JPH02144540A - Method for cooling printing frame - Google Patents

Method for cooling printing frame

Info

Publication number
JPH02144540A
JPH02144540A JP63297949A JP29794988A JPH02144540A JP H02144540 A JPH02144540 A JP H02144540A JP 63297949 A JP63297949 A JP 63297949A JP 29794988 A JP29794988 A JP 29794988A JP H02144540 A JPH02144540 A JP H02144540A
Authority
JP
Japan
Prior art keywords
light source
frame
mask film
cooling
water tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63297949A
Other languages
Japanese (ja)
Inventor
Yoshio Yazaki
矢崎 好夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP63297949A priority Critical patent/JPH02144540A/en
Publication of JPH02144540A publication Critical patent/JPH02144540A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To uniformly cool a mask film so that the mask film can be regulated to and maintained at an adequate temp. by passing flowing water which absorbs heat rays and allows the transmission of UV rays in the intermediate position between a light source and the printing frame. CONSTITUTION:A work 7 held in tight contact with the mask film 6 crimped between an upper frame 4 and a lower frame 5 of the printing frame is irradiated by the light source 2 of an exposing device. A water tank 9 for cooling which absorbs the heat rays and allows the transmission of the UV rays is provided in the intermediate position between the light source 2 and the printing frame 4 and the flowing water is passed in this position. The heat rays contained in the irradiation light are, therefore, absorbed at the time when the irradiating light from the light source 2 arrives at the mask film 6. The temp. rise of the mask film 6 is prevented in this way and the adequate patterns are printed on the work 7.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は焼枠の冷却方法に係り、特に上枠と下枠どの間
に挟持したマスクフィルムを密着したプリント基板など
のワークの焼枠に対する冷却方法に関する。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a method for cooling a baking frame, and particularly to a method for cooling a baking frame of a workpiece such as a printed circuit board to which a mask film sandwiched between an upper frame and a lower frame is tightly attached. Regarding cooling method.

〔従来の技術〕[Conventional technology]

近年、ICは集積度が高くなりそのピン数が増大し、ま
たビン間隔の狭い表面実装型が多用されるなどプリント
配線板の実装密度や配線密度が高くなり、さらにはスル
ーホール穿設作業においても多層化が進むなど、高密度
で高精度な配線パターンが要求されるようになってきた
In recent years, ICs have become more integrated and the number of pins has increased, and surface mount types with narrow bin spacing have become more common, resulting in higher mounting and wiring densities on printed wiring boards. As the number of layers increases, high-density and high-precision wiring patterns are required.

従来の露光装置においては、光源から照射される熱線に
よって、ワーク面に吸着したマスクフィルムが伸縮する
結果、これによって焼付けられるワークに寸法誤差が生
じたり、またマスクフィルムの表面に塗布される乳剤等
が膨潤してワークも熱変形するなど、所望する適正な配
線パターンが得られなくなり、これを回避するために、
マスクフィルムに冷風を吹き付ける冷却装置が採用され
ている。
In conventional exposure equipment, the mask film adsorbed to the workpiece surface expands and contracts due to the heat rays irradiated from the light source, resulting in dimensional errors in the printed workpiece and emulsion applied to the surface of the mask film. In order to avoid this, it becomes impossible to obtain the desired proper wiring pattern due to swelling of the workpiece and thermal deformation of the workpiece.
A cooling device is used that blows cold air onto the mask film.

上記冷却装置は、例えば露光室に隣接する背面側に冷却
機等を備えた冷却室を設け、冷却機側から得られる冷媒
を送気するファンを備えた送風口を露光室に臨ませ、こ
の送風口は、露光室に移送される焼枠のマスクフィルム
に向けて近接位置させである。なお、焼枠の両面から平
行光を照射する、いわゆる両面露光装置の場合には、例
えば焼枠の上下両面に対して送風口をそれぞれ配置しで
ある。
The above-mentioned cooling device includes, for example, a cooling room equipped with a cooler etc. on the back side adjacent to the exposure room, and an air outlet equipped with a fan that blows the coolant obtained from the cooler side facing the exposure room. The air outlet is positioned close to the mask film of the printing frame that is transferred to the exposure chamber. In the case of a so-called double-sided exposure device that irradiates parallel light from both sides of a printing frame, for example, air vents are arranged respectively on the upper and lower sides of the printing frame.

