JPH0213952A - Automatic pellicle foreign matter removing device - Google Patents

Abstract

PURPOSE:To raise the foreign matter removing rate on a mask and a pellicle by improving the separation of an adhered debris by means of butting compressed air charged electrostatically by an ionizer on the pellicle and the mask from a nozzle oscillated by a ultrasonic wave. CONSTITUTION:The mask 3 with the pellicle 2 is set on a mask holder 1 and the mask 3 with the pellicle 2 is slowly inserted into a foreign matter removing room 5 together with the mask holder 1 from an entrance and exit 4. At the same time, ionizer air 7 charged electrostatically with iona static electricity is blown out from the air nozzle. At such a moment, the air nozzle is oscillated by a ultrasonic wave oscillating part 8 and the ionizer air 7 goes to a coarse/ fine wave. The ionizer air 7 from the air nozzle 6 butts on debris 9 on the mask 3 and the pellicle 2 and the debris is parted from the pellicle 2. Thus, the foreign matter removing rate rises.

Description

[Detailed Description of the Invention] [Industrial Application Field] This invention relates to an apparatus for removing foreign matter on a mask and pellicle used when transferring a pattern to a wafer in the manufacture of VLSI and IC. .

[Conventional technology]

Conventional equipment that uses air to remove foreign substances on masks and pellicles used when transferring patterns to wafers in the manufacture of semiconductor devices consists of a projector, an ionizer, an air gun, and a mask support stand. .

Next, the operation will be explained.

Mask without pellicle or mask with pellicle (
Hereafter, simply referred to as a mask) is set on the mask support stand,
Air charged by an ionizer is applied to the mask to remove static electricity from the pellicle and the mask, improving the ability to remove foreign objects. Further, using a projector, while visually observing the foreign matter on the pellicle and mask, blow away the foreign matter with an air gun.

Further, the mask is turned over and foreign matter on the back side of the mask is removed in the same manner.

[The problem that the invention attempts to solve]

Conventional pellicle foreign object removal equipment is configured as described above, so not only does it take time and effort to remove foreign objects, but if the equipment is not properly handled, it can damage the pellicle mask. there is a possibility. Additionally, since it involves one manual step, there is a possibility that foreign matter may re-adhere when the mask is turned over, making countermeasures an issue.

The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a device that can remove foreign substances on a mask without manual work.

[Means to solve the problem]

The pellicle foreign matter removing device according to the present invention is similar to the conventional machine 5'.
By adding an ionizer and an ultrasonic nozzle, this reduction in foreign material removal rate was prevented due to the integration and automation of the system.

[Effect]

The improvement in the foreign matter removal rate in this invention is due to the neutralization of static electricity on the mask and pellicle surfaces by the ionizer.
This is due to the impact of the compressed air produced by the ultrasonic vibration mechanism on foreign objects.

〔Example〕

One embodiment of this invention gAJK will be described below.

Fig. 81 is a cross-sectional view of the main parts of the automatic pellicle foreign matter removal device according to the present invention, Fig. 2 shows a state in which foreign substances are removed from the pellicle at position V in Fig. 1, and 1ml is a perspective view; bl is a side view.

FIG. 3 is a perspective view of the automatic pellicle anomaly removing apparatus according to the present invention, which is attached to an aligner such as a pellicle fine projection exposure apparatus.

In the figure, il [mask holder, I21i pellicle,
+a+H mask, ;41 is the entrance/exit, +6) is the foreign matter removal chamber, ;611d air nozzle, (power is the ionizer, (8)
) is the ultrasonic excitation part, (9) is the foreign object, (10) is the exhaust port,
Uυ is a pellicle frame, 131 is a small projection exposure apparatus aligner, 131 is a main body of the self-help foreign matter removal apparatus, and 114+ is a holder drive unit.

Next, the operation will be explained.

1. The mask 131 with the pellicle +21 is set in the mask holder +Il of this device. (See Figure 1) 2. Next, a mask 131 with a pellicle 12) and a mask holder 11.
1 and the foreign body removal chamber 16 slowly from the entrance/exit (4).
).

8. At the same time, ionizer air (7), which is electrostatically charged by an ionizer (not shown), is ejected from the air nozzle 16). At this time, the air nozzle (6) is vibrated by the ultrasonic vibrator (8), and the ionizer air 171 becomes a compressional wave.

4. In the process of inserting the mask (3: 2 to the odoriest part of the foreign object removal chamber +51), the ionizer air (7) from the air nozzle (6) hits the foreign object (9) on the pellicle (2), causing the pellicle ( 21 Leave the top. (Figure 2) 5. On the other hand,
There is an exhaust port flo+ in the opposite direction to the entrance and exit port (41), and since it is normally evacuated, the mass z (31) and the foreign matter (9) separated from the pellicle (2) are quickly exhausted.

8. Foreign object (9) inserted into the foreign object removal chamber 16)
After the mask 131 has been removed, it slowly returns to its original position.

7. As described above, the mask (3) is cleaned automatically.

In addition, in the above embodiment, a mask with a pellicle +21 (31
Although we have described the case where the pellicle (mask (3) with 21 is directly inserted into the foreign matter removal chamber +61), the pellicle (mask (3) with 21 is inserted into the aligner-02 of a reduction projection exposure apparatus, etc.) l/I:
It is also possible to attach it.

[Effects of Cta Akira] As described above, according to the present invention, it is expected to improve the foreign matter removal rate and reduce manual labor when removing foreign matter from masks and pellicles, thereby improving VLSI yield and productivity. There is.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing the main parts of an automatic pellicle foreign matter removal device according to the present invention, and FIG. FIG. 8 is a perspective view of a 41h pellicle foreign matter removing apparatus according to the present invention in which a pellicle is attached to an aligner such as a small projection exposure apparatus. In the figure +II Irl mask holder, +21ij
Pellicle,)3) has a mask, (4) has an entrance/exit, 1lil
is a foreign matter removal chamber, 161 is an air nozzle, (force is ionizer air, (8) is an ultrasonic excitation unit, (91 is a foreign matter, (
10) is an exhaust port, αυ is a pellicle frame, +121 is a small projection exposure apparatus aligner-1 (+31 is an automatic foreign matter removal apparatus main body part, and a4 is a holder pivoting part. In addition, in the figures, the same reference numerals are the same or A considerable portion is shown.

Claims (1)

[Claims] An automatic pellicle characterized in that compressed air charged by an ionizer is applied to a mask with a pellicle and a mask without a pellicle from a nozzle excited by ultrasonic waves, thereby improving the ability to remove foreign matter adhering to the pellicle and the mask. Foreign matter removal device.