JPH02129996A - Manufacturing method of multilayer printed board - Google Patents

Manufacturing method of multilayer printed board

Info

Publication number
JPH02129996A
JPH02129996A JP63282364A JP28236488A JPH02129996A JP H02129996 A JPH02129996 A JP H02129996A JP 63282364 A JP63282364 A JP 63282364A JP 28236488 A JP28236488 A JP 28236488A JP H02129996 A JPH02129996 A JP H02129996A
Authority
JP
Japan
Prior art keywords
copper
printed wiring
aqueous solution
inner layer
reducing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63282364A
Other languages
Japanese (ja)
Inventor
Yasuo Tanaka
田中 恭夫
Naohito Yoshimura
吉村 直仁
Koichi Nakano
孝一 中野
Toru Notomi
徹 納富
Morio Take
杜夫 岳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP63282364A priority Critical patent/JPH02129996A/en
Priority to MYPI89001201A priority patent/MY104191A/en
Priority to KR1019890012890A priority patent/KR970004029B1/en
Priority to US07/403,519 priority patent/US5076864A/en
Priority to DE68920383T priority patent/DE68920383T2/en
Priority to EP89309018A priority patent/EP0358480B1/en
Publication of JPH02129996A publication Critical patent/JPH02129996A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/385Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/60Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using alkaline aqueous solutions with pH greater than 8
    • C23C22/63Treatment of copper or alloys based thereon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0315Oxidising metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1157Using means for chemical reduction
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、中間層(内層)となるプリント配線板の銅箔
面の処理方法を特徴とする多層プリント配線板の製造法
であり、特に、多層プリント配線板の製造工程で孔壁に
露出している酸化銅から酸性水溶液の作用で酸化銅が溶
けることによる「ハロー」或いは「ピンクリング」現象
を著しく減少或いは無くしたものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for manufacturing a multilayer printed wiring board, which is characterized by a method for treating a copper foil surface of a printed wiring board serving as an intermediate layer (inner layer). This method significantly reduces or eliminates the "halo" or "pink ring" phenomenon caused by the copper oxide exposed on the hole wall being dissolved by the action of an acidic aqueous solution during the manufacturing process of multilayer printed wiring boards.

〔従来の技術およびその課題〕[Conventional technology and its problems]

多層プリント板において、中間層とするプリント配線網
の形成された内層板の多層化接着力を向上させる方法と
しては、予め両面が凹凸化された銅箔を用いる方法;内
層用のプリント配線網を形成した後、■、化学的処理に
より銅箔表面に酸化銅膜を形成する方法、■、銅箔面を
シランカップリング剤や有機チタネートカップリング剤
で処理する方法などが知られているが、従来は接着性と
経済性の点から通常、光沢面を有する銅張積層板に内層
用のプリント配線網を形成した後、酸化性のアルカリ水
溶液で処理して褐色或いは黒色の酸化銅皮膜を形成した
ものが用いられる。
In a multilayer printed board, a method of improving the multilayer adhesion of an inner layer board on which a printed wiring network is formed as an intermediate layer is to use a copper foil that has been textured on both sides in advance; After formation, there are two known methods: (1) forming a copper oxide film on the surface of the copper foil through chemical treatment; and (2) treating the copper foil surface with a silane coupling agent or an organic titanate coupling agent. Conventionally, from the viewpoint of adhesion and economy, after forming a printed wiring network for the inner layer on a copper-clad laminate with a glossy surface, it is treated with an oxidizing alkaline aqueous solution to form a brown or black copper oxide film. is used.

ところが、この酸化銅膜、特に酸化第2銅は塩酸、硫酸
などの酸性水溶液に溶けやすい欠点を有している。この
ため、積層成形された多層板に小孔をあけ、スルーホー
ルメツキ工程や無電解メツキ又はその後の電解メツキ工
程などを施す場合、孔壁に露出した酸化銅膜が酸性液に
より溶かされる、いわゆる「ハロー」或いは「ピンクリ
ング」が発生し、絶縁性などのプリント配線板の信頼性
の低下の原因となる欠点があった。
However, this copper oxide film, particularly cupric oxide, has the disadvantage that it easily dissolves in acidic aqueous solutions such as hydrochloric acid and sulfuric acid. For this reason, when making small holes in a laminated multilayer board and performing a through-hole plating process, electroless plating process, or subsequent electrolytic plating process, the copper oxide film exposed on the hole wall is dissolved by the acidic liquid. There is a drawback that "halo" or "pink ring" occurs, which causes a decrease in the reliability of the printed wiring board, such as insulation properties.

