JPH02145459A - Glass for copying machine and production thereof - Google Patents
Glass for copying machine and production thereofInfo
- Publication number
- JPH02145459A JPH02145459A JP30032388A JP30032388A JPH02145459A JP H02145459 A JPH02145459 A JP H02145459A JP 30032388 A JP30032388 A JP 30032388A JP 30032388 A JP30032388 A JP 30032388A JP H02145459 A JPH02145459 A JP H02145459A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- solution
- film
- chlorine
- copying machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 16
- 239000000460 chlorine Substances 0.000 claims abstract description 16
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 15
- -1 indium alkoxide Chemical class 0.000 claims abstract description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 11
- 238000001035 drying Methods 0.000 claims abstract description 10
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 9
- 229910052738 indium Inorganic materials 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000005357 flat glass Substances 0.000 claims description 4
- 150000003377 silicon compounds Chemical class 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 28
- 239000011248 coating agent Substances 0.000 abstract description 20
- 238000002834 transmittance Methods 0.000 abstract description 18
- 230000003068 static effect Effects 0.000 abstract description 13
- 150000004703 alkoxides Chemical class 0.000 abstract description 12
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 2
- 238000001354 calcination Methods 0.000 abstract 1
- XPDGHGYGTJOTBC-UHFFFAOYSA-N methoxy(methyl)silicon Chemical compound CO[Si]C XPDGHGYGTJOTBC-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000005611 electricity Effects 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- NCGBFHRHXQDSQM-UHFFFAOYSA-N chloro(fluoro)silane Chemical compound F[SiH2]Cl NCGBFHRHXQDSQM-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- WCTXJBYIXVVFCF-UHFFFAOYSA-M chlorotin Chemical compound [Sn]Cl WCTXJBYIXVVFCF-UHFFFAOYSA-M 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Holders For Sensitive Materials And Originals (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は複写機、ことに自動原稿給紙タイプの複写機に
おける原稿送り部で用いる複写機用ガラスの製造方法に
関し、さらに詳しくは紙等を送る際摺擦することにより
発生する静電気の支障を防止し、かつ表面滑性および光
透過性の優れた複写機用ガラスの製造方法に関するもの
である。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing copying machine glass used in a document feeding section of a copying machine, particularly an automatic document feeding type copying machine, and more specifically relates to a method for manufacturing glass for a copying machine used in a document feeding section of a copying machine of an automatic document feeding type. The present invention relates to a method for producing copying machine glass that prevents problems caused by static electricity caused by rubbing during feeding, and has excellent surface smoothness and light transmittance.
[従来技術とその解決しようとする課題]通常、自動原
稿給紙タイプの複写機の紙送り機構は、原稿送り出しの
一対のロールと、そのロールと同期駆動するロールによ
ってゴムベルトをガラス板上で回転することにより、原
稿が自動的にガラス板上に搬送されていくようになって
いる。[Prior Art and Problems to be Solved] Normally, the paper feeding mechanism of an automatic document feeding type copying machine rotates a rubber belt on a glass plate by a pair of rolls for feeding the document and a roll driven in synchronization with the rolls. By doing so, the original is automatically conveyed onto the glass plate.
通常使用中、常にベルトとガラス板とは密接した状態に
あり、このため原稿給紙時には、原稿とガラス板、ガラ
ス板とゴムベルトとの間に摩擦による静電気が発生する
が、ゴムベルトおよびガラス板とも絶縁物であり帯電し
た静電気を除去することができず、ガラス板とゴムベル
ト間に多量の静電気が帯電し、この静電気により紙送り
がスムーズにいかず、紙詰り、塵埃付着によるコピー不
良等のトラブルが発生しやすい。特に高速複写機におい
てこのような傾向が著しく、種々の対策がなされている
。During normal use, the belt and glass plate are always in close contact with each other, and therefore, when a document is fed, static electricity is generated due to friction between the document and the glass plate, and between the glass plate and the rubber belt. Since it is an insulator, static electricity cannot be removed, and a large amount of static electricity builds up between the glass plate and the rubber belt. This static electricity prevents paper from feeding smoothly, causing problems such as paper jams and poor copying due to dust adhesion. is likely to occur. This tendency is particularly noticeable in high-speed copying machines, and various countermeasures have been taken.
例えば、ガラス板に帯電防止処理を施したものとして、
実開昭56−159345号公報には、複写機の原稿載
置ガラスが記載され、ガラス板の受光面に透明導電層を
積層し、この透明導電層を接地したことによって、静電
気を帯びた塵埃が原稿載置ガラスに付着することなく、
常に良好なコピーが得られるようにすることが示されて
いる。また、特開昭57−90668号公報には、透明
ガラスからなる原稿載置面に透明な静電気防止処理を施
すことにより、原稿の搬送あるいは搬送ベルトの走行時
に生じる摩擦帯電による原稿の搬送不良を防止すること
が示されている
しかし、これら従来のガラス表面処理方法は、帯電防止
の効果と表面滑性の両者を同時に満足させたものではな
く、紙詰り対策としては十分ではない。For example, if a glass plate is treated with antistatic treatment,
Japanese Utility Model Publication No. 56-159345 describes a document placement glass for a copying machine, in which a transparent conductive layer is laminated on the light-receiving surface of the glass plate, and this transparent conductive layer is grounded, so that dust charged with static electricity is removed. without adhering to the document placement glass.