〔発明が解決しよ・うとする課題〕[Problem that the invention attempts to solve]

しかしながら、上記冷却装置は送風口が一例のマスクに
対してただ一つで、しかもその送風方向が固定的である
ため、平行光が照射されるマスクフィルムの有効照射範
囲に対して均一に冷却されず、マスクに冷却ムラが生じ
る問題点があった。
However, since the above-mentioned cooling device has only one air outlet per mask, and the direction of the air blowing is fixed, the effective irradiation range of the mask film that is irradiated with parallel light cannot be cooled uniformly. First, there was the problem of uneven cooling of the mask.

この発明は、上記問題点に鑑みてなされたもので、マス
ク”ノ、イルムを均一に冷却し適温に調整維持すること
で、マスクフィルムの温度上昇を抑止し、ワークへの熱
影響を排除して、被露光物に適正なパターンを焼付ける
焼枠の冷却方法を提供するものである。
This invention was made in view of the above problems, and by uniformly cooling the mask film and maintaining it at an appropriate temperature, it suppresses the temperature rise of the mask film and eliminates the effect of heat on the workpiece. The present invention provides a method for cooling a printing frame that prints an appropriate pattern on an object to be exposed.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は前記問題点を解決するためになされたもので、
露光装置の光源により、焼枠の上枠と下枠との間に挟持
されたマスクフィルムを密着したワークを照射する露光
装置において、前記光源と前記焼枠との中間位置で熱線
を吸収しかつ紫外線を透過させる冷却用水槽の流水の通
過によって前記光源からの照射光を冷却する方法であり
、さらに前記光源からの照射光が前記光源と前記焼枠と
の中間位置で前記流水の他に熱吸収フィルタの通過によ
って冷却する方法であり、さらに、前記流水は気泡発生
が不能な速度を有していることを特徴とする方法である
The present invention has been made to solve the above problems,
In an exposure device that uses a light source of an exposure device to irradiate a workpiece with a mask film sandwiched between an upper frame and a lower frame of a printing frame in close contact with the workpiece, a heat ray is absorbed at an intermediate position between the light source and the printing frame. In this method, the irradiated light from the light source is cooled by passing running water in a cooling water tank that transmits ultraviolet rays, and the irradiated light from the light source is heated in addition to the running water at an intermediate position between the light source and the baking frame. This is a method of cooling by passing through an absorption filter, and the method is characterized in that the flowing water has a speed that makes it impossible to generate bubbles.

〔作用〕[Effect]

本発明は前記構成によって、露光装置の光源から照射さ
れる光は、マスクフィルムに到達する時点においては、
冷却用水槽の流水によって、前記照射光に含まれる熱線
が吸収される外に、熱線吸収フィルタを使用した場合に
は、このフィルタにおいて、さらに熱線が吸収され、紫
外線がマスクフィルムの透光部分を通過して、該マスク
フィルムの画像をワークへ焼き付ける9さらに、前記流
水の速度を気泡が発生しない程度の速度を有するように
加速することによって、発生気泡による焼付けむらを防
ぐ。従って、マスクフィルムは照射光線によって伸縮す
ることがなく、ワークに寸法誤差が生じない外に、マス
クフィルムの乳剤等が膨潤して熱変形しない。
In the present invention, with the above configuration, at the time when the light irradiated from the light source of the exposure device reaches the mask film,
In addition to the heat rays contained in the irradiation light being absorbed by the running water of the cooling water tank, if a heat ray absorption filter is used, the heat rays are further absorbed in this filter, and the ultraviolet rays penetrate the transparent portion of the mask film. 9 to print the image of the mask film onto the workpiece.Furthermore, by accelerating the speed of the flowing water to a speed that does not generate bubbles, uneven printing due to generated bubbles is prevented. Therefore, the mask film does not expand or contract due to the irradiation light, and not only does dimensional error not occur in the workpiece, but also the emulsion of the mask film does not swell and undergo thermal deformation.

