JPH02123775A - X-ray pre-ionization-discharge excitation pulse gas laser device - Google Patents
X-ray pre-ionization-discharge excitation pulse gas laser deviceInfo
- Publication number
- JPH02123775A JPH02123775A JP27622688A JP27622688A JPH02123775A JP H02123775 A JPH02123775 A JP H02123775A JP 27622688 A JP27622688 A JP 27622688A JP 27622688 A JP27622688 A JP 27622688A JP H02123775 A JPH02123775 A JP H02123775A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- rays
- discharge
- laser
- ray source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005284 excitation Effects 0.000 title description 5
- 239000000126 substance Substances 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 230000005855 radiation Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 230000003292 diminished effect Effects 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 229920002620 polyvinyl fluoride Polymers 0.000 description 2
- 238000002424 x-ray crystallography Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
- H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、エキシマレーザ装置等のＸ線予備電離放電励
起パルスガスレーザ装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an X-ray preionization discharge excited pulsed gas laser device such as an excimer laser device.
（従来の技術）
放電励起パルスガスレーザ装置においては、高気圧のレ
ーザガスをパルス的にグロー放電させることによってレ
ーザを励起している。上記のレーザガスを均一にグロー
放電させるためには、放電に先立って放電電極対間隙の
放電空間（以下、単に放電空間と称す）に多数の電子、
イオン対を形成する予備電離が必要不可欠である。(Prior Art) In a discharge-excited pulsed gas laser device, a laser is excited by glow-discharging a high-pressure laser gas in a pulsed manner. In order to cause the above laser gas to glow discharge uniformly, a large number of electrons,
Pre-ionization to form ion pairs is essential.
予備電離方式としては、ピンアーク放電を用いた紫外線
予備電離（以下、ピンアーク予備電離と称す）、コロナ
予備電離及びＸ線予備電離等が通常用いられている。As pre-ionization methods, ultraviolet pre-ionization using pin arc discharge (hereinafter referred to as pin-arc pre-ionization), corona pre-ionization, X-ray pre-ionization, etc. are commonly used.
Ｘ線予備電離は、放電に先立ってＸ線源からのＸ線を放
電空間のレーザガスに照射し、光電効果及びコンプトン
効果等によって生成する電子を用いるもので、他の予備
電離方式に比べＸ線の透過力が大きいためにレーザガス
を均一に予備電離できることや、Ｘ線源をレーザ管外に
配置するためレーザガス中での不純物の発生を防げる等
の利点を有し、一般的に用いられている。なお、Ｘ線予
備電離に関しては、「レーザ研究第１２巻、第３号、第
３〜１３ページ（１９８４） Ｊに詳しく記述されてい
る。X-ray preionization is a method in which X-rays from an X-ray source are irradiated onto the laser gas in the discharge space prior to discharge, and electrons generated by the photoelectric effect and Compton effect are used. It is commonly used because it has the advantages of being able to pre-ionize the laser gas uniformly due to its large penetrating power, and preventing the generation of impurities in the laser gas because the X-ray source is placed outside the laser tube. . Note that X-ray preionization is described in detail in "Laser Research Vol. 12, No. 3, pp. 3-13 (1984) J.
また、物質によるＸ線の質量吸収係数はＷ／９−物質の
原子番号２の４乗に比例し、Ｘ線の波長λの３乗に比例
すること（μ／ｐαＺ４λ３）が経験的に知られている
（例えば、東京図會発行の「原子物理ＩＪシュポルスキ
ー著の第９９ページに記述されている）。このことは、
物質の原子番号２が小さい程Ｘ線の透過率が大きくなる
こと及び放電空間のレーザガスに照射するＸ線の波長が
長い程（したがって、Ｘ線のエネルギーが小さい程）、
より多数の子備電離電子を生成できることを意味してい
る。Additionally, it is empirically known that the mass absorption coefficient of X-rays by a substance is proportional to W/9 - the atomic number of the substance 2 to the fourth power, and is proportional to the cube of the wavelength λ of the X-ray (μ/pαZ4λ3). (For example, it is described on page 99 of ``Atomic Physics IJ Shpolsky,'' published by Tokyo Zukai.)
