JPH0218571A - Plate making method for planographic printing plate - Google Patents
Plate making method for planographic printing plateInfo
- Publication number
- JPH0218571A JPH0218571A JP16685088A JP16685088A JPH0218571A JP H0218571 A JPH0218571 A JP H0218571A JP 16685088 A JP16685088 A JP 16685088A JP 16685088 A JP16685088 A JP 16685088A JP H0218571 A JPH0218571 A JP H0218571A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- rinsing
- printing plate
- rinse
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 63
- 238000000034 method Methods 0.000 title claims description 54
- 239000000758 substrate Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 abstract description 56
- -1 alkyl diphenylether Chemical compound 0.000 abstract description 51
- 239000007788 liquid Substances 0.000 abstract description 27
- 238000012545 processing Methods 0.000 abstract description 25
- 239000003945 anionic surfactant Substances 0.000 abstract description 5
- 239000000499 gel Substances 0.000 abstract description 5
- 239000001488 sodium phosphate Substances 0.000 abstract description 3
- 229910000162 sodium phosphate Inorganic materials 0.000 abstract description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract description 3
- 239000000872 buffer Substances 0.000 abstract description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 abstract description 2
- 230000002547 anomalous effect Effects 0.000 abstract 1
- 150000007857 hydrazones Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 39
- 229920005989 resin Polymers 0.000 description 31
- 239000011347 resin Substances 0.000 description 31
- 238000005406 washing Methods 0.000 description 27
- 108091008695 photoreceptors Proteins 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 23
- 229920001577 copolymer Polymers 0.000 description 19
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- 239000012487 rinsing solution Substances 0.000 description 16
- 239000002253 acid Substances 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 239000004094 surface-active agent Substances 0.000 description 12
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 238000011161 development Methods 0.000 description 10
- 239000000049 pigment Substances 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000005011 phenolic resin Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- 235000014113 dietary fatty acids Nutrition 0.000 description 5
- 239000000194 fatty acid Substances 0.000 description 5
- 229930195729 fatty acid Natural products 0.000 description 5
- 229920001568 phenolic resin Polymers 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229910052913 potassium silicate Inorganic materials 0.000 description 4
- 235000019353 potassium silicate Nutrition 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000004111 Potassium silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 125000004018 acid anhydride group Chemical group 0.000 description 3
- 235000001014 amino acid Nutrition 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 239000002518 antifoaming agent Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000010017 direct printing Methods 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 235000011118 potassium hydroxide Nutrition 0.000 description 3
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 150000003871 sulfonates Chemical class 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001413 amino acids Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000007853 buffer solution Substances 0.000 description 2
- 239000006172 buffering agent Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 239000005018 casein Substances 0.000 description 2
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 2
- 235000021240 caseins Nutrition 0.000 description 2
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- 239000002800 charge carrier Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- NVVZQXQBYZPMLJ-UHFFFAOYSA-N formaldehyde;naphthalene-1-sulfonic acid Chemical compound O=C.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 NVVZQXQBYZPMLJ-UHFFFAOYSA-N 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
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- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 229940083761 high-ceiling diuretics pyrazolone derivative Drugs 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 229920003146 methacrylic ester copolymer Polymers 0.000 description 2
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- 150000003891 oxalate salts Chemical class 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- BBMHARZCALWXSL-UHFFFAOYSA-M sodium dihydrogenphosphate monohydrate Chemical compound O.[Na+].OP(O)([O-])=O BBMHARZCALWXSL-UHFFFAOYSA-M 0.000 description 2
- 235000011008 sodium phosphates Nutrition 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
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- 239000008107 starch Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
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- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- MTCFGRXMJLQNBG-REOHCLBHSA-N (2S)-2-Amino-3-hydroxypropansäure Chemical compound OC[C@H](N)C(O)=O MTCFGRXMJLQNBG-REOHCLBHSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- DMDPKUWXJUYFKO-UHFFFAOYSA-N 1,1'-biphenyl;hydrochloride Chemical compound Cl.C1=CC=CC=C1C1=CC=CC=C1 DMDPKUWXJUYFKO-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- ZXBSSAFKXWFUMF-UHFFFAOYSA-N 1,2,3-trinitrofluoren-9-one Chemical compound C12=CC=CC=C2C(=O)C2=C1C=C([N+](=O)[O-])C([N+]([O-])=O)=C2[N+]([O-])=O ZXBSSAFKXWFUMF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VERMWGQSKPXSPZ-BUHFOSPRSA-N 1-[(e)-2-phenylethenyl]anthracene Chemical class C=1C=CC2=CC3=CC=CC=C3C=C2C=1\C=C\C1=CC=CC=C1 VERMWGQSKPXSPZ-BUHFOSPRSA-N 0.000 description 1
- HOQAPVYOGBLGOC-UHFFFAOYSA-N 1-ethyl-9h-carbazole Chemical compound C12=CC=CC=C2NC2=C1C=CC=C2CC HOQAPVYOGBLGOC-UHFFFAOYSA-N 0.000 description 1
- LFKNYYQRWMMFSM-UHFFFAOYSA-N 1-ethyl-9h-carbazole;formaldehyde Chemical compound O=C.N1C2=CC=CC=C2C2=C1C(CC)=CC=C2 LFKNYYQRWMMFSM-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
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- 150000007522 mineralic acids Chemical class 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229930184652 p-Terphenyl Natural products 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- COLNVLDHVKWLRT-UHFFFAOYSA-N phenylalanine Natural products OC(=O)C(N)CC1=CC=CC=C1 COLNVLDHVKWLRT-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- INAAIJLSXJJHOZ-UHFFFAOYSA-N pibenzimol Chemical compound C1CN(C)CCN1C1=CC=C(N=C(N2)C=3C=C4NC(=NC4=CC=3)C=3C=CC(O)=CC=3)C2=C1 INAAIJLSXJJHOZ-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- KYKNRZGSIGMXFH-ZVGUSBNCSA-M potassium bitartrate Chemical compound [K+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O KYKNRZGSIGMXFH-ZVGUSBNCSA-M 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- RCYFOPUXRMOLQM-UHFFFAOYSA-N pyrene-1-carbaldehyde Chemical compound C1=C2C(C=O)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 RCYFOPUXRMOLQM-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- ZIWRUEGECALFST-UHFFFAOYSA-M sodium 4-(4-dodecoxysulfonylphenoxy)benzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCOS(=O)(=O)c1ccc(Oc2ccc(cc2)S([O-])(=O)=O)cc1 ZIWRUEGECALFST-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 229940074404 sodium succinate Drugs 0.000 description 1
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 description 1
- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 150000003890 succinate salts Chemical class 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical class S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G13/00—Electrographic processes using a charge pattern
- G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
- G03G13/28—Planographic printing plates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子写真プロセスにより平版印刷版を作成する
製版方法に関するものであり、特にエツチング処理後の
リンス工程が改良された製版方法に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a plate-making method for creating a lithographic printing plate by an electrophotographic process, and particularly relates to a plate-making method with an improved rinsing step after etching treatment. be.
