JPH02181700A - Electron beam projector - Google Patents

Electron beam projector

Info

Publication number
JPH02181700A
JPH02181700A JP105389A JP105389A JPH02181700A JP H02181700 A JPH02181700 A JP H02181700A JP 105389 A JP105389 A JP 105389A JP 105389 A JP105389 A JP 105389A JP H02181700 A JPH02181700 A JP H02181700A
Authority
JP
Japan
Prior art keywords
electron beam
ozone
beam irradiation
thin film
metal thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP105389A
Other languages
Japanese (ja)
Inventor
Hisamichi Ishioka
石岡 久道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP105389A priority Critical patent/JPH02181700A/en
Publication of JPH02181700A publication Critical patent/JPH02181700A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prevent the leakage of ozone without enlarging and complicating the entire part of the device by building adsorbents which adsorb the ozone generated in an electron beam projection space by the electron beam transmitted through a thin metallic film into the electron beam projection space. CONSTITUTION:An object 7 to be irradiated moves form the left to the right in the electron beam projection space 18 and the generated ozone moves together with the object 7 and is liable to leak to the outside from a drawing out port on the right side; therefore, the adsorbents 9 are arrayed continuously to the right side from the thin metallic film 11 up to the drawing out port on the front surface side of the object to be irradiated. The concn. of the ozone in the electron beam projection space is lowered inexpensively without enlarging and complicating the entire part of the device in this way and the leakage of the ozone in the electron beam projection space is prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、電線ケーフル絶縁被膜の架欄、飲料容器の
殺菌等に用いられるもので、金属薄膜1こより閉鎖され
た窓枠を有する真空容器内で電子を発生させるとともに
この電子を電界で加速して前記金属薄膜を透過させ、前
記金属薄膜の外側に該金属薄膜を壁面の一部として画成
された電子線照射空間内の被照射物に照射する電子線照
射装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] This invention is used for sterilization of electric cable cable insulating coatings, beverage containers, etc., and is a vacuum container having a window frame closed by a single thin metal film. An object to be irradiated in an electron beam irradiation space defined outside the metal thin film with the metal thin film as part of the wall surface, by generating electrons within the space and accelerating the electrons with an electric field to transmit the metal thin film. The present invention relates to an electron beam irradiation device for irradiating.

〔従来の技術〕[Conventional technology]

第3図にこの種電子線照射装置の従来の構成例を示す。 FIG. 3 shows an example of a conventional configuration of this type of electron beam irradiation device.

金属薄m11により閉鎖された窓枠1aを有する接地電
位の真空容器1内には、図示されない大気側の′電源か
ら負の高電圧が印加されるカソード2電極面が前記窓枠
la側へ向けて配され、一方、窓枠1aのカソード2側
には負に課電されるグリッド3が配されるとともにこの
グリッド3と金属薄膜11との間の空間にはプラズマ原
料ガスが導入され、この空間に配された図示されないワ
イヤ電極に大気側から電圧を印加してプラズマ4が形成
される。このプラズマ中のイオンはグリッド3により真
空容器1内へ引き出されカソード2により加速されてカ
ソード2に衝突し、カソード2から2次電子を放出させ
る。この放出された2次電子はカソード2の負電位によ
り窓枠1a方向へ加速され、グリッド3を通り、プラズ
マ4を通過して金属薄膜11を透過し、大気中を横ぎり
、この金属薄膜11を壁面の一部とする電子線照射空間
8内を移動する被照射物7を照射し、被照射物に架橋1
重合、殺菌などの処理を施す。金属薄膜11は真空容器
1円の真空を保ちつる厚みを持ちかつ電子を透過させる
機能を有するもので、例ψ えば純アル箔が用いられる。電子線照射空間8には排気
ダクト12が設けられ、電子線照射空間8内のオゾンを
含む空気を排出することにより、電子線照射時に電子線
照射空間8内に発生するオゾンの濃度を低く抑え、オゾ
ンの電子線処理禁止作用や、図示されない被照射物の駆
動部9回転部等の腐蝕作用などを抑制するようにしてい
る。また、電子線照射空間8内に発生するオゾンは金属
薄膜11の表面を酸化してその寿命を短くするため、第
2図に示されるように、金属薄膜2またとえば純アルミ
箔の電子線照射空間8側表面に耐酸性膜2またとえばチ
タンあるいは窒化チタンの膜を形成するなどの対策が提
案されている(特開昭61−178700号公報参照)
In a vacuum vessel 1 at ground potential and having a window frame 1a closed by a thin metal m11, a cathode 2 electrode surface to which a negative high voltage is applied from a power source on the atmosphere side (not shown) is directed toward the window frame la. On the other hand, a negatively charged grid 3 is arranged on the cathode 2 side of the window frame 1a, and a plasma raw material gas is introduced into the space between the grid 3 and the metal thin film 11. Plasma 4 is formed by applying a voltage from the atmosphere to a wire electrode (not shown) placed in the space. Ions in the plasma are drawn into the vacuum chamber 1 by the grid 3, accelerated by the cathode 2, collide with the cathode 2, and cause the cathode 2 to emit secondary electrons. The emitted secondary electrons are accelerated toward the window frame 1a by the negative potential of the cathode 2, pass through the grid 3, pass through the plasma 4, pass through the metal thin film 11, cross the atmosphere, and pass through the metal thin film 11. An irradiated object 7 moving in an electron beam irradiation space 8 having a part of the wall surface is irradiated, and a bridge 1
Perform treatments such as polymerization and sterilization. The metal thin film 11 has a thickness that maintains the vacuum of one circle of the vacuum container, and has a function of transmitting electrons. For example, pure aluminum foil is used. An exhaust duct 12 is provided in the electron beam irradiation space 8, and by exhausting air containing ozone in the electron beam irradiation space 8, the concentration of ozone generated in the electron beam irradiation space 8 during electron beam irradiation is kept low. , the effect of ozone inhibiting electron beam processing, and the effect of corroding the rotating parts of the drive unit 9 of the object to be irradiated (not shown) are suppressed. Further, since ozone generated in the electron beam irradiation space 8 oxidizes the surface of the metal thin film 11 and shortens its life, as shown in FIG. Countermeasures have been proposed, such as forming an acid-resistant film 2 on the surface of the space 8, such as a film of titanium or titanium nitride (see Japanese Patent Laid-Open No. 178700/1983).
.

〔発明が解決しようとする詠題〕[The problem that the invention attempts to solve]

オゾンの害を抑制するためにこのように構成される電子
線照射装置においても、なお次のような点が問題点とし
て考えられる。すなわち、排気ダクトを用いてオゾンを
排出する装置では、装置全体が大形化し複雑となる。ま
た、金属薄@表面への耐酸性膜の形成は、耐酸性膜を大
面積(例えば数+α角)の金属薄膜表面に均一に蒸着す
る必要から膜形成のためのコストが高くなり、しかも耐
酸性膜の形成だけでは、金属薄膜の酸化は防止されても
、こんどは、発生した8人体に有害なオゾンが電子線照
射空間から被照射物の挿入口あるいは引出し口の隙間を
通って外部へ洩れ出すため、照射中は人が装置に近づく
ことができないという問題がある。そこで、排気ダクト
を含む排気装置と耐酸性膜を形成した金属薄膜とを併用
すればオゾンの害は大幅(こ低減されるが、装置が大形
化しかつ高価となる。
Even in an electron beam irradiation device configured in this way to suppress the harm caused by ozone, the following points can still be considered as problems. That is, in a device that exhausts ozone using an exhaust duct, the entire device becomes large and complicated. In addition, forming an acid-resistant film on a thin metal surface increases the cost of film formation because it is necessary to uniformly deposit the acid-resistant film on a large area (for example, several + α angle) of the thin metal film surface. Even if the oxidation of the metal thin film is prevented by the formation of a chemical film alone, the generated ozone, which is harmful to the human body, will pass from the electron beam irradiation space to the outside through the gap between the insertion or extraction port of the irradiated object. Due to leakage, there is a problem in that people cannot get close to the device during irradiation. Therefore, if an exhaust system including an exhaust duct is used in combination with a metal thin film coated with an acid-resistant film, the harm caused by ozone can be significantly reduced, but the system becomes large and expensive.

この発明の目的は、前述のごとき従来装置の問題点に鑑
み、装置を大形化することなく安価に電子線照射空間内
のオゾン濃度を抑制するとともに電子線照射空間外部へ
のオゾンの洩れを実質的に防止しうる電子線照射装置を
提供することである。
In view of the problems of the conventional device as described above, the purpose of this invention is to suppress the ozone concentration in the electron beam irradiation space at low cost without increasing the size of the device, and to prevent ozone leakage to the outside of the electron beam irradiation space. An object of the present invention is to provide an electron beam irradiation device that can substantially prevent the above.

〔課題を解決するための手段〕[Means to solve the problem]

上記課題を解決するために、この発明においては、金属
薄膜により閉鎖された窓枠を有する真空容器内で電子を
発生させるとともにこの電子を電界で加速して前記金属
薄膜を透過させ、前記金属薄膜の外側に該金属薄膜を壁
面の一部として画成された電子線照射空間内の被照射物
に照射する電子線照射装置において、#J記金属薄喚を
透過する電子線により前記電子線照射空間内に生ずるオ
ゾンを吸着する吸着剤を該電子線照射空間内に内蔵させ
るものとする。
In order to solve the above problems, in the present invention, electrons are generated in a vacuum container having a window frame closed by a metal thin film, and the electrons are accelerated by an electric field to pass through the metal thin film. In an electron beam irradiation device that irradiates an object in an electron beam irradiation space defined with the metal thin film as part of the wall surface on the outside of the An adsorbent that adsorbs ozone generated in the space is built into the electron beam irradiation space.

〔作用〕[Effect]

電子線照射空間内に内蔵させる吸着剤としては、身近な
ものとして、冷蔵庫の脱臭剤やたばこのフィルタなどに
含まれる活性炭がある。活性炭は気体の吸着作用が強く
、かつ多孔性のため吸着表面積が太き(、大量の気体を
吸着することができる。
Activated carbon, which is found in refrigerator deodorizers and cigarette filters, is a familiar adsorbent that is built into the electron beam irradiation space. Activated carbon has a strong gas adsorption effect and is porous, so it has a large adsorption surface area (and can adsorb a large amount of gas).

従って、このような吸着剤を電子線照射空間内に電子線
量に見合って適当量、適宜の位置に内蔵させることによ
り、電子線照射空間内のオゾン濃度が低く保たれ、かつ
外部へのオゾンの洩れも実質的に防止することが可能と
なり、前述のような。
Therefore, by incorporating such an adsorbent in an appropriate amount and position in the electron beam irradiation space in accordance with the electron beam dose, the ozone concentration in the electron beam irradiation space can be kept low and the ozone to the outside can be prevented. Leakage can also be substantially prevented, as mentioned above.

電子線照射空間内におけるオゾンの害の抑制や。Suppression of ozone damage in the electron beam irradiation space.

電子線照射中の装置への人の接近が安価に可能となる。It becomes possible for people to approach the device during electron beam irradiation at low cost.

〔実施例〕〔Example〕

第1図に本発明の一実施例を示す。図中、第3図と同一
の部材には同一符号を付し、説明を省略する。電子線照
射空間18内゛には、被照射物7が左から右へ移動して
おり、発生したオゾンは被照射物7とともに移動して右
方の引出し口から外部へもれ易いから、吸着剤9は金属
薄[11より右側にかつ被照射物の上面側に引出し口ま
で連続して並べられている。なお、本実施例の構成に加
え、さらに電子線照射空間の被照射物の挿入口と引出し
口とに、被照射物との隙間をさらに小さくするアダプタ
を設けるようにすれば、オゾンの洩れ防止番と対し、さ
らに確実な効果を得ることができる。
FIG. 1 shows an embodiment of the present invention. In the figure, the same members as in FIG. 3 are designated by the same reference numerals, and their explanations will be omitted. Inside the electron beam irradiation space 18, the irradiated object 7 moves from left to right, and the generated ozone moves with the irradiated object 7 and easily leaks to the outside from the right drawer opening. The agent 9 is continuously arranged on the right side of the metal thin film 11 and on the upper surface of the object to be irradiated up to the outlet. In addition to the configuration of this embodiment, if adapters are provided at the insertion and extraction ports of the irradiated object in the electron beam irradiation space to further reduce the gap between the irradiated object and the irradiated object, ozone leakage can be prevented. You can get even more reliable effects with this method.

〔発明の効果〕〔Effect of the invention〕

以上に述べたように、この発明によれば、金属薄膜によ
り閉鎖された窓枠を有する真空容器内で電子を発生させ
るとともにこの電子を電界で加速して前記金属薄膜を透
過させ、前記金属薄膜の外側に該金属薄膜を壁面の一部
として画成された電子線照射空間内の被照射物に照射す
る電子線照射装置において、前記金属薄膜を透過する電
子線により前記電子線照射空間内に生ずるオゾンを吸着
する吸着剤を該電子線照射空間内に内蔵させたので、装
置全体を大形、複雑化することなく、かつ安価に、電子
線照射空間内のオゾン濃度を低減するとともに電子線照
射空間外部へのオゾンの洩れを防止することができ、電
子線が透過する大面積金属薄膜への高価な耐酸住換形成
を行うことなく金属薄膜の寿命が延長され、同時に、電
子線照射空間外部での人体への危険性がなくなり、電子
線照射中でも装置に近づくことができるようになる。
As described above, according to the present invention, electrons are generated in a vacuum container having a window frame closed by a metal thin film, and the electrons are accelerated by an electric field to pass through the metal thin film. In an electron beam irradiation device that irradiates an object to be irradiated in an electron beam irradiation space defined as a part of the wall surface with the metal thin film on the outside of the metal thin film, an electron beam transmitted through the metal thin film is used to irradiate the object in the electron beam irradiation space. Since an adsorbent that adsorbs the generated ozone is built into the electron beam irradiation space, the ozone concentration in the electron beam irradiation space can be reduced and the electron beam Ozone leakage to the outside of the irradiation space can be prevented, the life of the metal thin film can be extended without the need for expensive acid-resistant migration formation on large-area metal thin films through which electron beams can pass, and at the same time There is no danger to the human body outside, and it becomes possible to approach the equipment even during electron beam irradiation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す電子線照射装置の全体
断面図、第2図は従来の金属薄膜の酸化防止手段の一例
を示す断面図、第3図は従来の電子線照射teaの構成
例を示す全体断面図である。 1・・・真空容器、1a・・・窓枠、2・・・カソード
、6・・・電子線、7・・・被照射物、8,18・・・
電子線照射空間、9・・・吸着剤、10・・・オゾン、
11.21・・・金属薄膜。
FIG. 1 is an overall sectional view of an electron beam irradiation device showing an embodiment of the present invention, FIG. 2 is a sectional view showing an example of a conventional means for preventing oxidation of a metal thin film, and FIG. FIG. 2 is an overall sectional view showing a configuration example. DESCRIPTION OF SYMBOLS 1... Vacuum container, 1a... Window frame, 2... Cathode, 6... Electron beam, 7... Irradiated object, 8, 18...
Electron beam irradiation space, 9...adsorbent, 10...ozone,
11.21...Metal thin film.

Claims (1)

【特許請求の範囲】[Claims] 1)金属薄膜により閉鎖された窓枠を有する真空容器内
で電子を発生させるとともにこの電子を電界で加速して
前記金属薄膜を透過させ、前記金属薄膜の外側に該金属
薄膜を壁面の一部として画成された電子線照射空間内の
被照射物に照射する電子線照射装置において、前記金属
薄膜を透過する電子線により前記電子線照射空間内に生
ずるオゾンを吸着する吸着剤を該電子線照射空間内に内
蔵させたことを特徴とする電子線照射装置。
1) Electrons are generated in a vacuum container having a window frame closed by a metal thin film, and the electrons are accelerated by an electric field to pass through the metal thin film, and the metal thin film is placed on a part of the wall surface outside the metal thin film. In an electron beam irradiation device that irradiates an object to be irradiated in an electron beam irradiation space defined as An electron beam irradiation device characterized by being built into an irradiation space.
JP105389A 1989-01-06 1989-01-06 Electron beam projector Pending JPH02181700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP105389A JPH02181700A (en) 1989-01-06 1989-01-06 Electron beam projector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP105389A JPH02181700A (en) 1989-01-06 1989-01-06 Electron beam projector

Publications (1)

Publication Number Publication Date
JPH02181700A true JPH02181700A (en) 1990-07-16

Family

ID=11490804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP105389A Pending JPH02181700A (en) 1989-01-06 1989-01-06 Electron beam projector

Country Status (1)

Country Link
JP (1) JPH02181700A (en)

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