JPH0214364U - - Google Patents
Info
- Publication number
- JPH0214364U JPH0214364U JP9053588U JP9053588U JPH0214364U JP H0214364 U JPH0214364 U JP H0214364U JP 9053588 U JP9053588 U JP 9053588U JP 9053588 U JP9053588 U JP 9053588U JP H0214364 U JPH0214364 U JP H0214364U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- ion beam
- magnetic field
- beam apparatus
- sample stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims 2
- 239000000696 magnetic material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- ing And Chemical Polishing (AREA)
Description
第１図はこの考案の一実施例の説明図、第２図
は従来例の説明図、第３図はその提案例の説明図
である。
１……ＥＣＲプラズマ源、２……試料室、３…
…コイル、８……照射対象、９……試料台。
FIG. 1 is an explanatory diagram of an embodiment of this invention, FIG. 2 is an explanatory diagram of a conventional example, and FIG. 3 is an explanatory diagram of a proposed example thereof. 1...ECR plasma source, 2...sample chamber, 3...
...Coil, 8...Irradiation target, 9...Sample stage.
Claims (1)
を外周に設けたＥＣＲプラズマ源と、このＥＣＲ
プラズマ源に接続されて前記コイルにより引き出
された前記プラズマが照射される照射対象を保持
した試料台を内部に有する試料室とを備えたイオ
ンビーム装置において、前記発散磁界の発散を緩
和する磁性体を前記試料台に設けたことを特徴と
するイオンビーム装置。 This ECR plasma source has a coil around its outer circumference that generates a divergent magnetic field that draws out plasma.
In an ion beam apparatus comprising a sample chamber connected to a plasma source and having inside thereof a sample stage holding an irradiation target to be irradiated with the plasma extracted by the coil, a magnetic material that alleviates divergence of the divergent magnetic field. An ion beam apparatus characterized in that the sample stage is provided with:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9053588U JPH0214364U (en) | 1988-07-07 | 1988-07-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9053588U JPH0214364U (en) | 1988-07-07 | 1988-07-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0214364U true JPH0214364U (en) | 1990-01-29 |
Family
ID=31315051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9053588U Pending JPH0214364U (en) | 1988-07-07 | 1988-07-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0214364U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4974273U (en) * | 1972-10-12 | 1974-06-27 |
-
1988
- 1988-07-07 JP JP9053588U patent/JPH0214364U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4974273U (en) * | 1972-10-12 | 1974-06-27 |