It has been shown to ensure that good copies are always obtained. Furthermore, Japanese Patent Application Laid-Open No. 57-90668 discloses that by applying a transparent anti-static treatment to the document placement surface made of transparent glass, defects in document conveyance due to frictional electrification that occur during conveyance of the document or when the conveyance belt runs are prevented. However, these conventional glass surface treatment methods do not satisfy both antistatic effect and surface smoothness at the same time, and are not sufficient as a countermeasure against paper jams.
これらのことから、当山願人は特開昭63−23302
0号において、ガラス板の原稿給紙面側あるいはそのも
う一方面側のうち、すくなくとも片面に帯電防止層を3
00〜1500人の厚さで設け、かつ原稿給紙面側の紙
接触面に少な(とも表面滑性層を300〜2000人の
厚さで設けてなることを特徴とする複写機用ガラスおよ
びその製造方法を開示し、複写機用ガラスの表面の静電
防止効果および滑性の優れた複写機用ガラスについての
提案を行った。For these reasons, Toyama Ganjin published Japanese Patent Application Laid-Open No. 63-23302.
No. 0 has an antistatic layer on at least 3 sides of the document feed side of the glass plate or the other side thereof.
A glass for a copying machine characterized by having a thickness of 0.00 to 1500 mm, and a thin surface smooth layer on the paper contacting surface on the document feeding surface side, and a surface smoothing layer having a thickness of 300 to 2000 mm. We disclosed a manufacturing method and proposed glass for copying machines with excellent antistatic effect and smoothness on the surface of glass for copying machines.
その後、本出願人はさらに塗布法による複写機用ガラス
の製造につき、光学的条件を主体に検討を進め、問題と
なる可視光線の透過率が高く、かつ表面抵抗および表面
滑性の優れた複写機を得るための方法についての検討を
行った。Subsequently, the applicant further investigated the optical conditions for producing copying machine glass using the coating method. We considered ways to obtain opportunities.
c問題点を解決するための具体的手段]本発明者らはか
かる従来法の問題点に鑑み、鋭意検討の結果、ガラス表
面に特定化学組成の塩素を含有するインジウムアルコキ
シドおよびスズアルコキシドを特定の割合で混合し、塗
布、焼成した後、その上にシラン系の薬液を塗布、乾燥
することにより、光透過性が優れ、かつ表面滑性、表面
抵抗率も共に優れた複写機用ガラスが得られることを見
いだし本発明に到達したものである。[Specific Means for Solving Problem c] In view of the problems of the conventional method, the present inventors have conducted intensive studies and found that indium alkoxide and tin alkoxide containing chlorine of a specific chemical composition are added to the glass surface using a specific method. By mixing the mixture in different proportions, applying it, and baking it, and then applying a silane-based chemical solution and drying it, glass for copiers with excellent light transmittance, surface smoothness, and surface resistivity can be obtained. The present invention was achieved by discovering that
すなわち本発明は、一般式In(ORI))c C1お
K(ただし、R1は炭素数2〜6のアルキル基またはア
ルコキシアルキル基を示し、1.8≦x≦2.7)で示
される塩素含有インジウムアルコキシドと、一般式5n
(ORx)yc1*−7(ただし、R,は炭素数2〜6
のアルキル基またはアルコキシアルキル基を示し、2,
5≦y≦3.8)で示される塩素含有スズアルコキシド
が、In/Snのモル比で87/13≦In/Sn≦9
674の割合で混合された濃度0.015〜0.08m
ol#!の溶液が塗布された導電層およびメチル基を含
有する有機けい素化合物の溶液が塗布された滑性層が順
次板ガラスの表面に被覆されてなる複写機用ガラスおよ
びガラス基板上に、上記組成の塩素含有アルコキシドを
塗布し、350〜550℃で乾燥、焼成して成膜し、そ
の表面にメチル基を含有する有機けい素化合物の溶液を
塗布、乾燥することを特徴とする複写機用ガラスの製造
方法である。That is, the present invention provides chlorine represented by the general formula In(ORI))c C1 or K (where R1 represents an alkyl group or an alkoxyalkyl group having 2 to 6 carbon atoms, and 1.8≦x≦2.7). Containing indium alkoxide and general formula 5n
(ORx)yc1*-7 (R, has 2 to 6 carbon atoms
represents an alkyl group or an alkoxyalkyl group, 2,
The chlorine-containing tin alkoxide represented by 5≦y≦3.8) has an In/Sn molar ratio of 87/13≦In/Sn≦9.
Concentration 0.015-0.08m mixed at a ratio of 674
ol#! A conductive layer coated with a solution of the above composition and a slipping layer coated with a solution of a methyl group-containing organosilicon compound are coated on the surface of a copying machine glass and a glass substrate. A glass for copying machines characterized by coating a chlorine-containing alkoxide, drying and baking at 350 to 550°C to form a film, and coating the surface of the film with a solution of an organosilicon compound containing a methyl group and drying. This is the manufacturing method.
