JPH02122677A - Optical coupling semiconductor device - Google Patents

Optical coupling semiconductor device

Info

Publication number
JPH02122677A
JPH02122677A JP63276723A JP27672388A JPH02122677A JP H02122677 A JPH02122677 A JP H02122677A JP 63276723 A JP63276723 A JP 63276723A JP 27672388 A JP27672388 A JP 27672388A JP H02122677 A JPH02122677 A JP H02122677A
Authority
JP
Japan
Prior art keywords
light
thin film
film sheet
insulating thin
receiving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63276723A
Other languages
Japanese (ja)
Inventor
Sadao Osada
長田 貞雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP63276723A priority Critical patent/JPH02122677A/en
Publication of JPH02122677A publication Critical patent/JPH02122677A/en
Pending legal-status Critical Current

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  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)

Abstract

PURPOSE:To facilitate machining and insertion of an insulating thin film sheet and to obtain an optical coupling semiconductor device having high dielectric strength between input and output and providing good light transmission by sticking an epoxy resin and a polyester plastic sheet and setting the thickness thereof to 50-200mum. CONSTITUTION:A light emission element 13, a light receiving element 14, lead wires 11, 12, wires 15, 16 and a three-layer insulating thin film sheet 17 are integrated through primary epoxy mold resin 18 having high transmittance. They are surrounded by a secondary black mold resin 19 in order to block external light from the resin 18. The three-layer insulating thin film sheet 17 is prepared by sticking polyester sheets 20, 21 through epoxy resin 22. Since three-layer structure having no opening is employed, the dielectric strength between input and output is higher than 5kV. The structure is thin and its transmittance is as high as 98%. Thereby very good transmission of light is made between the light emission element 13 and the light receiving element 14.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、発光素子と受光素子との間の絶縁耐圧の信頼
性を高めた光結合半導体装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an optically coupled semiconductor device with improved reliability of dielectric strength between a light emitting element and a light receiving element.

従来の技術 以下に、従来の光結合半導体装置について説明する。Conventional technology A conventional optically coupled semiconductor device will be described below.

第3図は、従来の光結合半導体装置の断面図で、リード
1に発光素子2が、リード3に受光素子4が、それぞれ
、相対向してマウントされている。発光素子2とリード
1との間にはワイヤー5が、また、受光素子4とリード
3との間にはワイヤー6が、それぞれ、ボンディングさ
れている。
FIG. 3 is a sectional view of a conventional optically coupled semiconductor device, in which a light emitting element 2 is mounted on a lead 1, and a light receiving element 4 is mounted on a lead 3, facing each other. A wire 5 is bonded between the light emitting element 2 and the lead 1, and a wire 6 is bonded between the light receiving element 4 and the lead 3.

そして、発光素子2、受光素子4、ワイヤー5゜6およ
びリード1,3を、透過率の良好な一次モールド樹脂7
により一体化しており、さらに前記一次モールド樹脂7
を外部光を遮断するための黒色の二次モールド樹脂8に
より包囲している。入出方間絶縁耐圧を高めるために、
前記一次モールド樹脂7において、ポリイミドやFEP
 (四フッ化エチレンー六フッ化エチレン共重合体)の
絶縁性薄膜シート9を前記、発光素子2と受光素子4と
の間を結ぶ光伝達路の光路を横切るような位置に設けて
いる。但し、前記絶縁性薄膜シート9は透過率が75%
程度とおちるため、光の伝達効率を高めるために光透過
用の開口が設けられている。第4図は絶縁性薄膜シート
9の平面形状を示す図で、絶縁性薄膜シート9には光透
過用の開口10が設けられている。
The light emitting element 2, the light receiving element 4, the wire 5.6 and the leads 1 and 3 are then molded into a primary mold resin 7 with good transmittance.
The primary mold resin 7
is surrounded by a black secondary mold resin 8 to block external light. In order to increase the insulation voltage between input and output,
In the primary mold resin 7, polyimide or FEP is used.
An insulating thin film sheet 9 of (tetrafluoroethylene-hexafluoroethylene copolymer) is provided at a position crossing the optical path of the optical transmission path connecting the light emitting element 2 and the light receiving element 4. However, the transmittance of the insulating thin film sheet 9 is 75%.
Therefore, a light transmission aperture is provided to increase the light transmission efficiency. FIG. 4 is a diagram showing the planar shape of the insulating thin film sheet 9, and the insulating thin film sheet 9 is provided with an opening 10 for light transmission.