この褐色或いは黒色の酸化銅皮膜を用いた場合に発生す
るハロー或いはピンクリングの発生を防止する方法とし
て、アルカリ性の還元性水溶液で処理する方法が知られ
ている(特開昭56−153797号)。この方法は、
褐色或いは黒色の酸化銅膜より接着力は低下するものの
実用化に耐える接着力を示すが、「ハロー」の発生防止
効果にバラツキがあり、実用化されるには至っていない
As a method for preventing the halo or pink ring that occurs when this brown or black copper oxide film is used, a method of treating it with an alkaline reducing aqueous solution is known (Japanese Patent Application Laid-Open No. 153797/1982). . This method is
Although the adhesion strength is lower than that of brown or black copper oxide films, it exhibits an adhesion strength sufficient for practical use, but its effectiveness in preventing the occurrence of "halos" varies, and it has not yet been put into practical use.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者らは、褐色或いは黒色酸化銅処理の還元処理し
て「ハロー」の防止効果にバラツキのない方法について
鋭意検討した。その結果、アルカリ性の還元剤水溶液に
代えて、意外にも、特定の還元剤を用い、銅塩を併用し
た酸性還元剤水溶液を用いる方法を見出した。
The inventors of the present invention have conducted intensive studies on methods for reducing the brown or black copper oxide treatment to ensure that the effect of preventing "halo" is consistent. As a result, we surprisingly discovered a method using a specific reducing agent and an acidic reducing agent aqueous solution containing a copper salt in place of an alkaline reducing agent aqueous solution.

すなわち、本発明は、多層プリント配線板の製造法にお
いて、中間層として用いるプリント配線網を形成した内
層板の銅箔面を化学的に酸化し黒色或いは褐色の酸化銅
面を形成した後、次亜リン酸ナトリウムである還元剤、
有機酸或いは無機酸の銅塩及び必要に応じてpH調整用
の酸を含有する酸性還元剤水溶液で該酸化銅面を処理し
、乾燥してなる内層板を用いることを特徴とする多層プ
リント配線板の製造法であり、また、該酸性還元剤水溶
液が、次亜リン酸ナトIJウムの濃度5g/ 12〜3
00g/l 、銅塩の濃度が0.1〜200g/12.
 pHが1.0以上7.0未満であり、処理温度が40
〜80℃、処理時間が0.5〜5分間であることを特徴
とする多層プリント配線板の製造法である。
That is, in the method of manufacturing a multilayer printed wiring board, the present invention involves chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a black or brown copper oxide surface, and then performing the following steps. reducing agent, which is sodium phosphite;
A multilayer printed wiring characterized by using an inner layer plate obtained by treating the copper oxide surface with an acidic reducing agent aqueous solution containing a copper salt of an organic or inorganic acid and, if necessary, an acid for pH adjustment, and drying the surface. This is a method for manufacturing a board, and the acidic reducing agent aqueous solution has a concentration of sodium hypophosphite of 5 g/12 to 3
00g/l, the concentration of copper salt is 0.1-200g/12.
The pH is 1.0 or more and less than 7.0, and the treatment temperature is 40
This is a method for manufacturing a multilayer printed wiring board, characterized in that the temperature is 80° C. and the processing time is 0.5 to 5 minutes.

褐色或いは黒色の酸化銅膜は酸化第二銅を主体とする酸
化銅から形成されたものであり、上記した「ハロー現象
」或いは「ピンクリング現象」はこの酸化第二銅がスル
ーホールの洗浄やスルーホールメツキ等に使用する酸性
水溶液に溶解するために起こるものである。これに対し
て、本発明はこれらの処理液と同じ酸性水溶液を使用し
て、酸化第二銅を主体とする銅膜を酸性水溶液に溶解し
難い亜酸化銅を生成させるものである。本発明の処理に
よって、酸化第二銅を主体とする褐色或いは黒色の酸化
銅膜からの銅の溶解という新たな問題の発生もなく、実
用化可能な接着力を持ったハロー或いはピンクリングを
大幅に減少或いは無くすることができることは予想され
ないことであった。
The brown or black copper oxide film is formed from copper oxide mainly containing cupric oxide, and the above-mentioned "halo phenomenon" or "pink ring phenomenon" is caused by this cupric oxide cleaning through-holes and This occurs due to dissolution in acidic aqueous solutions used for through-hole plating, etc. In contrast, the present invention uses the same acidic aqueous solution as these treatment solutions to generate cuprous oxide, which is difficult to dissolve in the acidic aqueous solution, from a copper film mainly composed of cupric oxide. By the treatment of the present invention, there is no new problem of copper dissolution from brown or black copper oxide films, which are mainly made of cupric oxide, and halos or pink rings with adhesion strength that can be put to practical use can be significantly improved. It was unexpected that this could be reduced or even eliminated.

