JPH0212155A - Dip coating method and coating device for photosensitive drum or the like - Google Patents
Dip coating method and coating device for photosensitive drum or the likeInfo
- Publication number
- JPH0212155A JPH0212155A JP16218688A JP16218688A JPH0212155A JP H0212155 A JPH0212155 A JP H0212155A JP 16218688 A JP16218688 A JP 16218688A JP 16218688 A JP16218688 A JP 16218688A JP H0212155 A JPH0212155 A JP H0212155A
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- coating
- tank
- cover
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0525—Coating methods
Landscapes
- Coating Apparatus (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電子写真感光体ドラム等の円筒状の基体の外周
面に塗布膜を形成する方法に関し、特に基体を塗布液中
に浸漬し、塗布ムラがなくかつ均一物性の塗布を可能と
する方法およびその装置に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for forming a coating film on the outer peripheral surface of a cylindrical substrate such as an electrophotographic photoreceptor drum, and in particular, immerses the substrate in a coating liquid, The present invention relates to a method and an apparatus that enable coating without coating unevenness and with uniform physical properties.
(従来技術)
従来、電子写真複写機の感光体ドラムの製造方法の一つ
に感光性物質を含有する塗布液に円筒状基体を浸漬する
ことにより感光性物質を基体外周面に塗布し、電子写真
感光体ドラムを製造する方法は浸漬塗布法として知られ
ている(特開昭49−130736号公報等参照)。(Prior art) Conventionally, one of the methods for manufacturing photoreceptor drums for electrophotographic copying machines is to immerse a cylindrical substrate in a coating solution containing a photosensitive substance to apply the photosensitive substance to the outer peripheral surface of the substrate. A method for manufacturing photographic photosensitive drums is known as a dip coating method (see Japanese Patent Application Laid-open No. 130736/1984, etc.).
浸漬塗布法は塗布液の溜まりに基体を浸漬するもので、
感光体ドラムを製造する際に用いられる塗布液には、テ
トラヒドロフラン等の揮発性の有機溶剤が使用されてお
り、怒光性物質をこの有機溶剤に分散又は溶解せしめて
得られるものである。The dip coating method involves dipping the substrate into a pool of coating solution.
A volatile organic solvent such as tetrahydrofuran is used in the coating liquid used in manufacturing the photosensitive drum, and is obtained by dispersing or dissolving a photosensitive substance in this organic solvent.
そして該溶剤は塗布液から絶えず蒸発しているから、塗
布液を収納する塗布液槽の液面に溶剤の蒸発による皮膜
が生じ、これが基体の周面に付着し、塗布液乾燥後、塗
布ムラとなってあられれると言う問題がある。Since the solvent is constantly evaporating from the coating solution, a film is formed on the liquid surface of the coating solution tank that stores the coating solution, and this film adheres to the peripheral surface of the substrate, and after the coating solution dries, the coating becomes uneven. There is a problem where it can become a hail.
また、塗布液が減少するに従って、基体の塗布液槽への
浸漬に伴う塗布液面の上昇高さが変化するため、そのこ
とに応じて基体の浸漬深さも調整しなければならないと
いう煩わしい問題があった。Additionally, as the coating liquid decreases, the height of the rise in the coating liquid level as the substrate is immersed in the coating liquid tank changes, causing the troublesome problem of having to adjust the immersion depth of the substrate accordingly. there were.
そこで、前記欠点を解消することを目的とするために、
浸漬の都度、または感光体ドラム製造工程において、常
に塗布液を塗布液槽の上端面よりオーバーフローさせる
浸漬塗布法が提案されている。Therefore, in order to eliminate the above drawbacks,
A dipping coating method has been proposed in which the coating liquid always overflows from the upper end surface of the coating liquid tank each time the photoconductor drum is immersed or during the manufacturing process of the photoreceptor drum.