The lower the atomic number 2 of the substance, the higher the transmittance of X-rays, and the longer the wavelength of the X-rays irradiated to the laser gas in the discharge space (therefore, the lower the energy of the X-rays),
This means that more ionized electrons can be generated.
（発明が解決しようとする課題）
従来のＸ線予備電離放電励起パルスガスレーザ装置では
、レーザ管外に配置したＸ線からのＸ線の一部を透過し
、レーザ管内の放電空間のレーザガスに照射するための
Ｘ線照射窓としてアルミニウム（Ａ１）の薄板を用いて
いる（例えば、「アプライド・フィジックス・レター（
Ａｐｐｌ、 Ｐｈｙｓ、 Ｌｅｔｔ、 ４２（２）。(Problems to be Solved by the Invention) In the conventional X-ray pre-ionization discharge excited pulsed gas laser device, a part of the X-rays from the X-rays placed outside the laser tube are transmitted and irradiated onto the laser gas in the discharge space inside the laser tube. A thin aluminum (A1) plate is used as the X-ray irradiation window for
Appl, Phys, Lett, 42(2).
１４９（１９８３） Ｊに記載の装置）。149 (1983) J).
物質に入射するＸ線の強度をＩｏ、物質の質量吸収係数
を１１／９、物質の密度をｐ、物質の厚さをｔとし、物
質を通過した後のＸ線強度を１とするとＩ＝Ｉ。ｅ−（
＄ｐ）ρＬと表わされる。今、アルミニウム薄板の厚さ
を１ｍｍとし、波長λ＝ １．２９５２Ａ（エネルギー
Ｅ〜９．６ｋｅＶ）のＸ線の透過を考えると、この波長
でのアルミニウム（Ａ１）の質量の吸収係数は約２９．
３ｃｍ２／ｇであるから、Ｉ／Ｉｏ ＝ ０．３６％と
なりこの波長以下の波長のＸ線はほとんど透過しないこ
とが判る。しがし、前述したように、レーザガスによる
Ｘ線の質量吸収係数は波長が短くなる程小さくなる（各
物質の質量吸収係数は、例えば「インターナショナル・
テーブル・フォ・エックスレイ・クリスタログラフィー
（Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｔａｂｌｅｓ ｆｏｒ
Ｘ−ｒａｙ ｃｒｙｓｔａｌｌｏｇｒａｐｈｙ）Ｊ第
３巻に記載されている）。例えば、放電励起パルスガス
レーザ装置の一つであるＸｅＣ１エキシマレーザ装置の
レーザガスであるキセノンガス（Ｘｅ）の場合、λ〜０
．２４人（Ｅ〜５０ＫｅＶ）における質量吸収係数はλ
〜１．２９人（Ｅ〜１０ＫｅＶ）における質量吸収係数
の１／１００以下である。したがって、Ｘ線照射窓とじ
てアルミニウム（ＡＩ）の薄板を用いる従来のＸ線予備
電離放電励起パルスガスレーザ装置では、放電空間のレ
ーザガスを電離する効率が高い長波長のＸ線は放電空間
にほとんど到達できない。このため、従来の装置では、
発生Ｘ線の総線量の大きなＸ線源を用いる必要が有り、
装置の運転コストが高くなるという問題点がある。また
、発生Ｘ線の総線量を増すために６０〜１８０ＫＶもの
高い管電圧のＸ線源を用いることから、Ｘ線源の寿命が
短いこと及び装置が大型化し、製作費が高くなる等の問
題点がある。If the intensity of the X-rays incident on the material is Io, the mass absorption coefficient of the material is 11/9, the density of the material is p, the thickness of the material is t, and the X-ray intensity after passing through the material is 1, then I= I. e-(
$p) is expressed as ρL. Now, assuming that the thickness of the aluminum thin plate is 1 mm and considering the transmission of X-rays with wavelength λ = 1.2952 A (energy E ~ 9.6 keV), the absorption coefficient of the mass of aluminum (A1) at this wavelength is approximately 29 ．．
Since it is 3 cm2/g, I/Io = 0.36%, and it can be seen that almost no X-rays having a wavelength below this wavelength are transmitted. However, as mentioned above, the mass absorption coefficient of X-rays caused by laser gas decreases as the wavelength becomes shorter (the mass absorption coefficient of each substance is
International Tables for X-ray crystallography
X-ray crystallography) J Volume 3). For example, in the case of xenon gas (Xe), which is the laser gas of a XeC1 excimer laser device, which is one of the discharge-excited pulsed gas laser devices, λ~0
．． The mass absorption coefficient for 24 people (E~50KeV) is λ
~1.29 It is 1/100 or less of the mass absorption coefficient in humans (E ~ 10 KeV). Therefore, in conventional X-ray pre-ionization discharge-excited pulsed gas laser equipment that uses a thin aluminum (AI) plate as the X-ray irradiation window, most of the long-wavelength X-rays, which are highly efficient at ionizing the laser gas in the discharge space, reach the discharge space. Can not. Therefore, with conventional equipment,
It is necessary to use an X-ray source with a large total dose of generated X-rays,
There is a problem in that the operating cost of the device is high. In addition, since an X-ray source with a high tube voltage of 60 to 180 KV is used to increase the total dose of generated X-rays, there are problems such as a short lifespan of the X-ray source, an increase in the size of the device, and high manufacturing costs. There is a point.