〔実施例〕〔Example〕

以下、本発明の実施例を第1図ないし第6図を参照して
説明する。第1図は本発明第1実施例の概略的構成を示
す縦切断正面図である。同図において、1は露光装置の
枠型ミラーであって、ミラーが左右および前後方向に対
称に組み立てられ、内側に平らな反射面1a、lb、l
cを形成した3個の中空截頭角錐状ミラーを高さ方向に
断面積が低減するように3段接続してつくられており、
全体として上すぼまりに形成されている。2は露光装置
の棒状光源であって、ミラーの頂部に配置され、長方体
状の反射箱3内に収納されている。
Embodiments of the present invention will be described below with reference to FIGS. 1 to 6. FIG. 1 is a vertically sectioned front view showing a schematic configuration of a first embodiment of the present invention. In the figure, reference numeral 1 denotes a frame-shaped mirror of an exposure device, and the mirror is assembled symmetrically in the left-right and front-back directions, and has flat reflecting surfaces 1a, lb, l on the inside.
It is made by connecting three hollow truncated pyramidal mirrors shaped like c in three stages so that the cross-sectional area decreases in the height direction.
The overall shape is tapered at the top. Reference numeral 2 denotes a rod-shaped light source of the exposure device, which is placed on top of a mirror and housed in a rectangular reflection box 3.

4は下枠であって、この下枠4と上枠5とで焼枠を形成
し、下枠4と上枠5との間には、下枠4側に向けたマス
クフィルム6を密着したワーク7が挟持されている。ま
た、8は密封用ガスケットである。しかも、光源2の照
射光によって、マスクフィルム6の各個所が均一に照射
されるように、ミラー1a、tb、  1cIJ<組み
立てられている。
4 is a lower frame, the lower frame 4 and the upper frame 5 form a baking frame, and between the lower frame 4 and the upper frame 5, a mask film 6 facing the lower frame 4 side is tightly attached. A workpiece 7 is being held. Further, 8 is a sealing gasket. Moreover, the mirrors 1a, tb, and 1cIJ< are assembled so that each part of the mask film 6 is uniformly irradiated with the irradiation light from the light source 2.

上記焼枠の構成は下枠側から焼き付ける場合であるが、
上枠側から焼き付ける場合には、上記構成記載における
下枠を上枠に、上枠を下枠に置き代えればよい。
The configuration of the above baking frame is for baking from the bottom frame side,
When printing from the upper frame side, the lower frame in the above configuration description may be replaced with the upper frame, and the upper frame may be replaced with the lower frame.

第1実施例は上記従来の構成において、光源体2と前記
下枠4との中間位置、すなわち光源2を収納した反射箱
3とミラー1aとの間に冷却用水槽9を設けて構成する
In the first embodiment, a cooling water tank 9 is provided in the conventional configuration as described above, at an intermediate position between the light source body 2 and the lower frame 4, that is, between the reflection box 3 housing the light source 2 and the mirror 1a.