以下、本発明の構成について説明する。The configuration of the present invention will be explained below.

本発明の多層プリント配線板とは、上記した中間層に使
用する内層用プリント配線網を形成した内層板として銅
箔面を化学的に酸化し黒色或いは褐色の酸化銅面を形成
した後、次亜リン酸すl−IJウムを含有する酸性還元
剤水溶液で該酸化銅面を処理し、乾燥してなるものを使
用する他は、多層化積層成形に使用する内層板、多層化
接着に使用するプリプレグ、外層を形成するためのプリ
プレグおよび銅箔或いは片面銅張積層板などの積層材料
並びに積層成形の方法など従来公知のもの並びに方法が
使用できるものであり、特に限定されないものである。
The multilayer printed wiring board of the present invention is an inner layer board on which an inner layer printed wiring network used for the above-mentioned intermediate layer is formed, and after chemically oxidizing the copper foil surface to form a black or brown copper oxide surface, In addition to treating the copper oxide surface with an acidic reducing agent aqueous solution containing sodium phosphite and drying it, it is also used as an inner layer plate for multilayer lamination molding and for multilayer adhesion. Conventionally known materials and methods can be used, including prepregs for forming the outer layer, laminate materials such as copper foil or single-sided copper-clad laminates, and laminate molding methods, and are not particularly limited.

このような積層材料はEガラス、Sガラス、Dガラス、
石英ガラスなどの種々のガラス織布、アルミナペーパー
などの無機質の織布機材:全芳香属ポリアミド、ポリイ
ミド、フッ素樹脂、ポリフェニレンサルファイド、ポリ
エーテルエーテルケトン、ポリエーテルイミド、その他
の超耐熱性樹脂製の織布;上記の無機質の繊維と超耐熱
製樹脂製の繊維とを用いた複合糸を使用した織布;上記
を適宜組み合わせたものなどの織布を補強基材とし、ビ
スフェノールA型、ノボラック型、ハロゲン化ビスフェ
ノールA型、ハロゲン化ノボラック型、その他の3官能
以上の多官能性エポキシ化合物などのエポキシ樹脂;シ
アナト樹脂、シアン酸エステル−エポキシ樹脂、シアン
酸エステルーマレイミド−エポキシ樹脂などを典型とす
るシアン酸エステル系樹脂;ビスマレイミドなどの多官
能性マレイミド類とビス(4−アミノフェニル)メタン
などの多官能性アミンを主成分とするマレイミド系樹脂
;さらには耐熱性の熱可塑性樹脂や熱可塑性樹脂と熱硬
化性樹脂との組成物からなる樹脂などを使用してなるプ
リプレグ、電解銅箔や圧延銅箔などの銅箔、銅箔とプリ
プレグとを積層成形してなる両面或いは片面銅張積層板
、銅張積層板の片面或いは両面に内層用のプリント配線
網を形成した内層用プリント配線板(内層板)が例示さ
れる。また積層成形方法としては、従来の熱盤ブレス、
熱盤真空プレス、オートクレーブ成形などが例示される
Such laminated materials include E glass, S glass, D glass,
Various glass woven fabrics such as quartz glass, inorganic woven fabrics such as alumina paper: Fully aromatic polyamide, polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, and other super heat-resistant resins. Woven fabric: Woven fabric using composite yarn using the above-mentioned inorganic fibers and super heat-resistant resin fibers; Woven fabric such as a suitable combination of the above is used as a reinforcing base material, and bisphenol A type, novolac type Epoxy resins such as , halogenated bisphenol A type, halogenated novolak type, and other trifunctional or higher polyfunctional epoxy compounds; Typical examples include cyanato resin, cyanate ester-epoxy resin, cyanate ester-maleimide-epoxy resin, etc. cyanate ester resins; maleimide resins whose main components are polyfunctional maleimides such as bismaleimide and polyfunctional amines such as bis(4-aminophenyl)methane; Prepreg made of resin made from a composition of plastic resin and thermosetting resin, copper foil such as electrolytic copper foil or rolled copper foil, double-sided or single-sided copper cladding made by laminating and molding copper foil and prepreg. An example is a printed wiring board for inner layers (inner layer board) in which a printed wiring network for inner layers is formed on one or both sides of a laminate or a copper-clad laminate. In addition, as a lamination molding method, conventional hot platen press,
Examples include hot platen vacuum press and autoclave molding.