本発明で用いる板ガラスとしては、通常の板ガラスでよ
いが、好ましくは化学強化あるいは風冷強化ガラスを用
いる。また、光透過率ができるだけ高いもの、具体的に
は厚さ41以下で89%以上の光透過率を有するものが
好ましい。The plate glass used in the present invention may be ordinary plate glass, but chemically strengthened or air-cooled tempered glass is preferably used. Further, it is preferable to use a material having as high a light transmittance as possible, specifically, a material having a light transmittance of 89% or more at a thickness of 41% or less.
通常のガラス板を用いた場合、本発明の方法により塗布
、焼成した後、風冷により強化ガラスとすることもでき
る。When a normal glass plate is used, it can be coated and fired by the method of the present invention, and then made into tempered glass by air cooling.
本発明で用いられる一般式In(OR,) 、CI、−
XまたはSn (ORz )γCl41中のアルキル基
のR,、R,は炭素数2〜6であるが、両者とも特にイ
ソプロピル基、ブチル基、またはエチレングリコールモ
ノエチルエーテルのようなアルコキシアルキル基が好ま
しい。上記塩素含有アルコキシドはどのような製造方法
により製造されたものでも、均一な組成を持つものなら
使用でき、InCl3.5nC14をOR,、OR2に
対応するアルコール中に溶解した後、アルカリ金属また
はアルカリ金属アルコキシドを特定量添加して生成する
塩を除去し、本発明の組成になるようにしたものでもよ
(、上記InCl3.5nC1,とIn(OR)3.5
n(OR)a等の完全置換型アルコキシドを本発明の組
成になるように混合し、加熱、攪拌により均一組成にな
るようにしたものでもよい。General formula In(OR,), CI, - used in the present invention
The alkyl group R,,R, in X or Sn(ORz)γCl41 has 2 to 6 carbon atoms, but both are particularly preferably an isopropyl group, a butyl group, or an alkoxyalkyl group such as ethylene glycol monoethyl ether. . The above-mentioned chlorine-containing alkoxide can be used as long as it has a uniform composition and is manufactured by any manufacturing method.After dissolving InCl3.5nC14 in alcohol corresponding to OR, OR2, alkali metal or alkali metal The composition of the present invention may be obtained by adding a specific amount of alkoxide and removing the salt produced (InCl3.5nC1 and In(OR)3.5
It is also possible to mix completely substituted alkoxides such as n(OR)a so as to have the composition of the present invention, and then heat and stir to obtain a uniform composition.
本発明の塗布溶液中の塩素含有スズアルコキシドと塩素
含有インジウムアルコキシドの濃度は、その合計が0.
015〜0.08+*ol/ 1が好ましい。両者の濃
度合計が0.015 mol/J未満の場合、塗布する
膜の厚さが薄すぎるため、均一な厚さの膜が形成しにく
く、再現性のある電気的特性の膜が得られない、一方、
濃度が0.08mol/1を越えると電気的特性に大き
な変化はないが、800Å以下の膜厚のものを得ること
が難しくなり、そのため可視光線の透過率が低下するた
め、好ましくない。The total concentration of chlorine-containing tin alkoxide and chlorine-containing indium alkoxide in the coating solution of the present invention is 0.
015-0.08+*ol/1 is preferred. If the total concentration of both is less than 0.015 mol/J, the thickness of the coated film is too thin, making it difficult to form a film with uniform thickness, making it impossible to obtain a film with reproducible electrical characteristics. ,on the other hand,
If the concentration exceeds 0.08 mol/1, there is no major change in the electrical properties, but it becomes difficult to obtain a film with a thickness of 800 Å or less, which reduces the transmittance of visible light, which is not preferable.
本発明で使用される組成の導電膜形成用組成物は非常に
ポットライフが長く、普通の保存状態では数カ月以上、
加水分解を起こさず、沈殿等を生じないという大きな長
所を持つ、上記溶液は、普通金属アルコキシドを生成さ
せる時に用いたアルコール中に溶解しているが、この溶
液をさらに溶媒によって希釈してもよく、希釈溶媒とし
てヘキサン、ヘプタン等の炭化水素、ベンゼン、トルエ
ン、キシレン等の芳香族炭化水素、n−プロパツール、
l−プロパツール、n−ブタノール、i−ブタノール等
のアルコール、酢酸エチル、酢酸ブチル等の酢酸エステ
ル、ジエチルケトン、アセトン等のケトン類、エチレン
グリコールモノエチルエーテル等のエーテル、 THF
、クロロホルム等で稀釈した後、種々の条件で成膜する
ことができる。The conductive film forming composition used in the present invention has a very long pot life, lasting several months or more under normal storage conditions.