本発明の目的は、このような課題を解決したＸ線予備電
離放電励起パルスガスレーザ装置を提供することにある
。An object of the present invention is to provide an X-ray pre-ionization discharge excited pulsed gas laser device that solves these problems.
（課題を解決するための手段）
・本発明は、内部に高気圧のレーザガスを封入するレー
ザ管と、前記レーザ管内に配置し空間を隔てて対向する
放電電極対と、前記レーザ管外に配置するＸ７凍源と、
前記Ｘ線源からのＸ線の一部を透過し放電空間に照射す
るためのＸ線照射窓とを少なくとも備えるＸ線予備電離
放電励起パルスガスレーザ装置において、前記Ｘ線照射
窓を原子番号が１〜１２の元素またはそれらの化合物か
ら構成される物質で形成することを特徴とするＸ線予備
電離放電励起パルスガスレーザ装置である。(Means for Solving the Problems) - The present invention provides a laser tube in which a high-pressure laser gas is sealed, a pair of discharge electrodes disposed inside the laser tube and facing each other across a space, and a pair of discharge electrodes disposed outside the laser tube. X7 Frozen and
In an X-ray pre-ionization discharge excited pulsed gas laser device comprising at least an X-ray irradiation window for transmitting a part of the X-rays from the X-ray source and irradiating the discharge space, the X-ray irradiation window has an atomic number of 1. This is an X-ray preionization discharge excited pulsed gas laser device characterized in that it is formed of a substance composed of ~12 elements or their compounds.
（作用）
本発明のＸ線予備電離放電励起パルスガスレーザ装置に
おいては、Ｘ線照射窓を原子番号１２以下の元素すなわ
ちＡＩより原子番号の小さい元素から構成される物質に
よって形成している。このような構成の本発明のＸ線予
備電離放電励起パルスガスレーザ装置では、レーザ管外
に配置したＸ線源から発生するＸ線において、レーザガ
スを電離する効率の極めて高い長波長のＸ線がＸ線照射
窓を透過し放電空間まで到達できることから、より少な
いＸ線の総線量で均一なグロー放電を起こすために必要
な数の子備電離電子を得ることが可能となる。したがっ
て、用いるＸ線源の総線量を小さくできるため、装置の
運転コストを低減できる。また、Ｘ線源において、より
低い管電圧でも放電空間において十分な予備電離電子数
を得ることが可能になるため、装置を小型化できること
及び製作費を低減できることに加えて、Ｘ線源の寿命を
長くでき装置全体の寿命を長くすることが可能であると
いう利点を有する。(Function) In the X-ray pre-ionization discharge excitation pulsed gas laser device of the present invention, the X-ray irradiation window is formed of a substance composed of an element with an atomic number of 12 or less, that is, an element with an atomic number smaller than AI. In the X-ray pre-ionization discharge excitation pulsed gas laser device of the present invention having such a configuration, among the X-rays generated from the X-ray source placed outside the laser tube, long-wavelength X-rays with extremely high efficiency of ionizing the laser gas are Since the X-rays can pass through the irradiation window and reach the discharge space, it becomes possible to obtain the necessary number of ionized electrons to cause a uniform glow discharge with a smaller total dose of X-rays. Therefore, since the total dose of the X-ray source used can be reduced, the operating cost of the apparatus can be reduced. In addition, in the X-ray source, it is possible to obtain a sufficient number of pre-ionized electrons in the discharge space even with a lower tube voltage, which not only allows the equipment to be made smaller and manufacturing costs to be reduced, but also increases the longevity of the X-ray source. This has the advantage that it is possible to extend the life of the entire device.
