JPH02154309A - Production of substrate for thin-film magnetic head - Google Patents
Production of substrate for thin-film magnetic headInfo
- Publication number
- JPH02154309A JPH02154309A JP30937088A JP30937088A JPH02154309A JP H02154309 A JPH02154309 A JP H02154309A JP 30937088 A JP30937088 A JP 30937088A JP 30937088 A JP30937088 A JP 30937088A JP H02154309 A JPH02154309 A JP H02154309A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- insulating film
- magnetic
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 29
- 239000010409 thin film Substances 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000010408 film Substances 0.000 claims abstract description 61
- 239000000725 suspension Substances 0.000 claims abstract description 18
- 239000000843 powder Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims description 5
- 238000005498 polishing Methods 0.000 abstract description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052593 corundum Inorganic materials 0.000 abstract description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000009413 insulation Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 101100055113 Caenorhabditis elegans aho-3 gene Proteins 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 210000003128 head Anatomy 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229940081330 tena Drugs 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、薄膜磁気ヘッド用基板の製造方法に関し、＾
１２０．または５ｉ（ｈからなる絶縁膜を形成した基板
を、ＴｉＯ２、Ｆｅ、０３またはＶ２Ｏ，から選ばれた
１種以上の粉末を含有する懸濁液中に入れ、この懸濁液
中でポリッシャを用いて絶縁膜の表面を研磨することに
より、絶縁膜の表面を、研磨加工歪やスクラッチ等を残
すことなく研磨し、磁気特性の優れた薄膜磁気ヘッドが
得られるようにしたものである。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a method of manufacturing a substrate for a thin film magnetic head.
120. Alternatively, a substrate on which an insulating film made of 5i(h) is formed is placed in a suspension containing one or more powders selected from TiO2, Fe, 03, or V2O, and a polisher is used in this suspension. By polishing the surface of the insulating film, the surface of the insulating film is polished without leaving polishing distortion or scratches, and a thin film magnetic head with excellent magnetic properties can be obtained.
〈従来の技術〉
薄膜磁気ヘッドとしては、面内記録再生用と垂直記録再
生用の２種類が知られているが、何れの場合も焼結体で
なる基板の上に＾１２０．または５ＩＱ２でなる絶ＩＸ
ｉ膜を形成し、この絶縁膜の表面に・磁性膜、導体コイ
ル膜及びコイル層間絶縁膜等を有する磁気回路を形成し
た構造となっている。第１図は特開昭５５−８４０１９
号公報等で知られた面内記録再生用薄膜磁気ヘッドの要
部の断面図である。１は焼結体でなる基板、２は絶縁膜
、３は下部の磁性膜、４はギャップ膜、５は上部の磁性
膜、６は導体コイル膜、７は眉間絶、ａｍ、８は全体を
覆うアルミナ等の保護膜である。磁性膜３及び磁性膜５
の先端部は、微小厚みのギャップ膜４を隔てて対向する
ボール部３１．５１となっており、ポール部３１．５１
において読み書きを行なう。<Prior Art> Two types of thin film magnetic heads are known: one for in-plane recording and reproduction and one for perpendicular recording and reproduction. Or absolute IX with 5IQ2
It has a structure in which an i film is formed, and a magnetic circuit including a magnetic film, a conductive coil film, a coil interlayer insulating film, etc. is formed on the surface of this insulating film. Figure 1 is from Japanese Patent Application Publication No. 55-84019.
1 is a sectional view of a main part of a thin film magnetic head for longitudinal recording/reproduction known from Japanese Patent Publication No. 1 is a substrate made of a sintered body, 2 is an insulating film, 3 is a lower magnetic film, 4 is a gap film, 5 is an upper magnetic film, 6 is a conductive coil film, 7 is a gap between eyebrows, am, 8 is the whole This is a protective film such as alumina that covers the surface. Magnetic film 3 and magnetic film 5
The tip of the ball part 31.51 faces the gap film 4 having a minute thickness, and the pole part 31.51
Read and write.