今日、平版オフセット印刷版としては、ジアゾ化合物と
フェノール樹脂を主成分とするポジ型感光剤やアクリル
系モノマーやプレポリマーを主成分とするネガ型感光剤
を用いるPS版などが実用化されているが、これらはす
べて低感度のため、あらかじめ画像記録された銀塩写真
フィルム原版を密着露光して製版を行っている。一方、
コンピューター画像処理と大容量データの保存およびデ
ータ通信技術の進歩によって、近年では、原稿人力、補
正、編集、割り付けから頁組まで一貫してコンピュータ
ー操作され、高速通信網や衛星通信により即時遠隔地の
末端プロンターに出力できる電子編集システムが実用化
している。特に、即時性の要求される新聞印刷分野にお
いて電子編集ンステムの要求度は高い。また、オリジナ
ルが原版フィルムの形で保存され、これをもとに必要に
応じて印刷版が複製されている分野においても、光ディ
スクなどの超大容量記録メディアの発達に伴いオリジナ
ルがこれらの記録メディアにデジタルデータとして保存
されるようになると考えられる。Today, as lithographic offset printing plates, PS plates that use positive-working photosensitizers whose main components are diazo compounds and phenolic resins, and negative-working photosensitizers whose main components are acrylic monomers and prepolymers are in practical use. However, all of these have low sensitivity, so plate making is performed by contact exposure of a silver halide photographic film master plate on which an image has been recorded in advance. on the other hand,
Advances in computer image processing, large-capacity data storage, and data communication technology have meant that in recent years, everything from manual input, correction, editing, and page layout to page layout has become computer-controlled, and high-speed communications networks and satellite communications have enabled instant delivery to remote locations. Electronic editing systems that can output to terminal printers have been put into practical use. In particular, electronic editing systems are in high demand in the field of newspaper printing, which requires immediacy. Furthermore, even in fields where originals are preserved in the form of original film, and printing plates are reproduced as needed based on this, with the development of ultra-high capacity recording media such as optical discs, the originals are being stored on these recording media. It is thought that it will be stored as digital data.
しかしながら、末端プロッターの出力から直接印刷版を
作成する直接型印刷版はほとんど実用化されておらず、
電子編集システムの稼働しているところでも出力は銀塩
写真フィルムにおこなわれこれをもとに間接的にPS版
へ密着露光により印刷版が作成されているのが実状であ
る。これは、出力プロッターの光源(例えば、He−N
eレーザー、半導体レーザーなど)により実用的な時間
内に印刷版を作成できるだけの高い感度を有する直接型
印刷版の開発が困難であることによる。However, direct printing plates that create printing plates directly from the output of terminal plotters have hardly been put into practical use.
Even in places where electronic editing systems are in operation, the current situation is that output is performed on silver halide photographic film, and based on this, printing plates are indirectly created by contact exposure to PS plates. This is the light source of the output plotter (e.g. He-N
This is because it is difficult to develop a direct printing plate with a sensitivity high enough to make a printing plate within a practical time using e-lasers, semiconductor lasers, etc.).
直接型印刷版を提供し得る高い光感度を有する感光体と
して電子写真感光体が考えられる。Electrophotographic photoreceptors are considered as photoreceptors with high photosensitivity that can provide direct printing plates.
従来、電子写真を利用した印刷版材料(印刷用原版)と
しては例えば、特公昭47−47610号、特公昭48
−40002号、特公昭48−18325号、特公昭5
1−15766号、特公昭51−25761号公報等に
記載の酸化亜鉛−樹脂分散系オフセット印刷版材料が知
られており、これは、電子写真法によりトナー画像形成
後その非画像部を不感脂性とするた給茶感脂化溶液(例
えば、フェロシアン塩又はフェリシアン塩を有する酸性
水溶液)で湿潤させた後使用される。このような処理を
されたオフセント印刷版は耐刷力が5千枚〜1万枚程度
であり、これ以上の印刷には適さず、又不感脂化に適し
た組成にすると静電特製が劣化し、かつ画像が悪化する
などの欠点がある。また、不感脂化溶液として有害なシ
アン化合物を使用する欠点を有する。Conventionally, printing plate materials (printing original plates) using electrophotography include, for example, Japanese Patent Publication No. 47-47610 and Japanese Patent Publication No. 48
-40002, Special Publication No. 18325, Special Publication No. 18325, Special Publication No. 18325
Zinc oxide-resin dispersion offset printing plate materials described in Japanese Patent Publication No. 1-15766 and Japanese Patent Publication No. 51-25761 are known, and after forming a toner image by electrophotography, the non-image area is rendered oil-insensitive. The tea is used after wetting with a fat-sensitizing solution (for example, a ferrocyanate or an acidic aqueous solution containing a ferricyanide). Off-cent printing plates treated in this way have a printing durability of about 5,000 to 10,000 sheets, and are not suitable for printing beyond this, and if the composition is made suitable for desensitization, the electrostatic properties will deteriorate. However, there are also drawbacks such as deterioration of the image. It also has the disadvantage of using harmful cyanide compounds as desensitizing solutions.
特公昭37−17162号、特公昭38−7758号、
特公昭46−39405号、特公昭52−2437号公
報等に記載される有機光導電体樹脂系印刷版材料では、
たとえばオキサゾールあるいはオキサジアゾール系化合
物をスチレン−無水マレイン酸共重合体で結着した光導
電性絶縁層を砂目立したアルミニウム板上に設けた電子
写真感光体が用いられており、この感光体上に電子写真
法によりトナー画像形成後アルカリ性有機溶剤で非画像
部を溶解除去して印刷版が形成される。Special Publication No. 37-17162, Special Publication No. 38-7758,
Organic photoconductor resin printing plate materials described in Japanese Patent Publication No. 46-39405, Japanese Patent Publication No. 52-2437, etc.
For example, an electrophotographic photoreceptor is used in which a photoconductive insulating layer made of an oxazole or oxadiazole compound bound with a styrene-maleic anhydride copolymer is provided on a grained aluminum plate. After forming a toner image on the toner image by electrophotography, a printing plate is formed by dissolving and removing the non-image area with an alkaline organic solvent.
また、特開昭57−147656号にはヒドラゾン化合
物およびバルビッール酸あるいはチオバルビッール酸を
含有する電子写真感光体が開示されている。その他にも
特開昭59−147335号、特開昭59−15245
6号、特開昭59168462号、特開昭58−145
495号等に記載の色素増感された電子写真感光体が知
られている。Further, JP-A-57-147656 discloses an electrophotographic photoreceptor containing a hydrazone compound and barbylic acid or thiobarbylic acid. In addition, JP-A-59-147335, JP-A-59-15245
No. 6, JP 59168462, JP 58-145
Dye-sensitized electrophotographic photoreceptors described in No. 495 and the like are known.
これらの電子写真感光体を用いた平版印刷版を製版する
際、電子写真プロセスによりトナー′画像を形成し、非
画像部を溶解除去した後に、通常流水や循環使用する水
洗水による水洗、更に複数の浴からなる多段水洗での水
洗などが行なわれる。When plate-making a lithographic printing plate using these electrophotographic photoreceptors, a toner image is formed by an electrophotographic process, the non-image area is dissolved and removed, and then washed with running water or recirculated washing water, and then washed several times. Washing is performed in a multi-stage water wash consisting of several baths.