第2図は上記冷却用水I!9の構成図であって、第2図
(A)は平面図、第2図([1)は同(A)図における
B−B線の切断正面図、第2図(C)は同図(B)内の
部分Cの拡大図である。冷却用水槽9は同図に示すよう
に、熱線を吸収しかつ紫外線を透過する2枚の板状ガラ
ス10.1)を並行に並べる。
Figure 2 shows the cooling water I! 9, in which FIG. 2 (A) is a plan view, FIG. 2 ([1) is a front view taken along line B-B in FIG. 2 (A), and FIG. 2 (C) is a front view of the same figure It is an enlarged view of part C in (B). As shown in the figure, the cooling water tank 9 has two glass plates 10.1) that absorb heat rays and transmit ultraviolet rays arranged in parallel.

この上側の仮ガラス10ば外周を押え金具15を介して
クツション部材18によって囲まれ、このクツション部
材18の外周縁部に設けた溝18aに0リング20を挿
入することによって仮ガラス10の外周を押え金具15
に密着させている。他方、板ガラス10の内側面外周縁
部に当接するクツション部材18に設けた溝21にOリ
ング22を挿入し、締め付りボルトi7aを押え金具1
5を貫通してクツション部材18に締め付i′JJるこ
とによって、板ガラス10の内側面外周縁とクツション
部材18とを密着させている。
The outer periphery of the upper temporary glass 10 is surrounded by a cushion member 18 via a holding fitting 15, and by inserting an O-ring 20 into a groove 18a provided on the outer periphery of the cushion member 18, the outer periphery of the temporary glass 10 is Presser metal fitting 15
It is closely attached to. On the other hand, the O-ring 22 is inserted into the groove 21 provided in the cushion member 18 that contacts the outer peripheral edge of the inner surface of the plate glass 10, and the tightening bolt i7a is held down by the metal fitting 1.
5 and tightens to the cushion member 18, the outer peripheral edge of the inner surface of the glass plate 10 and the cushion member 18 are brought into close contact.

また、下側の仮ガラス1)は外周を押え金具16を介し
てクツション部材19によって囲まれ、さらに、このク
ツション部材190図面上左側部分には予め吸水孔13
a、13b、13cが分配水路12&ご連通可能にクツ
ション部材19に穿設され、分配水路12に連通した水
路14a、14b、14c、14d、14e、14fは
クツション部材18を通って冷却水槽9の内部に連通し
ていると共に、図面上右側には排水孔13a’、13b
’、13e’が分配水路12′に連通可能にクツション
部材19に穿設され、これら排水孔に連通ずる水路14
3′〜14r′がクツション部材18に形成されている
。また、クツション部材18に設けた溝23にはOリン
グ24を挿入し、締め付はボルト17bを押え金具16
を貫通してり、/・ジョン部材18に締め付けることに
よって板ガラス1)の内側周縁面とクツション部材18
とを密封する。さらに、クツション部材18に設けた溝
25に0リング26を挿入し、締め付はボルト17c、
17dをそれぞれ97237部材19を介してクツショ
ン部材18に締め付けることにより、クツション部材1
8.19の間およびクツション部材19と給水孔13b
、水路14eとの間を密封する。
The outer periphery of the lower temporary glass 1) is surrounded by a cushion member 19 via a holding fitting 16, and the cushion member 190 has a water absorption hole 13 in advance on the left side in the drawing.
a, 13b, 13c are bored in the cushion member 19 so as to communicate with the distribution water channel 12, and the water channels 14a, 14b, 14c, 14d, 14e, 14f communicating with the distribution water channel 12 pass through the cushion member 18 and connect to the cooling water tank 9. There are drain holes 13a' and 13b on the right side of the drawing.
', 13e' are bored in the cushion member 19 so as to communicate with the distribution waterway 12', and a waterway 14 that communicates with these drainage holes.
3' to 14r' are formed on the cushion member 18. In addition, an O-ring 24 is inserted into the groove 23 provided in the cushion member 18, and the bolt 17b is held down by the metal fitting 16.
/.By tightening to the John member 18, the inner peripheral surface of the glass plate 1) and the cushion member 18
and seal it. Furthermore, the O-ring 26 is inserted into the groove 25 provided in the cushion member 18, and the bolt 17c is tightened.
17d to the cushion member 18 via the 97237 member 19, the cushion member 1
8. Between 19 and cushion member 19 and water supply hole 13b
, and the waterway 14e.