基板１はＭｎ−Ｚｎ系フェライト、Ｎｉ−Ｚｎ系フェラ
イトまたは＾ｔｔｏｓ−Ｔｉｃ等の焼結体で構成されて
いる。絶縁１１１２は＾１２０．またはｓｔｏ、テナｒ
）、スパッタリング等の手段によって、基板１の表面に
数μ−〜数十μｍ程度の膜厚となるように形成する。絶
縁［２は上述のように薄い膜厚であるので、焼結体でな
る基板１の表面粗度の影響を受けて、その表面粗度が粗
くなる。絶縁膜２の表面には例えば数μｍの膜厚で磁性
１１１３が形成されるので、絶縁膜２の表面粗度が大き
いと、特に高周波領域での磁気特性が悪くなる。これを
回避するため、従来は、磁性膜３を形成する前に、絶縁
膜２の表面をダイヤモンド、パウダー等を用いて機械研
磨していた。The substrate 1 is made of a sintered body such as Mn--Zn ferrite, Ni--Zn ferrite, or Tos-Tic. Insulation 1112 is ^120. or sto, tena r
), is formed on the surface of the substrate 1 by means such as sputtering so as to have a film thickness of several micrometers to several tens of micrometers. Since the insulation [2] has a thin film thickness as described above, it is affected by the surface roughness of the substrate 1 made of a sintered body, and its surface roughness becomes rough. Since the magnetic layer 1113 is formed on the surface of the insulating film 2 with a film thickness of, for example, several micrometers, if the surface roughness of the insulating film 2 is large, the magnetic properties particularly in the high frequency region will deteriorate. To avoid this, conventionally, before forming the magnetic film 3, the surface of the insulating film 2 was mechanically polished using diamond, powder, or the like.
〈発明が解決しようとする課題〉
しかしながら、絶縁ｌｌＩ２の表面をダイヤモンド、パ
ウダ等を用いて機械研磨した場合、絶縁膜２の表、面層
にｉ械加工歪やスクラッチが残り、これらが絶縁膜２の
上に形成される磁性膜３に悪影響を与え、磁気特性が充
分に改善できないという問題点があった。<Problems to be Solved by the Invention> However, when the surface of the insulating film 2 is mechanically polished using diamond, powder, etc., mechanical strain and scratches remain on the surface and surface layer of the insulating film 2, and these There was a problem in that the magnetic film 3 formed on the magnetic film 2 was adversely affected, and the magnetic properties could not be sufficiently improved.
そこで、本発明の課題は、上述する従来の問題点を解決
し、絶縁膜の表面を、研磨加工歪やスクラッチ等を残す
ことなく研磨し、磁気特性の優れた薄膜６１気ヘツドを
提供することである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above-mentioned conventional problems and to provide a thin film head with excellent magnetic properties by polishing the surface of an insulating film without leaving polishing distortion or scratches. It is.
く課題を解決するための手段〉
上述する課題を解決するため、本発明は、焼結体でなる
基板上にＡｌ２Ｏ３またはＳｉｎ、からなる絶縁膜を形
成した後、前記絶縁膜の上に磁性膜を形成する薄膜磁気
ヘッド用基板の製造方法において、前記絶、ｍ１ｌｌ！
を形成した後、＠起磁性膜を形成する前に、前記基板を
ＴｉＯ２、Ｆｅ、０．またはｖ２０．から選ばれた１種
以上の粉末を含有する懸濁液中に入れ、この懸濁液中で
ポリッシャを用いて前記絶縁膜の表面を研磨することを
特徴とする。Means for Solving the Problems> In order to solve the above problems, the present invention forms an insulating film made of Al2O3 or Sin on a substrate made of a sintered body, and then forms a magnetic film on the insulating film. In the method for manufacturing a substrate for a thin film magnetic head, which forms m1ll!
After forming the substrate and before forming the magnetomotive film, the substrate was coated with TiO2, Fe, 0. Or v20. The insulating film is placed in a suspension containing one or more powders selected from the following, and the surface of the insulating film is polished using a polisher in this suspension.