本発明の内層板に褐色或いは黒色の酸化銅皮膜を形成す
る方法は公知であり、通常、内層板の銅箔面を研磨、洗
浄した後、塩化銅又は過硫酸アンモニウムなどの水溶液
によりプレエツチング(ソフトエツチング、化学研磨)
した後、アルカリ性の酸化性水溶液で処理する方法で行
う。ここに、アルカリ性の酸化性水溶液並びに処理条件
としては具体的には下記の如きものが例示されるが、こ
れらに限定されるものではなく、公知方法が使用できる
The method of forming a brown or black copper oxide film on the inner layer plate of the present invention is known. Usually, after polishing and cleaning the copper foil surface of the inner layer plate, pre-etching (softening) is performed with an aqueous solution such as copper chloride or ammonium persulfate. etching, chemical polishing)
After that, it is treated with an alkaline oxidizing aqueous solution. Here, the alkaline oxidizing aqueous solution and treatment conditions are specifically exemplified below, but are not limited thereto, and known methods can be used.

■、水酸化ナトリウム(NaOH(15g/ ll))
/次亜塩素酸ナトリウム(NaC10□(31g/β)
)/リン酸ナトリウム(15g#り 、70〜100℃
、0.5〜10分間。
■, Sodium hydroxide (NaOH (15g/ll))
/ Sodium hypochlorite (NaC10□ (31g/β)
) / Sodium phosphate (15g #, 70-100℃
, for 0.5-10 minutes.

■、硫酸銅(50g/ 12 ) /塩化ナトリウム(
200g/ !! )、40〜80℃、3〜15分間。
■, Copper sulfate (50g/12)/sodium chloride (
200g/! ! ), 40-80°C, 3-15 minutes.

■、酢酸(20g/l)/塩化アンモニウム(20g/
 j2 )/酢酸銅(10g/j2) 、30〜80℃
、1〜10分間。
■, acetic acid (20g/l)/ammonium chloride (20g/l)
j2)/copper acetate (10g/j2), 30-80℃
, for 1-10 minutes.

■、酢酸銅(10g/ I! ) /硫酸銅(24g/
 (! ) /硫化バリウム(24g/12)/塩化ア
ンモニウム(24g/ (1)、40〜50℃、1〜1
0分間。
■, Copper acetate (10g/I!) / Copper sulfate (24g/
(!) /Barium sulfide (24g/12)/Ammonium chloride (24g/ (1), 40-50℃, 1-1
0 minutes.

■、硫酸銅(25g/ l ) /硫酸ニッケル(25
g/ (2) /塩素酸カリウム(25g/β)、70
〜90℃、1〜10分間。
■, Copper sulfate (25g/l) / Nickel sulfate (25g/l)
g/(2)/potassium chlorate (25g/β), 70
~90°C, 1-10 minutes.

■、過硫酸カリウム(20g/(り/水酸化ナトリウム
50g#2) 、50〜80℃、1〜3分間。
(2) Potassium persulfate (20g/(Li/50g of sodium hydroxide #2), 50-80°C, 1-3 minutes.

上記で褐色或いは黒色処理した内層板を清浄化した後、
本発明の次亜リン酸す) IJウム、有機酸或いは無機
酸の銅塩及び必要に応じてpH調整用の酸を含有する酸
性還元剤水溶液で処理しζ水洗し、乾燥した内層板を使
用して、「ハロー」の発生を大幅に減少或いは無くする
After cleaning the inner layer plate treated brown or black above,
The inner layer plate of the present invention is treated with an aqueous acidic reducing agent solution containing hypophosphorous acid (IJ), a copper salt of an organic acid or an inorganic acid, and an acid for pH adjustment as necessary, washed with water, and dried. This greatly reduces or eliminates the occurrence of "halos".

