JPS57143828A - Method of pattern formation - Google Patents

Method of pattern formation

Info

Publication number
JPS57143828A
JPS57143828A JP56029719A JP2971981A JPS57143828A JP S57143828 A JPS57143828 A JP S57143828A JP 56029719 A JP56029719 A JP 56029719A JP 2971981 A JP2971981 A JP 2971981A JP S57143828 A JPS57143828 A JP S57143828A
Authority
JP
Japan
Prior art keywords
polyvinyl carbazole
resist film
resist
unevenness
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56029719A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0213781B2 (de
Inventor
Shuzo Oshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56029719A priority Critical patent/JPS57143828A/ja
Publication of JPS57143828A publication Critical patent/JPS57143828A/ja
Publication of JPH0213781B2 publication Critical patent/JPH0213781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56029719A 1981-03-02 1981-03-02 Method of pattern formation Granted JPS57143828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56029719A JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56029719A JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Publications (2)

Publication Number Publication Date
JPS57143828A true JPS57143828A (en) 1982-09-06
JPH0213781B2 JPH0213781B2 (de) 1990-04-05

Family

ID=12283910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56029719A Granted JPS57143828A (en) 1981-03-02 1981-03-02 Method of pattern formation

Country Status (1)

Country Link
JP (1) JPS57143828A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512295U (ja) * 1991-08-02 1993-02-19 文宏 西尾 携帯電話機用ホルダー

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796333A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Production of substrate for exposure of charged beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796333A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Production of substrate for exposure of charged beam

Also Published As

Publication number Publication date
JPH0213781B2 (de) 1990-04-05

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