JPH02140736A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH02140736A JPH02140736A JP29430988A JP29430988A JPH02140736A JP H02140736 A JPH02140736 A JP H02140736A JP 29430988 A JP29430988 A JP 29430988A JP 29430988 A JP29430988 A JP 29430988A JP H02140736 A JPH02140736 A JP H02140736A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- general formula
- emulsion
- sensitivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 131
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 44
- 239000004332 silver Substances 0.000 title claims abstract description 44
- 239000000463 material Substances 0.000 title claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 20
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 12
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 6
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 4
- 125000004429 atom Chemical group 0.000 claims abstract description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 4
- 150000001875 compounds Chemical group 0.000 claims description 38
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 230000035945 sensitivity Effects 0.000 abstract description 44
- 239000000975 dye Substances 0.000 abstract description 35
- 239000000839 emulsion Substances 0.000 abstract description 33
- 230000003595 spectral effect Effects 0.000 abstract description 27
- 230000001235 sensitizing effect Effects 0.000 abstract description 11
- 229910052740 iodine Inorganic materials 0.000 abstract description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 description 42
- 125000001424 substituent group Chemical group 0.000 description 16
- 108010010803 Gelatin Proteins 0.000 description 15
- 239000008273 gelatin Substances 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 15
- 235000019322 gelatine Nutrition 0.000 description 15
- 235000011852 gelatine desserts Nutrition 0.000 description 15
- 206010070834 Sensitisation Diseases 0.000 description 14
- 238000011161 development Methods 0.000 description 14
- 230000008313 sensitization Effects 0.000 description 14
- 230000005070 ripening Effects 0.000 description 13
- 239000013078 crystal Substances 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000011593 sulfur Substances 0.000 description 5
- 150000003568 thioethers Chemical class 0.000 description 5
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 5
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical compound C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 4
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 4
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 4
- 229910021607 Silver chloride Inorganic materials 0.000 description 4
- 229910021612 Silver iodide Inorganic materials 0.000 description 4
- 125000004442 acylamino group Chemical group 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical compound C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 4
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical compound C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 239000004848 polyfunctional curative Substances 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 4
- 229940045105 silver iodide Drugs 0.000 description 4
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 4
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 3
- USYCQABRSUEURP-UHFFFAOYSA-N 1h-benzo[f]benzimidazole Chemical compound C1=CC=C2C=C(NC=N3)C3=CC2=C1 USYCQABRSUEURP-UHFFFAOYSA-N 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical compound C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000586 desensitisation Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 3
- 235000019345 sodium thiosulphate Nutrition 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 125000003944 tolyl group Chemical group 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- HXMRAWVFMYZQMG-UHFFFAOYSA-N 1,1,3-triethylthiourea Chemical compound CCNC(=S)N(CC)CC HXMRAWVFMYZQMG-UHFFFAOYSA-N 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- MVVFUAACPKXXKJ-UHFFFAOYSA-N 4,5-dihydro-1,3-selenazole Chemical compound C1CN=C[Se]1 MVVFUAACPKXXKJ-UHFFFAOYSA-N 0.000 description 2
- QMHIMXFNBOYPND-UHFFFAOYSA-N 4-methylthiazole Chemical compound CC1=CSC=N1 QMHIMXFNBOYPND-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000004061 bleaching Methods 0.000 description 2
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 2
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 2
- 125000002541 furyl group Chemical group 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- 125000000101 thioether group Chemical group 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- GVEYRUKUJCHJSR-UHFFFAOYSA-N (4-azaniumyl-3-methylphenyl)-ethyl-(2-hydroxyethyl)azanium;sulfate Chemical compound OS(O)(=O)=O.OCCN(CC)C1=CC=C(N)C(C)=C1 GVEYRUKUJCHJSR-UHFFFAOYSA-N 0.000 description 1
- ZQDPYAPUFMILTB-CSKARUKUSA-N (5e)-5-benzylidene-3-ethyl-2-sulfanylidene-1,3-thiazolidin-4-one Chemical compound O=C1N(CC)C(=S)S\C1=C\C1=CC=CC=C1 ZQDPYAPUFMILTB-CSKARUKUSA-N 0.000 description 1
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- UUJOCRCAIOAPFK-UHFFFAOYSA-N 1,3-benzoselenazol-5-ol Chemical compound OC1=CC=C2[se]C=NC2=C1 UUJOCRCAIOAPFK-UHFFFAOYSA-N 0.000 description 1
- BREUOIWLJRZAFF-UHFFFAOYSA-N 1,3-benzothiazol-5-ol Chemical compound OC1=CC=C2SC=NC2=C1 BREUOIWLJRZAFF-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- RBIZQDIIVYJNRS-UHFFFAOYSA-N 1,3-benzothiazole-5-carboxylic acid Chemical compound OC(=O)C1=CC=C2SC=NC2=C1 RBIZQDIIVYJNRS-UHFFFAOYSA-N 0.000 description 1
- UPPYOQWUJKAFSG-UHFFFAOYSA-N 1,3-benzoxazol-5-ol Chemical compound OC1=CC=C2OC=NC2=C1 UPPYOQWUJKAFSG-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- JXUKLFVKZQETHF-UHFFFAOYSA-N 1-$l^{1}-selanyl-n,n'-dimethylmethanimidamide Chemical compound CNC([Se])=NC JXUKLFVKZQETHF-UHFFFAOYSA-N 0.000 description 1
- OOERSUSBKPGELF-UHFFFAOYSA-N 1-benzyl-5-methylsulfonylbenzimidazole Chemical compound C1=NC2=CC(S(=O)(=O)C)=CC=C2N1CC1=CC=CC=C1 OOERSUSBKPGELF-UHFFFAOYSA-N 0.000 description 1
- HLRJOKUMGAFECQ-UHFFFAOYSA-N 1-ethylbenzo[e]benzimidazole Chemical compound C1=CC=CC2=C3N(CC)C=NC3=CC=C21 HLRJOKUMGAFECQ-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- 150000001473 2,4-thiazolidinediones Chemical class 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- UGWULZWUXSCWPX-UHFFFAOYSA-N 2-sulfanylideneimidazolidin-4-one Chemical group O=C1CNC(=S)N1 UGWULZWUXSCWPX-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- ZAMLGGRVTAXBHI-UHFFFAOYSA-N 3-(4-bromophenyl)-3-[(2-methylpropan-2-yl)oxycarbonylamino]propanoic acid Chemical compound CC(C)(C)OC(=O)NC(CC(O)=O)C1=CC=C(Br)C=C1 ZAMLGGRVTAXBHI-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- XRZDIHADHZSFBB-UHFFFAOYSA-N 3-oxo-n,3-diphenylpropanamide Chemical compound C=1C=CC=CC=1NC(=O)CC(=O)C1=CC=CC=C1 XRZDIHADHZSFBB-UHFFFAOYSA-N 0.000 description 1
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- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical compound SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 description 1
- 125000002632 imidazolidinyl group Chemical group 0.000 description 1
- 125000002636 imidazolinyl group Chemical group 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000004594 isoindolinyl group Chemical group C1(NCC2=CC=CC=C12)* 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- 125000001786 isothiazolyl group Chemical group 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- HXMDFSDFQBOIKG-UHFFFAOYSA-N n-(1,3-benzothiazol-5-yl)acetamide Chemical compound CC(=O)NC1=CC=C2SC=NC2=C1 HXMDFSDFQBOIKG-UHFFFAOYSA-N 0.000 description 1
- UUYJSOYTHDTYEZ-UHFFFAOYSA-N n-(1,3-benzothiazol-6-yl)propanamide Chemical compound CCC(=O)NC1=CC=C2N=CSC2=C1 UUYJSOYTHDTYEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- 125000002755 pyrazolinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 150000003236 pyrrolines Chemical class 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 125000004621 quinuclidinyl group Chemical group N12C(CC(CC1)CC2)* 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical class O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 125000000854 selenoether group Chemical group 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 1
- JHJUUEHSAZXEEO-UHFFFAOYSA-M sodium;4-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=C(S([O-])(=O)=O)C=C1 JHJUUEHSAZXEEO-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000005958 tetrahydrothienyl group Chemical group 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000001391 thioamide group Chemical group 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000004886 thiomorpholines Chemical class 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/28—Sensitivity-increasing substances together with supersensitising substances
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はハロゲン化銀写真感光材料に関し、特にテルロ
エーテル化合物を使用した分光増感されたハロゲン化銀
写真感光材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a silver halide photographic light-sensitive material spectrally sensitized using a telluroether compound.
(従来の技術)
従来より、写真感度が高く、かつカブリの発生も少なく
、また経時保存中の写真性能の変化の少ないハロゲン化
銀写真感光材料を得る努力がなされてきた。(Prior Art) Efforts have heretofore been made to obtain silver halide photographic materials that have high photographic sensitivity, little fogging, and little change in photographic performance during storage over time.
また、通常ハロゲン化銀写真乳剤は、増感色素を用い、
ハロゲン化銀自体は吸収をもたない緑、赤、赤外といっ
た波長域まで写真感度をもつように分光増感される。In addition, silver halide photographic emulsions usually use sensitizing dyes,
Silver halide itself is spectrally sensitized so that it has photographic sensitivity to wavelengths such as green, red, and infrared, where it has no absorption.
この分光感度を増すために、増感色素の使用量を増すこ
とがよく行なわれるが、使用量を増すと、同時に色素に
よる現像抑制、潜像分散、または色素を孔による光電子
の無効化や潜像漂白等によるとみられている固有波長域
の感度の低下いわゆる固有感度が大きくなり、その結果
として分光感度が頭打ちになり増加しなくなる。In order to increase this spectral sensitivity, it is often done to increase the amount of sensitizing dye used, but at the same time, increasing the amount used also inhibits development by the dye, disperses the latent image, or nullifies photoelectrons due to holes in the dye. Decrease in sensitivity in the characteristic wavelength range, which is thought to be due to image bleaching, etc. The so-called characteristic sensitivity increases, and as a result, the spectral sensitivity reaches a plateau and no longer increases.
こういった分光感度を更に増大せしめるために、例えば
米国特許第3,506,443号に記載のように、ある
種のチオエーテル化合物を用いることが知られていた。To further increase this spectral sensitivity, it was known to use certain thioether compounds, as described, for example, in US Pat. No. 3,506,443.
しかしながら、これらのチオエーテル化合物では未だ効
果が不十分であった。However, these thioether compounds still had insufficient effects.
また、チオエーテル化合物と同様に、ハロゲン化銀溶剤
ないし増感剤として作用するテルロエーテル化合物が特
開昭53−57817号に記載されており、増感色素、
1.1′−ジエチル−2゜2′−シアニンクロライドと
併用した技術が開示されているが、この色素は分光増感
性がもともとかなり低いものであり、また、実施例に示
すように多量の色素による固有減感も小さい。In addition, similar to thioether compounds, tellurium ether compounds which act as silver halide solvents or sensitizers are described in JP-A-53-57817, and include sensitizing dyes,
A technique in which 1.1'-diethyl-2゜2'-cyanine chloride is used in combination has been disclosed, but the spectral sensitization of this dye is originally quite low, and as shown in the examples, a large amount of the dye is used. Intrinsic desensitization caused by this phenomenon is also small.
分光増感性が大きいが、同時に多量の色素による固有減
感が大きい本発明の色素(下記一般(I)のもの)につ
いては、その固有減感をへらし、分光感度を更に向上さ
せる技術の開発が熱望されていた。For the dyes of the present invention that have large spectral sensitization but also have large inherent desensitization due to a large amount of dye (the following general (I)), it is necessary to develop a technology to reduce the inherent desensitization and further improve the spectral sensitivity. It was coveted.
(発明の目的)
本発明の第1の目的は、カブリの増大を伴うことなしに
、分光感度を増大せしめた乳剤を提供することにある。(Object of the Invention) A first object of the present invention is to provide an emulsion with increased spectral sensitivity without increasing fog.
第2の目的は、経時保存中の写真性能の劣化の少ない高
感度の分光増感されたハロゲン化銀写真感光乳剤を提供
することにある。A second object is to provide a spectrally sensitized silver halide photographic emulsion with high sensitivity that exhibits little deterioration in photographic performance during storage over time.
第3の目的は、迅速現像処理に通した高感度でカブリの
発生の少ない分光増感されたハロゲン化銀写真乳剤を提
供することにある。A third object is to provide a spectrally sensitized silver halide photographic emulsion that can be subjected to rapid development processing and has high sensitivity and little fogging.
(課題を解決するための手段)
本発明の目的は、下記一般式(I)で表わされる増感色
素の少なくとも1種を含有し、かつ、殻式(II)で表
わされるテルロエーテル化合物の少なくとも1種を含有
したハロゲン化銀写真乳剤により達成された。(Means for Solving the Problems) An object of the present invention is to contain at least one kind of sensitizing dye represented by the following general formula (I), and at least a telluroether compound represented by the shell formula (II). This was achieved using a silver halide photographic emulsion containing one type of silver halide.