(発明が解決しようとする問題点)
−船釣な浸漬塗布法の場合には、塗布液面上をカバーに
より覆うことにより少なくとも基体を浸漬させる時の溶
剤蒸発を防止できるものが知られている。けれども前記
のオーバーフローさせる浸漬塗布法の場合、塗布液槽内
の塗布液面上のみをカバーしたとしても装置を停止した
時(ポンプ停止時)に、塗布液槽上端面にオーバーフロ
ーにより付着した塗布液が乾燥し、塗布液槽上端面の高
さが不均一となる。その結果浸漬時の基体外周面での塗
布膜高さに影響を及ぼしてしまう。(Problems to be Solved by the Invention) - In the case of a boat-type dip coating method, it is known that the surface of the coating solution is covered with a cover to prevent solvent evaporation at least when the substrate is immersed. . However, in the case of the above-mentioned dip coating method that causes overflow, even if only the surface of the coating liquid in the coating liquid tank is covered, when the apparatus is stopped (when the pump is stopped), the coating liquid adheres to the upper end surface of the coating liquid tank due to overflow. dries, and the height of the upper end surface of the coating liquid tank becomes uneven. As a result, the height of the coating film on the outer peripheral surface of the substrate during dipping is affected.
更に、オーバーフローした塗布液を装置内で循環させる
場合に、塗布液槽上端面において乾燥した塗布液が不純
物となり塗布膜の表面均一物性に影響を及ぼす。Furthermore, when the overflowing coating liquid is circulated within the apparatus, the coating liquid dried on the upper end surface of the coating liquid tank becomes an impurity, which affects the surface uniformity of the coating film.
そこで本発明の目的は、塗布液面上と塗布液が収容され
る塗布液槽上端面を常にカバーによって覆うことにより
、塗布液槽上端面での塗布液の乾燥を防止すると共に、
塗布液面上からの溶剤蒸発を防止する。その結果、塗布
ムラがなく基体外周面に均一な厚さとなる塗布膜を得る
ことができる感光体ドラムの浸漬塗布法および塗布方法
を提供することにある。Therefore, an object of the present invention is to prevent the coating liquid from drying on the upper end surface of the coating liquid tank by always covering the coating liquid surface and the upper end surface of the coating liquid tank in which the coating liquid is stored, with a cover.
Prevents solvent evaporation from above the coating liquid surface. As a result, it is an object of the present invention to provide a dip coating method for a photoreceptor drum and a coating method that can obtain a coating film having a uniform thickness on the outer peripheral surface of a substrate without coating unevenness.
(問題点を解決するための手段)
本考案によれば、感光体ドラム用基体の周面に感光体層
を形成するために、塗布液の液面上昇によって、その最
終段階においてオーバーフローを生じさせて液面高さを
一定に保ち、該塗布液中に前記基体を浸漬し所定深さに
達した後に前記基体を引き上げ、前記基体の周面に感光
体層を形成する浸漬塗布法において、前記塗布液面上お
よび塗布液槽の上端面をカバーにより覆い、前記塗布液
がオーバーフローをした時に塗布液の液面上昇によって
前記カバーが上方に押し上げられることを特徴とし、そ
のことにより上記目的が達成される。(Means for Solving Problems) According to the present invention, in order to form a photoreceptor layer on the circumferential surface of a photoreceptor drum substrate, an overflow is caused in the final stage due to a rise in the liquid level of the coating liquid. In the dip coating method, the substrate is immersed in the coating liquid while keeping the liquid level constant, and after reaching a predetermined depth, the substrate is pulled up to form a photoreceptor layer on the peripheral surface of the substrate. The surface of the coating liquid and the upper end surface of the coating liquid tank are covered with a cover, and when the coating liquid overflows, the cover is pushed upward by the rise in the liquid level of the coating liquid, thereby achieving the above object. be done.
また、上記塗布法を実施する塗布装置は、基体の周面に
塗布するための塗布液が収容される塗布液槽と、該塗布
液槽の上端面より流出した前記塗布液を回収するため前
記塗布液槽の外周に設けられた回収槽と、該回収槽の上
端開口部及び前記塗布液面上を略全体的に覆い、且つ前
記基体が貫通し得る開口部が形成されているカバーと、
を具備し、該カバーが前記塗布液槽の上端面により支持
され、且つ上下方向に前記回収槽の内周面に案内される
よう構成され、そのことにより上記目的が達成される。Further, the coating apparatus for carrying out the above-mentioned coating method includes a coating liquid tank in which a coating liquid for coating the circumferential surface of the substrate is stored, and a coating liquid tank for collecting the coating liquid flowing out from the upper end surface of the coating liquid tank. a recovery tank provided on the outer periphery of the coating liquid tank; a cover that substantially entirely covers the upper end opening of the recovery tank and the surface of the coating liquid, and has an opening through which the base body can pass;
The cover is supported by the upper end surface of the coating liquid tank and is guided vertically to the inner circumferential surface of the recovery tank, thereby achieving the above object.
