JPH0216696B2 - - Google Patents
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- Publication number
- JPH0216696B2 JPH0216696B2 JP58107403A JP10740383A JPH0216696B2 JP H0216696 B2 JPH0216696 B2 JP H0216696B2 JP 58107403 A JP58107403 A JP 58107403A JP 10740383 A JP10740383 A JP 10740383A JP H0216696 B2 JPH0216696 B2 JP H0216696B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- metal
- copper foil
- foil
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Pressure Welding/Diffusion-Bonding (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
【発明の詳細な説明】
本発明は、熱放散性にすぐれた金属箔張り金属
基板の製法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a metal foil-covered metal substrate with excellent heat dissipation properties.
従来からフエノール樹脂・紙系銅張積層板やエ
ポキシ樹脂・ガラスクロス系銅張積層板等の樹脂
系銅張積層板の製造は、Bステージ迄半硬化した
プレプリグと銅箔とを多数重ね合せ、これを多段
プレスに挿入して、加熱加圧し、樹脂を硬化させ
て行つていた。この方法の利点は、1度に多数の
積層基板の製造が出来る点にあるが、欠点は、
予備操作、昇温等の時間が長くかかること、
基板の加熱むらを少なくするための昇温、冷
却等の工程管理が難しいこと、
設備投資が多大となること
であつた。 Traditionally, resin-based copper-clad laminates such as phenolic resin/paper-based copper-clad laminates and epoxy resin/glass cloth-based copper-clad laminates have been manufactured by laminating a large number of semi-cured prepregs and copper foils up to the B stage. This was inserted into a multi-stage press and heated and pressurized to harden the resin. The advantage of this method is that a large number of laminated substrates can be manufactured at one time, but the disadvantages are that it takes a long time for preliminary operations, temperature raising, etc.; Process control such as cooling was difficult, and equipment investment was large.
ところで、パワートランジスタやパワーIC等
の発熱の大きい半導体素子を搭載するハイブリツ
ドIC用基板として、近年、熱伝導性と電気絶縁
性を備えたアルミニウムベース銅張基板が出現
し、一部の用途では、独占的に使用されるに至つ
ている。これらのアルミニウム基板は、接着剤を
塗布した銅箔を、アルミニウム基板に多段プレス
で熱圧着するか、もしくは、Bステージ状に半硬
化したプレプリグをアルミニウム基板の上に静置
し、次に銅箔を置いて多段プレスで熱圧着する方
法により製造されている。しかしながら、アルミ
ニウム基板と銅箔の間に存在する絶縁性の接着層
の厚さが、前述の樹脂系銅張積層板の場合の1/10
〜1/50と薄いために、プレス時に脱ガスを完全に
行なうことが大変難しく、気泡が残存することが
あるため、銅箔の接着強度信頼性および耐電圧信
頼性に難点があつた。 By the way, in recent years, aluminum-based copper-clad substrates with thermal conductivity and electrical insulation properties have appeared as substrates for hybrid ICs on which semiconductor elements that generate a lot of heat, such as power transistors and power ICs, are mounted. It has come to be used exclusively. These aluminum substrates can be made by thermo-compression bonding a copper foil coated with an adhesive to an aluminum substrate using a multi-stage press, or by placing a semi-cured prepreg in a B-stage shape on an aluminum substrate, and then attaching a copper foil to the aluminum substrate. It is manufactured using a method in which the parts are placed and then heat-compressed using a multi-stage press. However, the thickness of the insulating adhesive layer that exists between the aluminum substrate and the copper foil is 1/10 that of the resin-based copper-clad laminate described above.
Because the copper foil is as thin as ~1/50, it is very difficult to completely degas it during pressing, and bubbles may remain, which poses problems in the reliability of the adhesive strength and withstand voltage of the copper foil.
本発明者らは、このような操作的に大変難し
く、また設備投資の多大となる多段プレスを用い
ない金属箔張り金属基板の製法について鋭意検討
した結果、多段プレスよりも簡単な操作で、かつ
接着強度信頼性のある金属箔張り金属基板の製法
を発明するに至つた。 The inventors of the present invention have conducted intensive studies on a method for producing metal foil-covered metal substrates that does not use a multi-stage press, which is extremely difficult to operate and requires a large amount of equipment investment. We have invented a method for manufacturing metal foil-clad metal substrates with reliable adhesive strength.