上記構成の第1実施例では、冷却水槽9に冷却水が分配
水路12、吸水孔13a、13b、13Cを介して注水
される。冷却水槽9は2枚のガラス仮10.1)の周囲
をクツション部材18.19によって水密に形成されて
いるので、注入された冷却水は漏水することな(排水孔
13a’、13b’、13c’および分配水路12′を
介して冷却水槽9外に排出される。このため光源2から
下枠4−・の投射光の熱線は冷却水槽9内の流水によっ
て吸収され、上記投射光の紫外線は仮ガラス1)、冷却
水、仮ガラス10を透過し下枠4を介して゛7スクフイ
ルム6を照射する。マスクフィルJ、6は投射光が熱線
を殆んど含有しないので、温度上昇することがなく、ワ
ーク7に適正なパターンを焼付けることができる。
In the first embodiment with the above configuration, cooling water is injected into the cooling water tank 9 through the distribution channel 12 and the water intake holes 13a, 13b, and 13C. The cooling water tank 9 is formed watertight around the two glass plates 10.1) by a cushion member 18.19, so that the injected cooling water does not leak (drain holes 13a', 13b', 13c). ' and the distribution channel 12' to the outside of the cooling water tank 9. Therefore, the heat rays of the projected light from the light source 2 to the lower frame 4-. are absorbed by the running water in the cooling water tank 9, and the ultraviolet rays of the projected light are Temporary glass 1), cooling water passes through the temporary glass 10, and irradiates the screen film 6 through the lower frame 4. Since the projected light of the mask films J and 6 contains almost no heat rays, the temperature does not rise, and an appropriate pattern can be printed on the workpiece 7.

第3図は本発明の第2実施例の縦切断正面図である。第
2実施例が第1実施例と相違する構成は、冷却用水槽9
が焼枠の下枠4の光源2側に支持部材4aによって固定
さねでいることであり、冷却水槽9の構成は第1実施例
のものと同一である。
FIG. 3 is a vertically sectioned front view of a second embodiment of the present invention. The configuration in which the second embodiment differs from the first embodiment is that the cooling water tank 9
is fixed to the light source 2 side of the lower frame 4 of the baking frame by a support member 4a, and the configuration of the cooling water tank 9 is the same as that of the first embodiment.

従って、第2実施例の効果も第1実施例と同様である。Therefore, the effects of the second embodiment are also similar to those of the first embodiment.

第4図は本発明の第3実施例の光源からの照射光の経路
の概略的構成を示す正面図であって、この実施例は、第
1.第2実施例との構成上の相違は露光装置の枠型ミラ
ー1の光源2から焼枠の下枠4への投射光は反射鏡27
.28を介して照射されることであり、第4図は冷却用
水槽9は下枠4の光源側に配置されている場合を示す。
FIG. 4 is a front view showing a schematic configuration of the path of the irradiated light from the light source of the third embodiment of the present invention, and this embodiment is similar to the first embodiment. The difference in structure from the second embodiment is that the light projected from the light source 2 of the frame-shaped mirror 1 of the exposure device to the lower frame 4 of the printing frame is reflected by a reflecting mirror 27.
.. 28, and FIG. 4 shows a case where the cooling water tank 9 is arranged on the light source side of the lower frame 4.

この場合に、冷却用水槽9は第1実施例のように光源2
を収納した反射箱3とミラー1aとの間に設けてもよい
こと勿論である。
In this case, the cooling water tank 9 is connected to the light source 2 as in the first embodiment.
Of course, it may be provided between the reflection box 3 containing the mirror 1a and the mirror 1a.

