JPH0176029U - - Google Patents
Info
- Publication number
- JPH0176029U JPH0176029U JP1987171477U JP17147787U JPH0176029U JP H0176029 U JPH0176029 U JP H0176029U JP 1987171477 U JP1987171477 U JP 1987171477U JP 17147787 U JP17147787 U JP 17147787U JP H0176029 U JPH0176029 U JP H0176029U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- sample
- mounting table
- extraction window
- generation chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000605 extraction Methods 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案装置の模式的縦断面図、第２図
は同じくプラズマ引出窓の平面図、第３図はプラ
ズマ投射域と試料との位置関係を示す説明図、第
４図は本考案装置と従来装置との比較試験結果を
示すグラフ、第５図は従来装置の模式的縦断面図
、第６図は同じくプラズマ引出窓の平面図、第７
図はプラズマ投射域と試料との位置関係を示す説
明図である。
１…プラズマ生成室、１ｄ…プラズマ引出窓、
２…導波管、３…反応室、４…励磁コイル、Ｓ…
試料。
Figure 1 is a schematic vertical cross-sectional view of the device of the present invention, Figure 2 is a plan view of the plasma extraction window, Figure 3 is an explanatory diagram showing the positional relationship between the plasma projection area and the sample, and Figure 4 is the device of the present invention. A graph showing the comparative test results between the device and the conventional device. Fig. 5 is a schematic vertical cross-sectional view of the conventional device. Fig. 6 is also a plan view of the plasma extraction window. Fig. 7
The figure is an explanatory diagram showing the positional relationship between the plasma projection area and the sample. 1... Plasma generation chamber, 1d... Plasma drawer window,
2... Waveguide, 3... Reaction chamber, 4... Excitation coil, S...
sample.
Claims (1)
マを発生させるプラズマ生成室と、往復移動可能
な試料用載置台を備え、前記プラズマ生成室で発
生したプラズマをプラズマ引出窓を通して前記試
料に投射せしめる試料室とを備えたプラズマ装置
において、前記プラズマ引出窓は前記載置台の移
動方向と直交する方向を長軸方向とする楕円形又
は長円に形成したことを特徴とするプラズマ装置
。 A plasma generation chamber that generates plasma using electron cyclotron resonance excitation; and a sample chamber that is equipped with a reciprocably movable sample mounting table and that projects the plasma generated in the plasma generation chamber onto the sample through a plasma extraction window. In the plasma apparatus, the plasma extraction window is formed into an ellipse or an ellipse whose major axis is perpendicular to the moving direction of the mounting table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171477U JPH071788Y2 (en) | 1987-11-10 | 1987-11-10 | Plasma equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171477U JPH071788Y2 (en) | 1987-11-10 | 1987-11-10 | Plasma equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0176029U true JPH0176029U (en) | 1989-05-23 |
| JPH071788Y2 JPH071788Y2 (en) | 1995-01-18 |
Family
ID=31463345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987171477U Expired - Lifetime JPH071788Y2 (en) | 1987-11-10 | 1987-11-10 | Plasma equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH071788Y2 (en) |
-
1987
- 1987-11-10 JP JP1987171477U patent/JPH071788Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH071788Y2 (en) | 1995-01-18 |