一般式(り
(X−)a
式中、Z+ 、Zzは異なっていても同一でもよく、5
また6貴台窒素複素環形成原子群を表わす。General formula (RI(X-)a In the formula, Z+ and Zz may be different or the same, and 5
It also represents a group of atoms forming a 6-di nitrogen heterocycle.
R,とR2は異なっていても同一でもよく、炭素数10
以下のアルキル基又はアルケニル基を表わす。R, and R2 may be different or the same, and have 10 carbon atoms
It represents the following alkyl group or alkenyl group.
R1とR1は水素原子を表わす、またR1とR。R1 and R1 represent a hydrogen atom;
と、R1とR,は連結して5または6員環を形成しても
よい。and R1 and R may be connected to form a 5- or 6-membered ring.
Ra、Rs とRaは異なっていても同一でもよく、水
素原子、低級アルキル基、了り−ル基または、ケトメチ
レン残基を表わす。Ra, Rs and Ra may be different or the same and represent a hydrogen atom, a lower alkyl group, an aryl group or a ketomethylene residue.
また、R4とR6が連結して5または6貝環を形成して
もよい。Further, R4 and R6 may be connected to form a 5- or 6-shell ring.
Xは酸アニオン残基を表わす。X represents an acid anion residue.
jとkはOまたは1を、lは0.1または2を、mは0
または1を表わす。j and k are O or 1, l is 0.1 or 2, m is 0
Or represents 1.
Llとり、は異なっていても同一でもよく、アルキル基
、アルケニル基、アルキニル基、シクロアルキル基、ア
リール基、アラルキル基または複素環基を表わす。Ll and may be different or the same and represent an alkyl group, an alkenyl group, an alkynyl group, a cycloalkyl group, an aryl group, an aralkyl group, or a heterocyclic group.
また、Z’+ 、Zx 、Rt 、Rt 、R4、Rs
、R1、Llおよびり、は各々独立に、更に置換基で置
換されていてもよい。Also, Z'+, Zx, Rt, Rt, R4, Rs
, R1, Ll and RI may each independently be further substituted with a substituent.
一般式(I)の化合物の詳細な説明を行なう。A detailed explanation of the compound of general formula (I) will be given.
式中、2..2.は異なっていても同一でもよく、5ま
たは6員画含窒素複素環形成原子群を表わし、具体的に
は、チアゾリン、チアゾール、ベンゾチアゾール、ナフ
トチアゾール、ジヒドロナフトチアゾール、セレナゾリ
ン、セレナゾール、ベンゾセレナゾール、ナフトセレナ
ゾール、ジヒドロナフトセレナゾール、オキサゾール、
ベンズオキサゾール、ナフトオキサゾール、ベンズイミ
ダゾール、ナフトイミダゾール、ピリジン、イミダゾ(
4,5−b)キノキザリン、テルラゾール、ペンゾテル
ラゾール、3.3−ジアルキルインドレニン等の複素環
核が挙げられる。In the formula, 2. .. 2. may be different or the same, and represent a group of atoms forming a 5- or 6-membered nitrogen-containing heterocycle, specifically thiazoline, thiazole, benzothiazole, naphthothiazole, dihydronaphthothiazole, selenazoline, selenazole, benzoselenazole. , naphthoselenazole, dihydronaphthoselenazole, oxazole,
Benzoxazole, naphthoxazole, benzimidazole, naphthoimidazole, pyridine, imidazo(
4,5-b) Heterocyclic nuclei such as quinoxaline, telllazole, penzotelllazole, and 3,3-dialkylindolenine can be mentioned.
前記の21およびZ2が表す含窒素複素環核は置換基を
一個以上有していてもよい。好ましい置換基の例として
は、低級アルキル基(分岐していても更に置換基(例え
ば、ヒドロキシ基、ハロゲン原子、アリール基、アリー
ルオキシ基、アリールチオ基、カルボキシ基、アルコキ
シ基、アルキルチオ基、アルコキシカルボニル基等)を
有していてもよい、より好ましくは総炭素数10以下の
アルキル基0例えば、メチル基、エチル基、ブチル基、
クロロエチル基、2.2; 3.3−テトラフルオロ
プロピル基、ヒドロキシ基、ベンジル基、トリルエチル
基、フェノキシエチル基、フェニルチオエチル基、カル
ボキシプロピル基、メトキシエチル基、エチルチオエチ
ル基、エトキシカルボニルエチル基等が挙げられる。)
、低級アルコキシ基(更に置換基を有していてもよい。The nitrogen-containing heterocyclic nucleus represented by 21 and Z2 may have one or more substituents. Examples of preferred substituents include lower alkyl groups (even if branched, further substituents (e.g., hydroxy group, halogen atom, aryl group, aryloxy group, arylthio group, carboxy group, alkoxy group, alkylthio group, alkoxycarbonyl group) etc.), more preferably an alkyl group having a total carbon number of 10 or less. For example, a methyl group, an ethyl group, a butyl group,
Chloroethyl group, 2.2; 3.3-tetrafluoropropyl group, hydroxy group, benzyl group, tolylethyl group, phenoxyethyl group, phenylthioethyl group, carboxypropyl group, methoxyethyl group, ethylthioethyl group, ethoxycarbonylethyl group Examples include groups. )
, a lower alkoxy group (which may further have a substituent).
置換基の例としては前記アルキル基の置換基の例として
挙げたものと同じ置換基等が挙げられる。より好ましく
は総炭素数8以下のアルコキシ基で、例えばメトキシ基
、エトキシ基、ペンチルオキシ基、エトキシメトキシ基
、メチルチオエトシキ基、フェノキシエトキシ基、ヒド
ロキシエトキシ基、クロロプロポキシ基等が挙げられる
)、ヒドロキシ基、ハロゲン原子、シアノ基、アリール
基(例えば、フェニル基、トリル基、アニシル基、クロ
ロフェニル基、カルボキシフェニル基等)、アリールオ
キシ基(例えば、トリルオキシ基、アニシルオキシ基、
フェノキシ基、クロロフェノキシ基)、アリールチオ基
(例えば、トリルチオ基、クロロフェニルチオ基、フェ
ニルチオ基)、低級アルキルチオ基(更に置換されてい
てもよく置換基の例としては、前記低級アルキル基の置
換基の例として挙げたもの等が挙げられる。より好まし
くは総炭素数8以下のアルキルチオ基で、例えばメチル
チオ基、エチルチオ基、ヒドロキシエチルチオ基、カル
ボキシエチルチオ基、クロロエチルチオ基、ベンジルチ
オ基等)、アシルアミノ基(より好ましくは総炭素数8
以下のアシルアミノ基、例えばアセチルアミノ基、ベン
ゾイルアミノ基、メタンスルホニルアミノ基、ベンゼン
スルホニルアミノ基等)、カルボキシ基、低級アルコキ
シカルボニル基(より好ましくは総炭素数6以下のアル
コキシカルボニル基、例えばエトキシカルボニル基、ブ
トキシカルボニル基等)、パーフルオロアルキル基(よ
り好ましくは総炭素数5以下のパーフルオロアルキル基
、例えばトリフルオロメチル基、ジフルオロメチル基等
)及びアシル基(より好ましくは総炭素数8以下のアシ
ル基、例えばアセチル基、プロピオニル基、ベンゾイル
基、ベンゼンスルホニル基等)が挙げられる。Examples of the substituent include the same substituents as those listed as examples of the substituent for the alkyl group. More preferably, it is an alkoxy group having a total carbon number of 8 or less, such as a methoxy group, an ethoxy group, a pentyloxy group, an ethoxymethoxy group, a methylthioethoxy group, a phenoxyethoxy group, a hydroxyethoxy group, a chloropropoxy group, etc.), Hydroxy group, halogen atom, cyano group, aryl group (e.g., phenyl group, tolyl group, anisyl group, chlorophenyl group, carboxyphenyl group, etc.), aryloxy group (e.g., tolyloxy group, anisyloxy group,
phenoxy group, chlorophenoxy group), arylthio group (e.g., tolylthio group, chlorophenylthio group, phenylthio group), lower alkylthio group (which may be further substituted). Examples include those listed above. More preferably, alkylthio groups having a total carbon number of 8 or less, such as methylthio group, ethylthio group, hydroxyethylthio group, carboxyethylthio group, chloroethylthio group, benzylthio group, etc.), Acylamino group (more preferably total carbon number 8
The following acylamino groups, such as acetylamino groups, benzoylamino groups, methanesulfonylamino groups, benzenesulfonylamino groups, etc.), carboxyl groups, lower alkoxycarbonyl groups (more preferably alkoxycarbonyl groups with a total carbon number of 6 or less, such as ethoxycarbonyl) group, butoxycarbonyl group, etc.), perfluoroalkyl group (more preferably a perfluoroalkyl group with a total carbon number of 5 or less, such as a trifluoromethyl group, a difluoromethyl group, etc.), and an acyl group (more preferably a total carbon number of 8 or less) (eg, acetyl group, propionyl group, benzoyl group, benzenesulfonyl group, etc.).
Zl及びZ2が表す含窒素複素環核の具体例としては、
例えばチアゾリン、4−メチルチアゾリン、チアゾール
、4−メチルチアゾール、4,5ジメチルチアゾール、
4−フェニルチアゾール、ベンゾチアゾール、5−メチ
ルベンゾチアゾール、6−メチルベンゾチアゾール、5
−エチルベンゾチアゾール、5,6−シメチルベンゾチ
アゾール、5−メトキシベンゾチアゾール、6−メトキ
シベンゾチアゾール、5−ブトキシベンゾチアゾール、
5.6−シメトキシベンゾチアゾール、5−メトキシ−
6−メチルベンゾチアゾール、5−クロロベンゾチアゾ
ール、5−クロロ−6−メチルベンゾチアゾール、5−
フェニルベンゾチアゾール、5−アセチルアミノベンゾ
チアゾール、6−プロピオニルアミノベンゾチアゾール
、5−ヒドロキシベンゾチアゾール、5−ヒドロキシ−
6−メチルベンゾチアゾール、5−エトキシ力ルポニル
ベンゾチアゾール、5−カルボキシベンゾチアゾール、
ナフト(I,2−d)チアゾール、ナフト(2,1−d
)チアゾール、5−メチルナツト(I,2−d)チアゾ
ール、8−メトキシナフト(I,2−d)チアゾール、
8,9−ジヒドロナフト(I,2−d)チアゾール、セ
レナゾリン、セレナゾール、ベンゾセレナゾール、5−
メチルベンゾセレナゾール、6−メチルベンゾセレナゾ
ール、5−メトキシベンゾセレナゾール、6−メトキシ
ベンゾセレナゾール、5−クロロベンゾセレナゾール、
5,6−シメチルベンゾセレナゾール、5−ヒドロキシ
ベンゾセレナゾール、5−ヒドロキシ−6−メチルベン
ゾセレナゾール、5゜6−シメトキシベンゾセレナゾー
ル、5−エトシキカルボニルベンゾセレナゾール、ナフ
ト(I2−dlセレナゾール、ナツト(2,I−d)セ
レナゾール、4−メチルオキサゾール、4.5−ジメチ
ルオキサゾール、4−フェニルオキサゾール、ベンズオ
キサゾール、5−ヒドロキシベンズオキサゾール、5−
メトキシベンズオキサゾール、5−フェニルベンズオキ
サゾール、5−フェネチルベンズオキサゾール、5−フ
ェノキシベンズオキサゾール、5−クロロベンズオキサ
ゾール、5−クロロ−5−メチルベンズオサキゾール、
5−フェニルチオベンズオキサゾール、6−エトキシ5
−ヒドロキシベンズオキサゾール、6−メトキシベンズ
オキサゾール、ナフト(I,2−d)オキサゾール、ナ
フト(2,1−d)オキサゾール、ナフト(2,3−d
)オキサゾール、l−エチル−5−シアノベンズイミダ
ゾール、1−エチル−5−クロロベンズイミダゾール、
l−エチル−5,6−シアノベンズイミダゾール、1−
エチル−6−クロロ−5−シアノベンズイミダゾール、
1−エチル−6−クロロ−5−トリフルオロメチルベン
ズイミダゾール、l−プロピル−5−ブトキシカルボニ
ルベンズイミダゾール、1−ベンジル−5−メチルスル
ホニルベンズイミダゾール、1−アリル−5−クロロ−
6−アセチルベンズイミダゾール、1−エチルナフト(
I,2−d)イミダゾール、1−エチル−6−クロロナ
フト(2,3−d)イミダゾール、2−ピリジン、4−
ピリジン、3,3−ジエチルインドレニン、33−ジメ
チルインドレニン、3.3.5−)ジエチルインドレニ
ン等が挙げられる。Specific examples of nitrogen-containing heterocyclic nuclei represented by Zl and Z2 include:
For example, thiazoline, 4-methylthiazoline, thiazole, 4-methylthiazole, 4,5 dimethylthiazole,
4-phenylthiazole, benzothiazole, 5-methylbenzothiazole, 6-methylbenzothiazole, 5
-ethylbenzothiazole, 5,6-dimethylbenzothiazole, 5-methoxybenzothiazole, 6-methoxybenzothiazole, 5-butoxybenzothiazole,
5.6-Simethoxybenzothiazole, 5-methoxy-
6-methylbenzothiazole, 5-chlorobenzothiazole, 5-chloro-6-methylbenzothiazole, 5-
Phenylbenzothiazole, 5-acetylaminobenzothiazole, 6-propionylaminobenzothiazole, 5-hydroxybenzothiazole, 5-hydroxy-
6-methylbenzothiazole, 5-ethoxyluponylbenzothiazole, 5-carboxybenzothiazole,
naphtho(I,2-d) thiazole, naphtho(2,1-d
) thiazole, 5-methylnaphtho(I,2-d)thiazole, 8-methoxynaphtho(I,2-d)thiazole,
8,9-dihydronaphtho(I,2-d)thiazole, selenazoline, selenazole, benzoselenazole, 5-
Methylbenzoselenazole, 6-methylbenzoselenazole, 5-methoxybenzoselenazole, 6-methoxybenzoselenazole, 5-chlorobenzoselenazole,
5,6-dimethylbenzoselenazole, 5-hydroxybenzoselenazole, 5-hydroxy-6-methylbenzoselenazole, 5゜6-simethoxybenzoselenazole, 5-ethoxycarbonylbenzoselenazole, naphtho(I2 -dl selenazole, natuto(2,I-d) selenazole, 4-methyloxazole, 4.5-dimethyloxazole, 4-phenyloxazole, benzoxazole, 5-hydroxybenzoxazole, 5-
Methoxybenzoxazole, 5-phenylbenzoxazole, 5-phenethylbenzoxazole, 5-phenoxybenzoxazole, 5-chlorobenzoxazole, 5-chloro-5-methylbenzoxazole,
5-phenylthiobenzoxazole, 6-ethoxy5
-Hydroxybenzoxazole, 6-methoxybenzoxazole, naphtho(I,2-d)oxazole, naphtho(2,1-d)oxazole, naphtho(2,3-d)
) oxazole, l-ethyl-5-cyanobenzimidazole, 1-ethyl-5-chlorobenzimidazole,
l-ethyl-5,6-cyanobenzimidazole, 1-
ethyl-6-chloro-5-cyanobenzimidazole,
1-Ethyl-6-chloro-5-trifluoromethylbenzimidazole, 1-propyl-5-butoxycarbonylbenzimidazole, 1-benzyl-5-methylsulfonylbenzimidazole, 1-allyl-5-chloro-
6-acetylbenzimidazole, 1-ethylnaphtho (
I,2-d) imidazole, 1-ethyl-6-chloronaphtho(2,3-d) imidazole, 2-pyridine, 4-
Examples include pyridine, 3,3-diethylindolenine, 33-dimethylindolenine, 3.3.5-)diethylindolenine, and the like.