The above solution, which has the great advantage of not causing hydrolysis or precipitation, is usually dissolved in the alcohol used to produce the metal alkoxide, but this solution may be further diluted with a solvent. , hydrocarbons such as hexane and heptane, aromatic hydrocarbons such as benzene, toluene, and xylene, n-propanol,
Alcohols such as l-propanol, n-butanol, i-butanol, acetate esters such as ethyl acetate and butyl acetate, ketones such as diethyl ketone and acetone, ethers such as ethylene glycol monoethyl ether, THF
After diluting with , chloroform, etc., a film can be formed under various conditions.
本発明に用いる塗布液中のインジウムとスズのモル比は
、87/13≦In/Sn≦9674の範囲がよい。The molar ratio of indium and tin in the coating liquid used in the present invention is preferably in the range of 87/13≦In/Sn≦9674.
表面抵抗の最も低い値は、上記モル比の範囲内にあり、
最低値を中心にその組成からずれるに従い、表面抵抗値
はしだいに大きくなる。一方、可視光線透過率は、I
n/Sn (モル比)が増加するに従って小さくなり、
上記範囲内でほぼ飽和値となる。The lowest value of surface resistance is within the range of the above molar ratio,
As the composition deviates from the minimum value, the surface resistance value gradually increases. On the other hand, the visible light transmittance is I
As n/Sn (molar ratio) increases, it becomes smaller,
The value is almost saturated within the above range.
従って、In/Sn(モル比)が87/13より小さい
場合、表面抵抗値は増加し、可視光線透過率は減少し、
特に可視光線透過率が低すぎる値となり、好ましくない
。In/Sn(モル比)が96/4より大きい場合、可
視光線透過率は大きく変わらないが、表面抵抗値が大き
すぎるため、好ましくない。Therefore, when the In/Sn (molar ratio) is smaller than 87/13, the surface resistance increases, the visible light transmittance decreases,
In particular, the visible light transmittance becomes too low, which is not preferable. When the In/Sn (molar ratio) is greater than 96/4, the visible light transmittance does not change significantly, but the surface resistance value is too large, which is not preferable.
塗布する方法としては、スプレー法、ロールコート法、
スクリーン印刷、スピンコード法、浸漬法を用いて成膜
することができるが、浸漬法、ロールコート法が好まし
い。Application methods include spray method, roll coating method,
The film can be formed using screen printing, a spin code method, or a dipping method, and the dipping method or roll coating method is preferable.
塗布時の温度、湿度などの条件は、加水分解速度に大き
く影響するので、厳重な管理が必要である。Conditions such as temperature and humidity during application greatly affect the rate of hydrolysis, so strict control is required.
上記方法で成膜した後、約lO分〜1時間室温放置して
もよく、そのまま加熱装置に入れ、昇温することにより
、乾燥と焼成を同時に行ってもよい。After forming a film by the above method, it may be left at room temperature for about 10 minutes to 1 hour, or it may be placed in a heating device as it is and heated to perform drying and baking at the same time.
上記工程において、昇温速度は非常に重要であり、lO
℃/win以内でゆっくり加熱することにより緻密で光
透過性の優れた膜が得られるが、昇温速度がそれより速
い場合、微細クラックの原因となり、好ましくない、焼
成温度は本発明に示すように350〜550℃が好まし
く、450〜520℃がより好ましい、この温度範囲内
で乾燥、焼成を行うことにより、アルコキシドが完全に
酸化分解されてITOの組成となり、被膜の表面抵抗値
が低く、耐久性にも優れたものとなる。焼成温度が35
0°Cより低い場合、アルコキシドが完全に分解して酸
化物とならないため、形成された膜は耐久性に劣り表面
抵抗値も十分低いものとならない、一方、焼成温度が5
50℃を越えた場合、基板となるガラスが歪む現象等が
おこり、好ましくない。In the above process, the temperature increase rate is very important, and 1O
By heating slowly within ℃/win, a dense film with excellent optical transparency can be obtained; however, if the heating rate is faster than that, it may cause minute cracks, which is undesirable. By drying and firing within this temperature range, preferably 350 to 550°C, more preferably 450 to 520°C, the alkoxide is completely oxidized and decomposed to have a composition of ITO, and the surface resistance of the film is low. It also has excellent durability. Firing temperature is 35
If the temperature is lower than 0°C, the alkoxide will not completely decompose into an oxide, so the formed film will have poor durability and the surface resistance will not be low enough.
If the temperature exceeds 50° C., the glass serving as the substrate may become distorted, which is not preferable.
上記条件で成膜することにより、膜厚が209〜800
人の可視光線透過率の高い、優れた透明導電膜となる。By forming the film under the above conditions, the film thickness is 209 to 800 mm.
It becomes an excellent transparent conductive film with high human visible light transmittance.
上述のような方法により、形成されたIT口組成の膜の
表面に、さらにメチル基を含有する有機けい素化合物の
溶液を塗布、乾燥することにより滑性層を設け、潤滑性
を改善する。A solution of an organosilicon compound containing a methyl group is further coated on the surface of the film having the IT composition formed by the method described above and dried to provide a lubricating layer to improve lubricity.
