position of the gas inlet, but in most cases it is between opposing electrode plates or on the electrode plate.

プラズマ重合膜の形成に使用する有機モノマーとしては
、常温で気体、液体、固体のいずれでもよく、液体及び
固体の場合はこれらを気化させて行うことはもちろんで
ある。有機モノマーとしては例えば、メタン、エタン、
プロパン、エチレン、アセチレン、プロピレン、CF4
.C2F4、C3F8、C2F4、C3F4等の気体状
モノマー、ベンゼン、ヘキサン、トルエン、スチレン、
キシレン、メタアクリル酸メチル等の液体状モノマー、
ナフタレン、アントラセン、ジベンジル等の固体状モノ
マー等のいずれを用いてもよい、また、キャリアーガス
としては1例えばアルゴン、ヘリウム等の不活性ガスを
好ましく用いることができる。なお真空容器内の圧力は
、ガス導入前で0.001〜0.5Torr、好ましく
は0−001〜0.  ITorr、有機モノマーガス
あるいはキャリアーガスと有機モノマーガス導入時で0
.005〜1Torr、好ましくは0.O1〜0.5T
orrである。
The organic monomer used to form the plasma polymerized film may be in the form of gas, liquid, or solid at room temperature, and in the case of liquid or solid, it is of course possible to vaporize these. Examples of organic monomers include methane, ethane,
Propane, ethylene, acetylene, propylene, CF4
.. Gaseous monomers such as C2F4, C3F8, C2F4, C3F4, benzene, hexane, toluene, styrene,
Liquid monomers such as xylene and methyl methacrylate,
Any solid monomer such as naphthalene, anthracene, dibenzyl, etc. may be used, and as the carrier gas, for example, an inert gas such as argon, helium, etc. can be preferably used. The pressure inside the vacuum container is 0.001 to 0.5 Torr, preferably 0-001 to 0.0 Torr before the gas is introduced. ITorr, 0 when introducing organic monomer gas or carrier gas and organic monomer gas
.. 005 to 1 Torr, preferably 0.005 to 1 Torr, preferably 0. O1~0.5T
It is orr.

また対向平板電極に高周波を印加してプラズマ重合膜を
形成する場合、高周波電源出力及び電極表面のエネルギ
ー密度は好ましくは、それぞれ10〜500W、0 、
1〜2W/ crn”、より好ましくはそれぞれ50〜
200W、0.2〜IW / c m″の範囲に調整す
る。
In addition, when forming a plasma polymerized film by applying high frequency to the facing flat electrode, the high frequency power output and the energy density of the electrode surface are preferably 10 to 500 W, 0 to 500 W, respectively.
1~2W/crn”, more preferably 50~
200W, adjusted to the range of 0.2~IW/cm''.

金属板上に無機、有機又は無機・有機複合皮膜を形成し
、その上にプラズマ重合膜を形成する場合、そのプラズ
マ重合膜の厚さは0.05〜2ILm、好ましくは0.
1〜11Lmとするのがよい、プラズマ重合膜の厚さが
薄すぎると均一な膜が得にくく、また厚すぎると成膜時
間が長くなり経済性が悪く、膜の密着性も悪化する。
When an inorganic, organic, or inorganic/organic composite film is formed on a metal plate and a plasma polymerized film is formed thereon, the thickness of the plasma polymerized film is 0.05 to 2 ILm, preferably 0.02 ILm.
The thickness of the plasma polymerized film is preferably 1 to 11 Lm. If the thickness of the plasma polymerized film is too thin, it will be difficult to obtain a uniform film, and if it is too thick, the film formation time will be long, which will be uneconomical, and the adhesion of the film will also deteriorate.

ところで、プラズマ重合膜の形成においである範囲のm
漂出力と有機モノマーガスあるいはキャリアーガスと有
機モノマーガス圧(ガス導入時)の条件で形成されたプ
ラズマ重合膜は被処理材表面との密着性が良好となる。
By the way, in the formation of a plasma polymerized film, a certain range of m
A plasma polymerized film formed under the conditions of drift force and organic monomer gas or carrier gas and organic monomer gas pressure (at the time of gas introduction) has good adhesion to the surface of the treated material.

すなわち密着性が良好となる電源出力と有機子ツマーガ
スあるいはキャリアーガスと有機モノマーガスの混合ガ
ス圧の範囲は両方ともに0.005〜ITorrである
That is, the range of the power supply output and the mixed gas pressure of the organic monomer gas or the carrier gas and the organic monomer gas in which good adhesion is obtained are both 0.005 to ITorr.