〈作用〉
絶縁ＩＩ！ ２を形成した基板１をＴｉｅ、、Ｆｅ２Ｏ
３またはｖ２０．から選ばれた１種以上の粉末を含有す
る懸濁液中に入れ、この懸濁液中でポリッシャを用いて
絶縁膜２の表面を研磨すると、従来の機械研磨に比較し
て、絶縁膜２に残留する研磨加工歪やスクラッチ等が著
しく小さくできる。従って、このようにして表面研磨し
た絶縁膜２の上に磁性膜３を形成することにより、磁気
特性の改善された薄膜磁気ヘッドを得ることができる。<Function> Insulation II! The substrate 1 on which 2 is formed is Tie, , Fe2O
3 or v20. When the surface of the insulating film 2 is polished using a polisher in the suspension containing one or more powders selected from Polishing distortion and scratches remaining on the surface can be significantly reduced. Therefore, by forming the magnetic film 3 on the insulating film 2 whose surface has been polished in this way, a thin film magnetic head with improved magnetic properties can be obtained.
懸濁液を作る粉末は粒径０．１μｍ以下のものが望まし
い０粒径が０．１μ−を越えると、絶縁膜２の表面に加
工歪が残り易くなると共に、表面粗度も悪化する。It is preferable that the powder for making the suspension has a particle size of 0.1 .mu.m or less.If the particle size exceeds 0.1 .mu.m, processing strain tends to remain on the surface of the insulating film 2, and the surface roughness also deteriorates.
懸濁液は上述の粒径を有する粉末を、純水中に０．５ｗ
ｔ％〜２０ｗｔ％懸濁させて作るｍ Ｏ，５ｗｔ％未
満では研磨効果が小さくなり、研磨作業性が悪くなる。The suspension is made by adding 0.5w of powder with the above particle size to pure water.
If mO, which is prepared by suspending t% to 20wt%, is less than 5wt%, the polishing effect will be small and polishing workability will be poor.
２０豐ｔ％を趙えると、各粉末による水和熱の発生、ゲ
ル化、粘性の増大等を招く不都合がある。If it exceeds 20 t%, there are disadvantages such as generation of heat of hydration, gelation, and increase in viscosity due to each powder.
研磨に当つては、上述のようにして調製された懸濁液を
容器内に入れる。容器内にはポリッシャが回転可能に配
設されている。ポリッシャの材料、回転速度及び荷重圧
力は、粉末の粒径、懸濁量、被加工材の材質等の条件に
応じて選択される。１例として、硬質クロス、ｓｔｏｗ
等の円盤型のものが使用できる。For polishing, the suspension prepared as described above is placed in a container. A polisher is rotatably disposed within the container. The material, rotation speed, and load pressure of the polisher are selected depending on conditions such as the particle size of the powder, the amount of suspension, and the material of the workpiece. As an example, hard cloth, stow
Disc-shaped ones such as can be used.
そして、容器内に、絶縁１１Ｉ２を形成した基板１を入
れ、懸濁液中でポリッシャ及び基板を相対的に回転させ
る。これにより基板１の絶縁膜２の表面にポリッシャ表
面が接触し、絶縁膜の表面が研磨される。Then, the substrate 1 with the insulation 11I2 formed thereon is placed in the container, and the polisher and the substrate are rotated relative to each other in the suspension. As a result, the polisher surface comes into contact with the surface of the insulating film 2 of the substrate 1, and the surface of the insulating film is polished.
本発明は面内記録再生用及び垂直記録再生用の何れの薄
膜磁気ヘッドにも適用できる。The present invention can be applied to both thin film magnetic heads for longitudinal recording and reproduction and for perpendicular recording and reproduction.
〈実施例〉
第１図において、基板１として精密研磨された５０φＸ
４ｔｍｍの＾ｈｏｓ−Ｔｉ（：基板を用い、その表面に
膜厚１５μｌのＡｈＯ３の絶縁ＩＩ［２をスパッタ形成
した。<Example> In Fig. 1, the substrate 1 is a precisely polished 50φX
Using a 4 tmm ^hos-Ti (: substrate), a 15 μl thick AhO 3 insulation II [2 was sputtered on the surface of the substrate.
懸濁液は０．１μ層の粒径のＴｉＯ２粉末を純水中に５
ｗｔ％となるように懸濁させて調製した。The suspension consists of 50% TiO2 powder with a particle size of 0.1μ layer in pure water.