この水洗工程は、現像された印刷版上から現像液成分お
よび感光層溶出成分を除去し、清浄にしてその後の印刷
におけるトラブルの発生を防ぐものである。This water washing step removes developer components and components eluted from the photosensitive layer from the developed printing plate to clean it and prevent troubles during subsequent printing.
しかしながら、水洗浴に持ち込まれた現像液が水洗水に
よって希釈されると、現像液中では溶解、分散していた
感光層成分が析出して異常な不溶物を生じることがしば
しばある。However, when the developer brought into the washing bath is diluted by the washing water, components of the photosensitive layer that have been dissolved and dispersed in the developer often precipitate, producing abnormal insoluble matter.
例えば感光層のバインダー主成分としてよく用いられる
(メタ)アクリル酸系共重合樹脂はアルカリ性現像液中
では溶解しているが、水洗浴中に持ち込まれてpHが低
下すると析出してしまう。For example, a (meth)acrylic acid copolymer resin often used as the main binder component of a photosensitive layer is dissolved in an alkaline developer, but when it is brought into a water washing bath and the pH is lowered, it precipitates.
特に自動現像機等で水洗水を循環使用する方法において
は、水洗水中に生じたこれらの不溶物がスプレィノズル
を詰まらせたり、パイプや槽に付着して、水洗水の循環
に不都合を生じることがしばしばある。Particularly in the method of circulating washing water in automatic processing machines, etc., these insoluble substances generated in the washing water may clog the spray nozzle or adhere to pipes or tanks, causing problems in the circulation of the washing water. is often the case.
更に、この不溶物が印刷版上に付着することにより、非
画像部の汚れを生ずる場合もあった。Furthermore, this insoluble matter may adhere to the printing plate, causing stains in non-image areas.
ところで、水洗水中における不溶物の発生を防ぐために
該水洗水に錯化剤を添加せしめることや水洗水として硬
度100以下の水を用いることが考えられる。By the way, in order to prevent the generation of insoluble matter in the washing water, it is conceivable to add a complexing agent to the washing water or to use water with a hardness of 100 or less as the washing water.
しかしながら、これらの技術は、水洗水中の多価金属イ
オンに起因する不溶物によるトラブルには有効ではある
が、現像液中に溶解分散した感光層成分が水洗水中で異
常な不溶化物を発生することによるトラブルには何ら有
効ではなかった。However, although these techniques are effective for troubles caused by insoluble matter caused by polyvalent metal ions in the washing water, they do not allow the photosensitive layer components dissolved and dispersed in the developer to generate abnormal insolubilized matter in the washing water. It was not effective at all for the trouble caused by.
他方、平版印刷版の非画像部を溶出させるためのエッチ
ンク液成分として珪酸塩が一般に用いられているが、エ
ツチング処理された印刷版によってエツチング浴から水
洗浴へ持ち込まれた珪酸塩が水洗水中でシリカゲルを形
成し、水洗水の循環に支障をきたすことがしばしばあっ
た。On the other hand, silicates are generally used as an etching solution component for eluting the non-image areas of lithographic printing plates, but the silicates carried from the etching bath to the washing bath by the etched printing plate are dissolved in the washing water. It often formed silica gel, which interfered with the circulation of flush water.
また水洗水を循環使用する場合の水洗水のpHは、アル
カリ性エツチング液の持込みにより急速に上昇する。こ
のとき、最終水洗浴のpHが9.5以上になると印刷開
始時、インキ着肉性が劣ったり、印刷汚れを生ずるなど
の影響がみられた。Further, when the washing water is recycled, the pH of the washing water increases rapidly due to the introduction of the alkaline etching solution. At this time, when the pH of the final washing bath was 9.5 or more, there were effects such as poor ink receptivity and printing stains at the start of printing.
従って従来の循環水洗水の寿命は短く、頻繁に新しい水
と交換する必要があった。Therefore, the life of conventional circulating water washing water is short, and it is necessary to frequently replace the water with new water.
別に、界面活性剤やpH緩衝剤を含有するいわゆるリン
ス液を循環使用してエツチング処理後リンス処理する方
法もあり得るが、これにおいても、pHの上昇を抑える
ことは出来ず、処理量には限界があった。Alternatively, there is a method of rinsing after etching by circulating a so-called rinsing solution containing surfactants and pH buffering agents, but even with this method, it is not possible to suppress the increase in pH, and the amount of processing is limited. There was a limit.
従って本発明の目的は、電子写真式平版印刷版の非画像
部の溶出(エツチング処理)後のリンス浴(これ以降、
リンス浴には水洗浴も含む)において異常な不溶物やゲ
ルを生ぜず、長期間にわたり多量の印刷版を安定して製
造できる製版方法を提供することにある。Therefore, an object of the present invention is to provide a rinsing bath (hereinafter referred to as
The purpose of the present invention is to provide a plate-making method that does not produce abnormal insoluble matter or gel in a rinsing bath (including a water washing bath) and can stably produce a large amount of printing plates over a long period of time.
そこで本発明者らは上記のような課題を解決すべく鋭意
検討を重ねた結果、本発明をなすに至ったものである。Therefore, the present inventors have made extensive studies to solve the above-mentioned problems, and as a result, have come up with the present invention.
すなわち、本発明は、画像部が導電性基板上に設けられ
た光導電体層上に電子写真プロセスにより形成されたト
ナー像からなる平版印刷版において、非画像部の除去の
後にリンス処理する平版印刷版の製版方法において、リ
ンス処理を複数のリンス浴で行ない、該リンス浴のpH
を後段になるほど低くなるようにしたことを特徴とする
平版印刷版の製版方法である。That is, the present invention provides a lithographic printing plate in which the image area consists of a toner image formed by an electrophotographic process on a photoconductor layer provided on a conductive substrate, in which the lithographic printing plate is subjected to a rinsing treatment after removing the non-image area. In a method for making a printing plate, rinsing is performed in a plurality of rinsing baths, and the pH of the rinsing baths is
This is a method for making a lithographic printing plate, characterized in that the lithographic printing plate is made lower toward the later stages.
本発明の好ましい実施態様によれば、最初のリンス浴の
pHは10〜13であり、かつ最終リンス浴のp Hは
3〜9、好ましくは6〜9である。According to a preferred embodiment of the invention, the pH of the initial rinsing bath is 10-13 and the pH of the final rinsing bath is 3-9, preferably 6-9.
以下、本発明について詳細に説明する。The present invention will be explained in detail below.
本発明において最も重要な事は、複数のリンス浴のpH
を規定範囲内に収めることであり、それには各種水溶性
化合物がリンス液に添加され、それらは場合により印刷
版の処理量や蒸発量、印刷版による持出量またはリンス
液のpHの上昇などに応じて補充される。The most important thing in the present invention is the pH of multiple rinse baths.
In order to do this, various water-soluble compounds are added to the rinsing solution, which may increase the throughput of the printing plate, the amount of evaporation, the amount taken out by the printing plate, or the pH of the rinsing solution. will be replenished accordingly.
この場合特に緩衝剤を含有させておくことが好ましい。In this case, it is particularly preferable to contain a buffer.
