JPH02170406A - Polypropylene film for vapor deposition for capacitor - Google Patents

Polypropylene film for vapor deposition for capacitor

Info

Publication number
JPH02170406A
JPH02170406A JP32388688A JP32388688A JPH02170406A JP H02170406 A JPH02170406 A JP H02170406A JP 32388688 A JP32388688 A JP 32388688A JP 32388688 A JP32388688 A JP 32388688A JP H02170406 A JPH02170406 A JP H02170406A
Authority
JP
Japan
Prior art keywords
film
vapor deposition
polypropylene film
additive
cooling roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32388688A
Other languages
Japanese (ja)
Other versions
JP2663594B2 (en
Inventor
Isamu Moriguchi
勇 森口
Kazuichi Yuuki
結城 万市
Keiji Shibayama
柴山 桂二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP32388688A priority Critical patent/JP2663594B2/en
Publication of JPH02170406A publication Critical patent/JPH02170406A/en
Application granted granted Critical
Publication of JP2663594B2 publication Critical patent/JP2663594B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PURPOSE:To obtain a film for a capacitor excellent in vapor deposition processability, containing less deposits and minimizing the sliding friction with a cooling roll, by a method wherein the static coefficient of friction between a Cr-plated metallic sheet and a non-vapor-deposited surface after metallic vapor deposition on one surface of a polypropylene film as well as the content of an additive are specified. CONSTITUTION:The title film is made of a PP resin comprising II (isotactic index) exceeding 96% with specific additive added thereto. The state of separation on a cooling roll depends upon the additive. The melting point of the additive shall not exceed 130 deg.C while the content thereof shall be selected not to exceed 4000wt.ppm. As for the additive, tetrakis [methylene-3(3,5-di-tertiary- butyl-4-hydroxyphenyl) propionate)methane, etc., are applicable. Finally, Al or the like is evaporated on one surface of the film and then the coefficient of friction between non-evaporated surface and a Cr-plated metallic sheet at 80 deg.C is selected not to exceed 0.8 to minimize the sliding friction with the cooling roll.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、コンデンサ用蒸着用ポリプロピレンフィルム
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a polypropylene film for vapor deposition for capacitors.

〔従来の技術〕[Conventional technology]

ポリプロピレンフィルムは、その優れた特性から広く工
業材料として用いられている。最近では、市場要求の変
化や各種改良に伴い、ポリプロピレンフィルムに金属を
蒸着して用いる用途が急増している。中でもコンデンサ
用は、従来の金属箔と巻回するものに比べ、小型化でき
、自己回復性を付与できるなどの理由から、蒸着化の移
行が顕著である。このため、従来に加え、良好な蒸着加
工性が要求されるようになった。
Polypropylene film is widely used as an industrial material due to its excellent properties. Recently, with changes in market demands and various improvements, applications in which metals are vapor-deposited on polypropylene films are rapidly increasing. Among these, for capacitors, there has been a remarkable shift towards vapor deposition because it can be made smaller and has self-healing properties compared to conventional ones that are wound with metal foil. For this reason, in addition to the conventional method, good vapor deposition processability is now required.

しかしながら、ポリプロピレンフィルムは、ポリエステ
ルフィルムやポリイミドフィルムに比べ、腰が弱い、熱
に対する寸法安定性に劣るなど、蒸着加工に適していな
い。このため、蒸着加工の際に張力や冷却温度などの加
工条件を微調整しながら加工しているのが実態である。
However, polypropylene film is not suitable for vapor deposition processing because it is weaker and has poorer dimensional stability against heat than polyester film or polyimide film. For this reason, the actual situation is that processing conditions such as tension and cooling temperature are finely adjusted during vapor deposition processing.