（実施例）
次に、図面を参照して本発明の実施例を詳細に説明する
。(Example) Next, an example of the present invention will be described in detail with reference to the drawings.
第１図は、本発明の第１の実施例を示す模式的な断面図
である。なお、本図には本発明に係る部分のみが示しで
ある。FIG. 1 is a schematic cross-sectional view showing a first embodiment of the present invention. Note that this figure shows only the portions related to the present invention.
本実施例ではレーザ管１の外に配置したＸ線源４からの
Ｘ線９を放電空間６に照射するためのＸ線照射窓として
、原子番号が１２以下の元素単体もしくはそれらの化合
物から構成される、ベリラム（Ｂｅ）、炭素材（Ｃ）、
窒化ボロン（ＢＮ）、ポリフッ化ビニル■Ｈ２−ＣＨＦ
祐）、ポリフッ化ビニリデン（−ｅＣＨ２−ＣＦ２ｉ）
酸化ベリリウム（ＢｅＯ）及びポリテトラフルオロエチ
レンｅｅＣＦ２−ＣＦ２Ｔｈ）等の物質で形成した低原
子番号Ｘ線照射窓（以下、単に低原子番号Ｘ線照射窓と
称す）５を用い、第１及び第２の放電電極２，３間に形
成される電界方向に垂直な方向からコリメータ７でコリ
メートされたＸ線９を放電空間６に照射する構成をとっ
ている。In this embodiment, the X-ray irradiation window for irradiating the discharge space 6 with X-rays 9 from the X-ray source 4 placed outside the laser tube 1 is made of an element having an atomic number of 12 or less or a compound thereof. berylum (Be), carbon material (C),
Boron nitride (BN), polyvinyl fluoride H2-CHF
Yu), polyvinylidene fluoride (-eCH2-CF2i)
A low atomic number X-ray irradiation window (hereinafter simply referred to as a low atomic number The discharge space 6 is irradiated with X-rays 9 collimated by a collimator 7 from a direction perpendicular to the direction of the electric field formed between the discharge electrodes 2 and 3.
この場合、Ｘ線源４から発生するＸ線の中で、レーザガ
スを電離する効率の極めて高い長波長のＸ線が低原子番
号Ｘ線照射窓５を透過し放電空間６まで到達することが
可能である。例えば、放電励起パルスガスレーザ装置の
一つであるＸｅＣ１エキシマレーザ装置のレーザガスで
あるキセノンガス（Ｘｅ）による質量吸収係数が、波長
λ〜０．２４Ａ（Ｅ〜５０ＫｅＶ）のＸ線の場合の１０
０倍以上である波長
λ＝１．２９５２人（Ｅ〜９．６ＫｅＶ）のＸ線の透過
を考えてみる。この波長のＸ線では、厚さｔ＝１ｍｍの
アルミニウム（Ａ１）の透過率Ｉ／Ｉｏは約０．３６％
となりほとんど透過しない。一方、厚さｔ＝１ｍｍのベ
リラム（Ｂｅ）、炭素材（Ｃ）、窒化ボロン（ＢＮ）、
ポリフッ化ビニル（（（ＣＨ２−ＣＦ２ｉ）、酸化ベリ
リウム（ＢｅＯ）及びポリテトラフルオロエチレン（（
ＣＦ２−ＣＦ２Ｍ）のこの波長での透過率Ｉ／Ｉｏは、
それぞれ約８４％、約４８％、約３８％、約３０％、約
２６％及び約１７％である。このように、本実施例の構
成をとれば、レーザガスを電離する効率の極めて高い長
波長のＸ線も放電空間６まで到達できるため、より少な
いＸ線の総線量で均一なグロー放電を起こすために必要
な数の予備電離電子を得ることが可能となる。したがっ
て、用いるＸ線源４の総線量を小さくできるため装置の
運転コストを低減できると同時に、より低い管電圧のＸ
線源でも十分な予備電離電子数を得ることが可能になる
ため、装置の寸法及び製作費を低減できるとともにＸ線
源の寿命を長くすることが可能になる。In this case, among the X-rays generated from the X-ray source 4, long-wavelength X-rays with extremely high efficiency of ionizing the laser gas can pass through the low atomic number X-ray irradiation window 5 and reach the discharge space 6. It is. For example, the mass absorption coefficient of xenon gas (Xe), which is the laser gas of a XeC1 excimer laser device, which is one of the discharge-excited pulsed gas laser devices, is 10
Consider the transmission of X-rays with a wavelength λ = 1.2952 people (E ~ 9.6 KeV), which is 0 times or more. For X-rays of this wavelength, the transmittance I/Io of aluminum (A1) with a thickness t = 1 mm is approximately 0.36%.