かかる水溶性化合物および緩衝剤の詳細は、例えば「化
学便覧基礎編■」日本化学会綿、昭和47年2月20日
第5刷、丸善株式会社発行、1312〜1320頁に記
載されており、これらはそのまま本発明に使用すること
ができる。好適な酸と水溶性塩としては、モリブデン酸
、硼酸、硝酸、硫酸、燐酸、ポリ燐酸などの無機酸、酢
酸、蓚酸、酒石酸、安息香酸、こはく酸、くえん酸、り
んご酸、乳酸、p−)ルエンスルホン酸などの水溶性有
機酸等の酸とその塩があげられる。より好ましい塩は水
溶性アルカリ金属塩およびアンモニウム塩で、特に好ま
しいものはモリブデン酸アンモニウムなどのモリブデン
酸塩、燐酸ナトリウムなどの燐酸塩、テトラポリ燐酸カ
リウム、トリメタ燐酸す) IJウムなどのポリ燐酸塩
、蓚酸ナトリウムなどの蓚酸塩、酒石酸カリウムなどの
酒石酸塩、こはく酸ナトリウムなどのこはく酸塩、くえ
ん酸アンモニウムなどのくえん酸塩である。これらの化
合物はそれぞれ単独または二種以上組み合わせて使用す
ることができる。またその添加量は特に限定されないが
、該リンス液の総重量に対し酸と塩の総量で約10重量
%以下であることが好ましく、より好ましくは0.01
〜6重量%の範囲で使用される。Details of such water-soluble compounds and buffering agents are described, for example, in "Chemistry Handbook Basic Edition ■", Chemical Society of Japan, February 20, 1971, 5th edition, published by Maruzen Co., Ltd., pages 1312-1320. These can be used as they are in the present invention. Suitable acids and water-soluble salts include inorganic acids such as molybdic acid, boric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, acetic acid, oxalic acid, tartaric acid, benzoic acid, succinic acid, citric acid, malic acid, lactic acid, p- ) Examples include acids such as water-soluble organic acids such as luenesulfonic acid and their salts. More preferred salts are water-soluble alkali metal salts and ammonium salts, and particularly preferred are molybdates such as ammonium molybdate, phosphates such as sodium phosphate, polyphosphates such as potassium tetrapolyphosphate and trimetaphosphate, These are oxalates such as sodium oxalate, tartrates such as potassium tartrate, succinates such as sodium succinate, and citrates such as ammonium citrate. These compounds can be used alone or in combination of two or more. The amount added is not particularly limited, but the total amount of acid and salt is preferably about 10% by weight or less, more preferably 0.01% by weight or less, based on the total weight of the rinse liquid.
It is used in a range of 6% by weight.
本発明に使用されるリンス液には、洗浄性向上、印刷版
の画像部の保護などの目的で界面活性剤を含有させてお
くことが好ましい。The rinsing liquid used in the present invention preferably contains a surfactant for the purpose of improving cleaning properties and protecting the image area of the printing plate.
かかる界面活性剤としては、例えばポリオキシエチレン
アルキルエーテノペポリオキシエチレンアルキルフェニ
ルエーテノペポリオキシエチレン脂肪酸エステル、ソル
ビタン脂肪酸エステノペポリオキシエチレンソルビクン
脂肪酸エステノペグリセリン脂肪酸エステルなどの非イ
オン界面活性剤、例えば脂肪酸塩、アルキル硫酸エステ
ル塩、アルキルベンゼンスルホン酸塩、アルキルナフタ
レンスルホン酸塩、アルキルジフェニルエーテルジスル
ホン酸塩、ジアルキルスルホこはく酸エステル塩、アル
キル燐酸エステル塩、ナフタレンスルホン酸ホルマリン
縮合物、ポリオキシエチレンアルキル硫酸エステル塩な
どのアニオン界面活性剤、および例えばアルキルアミン
塩、第4級アンモニウム塩、ポリオキシエチレンアルキ
ルアミン塩などのカチオン界面活性剤が含まれる。これ
らの内アルキルジフェニルエーテルジスルホン酸塩やナ
フタレンスルホン酸ホルマリン縮合物などのアニオン界
面活性剤が好ましい。上記の界面活性剤は単独もしくは
2種以上組み合わせて使用することができ、リンス液中
に約0.0(11〜10重量%より好ましくは、0.0
1〜2重量%の範囲で使用される。Examples of such surfactants include nonionic surfactants such as polyoxyethylene alkylethenope polyoxyethylene alkyl phenylethenope polyoxyethylene fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbicun fatty acid ester, and ethenope glycerin fatty acid ester. Surfactants, such as fatty acid salts, alkyl sulfate ester salts, alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyldiphenyl ether disulfonates, dialkyl sulfosuccinate ester salts, alkyl phosphate ester salts, naphthalene sulfonic acid formalin condensates, polyesters, Included are anionic surfactants such as oxyethylene alkyl sulfate salts, and cationic surfactants such as alkyl amine salts, quaternary ammonium salts, polyoxyethylene alkyl amine salts. Among these, anionic surfactants such as alkyl diphenyl ether disulfonate and naphthalene sulfonic acid formalin condensate are preferred. The above surfactants can be used alone or in combination of two or more, and about 0.0% (more preferably 0.0% by weight than 11 to 10% by weight) in the rinsing liquid.
It is used in a range of 1 to 2% by weight.
界面活性剤は複数のリンス浴のリンス液の全てに含有さ
せておくことが好ましいが、一部の浴のリンス液に含有
させておくだけでもよい。It is preferable that the surfactant be contained in all of the rinsing liquids of a plurality of rinsing baths, but it may be contained in only the rinsing liquids of some of the baths.
本発明に用いられるリンス液には更に親油性物質を含有
させておくことができる。これにより平版印刷版の画像
部がより高い感脂性を示すようになる。好ましい親油性
物質には、例えばオレイン酸、ラウリン酸、吉草酸、ノ
ニル酸、カプリン酸、ミスチリン酸、パルミチン酸など
の炭素原子数が5〜25の有機カルボン酸、ひまし油な
どが含まれる。これらの親油性物質は単独もしくは2以
上を組み合わせて使用することができ、先に示した界面
活性剤により、可溶化または乳化して含有させられる。The rinse liquid used in the present invention may further contain a lipophilic substance. As a result, the image area of the lithographic printing plate exhibits higher oil sensitivity. Preferred lipophilic substances include, for example, organic carboxylic acids having 5 to 25 carbon atoms such as oleic acid, lauric acid, valeric acid, nonylic acid, capric acid, mystilic acid, palmitic acid, castor oil, and the like. These lipophilic substances can be used alone or in combination of two or more, and are solubilized or emulsified with the above-mentioned surfactant.
これらの親油性物質はリンス液に対し約0.005重量
%から10重量%、より好ましくは0.05〜5重量%
の範囲で含有させられる。These lipophilic substances are about 0.005% to 10% by weight, more preferably 0.05 to 5% by weight of the rinse solution.
It can be contained within the range of .
更に本発明に用いられるリンス液には有機シラン化合物
等の消泡剤を含有させておくことが好ましい。Further, it is preferable that the rinsing liquid used in the present invention contains an antifoaming agent such as an organic silane compound.