R3及びR2は同一でも異なっていてもよく、総炭素数
IO以下の置換されていてもよいアルキル基又はアルケ
ニル基を表わす、アルキル基及びアルケニル基のより好
ましい置換基としては、例えば、スルホ基、カルボキシ
基、ハロゲン原子、ヒドロキシ基、炭素数6以下のアル
コキシ基、炭素数8以下の置換されていてもよいアリー
ル基(例えば、フェニル基、トリル基、スルホフェニル
基、カルボキシフェニル基等)、複素環基(例えば、フ
リル基、チエニル基等)、炭素数8以下の置換されてい
てもよいアリールオキシ基(例えば、クロロフェノキシ
基、フェノキシ基、スルホフェノキシ基、ヒドロキシフ
ェノキシ基)、炭素数8以下のアシル基(例えば、ベン
ゼンスルホニル基、メタンスルホニル基、アセチル基、
プロピオニル基等)、炭素数6以下のアルコキシカルボ
ニル基(例えば、エトキシカルボニル基、フトキシ力ル
ポニル基等)、シアノ基、炭素数6以下のアルキルチオ
基(例えば、メチルチオ基、エチルチオ基等)、炭素数
8以下の置換されていてもよいアリールチオ基(例えば
、フェニルチオ基、トリルチオ基等)、炭素数8以下の
置換されていてもよいカルバモイル基(例えば、カルバ
モイル基、N−エチルカルバモイル基等)、炭素数8以
下のアシルアミノ基(例えば、アセチルアミノ基、メタ
ンスルホニルアミノ基等)等が挙げられる。置換基は、
−個以上有していてもよい。R3 and R2 may be the same or different, and represent an optionally substituted alkyl group or alkenyl group having a total carbon number of IO or less. More preferable substituents for the alkyl group and alkenyl group include, for example, a sulfo group, Carboxy group, halogen atom, hydroxy group, alkoxy group having 6 or less carbon atoms, optionally substituted aryl group having 8 or less carbon atoms (e.g., phenyl group, tolyl group, sulfophenyl group, carboxyphenyl group, etc.), hetero cyclic group (for example, furyl group, thienyl group, etc.), optionally substituted aryloxy group having 8 or less carbon atoms (for example, chlorophenoxy group, phenoxy group, sulfophenoxy group, hydroxyphenoxy group), 8 or less carbon atoms acyl group (e.g., benzenesulfonyl group, methanesulfonyl group, acetyl group,
propionyl group, etc.), alkoxycarbonyl group with 6 or less carbon atoms (e.g., ethoxycarbonyl group, phthoxycarbonyl group, etc.), cyano group, alkylthio group with 6 or less carbon atoms (e.g., methylthio group, ethylthio group, etc.), carbon number An optionally substituted arylthio group having 8 or less carbon atoms (e.g., phenylthio group, tolylthio group, etc.), an optionally substituted carbamoyl group having 8 or less carbon atoms (e.g., carbamoyl group, N-ethylcarbamoyl group, etc.), carbon Examples include acylamino groups of number 8 or less (eg, acetylamino group, methanesulfonylamino group, etc.). The substituent is
- You may have more than one.
R5及びRtが表す基の具体例としては、例えばメチル
基、エチル基、プロピル基、アリル基、ペンチル基、ヘ
キシル基、メトキシエチル基、エトキシエチル基、フェ
ネチル基、トリルエチル基、スルホフェネチル基、2,
2.2−トリフルオロエチル基、2.2.3.3−テト
ラフルオロプロピル基、カルバモイルエチル基、ヒドロ
キシエチル基、2−(2−ヒドロキシエトキシ)エチル
基、カルボキシメチル基、カルボキシエチル基、エトキ
シカルボニルメチル基、スルホエチル基、2−クロロ−
3−スルホプロピル基、3−スルホプロピル基、2−ヒ
ドロキシ−3−スルホプロピル基、3−スルホブチル基
、4−スルホブチル基、2(2,3−ジヒドロキシプロ
ピル)エチル基、N−エチルカルバモイルエチル基、N
−メタンスルホニルアミンエチル基及び2− (2−(
3−スルホプロピルオキシ)エトキシ)エチル基等が挙
げられるR1及びR1は、水素原子を表す。またR1は
R8と、R1はR2と連結して5または6員環を形成し
てもよい。Specific examples of groups represented by R5 and Rt include, for example, a methyl group, an ethyl group, a propyl group, an allyl group, a pentyl group, a hexyl group, a methoxyethyl group, an ethoxyethyl group, a phenethyl group, a tolylethyl group, a sulfophenethyl group, ,
2.2-trifluoroethyl group, 2.2.3.3-tetrafluoropropyl group, carbamoylethyl group, hydroxyethyl group, 2-(2-hydroxyethoxy)ethyl group, carboxymethyl group, carboxyethyl group, ethoxy carbonylmethyl group, sulfoethyl group, 2-chloro-
3-sulfopropyl group, 3-sulfopropyl group, 2-hydroxy-3-sulfopropyl group, 3-sulfobutyl group, 4-sulfobutyl group, 2(2,3-dihydroxypropyl)ethyl group, N-ethylcarbamoylethyl group , N
-methanesulfonylamine ethyl group and 2- (2-(
R1 and R1, which include a 3-sulfopropyloxy)ethoxy)ethyl group, represent a hydrogen atom. Further, R1 may be linked to R8, and R1 may be linked to R2 to form a 5- or 6-membered ring.
R4、Rs及びR4は水素原子、低級アルキル基(置換
されていてもよく、例えば、メチル基、エチル基、プロ
ピル基、メトキシエチル基、フェネチル基等。より好ま
しくは炭素数5以下のアルキル基)、炭素数8以下の置
換されていてもよいアリール基(例えば、フェニル基、
トリル基等)またはアロポーラ−シアニンを形成する負
に荷電をもったケトメチレン残基(例えば、l、3−ビ
ス(2−メトキシエチル)−1,2,3,4−テトラヒ
ドロ−4−オキソ−6−オキシド−5−ピリミジニル基
、1,3−ジブチル−4−オキソ6−オキシド−1,2
,3,4−テトラヒドロ−5−ピリミジニル基等)を表
す、またR4とR4とが連結して5または6員環を形成
してもよい。R4, Rs and R4 are a hydrogen atom, a lower alkyl group (which may be substituted, for example, a methyl group, an ethyl group, a propyl group, a methoxyethyl group, a phenethyl group, etc., more preferably an alkyl group having 5 or less carbon atoms) , an optionally substituted aryl group having 8 or less carbon atoms (e.g., phenyl group,
tolyl group, etc.) or negatively charged ketomethylene residues forming allopolar cyanine (e.g. l,3-bis(2-methoxyethyl)-1,2,3,4-tetrahydro-4-oxo-6 -oxide-5-pyrimidinyl group, 1,3-dibutyl-4-oxo6-oxide-1,2
, 3,4-tetrahydro-5-pyrimidinyl group, etc.), and R4 and R4 may be connected to form a 5- or 6-membered ring.
Xは、酸アニオン残基を表す。X represents an acid anion residue.
j及びkは、0またはlを表す。j and k represent 0 or l.
1は、0.1または2を表す。1 represents 0.1 or 2.
mは、0または1を表し、分子内塩の場合は0である。m represents 0 or 1, and is 0 in the case of an inner salt.
で表される増感色素の少なくとも一種以上を含有せしめ
ることにより達成された。This was achieved by containing at least one type of sensitizing dye represented by:
前記一般式(I)で表される増感色素に於いてより好ま
しい増感色素は、ZIがベンズオキサゾール、ナフトオ
キサゾール、ベンズイミダゾール、ナフトイミダゾール
、ベンズチアゾール、ナフトチアゾール、ジヒドロナフ
トチアゾール、ベンゾセレナゾール、ナフトセレナゾー
ルまたはジヒドロナフトセレナゾール等の複素環核形成
原子群を表し、Z!がチアゾール、ベンゾチアゾール、
ナフトチアゾール、ジヒドロナフトチアゾール、セレナ
ゾール、ベンゾセレナゾール、ナフトセレナゾール、ジ
ヒドロナフトセレナゾール、ベンズオキサゾール、ナフ
トオキサゾール、ベンズイミダゾールまたはナフトイミ
ダゾール等の複素環核形成原子群を表す場合である。前
記Zl及びZ2を表す複素環核は、前述したごとく一個
以上の置換基を存していてもよいが、Zl及びZ2がベ
ンズイミダゾール核及びナフトイミダゾール核を表す場
合には電子吸引性置換基が好ましい(特に好ましい電子
吸引性基の例としては、例えばフッソ原子、塩素原子、
トリフルオロメチル基等の炭素数4以下のパーフルオロ
アルキル基、ブトキシカルボニル基等の総炭素数5以下
のアルコキシカルボニル基、シアノ基及びメタンスルホ
ニル基等の炭素数4以下のアルキルスルホニル基等があ
げられる。)。Among the sensitizing dyes represented by the general formula (I), more preferable sensitizing dyes are those in which ZI is benzoxazole, naphthoxazole, benzimidazole, naphthimidazole, benzthiazole, naphthothiazole, dihydronaphthothiazole, benzoselenazole. , represents a heterocyclic nucleation group such as naphthoselenazole or dihydronaphthoselenazole, and Z! is thiazole, benzothiazole,
This is the case when representing a heterocyclic nucleation atomic group such as naphthothiazole, dihydronaphthothiazole, selenazole, benzoselenazole, naphthoselenazole, dihydronaphthoselenazole, benzoxazole, naphthoxazole, benzimidazole, or naphthimidazole. The heterocyclic nucleus representing Zl and Z2 may have one or more substituents as described above, but when Zl and Z2 represent a benzimidazole nucleus or a naphthimidazole nucleus, an electron-withdrawing substituent may be present. Preferred (especially preferred examples of electron-withdrawing groups include, for example, fluorine atom, chlorine atom,
Perfluoroalkyl groups having 4 or less carbon atoms such as trifluoromethyl group, alkoxycarbonyl groups having 5 or less total carbon atoms such as butoxycarbonyl group, alkylsulfonyl groups having 4 or less carbon atoms such as cyano group and methanesulfonyl group, etc. It will be done. ).