このとき、適性条件を外すと、熱負け、シワ、濃淡ムラ
など種々の蒸着欠点を引き起こし、加工収率の低下を招
くことになる。
At this time, if the appropriate conditions are not met, various deposition defects such as heat loss, wrinkles, uneven density, etc. will occur, leading to a decrease in processing yield.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

即ち、ポリプロピレンフィルムの蒸着加工におけるポイ
ントは、いかに蒸着源に対向する冷却ロールにポリプロ
ピレンフィルムを歪みなく密着させ(このことをFit
性という)、全面の冷却効果を−にげるかにある。
In other words, the key point in the vapor deposition process of polypropylene film is how to bring the polypropylene film into close contact with the cooling roll facing the vapor deposition source without distortion.
This is because it has a cooling effect on the entire surface.

しかしながら、張力条件を追求しても、ポリプロピレン
フィルムと冷却ロールのすべりが悪いため充分な密着が
得られない、ポリプロピレンフィルムからの析出物が冷
却ロール上に堆積して冷却効果を著しく低下させるなど
の欠点があった。
However, even if the tension conditions are optimized, sufficient adhesion cannot be obtained due to poor slippage between the polypropylene film and the cooling roll, and precipitates from the polypropylene film accumulate on the cooling roll, significantly reducing the cooling effect. There were drawbacks.

本発明は、かかる課題に鑑み、冷却ロールとのすべりが
良く、析出物の少ない蒸着加工性に優れたポリプロピレ
ンフィルムを提供せんとするものである。
In view of these problems, the present invention aims to provide a polypropylene film that has good sliding properties with a cooling roll, has few precipitates, and has excellent vapor deposition processability.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のコンデンサ用蒸着用ポリプロピレンフィルムは
、ポリプロピレンフィルムの一方の面に金属蒸着を施し
た後の非蒸着面とクロムメッキを施した金属板との80
℃における静摩擦係数が0゜8以下であって、かつ融点
が130℃以下の添加剤の含有量が4000重量ppm
以下であることを特徴とする。
The polypropylene film for vapor deposition for capacitors of the present invention has an 80% bond between the non-evaporated surface and the chrome-plated metal plate after metal vapor deposition is performed on one side of the polypropylene film.
The content of additives with a static friction coefficient of 0°C or lower and a melting point of 130°C or lower is 4000 ppm by weight
It is characterized by the following:

この静摩擦係数が0.8を越えると冷却ロール上でフィ
ルムがすべらず、張力をかけてもFitせず、部分的に
冷却ロールからフィルムが浮き上がり、皺や濃淡むらを
引き起し易くなり不適当である。好ましくは0.7以下
であり、さらに好ましくは0.6以下である。
If this coefficient of static friction exceeds 0.8, the film will not slide on the cooling roll, will not fit even when tension is applied, and the film will partially lift off the cooling roll, easily causing wrinkles and uneven shading, making it unsuitable. It is. It is preferably 0.7 or less, more preferably 0.6 or less.

また、冷却ロール上の析出物状態は、ポリプロピレンフ
ィルム中の添加物によって左右され、コンデンサ用の場
合、融点が130℃以下の添加剤の含有量が4000重
量ppmを越えると、析出物による冷却効果の低下が著
しく、蒸着時にフィルムが受ける熱量が増大し、熱負け
などの欠点を発生させ、不適当である。好ましくは30
00重量ppm以下であり、さらに好ましくは2000
重量ppm以下である。
In addition, the state of precipitates on the cooling roll is influenced by the additives in the polypropylene film, and in the case of capacitors, if the content of additives with a melting point of 130°C or less exceeds 4000 ppm by weight, the cooling effect of the precipitates will be affected. The film is unsuitable because it significantly reduces the amount of heat it receives during vapor deposition and causes defects such as heat loss. Preferably 30
00 ppm by weight or less, more preferably 2000 ppm or less
It is less than ppm by weight.