発明が解決しようとする課題 上記従来例の構成では、絶縁性薄膜シートに光透過用の
開口を加工するのに手間がかかるという問題があった。
Problems to be Solved by the Invention The configuration of the conventional example described above has a problem in that it takes time and effort to process the openings for light transmission in the insulating thin film sheet.

また、絶縁耐圧を高めるためには開口は極力小さ(する
必要があるが、樹脂モールド時の絶縁性薄膜シートのず
れによっては、発光素子と受光素子との間を結ぶ光伝達
路の光路をさえぎってしまうという問題があった。
In addition, in order to increase the dielectric strength, the opening must be as small as possible, but depending on the misalignment of the insulating thin film sheet during resin molding, the optical path of the optical transmission path connecting the light emitting element and the light receiving element may be blocked. There was a problem with this.

本発明は、上記従来の問題点を解決するもので、絶縁性
薄膜シートに光透過用の開口を設けることなく、かつ発
光素子と受光素子との間の光伝達の良好な光結合半導体
装置を提供することを目的とする。
The present invention solves the above-mentioned conventional problems, and provides an optically coupled semiconductor device with good light transmission between a light emitting element and a light receiving element without providing an opening for light transmission in an insulating thin film sheet. The purpose is to provide.

課題を解決するための手段 この目的を達成するために本発明の光結合半導体装置に
おいては、透過率が良好で、かつ電気的に絶縁性を有す
る三層構造薄膜シートを発光素子と受光素子間を結ぶ光
伝達路の光路を横切るような位置に設け、かつ三層構造
絶縁性薄膜シートに、エポキシ系樹脂とその両面にポリ
エステル系プラスチックシートを貼り合わせ、厚さを5
0〜200μmに設定したものを使用した構成を有して
いる。
Means for Solving the Problems In order to achieve this object, in the optically coupled semiconductor device of the present invention, a three-layer thin film sheet having good transmittance and electrical insulation is used between the light emitting element and the light receiving element. The epoxy resin and polyester plastic sheets are bonded to the three-layer insulating thin film sheet, and the thickness is 5.
It has a configuration in which the thickness is set to 0 to 200 μm.

作用 この構成によって、絶縁性薄膜シートに開口を加工する
手間もかからな(なる上、発光素子と受光素子との間の
光伝達も良好で、入出力間絶B耐圧も高めることができ
る。
Function: With this configuration, it is not necessary to process openings in the insulating thin film sheet (in addition, the light transmission between the light emitting element and the light receiving element is good, and the input/output breakdown voltage B can also be increased.

実施例 υ下、本発明の一実施例について、図面を参照しながら
説明する。
Embodiment υ Below, an embodiment of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例における光結合半導体装置の
断面図を示すものである。第1図において、11.12
はリード、13は発光素子、14は受光素子、15.1
6はワイヤー 17は三層構造絶縁性薄膜シート、18
は一次モールド樹脂、19は二次モールド樹脂である。
FIG. 1 shows a sectional view of an optically coupled semiconductor device according to an embodiment of the present invention. In Figure 1, 11.12
is a lead, 13 is a light emitting element, 14 is a light receiving element, 15.1
6 is a wire, 17 is a three-layer insulating thin film sheet, 18
1 is a primary mold resin, and 19 is a secondary mold resin.