更にまた、R1及びR2が表すアルキル基またはアルケ
ニル基に於いて、R,またはR2のうち少なくともいず
れか一方はスルホ基、カルボキシ基またはヒドロキシ基
を含有したアルキル基またはアルキニル基である場合が
より好ましい。Furthermore, in the alkyl group or alkenyl group represented by R1 and R2, it is more preferable that at least one of R and R2 is an alkyl group or alkynyl group containing a sulfo group, a carboxy group, or a hydroxy group. .
一般式(I)の化合物の具体例としては、以下の化合物
が挙げられる。Specific examples of the compound of general formula (I) include the following compounds.
2H5
IhCF3
■−2
So、II・N(CJs)3 SOs
■−11
!−12
■−13
O3−
8O1−
!−7
■−14
C2H4
1、−15
tHs
■−16
Js
■
zns
■
(CHz)4sOs
■
■−25
し3Hり
SOJ−
■−20
■−22
SOJ−N(CJs)z
SOJ
■−26
■−27
C!H5
■−28
zus
■−29
■−30
■−31
■−35
■−37
■−32
■
次に一般式(II)の化合物のし、とL2の詳細な説明
を行なう。2H5 IhCF3 ■-2 So, II・N (CJs)3 SOs ■-11! -12 ■-13 O3- 8O1-! -7 ■-14 C2H4 1, -15 tHs ■-16 Js ■ zns ■ (CHz)4sOs ■ ■-25 3H SOJ- ■-20 ■-22 SOJ-N (CJs) z SOJ ■-26 ■- 27 C! H5 ■-28 zus ■-29 ■-30 ■-31 ■-35 ■-37 ■-32 ■ Next, a detailed explanation of and L2 of the compound of general formula (II) will be given.
アルキル基としては、直鎖もしくは分岐でもよく炭素数
1〜30、好ましくは1〜20のものであり、例えばメ
チル、エチル、プロピル、n −ブチル、5ec−ブチ
ル、t−ブチル、n−ヘキシル、2−エチルヘキシル、
n−オクチル、t−オクチル、n−ドデシル、n−ヘキ
サデシル、n−オクタデシル、イソステアリル基、ある
いはエイコシル基などがあげられる。The alkyl group may be linear or branched and has 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms, such as methyl, ethyl, propyl, n-butyl, 5ec-butyl, t-butyl, n-hexyl, 2-ethylhexyl,
Examples include n-octyl, t-octyl, n-dodecyl, n-hexadecyl, n-octadecyl, isostearyl group, and eicosyl group.
アルケニル基としては、直鎖あるいは分岐でもよく炭素
数2〜30、好ましくは2〜20のものであり、例えば
アリル、ブチニル、プレニル、オクテニル、ドデセニル
基、あるいはオレイル基などがあげられる。The alkenyl group may be linear or branched and has 2 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and examples thereof include allyl, butynyl, prenyl, octenyl, dodecenyl, and oleyl groups.
シクロアルキル基としては、3〜12員、好ましくは5
〜7員のもので、例えばシクロプロピル、シクロペンチ
ル、シクロヘキシル、シクロヘプチル基、あるいはシク
ロドデシル基などがあげられアルキニル基としては、直
鎖あるいは分岐でもよく炭素数2〜30、好ましくは2
〜20のものであり、例えばエチニル基、プロピニル基
、ブチニル基、インデニル基などがあげられる。The cycloalkyl group is 3 to 12 members, preferably 5
to 7-membered, such as cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, or cyclododecyl group.The alkynyl group may be linear or branched and has 2 to 30 carbon atoms, preferably 2
-20, such as ethynyl group, propynyl group, butynyl group, indenyl group, etc.
アリール基としては、例えばフェニル基、ナフチル基等
があげられる。Examples of the aryl group include a phenyl group and a naphthyl group.
アラルキル基としては、例えばベンジル基、フェネチル
基等があげられる。Examples of the aralkyl group include benzyl group and phenethyl group.
複素環基としては、ピロリル基、フリル基、チエニル基
、インドリル基、ピラゾリル基、イソオキサシリル基、
イソチアゾリル基、インデニル基、ベンゾイソオキサシ
リル基、ベンゾイソチアゾリル基、イミダゾリル基、オ
キサシリル基、チアゾリル基、ベンゾイミダゾリル基、
ベンゾオキサシリル基、ベンゾチアゾリル基、ピリジル
基、キノリル基、イソキノリル基、ピリダジニル基、ピ
リミジニル基、ピラジニル基、シンノリニル基、フタラ
ジニル基、キナゾリニル基、キノキサリニル基、プロピ
ニル基、プリニル基、トリアゾリル基、テトラアゾリル
基、ベンゾトリアゾリル基、チアジアゾリル基、テトラ
アザインデニル基、トリアザインデニル基、ジアザイン
デニル基、ピロリジニル基、ピロリニル基、イミダゾリ
ジニル基、イミダゾリニル基、ピラゾリジニル基、ピラ
ゾリニル基、ピペリジル基、ピペラジニル基、インドリ
ニル基、イソインドリニル基、キヌクリジニル基、モル
ホリニル基、テトラヒドロフリル基、テトラヒドロチエ
ニル基等があげられる。Examples of the heterocyclic group include pyrrolyl group, furyl group, thienyl group, indolyl group, pyrazolyl group, isoxasilyl group,
isothiazolyl group, indenyl group, benzisoxasilyl group, benzisothiazolyl group, imidazolyl group, oxasilyl group, thiazolyl group, benzimidazolyl group,
Benzoxasilyl group, benzothiazolyl group, pyridyl group, quinolyl group, isoquinolyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, cinnolinyl group, phthalazinyl group, quinazolinyl group, quinoxalinyl group, propynyl group, purinyl group, triazolyl group, tetraazolyl group, Benzotriazolyl group, thiadiazolyl group, tetraazaindenyl group, triazaindenyl group, diazaindenyl group, pyrrolidinyl group, pyrrolinyl group, imidazolidinyl group, imidazolinyl group, pyrazolidinyl group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group , isoindolinyl group, quinuclidinyl group, morpholinyl group, tetrahydrofuryl group, tetrahydrothienyl group, and the like.
L、 、i、zとして好ましくは、アルキル基、アルケ
ニル基、アリール基であり、特にアルキル基が好ましい
。L, , i, and z are preferably an alkyl group, an alkenyl group, or an aryl group, with an alkyl group being particularly preferred.
これらのLI、Lxは、更に置換基で置換されていても
よい。置換基としては、例えば水酸基、エーテル基、ハ
ロゲン原子、アミノ基、置換アミノ基、カルボニル基、
カルボキシル基、アシルオキシ基、アルコキシカルボニ
ル基、カルバモイル基、アシルアミノ基、ウレイド基、
チオカルボニル基、チオアミド基、チオウレイド基、ス
ルホ基、スルフィノ基、スルホニルアミン基、スルファ
モイル基、スルホニル基、スルフィニル基、スルフィニ
ルアミノ基、スルホアミノ基、スルツェナモイル基、ス
ルフェノ基、シアン基、メルカプト基、チオエーテル基
、セレノエーテル基、アンモニウム基、リン酸基、ホス
フィノ基、ニトロ基、フェニル基、アルケニル基、アル
キニル基、及び上記置換基により置換された置換アルキ
ル基、及び先にり、 、LIの複素環基として挙げた複
素環基等が挙げられる。These LI and Lx may be further substituted with a substituent. Examples of substituents include hydroxyl group, ether group, halogen atom, amino group, substituted amino group, carbonyl group,
carboxyl group, acyloxy group, alkoxycarbonyl group, carbamoyl group, acylamino group, ureido group,
Thiocarbonyl group, thioamide group, thioureido group, sulfo group, sulfino group, sulfonylamine group, sulfamoyl group, sulfonyl group, sulfinyl group, sulfinylamino group, sulfamino group, sulzenamoyl group, sulfeno group, cyan group, mercapto group, thioether group , a selenoether group, an ammonium group, a phosphoric acid group, a phosphino group, a nitro group, a phenyl group, an alkenyl group, an alkynyl group, and a substituted alkyl group substituted with the above substituent, and a heterocyclic group preceded by , LI Examples include the heterocyclic groups listed above.
これらLI、Lxへの置換基としては、水酸基、アルコ
キシ基、カルボキシル基、アミノ基、置換アミノ基、カ
ルボキシル基、スルホ基、チオエーテル基および、これ
らにより置換された置換アルキル基が好ましい。As the substituents for these LI and Lx, hydroxyl groups, alkoxy groups, carboxyl groups, amino groups, substituted amino groups, carboxyl groups, sulfo groups, thioether groups, and substituted alkyl groups substituted with these are preferable.
次に本発明に好ましく用いられる一般式(I[)の化合
物の具体例を以下に示す、勿論これらに限定されるもの
ではない。Next, specific examples of the compound of general formula (I[) preferably used in the present invention are shown below, but the invention is of course not limited to these.
n I HOCHtCHzTeCHzCHzOHI
I −2HO(Cllz) zTe(CHz) zOH
■−3[0(CJIt)sTecHzcHcHtOHH
f−4
t−5
■−10
■−11
■−12
■−13
■−14
■−15
110C11zC)icHzTe−I,C61(I:1
HOCIlzCHzTeCllzCHzOCllxHO
CHzCtlzTeCHzCHzSCtlzHOCHz
CIlzTeCt!zCHzSCIlzCIIJllH
OCHzGHzTe(GHz)JHzHzN(CHz)
:+TeCIItCHJHCHzCIlzSCHi)1
0CthCHzTe(CHz) 3SChHII
1
■JC(CHz) sTe(CHz) JIICCHz
112HsOZ(CHI)zTe(CHz) 3NHC
ONHCH3110((Jig) zTe(CHz)
xSOJllJ(CHz) zTe(Clh) JHC
ONIIClbHJ(CHz)iTe(CHz)JHC
NllCHz − N
n −28HOOCCHzCIItTeCHzCHzC
OOHC1+3
n 30 Na0sS(CHz)sTe(CTo)
ssOJaHOOCCM−CIItTeCHtCHCO
OHH
If 21 HOC1bCH=CHCHzT8CH
zCHzCH=CHCHzOHII 22 HOC
HzCH−CI Te CH=CIICHzOHn
−23HOCR1CI=CH−T13C)lzcHz
cHzsOJ(I26HOCIIzCLOCLC)Iz
TeCHtCllzOHI[38(CaH* b Te
)I H
本発明に用いられる一般式(II)の化合物の合成に関
しては、一般的なものの一つとして、テルルシアニオン
と、対応するハロゲン化アルキルとの反応がある。この
手法を用いた一例として、r Inorganic C
he+*1stsry J第18巻、2696頁〜27
00頁(I979年)に記載があり、本発明に用いられ
る化合物は、これに準じて容易に合成することができる
。n I HOCHtCHzTeCHzCHzOHI
I-2HO(Cllz) zTe(CHz) zOH
■-3[0(CJIt)sTecHzcHcHtOHH f-4 t-5 ■-10 ■-11 ■-12 ■-13 ■-14 ■-15 110C11zC)icHzTe-I,C61(I:1
HOCIlzCHzTeCllzCHzOCllxHO
CHzCtlzTeCHzCHzSCtlzHOCHz
CIlzTeCt! zCHzSCIlzCIIJllH
OCHzGHzTe(GHz)JHzHzN(CHz)
:+TeCIItCHJHCHzCIlzSCHi)1
0CthCHzTe(CHz) 3SChHII
1 ■JC (CHz) sTe (CHz) JIICCHz
112HsOZ(CHI)zTe(CHz) 3NHC
ONHCH3110 ((Jig) zTe(CHz)
xSOJllJ(CHz) zTe(Clh) JHC
ONIIClbHJ(CHz)iTe(CHz)JHC
NllCHHz - N n -28HOOCCHzCIItTeCHzCHzC
OOHC1+3 n 30 Na0sS(CHz)sTe(CTo)
ssOJaHOOCCM-CIItTeCHtCHCO
OHH If 21 HOC1bCH=CHCHzT8CH
zCHzCH=CHCHzOHII 22 HOC
HzCH-CITeCH=CIICHzOHn
-23HOCR1CI=CH-T13C)lzcHz
cHzsOJ(I26HOCIIzCLOCLC)Iz
TeCHtCllzOHI[38(CaH* b Te )I H Regarding the synthesis of the compound of general formula (II) used in the present invention, one of the common methods is the reaction of tellurium cyanion and the corresponding alkyl halide. be. As an example using this method, r Inorganic C
he+*1stsry J Vol. 18, pp. 2696-27
00 (I979), and the compounds used in the present invention can be easily synthesized according to this.