この範囲より高出力、あるいは低ガス圧で形成した場合
、密着性は悪化するが膜はさらに緻密となり防食性が良
好となる。よって被処理材表面との密着性及び防食性を
同時に満足させるために下層で密着性が良好で、上層で
緻密で防食性良好なプラズマ重合膜を、成膜条件を連続
的あるいは断続的に変化させて形成する方法が有効であ
る。このような変化させる条件は、電源出力とガス圧が
ある。
If the film is formed at a higher power or a lower gas pressure than this range, the adhesion will deteriorate, but the film will become denser and the corrosion resistance will be better. Therefore, in order to simultaneously satisfy adhesion to the surface of the treated material and corrosion resistance, a plasma polymerized film with good adhesion in the lower layer and dense and good corrosion resistance in the upper layer is formed by changing the film forming conditions continuously or intermittently. An effective method is to form it by Conditions to be changed include power output and gas pressure.

(実施例) 次に実施例に基づき本発明をさらに詳細に説明する。(Example) Next, the present invention will be explained in more detail based on Examples.

実施例1 弱エツチング脱脂した厚さ0.5mm、直径130mm
の105011合金円板表面に、ロール式テストコータ
ーを用いてポリエステル系塗料(商品名 関西ペイント
製KP9401 )を塗布、焼付けし、厚さ2ILmの
塗膜を形成した。これを直径的250mmの真空容器内
の対向平板型電極上に固定し、真空ポンプにより0.0
ITorrとした。この容器内にアルゴンガス及びスチ
レンモノマーガスを導入して0.2Torrとした。そ
の後、電極に周波数13.56MHzの高周波を電源出
力で100W印加し、プラズマを発生させ塗膜上に厚さ
0.51Lmのスチレンプラズマ重合膜を形成した。こ
のようにして得られたポリエステル系塗膜とスチレンプ
ラズマ重合膜の複合皮膜つきA見合金円板についてCA
SS (J I 5H8681)試験を行った結果をW
S1表に示す、なお比較例として、表面に脱脂後、ポリ
エステル系塗膜を厚さ2ILmで形成した1050合金
円板(比較例1)、また、同塗膜を厚さ41Lmとした
1050A1合金円板(比較例2)を用いた。
Example 1 Lightly etched and degreased, thickness 0.5 mm, diameter 130 mm
A polyester paint (trade name: KP9401 manufactured by Kansai Paint Co., Ltd.) was applied and baked on the surface of the 105011 alloy disc using a roll-type test coater to form a coating film with a thickness of 2 ILm. This was fixed on opposing flat electrodes in a vacuum container with a diameter of 250 mm, and a vacuum pump was used to
It was set to ITorr. Argon gas and styrene monomer gas were introduced into this container to adjust the pressure to 0.2 Torr. Thereafter, a high frequency wave with a frequency of 13.56 MHz and a power output of 100 W was applied to the electrode to generate plasma and form a styrene plasma polymerized film with a thickness of 0.51 Lm on the coating film. CA about the A-view alloy disc with the composite film of polyester coating film and styrene plasma polymerized film obtained in this way.
The results of the SS (J I 5H8681) test were
As a comparative example shown in Table S1, a 1050 alloy disc (Comparative Example 1) on which a polyester coating film was formed with a thickness of 2ILm after degreasing the surface, and a 1050A1 alloy disc with the same coating film on a thickness of 41Lm A plate (Comparative Example 2) was used.

第1表の結果から明らかなように実施例1ではCASS
試験(100hr)後でも試料表面は変化していなかっ
たが、比較例1及び2は試料全面に大きな腐食ビットが
多数発生していた。
As is clear from the results in Table 1, in Example 1, CASS
Although the sample surface did not change even after the test (100 hours), many large corroded bits were generated on the entire surface of the sample in Comparative Examples 1 and 2.

実施例2 弱エツチング、脱脂した厚さ0.5mm、直径130m
mの1050A1合金円板表面に、電解液:15%H2
SO4、電解電流密度IA/dゴにて厚さIgmの硫酸
アルマイト皮膜を形成し。
Example 2 Lightly etched and degreased thickness 0.5mm, diameter 130m
Electrolyte: 15% H2 on the surface of the 1050A1 alloy disk of
A sulfuric acid alumite film with a thickness of Igm was formed using SO4 and an electrolytic current density of IA/d.