リード11に発光素子13を、リード12に受光素子1
4を相対向してマウントしである。発光素子13とリー
ド11との間にはワイヤー15が、受光素子14とリー
ド12との間にはワイヤー16が、それぞれボンディン
グされている。そして発光素子13.受光素子14、リ
ード11゜12、ワイヤー15.16、及び三層構造絶
縁性薄膜シート17を、透過率の良好なエポキシ系一次
モールド樹脂18により一体化しである。さらに前記一
次モールド樹脂18への外部光を遮断するための黒色の
二次モールド樹脂19で包囲しである。
The light emitting element 13 is attached to the lead 11, and the light receiving element 1 is attached to the lead 12.
4 are mounted facing each other. A wire 15 is bonded between the light emitting element 13 and the lead 11, and a wire 16 is bonded between the light receiving element 14 and the lead 12. and light emitting element 13. The light receiving element 14, the leads 11 and 12, the wires 15 and 16, and the three-layer insulating thin film sheet 17 are integrated using an epoxy primary mold resin 18 with good transmittance. Further, the primary mold resin 18 is surrounded by a black secondary mold resin 19 for blocking external light.

ここで前記三層構造絶縁性薄膜シート17としては、ポ
リエステルシートをエポキシ系の樹脂により張り合わせ
た三層構造シートを使用している。第2図に三層構造絶
縁性薄膜シート17の断面を示す。20.21はポリエ
ステルシート、22はエポキシ系樹脂である。
Here, as the three-layer structure insulating thin film sheet 17, a three-layer structure sheet made of polyester sheets laminated with epoxy resin is used. FIG. 2 shows a cross section of the three-layer insulating thin film sheet 17. 20 and 21 are polyester sheets, and 22 is an epoxy resin.

三層構造でしかも開口等がないため、入出力量絶縁耐圧
は5KV以上と高い。それでいて、厚さも、80μm程
度と薄(、透過率も98%程度(三層構造絶縁性薄膜シ
ートのない状態を100%)あり、前記発光素子13と
受光素子14との間の光伝達は極めて良好である。
Since it has a three-layer structure and has no openings, the input/output dielectric strength is as high as 5KV or more. However, the thickness is as thin as about 80 μm (and the transmittance is about 98% (100% without the three-layer insulating thin film sheet), and light transmission between the light emitting element 13 and the light receiving element 14 is extremely low. In good condition.

また、三層構造絶縁性薄膜シートの透過率の温度(Ta
=150℃、t=500h)に対する経時変化も1%程
度であり問題ない。さらに三層構造の絶縁物としたこと
により、国際安全規格lEC380や各国安全規格(た
とえばVDEO806)をも十分満足する。
In addition, the transmittance temperature (Ta
The change over time (=150°C, t=500h) is also about 1%, which is no problem. Furthermore, by using an insulator with a three-layer structure, it fully satisfies the international safety standard 1EC380 and the safety standards of each country (for example, VDEO806).

発明の効果 本発明は、゛三層構造絶縁性薄膜シートを、エポキシ系
樹脂とその両面にポリエステル系プラスチックシートを
貼り合わせた三層構造の薄膜シートで構造し、かつその
厚さを50〜200μmに設定したことにより、絶縁性
薄膜シートの加工および、挿入を容易にし、かつ光伝達
も極めて良好で、入出力量絶縁耐圧も高い、優れた光結
合半導体装置を実現できるものである。
Effects of the Invention The present invention consists of a three-layer insulating thin film sheet consisting of an epoxy resin and a polyester plastic sheet laminated on both sides, and the thickness of the three-layer insulating thin film sheet is 50 to 200 μm. By setting this, it is possible to realize an excellent optically coupled semiconductor device that facilitates processing and insertion of the insulating thin film sheet, has extremely good optical transmission, and has high input/output dielectric strength.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明一実施例の光結合半導体装置のでの絶縁
性薄膜シートの平面図である。 1・・・・・・リード、2・・・・・・発光素子、3・
・・・・・リード、4・・・・・・受光素子、5・・・
・・・ワイヤー、6・・・・・・ワイヤー、7・・・・
・・一次モールド樹脂、8・・・・・・二次モールド樹
脂、9・・・・・・絶縁性薄膜シート、10・・・・・
・開口、11・・・・・・リード、12・・・・・・リ
ード、13・・・・・・発光素子、14・・・・・・受
光素子、15・・・・・・ワイヤー、16・・・・・・
ワイヤー、17・・・・・・三層構造絶縁性薄膜シート
、18・・・・・・一次モールド樹脂、1つ・・・・・
・二次モールド樹脂、20・・・・・・ポリエステルシ
ート、21・・・・・・ポリエステルシート、22・・
・・・・エポキシ系樹脂。 代理人の氏名 弁理士 粟野重孝 ほか1名第 図 第 図
FIG. 1 is a plan view of an insulating thin film sheet of an optically coupled semiconductor device according to an embodiment of the present invention. 1...Lead, 2...Light emitting element, 3.
...Lead, 4...Light receiving element, 5...
...Wire, 6...Wire, 7...
...Primary mold resin, 8...Secondary mold resin, 9...Insulating thin film sheet, 10...
・Opening, 11... Lead, 12... Lead, 13... Light emitting element, 14... Light receiving element, 15... Wire, 16...
Wire, 17...Three-layer insulating thin film sheet, 18...Primary mold resin, 1 piece...
・Secondary mold resin, 20...polyester sheet, 21...polyester sheet, 22...
...Epoxy resin. Name of agent: Patent attorney Shigetaka Awano and one other person

