JPH02185374A - Synthetic grindstone - Google Patents
Synthetic grindstoneInfo
- Publication number
- JPH02185374A JPH02185374A JP738489A JP738489A JPH02185374A JP H02185374 A JPH02185374 A JP H02185374A JP 738489 A JP738489 A JP 738489A JP 738489 A JP738489 A JP 738489A JP H02185374 A JPH02185374 A JP H02185374A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- grindstone
- abrasive grain
- water
- matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 239000011347 resin Substances 0.000 claims abstract description 22
- 239000011159 matrix material Substances 0.000 claims abstract description 17
- 150000005846 sugar alcohols Polymers 0.000 claims abstract description 11
- 239000011148 porous material Substances 0.000 claims description 14
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 8
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 239000011354 acetal resin Substances 0.000 claims description 4
- 229920006324 polyoxymethylene Polymers 0.000 claims description 4
- 239000008240 homogeneous mixture Substances 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 52
- 239000006061 abrasive grain Substances 0.000 abstract description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 29
- 229910052782 aluminium Inorganic materials 0.000 abstract description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 12
- 239000002245 particle Substances 0.000 abstract description 7
- 239000010419 fine particle Substances 0.000 abstract description 5
- 238000002156 mixing Methods 0.000 abstract description 5
- 238000000227 grinding Methods 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000001723 curing Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000002002 slurry Substances 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000003082 abrasive agent Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 150000001241 acetals Chemical class 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- 229920002261 Corn starch Polymers 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000008120 corn starch Substances 0.000 description 2
- 229940099112 cornstarch Drugs 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は平坦な表面を有する金属板、例えば、磁気ディ
スク基盤の素材たるアルミニウム合金製原盤(以下アル
ミディスクと略称する)等の軟質金属の表面の研削・琢
磨、すなわち研磨に供する合成砥石に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a metal plate having a flat surface, such as a soft metal such as an aluminum alloy master disk (hereinafter referred to as an aluminum disk) that is a material for a magnetic disk base. It relates to a synthetic whetstone used for surface grinding and polishing, that is, polishing.
(従来の技術)
従来、平坦な表面を有する金属板で比較的軟質なもの、
例えばアルミディスク等の表面研磨は、精密旋盤等を用
いた機械加工、炭化珪素等の微粉末スラリーを用いた所
謂ラッピング加工、あるいはレジノイド系砥石や、ウレ
タン系砥石等の合成砥石を用いた加工等が一般的であっ
た。(Prior art) Conventionally, a relatively soft metal plate with a flat surface,
For example, surface polishing of aluminum disks, etc. can be done by machining using a precision lathe, so-called lapping using a slurry of fine powder such as silicon carbide, or processing using a synthetic grindstone such as a resinoid grindstone or a urethane grindstone. was common.
しかしながら、精密旋盤等を用いた機械加工は、作業者
の熟練度により仕上がり精度、作業効率が異なる上、全
般的に作業性が悪く、小型の被研磨体を大量に処理する
ような場合、その効率の低さが顕著1あった。However, machining using precision lathes, etc. has different finishing accuracy and work efficiency depending on the skill level of the worker, and is generally poor in workability. The efficiency was noticeably low.
また、炭化珪素等の砥粒微粉末スラリーを用いたラッピ
ング加工法の場合は、スラリーのロス、使用量が多く経
済的に不利な上、周囲の作業環境や作業者を汚染し、更
にはその高濃度廃液の処理に大変な手間と費用とを要す
るという問題点があった。In addition, in the case of lapping processing using a slurry of fine abrasive particles such as silicon carbide, it is economically disadvantageous due to the large amount of slurry lost and used, and it also contaminates the surrounding working environment and workers, and furthermore, There is a problem in that processing high concentration waste liquid requires a lot of effort and cost.
かかる砥粒微粉末スラリーを用いるラッピング加工法に
代えて、合成砥石を用いた加工が近年急速に普及しつつ
ある。しかし合成砥石も、例えばビトリファイド系やレ
ジノイド系の硬質砥石等では、研磨性能が不充分で充分
な仕上り精度が得られなかったり、検索力が不足したり
、あるいは目詰まり現象等好ましからざる現象を惹起し
、高能率をもって一定の性能が得られない等の問題点が
あった。すなわち、平面部分の研磨、特にアルミディス
ク等、平坦度と面精度とが同時に要求される研磨におい
ては、被研磨体の表面と、研磨材の表面との面相瓦間を
接触させ、−時に研磨を進めてゆくことが必要であり、
例えばレジノイド系あるいはウレタン系等の独立気孔構
造の合成砥石を使用した場合は、研磨作用による研磨屑
、脱落砥粒等がこの気孔に入り込み、目詰まり現象を惹
き起こし易く、研磨効果の持続性に欠け、頻繁なドレッ
シング(表面更新)作業が必要となるのである。In place of the lapping method using such a fine abrasive powder slurry, processing using a synthetic grindstone is rapidly becoming popular in recent years. However, synthetic whetstones, such as vitrified or resinoid hard whetstones, have insufficient polishing performance and cannot obtain sufficient finishing precision, lack search power, or cause undesirable phenomena such as clogging. However, there were problems such as inability to obtain a certain level of performance with high efficiency. In other words, when polishing flat surfaces, especially aluminum disks, etc., which require both flatness and surface precision, the surface of the object to be polished and the surface of the abrasive material are brought into contact with each other. It is necessary to advance the
For example, when using a resinoid-based or urethane-based synthetic whetstone with an independent pore structure, polishing debris, fallen abrasive grains, etc. due to the polishing action can easily enter the pores, causing clogging, which may affect the sustainability of the polishing effect. This results in chipping and frequent dressing (surface renewal) work.
これに対して、連続気孔を有するポリビニルアセタール
系樹脂を結合材として用いたものは、研磨屑、脱落砥粒
等が気孔外に排出され易く、目詰まり現象を起こし難い
ため、優れた合成砥石として一般的に知られたものであ
るが、比較的耐水性に劣り、かかる精密研磨用途には不
向きであった。On the other hand, those using polyvinyl acetal resin with continuous pores as a bonding material are easy to discharge polishing debris, fallen abrasive grains, etc. to the outside of the pores, and are less likely to cause clogging, making them excellent synthetic grindstones. Although it is generally known, it has relatively poor water resistance and is not suitable for such precision polishing applications.
