JPH02115564U - - Google Patents
Info
- Publication number
- JPH02115564U JPH02115564U JP2386289U JP2386289U JPH02115564U JP H02115564 U JPH02115564 U JP H02115564U JP 2386289 U JP2386289 U JP 2386289U JP 2386289 U JP2386289 U JP 2386289U JP H02115564 U JPH02115564 U JP H02115564U
- Authority
- JP
- Japan
- Prior art keywords
- rail gun
- cvd
- supplying
- utility
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012495 reaction gas Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図の本考案は一実施例としてのレールガン
ＣＶＤ装置。第２図は従来法によるＣＶＤ装置図
であり、ａは熱ＣＶＤ法。ｂはプラズマＣＶＤ法
。ｃはレーザＣＶＤ法。ｄは光ＣＶＤ法を示す。
１……反応容器、２……レールガン、３……基
板、４−１及び４−２……反応ガス、５……給気
ライン、６……排気ライン、７……排気ポンプ、
８……回路、９……電源、１０……スイツチ。
The present invention shown in FIG. 1 is a rail gun CVD apparatus as an embodiment. Figure 2 is a diagram of a CVD apparatus using a conventional method, and a shows a thermal CVD method. b is plasma CVD method. c is laser CVD method. d indicates the photo-CVD method. DESCRIPTION OF SYMBOLS 1...Reaction container, 2...Rail gun, 3...Substrate, 4-1 and 4-2...Reaction gas, 5...Air supply line, 6...Exhaust line, 7...Exhaust pump,
8...Circuit, 9...Power supply, 10...Switch.
Claims (1)
物に向つて開口するレールガンと、該レールガン
にＣＶＤ反応ガスを供給する手段とを具備してな
ることを特徴とするＣＶＤ装置。 A CVD apparatus comprising: a rail gun that opens toward a workpiece placed in a reaction vessel equipped with an exhaust means; and means for supplying a CVD reaction gas to the rail gun.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2386289U JPH02115564U (en) | 1989-03-03 | 1989-03-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2386289U JPH02115564U (en) | 1989-03-03 | 1989-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02115564U true JPH02115564U (en) | 1990-09-17 |
Family
ID=31243215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2386289U Pending JPH02115564U (en) | 1989-03-03 | 1989-03-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02115564U (en) |
-
1989
- 1989-03-03 JP JP2386289U patent/JPH02115564U/ja active Pending