この実施例は配置場所の制約から、光源が焼枠から水平
方向に離間している場合であるが第1実施例と同様な作
用と効果を生じさせる。
Although this embodiment is a case in which the light source is horizontally spaced apart from the baking frame due to restrictions on the placement location, it produces the same functions and effects as the first embodiment.

第5図は本発明の第4実施例に使用される冷却用水槽の
縦切断正面図である。この冷却用水槽9aが第1ないし
第2実施例に使用された冷却用水槽9と相違する構成は
、冷却用水槽9aの構成部材である仮ガラスio、1i
と平行して熱線フィJL夕29を設けると井に、この熱
線フィルタ29の周端部を仮ガラス10の周囲を保持す
るクツション部材19によって保持させていることにあ
る。
FIG. 5 is a longitudinally sectioned front view of a cooling water tank used in a fourth embodiment of the present invention. This cooling water tank 9a is different from the cooling water tank 9 used in the first and second embodiments in that the temporary glass io, 1i, which is a component of the cooling water tank 9a, is different from the cooling water tank 9 used in the first and second embodiments.
When the hot wire filter 29 is provided in parallel with the hot wire filter 29, the peripheral end of the hot wire filter 29 is held by a cushion member 19 that holds the periphery of the temporary glass 10.

なお、熱線フィルタ29はクツション部材18に保持さ
せてもよい。
Note that the heat ray filter 29 may be held by the cushion member 18.

上記の構成によって、この実施例は、第1〜第2実施例
よりも更に効率よく、枠型ミラーI内の光源2から下枠
4への照射光から熱線を吸収する効果を奏する。
With the above configuration, this embodiment has the effect of absorbing heat rays from the light irradiated from the light source 2 in the frame mirror I to the lower frame 4 more efficiently than the first and second embodiments.

第6図は本発明の第5実施例に使用される冷却用水槽9
bの構成を示す平面図である。この第5実施例の冷却用
水槽9bと第1実施例の冷却水槽9との構成上の相違は
、冷却水の注入機構と排出機構とにある。すなわち、冷
却用水槽9bの注入と排出機構は、離間して平行配置し
た2枚の仮ガラスの四辺を密封保持するクツション部材
18または19の1つの辺に吸水孔30と排水孔31と
を設り、吸水孔30の水槽定に設けた案内32とυ1水
孔31の水槽内に設けた案内33とをそれぞれ冷却水が
水槽内で循環できるように対向し7た壁面に個別に向は
取り付け、さらに、注入孔30への注水管路にはポンプ
34を設けていることにある。
FIG. 6 shows a cooling water tank 9 used in the fifth embodiment of the present invention.
It is a top view which shows the structure of b. The structural difference between the cooling water tank 9b of the fifth embodiment and the cooling water tank 9 of the first embodiment lies in the cooling water injection mechanism and discharge mechanism. That is, the injection and discharge mechanism of the cooling water tank 9b is such that a water absorption hole 30 and a drainage hole 31 are provided on one side of a cushion member 18 or 19 that seals and holds the four sides of two pieces of temporary glass spaced apart and arranged in parallel. The guide 32 provided in the water tank of the water suction hole 30 and the guide 33 provided in the water tank of the υ1 water hole 31 are individually mounted on opposing wall surfaces so that the cooling water can circulate in the water tank. Furthermore, a pump 34 is provided in the water injection conduit to the injection hole 30.

