JPH02113333U - - Google Patents

Info

Publication number
JPH02113333U
JPH02113333U JP2097889U JP2097889U JPH02113333U JP H02113333 U JPH02113333 U JP H02113333U JP 2097889 U JP2097889 U JP 2097889U JP 2097889 U JP2097889 U JP 2097889U JP H02113333 U JPH02113333 U JP H02113333U
Authority
JP
Japan
Prior art keywords
electrode
substrate
cvd apparatus
film
plasma cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2097889U
Other languages
English (en)
Other versions
JPH0715132Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989020978U priority Critical patent/JPH0715132Y2/ja
Publication of JPH02113333U publication Critical patent/JPH02113333U/ja
Application granted granted Critical
Publication of JPH0715132Y2 publication Critical patent/JPH0715132Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案の一実施例によるプラズマＣＶ
Ｄ装置の電極構造を示す図、第２Ａ図及び第２Ｂ
図は電極の波形状部の一部断面詳細図、第３図は
本考案の一実施例が適用されるプラズマＣＶＤ装
置の概略断面構成図、第４図は従来の問題点を説
明するための図、第５図は本考案の他の実施例に
おける電極を基板側から見た図である。 １……成膜室、２……基板、４……電極部、５
……高周波電源、４１ａ……ガス導入孔、４３…
…電極、４３ｃ……波形状部、４３ｄ……ガス吹
出し孔。

Claims (1)

    【実用新案登録請求の範囲】
  1. 成膜すべき基板と対向させて電極を設け、この
    基板と電極との間に、反応ガスを導入させるとと
    もに、高周波電圧を印加してプラズマを発生させ
    、基板に成膜を行うプラズマＣＶＤ装置の電極構
    造であつて、前記電極は、複数のガス導入孔を有
    するとともに、波形状部を少なくとも一部に有す
    る、プラズマＣＶＤ装置の電極構造。
JP1989020978U 1989-02-23 1989-02-23 プラズマｃｖｄ装置の電極構造 Expired - Lifetime JPH0715132Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989020978U JPH0715132Y2 (ja) 1989-02-23 1989-02-23 プラズマｃｖｄ装置の電極構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989020978U JPH0715132Y2 (ja) 1989-02-23 1989-02-23 プラズマｃｖｄ装置の電極構造

Publications (2)

Publication Number Publication Date
JPH02113333U true JPH02113333U (ja) 1990-09-11
JPH0715132Y2 JPH0715132Y2 (ja) 1995-04-10

Family

ID=31237807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989020978U Expired - Lifetime JPH0715132Y2 (ja) 1989-02-23 1989-02-23 プラズマｃｖｄ装置の電極構造

Country Status (1)

Country Link
JP (1) JPH0715132Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020241703A1 (ja) * 2019-05-30 2020-12-03 京セラ株式会社 流路部材

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180114A (ja) * 1984-02-27 1985-09-13 Matsushita Electric Ind Co Ltd 非晶質膜の堆積方法および堆積装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180114A (ja) * 1984-02-27 1985-09-13 Matsushita Electric Ind Co Ltd 非晶質膜の堆積方法および堆積装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020241703A1 (ja) * 2019-05-30 2020-12-03 京セラ株式会社 流路部材
JPWO2020241703A1 (ja) * 2019-05-30 2020-12-03
US12516416B2 (en) 2019-05-30 2026-01-06 Kyocera Corporation Flow path member

Also Published As

Publication number Publication date
JPH0715132Y2 (ja) 1995-04-10

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