Therefore, it is hardly transmitted. On the other hand, berylum (Be), carbon material (C), boron nitride (BN) with thickness t = 1 mm,
Polyvinyl fluoride ((CH2-CF2i), beryllium oxide (BeO) and polytetrafluoroethylene ((
The transmittance I/Io of CF2-CF2M) at this wavelength is
They are about 84%, about 48%, about 38%, about 30%, about 26% and about 17%, respectively. In this way, with the configuration of this embodiment, long-wavelength X-rays with extremely high efficiency of ionizing the laser gas can also reach the discharge space 6, so that uniform glow discharge can be caused with a smaller total dose of X-rays. It becomes possible to obtain the required number of pre-ionized electrons. Therefore, since the total dose of the X-ray source 4 used can be reduced, the operating cost of the device can be reduced, and at the same time, the
Since it becomes possible to obtain a sufficient number of pre-ionized electrons even with a radiation source, it becomes possible to reduce the size and manufacturing cost of the device and to extend the life of the X-ray source.
第２図は、本発明の第２の実施例を示す模式的な断面図
で、本発明に係る部分のみが示しである。FIG. 2 is a schematic sectional view showing a second embodiment of the present invention, in which only the parts related to the present invention are shown.
本実施例では、放電電極対の一方の放電電極を開孔放電
電極１０とし、この開孔放電電極１０の背面のレーザ管
１の管壁に低原子番号Ｘ線照射窓５を設け、図の如くＸ
線源４からのＸ線９を開孔放電電極１０の背面から放電
空間６に照射する構成をとっている。本実施例でも第１
図に示した本発明の第１の実施例と同様に、レーザ管１
の外に配置したＸ線源からのＸ線９を放電空間６に照射
するためのＸ線照射窓としてＸ線の質量吸収係数が小さ
な原子番号１２以下の元素から構成される物°質で形成
した低原子番号Ｘ線照射窓５を用いる構成をとっている
ため、レーザガスを電離する効率の極めて高い長波長の
Ｘ線も放電空間６に到達できる。したがって、用いるＸ
線源４の総線量を小さくできるため装置の運転コストの
低減が可能であると同時に、より低い管電圧のＸ線源で
も十分な予備電離電子数を得ることが可能になるため、
装置の寸法及び製作費を低減できるとともにＸ線）原の
寿命を長くすることが可能になる。In this embodiment, one of the discharge electrodes of the discharge electrode pair is a perforated discharge electrode 10, and a low atomic number X-ray irradiation window 5 is provided on the wall of the laser tube 1 on the back side of the perforated discharge electrode 10, Like X
A configuration is adopted in which X-rays 9 from a radiation source 4 are irradiated into the discharge space 6 from the back side of the apertured discharge electrode 10. In this example, the first
Similar to the first embodiment of the invention shown in the figure, the laser tube 1
As an X-ray irradiation window for irradiating the discharge space 6 with X-rays 9 from an X-ray source placed outside the Since the configuration uses the low atomic number X-ray irradiation window 5, even long wavelength X-rays with extremely high efficiency of ionizing the laser gas can reach the discharge space 6. Therefore, use X
Since the total dose of the radiation source 4 can be reduced, it is possible to reduce the operating cost of the apparatus, and at the same time, it is possible to obtain a sufficient number of pre-ionized electrons even with an X-ray source with a lower tube voltage.