ここで、融点が130℃以下の添加剤としては、テトラ
キス[メチレン−3(3,5−ジ−ターシャクー−ブチ
ル−4ハイドロキシフエニル)プロピオネートコメタン
、2.2’ −メチレン−ビス(4−メチル−6−ター
ジヤリーープチルーフエノール、η−オクタデシルー3
−(4’ −ハイドロキシ−3’、5’ −ジ−ターシ
ャリ−ブチルフェニル)プロピオネート、2. 2−チ
オ[ジエチル−ビス−3(3’ −5−ジ−ターシャリ
−ブチル−4−ハイドロキシフェニル)プロピオネート
]などを例示することができる。
Here, examples of additives having a melting point of 130°C or lower include tetrakis[methylene-3(3,5-di-tert-butyl-4-hydroxyphenyl)propionate comethane, 2,2'-methylene-bis( 4-Methyl-6-tertiary petityl phenol, η-octadecyl-3
-(4'-hydroxy-3',5'-di-tert-butylphenyl)propionate, 2. Examples include 2-thio[diethyl-bis-3(3'-5-di-tert-butyl-4-hydroxyphenyl)propionate].

本発明のポリプロピレンフィルムの長さ方向のF−10
0値は、特に限定されるものではないが、加工張力で伸
ばされない程度の腰の強さをもっという点で10kg/
mm2以上である方が好ましい。
F-10 in the longitudinal direction of the polypropylene film of the present invention
A value of 0 is not particularly limited, but it is 10 kg/
It is more preferable that it is more than mm2.

また本発明のポリプロピレンフィルムの製法は、特に限
定されるものではなく、通常の延伸法によるものでよく
、二軸延伸が好ましいが、−軸延伸によるものであって
もかまわない。もちろん、インフレーション法、テンタ
ー法であってもかまわない。
The method for producing the polypropylene film of the present invention is not particularly limited, and may be any ordinary stretching method, preferably biaxial stretching, but -axial stretching may also be used. Of course, the inflation method or the tenter method may also be used.

さらに、本発明のポリプロピレンフィルムに使用するポ
リマーは、ホモポリマー以外に、プロピレンと他のα−
オレフィン(例えばエチレン、ブテンなど)の共重合体
であっても、ポリプロピレンと他のα−オレフィン重合
体(例えばポリエチレン、ポリブテンなど)とのブレン
ド品であってもかまわない。
Furthermore, in addition to the homopolymer, the polymer used in the polypropylene film of the present invention includes propylene and other α-
It may be a copolymer of olefins (eg, ethylene, butene, etc.) or a blend of polypropylene and other α-olefin polymers (eg, polyethylene, polybutene, etc.).

次に、本発明のポリプロピレンフィルムの製造法の一例
を説明する。但し、以下の製造法に限定されるものでは
ない。
Next, an example of the method for producing the polypropylene film of the present invention will be explained. However, the manufacturing method is not limited to the following.

テトラキス[メチレン−3(3,5−ジ−ターシャクー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンを添加したII(アイソタクチックインデックス
)96%以上のポリプロピレン樹脂を190〜280℃
の温度で溶融し、スリットを施したTダイよりシート状
に押出し、30〜95℃のチルロールで冷却固化する。
A polypropylene resin with II (isotactic index) of 96% or more to which tetrakis[methylene-3(3,5-di-tert-butyl-4-hydroxyphenyl)propionate comethane was added] was heated at 190 to 280°C.
The material is melted at a temperature of 1, extruded into a sheet through a T-die with slits, and cooled and solidified with a chill roll at 30 to 95°C.

次に、120〜160℃の温度で長さ方向に3〜7倍延
伸し、次いで145〜165℃の温度で11方向に5〜
12倍に延伸し、さらに150〜165℃の温度で熱処
理する。その後、蒸着を施す面に濡れ張力が35〜47
 d y n e / c mとなるようコロナ放電処
理などの表面処理を施し、ワインダーで巻取る。
Next, it is stretched 3 to 7 times in the length direction at a temperature of 120 to 160 °C, and then 5 to 7 times in 11 directions at a temperature of 145 to 165 °C.
It is stretched 12 times and further heat-treated at a temperature of 150 to 165°C. After that, the wetting tension on the surface to be vapor-deposited is 35 to 47
It is subjected to surface treatment such as corona discharge treatment so that it has a dyn e / cm, and then wound up with a winder.