本発明で使用されるメチル基を含有する有機けい素化合
物としては、メチル基を含むものなら何でも使用でき、
例えばアルコキシシラン、クロルシラン、クロルフルオ
ロシラン、シラノール、シラン、シリコンイソシアナー
ト、フルオロシラン、シリコンオイル等が挙げられるが
、その中でもアルコキシシラン、シリコンイソシアナー
ト、シリコンオイル等が好ましい。As the organosilicon compound containing a methyl group used in the present invention, any compound containing a methyl group can be used.
Examples include alkoxysilane, chlorosilane, chlorofluorosilane, silanol, silane, silicone isocyanate, fluorosilane, and silicone oil, among which alkoxysilane, silicone isocyanate, silicone oil, and the like are preferred.
これらの有機けい素化合物の溶液は、種々の溶媒中に溶
解して使用することができ、例えばヘキサン、ヘプタン
等の炭化水素、ベンゼン、トルエン、キシレン等の芳香
族炭化水素、n−プロパツール、i−プロパツール、n
−フタノール、i−ブタノール等のアルコール、酢酸エ
チル、酢酸ブチル等の酢酸エステル、ジエチルケトン、
アセトン等のケトン類、エチレングリコールモノエチル
エーテル等のエーテル、THF、クロロホルム等で希釈
した後、塗布、乾燥して成膜する。Solutions of these organosilicon compounds can be used by dissolving them in various solvents, such as hydrocarbons such as hexane and heptane, aromatic hydrocarbons such as benzene, toluene, and xylene, n-propanol, i-Proper Tools, n
-Alcohols such as phthanol and i-butanol, acetate esters such as ethyl acetate and butyl acetate, diethyl ketone,
After diluting with ketones such as acetone, ethers such as ethylene glycol monoethyl ether, THF, chloroform, etc., it is applied and dried to form a film.
この場合、有機けい素化合物の濃度は、0.03〜0.
8 mo1/lが好ましく、濃度が0.03mol/
1より小さい場合、表面の潤滑性が十分に上がらず、一
方0.8 mol/j!より大きい場合、潤滑性は上が
るが表面の抵抗値は減少し、十分な帯電防止効果が得ら
れない。また上記溶液の塗布方法としては、手塗り、ス
プレー法、ローラーコート法、スクリーン印刷、スピン
コード法、浸漬法が使用できるが、手塗り、ローラーコ
ート法が好ましく、特に滑性膜を形成させる場合、これ
により表面の帯電防止効果が減少しないよう、十分薄い
膜を形成させる必要があるため、塗布液を脱脂綿、ガー
ゼ等に含ませ軽く表面に塗布する程度の方法が薄い膜を
形成させる場合には以外と有利な方法である。In this case, the concentration of the organosilicon compound is 0.03-0.
8 mol/l is preferable, and the concentration is 0.03 mol/l.
If it is less than 1, the surface lubricity will not be sufficiently improved; on the other hand, if it is less than 0.8 mol/j! If it is larger, the lubricity increases, but the surface resistance value decreases, and a sufficient antistatic effect cannot be obtained. The above solution can be applied by hand coating, spraying, roller coating, screen printing, spin cording, and dipping, but hand coating and roller coating are preferred, especially when forming a slippery film. As a result, it is necessary to form a sufficiently thin film so that the antistatic effect on the surface does not decrease. Therefore, when forming a thin film, a method of soaking the coating solution in absorbent cotton, gauze, etc. and lightly applying it to the surface is recommended. is an advantageous method.
このような方法により塗布された後、60〜200℃の
温度で10分以上乾燥することにより、潤滑性を有する
膜が形成される。乾燥温度が60°Cより低い場合、溶
媒が十分に揮散しないため膜の強度が弱く、剥がれたり
、摩耗しやすくなり、一方200°Cより高い場合、潤
滑性が減少し始め、十分な滑性を有さないものとなる。After being applied by such a method, a film having lubricity is formed by drying at a temperature of 60 to 200° C. for 10 minutes or more. If the drying temperature is lower than 60°C, the solvent will not volatilize sufficiently, so the film strength will be weak, and it will peel off or wear easily. On the other hand, if it is higher than 200°C, the lubricity will start to decrease, and the film will not have sufficient lubricity. It will not have.
上述のような方法により得られた複写機用ガラスは、可
視光線透過率が87%以上(500r+n) 、静摩擦
係数がμs =0.35以下、表面抵抗値が1000
KΩ/口以下となり、帯電防止作用を有し且つ可視光線
透過率の非常に高い複写機用ガラスとなる。The copying machine glass obtained by the method described above has a visible light transmittance of 87% or more (500r+n), a static friction coefficient of μs = 0.35 or less, and a surface resistance value of 1000.
KΩ/unit or less, resulting in copying machine glass that has an antistatic effect and has a very high visible light transmittance.
[実施例] 本発明を実施例により具体的に説明する。[Example] The present invention will be specifically explained with reference to Examples.