本発明において使用する電子写真製版印刷版は後述の電
子写真感光体を用いて公知のプロセスによって作成する
ことが出来る。即ち、暗所で実質的に一様に帯電し、画
像露光により静電潜像を形成する。露光方法としては、
半導体レーザ、He−Neレーザ等による走査露光ある
いはキセノンランプ、タングステンランプ、螢光灯等を
光源として反射画像露光、透明陽画フィルムを通した密
着露光などが挙げられる。次に上記静電潜像をトナーに
よって現像する。現像法としては従来公知の方法、例え
ば、カスケード現像、磁気ブラシ現像、パウダークラウ
ド現像、液体現像などの各種の方法を用いることが出来
る。なかでも液体現像は微細な画像を形成することが可
能であり、印刷版を作成するために好適である。形成さ
れたトナー画像は公知の定着法、例えば、加熱定着、圧
力定着、溶剤定着等により定着することが出来る。The electrophotographic printing plate used in the present invention can be produced by a known process using the electrophotographic photoreceptor described below. That is, it is charged substantially uniformly in a dark place, and an electrostatic latent image is formed by imagewise exposure. As for the exposure method,
Examples include scanning exposure using a semiconductor laser, He--Ne laser, etc., reflection image exposure using a xenon lamp, tungsten lamp, fluorescent lamp, etc. as a light source, and contact exposure using a transparent positive film. Next, the electrostatic latent image is developed with toner. As the developing method, various conventionally known methods such as cascade development, magnetic brush development, powder cloud development, and liquid development can be used. Among these, liquid development is capable of forming fine images and is suitable for creating printing plates. The formed toner image can be fixed by a known fixing method, such as heat fixing, pressure fixing, solvent fixing, or the like.
この様に形成したトナー画像をレジストとして作用させ
、非画像部の光導電層をエツチング液により除去するこ
とにより印刷版が作成できる。A printing plate can be prepared by allowing the toner image thus formed to act as a resist and removing the photoconductive layer in non-image areas with an etching solution.
トナー画像形成後の非画像部の光導電性絶縁層を除去す
るエツチング液としては、光導電性絶縁層を除去できる
ものなら任意の溶剤が使用可能であり、特に限定される
ものではないが、好ましくは、アルカリ性溶剤が使用さ
れる。ここで言う、アルカリ性溶剤とは、アルカリ性化
合物を含有する水溶液もしくは、アルカリ性化合物を含
有する有機溶剤もしくは、アルカリ性化合物を含有する
水溶液と有機溶剤との混合物である。アルカリ性化合物
としては、水酸性す) IJウム、水酸化カリウム、炭
酸ナトリウム、ケイ酸ナトリウム、ケイ酸カリウム、メ
タケイ酸ナトリウム、メタケイ酸カリウム、リン酸ナト
リウム、リン酸カリウム、アンモニア、およびモノエタ
ノールアミン、ジェタノールアミン、トリエタノールア
ミン等のアミノアルコール類等などの有機および無機の
任意のアルカリ性の化合物を挙げることが出来る。エツ
チング液の溶媒としては前述のように、水もしくは多く
の有機溶剤を使用することが出来るが、臭気、公害性の
点から水を主体としたエツチング液が好ましく使用され
る。水を主体としたエツチング液には、必要に応じて、
各種の有機溶剤を添加することも出来る。好ましい有機
溶剤としては、A
メタノーノベエタノール、プロパノーノベブタノール、
ペンジルアルコーノベフェネチルアルコール等の低級ア
ルコールや芳香族アルコールおよびエチレングリコール
、ジエチレングリコール、トリエチレングリコール、ポ
リエチレングリコール、セルソルブ類、およびモノエタ
ノールアミン、ジェタノールアミン、トリエタノールア
ミン等のアミンアルコール類等を挙げることが出来る。As the etching solution for removing the photoconductive insulating layer in the non-image area after toner image formation, any solvent can be used as long as it can remove the photoconductive insulating layer, and is not particularly limited. Preferably, alkaline solvents are used. The alkaline solvent referred to here is an aqueous solution containing an alkaline compound, an organic solvent containing an alkaline compound, or a mixture of an aqueous solution containing an alkaline compound and an organic solvent. Examples of alkaline compounds include hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, potassium silicate, sodium metasilicate, potassium metasilicate, sodium phosphate, potassium phosphate, ammonia, and monoethanolamine, Any organic or inorganic alkaline compounds such as amino alcohols such as jetanolamine and triethanolamine can be mentioned. As mentioned above, water or many organic solvents can be used as the solvent for the etching solution, but from the viewpoint of odor and pollution, an etching solution mainly composed of water is preferably used. For etching liquids based on water, if necessary,
Various organic solvents can also be added. Preferred organic solvents include A methanol, propanobebutanol,
Examples include lower alcohols and aromatic alcohols such as penzyl alcoholobephenethyl alcohol, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, cellosolves, and amine alcohols such as monoethanolamine, jetanolamine, and triethanolamine. I can do it.
本発明に使用されるエツチング液には、更に界面活性剤
を含有させることができる。これによりエツチング液が
電子写真感光体の感光層の表面に良く濡れるようになり
、エツチング液の処理能力(単位容積のエツチング液が
溶解除去できる感光層の量)を向上させることができ、
更に最適な結果を与えるエツチング処理条件(温度およ
び処理時間など)の巾を広げることができる。このよう
な界面活性剤の好ましいものには、アニオン界面活性剤
と両性界面活性剤が含まれる。アニオン界面活性剤の好
ましい具体例には、例えばドデシルベンゼンスルホン酸
ナトリウムのようなアルキルベンセンスルホン酸塩類(
該アルキル基の炭素原子数は8〜18、より好ましくは
12〜16)、例えば、イソプロピルナフタレンスルホ
ン酸ナトリウムのようなアルキルナフタレンスルホン酸
塩類(該アルキル基の炭素数は3〜10)、ナフタレン
スルホン酸塩のホルマリン縮合物、ジアルキルスルホこ
はく酸塩類(該アルキル基の炭素数は2〜18)、ジア
ルキルアミドスルホン酸塩類(該アルキル基の炭素数は
11〜17)などが含まれる。両性界面活性剤の好まし
い具体例には、イミタソリン誘導体、例えばN−アルキ
ル−NN N−トリス(カルボキシメチル)アンモニウ
ム(該アルキル基の炭素数は12〜18)、Nアルキル
−N−カルボキシメチル−NN−ジヒドロキンエチルア
ンモニウム(該アルキル基の数は12〜18)などのベ
クイン型化合物が含まれる。かかる界面活性剤の使用量
は特に制限はないが、−船釣には約0.003〜約3重
量%、より好ましくは0006〜1重景%の濃度でエツ
チング液中に含有させられる。The etching solution used in the present invention may further contain a surfactant. This allows the etching solution to wet the surface of the photosensitive layer of the electrophotographic photoreceptor well, improving the processing ability of the etching solution (the amount of photosensitive layer that can be dissolved and removed by a unit volume of the etching solution).
Furthermore, it is possible to widen the range of etching processing conditions (temperature, processing time, etc.) that provide optimal results. Preferred such surfactants include anionic surfactants and amphoteric surfactants. Preferred examples of anionic surfactants include alkylbenzene sulfonates (such as sodium dodecylbenzene sulfonate)
The number of carbon atoms in the alkyl group is 8 to 18, more preferably 12 to 16), for example, alkylnaphthalene sulfonates such as sodium isopropylnaphthalene sulfonate (the number of carbon atoms in the alkyl group is 3 to 10), naphthalene sulfone These include formalin condensates of acid salts, dialkyl sulfosuccinates (the alkyl group has 2 to 18 carbon atoms), dialkylamide sulfonates (the alkyl group has 11 to 17 carbon atoms), and the like. Preferred specific examples of amphoteric surfactants include imitasoline derivatives, such as N-alkyl-NN N-tris(carboxymethyl)ammonium (the alkyl group has 12 to 18 carbon atoms), N-alkyl-N-carboxymethyl-NN -Vequin-type compounds such as dihydroquinethylammonium (the number of alkyl groups is 12 to 18) are included. The amount of surfactant to be used is not particularly limited, but for boat fishing, it is contained in the etching solution at a concentration of about 0.003 to about 3% by weight, more preferably 0.006 to 1% by weight.
本発明に使用されるエツチング液には、更に、消泡剤を
含有させることができる。好適な消泡剤には、米国特許
第3,250,727号、同第3゜545.970号、
英国特許第1. 382. 901号、同第1,387
,713号などの各明細書に記されている化合物がある
。これらの内でも有機シラン化合物は好ましい。The etching solution used in the present invention may further contain an antifoaming agent. Suitable antifoam agents include U.S. Pat. No. 3,250,727;
British Patent No. 1. 382. No. 901, No. 1,387
There are compounds described in various specifications such as No. 713. Among these, organic silane compounds are preferred.
上記のようなエツチング液で、トナー画像が形成された
電子写真感光体をエツチング処理する方法としては種々
の方法が可能である。具体的には、トナー画像の形成さ
れた感光体をエツチング液中に浸漬する方法、当該感光
体の感光層に対して多数のノズルからエツチング液を噴
射する方法、エツチング液が湿潤されたスポンジで当該
感光体の感光層を拭う方法、当該感光体の感光層の表面
にエツチング液をローラー塗布する方法などが挙げられ
る。またこのようにして感光体の感光層にエツチング液
が施された後、感光層の表面をプランなどで軽く擦るこ
ともできる。エツチング処理条件については、上記のエ
ツチング方法に応じて、当業者が適宜決定することがで
きる。−例を示すと、例えば浸漬によるエツチング方法
では、約15〜35℃のエツチング液に、約YO〜80
秒間ン麦ン責される。Various methods are possible for etching an electrophotographic photoreceptor on which a toner image has been formed using the etching solution as described above. Specifically, methods include immersing a photoreceptor on which a toner image has been formed in an etching solution, spraying the etching solution onto the photosensitive layer of the photoreceptor from a number of nozzles, and using a sponge moistened with the etching solution. Examples include a method of wiping the photosensitive layer of the photoreceptor, a method of applying an etching solution to the surface of the photoreceptor layer of the photoreceptor with a roller, and the like. Further, after the etching solution has been applied to the photosensitive layer of the photoreceptor in this manner, the surface of the photosensitive layer can be lightly rubbed with a plan or the like. Etching processing conditions can be appropriately determined by those skilled in the art depending on the above-described etching method. - For example, in an etching method using immersion, about YO to 80
She is raped for a second.
上記のようにして得られた平版印刷版はスクイズされて
、版面上のエツチング液の量が少なくなる様にすること
が好ましい。本発明においては、スクイーズされた後に
残存する平版印刷版の版面上のエツチング液の量は表裏
両面で20mβ/ m’以下であることが好ましく、こ
の量はできるだけ少ない方が好ましい。従って、より好
ましいエツチング液の残存量は10mβ/ m’以下で
あり、最も好ましくは5mβ/m′以下である。スクイ
ーズされた後の肇が20mβ/ m’よりも多くなると
、本発明で用いるリンス液がより早く劣化するので補充
量を多くする必要があり、廃液処理を含めてランニング
コストアップとなり、好ましくない。The lithographic printing plate obtained as described above is preferably squeezed to reduce the amount of etching solution on the plate surface. In the present invention, the amount of etching solution remaining on the plate surface of the lithographic printing plate after being squeezed is preferably 20 mβ/m' or less on both the front and back surfaces, and it is preferable that this amount is as small as possible. Therefore, the residual amount of the etching solution is more preferably 10 mβ/m' or less, most preferably 5 mβ/m' or less. If the length after squeezing is more than 20 mβ/m', the rinsing liquid used in the present invention deteriorates more quickly, so it is necessary to increase the amount of replenishment, which increases running costs including waste liquid treatment, which is not preferable.
平版印刷版の版面をスクイースする方法としては、例え
はゴムのような弾性部材をローラー表面に被覆した弾性
ローラ一対の間に平版印刷版を通して、そのニップ圧力
によって版面のエツチング液を除去する方法、或いは表
面の滑らかな弾性プラスチック材を平版印刷版の搬送路
に沿わせた状態で配置し、その版面と摺接させることに
より版面の現像液を掻取る方法などを採用することがで
きる。A method for squeezing the plate surface of a planographic printing plate includes, for example, a method in which the plate is passed between a pair of elastic rollers whose surfaces are coated with an elastic member such as rubber, and the etching liquid on the plate surface is removed by the nip pressure. Alternatively, a method may be adopted in which an elastic plastic material with a smooth surface is placed along the transport path of the lithographic printing plate and brought into sliding contact with the plate surface to scrape off the developer from the plate surface.
かくして得られた平版印刷版は、本発明の方法にしたが
ってリンス処理される。具体的な処理方法としては、リ
ンス液が満たされた浴に浸漬する方法、リンス液を版画
にスプレーで噴射する方法、リンス液をローラーで塗布
する方法などがある。The lithographic printing plate thus obtained is rinsed according to the method of the present invention. Specific processing methods include immersion in a bath filled with a rinsing solution, spraying the rinsing solution onto the print, and applying the rinsing solution with a roller.
従来の流水や循環水によるリンスでは、エツチング液に
は溶解、分散していた感光層成分がリンス部で析出して
不溶物を生じていた。例えば(メタ〉アクリル酸系共重
合樹脂を用いた電子写真式平版印刷版を珪酸塩を含むア
ルカリ性エツチング液で処理した場合、感光層の主成分
である(メタ)アクリル酸系共重合樹脂はアルカリ性の
エツチング液には容易に溶解するが、エツチング液が水
で希釈され、pHが低くなった場合析出し、スプレーの
目詰まりやリンス浴の汚れおよび印刷汚れなどの原因と
なっていた。In conventional rinsing with running water or circulating water, components of the photosensitive layer that were dissolved or dispersed in the etching solution precipitate in the rinsing area, producing insoluble matter. For example, when an electrophotographic planographic printing plate using a (meth)acrylic acid copolymer resin is treated with an alkaline etching solution containing a silicate, the (meth)acrylic acid copolymer resin, which is the main component of the photosensitive layer, is alkaline. However, when the etching solution is diluted with water and the pH becomes low, it precipitates, causing clogging of the spray, staining of the rinse bath, and staining of prints.
更に中性付近で強い緩衝作用を示す緩衝剤を含むリンス
液でエツチング液が中和、希釈された場合には珪酸塩が
ゲル化し、寒天状となってリンス液の循環などに支障を
きたした。Furthermore, when the etching solution was neutralized or diluted with a rinsing solution that contained a buffering agent that had a strong buffering effect near neutrality, the silicate gelled and became agar-like, which caused problems in the circulation of the rinsing solution. .
本発明は、リンス処理を複数のリンス浴で行ない、かつ
このリンス浴のpHを後段になるほど低くなるようにし
たことを特徴としている。したがって、本発明によれば
、最初のリンス浴のpHが比較的高く設定されているた
め、持ち込まれたエツチング液が希釈されてもpHが急
激に低下することはない。このため不溶物の析出やシリ
カゲルの生成もなく、長期間にわたり多量の印刷版を安
定して製造することができる。The present invention is characterized in that the rinsing process is performed using a plurality of rinsing baths, and the pH of the rinsing baths is made lower as the process progresses. Therefore, according to the present invention, since the pH of the initial rinsing bath is set relatively high, the pH does not drop suddenly even if the etching solution brought in is diluted. Therefore, there is no precipitation of insoluble matter or the formation of silica gel, and a large quantity of printing plates can be stably produced over a long period of time.
このようにして処理されて得られた平版印刷版は、現像
インク盛り、加筆または消去に代表される修正、ガム引
きなどの種々の工程に供することができ、しかもこれら
のいずれの工程をも、何ら支障なく、効率的に行なうこ
とができる。The lithographic printing plate obtained by processing in this manner can be subjected to various processes such as development ink application, correction such as addition or erasure, and gumming, and any of these processes can be carried out. This can be done efficiently without any problems.
本発明について更に詳細に説明する。The present invention will be explained in more detail.
電子写真感光体に用いられる導電性基板としては、導電
性表面を有するプラスチックシートまたは特に溶剤不透
過性および導電性にした紙、アルミニウム板、亜鉛板、
または銅−アルミニウム板、銅−ステンレス板、クロム
−銅板等のバイメタル板、またはクロム−銅−アルミニ
ウム板、クロム鉛−鉄板、クロム−銅−ステンレス板等
のトライメタル板等の親水性表面を有する導電性基板が
用いられ、その厚さは、0.1〜b
特に0.1〜0.5m+nが好ましい。これらの基板の
中でもアルミニウム板が好適に使用される。本発明にお
いて用いられるアルミニウム板はアルミニウムを主成分
とする純アルミニウムや微量の異原子を含むアルミニウ
ム合金などの板状体であり、その組成が特定されるもの
ではなく公知、公用の素材を適宜使用することが出来る
。Conductive substrates used in electrophotographic photoreceptors include plastic sheets with conductive surfaces or papers made particularly solvent-impermeable and conductive, aluminum plates, zinc plates,
Or has a hydrophilic surface such as a bimetallic plate such as a copper-aluminum plate, a copper-stainless steel plate, a chrome-copper plate, or a tri-metallic plate such as a chromium-copper-aluminum plate, a chrome-lead-iron plate, a chromium-copper-stainless steel plate, etc. A conductive substrate is used, and its thickness is preferably 0.1 to b, particularly 0.1 to 0.5 m+n. Among these substrates, aluminum plates are preferably used. The aluminum plate used in the present invention is a plate-shaped body such as pure aluminum whose main component is aluminum or an aluminum alloy containing a small amount of foreign atoms, and its composition is not specified, and publicly known and publicly used materials are used as appropriate. You can.
このアルミニウム板は公知の方法で砂目立て、陽極酸化
して用いることが出来る。砂目立て処理に先立ってアル
ミニウム板表面の圧延脂を除去するだめに、所望により
界面活性剤またはアルカリ性水溶液による脱脂処理が施
され、砂目立て処理が行われる。砂目立て処理方法には
、機械的に表面を粗面化する方法、電気化学的に表面を
溶解する方法及び化学的に表面を選択溶解させる方法が
ある。機械的に表面を粗面化する方法としては、ボール
研磨法、ブラシ研磨法、ブラスト研磨法、パフ研磨法等
と称せられる公知の方法を用いることが出来る。また電
気化学的な粗面化法としては塩酸または硝酸電解液中で
交流または直流により、行う方法がある。また、特開昭
54−63,902号に開示されている様に両者を組み
合わせた方法も利用できる。This aluminum plate can be used after being grained and anodized using a known method. Prior to the graining treatment, in order to remove rolling grease from the surface of the aluminum plate, degreasing treatment is performed using a surfactant or an alkaline aqueous solution, if desired, and then the graining treatment is performed. Graining treatment methods include a method of mechanically roughening the surface, a method of electrochemically dissolving the surface, and a method of selectively dissolving the surface chemically. As a method for mechanically roughening the surface, known methods such as ball polishing, brush polishing, blast polishing, puff polishing, etc. can be used. Further, as an electrochemical surface roughening method, there is a method in which alternating current or direct current is used in a hydrochloric acid or nitric acid electrolyte. Furthermore, a method combining both methods can also be used, as disclosed in Japanese Patent Application Laid-Open No. 54-63,902.
この様に粗面化されたアルミニウム板は必要に応じてア
ルカリエツチング処理及び中和処理される。The aluminum plate thus roughened is subjected to alkali etching treatment and neutralization treatment as required.
この様に処理されたアルミニウム板は陽極酸化処理され
る。陽極酸化処理に用いられる電解質としては硫酸、燐
酸、蓚酸、クロム酸、あるいはそれらの混酸が用いられ
、それらの電解質やその濃つつ
度は電解質の種類によって適宜法められる。陽極酸化の
処理条件は用いる電解質により種々変わるので、−概に
特定し得ないが、−船釣には電解質の濃度が1〜80重
量%溶液、液温は、5〜70℃、電流密度5〜60A/
dm’、電圧1〜100V、、電解時間10秒〜50分
の範囲に有れば好適である。陽極酸化皮膜量は0.1〜
10g/m’が好適であるが、より好ましくは1〜6
g / m’の範囲である。The aluminum plate thus treated is anodized. As the electrolyte used in the anodizing treatment, sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid thereof is used, and the electrolyte and its concentration are determined as appropriate depending on the type of electrolyte. Since the processing conditions for anodizing vary depending on the electrolyte used, it cannot be generally specified, but for boat fishing, the electrolyte concentration is 1 to 80% by weight, the liquid temperature is 5 to 70°C, and the current density is 5. ~60A/
dm', a voltage of 1 to 100 V, and an electrolysis time of 10 seconds to 50 minutes. The amount of anodic oxide film is 0.1~
10 g/m' is suitable, more preferably 1 to 6
g/m' range.
このようにして得られた導電性基板の上に公知の電子写
真感光層く光導電層)を設けて、電子写真感光体を得る
ことが出来る。A known electrophotographic photosensitive layer (photoconductive layer) is provided on the conductive substrate thus obtained to obtain an electrophotographic photoreceptor.