ここで、高温、例えば80℃における金属板との摩擦係
数は、ポリプロピレンフィルムの性状と次のように関係
する。金属板と接する面の表面粗さが小さい程、金属板
との接する面の濡れ張力が高い程、低融点添加剤量が多
い程、摩擦係数が大きくなる。
Here, the coefficient of friction with the metal plate at a high temperature, for example 80° C., is related to the properties of the polypropylene film as follows. The smaller the surface roughness of the surface in contact with the metal plate, the higher the wetting tension of the surface in contact with the metal plate, and the greater the amount of the low melting point additive, the larger the friction coefficient becomes.

尚、本発明のポリプロピレンフィルムを蒸着するにあた
っては、蒸着金属を限定するものではないが、アルミニ
ウム(AI)、亜鉛(Zn)、あるいはそれらの混合や
合金に好適である。
Incidentally, when depositing the polypropylene film of the present invention, the metal to be deposited is not limited, but aluminum (AI), zinc (Zn), or a mixture or alloy thereof is suitable.

また、蒸着面は片面であっても、両面であってもかまわ
ない。
Moreover, the vapor deposition surface may be one side or both sides.

次に、本発明に用いた測定法および評価法について説明
する。
Next, the measurement method and evaluation method used in the present invention will be explained.

(1)80℃における非蒸着面と金属板の静摩擦係数 長さ方向にtoomm、巾方向に75mmの長方形のフ
ィルム試料を採取する。次に、金属蒸着を目的とした面
にAIを20〜40nmの厚さに蒸着をする。次に、該
蒸着フィルムをクロム(Cr)メツキを施した金属熱板
に非蒸着面が接するようにセットする。この試料の上に
200gの荷重を長さ方向に65mm、巾方向に63m
m長方面積にかかるように置(。その後、熱板を80℃
に昇温し、長さ方向に150mm/分の速度で蒸着フィ
ルムを引張り、その最大静止抵抗値(g)を読み取り、
次式にて求める。
(1) Static friction coefficient between non-evaporated surface and metal plate at 80°C A rectangular film sample measuring toomm in the length direction and 75mm in the width direction is taken. Next, AI is deposited to a thickness of 20 to 40 nm on the surface intended for metal deposition. Next, the vapor-deposited film is set so that the non-vapor-deposited surface is in contact with a metal hot plate plated with chromium (Cr). A load of 200g was placed on this sample at a distance of 65mm in the length direction and 63m in the width direction.
Place it so that it covers a rectangular area of
The temperature was raised to
Calculate using the following formula.

静摩擦係数=最大静止抵抗値/200 上式中、分母の200は荷重(g)である。Static friction coefficient = maximum static resistance value / 200 In the above formula, 200 in the denominator is the load (g).

また、測定数は3とし、その平均値を求める。Further, the number of measurements is 3, and the average value is calculated.

(2)添加剤の定量 フィルムを5mmX5mm以下の小片にカットし、8g
を採取する。次に、この試料を65℃、50m1のクロ
ロホルムで90分間抽出した後、この液を吸引濾過し、
さらにクロロホルムで洗浄しながら吸引濾過し、その後
クロロホルムを回収し、抽出物を乾固する。次に、この
抽出物をメタノールで、100m1になるよう希釈する
。この液から2mlを採取し、液体クロマトグラフ(島
原製作所製「島原高速液体クロマトグラフLC4A形」
および[クロマトパックC−R2A (X)」)にて分
析し、あらかじめ求めておいた検量線にて、濃度(mg
/ml)を求める。こうして求めた濃度から、次式によ
り含有率を求める。
(2) Quantitative amount of additive Cut the film into small pieces of 5 mm x 5 mm or less, and 8 g
Collect. Next, this sample was extracted with 50ml of chloroform at 65°C for 90 minutes, and the liquid was filtered with suction.
Further, suction filtration is carried out while washing with chloroform, and then the chloroform is recovered, and the extract is dried. Next, this extract is diluted with methanol to a volume of 100 ml. Collect 2 ml of this liquid and use a liquid chromatograph (Shimabara High Performance Liquid Chromatograph LC4A type manufactured by Shimabara Manufacturing Co., Ltd.).
The concentration (mg
/ml). From the concentration determined in this way, the content rate is determined by the following formula.