It was prepared by suspending it so that it was wt%.
ポリッシャとして硬質クロスを使用し、０．５にｇ７ｃ
ｍの荷重、４０ ｒｐｍの回転数で、ポリシングを行な
った。Use a hard cloth as a polisher, g7c to 0.5
Polishing was carried out under a load of m and a rotation speed of 40 rpm.
得られた絶縁ＩＮ！２０表面粗さは０．０２μｍ以下で
あった。この絶縁１ｌｉ１の表面に膜厚２．４μｍの磁
性［３を形成した。これをサンプルＡとする。The resulting insulation IN! 20 surface roughness was 0.02 μm or less. A magnetic layer [3] having a thickness of 2.4 μm was formed on the surface of this insulating layer 1li1. This is called sample A.
く比較例〉
実施例と同様の基板１に対し、粒径２μｍのダイヤモン
ドパウダを使用し、ポリッシャとしてＳｎ盤を使用して
ラップ仕上げを行なった。得られた絶縁膜２の表面粗さ
は０．２μｍでありた。この絶縁膜２の表面に膜厚２．
４μｍの磁性膜３を形成した。これをサンプルＢとする
。Comparative Example> A substrate 1 similar to that of the example was lapped using diamond powder with a particle size of 2 μm and an Sn disk as a polisher. The surface roughness of the obtained insulating film 2 was 0.2 μm. The surface of this insulating film 2 has a film thickness of 2.
A magnetic film 3 having a thickness of 4 μm was formed. This is called sample B.
第２図は実施例によって得られたサンプルＡと比較例に
よって得られたサンプルＢの、周波数と透磁率相対値と
の関係を示すデータである。第２図から明らかなように
、本発明に係る製造方法によって得られたサンプルＡは
、従来の製造方法に従って得られたサンプルＢに比べて
、全周波数範囲で（蚤れた磁気特性が得られている。特
に、この種の薄膜磁気ヘッドの実用周波数範囲である５
！１ｌｌｌｚ以上の高周波領域においては、特性が２倍
近く向上している。 Ｔｉ（ｈ粉末に代えて、Ｆｅ２Ｏ
，またはＶ、ら粉末の懸濁液を用いても、同様の結果が
得られた。FIG. 2 shows data showing the relationship between the frequency and the relative magnetic permeability value of Sample A obtained in the Example and Sample B obtained in the Comparative Example. As is clear from FIG. 2, sample A obtained by the manufacturing method according to the present invention has less magnetic properties in the entire frequency range than sample B obtained according to the conventional manufacturing method. In particular, the practical frequency range of this type of thin film magnetic head is 5.
! In the high frequency region of 1llllz or more, the characteristics are improved by nearly twice. Ti(h instead of powder, Fe2O
Similar results were obtained using suspensions of powders such as , or V, et al.
〈発明の効果〉
以上述べたように、本発明に係る薄ＩＩＩ磁気ヘッド用
基板の製造方法は、焼結体でなる基板上にＡｈ（ｈ ま
たはＳｔＯ□からなる絶縁膜を形成した後、絶１４ＷＡ
の表面に磁性膜を形成する前に、基板をＴｉＯ２、Ｆｅ
、０．またはｖ２０．から選ばれた１種以上の粉末を含
有する懸濁液中に入れ、この懸濁液中でポリッシャを用
いて絶縁膜の表面を研磨することを特徴とするから、絶
縁膜の表面を、研磨加工歪やスクラッチ等を残すことな
、く研磨し、磁気特性の優れた薄膜磁気ヘッドを製造で
台る。<Effects of the Invention> As described above, in the method for manufacturing a thin III magnetic head substrate according to the present invention, after forming an insulating film made of Ah (h or StO□) on a substrate made of a sintered body, 14WA
Before forming a magnetic film on the surface of the substrate, TiO2, Fe
,0. Or v20. The method is characterized in that the surface of the insulating film is polished by placing it in a suspension containing one or more types of powder selected from We manufacture thin-film magnetic heads with excellent magnetic properties by polishing without leaving any processing distortion or scratches.