また、耐水性付与を目的として熱硬化性樹脂硬化体を配
合したものも、特公昭3B−1898号および同83−
8762号各公報などに提案され、耐水性合成砥石とし
て公知のものである。特に後者の発明においては、熱硬
化性樹脂の配合比率を変えることにより、弾性のあるも
のから剛性に至るまでの性質を有する研磨材が得られ、
殊に粒度の細かい砥石は、軟質、硬質、難削材の研磨に
有用であるとされていたが、その研削力においては尚不
充分な面があり、平坦な表面を有する軟質金属板、特に
アルミディスク等の平面研磨に不向きであった。In addition, products containing a cured thermosetting resin for the purpose of imparting water resistance are also available in Japanese Patent Publications No. 3B-1898 and No. 83-
It was proposed in various publications such as No. 8762, and is known as a water-resistant synthetic whetstone. In particular, in the latter invention, by changing the blending ratio of the thermosetting resin, an abrasive material with properties ranging from elastic to rigid can be obtained.
In particular, fine-grained whetstones were said to be useful for polishing soft, hard, and difficult-to-cut materials, but their grinding power was still insufficient, and they were particularly useful for polishing soft metal plates with flat surfaces. It was not suitable for flat surface polishing of aluminum disks, etc.
更にまた、ポリビニルアセタール系砥石の耐薬品性、抗
圧力の不足を補うと共に、研削材の接着。Furthermore, it compensates for the lack of chemical resistance and anti-pressure of polyvinyl acetal grinding wheels, and also serves as an adhesion for abrasive materials.
抱合力を増大させるために、珪酸ゲルをマトリックス中
に添加する方法が特公昭5B−22443号として提案
されているが、この方法によって製造された従来の合成
砥石も上記同様、軟質金属板の精密研磨に適するとは云
えなかった。In order to increase the bonding force, a method of adding silicic acid gel to the matrix has been proposed in Japanese Patent Publication No. 5B-22443, but conventional synthetic grindstones manufactured by this method also have the same effect on the precision of soft metal plates. It could not be said that it was suitable for polishing.
これらの問題点を解決するために特開昭61−1112
480号公報には、ポリビニルアセタール系砥石の表面
硬度と砥粒番手との関係を限定し、かつ珪酸ゲルをマト
リックス中に添加した合成砥石が提案されており、この
合成砥石は特にアルミディスク等の平面研磨に対して優
れた平坦度と高い面精度とを同時に満足するものである
。そして、この合成砥石は通常研磨機に装着する前に水
中に投入し、12時間以上放置し、完全に湿潤状態に到
らしめ、最大2%程度膨潤させ安定した後便われてきた
。ところが、冬期にこの合成砥石を水中に投入すると、
水が砥石内部に浸透する前に、膨潤による歪が原因で砥
石にひびが入り、砥石が割れるという問題があった。従
って、冬期には使用前に砥石を室温で保管した後、水中
に投入する必要があり、すぐに砥石が使用できず、その
改善が望まれていた。In order to solve these problems,
Publication No. 480 proposes a synthetic whetstone in which the relationship between the surface hardness and abrasive grain count of a polyvinyl acetal-based whetstone is limited, and silicic acid gel is added to the matrix. It simultaneously satisfies excellent flatness and high surface precision for surface polishing. This synthetic whetstone is usually placed in water before being installed in a polishing machine, left to stand for 12 hours or more, allowed to reach a completely wet state, swelled by a maximum of 2%, and stabilized before being disposed of. However, when this synthetic whetstone is put into water during the winter,
There was a problem in that before the water penetrated into the inside of the whetstone, the whetstone would crack due to distortion due to swelling, causing the whetstone to break. Therefore, in the winter, it is necessary to store the whetstone at room temperature and then put it into water before use, making it impossible to use the whetstone immediately, and an improvement has been desired.
(発明が解決しようとする問題点)
本発明者等は、上述の技術的現状と問題点とに鑑み、鋭
意研究を行なった結果、本発明を完成するに至ったもの
であり、その目的とするところは、優れた平坦度と高い
面精度とを同時に満足するように仕上げられた軟質金属
板、特にアルミディスク等、就中、極めて精密な用途に
供せられる特殊アルミ合金の環状盤等に使用でき、しか
も冬期に水中に投入してもひび割れがおこらない合成砥
石を提供するにある。(Problems to be Solved by the Invention) The present inventors have completed the present invention as a result of intensive research in view of the above-mentioned technical current situation and problems. This is applied to soft metal plates finished to satisfy both excellent flatness and high surface precision, especially aluminum disks, and especially annular disks made of special aluminum alloys used for extremely precise applications. To provide a synthetic whetstone that can be used and does not crack even when put into water in winter.
(問題点を解決するための手段)
上述の目的は、連続微細気孔を具えた三次元網状組織を
なす構造体であって、該組織がポリビニルアセタール系
樹脂と少なくとも一種の熱硬化性樹脂の硬化体と珪酸塩
の非晶体との均一混合体よりなるマトリックスと、該マ
トリックス中において相連接し実質的に連続状態をなし
て存在する砥粒微細粒子との混合体からなる構造体に、
多価アルコールないし、その誘導体、あるいはその重合
体を重量比において1〜5%施与せしめたことを特徴と
する合成砥石によって達成される。(Means for Solving the Problems) The above object is to provide a structure having a three-dimensional network structure with continuous fine pores, which structure is formed by curing polyvinyl acetal resin and at least one thermosetting resin. A structure consisting of a matrix made of a homogeneous mixture of amorphous material and silicate, and a mixture of abrasive fine particles that are interconnected and exist in a substantially continuous state in the matrix,
This can be achieved by using a synthetic grindstone characterized by applying 1 to 5% by weight of polyhydric alcohol, its derivative, or its polymer.