本発明の酸性還元剤水溶液とは、還元剤である次亜リン
酸ナトリウム(”Na82PO2)の濃度が5〜3゜O
g/j’、好まL < Lt 10〜100g/ 12
、有機酸或いは無機酸の銅塩の濃度が0.1〜200g
/ 12 、好ましくは1〜50g#2 SpHが1.
0以上7.0未満、好ましくは2.0〜5.0であり、
処理温度 40〜80℃、処理時間0.5〜5分間の条
件を使用する。
The acidic reducing agent aqueous solution of the present invention means that the concentration of sodium hypophosphite ("Na82PO2), which is a reducing agent, is 5 to 3°O.
g/j', preferably L<Lt 10-100g/12
, the concentration of copper salt of organic acid or inorganic acid is 0.1-200g
/ 12, preferably 1-50g #2 SpH is 1.
0 or more and less than 7.0, preferably 2.0 to 5.0,
The conditions used are a treatment temperature of 40 to 80°C and a treatment time of 0.5 to 5 minutes.

有機酸或いは無機酸の銅塩としては、塩化鋼、硫酸銅な
どの無機酸の銅塩、蟻酸銅、酢酸銅などの有機酸の銅塩
が挙げられる。また必要に応じて使用する酸としては、
蟻酸、酢酸などの有機酸があげられ、濃度としては1〜
50rrL1.llの範囲が例示される。
Examples of copper salts of organic acids or inorganic acids include copper salts of inorganic acids such as steel chloride and copper sulfate, and copper salts of organic acids such as copper formate and copper acetate. In addition, as an acid to be used as necessary,
Examples include organic acids such as formic acid and acetic acid, with concentrations ranging from 1 to
50rrL1. A range of ll is exemplified.

処理済の内層板を水洗し、風乾、加熱(特に80〜20
0℃)などの公知の方法で乾燥して本発明の処理された
内層板とする。
Wash the treated inner layer board with water, air dry, and heat (especially at 80 to 20
The treated inner layer plate of the present invention is obtained by drying by a known method such as at 0° C.).

〔実施例〕〔Example〕

以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.

実施例1 厚み0.8mm、銅箔厚み70.の両面銅張ガラスエポ
キシ積層板の両面の約半分を公知エツチング法で除去し
た後、NaOH(15g/ (1) /次亜塩素酸す)
 IJウム(31g#り/リン酸ナトリウム(15g#
りの水溶液で90℃、5分間処理し、水洗した後、この
内層板を次亜リン酸ナトリウム(Na82PO230g
/ (1)/硫酸銅(30g#り /酢酸(3m1./
 l )のpH3,0〜4.0の酸性還元処理水溶液を
用い、80tで1.5分間処理した後、十分に水洗し、
130t、30分間乾燥して処理内層板を得た。
Example 1 Thickness: 0.8 mm, copper foil thickness: 70. After removing about half of both sides of the double-sided copper-clad glass epoxy laminate using a known etching method, NaOH (15g/(1)/hypochlorous acid) was added.
IJium (31g#)/Sodium Phosphate (15g#)
After treating with an aqueous solution of Na82PO2 at 90℃ for 5 minutes and washing with water, the inner layer plate was treated with sodium hypophosphite (Na82PO230g).
/ (1) / Copper sulfate (30 g / Acetic acid (3 m1. /
l) using an acidic reduction treatment aqueous solution with a pH of 3.0 to 4.0, treated at 80 t for 1.5 minutes, and then thoroughly washed with water.
A treated inner laminate was obtained by drying at 130 tons for 30 minutes.

処理内層板の両面にガラスエポキシプリプレグ(樹脂量
52%、厚み0.1mm)  3枚、きらに厚み18虜
の電解銅箔を重ねて温度175℃、圧力40kg/cn
fで2時間積層成形して4層板とした後、冷却し、次い
で孔径0.4Mφ、8万r、 p、 mo、20n/回
転の条件でi、 ooo個、 2.54mmの間隔の孔
あけした。尚、孔あけした内層の処理銅箔面は黒色であ
った。
Three sheets of glass epoxy prepreg (resin content 52%, thickness 0.1 mm) and 18 mm thick electrolytic copper foil were layered on both sides of the treated inner laminate at a temperature of 175°C and a pressure of 40 kg/cm.
After laminating and forming a 4-layer plate at f for 2 hours, it was cooled, and then it was molded with i, ooo holes at a spacing of 2.54 mm under the conditions of a hole diameter of 0.4 Mφ, 80,000 r, p, mo, and 20 n/rotation. It was open. Note that the treated copper foil surface of the inner layer with holes was black.