上式中、分子の100はメタノール溶液の容量(ml)
、分母の8000は試料の重it(mg)である。
In the above formula, 100 in the molecule is the volume (ml) of the methanol solution.
, 8000 in the denominator is the weight it (mg) of the sample.

〔実施例〕〔Example〕

次に、本発明の実施例に基づき説明する。 Next, an explanation will be given based on examples of the present invention.

実施例1 テトラキス[メチレン−3(3,5−ジ−ターシャリー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンを500ppm添加したll97%のプロピレン
ホモポリマーを260°Cの押出機に供給し、スリット
を施したTダイより押出し、80℃のチルロールで冷却
固化した後、長さ方向に135℃の温度で4.5倍に延
伸し、次いで巾方向に160℃の温度で8倍に延伸し、
さらに160℃の温度で熱処理した。次に、フィルムの
片面に、濡れ張力が39 d y n e / c m
になるようにコロナ放電処理を施し、ワインダーで巻取
った。このときのフィルム厚みは、8μmであった。
Example 1 A 97% propylene homopolymer with 500 ppm of tetrakis[methylene-3(3,5-di-tert-butyl-4-hydroxyphenyl)propionate comethane added was fed to an extruder at 260°C, It was extruded through a T-die with slits, cooled and solidified with a chill roll at 80°C, then stretched 4.5 times in the length direction at a temperature of 135°C, and then stretched 8 times in the width direction at a temperature of 160°C. ,
Further, heat treatment was performed at a temperature of 160°C. Then, on one side of the film, a wet tension of 39 dyne/cm
It was subjected to corona discharge treatment so that The film thickness at this time was 8 μm.

次ニコノフィルムを630mm巾、25000m長さに
スリットし、蒸着加工性を評価した。
Next, the Nikono film was slit to a width of 630 mm and a length of 25,000 m, and the vapor deposition processability was evaluated.

蒸着加工は、ULVAC製630mm巾、Al仕様の蒸
着機を用いて、A1膜厚25nm、搬送速度250m/
分、巻出張力4kg、巻取張力4kg、冷却ロール冷媒
温度−15°Cの条件で実施し、次の基準で蒸着加工性
を判定した。
The vapor deposition process was performed using a ULVAC 630 mm width, Al specification vapor deposition machine, with an A1 film thickness of 25 nm and a conveyance speed of 250 m/min.
The test was carried out under the following conditions: unwinding force of 4 kg, winding tension of 4 kg, and cooling roll refrigerant temperature of -15°C, and the vapor deposition processability was determined based on the following criteria.

(1)蒸着膜の濃淡むら ◎:全く濃淡むらなし。(1) Uneven density of deposited film ◎: No unevenness in density at all.

01部分的に濃淡むらあるも、実用可。01 Although there are some uneven shading, it can be used for practical purposes.

×二全面に濃淡むらがあり、実用不可。×2 There are uneven shading on the entire surface, making it unusable.

(2)熱負け ◎・全くなし。(2) Loss of heat ◎・None at all.

○:熱負けはあるが軽微であり、実用可。○: There is heat loss, but it is minor and can be used for practical purposes.

×:熱負けがひどく、実用不可。×: Severe heat loss, impractical.

(3)皺 蒸着を終えたフィルムを巾方向に100mm巾に6分割
、長さ方向に5000m長さに5分割し、計30リール
を合否判定し、その不良リール数で次のように判定した
(3) The film after wrinkle deposition was divided into six 100mm widths in the width direction and five 5000m lengths in the length direction, and a total of 30 reels were judged pass/fail, and the number of defective reels was judged as follows. .