上記の構成によって、第5実施例は、第1実施例と同様
に、冷却用水槽9b’を図示しない光源と焼枠の下枠と
の間に設け、しかも水槽9b’内では注入された冷却水
は水槽内を大きい速度で循環して排出されるので、下枠
とワークとの間に設けたマスクフィルムの温度上昇を効
率よく抑正し、ワークへの熱影響を排除して、ワークに
適正なパターンを焼き付ける。しかも、ポンプを介在さ
せることによって、冷却水を大きい速度を持って水槽9
b内に注入し、排出させるので、冷却水は水槽内で照射
光から奪った熱によって気泡を発生する程加熱されない
。すなわら、第5実施例においては、冷却用水槽9bの
使用による気泡に基づくマスクフィルムの焼きむらを生
じることがない。
With the above configuration, in the fifth embodiment, the cooling water tank 9b' is provided between the light source (not shown) and the lower frame of the baking frame, as in the first embodiment, and the cooling water injected into the water tank 9b' is Since the water circulates in the water tank at a high speed and is discharged, it efficiently suppresses the temperature rise of the mask film installed between the lower frame and the workpiece, eliminates the influence of heat on the workpiece, and Burn the appropriate pattern. Moreover, by interposing the pump, the cooling water can be supplied to the water tank 9 at a high speed.
Since the cooling water is injected into the tank and discharged, the cooling water is not heated to the extent that bubbles are generated due to the heat taken from the irradiated light in the water tank. That is, in the fifth embodiment, uneven baking of the mask film due to air bubbles caused by the use of the cooling water tank 9b does not occur.

〔発明の効果〕〔Effect of the invention〕

本願発明は、光源と焼枠との中間位置で熱線を吸収し、
紫外線を透過させる冷却用水槽の流水によって、さらに
この流水の他に熱線フィルタによって光源からの熱線を
除去するか、または、前記流水を気泡の発生が不可能な
速度に加速するようにした焼枠の冷却方法である。従っ
て、本願は高温度雰囲気においての焼付作業においても
マスクフィルムの温度」二昇を抑止し、乳剤などが膨潤
して熱変形することがなく、また前記冷却水に気泡が発
生ずることによる焼付けむらもなく、適正なパターンを
ワークへ焼き付けることができる。
The present invention absorbs heat rays at an intermediate position between the light source and the baking frame,
A baking frame in which running water from a cooling water tank that transmits ultraviolet rays is used, and in addition to this running water, heat rays from a light source are removed by a heat ray filter, or the running water is accelerated to a speed that makes it impossible to generate bubbles. This is a cooling method. Therefore, the present application prevents the temperature of the mask film from rising even during printing work in a high-temperature atmosphere, prevents the emulsion from swelling and deforming due to heat, and prevents uneven printing due to the formation of air bubbles in the cooling water. It is possible to print an appropriate pattern onto the workpiece without any problems.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第6図は本発明実施例の図面であって、第
1図は第1実施例の概略的構成を示す縦切断正面図、第
2図(A) 、 (B) 、 (C)は第1実施例に使
用される冷却用水槽の構成図であって、図(A)は平面
図、図(B)は図(A)におC)るB−B線の切断正面
図、図(C)は図(B)内の部分Cの拡大図、第3図は
第2実施例の縦切断正面図、第4図は第3実施例の光源
からの照射光の経路の概略的構成を示す正面図、第5図
は第4実施例の冷却用水槽の縦切断正面図、第6図は第
5実施例に使用される冷却用水槽の構成を示す平面図で
ある。 l・・・露光装置の枠形ミラー 2・・・露光装置の棒状光源 ・・・反射箱      4・・・下枠・・・上枠  
     6・・・マスクフィルム9a、9b・・・冷
却用水槽 0.1)・・・仮ガラス 12・・・分配水路3・・・
吸水孔     14・・・水路5.1G・・・押え板
  I7・・・締付ボルト8.19・・・クツション部
材 0.22,24.26・・・Oリング 1.23.25・・・溝 27.28・・・反射鏡9・
・・熱線吸収フィルタ 0・・・吸水孔     31・・・排水孔2.33・
・・ノズル  34・・・ポンプ第1図 第3図 第4図 第5図 1】 第6図 +8(+9)
1 to 6 are drawings of embodiments of the present invention, in which FIG. 1 is a longitudinally sectioned front view showing the schematic configuration of the first embodiment, and FIGS. 2(A), (B), (C) ) is a configuration diagram of a cooling water tank used in the first embodiment, where figure (A) is a plan view and figure (B) is a front view cut along line B-B in figure (A). , Figure (C) is an enlarged view of part C in Figure (B), Figure 3 is a longitudinally sectioned front view of the second embodiment, and Figure 4 is an outline of the path of the irradiated light from the light source of the third embodiment. FIG. 5 is a vertically sectioned front view of the cooling water tank of the fourth embodiment, and FIG. 6 is a plan view showing the structure of the cooling water tank used in the fifth embodiment. l...Frame-shaped mirror of exposure device 2...Bar-shaped light source of exposure device...Reflection box 4...Lower frame...Upper frame
6... Mask films 9a, 9b... Cooling water tank 0.1)... Temporary glass 12... Distribution channel 3...
Water absorption hole 14... Water channel 5.1G... Holding plate I7... Tightening bolt 8.19... Cushion member 0.22, 24.26... O-ring 1.23.25... Groove 27.28...Reflector 9.
... Heat ray absorption filter 0 ... Water absorption hole 31 ... Drain hole 2.33.
...Nozzle 34...Pump Fig. 1 Fig. 3 Fig. 4 Fig. 5 Fig. 1] Fig. 6 +8 (+9)