より詳細な合成方法については、特願昭63−1734
74号、特開昭53−57817号等に記載されている
のを参考にすればよい。For more detailed synthesis methods, please refer to Japanese Patent Application No. 1734-1983.
No. 74, JP-A No. 53-57817, etc. may be referred to.
本発明の一般式(I)の化合物は、乳剤製造時における
ハロゲン化銀粒子の沈澱生成時、それにつづく物理熟成
時、化学熟成時及び塗布直前から選ばれる少なくとも1
工程におて添加するのが好ましい、特に化学熱成時以降
に添加するのが好ましい、添加量としては任意の量が選
べるが、ハロゲン化銀モル当り101〜104モル、好
ましくは10−h〜5×101モル、より好ましくは1
0−s〜2X10−’モルであり、ハロゲン化銀粒子表
面の10%以上100%以下の被覆に相当する量が好ま
しい。The compound of the general formula (I) of the present invention is used at least once during the precipitation of silver halide grains during emulsion production, during subsequent physical ripening, during chemical ripening, and immediately before coating.
It is preferable to add it in the process, especially after the chemical thermal formation.The amount to be added can be selected as desired, but it is 101 to 104 mol per mol of silver halide, preferably 10-h to 5 x 101 moles, more preferably 1
The amount is preferably from 0-s to 2×10-' moles, and corresponds to coverage of 10% or more and 100% or less of the surface of the silver halide grains.
本発明に於いて、一般式(It)の化合物は乳剤製造時
に於ける、ハロゲン化銀粒子の沈澱生成時、それに続く
物理熟成時、化学熟成時及び塗布直前から選ばれる少な
くとも1工程に於いて添加されることが好ましい、特に
沈澱生成時、物理熟成時、又は化学熟成時に添加するの
が好ましい。In the present invention, the compound of general formula (It) is used in at least one step selected from the steps of producing a silver halide grain during emulsion production, during the subsequent physical ripening, during chemical ripening, and immediately before coating. It is preferably added, particularly during precipitate formation, physical ripening, or chemical ripening.
添加量としては任意に選べるが、ハロゲン化銀モル当り
0.001g〜30g、好ましくは0゜003g〜10
g、より好ましくは0.01g〜3gである。The amount added can be arbitrarily selected, but is 0.001 g to 30 g, preferably 0.003 g to 10 g per mole of silver halide.
g, more preferably 0.01 g to 3 g.
また、本発明の一般式(II)の化合物と同時に、前述
の既知のチオエーテル化合物や、チオシアン酸塩(例え
ば、ロダンカリなど)、及び特公昭5B−51252号
、特開昭55−77737号、米国特許4,221,8
63号、特公昭60−11341号等に記載の化合物等
と併用して用いてもよい。In addition, at the same time as the compound of general formula (II) of the present invention, the above-mentioned known thioether compounds, thiocyanates (for example, rhodankali, etc.), and Japanese Patent Publication No. 5B-51252, Japanese Patent Application Laid-Open No. 55-77737, U.S. Patent 4,221,8
It may be used in combination with the compounds described in No. 63, Japanese Patent Publication No. 60-11341, etc.
また、本発明の一般式(I[)の化合物を化学熟成時よ
り以前(例えば、ハロゲン化銀粒子形成時)に用いる時
、特開昭60−136736号に記載の方法で、ハロゲ
ン化銀溶剤としての機能を失活させることもできる。Furthermore, when the compound of the general formula (I[) of the present invention is used before chemical ripening (for example, during silver halide grain formation), a silver halide solvent may be used by the method described in JP-A-60-136736. It is also possible to deactivate the function.
本発明に於て、ハロゲン化銀粒子の形成方法は、当業界
でよく知られている一般的な方法を用いることが出来る
が特に、ダブルジエ・ント法が好ましい。In the present invention, as a method for forming silver halide grains, general methods well known in the art can be used, but a double dient method is particularly preferred.
ダブルジェット法とは、硝酸銀水溶液と、1種以上のハ
ロゲン化物(例えば臭化カリウムの如きアルカリ金属ハ
ロゲン化物)の水溶液を同時に、2つの別々のジェット
によってハロゲン化銀の保護コロイド(例えばゼラチン
又はゼラチン誘導体)の攪拌している溶液に加える方法
である。The double jet method is a process in which an aqueous solution of silver nitrate and an aqueous solution of one or more halides (e.g. alkali metal halides such as potassium bromide) are simultaneously mixed into a protective colloid of silver halide (e.g. gelatin or gelatin) using two separate jets. derivative) into a stirring solution.
本発明において写真乳剤はピー・ゲラフキデス(P、G
lafkides)著 シミー・工・フィジクフォトグ
ラフィ”/り (Chimie et Physiqu
e Photographique)、ポール・モンテ
ル(Paul Montel)者刊(I967年)、ジ
ー・エフ・デュフイン(G、F、Duffin)著フォ
トグラフィック・エマルジョン・ケミストリー (Ph
otographic Emulsion Chemi
stry)、ザ8フォーカル・プレス (The Fo
cal Press)刊(I966年)、ヴイ・エル
・ツエリクマン他著(V、L。In the present invention, the photographic emulsion is P. gelafchides (P, G.
lafkides) Chimie et Physiqu Photography”/ri (Chimie et Physiqui
e Photographique), published by Paul Montel (1967), Photographic Emulsion Chemistry (Ph.
otographic Emulsion Chemi
stry), The 8 Focal Press (The Fo
Cal Press) (I966), V. L. Zerichman et al. (V.L.).
Zelik椙an et al)メーキング・アンド・
コーティング・フォトグラフィック・エマルジョン(M
aking and Coating Photogr
aphic Emulsion)、ザ・フォカル・プレ
ス(The Focal Press)刊(I964年
)などに記載された方法を用いて調製することができる
。すなわち、酸性法、中性法、アンモニア法等のいずれ
でもよく、また可溶性根塩と可溶性ハロゲン塩を反応さ
せる形式としては片側混合法、同時混合法、それらの組
合せなどのいずれを用いてもよい。Zelik Suan et al) Making and
Coating Photographic Emulsion (M
making and coating photogr
aphic Emulsion, published by The Focal Press (1964), etc. That is, any of the acidic method, neutral method, ammonia method, etc. may be used, and the method for reacting the soluble root salt with the soluble halogen salt may be a one-sided mixing method, a simultaneous mixing method, or a combination thereof. .
粒子を銀イオン過剰の下において形成させる方法(いわ
ゆる逆混合法)を用いることもできる。It is also possible to use a method in which particles are formed in an excess of silver ions (so-called back-mixing method).
また、写真乳剤中のハロゲン化銀粒子の粒子サイズ分布
は任意であるが単分散である方が好ましい。ここで単分
散とは95%の粒子が数平均粒子サイズの±60%以内
、好ましくは40%以内のサイズに入る分散系である。Further, although the grain size distribution of silver halide grains in the photographic emulsion is arbitrary, it is preferable that the grain size be monodisperse. Here, monodisperse means a dispersion system in which 95% of the particles fall within ±60%, preferably within 40%, of the number average particle size.
ここで数平均粒子サイズとはハロゲン化根粒子の投影面
積径の数平均直径である。Here, the number average particle size is the number average diameter of the projected area diameter of halogenated root particles.
別々に形成した2種以上のハロゲン化銀乳剤を混合して
用いてもよい。Two or more types of silver halide emulsions formed separately may be mixed and used.
本発明において、写真乳剤には、ハロゲン化銀として臭
化銀、沃臭化銀、沃塩臭化銀、塩臭化銀、沃化銀及び塩
化銀のいずれを用いてもよい。In the present invention, any of silver bromide, silver iodobromide, silver iodochlorobromide, silver chlorobromide, silver iodide, and silver chloride may be used as silver halide in the photographic emulsion.
粒子サイズ分布はせまくても広くてもいずれでもよい。The particle size distribution may be narrow or wide.
写真乳剤中のハロゲン化銀粒子は、立方体、八面体、1
4面体、斜方12面体のような規則的(regular
)な結晶体を有するものでもよく、また球状、板状など
のような変則的(irregular)な結晶形をもつ
もの、あるいはこれらの結晶形の複合形をもつものでも
よい。Silver halide grains in photographic emulsions are cubic, octahedral, 1
Regular objects such as tetrahedrons and rhombic dodecahedrons
), or may have irregular crystal shapes such as spherical or plate-like, or a composite of these crystal shapes.
種々の結晶形の粒子の混合から成ってもよい。It may also consist of a mixture of particles of various crystalline forms.
また、高次の指数面をもつ結晶でもよい。Further, a crystal having a high-order index plane may be used.
ハロゲン化銀粒子は内部と表層とが異なる相をもってい
ても、均一な相から成っていてもよい。The silver halide grains may have different phases inside and on the surface, or may consist of a uniform phase.
2重構造でも、多重構造をもった粒子でもよい。Particles may have a double structure or a multilayer structure.
また、例えばPbOの様な酸化物結晶と塩化銀の様なハ
ロゲン化銀結晶を結合させた、接合型ハロゲン化銀結晶
、エピタキシャル成長をさせたハロゲン化銀結晶(例え
ば臭化銀上に塩化銀、沃臭化銀、沃化銀等をエピタキシ
ャルに成長させる。)、大方晶形、沃化銀に正六面体の
塩化銀が配向重複した結晶などでもよい。In addition, for example, a junction type silver halide crystal in which an oxide crystal such as PbO and a silver halide crystal such as silver chloride are combined, and a silver halide crystal grown epitaxially (for example, silver chloride on silver bromide, (Silver iodobromide, silver iodide, etc. are grown epitaxially.), or a crystal in which crystals such as an orthogonal crystal or a crystal in which a regular hexahedral silver chloride is oriented and overlapped with silver iodide may be used.
また、アスペクト比3以上、好ましくは5〜20の平板
状ハロゲン化銀粒子を用いることもできる。より詳しく
は、米国特許4,434,226号、同4,439,5
20号、ヨーロッパ特許84,637A、号、特開昭5
9−99433号、「リサーチ・ディスクロージャー」
第225巻、Nα22534 (I983年1月)など
に記載されている。Further, tabular silver halide grains having an aspect ratio of 3 or more, preferably 5 to 20 can also be used. For more details, see U.S. Pat. Nos. 4,434,226 and 4,439,5.
No. 20, European Patent No. 84,637A, No. 5, Japanese Patent Publication No. 5
No. 9-99433, “Research Disclosure”
It is described in Volume 225, Nα22534 (January 1983), etc.
また、特願昭63−7851号、同63−7852号、
同63−7853号に記載の方法でハロゲン化銀粒子を
形成してもよい。Also, Japanese Patent Application No. 63-7851, No. 63-7852,
Silver halide grains may be formed by the method described in No. 63-7853.
本発明に於けるハロゲン化銀粒子形成時のpHlPAg
、温度等の条件に特に制限はないが、pH値としては約
1〜約10.特に2〜8が好ましく、P A g4aト
L”];15〜約11、特に7.8〜10.5に保つの
が好ましい。pHlPAg during silver halide grain formation in the present invention
There are no particular restrictions on conditions such as temperature, but the pH value is about 1 to about 10. In particular, it is preferably from 2 to 8, and preferably from 15 to about 11, particularly preferably from 7.8 to 10.5.
温度としては約30〜約90°Cの間でハロゲン化銀粒
子を形成することが出来るが、特に35°C〜80°C
が好ましい。Silver halide grains can be formed at a temperature between about 30°C and about 90°C, particularly between 35°C and 80°C.
is preferred.
勿論、ハロゲン化銀粒子形成中にpH,PAg及び温度
を変化させても構わない。Of course, pH, PAg and temperature may be changed during silver halide grain formation.
ハロゲン化銀粒子形成または物理熟成の過程において、
カドミウム塩、亜鉛塩、鉛塩、タリウム塩、イリジウム
塩またはその錯塩、ロジウム塩またはその錯塩、鉄塩ま
たは鉄錯塩などを共存させてもよい。また、それらの添
加量は、目的とする感光材料に応じて少量でも多量でも
よい。In the process of silver halide grain formation or physical ripening,
A cadmium salt, a zinc salt, a lead salt, a thallium salt, an iridium salt or a complex salt thereof, a rhodium salt or a complex salt thereof, an iron salt or an iron complex salt, etc. may be present. Further, the amount of these additives may be small or large depending on the intended photosensitive material.