◎:不良リール数 1本以下 ○:不良リール数 2〜4本 ×:不良リール数 5本以上 結果を第1表に示す。◎: Number of defective reels: 1 or less ○: Number of defective reels: 2 to 4 ×: Number of defective reels: 5 or more The results are shown in Table 1.

実施例2 テトラキス[メチレン−3(3,5−ジ−ターシャジー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンの添加量を3500ppmとした以外は、実施例
1に同じ。結果を第1表に示す。
Example 2 Same as Example 1 except that the amount of tetrakis[methylene-3(3,5-di-tertiary-butyl-4-hydroxyphenyl)propionate comethane added was 3500 ppm. The results are shown in Table 1.

実施例3 テトラキス[メチレン−3(3,5−ジ−ターシャジー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンの代りに、1,3.5トリメチル−2,4,6−
トリス(3,5−ジ−ターシャクー−ブチル−4ハイド
ロキシベンジル)ベンゼン(融点244°C)を500
0ppm添加した以外は、実施例1と同じ。結果を第1
表に示す。
Example 3 Tetrakis[methylene-3(3,5-di-tertiary-butyl-4-hydroxyphenyl)propionate instead of comethane, 1,3.5trimethyl-2,4,6-
Tris(3,5-ditershacou-butyl-4-hydroxybenzyl)benzene (melting point 244°C) at 500°C
Same as Example 1 except that 0 ppm was added. Results first
Shown in the table.

実施例4 1.3.5トリメチル−2,4,6−)リス(3,5−
ジ−ターシャクー−ブチル−4ハイドロキシベンジル)
ベンゼンの添加量を2000ppmとした以外は、実施
例1と同じ。結果を第1表に示す。
Example 4 1.3.5 trimethyl-2,4,6-)lis(3,5-
di-tershaku-butyl-4-hydroxybenzyl)
Same as Example 1 except that the amount of benzene added was 2000 ppm. The results are shown in Table 1.

比較例1 テトラキス[メチレン−3(3,5−ジ−ターシャジー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンの添加量を5000ppmとした以外は、実施例
1と同じ。結果を第1表に示す。
Comparative Example 1 Same as Example 1 except that the amount of tetrakis[methylene-3(3,5-di-tertiary-butyl-4-hydroxyphenyl)propionate comethane added was 5000 ppm. The results are shown in Table 1.

比較例2 チルロールの温度を30℃として、冷却固化した以外は
、実施例2と同じ。結果を第1表に示す。
Comparative Example 2 Same as Example 2 except that the temperature of the chill roll was 30° C. and the material was cooled and solidified. The results are shown in Table 1.

比較例3 ポリプロピレンフィルムの両面に、濡れ張力が43 d
 y n e / c mとなるようコロナ放電処理し
た以外は、実施例1に同じ。結果を第1表に示す。
Comparative Example 3 Wetting tension was 43 d on both sides of polypropylene film.
Same as Example 1 except that corona discharge treatment was performed so that yne/cm. The results are shown in Table 1.

比較例4 テトラキス[メチレン−3(3,5−ジ−ターシャジー
−ブチル−4ハイドロキシフエニル)プロピオネートコ
メタンの添加量を6000ppmとし、濡れ張力を35
dyne/cmとした以外は、実施例1と同じ。結果を
第1表に示す。
Comparative Example 4 Tetrakis[methylene-3(3,5-di-tertiary-butyl-4-hydroxyphenyl)propionate The amount of comethane added was 6000 ppm, and the wetting tension was 35
Same as Example 1 except that dyne/cm was used. The results are shown in Table 1.

〔発明の効果〕〔Effect of the invention〕

本発明のポリプロピレンフィルムは、蒸着加工において
、濃淡むら、熱負け、皺の3欠点が発生し難く、高い加
工収率で蒸着フィルムコンデンサを得ることができる。
The polypropylene film of the present invention is less likely to suffer from the three defects of uneven density, heat loss, and wrinkles during vapor deposition processing, and a vapor-deposited film capacitor can be obtained with a high processing yield.