実施例I
In(0−n−Bu) 2C1と5n(04t)a C
1をIn/Sn(モル比)= 9515、両アルコキシ
ドの濃度の合計を0.025mol/lになるよう原料
およびイソプロピルアルコールと酢酸−〇−プロピルの
1対1の溶媒を用いて調整し、これを塗布溶液とした。Example I In(0-n-Bu) 2C1 and 5n(04t)a C
1 was adjusted using raw materials and a 1:1 solvent of isopropyl alcohol and 〇-propyl acetate so that In/Sn (molar ratio) = 9515 and the total concentration of both alkoxides was 0.025 mol/l. was used as a coating solution.
次に、塗布用のガラス基板として330 X480 X
4 (mm)のフロート厚板ガラスを中性洗剤および
セリア等で十分洗浄した後、純水で再び洗浄、乾燥して
用いた。Next, a glass substrate of 330 x 480 x
4 (mm) thick float glass was sufficiently washed with a neutral detergent, ceria, etc., and then washed again with pure water and dried before use.
塗布方法は浸漬法を用いて行い、引き上げ速度0.4
cm/seeで引き上げた後、500°Cまで1.5時
間で昇温し、30分間焼成した。その後、この基板を常
温まで自然冷却し、アルコキシシラン[Sill(Me
)(0−Et)2](濃度0.2 mol#! )の溶
液をガーゼにしみこませ後、表面を軽くふくことにより
塗布し、60°Cで20分間乾燥させてサンプルとした
。用いた塗布液の化学式においてで、nBuはn−ブチ
ル基、Etはエチル基、Meはメチル基を表わす。The coating method was performed using a dipping method, and the pulling rate was 0.4.
After pulling it up at a rate of cm/see, the temperature was raised to 500°C over 1.5 hours and baked for 30 minutes. Thereafter, this substrate was naturally cooled to room temperature, and alkoxysilane [Sill(Me)
)(0-Et)2] (concentration 0.2 mol#!) was impregnated into gauze, applied by lightly wiping the surface, and dried at 60°C for 20 minutes to prepare a sample. In the chemical formula of the coating liquid used, nBu represents an n-butyl group, Et represents an ethyl group, and Me represents a methyl group.
可視光線透過率は、島津製作所のUV365を用いて4
80〜7800IIの範囲で測定したが、500nmの
値を代表値として示すと、この場合89.6%であった
。Visible light transmittance is 4 using Shimadzu UV365.
Measurements were made in the range of 80 to 7800 II, and the representative value at 500 nm was 89.6% in this case.
表面抵抗値は、横河−ヒューレットパッカード社製5u
rface Re5istance Meterを用い
て測定したところ、100〜500にΩ/口であった。The surface resistance value is 5u manufactured by Yokogawa-Hewlett-Packard.
When measured using an rface resistance meter, it was 100 to 500 Ω/mouth.
また、静摩擦係数は次のようにして決定した、すなわち
低面が100 X100 (am)で重さ100 g
の分銅を載置した100 X100 (−m)のコピー
紙を複写機用ガラスの上に置き、0.2cm/secの
等速で一端を持ち上げ、分銅がすべりはじめた時の台と
複写機用ガラスの角度θより、静摩擦係数μ5=tan
θを求めた。In addition, the static friction coefficient was determined as follows, i.e., the lower surface is 100 x 100 (am) and the weight is 100 g.
Place a 100 x 100 (-m) copy paper with a weight on it on the copying machine glass, and lift one end at a constant speed of 0.2 cm/sec to separate the stand and the copying machine when the weight starts to slip. From the angle θ of the glass, the static friction coefficient μ5=tan
θ was calculated.
μs =0.05〜0,13であった。本実施例により
得られた複写機用ガラスを市販の複写機にセットし、A
DF装置で10000枚コピーをし、その後テスト前と
同様に可視光線透過率(T)、表面抵抗値(Rs)、静
摩擦係数(μS)を測定したところ、T=89.5〜8
8.9%、Rs=200〜50QKΩ/口、us =O
,07〜0.14とその値もテスト前とほとんど変わら
ず、本実施例により作成した複写機用ガラスが、十分耐
久性のあるものであることが分かった。μs = 0.05 to 0.13. The copying machine glass obtained in this example was set in a commercially available copying machine, and A
After making 10,000 copies with the DF device, we measured the visible light transmittance (T), surface resistance (Rs), and static friction coefficient (μS) in the same manner as before the test, and found that T = 89.5 to 8.
8.9%, Rs=200~50QKΩ/mouth, us=O
, 07 to 0.14, which is almost the same as before the test, indicating that the copying machine glass prepared in this example is sufficiently durable.