本発明に於ける化学熟成工程の条件、例えばp)(、P
AP、温度、時間及び添加剤等に特に制限はなく、当業
界で一般に行なわれている条件で行うことが出来る。Conditions for the chemical ripening process in the present invention, e.g. p) (, P
There are no particular restrictions on AP, temperature, time, additives, etc., and it can be carried out under conditions commonly used in the industry.
例えばPH値としては3.0〜8.5、特に5゜0〜7
.5が好ましく、PAg値としては、7゜0〜9.5、
特に8.0〜9.3が好ましく、温度としては、40〜
85°C1特に45〜75℃が好ましく、時間は5〜2
00分、特に10〜120分が好ましい。For example, the pH value is 3.0 to 8.5, especially 5°0 to 7.
.. 5 is preferable, and the PAg value is 7°0 to 9.5,
In particular, 8.0 to 9.3 is preferable, and the temperature is 40 to 9.3.
85°C1, especially preferably 45-75°C, and the time is 5-2
00 minutes, especially 10 to 120 minutes is preferred.
沈澱形成後あるいは物理熟成後の乳剤から可溶性塩類を
除去するためにはゼラチンをゲル化させて行なうターデ
ル水洗法を用いてもよく、また無機塩類、アニオン性界
面活性剤、アニオン性ポリマー(たとえばポリスチレン
スルホン酸)、あるいはゼラチン誘導体(たとえばアシ
ル化ゼラチン、・カルバモイル化ゼラチンなど)を利用
した沈澱法(フロキュレーション法)を用いてもよい。In order to remove soluble salts from the emulsion after precipitation or physical ripening, the Tardel water washing method, which involves gelatinization of gelatin, may be used. A precipitation method (flocculation method) using gelatin derivatives (eg, acylated gelatin, carbamoylated gelatin, etc.) may also be used.
ハロゲン化銀乳剤は、通常は化学増感される。Silver halide emulsions are usually chemically sensitized.
化学増感のためには、例えば、エイチ・フリーザー (
I1,Fr1rser)編「デイ・グラントラーゲン・
デル・フォトグラフィッシェン・プロツエッセ・ミツト
・ジルベルハロゲニーテ7(DieGrundlage
n der PhoLographischen Pr
ozesse muSilberhalogenide
n)」(アカデミンシェ・フェアラーグス社 Akad
emische Verlagseellschaft
。For chemical sensitization, for example, H Freezer (
I1, Fr1rser) ed.
Die Grundlage 7 (DieGrundlage)
n der PhoLographischen Pr
ozesse muSilberhalogenide
n)” (Akademinsche Verlags) Akad
emische Verlagseellschaft
.
1968年刊)675〜734頁に記載の方法を用いる
ことができる。The method described on pages 675-734 (published in 1968) can be used.
すなわち、銀イオンと反応し得る硫黄を含む化合物や活
性ゼラチンを用いる硫黄増感法、セレン増悪法(例えば
、ジメチルセレノ尿素)、還元性物質を用いる還元増感
法、金その他の貴金属化合物を用いる貴金属増悪法など
を単独または組合せて用いることができる。硫黄増悪剤
としては、チオ硫酸塩(例えば、チオ硫酸ナトリウム)
、チオ尿素1!(例えば、トリエチルチオ尿素、アセチ
ルチオ尿素、ジフェニルチオ尿素)、チアゾール類、ロ
ーダニン類(例えば、5−ベンジリデン−3エチル−ロ
ーダニン)、その他の不安定硫黄を放出する化合物を用
いることができる。That is, a sulfur sensitization method using a compound containing sulfur that can react with silver ions or activated gelatin, a selenium enhancement method (for example, dimethylselenourea), a reduction sensitization method using a reducing substance, and a gold or other noble metal compound. Noble metal aggravation methods and the like can be used alone or in combination. Sulfur exacerbants include thiosulfates (e.g. sodium thiosulfate)
, Thiourea 1! (eg, triethylthiourea, acetylthiourea, diphenylthiourea), thiazoles, rhodanines (eg, 5-benzylidene-3ethyl-rhodanine), and other compounds that release unstable sulfur can be used.
還元増感剤としては第一すず塩、アミン類、ヒドラジン
誘導体、ホルムアミジンスルフィン酸、ボラン化合物、
シラン化合物などを用いることができる。貴金属増感の
ためには、塩化金酸、ジチオシアナート金塩等の全錯塩
(但し、第一シアン化金は好ましくない。)のほか、白
金、イリジウム、パラジウム等の周期律■族の金属の錯
塩を用いることができる。Examples of reduction sensitizers include stannous salts, amines, hydrazine derivatives, formamidine sulfinic acid, borane compounds,
A silane compound or the like can be used. For noble metal sensitization, in addition to total complex salts such as chloroauric acid and dithiocyanate gold salt (however, primary gold cyanide is not preferred), metals of group II of the periodic system such as platinum, iridium, and palladium are used. A complex salt of can be used.
特に、金化合物等貴金属による増悪法及び硫黄化合物に
よる増感法は好ましく用いることができる。In particular, an aggravation method using a noble metal such as a gold compound and a sensitization method using a sulfur compound can be preferably used.
又、感度上昇、コントラスト上昇、または現像促進の目
的で、例えばポリアルキレンオキシドまたはそのエーテ
ル、エステル、アミンなどの誘導体、チオエーテル化合
物、チオモルフォリン類、四級アンモニウム塩化合物、
ウレタン誘導体、尿素読導体、イミダゾール誘導体、3
−ピラゾリドン類等を含んでもよい。例えば米国特許2
.400.532号、同2,423,549号、同2゜
716.062号、同3,617,280号、同3.7
72,0.21号、同3,808,003号等に記載さ
れたものを用いることができる。In addition, for the purpose of increasing sensitivity, increasing contrast, or accelerating development, for example, polyalkylene oxide or its derivatives such as ethers, esters, and amines, thioether compounds, thiomorpholines, quaternary ammonium salt compounds,
Urethane derivative, urea reader, imidazole derivative, 3
- May contain pyrazolidones and the like. For example, US patent 2
.. 400.532, 2,423,549, 2゜716.062, 3,617,280, 3.7
Those described in No. 72,0.21, No. 3,808,003, etc. can be used.
又、感光材料の製造工程、保存中あるいは写真処理中の
カブリを防止しあるいは写真性能を安定化させる目的で
、種々の化合物を含有させることができる。すなわちア
ゾール類たとえばベンゾチアゾリウム塩、ニトロインダ
ゾール類、ニトロベンズイミダゾール類、クロロベンズ
イミダゾール類、ブロモベンズイミダゾール類、メルカ
プトチアゾール類、メルカプトベンゾチアゾール類、メ
ルカプトベンズイミダゾール類、メルカプトチアジアゾ
ール類、アミノトリアゾール類、ベンゾトリアゾール類
、ニトロベンゾトリアゾール類、メルカプトテトラゾー
ル類(特に1−フェニル−5メルカプトテトラゾール)
など;メルカプトピリミジン類;メルカプトトリアジン
類;たとえばオキサゾリンチオンのようなチオケト化合
物;アザインデン類、たとえばトリアザインデン類、テ
トラアザインデン類(特に4−ヒドロキシ−6−メチル
(I3,3a、7)テトラザインデン)、ペンタアザイ
ンデン類など;ベンゼンスルフィン酸、ベンゼンスルフ
オン酸アミド、ベンゼンチオスルフォン酸等のようなカ
ブリ防止剤または安定剤として知られた多くの化合物を
加えることができる。In addition, various compounds can be contained for the purpose of preventing fogging or stabilizing photographic performance during the manufacturing process, storage, or photographic processing of the photographic material. That is, azoles such as benzothiazolium salts, nitroindazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles. , benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (especially 1-phenyl-5-mercaptotetrazole)
mercaptopyrimidines; mercaptotriazines; thioketo compounds such as oxazolinthione; azaindenes, such as triazaindenes, tetraazaindenes (especially 4-hydroxy-6-methyl (I3,3a,7)tetrazain); Many compounds known as antifoggants or stabilizers can be added, such as benzenesulfinic acid, benzenesulfonic acid amide, benzenethiosulfonic acid, etc.;
感光材料に用いる結合剤または保護コロイドとしては、
ゼラチンを用いるのが有利であるが、それ以外に親水性
合成高分子なども用いることができる。ゼラチンとして
は、石灰処理ゼラチン、酸処理ゼラチン、誘導体ゼラチ
ンなどを用いることもできる。Binders or protective colloids used in photosensitive materials include:
It is advantageous to use gelatin, but other hydrophilic synthetic polymers can also be used. As the gelatin, lime-treated gelatin, acid-treated gelatin, derivative gelatin, etc. can also be used.
又、本発明を用いて作られた感光材料の写真乳剤層また
は他の親水性コロイド層には、塗布助剤、帯電防止、ス
ベリ性改良、乳化分散、接着防止および写真特性改良(
たとえば現像促進、硬調化、増感)など種々の目的で種
々の公知の界面活性剤を含んでもよい。In addition, the photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material prepared using the present invention may contain coating aids, antistatic properties, smoothness improvement, emulsification dispersion, adhesion prevention, and photographic property improvement (
For example, various known surfactants may be included for various purposes such as development acceleration, contrast enhancement, and sensitization.
本発明の写真乳剤は、一般式(I)で表わされる色素に
加えてメチン色素類でその他によってさらに分光増感さ
れていてもよい。用いられる色素には、シアニン色素、
メロシアニン色素、複合シアニン色素、複合メロシアニ
ン色素、ホロポーラ−シアニン色素、ヘミシアニン色素
、スチリル色素、およびヘミオキソノール色素が包含さ
れる。The photographic emulsion of the present invention may be further spectrally sensitized with methine dyes in addition to the dye represented by formula (I). The dyes used include cyanine dyes,
Included are merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes, and hemioxonol dyes.
特に有用な色素、メロシアニン色素および複合メロシア
ニン色素に属する色素である。これらの色素類には塩基
性異部環核としてシアニン色素類に通常利用される核の
いずれをも適用できる。すなわち、ピロリン核、オキサ
ゾリン核、チアゾリン核、ビロール核、オキサゾール核
、チアゾール核、セレナゾール核、イミダゾール核、テ
トラゾール核、ピリジン核など;これらの核に脂環式炭
化水素環が融合した核;およびこれらの核に芳香族炭化
水素環が融合した核、すなわち、インドレニン核、ベン
ズインドレニン核、インドール核、ベンズオキサゾール
核、ナフトオキサゾール核、ベンゾチアゾール核、ナフ
トチアゾール核、ヘンヅセレナゾール核、ベンズイミダ
ゾール核、キノリン核などが適用できる。これらの核は
炭素原子上に置換されていてもよい。Particularly useful pigments are those belonging to the merocyanine pigments and complex merocyanine pigments. Any of the nuclei commonly used for cyanine dyes can be used as the basic heterocyclic nucleus for these dyes. That is, pyrroline nucleus, oxazoline nucleus, thiazoline nucleus, virol nucleus, oxazole nucleus, thiazole nucleus, selenazole nucleus, imidazole nucleus, tetrazole nucleus, pyridine nucleus, etc.; a nucleus in which an alicyclic hydrocarbon ring is fused to these nuclei; and these A nucleus in which an aromatic hydrocarbon ring is fused to the nucleus of Imidazole nuclei, quinoline nuclei, etc. can be applied. These nuclei may be substituted on carbon atoms.
メロシアニン色素または複合メロシアニン色素にはケト
メチレン構造を有する核として、ビラプリン−5−オン
核、チオヒダントイン核、2−チオオキサゾリジン−2
,4−ジオン核、チアゾリジン−2,4−ジオン核、ロ
ーダニン核、チオバルビッール酸核などの5〜6員異節
環核を適用することができる。Merocyanine dyes or complex merocyanine dyes include a core with a ketomethylene structure, such as a birapurin-5-one core, a thiohydantoin core, and a 2-thioxazolidine-2 core.
, 4-dione nucleus, thiazolidine-2,4-dione nucleus, rhodanine nucleus, thiobarbic acid nucleus, and the like can be applied.