この孔あけした4層板を4NのIIcI水溶液に5分間
浸漬して内層のある孔周囲のハローを全孔の任意の1/
4 (125個)について観察するとともにその最大の
ものの長さを測定した。
This perforated 4-layer plate was immersed in a 4N IIcI aqueous solution for 5 minutes to remove the halo around the hole in the inner layer at an arbitrary 1/2 inch of the total hole.
4 (125 pieces) were observed and the length of the largest one was measured.

又、孔あけした4層板を5cm角に取り、100℃、6
時間煮沸した後、260℃のハンダに30秒浸漬する試
験をした。
Also, take a 5 cm square piece of the 4-layer board with holes and heat it at 100°C for 6
After boiling for an hour, a test was conducted by immersing it in solder at 260°C for 30 seconds.

又、上記において、孔あけした4層板を用い、通常の銅
スルーホールメツキを実施した後に、同様にハローにつ
いて測定した。
Further, in the above, using the perforated four-layer board, after carrying out ordinary copper through-hole plating, the halo was similarly measured.

結果を第1表に示した。The results are shown in Table 1.

実施例2 実施例1において、酸性還元処理水溶液として次亜リン
酸ナトリウム(NaH2PO□50g/l) /硫酸銅
(30g#り /酢酸(4mjl!#)のpH3,0〜
4゜0の水溶液を用いる他は同様とした結果を第1表に
示した。
Example 2 In Example 1, the acidic reduction treatment aqueous solution was sodium hypophosphite (NaH2PO□50g/l)/copper sulfate (30g/l)/acetic acid (4mjl!#) at pH 3.0~
Table 1 shows the results obtained in the same manner except that a 4°0 aqueous solution was used.

実施例3 実施例1において、同じ酸性還元処理水溶液を用い、内
層板の処理面積/処理液体積の比を0.01m’/ 1
 (lとして、処理液に還元剤を補充することなく還元
処理を20回行い、20回目の結果を第4表に示した。
Example 3 In Example 1, the same acidic reduction treatment aqueous solution was used, and the ratio of treatment area of inner layer plate/treatment liquid volume was 0.01 m'/1.
(1) The reduction treatment was performed 20 times without replenishing the reducing agent to the treatment solution, and the results of the 20th treatment are shown in Table 4.

比較例1.2 実施例1において、黒色酸化銅処理内層板の還元処理を
アルカリ性還元剤水溶液(30重量%ホルマリン水溶液
30m1/ l 、 KO838g#! 、温度75℃
)に15分間浸漬(比較例1)及びアルカリ性還元剤水
溶液(次亜リン酸ナトリウム30g/ 1、Na0II
 5g/l、温度65℃)に10分間浸漬(比較例2)
する他は同様とした。この結果、一部には「ハロー」0
のものもあったが、最大のものは第1表に記載の通りで
あり、バラツキが大きいものであった。
Comparative Example 1.2 In Example 1, the black copper oxide treated inner layer plate was reduced using an alkaline reducing agent aqueous solution (30% by weight formalin aqueous solution 30ml/l, KO838g#!, temperature 75°C)
) for 15 minutes (Comparative Example 1) and an alkaline reducing agent aqueous solution (sodium hypophosphite 30g/1, Na0II
5g/l, temperature 65°C) for 10 minutes (Comparative Example 2)
The rest was the same. As a result, some people say “Hello” 0
Although there were some cases, the largest one was as shown in Table 1, and there was a large variation.

実施例4 実施例1において、内層板として両面銅張ガラス−シア
ン酸エステル・マレイミド・エポキシ樹脂積層板(三菱
瓦斯化学■製、l比810)を用いたものを使用し、多
層化接着用プリプレグとしてガラスシアン酸エステル−
マレイミド−エポキシ樹脂プリプレグ(三菱瓦斯化学■
製、GHPL 810)を用い、表面処理用シアナト化
合物の希薄溶液として1,4−ジシアナトベンゼン溶解
したものを用い、多層化積層成形条件を温度200℃、
2時間に変更する他は同様とした結果を第2表に示した
Example 4 In Example 1, a double-sided copper-clad glass-cyanate ester maleimide epoxy resin laminate (manufactured by Mitsubishi Gas Chemical Co., Ltd., L ratio 810) was used as the inner layer plate, and a prepreg for multilayer adhesive was used. As glass cyanate ester-
Maleimide-epoxy resin prepreg (Mitsubishi Gas Chemical ■
GHPL 810), a dilute solution of cyanato compound for surface treatment in which 1,4-dicyanatobenzene was dissolved, and the multilayer lamination molding conditions were a temperature of 200°C,
Table 2 shows the results in the same manner except that the time was changed to 2 hours.