実施例2〜4
インジウムおよびスズの塩素含有アルコキシドの組成、
モル比、合計濃度および塗布法を変化させ、実施例1と
同様にしてITO膜をガラス板の上に形成した後滑性膜
形成用の塗布液も変化させ、種々の塗布法により塗布し
た後、乾燥を行い複写機用ガラスとした。これら各実施
例でのそれぞれの塗布液の種々の条件、塗布条件、作成
された複写機用ガラスの物性、耐久性についての結果を
第1表に示す。なお耐久性については、実施例1と同様
のテストを行い、可視光線透過率、表面抵抗値、静摩擦
係数を測定して、その値がほとんど変ねらず使用には支
障ないものをOlそのうちどれかの値が変化して使用に
支障をきたすものを×しして表わした。Examples 2-4 Compositions of indium and tin chlorine-containing alkoxides,
An ITO film was formed on a glass plate in the same manner as in Example 1 by changing the molar ratio, total concentration, and coating method. After coating by various coating methods by changing the coating solution for forming a slippery film. The glass was dried to obtain copying machine glass. Table 1 shows the results of various conditions for each coating liquid in each of these Examples, coating conditions, and physical properties and durability of the glass for a copying machine produced. Regarding durability, we conducted the same test as in Example 1 and measured the visible light transmittance, surface resistance value, and coefficient of static friction, and selected the ones whose values hardly changed and did not pose any problem in use. Items whose values change and cause problems in use are indicated by an x.
参考例1
実施例1で用いたものと同じ板ガラスを用い、その表面
に市販のガラスクリーナーを吹き付け、乾拭きしたもの
の物性を第1表にしめす。Reference Example 1 Using the same plate glass as that used in Example 1, the surface of the glass was sprayed with a commercially available glass cleaner and wiped dry. Table 1 shows the physical properties of the glass.
比較例1〜フ
インジウムおよびスズの塩素含有アルコキシドの組成、
モル比、合計濃度および塗布法を変化させ、実施例1と
同様にしてITO膜をガラス板の上に形成した後滑性膜
形成用の塗布液も変化させ、種々の塗布法により塗布し
た後、乾燥を行い複写機用ガラスとした。これら各実施
例でのそれぞれの塗布液の種々の条件、塗布条件、作成
された複写機用ガラスの物性、耐久性についての結果を
第1表に示す、ただし、比較例7においては、帯電膜形
成の際の焼成温度を300°C130分、比較例8にお
いては、滑性層形成の際の乾燥温度を250°Cで行っ
たものである。Comparative Example 1 ~ Composition of chlorine-containing alkoxide of findium and tin,
An ITO film was formed on a glass plate in the same manner as in Example 1 by changing the molar ratio, total concentration, and coating method. After coating by various coating methods by changing the coating solution for forming a slippery film. The glass was dried to obtain copying machine glass. Table 1 shows the results of the various conditions and coating conditions of each coating liquid in each of these Examples, and the physical properties and durability of the prepared copying machine glass. However, in Comparative Example 7, the charged film The firing temperature during formation was 300°C for 130 minutes, and in Comparative Example 8, the drying temperature during formation of the slippery layer was 250°C.
〔発明の効果]
本発明の複写機用ガラスは、塩素含有アルコキシドを塗
布液として作成したITO組成金属酸化物膜で、可視光
線透過率の優れた帯電防止層であり、該金属酸化物層の
上にメチル基を含む有機けい素化合物の溶液を塗布液と
した薄膜の滑性層が設けられているため、可視光線透過
率、表面抵抗、静摩擦係数のいずれにも優れ、このため
自動給紙の際の帯電を完全に防止できるだけでなく、紙
の滑りを良好とするため、紙詰りを確実に防ぐことがで
きるものである。[Effects of the Invention] The copying machine glass of the present invention is an ITO composition metal oxide film prepared using a chlorine-containing alkoxide as a coating liquid, and is an antistatic layer with excellent visible light transmittance. A thin slippery layer coated with a solution of an organosilicon compound containing methyl groups is provided on top, which has excellent visible light transmittance, surface resistance, and coefficient of static friction, making automatic paper feeding possible. Not only can it completely prevent charging during printing, but it also improves the paper's slippage, thereby reliably preventing paper jams.
Claims (2)
ただし、R_1は炭素数2〜6のアルキル基またはアル
コキシアルキル基を示し、1.8≦x≦2.7)で示さ
れる塩素含有インジウムアルコキシドと、一般式Sn(
OR_2)_yCl_4_−_y(ただし、R_2は炭
素数2〜6のアルキル基またはアルコキシアルキル基を
示し、2.5≦y≦3.8)で示される塩素含有スズア
ルコキシドが、In/Snのモル比で87/13≦In
/Sn≦96/4の割合で混合された濃度0.015〜
0.08mol/lの溶液が塗布された導電層およびメ
チル基を含有する有機けい素化合物の溶液が塗布された
滑性層が順次板ガラスの表面に被覆されてなる複写機用
ガラス。(1) General formula In(OR_1)_xCl_3_-_x(
However, R_1 represents an alkyl group or an alkoxyalkyl group having 2 to 6 carbon atoms, and chlorine-containing indium alkoxide represented by the formula Sn (1.8≦x≦2.7) and the general formula Sn (
OR_2)_yCl_4_-_y (wherein R_2 represents an alkyl group or alkoxyalkyl group having 2 to 6 carbon atoms, and 2.5≦y≦3.8), the chlorine-containing tin alkoxide has an In/Sn molar ratio 87/13≦In
/Sn≦96/4 concentration 0.015~
A glass for a copying machine comprising a plate glass whose surface is sequentially coated with a conductive layer coated with a solution of 0.08 mol/l and a slippery layer coated with a solution of an organosilicon compound containing a methyl group.
xCl_3_−_x(ただし、R_1は炭素数2〜6の
アルキル基またはアルコキシアルキル基を示し、1.8
≦x≦2.7)で示される塩素含有インジウムアルコキ
シドと、一般式Sn(OR_2)_yCl_4_−_y
(ただし、R_2は炭素数2〜6のアルキル基またはア
ルコキシアルキル基を示し、2.5≦y≦3.8)で示
される塩素含有スズアルコキシドが、In/Snのモル
比で87/13≦In/Sn≦96/4の割合で混合さ
れた濃度0.015〜0.08mol/lの溶液を塗布
し、350〜550℃で乾燥、焼成して成膜した後、そ
の表面にメチル基を含有する有機けい素化合物の溶液を
塗布、乾燥することを特徴とする複写機用ガラスの製造
方法。(2) On the surface of the glass substrate, the general formula In(OR_1)_
xCl_3_-_x (where R_1 represents an alkyl group or alkoxyalkyl group having 2 to 6 carbon atoms, and 1.8
≦x≦2.7) and a chlorine-containing indium alkoxide with the general formula Sn(OR_2)_yCl_4_-_y
(However, R_2 represents an alkyl group or alkoxyalkyl group having 2 to 6 carbon atoms, and the chlorine-containing tin alkoxide represented by 2.5≦y≦3.8) has an In/Sn molar ratio of 87/13≦ A solution of In/Sn≦96/4 with a concentration of 0.015 to 0.08 mol/l is applied, dried and fired at 350 to 550°C to form a film, and then methyl groups are added to the surface. 1. A method for producing glass for copying machines, which comprises applying a solution of an organic silicon compound therein and drying the solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30032388A JPH02145459A (en) | 1988-11-28 | 1988-11-28 | Glass for copying machine and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30032388A JPH02145459A (en) | 1988-11-28 | 1988-11-28 | Glass for copying machine and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02145459A true JPH02145459A (en) | 1990-06-04 |
Family
ID=17883394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30032388A Pending JPH02145459A (en) | 1988-11-28 | 1988-11-28 | Glass for copying machine and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02145459A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306478A (en) * | 1994-05-13 | 1995-11-21 | Nippon Sheet Glass Co Ltd | Top plate for copying machine and production thereof |
| DE102009054998A1 (en) | 2009-12-18 | 2011-06-22 | Evonik Degussa GmbH, 45128 | Process for the preparation of indium chlorodialkoxides |
| WO2011073005A2 (en) | 2009-12-18 | 2011-06-23 | Evonik Degussa Gmbh | Method for producing layers containing indium oxide, layers containing indium oxide produced according to said method and the use thereof |
| DE102010043668A1 (en) * | 2010-11-10 | 2012-05-10 | Evonik Degussa Gmbh | Process for producing indium oxide-containing layers, indium oxide-containing layers produced by the process and their use |
-
1988
- 1988-11-28 JP JP30032388A patent/JPH02145459A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306478A (en) * | 1994-05-13 | 1995-11-21 | Nippon Sheet Glass Co Ltd | Top plate for copying machine and production thereof |
| DE102009054998A1 (en) | 2009-12-18 | 2011-06-22 | Evonik Degussa GmbH, 45128 | Process for the preparation of indium chlorodialkoxides |
| WO2011072887A1 (en) | 2009-12-18 | 2011-06-23 | Evonik Degussa Gmbh | Method for producing indium chloride alkoxides |
| WO2011073005A2 (en) | 2009-12-18 | 2011-06-23 | Evonik Degussa Gmbh | Method for producing layers containing indium oxide, layers containing indium oxide produced according to said method and the use thereof |
| KR20120095422A (en) * | 2009-12-18 | 2012-08-28 | 에보니크 데구사 게엠베하 | Method for producing layers containing indium oxide, layers containing indium oxide produced according to said method and the use thereof |
| CN102652137A (en) * | 2009-12-18 | 2012-08-29 | 赢创德固赛有限公司 | Method for producing indium chloride alkoxides |
| JP2013514290A (en) * | 2009-12-18 | 2013-04-25 | エボニック デグサ ゲーエムベーハー | Method for producing indium chloro dialkoxide |
| US8580989B2 (en) | 2009-12-18 | 2013-11-12 | Evonik Degussa Gmbh | Process for the preparation of indium chlordialkoxides |
| CN102652137B (en) * | 2009-12-18 | 2015-12-02 | 赢创德固赛有限公司 | Prepare the method for indium chlorine two alkoxide |
| DE102010043668A1 (en) * | 2010-11-10 | 2012-05-10 | Evonik Degussa Gmbh | Process for producing indium oxide-containing layers, indium oxide-containing layers produced by the process and their use |
| WO2012062575A1 (en) | 2010-11-10 | 2012-05-18 | Evonik Degussa Gmbh | Process for producing indium oxide-containing layers |
| DE102010043668B4 (en) * | 2010-11-10 | 2012-06-21 | Evonik Degussa Gmbh | Process for producing indium oxide-containing layers, indium oxide-containing layers produced by the process and their use |
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