(実施例)
以下、本発明の好適実施例を添付図面に基づいて説明す
る。(Embodiments) Hereinafter, preferred embodiments of the present invention will be described based on the accompanying drawings.
第1図は基体を塗布液に挿入する前の状態を示す概略断
面図、第2図は基体を塗布液に浸漬させた状態を示す概
略断面図である。FIG. 1 is a schematic sectional view showing the state before the substrate is inserted into the coating liquid, and FIG. 2 is a schematic sectional view showing the state where the substrate is immersed in the coating liquid.
本発明の感光体ドラムの浸漬塗布法は、第1図に示すよ
うに揮発性の塗布液4が収容された塗布液槽lと、該塗
布液槽1の外周に設けられる回収槽2と、前記塗布液槽
1の上端面11に支持され回収槽2の内側に配置される
カバー3とを用いて実施される。As shown in FIG. 1, the dip coating method for photoreceptor drums of the present invention includes a coating liquid tank 1 containing a volatile coating liquid 4, a recovery tank 2 provided on the outer periphery of the coating liquid tank 1, This is carried out using a cover 3 supported on the upper end surface 11 of the coating liquid tank 1 and disposed inside the recovery tank 2.
回収槽2は塗布液槽1の上縁外周が環状に設けられて成
形され、この回収槽2の外壁の上端面が塗布液槽1の上
端面11より高く位置するように設けられている。回収
槽2の底部はコック5を介して図示しない廃液タンクに
接続され、塗布液槽1の底部はコツクロを介して図示し
ない補給タンクに接続されている。従って補給タンクよ
りコツクロを介して塗布液4は塗布液槽1に注入され、
塗布液槽lよりオーバーフローされた塗布液4は一旦、
回収槽2に流出しコック5を介して廃液タンクへ回収さ
れる。The recovery tank 2 is formed so that the outer periphery of the upper edge of the coating liquid tank 1 is annular, and the upper end surface of the outer wall of the recovery tank 2 is located higher than the upper end surface 11 of the coating liquid tank 1. The bottom of the recovery tank 2 is connected to a waste liquid tank (not shown) via a cock 5, and the bottom of the coating liquid tank 1 is connected to a replenishment tank (not shown) via a screwdriver. Therefore, the coating liquid 4 is injected into the coating liquid tank 1 from the supply tank through the conduit,
The coating liquid 4 overflowing from the coating liquid tank 1 is once
The liquid flows out into the recovery tank 2 and is recovered into the waste liquid tank via the cock 5.
7は円筒状の感光体ドラム用の基体であり、前記塗布液
槽1の上方に配設された保持手段8により保持される。Reference numeral 7 denotes a cylindrical base for the photosensitive drum, which is held by a holding means 8 disposed above the coating liquid tank 1 .
保持手段8(第2図参照)は、塗布液4の上方に略垂直
に配設され上部は図外の昇降装置に連結されており、該
昇降装置により保持手段8は基体7の略鉛直状態を保持
しつつ昇降駆動される。尚、上記保持手段8としては、
例えば特開昭6に25660号公報に開示されるもの等
が使用可能である。よって基体7は中空であっても内部
に塗布液4を侵入させることなく浸漬される。The holding means 8 (see FIG. 2) is disposed approximately vertically above the coating liquid 4, and its upper portion is connected to an elevating device (not shown). It is driven up and down while holding the In addition, as the above-mentioned holding means 8,
For example, the one disclosed in Japanese Unexamined Patent Application Publication No. 25660/1983 can be used. Therefore, even if the base body 7 is hollow, it can be immersed without the coating liquid 4 entering inside.
塗布液槽lは形状が特に限定されないが例えば円筒状と
するのが好ましく円筒形の容器であって、基体7の外径
より大なる内径を有し、基体7の軸方向長さより大なる
深さを有している。Although the shape of the coating liquid tank l is not particularly limited, it is preferably a cylindrical container, which has an inner diameter larger than the outer diameter of the base 7 and a depth larger than the axial length of the base 7. It has a certain quality.
塗布液槽1内に収容される塗布液4としては、例えば電
子写真感光体ドラムを製造する場合には、感光性物質を
テトラヒドロフラン等の揮発性の有機溶剤に溶融させた
ものが使用される。As the coating liquid 4 contained in the coating liquid tank 1, for example, when manufacturing an electrophotographic photosensitive drum, a photosensitive substance dissolved in a volatile organic solvent such as tetrahydrofuran is used.
また前記基体7としては、例えばアルミニウム。Further, the base body 7 is made of aluminum, for example.
ニッケル、銅、亜鉛、パラジウム、銀、インジウム、錫
、白金、鉄、ステンレス鋼、真鍮等の金属が用いられる
。Metals such as nickel, copper, zinc, palladium, silver, indium, tin, platinum, iron, stainless steel, and brass are used.
尚、基体7の形状における円筒状とは、少なくとも胴体
部が円筒状であれば、その両端形状は特に限定されず、
例えばその両端又は一端に固着又は嵌合等の手段によっ
て他の形状の部材ないし部分が付加されていてもよい。In addition, the cylindrical shape in the shape of the base body 7 is not particularly limited to the shape of both ends, as long as at least the body part is cylindrical.
For example, members or parts of other shapes may be added to both ends or one end thereof by means of fixing or fitting.
塗布液4面上および塗布液槽1の上端面11を全体的に
覆うカバー3は塗布液4面上に浮上可能な軽量部材(例
えば、発泡スチロール等)によって環状に形成されるこ
とが好ましい。そしてカバー3は下面が塗布液槽1の上
端面11に当接することにより支持されている。よって
塗布液4は塗布液槽1の上端面11よりオーバーフロー
する際に、カバー3を僅かに上方に押し上げることによ
り、回収槽2へ流出する。The cover 3 that completely covers the surface of the coating liquid 4 and the upper end surface 11 of the coating liquid tank 1 is preferably formed into an annular shape using a lightweight member (eg, styrene foam, etc.) that can float above the surface of the coating liquid 4. The cover 3 is supported by its lower surface coming into contact with the upper end surface 11 of the coating liquid tank 1. Therefore, when the coating liquid 4 overflows from the upper end surface 11 of the coating liquid tank 1, it flows out into the recovery tank 2 by pushing up the cover 3 slightly upward.
また該カバー3の開口部31の径は基体7の外径より大
きいか、或いはあまり大きくすると塗布液4の蒸発の問
題が生じ好ましくない。逆に小さくすると基体7を下降
させる際にカバー3に当たる可能性があり、上昇させる
際に粘度の高い塗布液の場合に基体7とカバー3との間
隙中D(第2図参照)を通って基体7と共にカバ−3上
面に塗布?(!4が溢れてしまう。そのため間隙中りは
2〜3mm以下になるように、各々開口部31の径及び
基体7の外径を決定すればよい。そして上記カバー3の
外径は回収槽2の内径よりわずかに小さく、具体的には
一方のカバー3の外周面32と回収槽2の内周面21と
の間隙(第1図参照)が間隙中りより小さく、好ましく
は間隙がないほうが良い。そしてカバー3の外周面32
が回収槽2の内周面21に対向していることにより、カ
バー3の上下方向の移動が内周面21によって案内され
る。即ち内周面21はカバー3のガイドとして機能する
。以上の構成とすることで回収槽2の上端開口部22も
カバー3によって略全体的に覆われる。Further, if the diameter of the opening 31 of the cover 3 is larger than the outer diameter of the base 7, or if it is too large, the problem of evaporation of the coating liquid 4 occurs, which is not preferable. On the other hand, if it is made smaller, there is a possibility that it will hit the cover 3 when lowering the base 7, and if the coating liquid has a high viscosity, it will pass through the gap D (see Figure 2) between the base 7 and the cover 3 when it is raised. Coating on the top surface of cover 3 along with base 7? (! 4 overflows. Therefore, the diameter of the opening 31 and the outer diameter of the base body 7 should be determined respectively so that the inside of the gap is 2 to 3 mm or less.The outer diameter of the cover 3 is Specifically, the gap between the outer circumferential surface 32 of one cover 3 and the inner circumferential surface 21 of the collection tank 2 (see FIG. 1) is smaller than the middle of the gap, preferably there is no gap. It is better.And the outer peripheral surface 32 of the cover 3
is opposed to the inner circumferential surface 21 of the collection tank 2, so that the vertical movement of the cover 3 is guided by the inner circumferential surface 21. That is, the inner peripheral surface 21 functions as a guide for the cover 3. With the above configuration, the upper end opening 22 of the recovery tank 2 is also substantially entirely covered by the cover 3.