Claims (1)

【特許請求の範囲】[Claims] (1)ポリプロピレンフィルムの一方の面に金属蒸着を
施した後の非蒸着面とクロムメッキを施した金属板との
80℃における静摩擦係数が0.8以下であって、かつ
融点が130℃以下の添加剤の含有量が4000重量p
pm以下であることを特徴とするコンデンサ用蒸着用ポ
リプロピレンフィルム。
(1) The coefficient of static friction at 80°C between the non-evaporated surface after metal vapor deposition on one side of the polypropylene film and the chrome plated metal plate is 0.8 or less, and the melting point is 130°C or less The content of additives is 4000 p by weight.
1. A polypropylene film for vapor deposition for capacitors, characterized in that the film is pm or less.
JP32388688A 1988-12-22 1988-12-22 Polypropylene film for capacitor evaporation Expired - Fee Related JP2663594B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32388688A JP2663594B2 (en) 1988-12-22 1988-12-22 Polypropylene film for capacitor evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32388688A JP2663594B2 (en) 1988-12-22 1988-12-22 Polypropylene film for capacitor evaporation

Publications (2)

Publication Number Publication Date
JPH02170406A true JPH02170406A (en) 1990-07-02
JP2663594B2 JP2663594B2 (en) 1997-10-15

Family

ID=18159701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32388688A Expired - Fee Related JP2663594B2 (en) 1988-12-22 1988-12-22 Polypropylene film for capacitor evaporation

Country Status (1)

Country Link
JP (1) JP2663594B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405920B2 (en) 2003-03-19 2008-07-29 Toray Industries, Inc. Flat type capacitor-use polypropylene film and flat type capacitor using it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405920B2 (en) 2003-03-19 2008-07-29 Toray Industries, Inc. Flat type capacitor-use polypropylene film and flat type capacitor using it

Also Published As

Publication number Publication date
JP2663594B2 (en) 1997-10-15

Similar Documents

Publication Publication Date Title
US4997700A (en) Biaxially oriented polypropylene film for metallizing applications
KR101117537B1 (en) Polypropylene film for flat capacitors and flat capacitors
JP3737858B2 (en) Polyolefin-based unstretched film and vapor-deposited unstretched film using the same
JP2001106804A (en) Polypropylene film for double-sided deposition
JP2663594B2 (en) Polypropylene film for capacitor evaporation
JP2990803B2 (en) Polypropylene film for double-sided deposition
JPH0349952A (en) Polypropylene composite film and metal vapor deposition polypropylene composite film
WO2022138531A1 (en) Polypropylene film, laminate, packaging material, and packing body
JPH01223144A (en) Polypropylene film for double vacuum deposition
KR960013069B1 (en) Polyphenylene sulfide film, process for its production, and process for subjecting the film to vacuum deposition
JP2003257777A (en) Polypropylene film for capacitors and capacitors
JPH11129414A (en) Matte antistatic film
JP2002234958A (en) Polypropylene film for double-sided vapor deposition and capacitor using the same
JP3460295B2 (en) Heat and moisture resistant vapor deposition film
JPH01259160A (en) Plastic film
JPH11302403A (en) Barrier film and its preparation
JP4254289B2 (en) Laminated polypropylene film and fusing sealed package comprising the same
JPH09270361A (en) Polyolefin film for capacitor and capacitor made of the same
HK1007294B (en) Polyphenylene sulfide film, process for its production, and process for subjecting the film to vacuum deposition
JPH0373409A (en) Metal thin film type magnetic recording medium
JPH06105672B2 (en) Metal evaporated film and capacitor
JPH0383636A (en) Polypropylene film for metallizing both sides
US20130004733A1 (en) Method to reduce metal pick-off from edges of metallized biaxially oriented films
JP2003011255A (en) Functional membrane and manufacturing method thereof
JPS62265335A (en) Polypropylene film

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees