JPH02149105U - - Google Patents

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Publication number
JPH02149105U
JPH02149105U JP5840889U JP5840889U JPH02149105U JP H02149105 U JPH02149105 U JP H02149105U JP 5840889 U JP5840889 U JP 5840889U JP 5840889 U JP5840889 U JP 5840889U JP H02149105 U JPH02149105 U JP H02149105U
Authority
JP
Japan
Prior art keywords
layer
thin film
deposited
magnetic head
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5840889U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5840889U priority Critical patent/JPH02149105U/ja
Publication of JPH02149105U publication Critical patent/JPH02149105U/ja
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第10図は本考案に係り、第1図は
薄膜磁気ヘツドの要部断面図、第2図、第3図、
第4図、第5図、第6図、第7図、第8図及び第
9図は夫々薄膜磁気ヘツドの製造方法を示す断面
図、第10図は他の実施例の薄膜磁気ヘツドの要
部断面図である。第11図は従来の薄膜磁気ヘツ
ドの要部断面図である。 1…基板、2…下部磁性層、3…ギヤツプスペ
ーサ、4a…第1導体コイル層、4b…第2導体
コイル層、5…層間絶縁層、6…上部磁性層、1
0…第1の拡散防止層、11…第2の拡散防止層
1 to 10 relate to the present invention, in which FIG. 1 is a sectional view of the main part of a thin film magnetic head, FIGS. 2 and 3,
4, 5, 6, 7, 8, and 9 are cross-sectional views showing a method for manufacturing a thin film magnetic head, respectively, and FIG. 10 is a schematic diagram of another embodiment of a thin film magnetic head. FIG. FIG. 11 is a sectional view of a main part of a conventional thin film magnetic head. DESCRIPTION OF SYMBOLS 1...Substrate, 2...Lower magnetic layer, 3...Gap spacer, 4a...First conductor coil layer, 4b...Second conductor coil layer, 5...Interlayer insulating layer, 6...Upper magnetic layer, 1
0...First diffusion prevention layer, 11...Second diffusion prevention layer.

Claims (1)

【実用新案登録請求の範囲】 (1) 基板上に強磁性金属材料よりになる下部磁
性層を被着形成し、該下部磁性層上に導体コイル
層、該導体コイル層を覆う非磁性の金属酸化物材
料よりなる層間絶縁層及び磁気キヤツプ形成用の
ギヤツプスペーサを被着形成し、前記層間絶縁上
に強磁性金属材料よりなる上部磁性層を被着形成
してなる薄膜磁気ヘツドにおいて、前記層間絶縁
層を拡散防止層を介して前記下部磁性層上に被着
形成したことを特徴とする薄膜磁気ヘツド。 (2) 基板上に強磁性金属材料よりになる下部磁
性層を被着形成し、該下部磁性層上に導体コイル
層、該導体コイル層を覆う非磁性の金属酸化物材
料よりなる層間絶縁層及び磁気キヤツプ形成用の
ギヤツプスペーサを被着形成し、前記層間絶縁上
に強磁性金属材料よりなる上部磁性層を被着形成
してなる薄膜磁気ヘツドにおいて、前記上部磁性
層を拡散防止層を介して前記層間絶縁層上に被着
形成したことを特徴とする薄膜磁気ヘツド。 (3) 前記拡散防止層Cr,Ti,Ni,W,M
o,NiCr,TiW,TiC,TiN等により
形成したことを特徴とする請求項(1)又は(2)記載
の薄膜磁気ヘツド。 (4) 前記拡散防止層の熱膨張係数が該拡散防止
層と接している前記強磁性金属材料の熱膨張係数
と前記金属酸化物材料の熱膨張係数との間にある
ことを特徴とする請求項(1)又は(2)記載の薄膜磁
気ヘツド。
[Claims for Utility Model Registration] (1) A lower magnetic layer made of a ferromagnetic metal material is deposited on a substrate, a conductor coil layer is placed on the lower magnetic layer, and a non-magnetic metal is used to cover the conductor coil layer. In a thin film magnetic head, an interlayer insulating layer made of an oxide material and a gap spacer for forming a magnetic cap are deposited, and an upper magnetic layer made of a ferromagnetic metal material is deposited on the interlayer insulating layer. 1. A thin film magnetic head, characterized in that a layer is deposited on the lower magnetic layer via a diffusion prevention layer. (2) A lower magnetic layer made of a ferromagnetic metal material is deposited on the substrate, a conductive coil layer is formed on the lower magnetic layer, and an interlayer insulating layer made of a non-magnetic metal oxide material covers the conductive coil layer. and a gap spacer for forming a magnetic cap, and an upper magnetic layer made of a ferromagnetic metal material is deposited on the interlayer insulation. A thin film magnetic head characterized in that the thin film magnetic head is formed on the interlayer insulating layer. (3) The diffusion prevention layer Cr, Ti, Ni, W, M
2. The thin film magnetic head according to claim 1, wherein the thin film magnetic head is made of NiCr, TiW, TiC, TiN, or the like. (4) A claim characterized in that the coefficient of thermal expansion of the diffusion prevention layer is between the coefficient of thermal expansion of the ferromagnetic metal material in contact with the diffusion prevention layer and the coefficient of thermal expansion of the metal oxide material. The thin film magnetic head according to item (1) or (2).
JP5840889U 1989-05-19 1989-05-19 Pending JPH02149105U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5840889U JPH02149105U (en) 1989-05-19 1989-05-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5840889U JPH02149105U (en) 1989-05-19 1989-05-19

Publications (1)

Publication Number Publication Date
JPH02149105U true JPH02149105U (en) 1990-12-19

Family

ID=31583989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5840889U Pending JPH02149105U (en) 1989-05-19 1989-05-19

Country Status (1)

Country Link
JP (1) JPH02149105U (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140510A (en) * 1983-12-28 1985-07-25 Sony Corp Substrate for thin film magnetic head
JPS62145521A (en) * 1985-12-18 1987-06-29 Sony Corp Thin film magnetic head
JPS6331310A (en) * 1986-07-25 1988-02-10 Murata Mfg Co Ltd Lc filter
JPS63175213A (en) * 1987-01-14 1988-07-19 Hitachi Ltd thin film magnetic head

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140510A (en) * 1983-12-28 1985-07-25 Sony Corp Substrate for thin film magnetic head
JPS62145521A (en) * 1985-12-18 1987-06-29 Sony Corp Thin film magnetic head
JPS6331310A (en) * 1986-07-25 1988-02-10 Murata Mfg Co Ltd Lc filter
JPS63175213A (en) * 1987-01-14 1988-07-19 Hitachi Ltd thin film magnetic head

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