JPH0212190U - - Google Patents

Info

Publication number
JPH0212190U
JPH0212190U JP8886388U JP8886388U JPH0212190U JP H0212190 U JPH0212190 U JP H0212190U JP 8886388 U JP8886388 U JP 8886388U JP 8886388 U JP8886388 U JP 8886388U JP H0212190 U JPH0212190 U JP H0212190U
Authority
JP
Japan
Prior art keywords
far
film
induction plasma
copper
copper film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8886388U
Other languages
Japanese (ja)
Other versions
JPH0451437Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8886388U priority Critical patent/JPH0451437Y2/ja
Publication of JPH0212190U publication Critical patent/JPH0212190U/ja
Application granted granted Critical
Publication of JPH0451437Y2 publication Critical patent/JPH0451437Y2/ja
Expired legal-status Critical Current

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  • Resistance Heating (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の第1実施例を示しaは正面
図、bはaにおけるA―A断面図、第2図は第2
実施例を示しaは正面図、bはaにおけるB―B
断面部分拡大図、第3図は従来の遠赤外線発生装
置の1例を示す断面図、第4図は従来の他の遠赤
外線発生装置を示す断面図、第5図はさらに他の
遠赤外線発生装置を示しaは正面図、bはaにお
けるC―C断面図である。 11,22……遠赤外線発生パネル、12,2
2……断熱性基板、13,23……インダクシヨ
ンプラズマコーテイングによる銅被膜、14,2
4……遠赤外線物質の被膜。
Fig. 1 shows the first embodiment of this invention, a is a front view, b is a cross-sectional view taken along line A-A at a, and Fig. 2 is a second embodiment of the invention.
Showing an example, a is a front view, and b is B-B at a.
3 is a sectional view showing an example of a conventional far-infrared ray generator, FIG. 4 is a sectional view showing another conventional far-infrared ray generator, and FIG. 5 is a further sectional view showing another far-infrared ray generator. The apparatus is shown, and a is a front view, and b is a cross-sectional view taken along line C--C at a. 11, 22... Far infrared generation panel, 12, 2
2...Insulating substrate, 13,23...Copper coating by induction plasma coating, 14,2
4...A coating of far-infrared material.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] インダクシヨンプラズマを熱源に利用したイン
ダクシヨンプラズマコーテイング法によつて断熱
性基板面に銅粉末を皮膜に形成し、その銅被膜表
面に遠赤外線材料をコーテイングし、前記銅被膜
を通電加熱又は誘電加熱される加熱部とする遠赤
外線発生パネル。
Copper powder is formed into a film on a heat insulating substrate surface by an induction plasma coating method using induction plasma as a heat source, a far-infrared material is coated on the surface of the copper film, and the copper film is electrically heated or dielectrically heated. A far-infrared ray generating panel that serves as a heating section.
JP8886388U 1988-07-04 1988-07-04 Expired JPH0451437Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8886388U JPH0451437Y2 (en) 1988-07-04 1988-07-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8886388U JPH0451437Y2 (en) 1988-07-04 1988-07-04

Publications (2)

Publication Number Publication Date
JPH0212190U true JPH0212190U (en) 1990-01-25
JPH0451437Y2 JPH0451437Y2 (en) 1992-12-03

Family

ID=31313420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8886388U Expired JPH0451437Y2 (en) 1988-07-04 1988-07-04

Country Status (1)

Country Link
JP (1) JPH0451437Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010034058A (en) * 2008-07-25 2010-02-12 Qinghua Univ Planar heat source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010034058A (en) * 2008-07-25 2010-02-12 Qinghua Univ Planar heat source

Also Published As

Publication number Publication date
JPH0451437Y2 (en) 1992-12-03

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