本発明砥石の微細三次元網状組織をなす硬化体は、レジ
ノイド系やつl/タン系人造砥石の独立気泡構造とは組
織を全く異にし、独立気泡は存在せず、空隙中に枝が立
体的に伸びた様な組織であり気孔は無限に連通したもの
となる。従って、研磨作業に起因する砥粒脱落物、研磨
層はこの間隙から系外に排出され易(、また捕捉された
場合も他の独立気泡構造の砥石に見る如く、気泡部分に
これらが堆積し、目詰まり等好ましからざる現象を惹起
し難いものである。独立気泡構造の場合は目詰まり現象
により研磨効果の持続性に欠け、頻繁なドレッシング作
業(表面更新)が必要となる。The hardened body forming a fine three-dimensional network structure of the grinding wheel of the present invention has a completely different structure from the closed cell structure of resinoid-based and l/tan-based artificial grinding wheels, and there are no closed cells and three-dimensional branches are formed in the voids. It has a structure that looks like it has been stretched out, and the pores are infinitely connected. Therefore, the abrasive grains and polishing layer that result from polishing work are easily discharged from the system through these gaps (and even if they are captured, they are deposited in the air bubbles, as seen in other closed-cell whetstones). , it is difficult to cause undesirable phenomena such as clogging.In the case of a closed cell structure, the polishing effect lacks sustainability due to clogging, and frequent dressing operations (surface renewal) are required.
上述の効果が十分に得られるのは、平均気孔径10乃至
100μmの範囲であり、これを下回ると密すぎて、目
詰まり等の現象が出易い。また、これを上回ると、構造
的に粗すぎて物性の均一性という面でやや難がある。The above-mentioned effects can be sufficiently obtained within the range of average pore diameter of 10 to 100 μm; below this range, the pores are too dense and phenomena such as clogging tend to occur. Moreover, if it exceeds this range, the structure will be too rough and there will be some difficulty in terms of uniformity of physical properties.
また気孔率は80〜8s容量%の範囲にあることが好ま
しい。60容量%未満の場合は、独立気泡が存在するよ
うになり、88%容量を超えると強度の面でやや不十分
なものとなる。Further, the porosity is preferably in the range of 80 to 8% by volume. If it is less than 60% by volume, closed cells will be present, and if it exceeds 88% by volume, the strength will be somewhat insufficient.
砥粒の結合材としてポリビニルアセクール系樹脂と熱硬
化性樹脂の硬化体および珪酸塩の非晶体を用いた合成砥
石は、特開昭81−192480号公報により公知のも
のであるが、この合成砥石は熱硬化性樹脂硬化体を配合
しているため耐水性があり、また珪酸塩の非晶体を併用
しているので軟質金属研磨用砥石として、極めて好まし
い研削力を有し、特に砥石自体の摩耗も少なく、且つ、
目詰まり等好ましからざる現象を引き起こしにくい性能
が付与されるのである。結合材であるマトリックスとし
て上述の如(、ポリビニルアセタール系樹脂に熱硬化性
樹脂の硬化体、及び珪酸塩の非晶体を併用することによ
りポリビニルアセタール系合成砥石に特有な靭性(ねば
り)を低減せしめ、適度な脆性(もろさ)を有する合成
砥石となるものであり、特に珪酸塩非晶体は砥石に適度
な脆性を付与し、且つ、その研削力を向上させるという
優れた効果を有する。A synthetic whetstone using a hardened polyvinyl acecool resin, a thermosetting resin, and an amorphous silicate as a binder for abrasive grains is known from Japanese Patent Application Laid-open No. 81-192480. The whetstone is water resistant because it contains a hardened thermosetting resin, and because it is also made with amorphous silicate, it has extremely favorable grinding power as a whetstone for polishing soft metals. Less wear and tear, and
This provides performance that makes it difficult to cause undesirable phenomena such as clogging. The toughness (stickiness) characteristic of polyvinyl acetal synthetic grinding wheels can be reduced by using a hardened thermosetting resin and an amorphous silicate together with polyvinyl acetal resin as described above as a matrix which is a binding material. This results in a synthetic whetstone having appropriate brittleness, and in particular, silicate amorphous has the excellent effect of imparting appropriate brittleness to the whetstone and improving its grinding power.
本発明で言う熱硬化性樹脂としては、メラ【ン系樹脂、
フェノール系樹脂、尿素系樹脂、熱硬化型ウレタン系樹
脂、エポキシ樹脂等が挙げられるが、通常はメラミン系
樹脂、フェノール系樹脂が用いられる。The thermosetting resin referred to in the present invention includes melane-based resin,
Examples include phenolic resins, urea resins, thermosetting urethane resins, and epoxy resins, but melamine resins and phenol resins are usually used.
本発明で言う珪酸塩の非晶体とは、二酸化珪素と各種の
塩基からなる種々の珪酸塩に酸を作用させることによっ
て生ずるゲル状物質を指し、塩基としては、例えばソー
ダ灰を使用した珪酸塩の場合、Na2O・x8i01−
yHlo なる化学式で示されるものであり、Na1O
/8i0tのモル比が2及び4のものを用いることが好
ましい。この場合、ゲル状物質の一般式は、
で示される無機高分子体が分子間架橋をし、非結晶性の
三次元化合物となったものとなる。塩基としては、この
他、水酸化アルミ等を用いる場合もある。In the present invention, the amorphous silicate refers to a gel-like substance produced by the action of acid on various silicates made of silicon dioxide and various bases. In the case of Na2O x8i01-
It is represented by the chemical formula yHlo, and Na1O
It is preferable to use those having a molar ratio of /8i0t of 2 and 4. In this case, the general formula of the gel-like substance is an inorganic polymer represented by intermolecular crosslinking to form an amorphous three-dimensional compound. In addition to this, aluminum hydroxide or the like may be used as the base.
上記結合材マトリックスは、研磨の主材である砥粒微細
粒子を効果的に把持する役割をはたすもので、研磨作業
に際しては、1つの砥粒が表面を研磨して、系外に排除
されると同時に新しい砥粒を自生させ、研磨作業を継続
させてゆくもの、すなわち、砥石は自身摩耗しつつ、研
磨を行うものであるが、上記珪酸塩非晶体の併用により
マトリックス自体も若干の研削力を有するものとなり得
、研削力が格段に向上すると同時に砥石自体の摩耗も低
減し得るものである。The above-mentioned binder matrix plays the role of effectively holding the abrasive fine particles that are the main material of polishing, and during polishing work, one abrasive grain polishes the surface and is eliminated from the system. At the same time, new abrasive grains are self-generated and the polishing process continues.In other words, the grindstone performs polishing while wearing itself, but by using the silicate amorphous material mentioned above, the matrix itself also has a slight grinding force. The grinding force can be significantly improved, and at the same time, the wear of the grindstone itself can be reduced.
また、本発明に言う砥粒微細粒子とは、ダイヤモンド、
窒化ホウ素、炭化珪素、熔融アルミナ、ガーネット、エ
メリー、酸化セリウム、酸化クロム等研削力を有する化
合物または単体からなる研磨材料のいずれかを粉砕し、
適当な方法にてJI8規格Re O01に規定された粒
度に分級されたものを指すものであるが、炭化珪素、熔
融アル主す、酸化クロム、酸化セリウムよりなる群から
選ばれた超硬セラミックス砥粒の少なくとも1種を選定
することが望ましい。In addition, the abrasive fine particles referred to in the present invention include diamond,
Grinding abrasive materials such as boron nitride, silicon carbide, fused alumina, garnet, emery, cerium oxide, chromium oxide, etc., consisting of compounds or single substances with grinding power,
This refers to abrasives classified by an appropriate method to the particle size specified in JI8 standard Re O01, and is a cemented carbide ceramic abrasive selected from the group consisting of silicon carbide, fused aluminum, chromium oxide, and cerium oxide. It is desirable to select at least one type of grain.
更に、本発明における要点は、研磨性能を持つ砥粒の配
位・分布状態に係る点である。すなわち、この種の合成
砥石においては、研磨面に存在する砥粒々子が摩擦して
脱落し、系外に排出されるという現象を繰り返し、砥石
は自らの厚みを減少させつつ、被研磨体表面を研磨して
ゆくものであるが、砥粒の比率が少ないと、1個の砥粒
が独立して存在することとなり、その砥粒が脱落した後
は、ミクロ的見方をすれば結合材のみで表面を摺擦する
。すなわち研磨力の少ない部分での摺擦を行う為、切れ
味(研削力)が劣るものとなる。特に本発明の如く、ア
ルミディスク等軟質金属の表面研磨を目的とする場合、
かかる現象は好ましくなく、表面斑、研磨斑等の問題に
つながり易い。Furthermore, the key point of the present invention is the coordination and distribution state of abrasive grains having polishing performance. In other words, in this type of synthetic whetstone, the abrasive grains existing on the polishing surface are rubbed off, fall off, and are discharged from the system repeatedly, and the whetstone reduces its own thickness while increasing the surface of the object to be polished. However, if the ratio of abrasive grains is small, each abrasive grain will exist independently, and after that abrasive grain falls off, from a microscopic perspective, only the binder will remain. Scrub the surface with. In other words, since the rubbing is performed in areas with low abrasive force, the sharpness (grinding force) is poor. Especially when the purpose is to polish the surface of a soft metal such as an aluminum disk, as in the present invention,
Such a phenomenon is undesirable and tends to lead to problems such as surface unevenness and polishing unevenness.
本発明においては、かかる好ましからざる現象を回避す
る為、個々の砥粒がマトリックス中で各々独立して存在
せず、隣接した砥粒々子と相互に連接し、実質的に連続
した状態をなして分布していることが必要となる。かか
る砥粒の状態は、砥石のマトリックスが、60〜86容
量%という高い気孔率をもって三次元的に均一に連通し
た、平均孔径10〜100μmの連続気孔構造をなし、
このようなマトリックスの微細骨格中に適度な粒度の砥
粒微細粒が充分な量をもって、所謂、目白押しをなして
配位され、均一に分布していることに由来する。また、
かかる配位・分布を確実にするための好適な砥粒番手は
、少なくとも800番、含有量は混合体重量の25重量
%以上、更に好適には混合体重量の60重量%以上であ
る。そして、砥粒番手が低い程、すなわち砥粒々径が大
きい程、硬度を高めにすることが好ましい。In the present invention, in order to avoid such undesirable phenomena, individual abrasive grains do not exist independently in the matrix, but are interconnected with adjacent abrasive grains, forming a substantially continuous state. It needs to be distributed. The state of such abrasive grains is such that the matrix of the grinding wheel has a continuous pore structure with an average pore diameter of 10 to 100 μm, which is uniformly connected in three dimensions with a high porosity of 60 to 86% by volume,
This is due to the fact that a sufficient amount of abrasive grains of appropriate particle size are arranged in the fine skeleton of such a matrix, so to speak, and uniformly distributed. Also,
To ensure such coordination and distribution, the preferred abrasive grain size is at least 800, and the content is 25% by weight or more of the weight of the mixture, more preferably 60% by weight or more of the weight of the mixture. Further, it is preferable that the lower the abrasive grain count, that is, the larger the diameter of the abrasive grains, the higher the hardness.
以上のような構造体に施与される多価アルコールは、水
の浸透剤として添加されるものであり、水が急速に内部
に浸透し、膨潤による歪が発注せず、ひび割れを防止し
得るものである。The polyhydric alcohol applied to the structure described above is added as a water penetrating agent, and water quickly penetrates into the structure, preventing distortion due to swelling and preventing cracks. It is something.
ここで、多価アルコールとは、多価アルコールないし、
その誘導体、あるいはその重合体を指すものであるが、
通常はグリセリン、グリコール類。Here, polyhydric alcohol refers to polyhydric alcohol or
It refers to its derivatives or its polymers,
Usually glycerin or glycols.
ペトリオール(例えば商品名「クラレイソブレン・ケミ
カル」)lエタノールアミン等が用いられる。この中で
も特に不揮発性(蒸気圧が極めて低い)、低毒性、吸湿
性に富むものが好ましい。Petriol (for example, trade name "Clareisobrene Chemical"), ethanolamine, etc. are used. Among these, those that are nonvolatile (having extremely low vapor pressure), have low toxicity, and are highly hygroscopic are particularly preferred.
本発明にかかる砥石は次の如き方法にて製造される。The grindstone according to the present invention is manufactured by the following method.
すなわち、平均重合度500〜200G、wt化[8G
モル%以上のポリビニルアルコール、その誘導体または
変性体の一種あるいはそれ以上を混合して水溶液となし
、それに熱硬化性樹脂のモノマー、オリゴマーあるいは
重合体等からなる前駆体の水溶液、非水溶媒溶液、エマ
ルシヨン等、および珪酸塩の水溶液またはコロイドを加
えて均一に撹拌し、更に砥粒、架橋剤としてのアルデヒ
ド類、触媒としての酸類、及び気孔生成剤としての澱粉
類等を加え、均一粘稠スラリーをW4製し、これを所定
の型枠に注型する。然る後、40乃至100℃の温度に
て約−昼夜、揚浴あるいはその他の浴中で反応固化を行
なった後取り出し、水洗いして余剰のアルデヒド類、酸
類、気孔生成剤を除去する。こうして得られた中間体は
、形態的には砥石の形態を整えているが、樹脂の硬化反
応が行なわれておらず、性能は不充分である。That is, the average degree of polymerization is 500 to 200G, wt [8G
An aqueous solution is prepared by mixing mol% or more of polyvinyl alcohol, one or more of its derivatives or modified products, and an aqueous solution or non-aqueous solution of a precursor consisting of a thermosetting resin monomer, oligomer or polymer, etc. An emulsion, etc., and an aqueous solution or colloid of silicate are added and stirred uniformly, and then abrasive grains, aldehydes as a crosslinking agent, acids as a catalyst, starch as a pore forming agent, etc. are added to form a uniform viscous slurry. is made of W4 and cast into a predetermined mold. Thereafter, the product is reacted and solidified in a frying bath or other bath at a temperature of 40 to 100° C. day and night, and then taken out and washed with water to remove excess aldehydes, acids, and pore forming agents. The intermediate thus obtained has the shape of a grindstone, but the resin has not undergone a curing reaction and its performance is insufficient.
従ってこの中間体を100℃程度の温度で加熱し水分を
蒸発除去、乾燥した後、樹脂の硬化を行なう為の熱処理
(キユアリング)を行なわねばならないが、キユアリン
グ1ζ必要な温度および時間は使用した樹脂の種類およ
びユによって微妙に異なるものである。一般的には10
0乃至260℃で20乃至100時間のキユアリングを
施せば、硬化反応はほぼ達成される。Therefore, it is necessary to heat this intermediate at a temperature of about 100°C to evaporate the moisture, dry it, and then perform a heat treatment (curing) to cure the resin. It differs slightly depending on the type and type. Generally 10
The curing reaction is almost completed by curing at 0 to 260°C for 20 to 100 hours.
硬化が不充分であると靭性が大キ<、またキユアリング
条件が過酷で硬化が進みすぎると熱分解が同時に生起し
、好ましからざる現象が起こり易いので、条件の選定は
慎重に行なう必要がある。If the curing is insufficient, the toughness will be greatly affected, and if the curing conditions are harsh and the curing progresses too much, thermal decomposition will occur at the same time, which is likely to cause undesirable phenomena, so conditions must be selected carefully.
またキユアリングにおいて急激な昇温を避ける為、段階
的な昇温を行なったり、不活性ガス雰囲気の中で行ない
局部的酸化・劣化を抑制することも有効である。In order to avoid rapid temperature rise during curing, it is also effective to raise the temperature in stages or to perform it in an inert gas atmosphere to suppress local oxidation and deterioration.
ポリビニルアルコール以外の樹脂については前述の如く
、反応原液の段階で混合(ブレ【ツクス)しても良いが
反応終了後の中間体にその液状前駆体を含浸せしめてか
らキユアリングしてもよく、また2種以上の樹脂を併用
する場合は一つの樹脂をプレミックスし、もう一つの樹
脂を後処理するという手段を用いてもよく、特に方法に
ついて限定されない。更に熱硬化を促進するための触媒
を併用することも有効である。As mentioned above, resins other than polyvinyl alcohol may be mixed (bleached) at the stage of the reaction stock solution, or may be cured after the intermediate is impregnated with the liquid precursor after the reaction is completed. When two or more resins are used together, a method may be used in which one resin is premixed and the other resin is post-treated, and the method is not particularly limited. Furthermore, it is also effective to use a catalyst to promote thermal curing.
液状の樹脂は、水溶液、有機溶剤に溶解した溶液、エマ
ルジ■ン、あるいは樹脂原液のいずれも使用しうるが、
作業性および混合比のコントロールのし易さから見て、
水溶液を使用する方法が最も好適である。The liquid resin can be an aqueous solution, a solution dissolved in an organic solvent, an emulsion, or a resin stock solution.
From the viewpoint of workability and ease of controlling the mixing ratio,
The method using an aqueous solution is most preferred.
このようにして得られた硬化体に多価アルコールを施与
する方法は、コーティング法、スプレー法、給液ロール
塗布法等が挙げられる。そして、多価アルコールを付着
させた硬化体を40’C〜80℃の温度で乾燥すること
で、合成砥石を得ることができる。Methods for applying polyhydric alcohol to the cured product thus obtained include a coating method, a spray method, a liquid supply roll coating method, and the like. Then, a synthetic grindstone can be obtained by drying the cured product to which polyhydric alcohol is attached at a temperature of 40'C to 80C.
(作用)
前述の如くして得られた砥石は所望の形状に成型された
後、水中に投入し、12時間以上放、置し、完全に湿潤
状態に到らしめ、最大2%程度膨潤させ安定した後軟質
金属の表面研磨用途に供せられるが、特にアルミディス
ク等、特殊アルミ合金の環状盤の表面研磨の如き、極め
て精密な用途に供せられる場合、研磨前後の厚み、すな
わち研削量が精度高(定められており、しかも平坦度、
厚みのバラツキが極端におさえられている為、一般的な
研磨装置には適用されに<<、例えば両面ラッピング式
研磨機等、極めて精密な装置に装着して用いることが好
ましい。ここで両面ラッピング式研磨機とは、円形また
は環形盤状の金属性定盤を上下両面に備え、その間に被
研磨体を1枚またはそれ以上挾みこんで圧着し、上下両
定盤を逆方向に回転せしめ、被研磨体表面を摺動擦過し
て、研磨を行なう装置を言い、本発明になる砥石を適用
する場合には、まず、水中に投入し、12時間以上放置
し、完全に湿潤状態に到らしめ、最大2%程度膨潤させ
安定させるのである。その際、多価アルコール(@導体
、重合体を含む)を付着せしめているので、多価アルコ
ールが浸透剤として働き、水が急速に内部に浸透するの
で、膨潤による歪が発生せず、従ってひび割れが発生し
ないのである。(Function) After the grindstone obtained as described above is molded into a desired shape, it is placed in water and left to stand for 12 hours or more to reach a completely wet state and swell by a maximum of about 2%. After stabilization, it is used for surface polishing of soft metals, but especially when used for extremely precise purposes such as surface polishing of special aluminum alloy annular disks such as aluminum disks, the thickness before and after polishing, that is, the amount of grinding. is highly accurate (defined, flatness,
Since the variation in thickness is extremely suppressed, it cannot be applied to general polishing equipment, but is preferably used by being attached to extremely precise equipment, such as a double-sided lapping polisher. Here, a double-sided lapping type polishing machine is equipped with circular or ring-shaped metal surface plates on both the upper and lower surfaces, and one or more objects to be polished are sandwiched between them and crimped, and both the upper and lower surface plates are rotated in opposite directions. When applying the grindstone of the present invention, it is first placed in water and left for at least 12 hours to completely wet the surface of the object to be polished. This is achieved by allowing the material to swell by a maximum of 2% and stabilize. At that time, since polyhydric alcohol (containing conductors and polymers) is attached, the polyhydric alcohol acts as a penetrant and water quickly penetrates into the interior, so distortion due to swelling does not occur, and therefore No cracks will occur.
次に砥石が均一表面を形成するよう両定盤にこれを装着
して用いるのである。稼働時には研磨助剤たる液体を適
量流して、研磨面を濡らしつつ研磨が行なわれるもので
あるが、ここで用いられる液体、所謂、研磨液は、水、
ある種の界面活性剤を含んだ水、あるいは有機溶剤等で
ある。Next, the grindstone is attached to both surface plates so that it forms a uniform surface. During operation, polishing is performed by flowing an appropriate amount of a polishing aid liquid to wet the polishing surface, but the liquid used here, the so-called polishing liquid, is water,
These include water containing some kind of surfactant, or organic solvents.
かくして本発明1ζなる砥石を両面ラッピング式研磨機
に装着し、例えばアルミディスクの研磨を行なうと、優
れた耐水性と砥粒保持力とを有するマトリックス樹脂中
に均−且つ緻密に充訓され、相互に連接した砥粒微細粒
子は、その砥粒番手とマトリックスの適度な硬度、弾性
、脆性などに由来する砥石表面硬度と相俟って、冴えた
切れ味、すなわち研磨力を示し、また砥粒粒子は摺擦研
磨作用−ζより順次脱落しても背後に連接した新しい砥
粒が表面に現れて、砥面が直ちに更新再生されるととも
に、研磨屑、脱落砥粒等は連続微細気孔から排出され易
いため、目詰まりを起こし難いから、高い研磨力が長期
に亙って維持される。また、本発明砥石の@微細砥粒の
前述せる特殊な配位・分布状態のために、研酊作業時、
マトリックス樹脂のみによる摺擦現象を生ずることなく
、平坦な被研磨体全面に互って砥粒粒子が接触・摺擦し
、常時均一な研磨作用が行なわれる。従って、本発明砥
石は平坦な平面を有する軟質金属板に、研磨斑のない、
高い平滑度と優れた仕上かり面精度とを効率良(与える
ものである。Thus, when the grinding wheel of the present invention 1ζ is installed in a double-sided lapping type polishing machine to polish, for example, an aluminum disk, the grindstone is evenly and densely impregnated into the matrix resin, which has excellent water resistance and abrasive grain retention. The fine particles of abrasive grains connected to each other, together with the surface hardness of the grinding wheel derived from the appropriate hardness, elasticity, and brittleness of the abrasive grain count and matrix, exhibit sharp cutting ability, that is, abrasive power, and the abrasive grains Even if the particles fall off sequentially due to the abrasive action of ζ, new abrasive grains connected behind appear on the surface, and the abrasive surface is immediately renewed and regenerated, and the abrasive debris and fallen abrasive grains are discharged from continuous fine pores. Because it is easy to remove, it is difficult to cause clogging, so high polishing power is maintained for a long period of time. In addition, due to the above-mentioned special coordination and distribution state of the fine abrasive grains of the grinding wheel of the present invention, during grinding work,
The abrasive grains contact and rub against each other over the entire flat surface of the object to be polished, without causing any rubbing phenomenon caused only by the matrix resin, and a uniform polishing action is always performed. Therefore, the grinding wheel of the present invention can polish a soft metal plate having a flat surface without polishing unevenness.
It efficiently provides high smoothness and excellent finished surface accuracy.
(実施例) 以下実施例に従い本発明の実施態様を説明する。(Example) Embodiments of the present invention will be described below with reference to Examples.
尚、本実施例において使用した研磨装置、測定機器、被
研磨体等は次の通りである。The polishing apparatus, measuring equipment, object to be polished, etc. used in this example are as follows.
・研磨装置・・・スピードファム社製両面研治機(型式
8FDL 9B−588G)
・表面粗さ計・・・東京精密社製 表面粗さ計(型式、
サーフコム 5siA)
・被研磨剤・・・JI8−規格ムムロ086に記された
アルミニウム合金製環状板
又研磨条件及び測定条件は下記の通りである。・Polishing device: Double-sided grinder manufactured by Speed FAM (Model 8FDL 9B-588G) ・Surface roughness meter: Surface roughness meter manufactured by Tokyo Seimitsu Co., Ltd. (Model:
Surfcom 5siA) - Polishing material: An annular plate made of aluminum alloy as described in JI8-Standard Mumuro 086. The polishing conditions and measurement conditions are as follows.
・研磨条件:
・圧力100 fl / Cm”
・研磨時間・・・5分/バッチ
・上部定盤回転数・・・20 R/M (左回り)・下
部 ・・・a OR/M (右回り)・キャリ
アー l ・・・t Oa/M (右回り)・水供給量
・・・51/分
・表面精度測定条件
(WCM) ・カットオフ値・・・5.8mm以下
・測定長・・・80mm
なおここでいうRa * Rmax e WOMは、次
式のパラメーターを示す。・Polishing conditions: ・Pressure 100 fl/Cm" ・Polishing time...5 minutes/batch ・Upper surface plate rotation speed...20 R/M (counterclockwise) ・Lower...a OR/M (clockwise) )・Carrier l...t Oa/M (clockwise)・Water supply rate...51/min・Surface accuracy measurement conditions (WCM)・Cutoff value...5.8mm or less・Measurement length... 80 mm Note that Ra * Rmax e WOM here indicates the parameter of the following equation.
R,・・・中心線平均粗さ f (x)は、粗さ曲線を示す。R, ... center line average roughness f (x) indicates the roughness curve.
Rmax ・・・最大高さ
Rmax =Pmax−Vmin
PmjaX ・・・粗さ曲線における最大山高さvm
ln # # 最大谷深さWOM・
・・3波最大うねり
WOM =Pmax Vmin
PmaX ・・・3波うねり曲線における最大山高さ
Vm i n ・・・ # l R
大谷深さ砥粒として、炭化珪素粉末の800番のものを
選定した。800番は平均粒径18〜22μmのもので
ある。重合度1700、完全鹸化のポリビニルアルコー
ルを水溶液となし、これに水溶性フェノール樹脂として
住人デュレズ■製PR−961人を所定量と、触媒とし
ての硫酸、架橋剤としてのホルムアルデヒド、気孔生成
剤としてのコーンスターチとを加え、さらに二酸化珪素
にソーダ灰を加えた珪酸塩の水溶液を所定量加えた後、
前述砥粒と混合して均一のスラリー状液を調製した。こ
のスラリー液を所定の型枠に注型し、60℃にて一昼夜
反応固化せしめた。しかる後、水洗いし、過剰の酸、ホ
ルムアルデハイド、コーンスターチ等を除去して乾燥し
合成砥石の中間体を得た。これを130℃の温度にて約
60時間熱処理して、所期の砥石を得た。また、水溶液
のメラミン樹脂として昭和高分子■製8M−700の水
溶液を準備し、前記中間体をこれに含浸し、所定量に絞
った後、乾燥し、130℃の温度にて約50時間熱処理
を行ない、構造体を得た。Rmax ... Maximum height Rmax = Pmax - Vmin PmjaX ... Maximum peak height vm in the roughness curve
ln # # Maximum valley depth WOM・
... 3-wave maximum swell WOM = Pmax Vmin PmaX ... Maximum mountain height in 3-wave swell curve Vmin ... # l R
No. 800 silicon carbide powder was selected as the Otani depth abrasive grain. No. 800 has an average particle size of 18 to 22 μm. Completely saponified polyvinyl alcohol with a degree of polymerization of 1700 was made into an aqueous solution, and a predetermined amount of water-soluble phenol resin PR-961 manufactured by Jumin Durez was added to the solution, as well as sulfuric acid as a catalyst, formaldehyde as a crosslinking agent, and formaldehyde as a pore-forming agent. After adding cornstarch and a predetermined amount of a silicate aqueous solution containing silicon dioxide and soda ash,
A uniform slurry liquid was prepared by mixing with the abrasive grains described above. This slurry liquid was cast into a predetermined mold, and reacted and solidified at 60° C. overnight. Thereafter, it was washed with water to remove excess acid, formaldehyde, cornstarch, etc., and dried to obtain an intermediate for a synthetic grindstone. This was heat-treated at a temperature of 130° C. for about 60 hours to obtain the desired grindstone. In addition, an aqueous solution of 8M-700 manufactured by Showa Kobunshi ■ was prepared as an aqueous melamine resin, and the intermediate was impregnated into this, squeezed to a predetermined amount, dried, and heat-treated at a temperature of 130°C for about 50 hours. I did this and got a structure.
かくして得られた構造体を、第1図に示すが如き厚さ5
9mmの略扇形の形状(1)に切断成形し、これにグリ
セリン(第一工業製薬■製DG)純分の濃度が6.10
,15wt%の水溶液をスプレー法にて施与して、50
〜80℃で乾燥し、本発明実施例の合成砥石を得た。The structure thus obtained has a thickness of 5 as shown in FIG.
Cut and mold into a 9 mm approximately fan-shaped shape (1), and add glycerin (DG manufactured by Daiichi Kogyo Seiyaku ■) with a pure concentration of 6.10.
, 15 wt% aqueous solution was applied by spraying, and 50%
It was dried at ~80°C to obtain a synthetic whetstone of an example of the present invention.
本実施例で用いた砥石の組成は第1表に示す。The composition of the grindstone used in this example is shown in Table 1.
かくして得られた合成砥石を14℃の大気中に24時間
放置後砥石の底面を20℃の水に浸し、砥石の上面まで
水が浸透するまでの時間を測定し、また砥面の状態を検
査した。After the synthetic whetstone thus obtained was left in the air at 14°C for 24 hours, the bottom of the whetstone was immersed in water at 20°C, the time until the water penetrated to the top of the whetstone was measured, and the condition of the grinding surface was inspected. did.
次にこの合成砥石を金属製取付板(2)に接合し、ボル
トにて研磨装置の上下ラッピング盤に取付けた。キャリ
アーを用いて被研磨材を固定し、研磨装置の所定の条件
にて、研磨を行なった。研磨液(クーラント)としては
水を用い、所定時間研磨後、被研磨材の表面形状を検査
した。Next, this synthetic grindstone was joined to a metal mounting plate (2), and attached to the upper and lower lapping machines of the polishing device using bolts. The material to be polished was fixed using a carrier, and polished under predetermined conditions of the polishing device. Water was used as the polishing liquid (coolant), and after polishing for a predetermined period of time, the surface shape of the polished material was inspected.
結果を第1表に記す。The results are shown in Table 1.
(以下余白)
−・・・なし
第
+・・・僅かにあり
表
++・・・あり
第1表から明らかな如く、本発明になる合成砥石は、水
中に投入した時にも水がすぐに浸透するため、ひび割れ
が発生しないのである。また適度の研削力を有し、かつ
表面精度においても良好な結果を示す。RmaXがRa
の略11程度の値を示しており、条痕が少なく、良い仕
上がりである事がわかる。(Leaving space below) -...None No. +...Slightly present Table ++...Present As is clear from Table 1, the synthetic whetstone of the present invention allows water to penetrate immediately even when it is placed in water. Therefore, no cracks occur. It also has appropriate grinding power and shows good results in terms of surface precision. RmaX is Ra
It shows a value of approximately 11, indicating that there are few scratches and a good finish.
(発明の効果)
以上詳述した様に、本発明による合成砥石は、冬期に砥
石を室温(使用雰囲気)で保管したのち、水中に投入す
る必要がなく、必要な時にすぐに使えるため作業性が向
上するのである。(Effects of the Invention) As detailed above, the synthetic whetstone according to the present invention does not require storing the whetstone at room temperature (usage atmosphere) during the winter and then putting it into water, and it can be used immediately when needed, resulting in improved workability. will improve.
また、本発明による合成砥石は優れた平坦度と萬い面精
度とを同時に備えた、軟質金属板、例えばアルミディス
クを効率良く経済的有利に取得することが可能となった
ため、電子工業、事務機器産業等の発達に伴う情報蓄積
媒体としての高精度仕上アルミディスク等の品質向上な
らびに急速な需要増に十分対処することができると共に
、研磨作業効率の上昇は生産加工コストの低減を可能と
するなど産業界への寄与は頗る大である。In addition, the synthetic whetstone according to the present invention has made it possible to efficiently and economically obtain soft metal plates, such as aluminum disks, which have both excellent flatness and surface precision. It will be able to fully cope with the quality improvement and rapid increase in demand for high-precision finished aluminum disks as information storage media due to the development of the equipment industry, etc., and the increase in polishing work efficiency will make it possible to reduce production processing costs. The contribution to industry is enormous.
【図面の簡単な説明】
第1図は本発明砥石の使用状況を説明するためのラッピ
ング式研磨機のラッピング盤の斜視図である。
(1)・・・砥石、(2)・・・取付板、(5)・・・
ラッピング盤。
第
図BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a lapping machine of a lapping type polishing machine for explaining how the grindstone of the present invention is used. (1)...Whetstone, (2)...Mounting plate, (5)...
Wrapping board. Diagram
Claims (1)
体であって、該組織がポリビニルアセタール系樹脂と少
なくとも一種の熱硬化性樹脂の硬化体と珪酸塩の非晶体
との均一混合体よりなるマトリックスと、該マトリック
ス中において相連接し実質的に連続状態をなして存在す
る砥粒微細粒子との混合体からなる構造体に、多価アル
コールないし、その誘導体、あるいはその重合体を重量
比において1〜5%施与せしめたことを特徴とする合成
砥石。(1) A structure having a three-dimensional network structure with continuous fine pores, the structure being a homogeneous mixture of a polyvinyl acetal resin, a cured product of at least one thermosetting resin, and an amorphous silicate. A polyhydric alcohol, a derivative thereof, or a polymer thereof is added by weight to a structure consisting of a mixture of a matrix consisting of 1. A synthetic whetstone characterized by having a ratio of 1 to 5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP738489A JPH02185374A (en) | 1989-01-13 | 1989-01-13 | Synthetic grindstone |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP738489A JPH02185374A (en) | 1989-01-13 | 1989-01-13 | Synthetic grindstone |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02185374A true JPH02185374A (en) | 1990-07-19 |
Family
ID=11664439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP738489A Pending JPH02185374A (en) | 1989-01-13 | 1989-01-13 | Synthetic grindstone |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02185374A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04256581A (en) * | 1991-02-08 | 1992-09-11 | Kanebo Ltd | Composite grinding wheel |
| US6390895B1 (en) | 1999-08-09 | 2002-05-21 | Hitachi, Ltd. | Flattening and machining method and apparatus |
| JP2011525431A (en) * | 2008-06-23 | 2011-09-22 | サンーゴバン アブレイシブズ,インコーポレイティド | High porosity vitrified superabrasive product and manufacturing method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56102475A (en) * | 1979-12-29 | 1981-08-15 | Mitsubishi Metal Corp | Impregnated grind stone with sealing layer |
| JPS61192480A (en) * | 1985-02-22 | 1986-08-27 | Kanebo Ltd | Synthetic grinding stone for soft metal |
-
1989
- 1989-01-13 JP JP738489A patent/JPH02185374A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56102475A (en) * | 1979-12-29 | 1981-08-15 | Mitsubishi Metal Corp | Impregnated grind stone with sealing layer |
| JPS61192480A (en) * | 1985-02-22 | 1986-08-27 | Kanebo Ltd | Synthetic grinding stone for soft metal |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04256581A (en) * | 1991-02-08 | 1992-09-11 | Kanebo Ltd | Composite grinding wheel |
| US6390895B1 (en) | 1999-08-09 | 2002-05-21 | Hitachi, Ltd. | Flattening and machining method and apparatus |
| US6477825B2 (en) | 1999-08-09 | 2002-11-12 | Hitachi, Ltd. | Flattening and machining method and apparatus |
| JP2011525431A (en) * | 2008-06-23 | 2011-09-22 | サンーゴバン アブレイシブズ,インコーポレイティド | High porosity vitrified superabrasive product and manufacturing method |
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