すなわち本発明は、金属板の少なくとも一主面
上にエポキシ系樹脂組成物の絶縁層を形成し、前
記絶縁層と金属箔とを加熱ロール間で加圧すると
ともに前記絶縁層を溶融しながら前記金属箔を前
記絶縁層に仮接着して金属箔張り金属基板とな
し、次いで該金属箔張り金属基板を再度加熱処理
して前記絶縁層を後硬化させる金属箔張り金属基
板の製法であつて、
前記金属板に形成する前記エポキシ系樹脂組成
物の絶縁層が少なくとも二層となし、しかも金属
板にエポキシ系樹脂組成物を塗布した後加熱硬化
させて一層目の絶縁層を形成し、次いで二層目の
絶縁層を形成する際に、前記一層目の絶縁層の硬
化させるための時間より前記二層目の絶縁層の硬
化させるための加熱時間を短かくし、硬化度合を
異ならせることを特徴とする金属箔張り金属基板
の製法である。 That is, in the present invention, an insulating layer of an epoxy resin composition is formed on at least one main surface of a metal plate, and the insulating layer and metal foil are pressed between heating rolls and the metal is melted while the insulating layer is melted. A method for producing a metal foil-covered metal substrate in which a foil is temporarily bonded to the insulating layer to form a metal foil-covered metal substrate, and then the metal foil-covered metal substrate is heat-treated again to post-cure the insulating layer, the method comprising: The insulating layer of the epoxy resin composition formed on the metal plate is at least two layers, and the epoxy resin composition is applied to the metal plate and then heated and cured to form the first insulating layer, and then the second insulating layer is formed. When forming the second insulating layer, the heating time for curing the second insulating layer is shorter than the time for curing the first insulating layer, and the degree of curing is varied. This is a method for manufacturing metal foil-covered metal substrates.
以下図面により本発明を詳細に説明する。 The present invention will be explained in detail below with reference to the drawings.
第1図は、本発明の加熱ロール部分の概略断面
図であり、第2図は、金属箔張り金属基板を挿入
した概略断面図である。第1図は、本発明に用い
ることのできる加熱ロール部分であり、符号1及
び6は、ラミネートする材料を移送時に支持する
台(支持台)である。2,3,4及び5は、ロー
ルであり、該ロール2,3,4及び5は、油圧等
で圧力がかけられる構造になつている。ロールの
中では少なくともロール2には、ヒーターが入つ
ており、その表面は、シリコンゴムの様な耐熱性
ゴムから成つており、ラミネート時の脱ガスを容
易にしている。ロール3,4及び5は、ロール2
とまつたく同じ仕様であつてもよいが、金属製ロ
ールでも可能である。 FIG. 1 is a schematic sectional view of a heating roll portion of the present invention, and FIG. 2 is a schematic sectional view of a heated roll portion in which a metal foil-covered metal substrate is inserted. FIG. 1 shows a heating roll part that can be used in the present invention, and reference numerals 1 and 6 are stands (support stands) that support the materials to be laminated during transfer. 2, 3, 4, and 5 are rolls, and the rolls 2, 3, 4, and 5 are constructed to be pressurized by hydraulic pressure or the like. Among the rolls, at least roll 2 is equipped with a heater, and its surface is made of heat-resistant rubber such as silicone rubber to facilitate degassing during lamination. Rolls 3, 4 and 5 are roll 2
The specifications may be exactly the same, but metal rolls are also possible.
金属箔張り金属基板(以下基板という)の製造
に際しては、まず絶縁層8を金属基板9上に形成
し、その上に金属箔7を静置し、第1図の加熱ロ
ールに通す。その結果、第2図に示すように、絶
縁層8の表面層は、ロール2のヒーターによる熱
で溶融すると共にロール2と3の圧力で金属箔7
に矢印の方向へ脱ガスを伴ないながら、次々と圧
着される。基板は、更にロール4と5で再加圧下
加熱もしくは冷却され仮接着される。この仮接着
された基板は、更に加熱して後硬化させる。この
後硬化には、通常の送風乾燥機や遠赤外乾燥機等
が用いられるが、加熱プレスする方法でも可能で
ある。 When manufacturing a metal foil-covered metal substrate (hereinafter referred to as a substrate), an insulating layer 8 is first formed on a metal substrate 9, a metal foil 7 is placed on top of the insulating layer 8, and the layer is passed through a heating roll as shown in FIG. As a result, as shown in FIG. 2, the surface layer of the insulating layer 8 is melted by the heat generated by the heater of the roll 2, and the metal foil 7 is melted by the pressure of the rolls 2 and 3.
They are crimped one after another in the direction of the arrow with degassing. The substrates are further heated or cooled under pressure again with rolls 4 and 5 to be temporarily bonded. This temporarily bonded substrate is further heated and post-cured. For this post-curing, a normal blow dryer, far-infrared dryer, etc. are used, but a method of hot pressing is also possible.
本発明の金属基板としては、アルミニウムおよ
びその合金、鉄、鉄−ニツケル合金、ステンレ
ス、等が用いられるが、アルマイト処理したアル
ミニウム板でも何ら支障はない。 As the metal substrate of the present invention, aluminum and its alloys, iron, iron-nickel alloy, stainless steel, etc. are used, but an aluminum plate treated with alumite may be used without any problem.
次に金属箔としては、銅箔、アルミニウム箔、
アルミニウム箔と銅箔とをクラツドした箔、銅箔
に異種の金属をメツキした箔等が使用できる。金
属箔の厚みは、5μ〜200μが適当である。 Next, as metal foil, copper foil, aluminum foil,
Foils made by cladding aluminum foil and copper foil, foils made by plating copper foil with different metals, etc. can be used. The appropriate thickness of the metal foil is 5μ to 200μ.
本発明による基板製造に用いる金属箔は、枚葉
状、ロール状のいづれでも良く特に、後者の場合
は、連続製造が可能である。 The metal foil used for manufacturing the substrate according to the present invention may be either sheet-shaped or rolled, and in particular, in the latter case, continuous production is possible.
次に、本発明に用いる金属基板上の絶縁層は、
加熱により溶融するBステージ状のプリプレグや
フイラー入りエポキシ樹脂等のエポキシ系樹脂組
成物が良く、少なくとも2度に分けて塗布する方
が、耐電圧の点から好ましい。更にこの絶縁層
は、硬化度合の異なることが、耐電圧の点から好
ましい。 Next, the insulating layer on the metal substrate used in the present invention is
Epoxy resin compositions such as B-stage prepregs and filler-containing epoxy resins that melt when heated are preferable, and it is preferable to apply them at least twice in terms of withstand voltage. Furthermore, it is preferable that the insulating layers have different degrees of hardening from the viewpoint of withstand voltage.
又、本発明のラミネートの条件としては、絶縁
層の溶解、仮接着の状態によつても異なるが、ロ
ール温度は、50〜200℃、ロール速度0.5〜10m/
分、ロール圧着力は、1〜10Kg/cm2の範囲が好ま
しく、この範囲以外では、金属基板への金属箔の
仮接着の状態及び生産性が低下する。又、その後
の金属箔張り金属基板の後硬化については、一般
に乾燥器中で、20℃〜200℃、で温度との関係に
より24時間から10分まで、絶縁層硬化剤の状態に
より硬化時間を選択する必要がある。 In addition, the laminating conditions of the present invention vary depending on the melting of the insulating layer and the state of temporary adhesion, but the roll temperature is 50 to 200°C, and the roll speed is 0.5 to 10 m/min.
The roll pressure force is preferably in the range of 1 to 10 Kg/cm 2 . Outside this range, the state of temporary adhesion of the metal foil to the metal substrate and productivity will deteriorate. In addition, for the subsequent post-curing of the metal foil-covered metal substrate, the curing time is generally 24 hours to 10 minutes depending on the temperature at 20°C to 200°C in a dryer, depending on the condition of the insulating layer curing agent. You need to choose.
以下、実施例により更に本発明を説明する。 The present invention will be further explained below with reference to Examples.
実施例 1
1.5mmのアルミニウム板上に硬化剤を含んだフ
イラー入りエポキシ樹脂を、スプレーガンで約
40μの厚さになる様に塗装した。次いでこれをア
ルミニウム板上で80℃、90分で硬化させ、次に同
様にして更に40μの絶縁層を塗布した。この絶縁
層付きアルミニウム板を80℃、30分硬化させ、第
1図に示す構造を有するロール直径15cmの加熱ロ
ールで35μの枚葉状の銅箔をラミネートした。ロ
ール2と3は、150℃に加熱してあり、ロール4
と5は加熱してない条件である。アルミニウム板
送りスピードは1.0m/分であり、ロール2と4
には、2Kg/cm2の圧力がかけられている。Example 1 A filler-containing epoxy resin containing a hardening agent was applied onto a 1.5 mm aluminum plate using a spray gun.
It was painted to a thickness of 40μ. This was then cured on an aluminum plate at 80° C. for 90 minutes, and then an additional 40 μm insulating layer was applied in the same manner. This aluminum plate with an insulating layer was cured at 80° C. for 30 minutes, and a sheet of 35 μm copper foil was laminated with a heating roll having a roll diameter of 15 cm having the structure shown in FIG. Rolls 2 and 3 are heated to 150℃, and roll 4
and 5 are conditions without heating. The aluminum plate feeding speed is 1.0m/min, and rolls 2 and 4
A pressure of 2Kg/cm 2 is applied to the
次に、この操作で出来上つた銅箔張りアルミニ
ウム基板は送風乾燥機で140℃、3時間後硬化さ
せた。得られた銅箔張りアルミニウム基板の剥離
強度は、2.0Kg/cm2であり、半田バス300℃、30分
の浸漬テストにおいても銅箔のふくれは、みられ
なかつた。この熱処理後の銅箔張りアルミニウム
基板は、耐電圧を測定したところ2KV以上であ
つた。 Next, the copper foil-covered aluminum substrate produced by this operation was cured at 140° C. for 3 hours in a blower dryer. The peel strength of the resulting copper foil-covered aluminum substrate was 2.0 Kg/cm 2 , and no blistering of the copper foil was observed even in a 30-minute immersion test at 300° C. in a solder bath. After this heat treatment, the withstand voltage of the copper foil-clad aluminum substrate was measured to be 2 KV or more.
実施例 2
実施例1と同様にアルミニウム板上に2つの異
なる硬化度合を有するフイラー入りエポキシ樹脂
絶縁層を形成し更にその上に30μの絶縁層を形成
し、80℃、20分硬化後、第1図の2,3,4,5
のすべてのロールを100℃に加熱した状態で基板
送りスピード1.5m/分で枚葉状35μ銅箔をラミネ
ートした。ただしロール4及び5を通加した基板
は、冷風により冷却され10分以内に室温になつ
た。Example 2 Similar to Example 1, filler-containing epoxy resin insulating layers having two different degrees of hardening were formed on an aluminum plate, and a 30 μm insulating layer was further formed thereon, and after curing at 80°C for 20 minutes, the 2, 3, 4, 5 in Figure 1
A sheet of 35 μm copper foil was laminated at a board feeding speed of 1.5 m/min with all rolls heated to 100°C. However, the substrates to which rolls 4 and 5 were applied were cooled by cold air and reached room temperature within 10 minutes.
この操作で出来上つた銅箔張りアルミニウム基
板を実施例1と同じ条件で後硬化した。得られた
銅箔張りアルミニウム基板の剥離強度は、2.2Kg/
cm2であり、実施例1と同じく、300℃、30分の半
田バス浸漬テストにおいても銅箔のふくれは生じ
なかつた。この熱処理後の銅箔張りアルミニウム
基板は、耐電圧を測定したところ3KV以上であ
つた。 The copper foil-clad aluminum substrate produced by this operation was post-cured under the same conditions as in Example 1. The peel strength of the copper foil-covered aluminum substrate obtained was 2.2Kg/
cm 2 , and as in Example 1, no blistering of the copper foil occurred even in the solder bath immersion test at 300° C. for 30 minutes. After this heat treatment, the copper foil-covered aluminum substrate had a withstand voltage of 3 KV or more when measured.
実施例 3
実施例2と同じ、異なつた硬化度合を有する3
層から成る絶縁層を塗布した30cm角のアルミニウ
ム板を、実施例2と同じ加熱ロール条件で、ロー
ル状35μ銅箔を用いてラミネートした。冷却は、
実施例2と同様に行い、銅箔を切断後、実施例1
と同じ条件で後硬化した。得られた銅箔張りアル
ミニウム基板の剥離強度は、1.9Kg/cmであり、
300℃、30分の半田バス浸漬テストにおいても銅
箔のふくれは生じなかつた。この熱処理後の銅箔
張りアルミニウム基板は、耐電圧を測定したとこ
ろ、3KV以上であつた。Example 3 Same as example 2, but with different degree of hardening 3
A 30 cm square aluminum plate coated with an insulating layer consisting of layers was laminated using rolled 35μ copper foil under the same heated roll conditions as in Example 2. The cooling is
After cutting the copper foil in the same manner as in Example 2, Example 1
It was post-cured under the same conditions. The peel strength of the copper foil-clad aluminum substrate obtained was 1.9 Kg/cm.
Even in a solder bath immersion test at 300°C for 30 minutes, no blistering occurred in the copper foil. After this heat treatment, the withstand voltage of the copper foil-clad aluminum substrate was measured and was 3 KV or more.
比較例 1
実施例1と同じ絶縁層付アルミニウム板上に
35μ銅箔を静置し、100゜に加熱したプレス機には
さみ、加圧下30分放置した後、温度を150℃に上
げ2時間加熱して銅張基板を製造した。銅箔張り
アルミニウム基板の剥離強度を測定したところ、
大部分は、2.0Kg/cmあつたが部分的に1.4Kg/cmを
示す場合があり、銅箔と絶縁層の間に気泡が混入
している可能性があつた。この銅箔張りアルミニ
ウム基板を300℃、30分の半田バス浸漬テストに
かけたところ、数分で部分的な銅箔のふくれがみ
られ、最終的には直径5cmの銅箔ふくれが認めら
れた。更に熱処理を行なわない銅箔張りアルミニ
ウム基板は、耐電圧を測定したところ0.5KV以下
であつた。Comparative example 1 On the same aluminum plate with insulating layer as in Example 1
The 35μ copper foil was left standing, placed in a press heated to 100°, left under pressure for 30 minutes, and then raised to 150°C and heated for 2 hours to produce a copper-clad board. When we measured the peel strength of a copper foil-clad aluminum substrate, we found that
In most cases, the temperature was 2.0Kg/cm, but in some areas it was 1.4Kg/cm, indicating that there was a possibility that air bubbles were mixed in between the copper foil and the insulating layer. When this copper foil-covered aluminum board was subjected to a solder bath immersion test at 300°C for 30 minutes, partial blistering of the copper foil was observed within a few minutes, and ultimately a 5cm diameter copper foil blister was observed. Furthermore, when the withstand voltage of the copper foil-clad aluminum substrate without heat treatment was measured, it was 0.5 KV or less.
比較例 2
実施例1と同様の操作により80μの絶縁層を1.5
mm板厚のアルミニウム板上に塗装した。この絶縁
層付アルミニウム基板を80℃、30分硬化させ、実
施例1と同じラミネート条件、および硬化条件で
操作を行ない、35μ銅箔張りアルミニウム基板を
製造した。得られた銅箔張りアルミニウム基板の
剥離強度は1.9Kg/cmであり、半田バス300℃、30
分の浸漬において部分的にふくれが生じた。この
熱処理後の銅箔張りアルミニウム基板は、耐電圧
を測定したところ1.0KV以下であつた。熱処理前
の該基板をエツチングし、銅箔を除去したとこ
ろ、部分的に絶縁層に欠陥があつた。Comparative Example 2 An 80 μ insulating layer was formed by 1.5 μm by the same operation as in Example 1.
Painted on an aluminum plate with a thickness of mm. This aluminum substrate with an insulating layer was cured at 80° C. for 30 minutes, and operations were performed under the same laminating and curing conditions as in Example 1 to produce a 35μ copper foil-clad aluminum substrate. The peel strength of the copper foil-covered aluminum board obtained was 1.9 Kg/cm, and the peel strength was 1.9 kg/cm.
Partial blistering occurred after soaking for a minute. After this heat treatment, the withstand voltage of the copper foil-clad aluminum substrate was measured and was 1.0 KV or less. When the substrate before heat treatment was etched and the copper foil was removed, defects were found in some parts of the insulating layer.
第1図は、本発明の加熱ロール部分の概略断面
図、第2図は、金属箔張り金属基板を挿入した概
略断面図を示す。
符号 1,6…支持台、2,3,4,5…ロー
ル、7…金属箔、8…絶縁層、9…金属基板。
FIG. 1 is a schematic sectional view of a heating roll portion of the present invention, and FIG. 2 is a schematic sectional view of a heated roll portion in which a metal foil-covered metal substrate is inserted. Symbols 1, 6...Support stand, 2, 3, 4, 5...Roll, 7...Metal foil, 8...Insulating layer, 9...Metal substrate.
Claims (1)
脂組成物の絶縁層を形成し、前記絶縁層と金属箔
とを加熱ロール間で加圧するとともに前記絶縁層
を溶融しながら前記金属箔を前記絶縁層に仮接着
して金属箔張り金属基板となし、次いで該金属箔
張り金属基板を再度加熱処理して前記絶縁層を後
硬化させる金属箔張り金属基板の製法であつて、 前記金属板に形成する前記エポキシ系樹脂組成
物の絶縁層が少なくとも二層となし、しかも金属
板にエポキシ系樹脂組成物を塗布した後加熱硬化
させて一層目の絶縁層を形成し、次いで二層目の
絶縁層を形成する際に、前記一層目の絶縁層の硬
化させるための加熱時間より前記二層目の絶縁層
の硬化させるための加熱時間を短かくし、硬化度
合を異ならせることを特徴とする金属箔張り金属
基板の製法。[Scope of Claims] 1. An insulating layer of an epoxy resin composition is formed on at least one principal surface of a metal plate, and the insulating layer and metal foil are pressed between heating rolls while melting the insulating layer. A method for producing a metal foil-covered metal substrate, wherein the metal foil is temporarily bonded to the insulating layer to form a metal foil-covered metal substrate, and then the metal foil-covered metal substrate is heat-treated again to post-cure the insulating layer. , the insulating layer of the epoxy resin composition formed on the metal plate is at least two layers, and the epoxy resin composition is applied to the metal plate and cured by heating to form the first insulating layer; When forming the second insulating layer, the heating time for curing the second insulating layer is shorter than the heating time for curing the first insulating layer, and the degree of curing is varied. A method for manufacturing a metal foil-covered metal substrate characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10740383A JPS59232845A (en) | 1983-06-15 | 1983-06-15 | Manufacture of metallic foil lined metallic substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10740383A JPS59232845A (en) | 1983-06-15 | 1983-06-15 | Manufacture of metallic foil lined metallic substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59232845A JPS59232845A (en) | 1984-12-27 |
| JPH0216696B2 true JPH0216696B2 (en) | 1990-04-18 |
Family
ID=14458258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10740383A Granted JPS59232845A (en) | 1983-06-15 | 1983-06-15 | Manufacture of metallic foil lined metallic substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59232845A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1088072A (en) * | 1996-09-11 | 1998-04-07 | Toyo Seimitsu Kogyo Kk | A metal sheet temporary fixing sheet for facilitating automated supply and a method for producing the same. |
| EP3122571B2 (en) * | 2014-03-24 | 2024-09-04 | MGI Digital Technology | Gilding method and system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59167248A (en) * | 1983-03-14 | 1984-09-20 | 松下電器産業株式会社 | Method of forming metal laminate |
-
1983
- 1983-06-15 JP JP10740383A patent/JPS59232845A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59232845A (en) | 1984-12-27 |
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