その上に実施例1と同様にしてポリエステル系塗II!
(厚さ2gm)、スチレンプラズマ重合膜(厚さ0.5
1Lm)を形成した。このようにして得られた、硫酸ア
ルマイト皮膜、ポリエステル系塗膜及びスチレンプラズ
マ重合膜の複合皮膜つきA5L合金円板についてCAS
S試験を行った結果を第2表に示す、なお比較例として
表面に脱脂後、硫酸アルマイト皮膜を2.pm形成し、
さらにその上にポリエステル系塗膜を21Lm形成した
1050A!L合金同板(比較例3)を用いた。
On top of that, apply polyester coating II in the same manner as in Example 1!
(thickness 2gm), styrene plasma polymerized film (thickness 0.5gm), styrene plasma polymerized film (thickness 0.5gm)
1 Lm) was formed. CAS on the A5L alloy disk with a composite coating of sulfuric acid alumite coating, polyester coating and styrene plasma polymerized coating obtained in this way.
The results of the S test are shown in Table 2. As a comparative example, a sulfuric acid alumite film was applied to the surface after degreasing. pm formation,
Furthermore, 1050A with 21Lm of polyester coating film formed on it! The same plate of L alloy (Comparative Example 3) was used.

第2表の結果から明らかなように実施例2ではCASS
試験(100hr)後でも試料表面が変化していなかっ
たが、比較例3の試料表面には腐食ビットが発生してい
た。
As is clear from the results in Table 2, in Example 2, CASS
Although the sample surface did not change even after the test (100 hours), corrosion bits were generated on the sample surface of Comparative Example 3.

(発明の効果) 本発明の金属板は、耐食性に極めて優れ、酸又はアルカ
リの存在する雰囲気中でも腐食することがなく、また、
その皮膜は外傷にも耐えるという優れた効果を奏する。
(Effects of the Invention) The metal plate of the present invention has extremely excellent corrosion resistance, does not corrode even in an atmosphere containing acid or alkali, and
The film has an excellent effect of being resistant to external damage.

Claims (3)

【特許請求の範囲】[Claims] (1)金属板表面に無機もしくは有機皮膜又は無機・有
機複合皮膜を設け、その上にプラズマ重合膜を設けてな
ることを特徴とする耐食性金属板。
(1) A corrosion-resistant metal plate characterized in that an inorganic or organic film or an inorganic/organic composite film is provided on the surface of the metal plate, and a plasma polymerized film is provided thereon.
(2)プラズマ重合膜の膜質が断面方向に変化してなる
請求項1記載の耐食性金属板。
(2) The corrosion-resistant metal plate according to claim 1, wherein the quality of the plasma polymerized film changes in the cross-sectional direction.
(3)金属板がアルミニウム又はアルミニウム合金板で
ある請求項1又は2記載の耐食性金属板。
(3) The corrosion-resistant metal plate according to claim 1 or 2, wherein the metal plate is an aluminum or aluminum alloy plate.
JP25478788A 1988-10-12 1988-10-12 Corrosion resistant metal plate Pending JPH02102038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25478788A JPH02102038A (en) 1988-10-12 1988-10-12 Corrosion resistant metal plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25478788A JPH02102038A (en) 1988-10-12 1988-10-12 Corrosion resistant metal plate

Publications (1)

Publication Number Publication Date
JPH02102038A true JPH02102038A (en) 1990-04-13

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JP25478788A Pending JPH02102038A (en) 1988-10-12 1988-10-12 Corrosion resistant metal plate

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1094130A3 (en) * 1999-10-22 2002-08-14 Robert Bosch Gmbh Method and apparatus for plasma processing of surfaces
US20120308762A1 (en) * 2010-01-22 2012-12-06 Europlasma Nv Method for the Application of a Conformal Nanocoating by Means of a Low Pressure Plasma Process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1094130A3 (en) * 1999-10-22 2002-08-14 Robert Bosch Gmbh Method and apparatus for plasma processing of surfaces
US20120308762A1 (en) * 2010-01-22 2012-12-06 Europlasma Nv Method for the Application of a Conformal Nanocoating by Means of a Low Pressure Plasma Process
CN102821873A (en) * 2010-01-22 2012-12-12 欧洲等离子公司 Method for the application of a conformal nanocoating by means of a low pressure plasma process

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