Claims (3)

【特許請求の範囲】[Claims] (1)露光装置の光源により、焼枠の上枠と下枠との間
に挟持されたマスクフィルムを密着したワークを照射す
る露光装置において、 前記光源と前記焼枠との中間位置で熱線を吸収しかつ紫
外線を透過させる冷却用水槽の流水の通過によって前記
光源からの熱線を除去することを特徴とする焼枠の冷却
方法。
(1) In an exposure device that uses a light source of an exposure device to irradiate a workpiece with a mask film sandwiched between an upper frame and a lower frame of a printing frame in close contact with the workpiece, a heat ray is emitted at an intermediate position between the light source and the printing frame. A method for cooling a baking frame, characterized in that heat rays from the light source are removed by passing running water in a cooling water tank that absorbs and transmits ultraviolet rays.
(2)前記光源からの照射光が前記光源と前記焼枠との
中間位置で前記流水の他に熱吸収フィルタの通過によっ
て冷却することを特徴とする前記第1項記載の焼枠の冷
却方法。
(2) The method for cooling a baking frame according to item 1, characterized in that the irradiated light from the light source is cooled by passing through a heat absorption filter in addition to the running water at an intermediate position between the light source and the baking frame. .
(3)前記流水は気泡発生が不能な速度を有しているこ
とを特徴とする前記第1項ないし第2項の何れかの項記
載の焼枠の冷却方法。
(3) The method for cooling a baking frame according to any one of items 1 and 2, wherein the flowing water has a speed that makes it impossible to generate bubbles.
JP63297949A 1988-11-25 1988-11-25 Method for cooling printing frame Pending JPH02144540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63297949A JPH02144540A (en) 1988-11-25 1988-11-25 Method for cooling printing frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63297949A JPH02144540A (en) 1988-11-25 1988-11-25 Method for cooling printing frame

Publications (1)

Publication Number Publication Date
JPH02144540A true JPH02144540A (en) 1990-06-04

Family

ID=17853174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63297949A Pending JPH02144540A (en) 1988-11-25 1988-11-25 Method for cooling printing frame

Country Status (1)

Country Link
JP (1) JPH02144540A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116559A (en) * 1990-09-06 1992-04-17 Orc Mfg Co Ltd Exposing device and heat absorption type cold mirror

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172638A (en) * 1983-03-23 1984-09-29 Toshiba Electric Equip Corp Light irradiating device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172638A (en) * 1983-03-23 1984-09-29 Toshiba Electric Equip Corp Light irradiating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116559A (en) * 1990-09-06 1992-04-17 Orc Mfg Co Ltd Exposing device and heat absorption type cold mirror

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