以上の装置の構成において本発明方法は次のように実施
される。In the above apparatus configuration, the method of the present invention is implemented as follows.
まず第1図に示すようにコツクロを開いて塗布液槽1の
上端面11より塗布液4が回収槽2側へオーバーフロー
するように塗布液4を塗布液槽1内に常時注入する。次
に保持手段8により保持された基体7を第2図に示すよ
うに塗布液槽1内に挿入し浸漬を行う。この時塗布液4
は基体7の体積に押し退けられて、塗布液4の注入に伴
うオーバーフロー量より更に多くの塗布液4が塗布液槽
1の上端面11からオーバーフローし、回収槽2へ流出
する。カバー3はオーバーフローに伴い回収槽2の内周
面21によりガイドされ上下方向に移動する。そして、
基体7を引き上げると塗布が完了し、次の基体7を浸漬
する。First, as shown in FIG. 1, the lid is opened and the coating liquid 4 is constantly injected into the coating liquid tank 1 so that the coating liquid 4 overflows from the upper end surface 11 of the coating liquid tank 1 to the recovery tank 2 side. Next, the substrate 7 held by the holding means 8 is inserted into the coating liquid tank 1 as shown in FIG. 2 and immersed. At this time, coating liquid 4
is displaced by the volume of the substrate 7, and a larger amount of the coating liquid 4 overflows from the upper end surface 11 of the coating liquid tank 1 than the amount of overflow accompanying the injection of the coating liquid 4, and flows out into the recovery tank 2. The cover 3 is guided by the inner circumferential surface 21 of the recovery tank 2 and moves in the vertical direction as the overflow occurs. and,
When the substrate 7 is pulled up, coating is completed and the next substrate 7 is dipped.
基体7を引き上げると基体7により押し退けられてオー
バーフローした分と基体7に塗布された塗布液4が塗布
液槽1よりなくなるため、塗布液4の液面は下降する。When the base body 7 is pulled up, the overflow amount pushed away by the base body 7 and the coating liquid 4 coated on the base body 7 disappear from the coating liquid tank 1, so that the liquid level of the coating liquid 4 falls.
けれども基体7の引き上げ速度に伴う液面の下降量以上
の塗布液4をコツクロを介して図外の補給タンクより注
入するよう注入量を設定しておけば、基体7を引き上げ
ても常にオバーフローの状態を維持できる。However, if the injection amount is set so that the coating liquid 4 is injected from a replenishment tank (not shown) via a droplet in an amount that exceeds the amount of drop in the liquid level due to the rate at which the substrate 7 is pulled up, overflow will always occur even when the substrate 7 is pulled up. The state can be maintained.
上記のように常にオーバーフローさせる場合は塗布液4
の供給速度がかなり速くなり、そのための塗布液4面上
での液面の波打ちによる乱れも大きくなる。けれどもカ
バー3が塗布液4の乱れを吸収してしまうので基体7外
周面での塗布膜の膜厚および塗布膜高さのバラツキが防
止される。If it always overflows as above, apply liquid 4.
The supply speed of the coating liquid becomes considerably high, and the turbulence caused by the waving of the liquid surface on the surface of the coating liquid 4 increases accordingly. However, since the cover 3 absorbs the turbulence of the coating liquid 4, variations in the thickness and height of the coating film on the outer peripheral surface of the base body 7 are prevented.