The size and manufacturing cost of the device can be reduced, and the life of the X-ray source can be extended.
さらに、本実施例では、開孔放電電極１０の背面から放
電空間６に照射する構成をとるため、放電空間６にレー
ザガスを循環することが容易な構成を取り易く装置の高
繰り返し動作が可能である。Furthermore, in this embodiment, since the configuration is such that the discharge space 6 is irradiated from the back side of the open-hole discharge electrode 10, it is easy to adopt a configuration in which the laser gas can be easily circulated in the discharge space 6, and the device can be operated repeatedly. be.
第３図は、本発明の第３の実施例を示す模式的な断面図
で、本図でも本発明に係る部分のみが示しである。FIG. 3 is a schematic cross-sectional view showing a third embodiment of the present invention, and only the parts related to the present invention are shown in this figure.
本実施例では、第１及び第２図に示した本発明の第１及
び第２の実施例と同様に、レーザ管１の外に配置したＸ
線源４からのＸ線９を放電空間６に照射するためのＸ線
照射窓として原子番号１２以下の元素から構成される物
質で形成した低原子番号Ｘ線照射窓５を用いるとともに
、この低原子番号Ｘ線照射窓５が放電電極対の一方の放
電電極を兼ねる構成をとっている。本実施例の構成をと
ることによって、レーザガスを電離する効率の極めて高
い長波長のＸ線も含めてＸ線源４からのＸ線をより多く
放電空間６まで到達させることが可能となる。したがっ
て、用いるＸ線源４の総線量をより小さくできるため装
置の運転コストの低減が可能であると同時に、より低い
管電圧のＸ線源も十分な予備電離電子数を得ることが可
能になるため、装置の寸法及び製作費を低減できるとと
もにＸ線源の寿命をより長くすることが可能になる。In this embodiment, as in the first and second embodiments of the present invention shown in FIGS.
As the X-ray irradiation window for irradiating the discharge space 6 with the X-rays 9 from the radiation source 4, a low atomic number The atomic number X-ray irradiation window 5 is configured to also serve as one of the discharge electrodes of the discharge electrode pair. By adopting the configuration of this embodiment, it becomes possible to allow more X-rays from the X-ray source 4 to reach the discharge space 6, including long-wavelength X-rays that have extremely high efficiency in ionizing laser gas. Therefore, since the total dose of the X-ray source 4 used can be made smaller, it is possible to reduce the operating cost of the apparatus, and at the same time, it is also possible to obtain a sufficient number of pre-ionized electrons using an X-ray source with a lower tube voltage. Therefore, the size and manufacturing cost of the device can be reduced, and the life of the X-ray source can be extended.
また、本実施例でも本発明の第２の実施例と同様に、放
電空間６にレーザガスを循環することが容易であるから
装置の高繰り返し動作が可能である。Further, in this embodiment, as in the second embodiment of the present invention, it is easy to circulate the laser gas in the discharge space 6, so that the device can be operated repeatedly.
（発明の効果）
以上述べた様に、本発明のＸ線予備電離放電励起パルス
ガスレーザ装置によれば、レーザガスを電離する効率の
極めて高い長波長のＸ線も含めてレーザ管外に配置した
Ｘ線源からのＸ線をより多くレーザ管内の放電空間まで
到達させることが可能となる。したがって用いるＸ線源
の総線量をより小さくできることから装置の運転コスト
の低減が可能になると同時に、より低い管電圧のＸ線源
でも均一なグロー放電を起こすために十分な予備電離電
子数を得ることができるから、装置の寸法及び製作費を
低減できかつＸ線源の寿命が伸び装置全体の寿命を長く
することが可能になる。(Effects of the Invention) As described above, according to the X-ray pre-ionization discharge excitation pulsed gas laser device of the present invention, X-rays arranged outside the laser tube, including long-wavelength X-rays with extremely high efficiency of ionizing laser gas, It becomes possible to allow more X-rays from the radiation source to reach the discharge space within the laser tube. Therefore, since the total dose of the X-ray source used can be made smaller, it is possible to reduce the operating cost of the device, and at the same time, even with an X-ray source with a lower tube voltage, a sufficient number of pre-ionized electrons can be obtained to cause a uniform glow discharge. As a result, the size and manufacturing cost of the device can be reduced, and the life of the X-ray source can be extended, making it possible to extend the life of the entire device.