本発明の写真乳剤には色素形成カプラー、すなわち芳香
族アミン(通常第一級アミン)現像主薬の酸化生成物と
反応して色素を形成する化合物(以下カプラーと略記す
る)を含んでもよい。カプラーは分子中にバラスト基と
よばれる疎水基を有する非拡散性のものが望ましい。カ
プラーは銀イオンに対し4当量性あるいは2当量性のど
ちらでもよい。また色補正の効果をもつカラードカプラ
ー、あるいは現像にともなって現像抑制剤を放出するカ
プラー(いわゆるDIRカプラー)を含んでもよい、カ
プラーはカンプリング反応の生成物が無色であるような
カプラーでもよい。The photographic emulsion of the present invention may also contain a dye-forming coupler, that is, a compound (hereinafter abbreviated as coupler) that reacts with the oxidation product of an aromatic amine (usually a primary amine) developing agent to form a dye. The coupler is preferably a non-diffusible coupler having a hydrophobic group called a ballast group in its molecule. The coupler may be either 4-equivalent or 2-equivalent to silver ion. It may also contain a colored coupler that has a color correction effect or a coupler that releases a development inhibitor upon development (so-called DIR coupler).The coupler may be a coupler in which the product of the campling reaction is colorless.
黄色発色カプラーとしては公知の開鎖ケトメチレン系カ
プラーを用いることができる。これらのうちベンゾイル
アセトアニリド系及びピバロイルアセトアニリド系化合
物に有利である。As the yellow coloring coupler, a known open-chain ketomethylene coupler can be used. Among these, benzoylacetanilide and pivaloylacetanilide compounds are advantageous.
マゼンタカプラーとしてはピラゾロン系化合物、インダ
シロン系化合物、シアノアセチル化合物などを用いるこ
とができ、特にピラゾロン系化合物は有利である。As the magenta coupler, pyrazolone compounds, indacylon compounds, cyanoacetyl compounds, etc. can be used, and pyrazolone compounds are particularly advantageous.
シアンカプラーとしてはフェノール系化合物、ナフトー
ル系化合物などを用いることができる。As the cyan coupler, phenolic compounds, naphthol compounds, etc. can be used.
DIRカプラー以外に、現像にともなって現像抑制剤を
放出する化合物を、感光材料中に含んでもよく、例えば
米国特許3,297,445号、同3,379,529
号、西独特許出111(OLS)2.417,914号
に記載のものが使用できる。In addition to the DIR coupler, the light-sensitive material may contain a compound that releases a development inhibitor upon development; for example, U.S. Pat. Nos. 3,297,445 and 3,379,529
No. 111 (OLS) No. 2.417,914 can be used.
上記のカプラーは同一層に2種以上含むこともできる。Two or more of the above couplers can be contained in the same layer.
同一の化合物を異なる2つ以上の層に含んでもよい。The same compound may be contained in two or more different layers.
カプラーをハロゲン化銀乳剤層に導入するには、公知の
方法たとえば米国特許2,322,027号に記載の方
法などが用いられる。To introduce the coupler into the silver halide emulsion layer, known methods such as those described in US Pat. No. 2,322,027 can be used.
本発明の乳剤は、通常、物理熟成、化学熟成および分光
増感を行ったものを使用する。このような工程で使用さ
れる添加剤は「リサーチ・ディスクロージャー」第17
6巻、Na17643 (I978年12月)および同
第187巻、Nα1B716 (I979年11月)に
記載されており、その該当個所を後掲の表にまとめた。The emulsion used in the present invention is usually one that has been subjected to physical ripening, chemical ripening and spectral sensitization. Additives used in such processes are listed in Research Disclosure No. 17.
6, Na17643 (December 1978) and Volume 187, Na1B716 (November 1979), and the relevant parts are summarized in the table below.
本発明に併用できる公知の写真用添加剤も上記の2つの
リサーチ・ディスクロージャーに記載されており、後掲
の表に記載個所を示した。Known photographic additives that can be used in combination with the present invention are also listed in the above two Research Disclosures, and the locations listed are shown in the table below.
添加剤種類
化学増悪剤
感度上昇剤
分光増感剤
強色増感剤
増白剤
7 カプラー
8 有機溶媒
紫外線吸収剤
スティン防止剤
色素画像安定剤
硬膜剤
バインダー
可塑剤、潤滑剤
スタチック防止剤
RD17643
23頁
23〜24頁
RD18716
648頁右欄
同上
648頁右欄〜
649頁右欄
24頁
25頁
25頁
25頁右欄 650頁左〜右欄
25頁
26頁
26頁
27頁
651頁左欄
同上
650頁右欄
27頁
同上
本発明のハロゲン化銀乳剤は、黒白ハロゲン化銀写真感
光材料(例えば、Xレイ感材、リス型怒材、黒白撮影用
ネガフィルムなど)やカラー写真感光材料(例えば、カ
ラーネガフィルム、カラー反転フィルム、カラーペーパ
ーなど)に用いることができる。更に拡散転写用感光材
料(例えば、カラー拡散転写要素、銀塩拡散転写要素)
、熱現像感光材料(黒白、カラー)などにも用いること
ができる。Additive type Chemical enhancer Sensitivity enhancer Spectral sensitizer Super sensitizer Brightener 7 Coupler 8 Organic solvent Ultraviolet absorber Stain inhibitor Dye Image stabilizer Hardener Binder Plasticizer, lubricant Static inhibitor RD17643 23 Pages 23-24 RD18716 Page 648 Right column Same as above Page 648 Right column - Page 649 Right column Page 24 Page 25 Page 25 Page 25 Right column Page 650 Left - Right column Page 25 Page 26 Page 26 Page 27 Page 651 Page Left column Same as above 650 Page right column, page 27 Same as above The silver halide emulsion of the present invention can be used in black and white silver halide photographic materials (e.g., X-ray photosensitive materials, squirrel type materials, negative films for black and white photography, etc.) and color photographic materials (e.g., It can be used for color negative film, color reversal film, color paper, etc.). Furthermore, photosensitive materials for diffusion transfer (e.g., color diffusion transfer elements, silver salt diffusion transfer elements)
It can also be used in heat-developable photosensitive materials (black and white, color), etc.
本発明の写真札割は写真感光材料に通常用いられている
プラスチックフィルム、紙などの可撓性支持体またはガ
ラス、などの剛性の支持体にデイツプ塗布法、ローラー
塗布法、カーテン塗布法、押出塗布法などにより塗布さ
れる。可撓性支持体として有用なものは、硝酸セルロー
ス、酢酸セルロース、酢酸酪酸セルロース、ボリスチレ
イ、ポリ塩化ビニル、ポリエチレンテレフタレート、ポ
リカーボネート等の半合成または合成高分子から成るフ
ィルム、バライタ層またはα−オレフィンポリマー(例
えばポリエチレン、ポリプロピレン、エチレン/ブテン
共重合体)等を塗布またはラミネートした紙等である。The photo tag of the present invention can be produced by dip coating, roller coating, curtain coating, or extrusion on a flexible support such as plastic film or paper, or a rigid support such as glass, which is commonly used in photosensitive materials. It is applied using a coating method. Useful as flexible supports are films of semi-synthetic or synthetic polymers such as cellulose nitrate, cellulose acetate, cellulose acetate butyrate, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, baryta layers or alpha-olefin polymers. (For example, paper coated with or laminated with polyethylene, polypropylene, ethylene/butene copolymer), etc.
本発明を適用して作られる感光材料の写真処理には、公
知の方法のいずれも用いることができる。Any known method can be used for photographic processing of the light-sensitive material produced by applying the present invention.
処理液には公知のものを用いることができる。処理温度
は普通18°Cから50°Cの間に選ばれるが、18°
Cより低い温度または50°Cをこえる温度としてもよ
い。目的に応じ銀画像を形成する現像処理(黒白写真処
理)あるいは、色素像を形成すべき現像処理から成るカ
ラー写真処理のいずれでも適用できる。A known treatment liquid can be used. The processing temperature is usually chosen between 18°C and 50°C, but
The temperature may be lower than 50°C or above 50°C. Depending on the purpose, either a development process that forms a silver image (black and white photographic process) or a color photographic process that consists of a development process that forms a dye image can be applied.
詳しくは、「リサーチ・ディスクロージャー」第176
巻、Nα17643の28〜29頁、同第187巻、漱
18716の651頁左欄及び右欄に記載された方法に
よって現像処理することができる。For details, see “Research Disclosure” No. 176.
The development process can be carried out by the method described in the left column and right column of page 651 of Volume 18716, Vol.
以下に実施例を挙げて本願をさらに説明する。The present application will be further explained below with reference to Examples.
実施例1
ゼラチン及び臭化カリウムを含有する水溶性を75°C
に保ちつつ激しく撹拌しながら硝酸銀水溶液と、臭化カ
リウムと沃化カリウムの混合水i8[とを同時に添加し
て、2モル%の沃化銀を含み、平均粒子サイズが0.8
0μmの単分散の14面体沃臭化銀乳剤を調製した。Example 1 Aqueous solution containing gelatin and potassium bromide at 75°C
While maintaining the temperature and stirring vigorously, a silver nitrate aqueous solution and a mixed water i8 of potassium bromide and potassium iodide were simultaneously added to obtain a solution containing 2 mol% silver iodide and an average particle size of 0.8.
A monodispersed 14-hedral silver iodobromide emulsion of 0 μm was prepared.
この乳剤をフロキュレーンコン法で不要の塩類を除いた
後pHを6.3、PAgを8.4にあわせて17部に分
け、各々にI−6又は比較化合物を加えたあとトリエチ
ルチオ尿素、塩化金酸、チオシアン酸カリウムを加え更
に第1表に示す一般式(II)の化合物を加え、1/1
00秒露光時で最適感度を示すように60°Cで化学熟
成した。After removing unnecessary salts from this emulsion using the flocculene con method, it was divided into 17 parts with a pH of 6.3 and a PAg of 8.4, and I-6 or a comparative compound was added to each part, followed by triethylthiourea. , chloroauric acid and potassium thiocyanate were added, and then the compound of general formula (II) shown in Table 1 was added, and 1/1
Chemical ripening was carried out at 60°C so as to exhibit optimum sensitivity at 00 seconds exposure.
かくして得られた乳剤に下記安定剤、カブリ防止剤、硬
膜剤、および塗布助剤を加え、ゼラチン表面保護層と共
に、同時押し出し法により、ポリエチレンテレフタレー
トフィルム支持体上に塗布、乾燥し試料1〜17を得た
。The following stabilizers, antifoggants, hardeners, and coating aids were added to the emulsion thus obtained, and the mixture was coated with a gelatin surface protective layer on a polyethylene terephthalate film support by a coextrusion method and dried. I got 17.
安定剤;4−ヒドロキシ−6−メチル−1,33a、7
−チトラザインデン
カブリ防止剤;1−フェニル−5−メルカプトテトラゾ
ール
硬膜剤;2.4−ジクロロ−6−ヒドロキシ1.3.5
−1リアジンナトリウム塩
塗布助剤;ドデシルベンゼンスルホン酸ナトリウム
得られた試料をセンシトメーターを用いて光学楔と、更
に419nmの干渉フィルター(固有域の(固有感度域
)の感度測定用)または富士フィルム株製5C−50フ
ィルター(分光域(分光増感域)の感度測定用)を介し
て露光しく1/100秒)、自動現像機用RD−I[+
現像液(富士写真フィルム■製)で35°C20秒間現
像し、常法により定着、水洗、乾燥し写真感度を測定し
た。写真感度は、カブリ値+0.2の光学濃度を得るに
要する露光量の逆数の相対値で表わし、固有域の感度は
、試料1のそれを100とし、分光域の感度は、試料3
のそれを100とした。Stabilizer; 4-hydroxy-6-methyl-1,33a,7
-Titrazaindene antifoggant; 1-phenyl-5-mercaptotetrazole hardener; 2,4-dichloro-6-hydroxy 1.3.5
-1 Sodium riazine salt coating aid; Sodium dodecylbenzenesulfonate The obtained sample was passed through an optical wedge using a sensitometer and a 419 nm interference filter (for sensitivity measurement in the intrinsic range (intrinsic sensitivity range)) or Exposure through Fuji Film Co., Ltd.'s 5C-50 filter (for sensitivity measurement in the spectral range (spectral sensitization range) to 1/100 seconds), RD-I [+
The film was developed with a developer (manufactured by Fuji Photo Film ■) at 35°C for 20 seconds, fixed in a conventional manner, washed with water, and dried, and the photographic sensitivity was measured. Photographic sensitivity is expressed as a relative value of the reciprocal of the exposure amount required to obtain an optical density of fog value + 0.2, and the sensitivity in the intrinsic range is that of sample 1 as 100, and the sensitivity in the spectral range is that of sample 3.
was set as 100.
第1表より明らかな様に、本発明の化合物(I−6)は
良好な分光増感色素であるが、多量用いると固有感度が
低下してしまい、ある添加量で分光感度が頭打ちになる
。しかし、本発明の化合物(II)を併用すると固有感
度が回復し、その回復以上に分光感度が増加するという
顕著な併用効果が見られた。As is clear from Table 1, the compound (I-6) of the present invention is a good spectral sensitizing dye, but when used in a large amount, the inherent sensitivity decreases, and the spectral sensitivity reaches a plateau at a certain amount added. . However, when compound (II) of the present invention was used in combination, the intrinsic sensitivity was restored, and a remarkable combination effect was observed in which the spectral sensitivity increased more than the restoration.