ここで装置を停止しオーバーフローしない状態とした場
合に、塗布液4の液面高さが上端面11と等しければ、
上端面11ではカバー3の当接に伴いカバ−3下面と上
端面11との当接部において毛細管現象によりその隙間
に常に塗布液4が介在するので、この塗布液4はカバー
3により外気と接することがない。そのため上端面ll
上での塗布液4の乾燥は抑止される。If the apparatus is stopped here and there is no overflow, if the liquid level of the coating liquid 4 is equal to the upper end surface 11, then
When the cover 3 comes into contact with the upper end surface 11, the coating liquid 4 is always present in the gap between the lower surface of the cover 3 and the upper end surface 11 due to capillary action. I have no contact with you. Therefore, the upper end surface ll
Drying of the coating liquid 4 on the surface is suppressed.
また、塗布液4の液面高さが塗布液槽lの上端面11ま
でない時でも、カバ−3下面と上端面11との当接部に
介在される塗布液4はカバー3が存在しない時よりも、
極端に塗布液4の乾燥が抑止される。Further, even when the liquid level of the coating liquid 4 does not reach the upper end surface 11 of the coating liquid tank l, the coating liquid 4 interposed at the abutting portion between the lower surface of the cover 3 and the upper end surface 11 does not have the cover 3. than time,
Drying of the coating liquid 4 is extremely suppressed.
更にカバー3が回収槽2の上端開口部22を全体的に覆
うため、内部空間は溶剤蒸気で飽和状態となり回収槽2
内部に付着した塗布液4および回収された塗布液4の溶
剤の蒸発も抑止される。よって塗布液槽1の上端面11
に塗布液4の皮膜が付着し、その高さが不均一となるこ
ともなく、回収された塗布液4を装置内で循環させたと
しても塗布膜の均一物性が保たれる。Furthermore, since the cover 3 completely covers the upper end opening 22 of the recovery tank 2, the internal space becomes saturated with solvent vapor, and the recovery tank 2 becomes saturated.
Evaporation of the coating liquid 4 adhering to the inside and the solvent of the recovered coating liquid 4 is also suppressed. Therefore, the upper end surface 11 of the coating liquid tank 1
The film of the coating liquid 4 does not adhere to the surface and its height becomes non-uniform, and even if the collected coating liquid 4 is circulated within the apparatus, the uniform physical properties of the coating film are maintained.
以上、本発明に従う浸漬塗布法を実施する上での装置の
具体例について説明したが、本発明はこれら具体例に限
定されるものではなく種々の変形乃至修正が可能である
。Although specific examples of the apparatus for carrying out the dip coating method according to the present invention have been described above, the present invention is not limited to these specific examples and can be modified in various ways.
例えば、前記カバー3の開口部31には蒸発防止を更に
効果的にするために、基体7の浸漬前に蓋を設けておい
てもよい。またカバー3の開口部31をシャッター構造
にして、基体7を浸漬する時に側面方向に開口して上記
と同様の開口部31が形成されるようにしてもよいい。For example, the opening 31 of the cover 3 may be provided with a lid before the substrate 7 is immersed in order to more effectively prevent evaporation. Further, the opening 31 of the cover 3 may have a shutter structure so that when the base 7 is immersed, it opens in the side direction to form the same opening 31 as described above.
尚、浸漬法としては基体7を固定しておいて、塗布液槽
1を上昇及び下降させて浸漬させることもできる。Incidentally, as a dipping method, the substrate 7 can be fixed and the coating liquid tank 1 can be raised and lowered for dipping.
(発明の効果)
本発明は以上のように、装置上端面開口部を塗布液槽上
端面により支持されるカバーにより略全体的に覆うこと
により溶剤の蒸発を抑止し、特にオーバーフローにより
塗布液が付着する塗布液槽の上、端面での塗布液の乾燥
を防止できる。その結果、塗布液の液面皮膜が残ること
がなく、それが基体の周面に付着する恐れがなくなり塗
布ムラがなく、且つ均一物性の塗布膜を得ることができ
る。(Effects of the Invention) As described above, the present invention suppresses evaporation of the solvent by covering almost the entire opening of the upper end surface of the device with a cover supported by the upper end surface of the coating liquid tank, and in particular prevents the coating liquid from overflowing. It is possible to prevent the coating liquid from drying on the top and end surfaces of the coating liquid tank to which it adheres. As a result, no liquid surface film of the coating liquid remains, and there is no possibility that it will adhere to the circumferential surface of the substrate, thereby making it possible to obtain a coating film with no uneven coating and uniform physical properties.