第１図は本発明に係る薄膜磁気ヘッドの要部における断
面図、第２図は実施例によって得られたサンプルＡと比
較例によって得られたサンプルＢの、周波数と透磁率相
対値との関係を示すデータである。
！・・・基板
３・・・磁性膜FIG. 1 is a cross-sectional view of the main part of the thin-film magnetic head according to the present invention, and FIG. 2 is the relationship between frequency and relative magnetic permeability of sample A obtained in the example and sample B obtained in the comparative example. This is data showing. ! ...Substrate 3...Magnetic film
Claims (1)
Ｏ＿２からなる絶縁膜を形成した後、前記絶縁膜の上に
磁性膜を形成する薄膜磁気ヘッド用基板の製造方法にお
いて、前記絶縁膜を形成した後、前記磁性膜を形成する
前に、前記基板をＴｉＯ＿２、Ｆｅ＿２Ｏ＿３またはＶ
＿２Ｏ＿５から選ばれた１種以上の粉末を含有する懸濁
液中に入れ、この懸濁液中でポリッシャを用いて前記絶
縁膜の表面を研磨することを特徴とする薄膜磁気ヘッド
用基板の製造方法。(1) Al_2O_3 or Si on a substrate made of a sintered body
In a method for manufacturing a substrate for a thin film magnetic head, in which a magnetic film is formed on the insulating film after forming an insulating film made of O_2, after forming the insulating film and before forming the magnetic film, TiO_2, Fe_2O_3 or V
Production of a thin film magnetic head substrate, characterized in that the insulating film is placed in a suspension containing one or more powders selected from _2O_5, and the surface of the insulating film is polished in this suspension using a polisher. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30937088A JPH02154309A (en) | 1988-12-07 | 1988-12-07 | Production of substrate for thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30937088A JPH02154309A (en) | 1988-12-07 | 1988-12-07 | Production of substrate for thin-film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02154309A true JPH02154309A (en) | 1990-06-13 |
Family
ID=17992185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30937088A Pending JPH02154309A (en) | 1988-12-07 | 1988-12-07 | Production of substrate for thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02154309A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1006925A3 (en) * | 1993-03-22 | 1995-01-24 | Koninkl Philips Electronics Nv | Method for constructing a thin film magnetic head and magnetic headconstructed according to the method |
| EP0617410A3 (en) * | 1993-03-22 | 1996-12-11 | Koninkl Philips Electronics Nv | Method of manufacturing a thin-film magnetic head, and magnetic head obtainable by means of said method. |
| EP0617409A3 (en) * | 1993-03-22 | 1996-12-27 | Koninkl Philips Electronics Nv | Method of manufacturing a thin-film magnetic head, and magnetic head obtainable by means of said method. |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5924958A (en) * | 1982-07-27 | 1984-02-08 | Sumitomo Special Metals Co Ltd | Accurate polishing method of insulating thin film |
| JPS6266419A (en) * | 1985-09-18 | 1987-03-25 | Sumitomo Special Metals Co Ltd | Substrate for magnetic disk and its production |
-
1988
- 1988-12-07 JP JP30937088A patent/JPH02154309A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5924958A (en) * | 1982-07-27 | 1984-02-08 | Sumitomo Special Metals Co Ltd | Accurate polishing method of insulating thin film |
| JPS6266419A (en) * | 1985-09-18 | 1987-03-25 | Sumitomo Special Metals Co Ltd | Substrate for magnetic disk and its production |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1006925A3 (en) * | 1993-03-22 | 1995-01-24 | Koninkl Philips Electronics Nv | Method for constructing a thin film magnetic head and magnetic headconstructed according to the method |
| EP0617410A3 (en) * | 1993-03-22 | 1996-12-11 | Koninkl Philips Electronics Nv | Method of manufacturing a thin-film magnetic head, and magnetic head obtainable by means of said method. |
| EP0617409A3 (en) * | 1993-03-22 | 1996-12-27 | Koninkl Philips Electronics Nv | Method of manufacturing a thin-film magnetic head, and magnetic head obtainable by means of said method. |
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