第１図、第２図及び第３図は、本発明の第１、第２及び
第３の実施例をそれぞれ示す模式的な断面図である。
図において、
１・・・レーザ管、２・・・第１の放電電極、３・・・
第２の放電電極、４．・・Ｘ線源、５・・・低原子番号
Ｘ線照射窓、６・・・放電空間、７・・・コリメータ、
８・・・励起回路、
９・・・Ｘ線、
１０・・・開孔放電電極、
である。FIGS. 1, 2, and 3 are schematic sectional views showing first, second, and third embodiments of the present invention, respectively. In the figure, 1... laser tube, 2... first discharge electrode, 3...
a second discharge electrode; 4. ...X-ray source, 5...Low atomic number X-ray irradiation window, 6...Discharge space, 7...Collimator, 8...Excitation circuit, 9...X-ray, 10...Open A hole discharge electrode.
Claims (1)
レーザ管内に配置し空間を隔てて対向する放電電極対と
、前記レーザ管外に配置するＸ線源と、前記Ｘ線源から
のＸ線の一部を透過し前記放電電極対間隙の放電空間に
照射するためのＸ線照射窓とを少なくとも備えるＸ線予
備電離放電励起パルスガスレーザ装置において、前記Ｘ
線照射窓を原子番号が１〜１２の元素またはそれらの化
合物から構成される物質で形成することを特徴とするＸ
線予備電離放電励起パルスガスレーザ装置。a laser tube in which high-pressure laser gas is sealed; a pair of discharge electrodes disposed inside the laser tube and facing each other with a space between them; an X-ray source disposed outside the laser tube; An X-ray pre-ionization discharge excited pulsed gas laser device comprising at least an X-ray irradiation window for transmitting a portion of the X-ray and irradiating the discharge space in the gap between the discharge electrodes.
X, characterized in that the radiation irradiation window is formed of a substance consisting of an element with an atomic number of 1 to 12 or a compound thereof
Line pre-ionization discharge excited pulsed gas laser device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27622688A JPH02123775A (en) | 1988-11-02 | 1988-11-02 | X-ray pre-ionization-discharge excitation pulse gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27622688A JPH02123775A (en) | 1988-11-02 | 1988-11-02 | X-ray pre-ionization-discharge excitation pulse gas laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02123775A true JPH02123775A (en) | 1990-05-11 |
Family
ID=17566449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27622688A Pending JPH02123775A (en) | 1988-11-02 | 1988-11-02 | X-ray pre-ionization-discharge excitation pulse gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02123775A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06350167A (en) * | 1993-06-08 | 1994-12-22 | Nec Corp | Electrode for x-ray discharge excited gas laser and gas laser device |
| US20220200225A1 (en) * | 2020-12-21 | 2022-06-23 | Hamamatsu Photonics K.K | Light emitting sealed body and light source device |
-
1988
- 1988-11-02 JP JP27622688A patent/JPH02123775A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06350167A (en) * | 1993-06-08 | 1994-12-22 | Nec Corp | Electrode for x-ray discharge excited gas laser and gas laser device |
| US20220200225A1 (en) * | 2020-12-21 | 2022-06-23 | Hamamatsu Photonics K.K | Light emitting sealed body and light source device |
| US11862922B2 (en) * | 2020-12-21 | 2024-01-02 | Energetiq Technology, Inc. | Light emitting sealed body and light source device |
| US12191623B2 (en) * | 2020-12-21 | 2025-01-07 | Hamamatsu Photonics K.K. | Light emitting sealed body and light source device |
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