更に回収槽上にもカバーがされるため、回収槽よりの溶
剤の蒸発も抑止される。Furthermore, since the recovery tank is also covered, evaporation of the solvent from the recovery tank is also suppressed.
尚、液面の波打ちによる乱れをカバーによって吸収し均
一な塗布膜を形成できるという効果がある。Note that the cover absorbs disturbances caused by undulating the liquid surface and has the effect of forming a uniform coating film.
第1図は本発明の一実施例を示し基体を塗布液に挿入す
る前の状態を示す塗布装置の概略断面図、第2図は基体
を塗布液に浸漬させた状態を示す塗布装置の概略断面図
である。
・塗布液槽
・回収槽
・カバー
・塗布液
・基体
実用新案登録出願人
三田工業株式会社
第
図
第
図FIG. 1 is a schematic sectional view of a coating device showing an embodiment of the present invention, showing a state before a substrate is inserted into a coating solution, and FIG. 2 is a schematic sectional view of a coating device showing a state in which a substrate is immersed in a coating solution. FIG.・Coating liquid tank ・Collection tank ・Cover ・Coating liquid ・Substrate Utility model registration applicant Sanda Kogyo Co., Ltd.
Claims (2)
ために、塗布液の液面上昇によって、その最終段階にお
いてオーバーフローを生じさせて液面高さを一定に保ち
、該塗布液中に前記基体を浸漬し所定深さに達した後に
前記基体を引き上げ、前記基体の周面に感光体層を形成
する浸漬塗布法において、 前記塗布液面上および塗布液槽の上端面をカバーにより
覆い、前記塗布液がオーバーフローをした時に塗布液の
液面上昇によって前記カバーが上方に押し上げられるこ
とを特徴とする感光体ドラム等の浸漬塗布法。(1) In order to form a photoreceptor layer on the circumferential surface of the photoreceptor drum substrate, as the liquid level of the coating liquid rises, an overflow is caused in the final stage to keep the liquid level constant; In a dip coating method in which the substrate is immersed in a liquid, the substrate is pulled up after reaching a predetermined depth, and a photoreceptor layer is formed on the circumferential surface of the substrate, the surface of the coating liquid and the upper end surface of the coating liquid tank are covered. A dip coating method for photoreceptor drums, etc., characterized in that when the coating liquid overflows, the cover is pushed upward by the rising liquid level of the coating liquid.
塗布液槽と、 該塗布液槽の上端面より流出した前記塗布液を回収する
ため前記塗布液槽の外周に設けられた回収槽と、 該回収槽の上端開口部及び前記塗布液面上を略全体的に
覆い、且つ前記基体が貫通し得る開口部が形成されてい
るカバーと、を具備し、 該カバーが前記塗布液槽の上端面により支持され、且つ
上下方向に前記回収槽の内周面に案内されることを特徴
とする感光体ドラム等の塗布装置。(2) A coating liquid tank containing a coating liquid for coating on the circumferential surface of the substrate, and a coating liquid tank provided on the outer periphery of the coating liquid tank to collect the coating liquid flowing out from the upper end surface of the coating liquid tank. a recovery tank; and a cover that substantially entirely covers an upper end opening of the recovery tank and the surface of the coating solution, and is formed with an opening through which the base body can penetrate, A coating device for a photoreceptor drum or the like, characterized in that it is supported by an upper end surface of a liquid tank and is guided vertically to an inner circumferential surface of the recovery tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16218688A JPH0212155A (en) | 1988-06-29 | 1988-06-29 | Dip coating method and coating device for photosensitive drum or the like |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16218688A JPH0212155A (en) | 1988-06-29 | 1988-06-29 | Dip coating method and coating device for photosensitive drum or the like |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0212155A true JPH0212155A (en) | 1990-01-17 |
Family
ID=15749641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16218688A Pending JPH0212155A (en) | 1988-06-29 | 1988-06-29 | Dip coating method and coating device for photosensitive drum or the like |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0212155A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0792697A1 (en) * | 1996-03-01 | 1997-09-03 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
-
1988
- 1988-06-29 JP JP16218688A patent/JPH0212155A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0792697A1 (en) * | 1996-03-01 | 1997-09-03 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
| US5725667A (en) * | 1996-03-01 | 1998-03-10 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
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