配線間の電気的導通を行うスルーホールメツキ工程にお
いて、メツキ液に褐色或いは黒色酸化銅が溶解して電気
的短絡などの不良発生の原因となりやすい「ハロー」の
発生が大幅に減少するか、又は全く無くなり、その処理
時間も従来のアルカリ性還元剤水溶液処理に比較して大
幅に短縮され、かつ繰り返し使用も可能であり、信頼性
に優れた多層プリント配線板を生産性よく製造できるも
ので、工業的な意義は極めて高いものである。
In the through-hole plating process that creates electrical continuity between wiring, the occurrence of "halos" that tend to cause defects such as electrical short circuits due to the dissolution of brown or black copper oxide in the plating solution is greatly reduced, or The process time is significantly shortened compared to conventional alkaline reducing agent aqueous solution treatment, and it can be used repeatedly, making it possible to manufacture highly reliable multilayer printed wiring boards with high productivity, making it an industrial option. The significance of this is extremely high.

特許出願人  三菱瓦斯化学株式会社 代理人 弁理士(9070)  手掘 貞文〔発明の作
用および効果〕
Patent Applicant Mitsubishi Gas Chemical Co., Ltd. Agent Patent Attorney (9070) Sadafumi Tebori [Operations and Effects of the Invention]

Claims (1)

【特許請求の範囲】 1 多層プリント配線板の製造法において、中間層とし
て用いるプリント配線網を形成した内層板の銅箔面を化
学的に酸化し褐色或いは黒色の酸化銅面を形成した後、
次亜リン酸ナトリウムである還元剤、有機酸或いは無機
酸の銅塩及び必要に応じてpH調整用の酸を含有する酸
性還元剤水溶液で該酸化銅面を処理し、乾燥してなる内
層板を用いることを特徴とする多層プリント配線板の製
造法。 2 該酸性還元剤水溶液が、次亜リン酸ナトリウムの濃
度5g/l〜300g/l、銅塩の濃度が0.1〜20
0g/l、pHが1.0以上7.0未満であり、処理温
度が40〜80℃、処理時間が0.5〜5分間である請
求項1記載の多層プリント配線板の製造法。
[Claims] 1. In a method for manufacturing a multilayer printed wiring board, after chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface,
An inner layer plate obtained by treating the copper oxide surface with an acidic reducing agent aqueous solution containing a reducing agent such as sodium hypophosphite, a copper salt of an organic acid or an inorganic acid, and an acid for pH adjustment as necessary, and drying. A method for manufacturing a multilayer printed wiring board characterized by using. 2 The acidic reducing agent aqueous solution has a sodium hypophosphite concentration of 5 g/l to 300 g/l and a copper salt concentration of 0.1 to 20 g/l.
The method for manufacturing a multilayer printed wiring board according to claim 1, wherein the pH is 1.0 or more and less than 7.0, the treatment temperature is 40 to 80°C, and the treatment time is 0.5 to 5 minutes.
JP63282364A 1988-09-06 1988-11-10 Manufacturing method of multilayer printed board Pending JPH02129996A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP63282364A JPH02129996A (en) 1988-11-10 1988-11-10 Manufacturing method of multilayer printed board
MYPI89001201A MY104191A (en) 1988-09-06 1989-09-05 Process for producing multilayer printed wiring board
KR1019890012890A KR970004029B1 (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board
US07/403,519 US5076864A (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board
DE68920383T DE68920383T2 (en) 1988-09-06 1989-09-06 Process for producing a multilayer printed circuit board.
EP89309018A EP0358480B1 (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63282364A JPH02129996A (en) 1988-11-10 1988-11-10 Manufacturing method of multilayer printed board

Publications (1)

Publication Number Publication Date
JPH02129996A true JPH02129996A (en) 1990-05-18

Family

ID=17651449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63282364A Pending JPH02129996A (en) 1988-09-06 1988-11-10 Manufacturing method of multilayer printed board

Country Status (1)

Country Link
JP (1) JPH02129996A (en)

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