Claims (1)

【特許請求の範囲】[Claims]  発光素子とこれに対向して設けられた受光素子と、前
記発光素子と受光素子とを共に包囲し、一体化した透過
率の良好な一次モールド樹脂と、前記一次モールド樹脂
を包囲して外部光を遮断するための黒色の二次モールド
樹脂と、前記発光素子と受光素子間を結ぶ光伝達路の光
路を横切るような位置に設けた三層構造絶縁性薄膜シー
トとを備え、前記三層構造絶縁性薄膜シートを、エポキ
シ系樹脂とその両面にポリエステル系プラスチックシー
トを貼り合わせた三層構造の薄膜シートで構成し、かつ
、その厚さを50〜200μmに設定したことを特徴と
する光結合半導体装置。
A light-emitting element, a light-receiving element provided opposite to the light-emitting element, a primary molding resin that surrounds the light-emitting element and the light-receiving element and has good transmittance, and a primary molding resin that surrounds the primary molding resin and absorbs external light. and a three-layer structure insulating thin film sheet provided at a position crossing the optical path of the light transmission path connecting the light-emitting element and the light-receiving element. An optical coupling characterized in that the insulating thin film sheet is composed of a three-layer thin film sheet made of an epoxy resin and a polyester plastic sheet laminated on both sides, and the thickness is set to 50 to 200 μm. Semiconductor equipment.
JP63276723A 1988-11-01 1988-11-01 Optical coupling semiconductor device Pending JPH02122677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63276723A JPH02122677A (en) 1988-11-01 1988-11-01 Optical coupling semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63276723A JPH02122677A (en) 1988-11-01 1988-11-01 Optical coupling semiconductor device

Publications (1)

Publication Number Publication Date
JPH02122677A true JPH02122677A (en) 1990-05-10

Family

ID=17573439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63276723A Pending JPH02122677A (en) 1988-11-01 1988-11-01 Optical coupling semiconductor device

Country Status (1)

Country Link
JP (1) JPH02122677A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009021333A (en) * 2007-07-11 2009-01-29 Nec Electronics Corp Method of manufacturing optical coupling apparatus, and optical coupling apparatus
US10400375B2 (en) 2015-11-26 2019-09-03 Bernina International Ag Accessories box for a sewing machine
WO2023068149A1 (en) * 2021-10-20 2023-04-27 ローム株式会社 Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009021333A (en) * 2007-07-11 2009-01-29 Nec Electronics Corp Method of manufacturing optical coupling apparatus, and optical coupling apparatus
US10400375B2 (en) 2015-11-26 2019-09-03 Bernina International Ag Accessories box for a sewing machine
WO2023068149A1 (en) * 2021-10-20 2023-04-27 ローム株式会社 Semiconductor device

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