一方、特開昭53−57817号で使用されている色素
(比較化合物)は、もともと固有感度の低下が少ないも
のであるが、分光感度は著しく本発明の一般式(I)に
比べ低く、本発明の一般式(II)の化合物を併用して
も固有感度の増加分と同程度の分光感度の上昇しか得ら
れない。On the other hand, the dye used in JP-A No. 53-57817 (comparative compound) originally has a small decrease in intrinsic sensitivity, but its spectral sensitivity is significantly lower than that of the general formula (I) of the present invention. Even if the compound of the general formula (II) of the invention is used in combination, the spectral sensitivity can only be increased by the same amount as the increase in the intrinsic sensitivity.
実施例2
実施例1と同様にし、但し第2表に示すように一般式(
I)の化合物のみを用いたときの固有感度と分光感度に
対し、化合物■−1(添加量0゜12g1モルAg x
)を更に併用したときの固有感度と分光感度の各々の相
対比(増感比率)で表わした。Example 2 Same as Example 1, except that the general formula (
Regarding the intrinsic sensitivity and spectral sensitivity when using only compound I), compound ■-1 (addition amount 0°12g 1 mol Ag
) was further expressed as the relative ratio of the intrinsic sensitivity and spectral sensitivity (sensitization ratio).
固有感度の増感比率=
分光感度の増感比率=
第2表より明らかな様に、本発明の一般式(I)の化合
物に一般式(■)の化合物を併用すると、固有感度の増
加率以上に分光感度が上昇するのが明らかである。Sensitization ratio of intrinsic sensitivity = Sensitization ratio of spectral sensitivity = As is clear from Table 2, when the compound of general formula (■) of the present invention is used in combination with the compound of general formula (■), the increase rate of intrinsic sensitivity is It is clear that the spectral sensitivity increases as described above.
実施例3
コア部の粒子形成時に、3.6−シチアー18−オクタ
ンジオールを用いその後過酸化水素を加え、更にシェル
部にあたる硝酸銀水溶液と、臭化カリウムと沃化カリウ
ムとの混合水溶液とをダブルジェット法で添加して、平
均沃度含量8モル%、コア・シェル比1:3の内部高沃
度型の2重構造をもち、球相当径0.7μmで直径/厚
み比5.0の板状の双晶粒子からなる沃臭化銀乳剤を調
製し、塩化金酸、チオ硫酸ナトリウムおよびチオ硫酸ナ
トリウムを加え60°Cで45分間加熱し、全硫黄増感
を施した。Example 3 When forming particles for the core part, 3,6-cythia-18-octanediol was used, then hydrogen peroxide was added, and then a silver nitrate aqueous solution for the shell part and a mixed aqueous solution of potassium bromide and potassium iodide were added. Added by jet method, it has an internal high iodine double structure with an average iodine content of 8 mol%, a core-shell ratio of 1:3, an equivalent sphere diameter of 0.7 μm, and a diameter/thickness ratio of 5.0. A silver iodobromide emulsion consisting of plate-shaped twin crystal grains was prepared, and chloroauric acid, sodium thiosulfate, and sodium thiosulfate were added thereto, and the emulsion was heated at 60°C for 45 minutes to perform total sulfur sensitization.
得られた乳剤を4部に分け、本発明の分光増感色素(I
−311−20、l−22)をハロゲン化i艮1モル当
りそれぞれlXl0−’、3XlO−’lXl0−’モ
ル加えたあと、第3表に示す化合物を加えた。更にカプ
ラー分散物(Cp−1、Cp2、Cp−3、Cp−4,
0il−LOil−2)、カプリ防止剤(I−(m−ス
ルホフェニルクー5−メルカプトテトラゾール・モノ
Na塩)、安定剤(4−ヒドロキシ−6−メチル−1゜
3.3a、7−チトラザインデン)、硬膜剤(H−1)
、及び塗布助剤(p−ドデシルベンゼンスルホン酸ナト
リウムと、p−ノニルフェノキシポリ (エチレンオキ
シ)プロパンスルホン酸ナトリウム)を加え、ゼラチン
表面保護層と共に、セルロース、トリアセテートフィル
ム支持体上に塗布、乾燥し試料27〜30を得た。The obtained emulsion was divided into four parts, and the spectral sensitizing dye of the present invention (I
-311-20, 1-22) were added in mols of 1X10-' and 3X1O-'1X10-' per 1 mole of halogenated i, respectively, and then the compounds shown in Table 3 were added. Furthermore, coupler dispersions (Cp-1, Cp2, Cp-3, Cp-4,
0il-LOil-2), anti-capri agent (I-(m-sulfophenyl-5-mercaptotetrazole mono
Na salt), stabilizer (4-hydroxy-6-methyl-1°3.3a, 7-chitrazaindene), hardener (H-1)
, and coating aids (sodium p-dodecylbenzenesulfonate and sodium p-nonylphenoxypoly(ethyleneoxy)propanesulfonate) were added, and the mixture was coated on a cellulose or triacetate film support along with a gelatin surface protective layer, and dried. Samples 27 to 30 were obtained.
試料を光模と更に、419nmの干渉フィルター(固有
感度測定用)または、富士フィルム■製5C−52フィ
ルター(分光感度測定用)を介して露光しく1/100
秒)下記の発色現像処理を行ったあと、写真性の測定を
行ない第3表に示す結果を得た。The sample was exposed to light at 1/100 through a 419 nm interference filter (for measuring intrinsic sensitivity) or a 5C-52 filter (for measuring spectral sensitivity) made by Fuji Film ■.
Sec.) After carrying out the following color development treatment, photographic properties were measured and the results shown in Table 3 were obtained.
なお、第3表における固有感度と分光感度は、実施例1
と同様に試料27の各々を100とし、他を相対的に表
わした。Note that the intrinsic sensitivity and spectral sensitivity in Table 3 are based on Example 1.
Similarly, each sample 27 was set as 100, and the others were expressed relatively.
1、 カラー現像 2分45秒(38°C)2、漂
白 6分30秒
3、水 洗 3分15秒
4、定 着 6分30秒
5、水 洗 3分15秒
6、安 定 3分15秒
各工程に用いた処理eMi成は下記のものである。1. Color development 2 minutes 45 seconds (38°C) 2. Bleaching 6 minutes 30 seconds 3. Washing 3 minutes 15 seconds 4. Fixing 6 minutes 30 seconds 5. Washing 3 minutes 15 seconds 6. Stability 3. The processing eMi composition used in each step is as follows.
(カラー現像fi)
ニトリロ三酢酸ナトリウム 1.0g亜硫酸
ナトリウム 4.0g炭酸ナトリウム
30.0g臭化カリ
1.4gヒドロキシルアミン硫酸塩
2,4g4−(N−エチル−N−β
ヒドロキシエチルアミノ)
2−メチル−アニリン
硫酸塩 4.5g水を加えて
1!(漂 白 液)
臭化アンモニウム 160.0gアンモ
ニア水(28%) 25.0mエチレンジ
アミン−四酢酸
ナトリウム鉄塩 130.0g氷酢酸
水を加えて
(定 着 液)
テトラポリリン酸ナトリウム
亜硫酸ナトリウム
チオ硫酸アンモニウム(70χ)
重亜硫酸ナトリウム
水を加えて
(安 定 液)
ポルマリン
水を加えて
P−1
0■
14゜
〇−
8、0g
■!!。(Color development fi) Sodium nitrilotriacetate 1.0g Sodium sulfite 4.0g Sodium carbonate 30.0g Potassium bromide
1.4g hydroxylamine sulfate 2,4g 4-(N-ethyl-N-β hydroxyethylamino) 2-methyl-aniline sulfate 4.5g Add water 1! (Bleach solution) Ammonium bromide 160.0g Aqueous ammonia (28%) 25.0m Sodium iron salt of ethylenediamine-tetraacetic acid 130.0g Add glacial acetic acid water (Fixer) Sodium tetrapolyphosphate Sodium sulfite Ammonium thiosulfate ( 70χ) Add sodium bisulfite water (stable solution) Add Polmarine water and P-1 0■ 14゜〇- 8,0g ■! ! .
p−2
p−3
H
(t)CsH++
p
第3表より明らかな様に、本発明の化合物(I)と化合
物(II)とを併用することで、分光域の感度が著しく
高めることができた。p-2 p-3 H (t)CsH++ p As is clear from Table 3, the combined use of compound (I) and compound (II) of the present invention can significantly increase the sensitivity in the spectral range. Ta.
(Oil−1) (Of リン酸トリクレジル フタル酸ジブチル (H(Oil-1) (Of tricresyl phosphate dibutyl phthalate (H
Claims (1)
と、一般式(II)で示される化合物の少なくとも1種と
を含有することを特徴とするハロゲン化銀写真感光材料
。 一般式( I ) ▲数式、化学式、表等があります▼ 一般式(II) L_1−Te−L_2 式中、Z_1、Z_2は異なっていても同一でもよく、
5また6員含窒素複素環形成原子群を表わす。 R_1とR_2は異なっていても同一でもよく、炭素数
10以下のアルキル基又はアルケニル基を表わす。 R_3とR_7は水素原子を表わす、またR_2とR_
1と、R_7とR_2は連結して5または6員環を形成
してもよい。 R_4、R_5とR_6は異なっていても同一でもよく
、水素原子、低級アルキル基、アリール基または、ケト
メチレン残基を表わす。 また、R_4とR_6が連結して5または6員環を形成
してもよい。 Xは酸アニオン残基を表わす。 jとkは0または1を、lは0、1または2を、mは0
または1を表わす。 L_1とL_2は異なっていても同一でもよく、アルキ
ル基、アルケニル基、アルキニル基、シクロアルキル基
、アリール基、アラルキル基または複素環基を表わす。[Scope of Claims] A silver halide photographic material containing at least one compound represented by the following general formula (I) and at least one compound represented by the general formula (II). . General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ General formula (II) L_1-Te-L_2 In the formula, Z_1 and Z_2 may be different or the same,
Represents a group of atoms forming a 5- or 6-membered nitrogen-containing heterocycle. R_1 and R_2 may be different or the same and represent an alkyl group or alkenyl group having 10 or less carbon atoms. R_3 and R_7 represent hydrogen atoms, and R_2 and R_
1, R_7 and R_2 may be connected to form a 5- or 6-membered ring. R_4, R_5 and R_6 may be different or the same and represent a hydrogen atom, a lower alkyl group, an aryl group or a ketomethylene residue. Furthermore, R_4 and R_6 may be connected to form a 5- or 6-membered ring. X represents an acid anion residue. j and k are 0 or 1, l is 0, 1 or 2, m is 0
Or represents 1. L_1 and L_2 may be different or the same and represent an alkyl group, an alkenyl group, an alkynyl group, a cycloalkyl group, an aryl group, an aralkyl group, or a heterocyclic group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29430988A JPH02140736A (en) | 1988-11-21 | 1988-11-21 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29430988A JPH02140736A (en) | 1988-11-21 | 1988-11-21 | Silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02140736A true JPH02140736A (en) | 1990-05-30 |
Family
ID=17806026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29430988A Pending JPH02140736A (en) | 1988-11-21 | 1988-11-21 | Silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02140736A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0573650A4 (en) * | 1991-12-18 | 1994-11-17 | Fuji Photo Film Co Ltd | Silver halide photographic material. |
| US5922525A (en) * | 1996-04-08 | 1999-07-13 | Eastman Kodak Company | Photographic material having a red sensitized silver halide emulsion layer with improved heat sensitivity |
| US5925509A (en) * | 1995-09-29 | 1999-07-20 | Eastman Kodak Company | Photographic material having a red sensitized silver halide emulsion layer with improved heat sensitivity |
| US6120982A (en) * | 1995-09-29 | 2000-09-19 | Eastman Kodak Company | Red sensitizing dye combinations for high chloride emulsions |
-
1988
- 1988-11-21 JP JP29430988A patent/JPH02140736A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0573650A4 (en) * | 1991-12-18 | 1994-11-17 | Fuji Photo Film Co Ltd | Silver halide photographic material. |
| US5925509A (en) * | 1995-09-29 | 1999-07-20 | Eastman Kodak Company | Photographic material having a red sensitized silver halide emulsion layer with improved heat sensitivity |
| US6120982A (en) * | 1995-09-29 | 2000-09-19 | Eastman Kodak Company | Red sensitizing dye combinations for high chloride emulsions |
| US5922525A (en) * | 1996-04-08 | 1999-07-13 | Eastman Kodak Company | Photographic material having a red sensitized silver halide emulsion layer with improved heat sensitivity |
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