JPH0213781B2 - - Google Patents

Info

Publication number
JPH0213781B2
JPH0213781B2 JP56029719A JP2971981A JPH0213781B2 JP H0213781 B2 JPH0213781 B2 JP H0213781B2 JP 56029719 A JP56029719 A JP 56029719A JP 2971981 A JP2971981 A JP 2971981A JP H0213781 B2 JPH0213781 B2 JP H0213781B2
Authority
JP
Japan
Prior art keywords
resist film
film
polyvinyl carbazole
thickness
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56029719A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57143828A (en
Inventor
Shuzo Ooshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56029719A priority Critical patent/JPS57143828A/ja
Publication of JPS57143828A publication Critical patent/JPS57143828A/ja
Publication of JPH0213781B2 publication Critical patent/JPH0213781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56029719A 1981-03-02 1981-03-02 Method of pattern formation Granted JPS57143828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56029719A JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56029719A JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Publications (2)

Publication Number Publication Date
JPS57143828A JPS57143828A (en) 1982-09-06
JPH0213781B2 true JPH0213781B2 (de) 1990-04-05

Family

ID=12283910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56029719A Granted JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Country Status (1)

Country Link
JP (1) JPS57143828A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512295U (ja) * 1991-08-02 1993-02-19 文宏 西尾 携帯電話機用ホルダー

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796333A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Production of substrate for exposure of charged beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512295U (ja) * 1991-08-02 1993-02-19 文宏 西尾 携帯電話機用ホルダー

Also Published As

Publication number Publication date
JPS57143828A (en) 1982-09-06

Similar Documents

Publication Publication Date Title
JP2654450B2 (ja) レジスト・パターンの形成方法
US5480047A (en) Method for forming a fine resist pattern
JPH04115515A (ja) パターン形成方法
JPH0142134B2 (de)
US4988609A (en) Method of forming micro patterns
JPS59124134A (ja) レジスト・マスクの形成方法
JPH0213781B2 (de)
JPS58218119A (ja) パタ−ン形成方法
JPS6239817B2 (de)
US3824014A (en) Relief mask for high resolution photolithography
JPH06105678B2 (ja) 半導体装置の製造方法
JPH04249311A (ja) 光リソグラフィーの限界解像度以下の微細パターン形成方法
JPS59124133A (ja) ネガテイブ型レジスト像の形成方法
JPH03283418A (ja) レジストパターン形成方法
JPH0419697B2 (de)
JPH02156244A (ja) パターン形成方法
JP2712407B2 (ja) ２層フォトレジストを用いた微細パターンの形成方法
JP3271227B2 (ja) 半導体装置製造用原版レチクルの製造方法及びその装置
JPH0513325A (ja) パターン形成方法
KR100442968B1 (ko) 반도체소자의감광막형성방법
JPH0223355A (ja) パターン形成方法
JPH0147009B2 (de)
JPH0462166B2 (de)
JPS58153932A (ja) 写真蝕刻方法
JPS58122726A (ja) レジスト寸法の精密制御による半導体素子の製造方法