JPH02115200U - - Google Patents
Info
- Publication number
- JPH02115200U JPH02115200U JP2317089U JP2317089U JPH02115200U JP H02115200 U JPH02115200 U JP H02115200U JP 2317089 U JP2317089 U JP 2317089U JP 2317089 U JP2317089 U JP 2317089U JP H02115200 U JPH02115200 U JP H02115200U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- grid
- workpiece
- transport
- filament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 230000001133 acceleration Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Description
第１図は本考案の１実施例である電子線照射装
置の電子線発生原理を示す概略回路図、第２図は
本考案の１実施例である電子線照射装置の概略平
面図、第３図はその概略正面図、第４図は説明図
、第５図は従来の電子線照射装置の概略正面図、
第６図はその概略平面図、第７図は従来の電子線
照射装置の電子線発生原理を示す概略回路図であ
る。
Ｅ１……加熱用電源、Ｅ２……グリツド用電源
、Ｅ３……加速用電源、Ｅｇ……グリツド電圧、
Ｔ１，Ｔ２，Ｔ３……トランス、Ｄ１……整流器
、Ｃ……グリツド制御部、Ｒ１，Ｒ２，Ｒ３，Ｒ
ａ，Ｒｂ……抵抗、Ｔｍ１〜Ｔｍ３……タイマ、
ｔｍ１〜ｔｍ３……接点、ＳＷ１，ＳＷ２……ス
イツチ、１……外函、１０……搬送路、１２……
第１の搬送路、１３……第２の搬送路、１４……
スリツト、１５ａ，１５ｂ……開閉扉、２０……
搬送装置、２１……搬送用チエーン、２２……係
止片、２３……モーター、２５……搬送用ローラ
ー、３０……電子線発生部、３１……フイラメン
ト、３２……グリツド、３３……シールド電極、
３４……窓、Ａ……被処理物。
FIG. 1 is a schematic circuit diagram showing the electron beam generation principle of an electron beam irradiation device which is an embodiment of the present invention, FIG. 2 is a schematic plan view of an electron beam irradiation device which is an embodiment of the present invention, and FIG. The figure is a schematic front view, FIG. 4 is an explanatory diagram, and FIG. 5 is a schematic front view of a conventional electron beam irradiation device.
FIG. 6 is a schematic plan view thereof, and FIG. 7 is a schematic circuit diagram showing the principle of electron beam generation of a conventional electron beam irradiation device. E1 ...Power supply for heating, E2 ...Power supply for grid, E3 ...Power supply for acceleration, Eg...Grid voltage,
T1 , T2 , T3 ...transformer, D1 ...rectifier, C...grid control section, R1 , R2 , R3 , R
a, Rb...Resistance, Tm1 to Tm3 ...Timer,
t m1 to t m3 ... Contact, SW 1 , SW 2 ... Switch, 1 ... Outer case, 10 ... Conveyance path, 12 ...
First conveyance path, 13...Second conveyance path, 14...
Slit, 15a, 15b... Opening/closing door, 20...
Conveyance device, 21... Conveyance chain, 22... Locking piece, 23... Motor, 25... Conveyance roller, 30... Electron beam generator, 31... Filament, 32... Grid, 33... shield electrode,
34...Window, A...Object to be treated.
Claims (1)
を制御するグリツドとを有し電子線を発生する電
子線発生部と、前記フイラメントを加熱する加熱
用電源と、前記グリツドに電圧を加えるグリツド
用電源と、前記フイラメントから放出された電子
線を加速する加速用電源と、被処理物に電子線処
理を行う照射領域を有する搬送路と、該搬送路に
送入された被処理物を搬送する搬送装置とを備え
、被処理物の搬送速度や種類に応じてグリツド電
圧を調整してビーム電流を所定の値に設定する電
子線照射装置において、前記搬送路内の前記被処
理物の搬送位置を検知する検知手段と、該検知手
段からの信号に基づき、前記搬送位置に対応して
グリツド電圧を漸次上げ、前記被処理物が前記照
射領域を通過する際には前記所定のビーム電流と
なるようにグリツド電圧を調整するグリツド制御
手段を設けたことを特徴とする電子線照射装置。 An electron beam generating section that generates an electron beam and has a filament that emits electrons and a grid that controls the amount of electron emission; a heating power source that heats the filament; and a grid power source that applies voltage to the grid. , an acceleration power source for accelerating the electron beam emitted from the filament, a transport path having an irradiation area for performing electron beam processing on the workpiece, and a transport device for transporting the workpiece fed into the transport path. In an electron beam irradiation device, the beam current is set to a predetermined value by adjusting the grid voltage according to the transport speed and type of the workpiece, and the transport position of the workpiece within the transport path is detected. a detection means for detecting the beam, and a grid voltage is gradually increased in accordance with the conveyance position based on a signal from the detection means, so that the beam current reaches the predetermined beam current when the object to be processed passes through the irradiation area. An electron beam irradiation device characterized by being provided with grid control means for adjusting grid voltage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2317089U JPH0720640Y2 (en) | 1989-02-28 | 1989-02-28 | Electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2317089U JPH0720640Y2 (en) | 1989-02-28 | 1989-02-28 | Electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02115200U true JPH02115200U (en) | 1990-09-14 |
| JPH0720640Y2 JPH0720640Y2 (en) | 1995-05-15 |
Family
ID=31241941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2317089U Expired - Lifetime JPH0720640Y2 (en) | 1989-02-28 | 1989-02-28 | Electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0720640Y2 (en) |
-
1989
- 1989-02-28 JP JP2317089U patent/JPH0720640Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0720640Y2 (en) | 1995-05-15 |
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