光導電層に用いる光導電性材料としては従来から知られ
ている数多くの有機または無機の化合物を用いることが
出来る。例えば、公知の分散可能な光導電性材料として
は、セレン、セレン−テルノペ硫化カドミウム、酸化亜
鉛等の無機光導電材料を挙げることが出来る。また、有
機光導電性化合物としては、
1)米国特許第3.112.197号明細書などに記載
されているトリアソール誘導体、2)米国特許第3,1
89.447号明細書などに記載されているオキサジア
ゾール誘導体、3)特公昭37−16,096号公報な
どに記載されているイミダゾール誘導体、
4)米国特許第3,615,402号、同3820.9
89号、同3,542,544号、特公昭45−555
号、同51−10,983号、特開昭51−93,22
4号、同55−108 667号、同55−15695
3号、同56−36゜656号明細書、公報などに記載
のポリアリールアルカン誘導体、
5)米国特許第3,180.729号、同4278.7
46号、特開昭55−88,064号、同55−88,
065号、同4L−105,537号、同55−51.
086号、同56−.80051号、同56−88,1
41号、同57−45.545号、同54−112,6
37号、同55−74,546号明細書、公報などに記
載されているピラゾロン誘導体及びピラゾロン誘導体、
6)米国特許第3,615,404号、特公昭51−1
0,105号、同46−3.712号、同47−28,
336号、特開昭54−83,435号、同54−11
0,836号、同54−119.925号明細書、公報
などに記載されているフェニレンジアミン誘導体、
7)米国特許第3,567.450号、同3,180.
703号、同3,240,597号、同3゜658.5
20号、同4,232,103号、同4.175,96
1号、同4,012,376号西独国特許(DAS)1
,110.518号、特公昭49−35,702号、同
39−27.577号、特開昭55−144.250号
、同56119.132号、同56−22,437号明
細書、公報などに記載されているアリールアミン誘導体
、
8)米国特許第3,526,501号明細書記載のアミ
ノ置換カルコン誘導体、
9)米国特許第3,542,546号明細書などに記載
のN、 N−ビカルバジル誘導体、10)米国特許第
3,257.203号明細書などに記載のオキザソール
誘導体、
11)特開昭56−46,234号令報などに記載のス
チリルアントラセン誘導体、
12)特開昭54−110,837号公報等に記載され
ているフルオレノン誘導体、
13)米国特許第3,717.462号、特開昭54−
59,143号(米国特許第4,150゜987号に対
応)、同55−52,063号、同55−52,064
号、同55−46,760号、同55−85,495号
、同57−11,350号、同57−148,749号
、同57−104144号明細書、公報などに記載され
ているヒトラソン誘導体、
14)米国特許第4,047,948号、同4゜047
.949号、同4,265,990号、同4.273,
846号、同4,299.897号、同4,306,0
08号明細書などに記載のベンジジン誘導体、
15)特開昭58−190,953号、同5995.5
40号、同59−97,148号、同59−195,6
58号、同62−36,674号公報などに記載されて
いるスチルベン誘導体等がある。As the photoconductive material used in the photoconductive layer, many conventionally known organic or inorganic compounds can be used. For example, known dispersible photoconductive materials include inorganic photoconductive materials such as selenium, selenium-ternope cadmium sulfide, and zinc oxide. Further, as organic photoconductive compounds, 1) triazole derivatives described in U.S. Patent No. 3.112.197 etc., 2) U.S. Pat.
3) Imidazole derivatives described in Japanese Patent Publication No. 37-16,096, etc., 4) U.S. Patent No. 3,615,402, 3820.9
No. 89, No. 3,542,544, Special Publication No. 45-555
No. 51-10,983, JP-A-51-93, 22
No. 4, No. 55-108 667, No. 55-15695
Polyarylalkane derivatives described in U.S. Pat. No. 3, No. 56-36゜656, publications, etc.;
No. 46, JP-A No. 55-88,064, JP-A No. 55-88,
No. 065, No. 4L-105, 537, No. 55-51.
No. 086, 56-. No. 80051, 56-88, 1
No. 41, No. 57-45.545, No. 54-112, 6
Pyrazolone derivatives and pyrazolone derivatives described in No. 37, No. 55-74,546, publications, etc.
6) U.S. Patent No. 3,615,404, Special Publication No. 51-1
No. 0,105, No. 46-3.712, No. 47-28,
No. 336, JP-A-54-83,435, JP-A No. 54-11
7) U.S. Pat. No. 3,567.450, U.S. Pat. No. 3,180.
No. 703, No. 3,240,597, No. 3゜658.5
No. 20, No. 4,232,103, No. 4.175,96
No. 1, No. 4,012,376 West German Patent (DAS) 1
, 110.518, JP 49-35,702, JP 39-27.577, JP 55-144.250, JP 56119.132, JP 56-22,437 specifications, publications 8) Amino-substituted chalcone derivatives described in U.S. Patent No. 3,526,501, 9) N, N described in U.S. Patent No. 3,542,546, etc. - Bicalbasil derivatives, 10) Oxazole derivatives described in U.S. Patent No. 3,257.203, etc., 11) Styryl anthracene derivatives described in JP-A-56-46,234, etc., 12) JP-A-54 Fluorenone derivatives described in -110,837, etc., 13) U.S. Patent No. 3,717.462, JP-A-1983-
No. 59,143 (corresponding to U.S. Patent No. 4,150°987), No. 55-52,063, No. 55-52,064
No. 55-46,760, No. 55-85,495, No. 57-11,350, No. 57-148,749, No. 57-104144, specifications, publications, etc. Derivatives, 14) U.S. Patent No. 4,047,948, 4°047
.. No. 949, No. 4,265,990, No. 4.273,
No. 846, No. 4,299.897, No. 4,306,0
Benzidine derivatives described in the specification of No. 08, etc., 15) JP-A-58-190,953, JP-A No. 5995.5
No. 40, No. 59-97,148, No. 59-195,6
Examples include stilbene derivatives described in Japanese Patent No. 58 and Japanese Patent No. 62-36,674.
また、上記のような低分子光導電性化合物の他に、次の
ような高分子化合物も使用することが出来る。Further, in addition to the above-mentioned low-molecular photoconductive compounds, the following high-molecular compounds can also be used.
16〉特公昭34−10.966号公報記載のポリビニ
ルカルバゾール及びその誘導体、17)特公昭43−1
8,674号、同43−19.192号公報記載のポリ
ビニルピレン、ポリビニルアントラセン、ポリ−2−ビ
ニル−4(4′−ジメチルアミノフェニル)−5−フェ
ニルオキサソーノペボリー3−ビニル−N−エチルカル
バゾール等のビニル重合体、
18)特公昭43−19,193号公報記載のポリアセ
ナフチレン、ポリインデン、アセナフチレンとスチレン
の共重合体等の重合体、
19)特公昭56−13,940号公報などに記載のピ
レン−ホルムアルデヒド樹脂、ブロムピレン−ホルムア
ルデヒド樹脂、エチルカルバゾールホルムアルデヒド樹
脂等の縮合樹脂、
20)特開昭56−90,883号、同56−161.
550号公報に記載された各種のトリフェニルメタンポ
リマー、
また、光導電体の感度の向上、望みの感光波長域を持た
せるため等の目的のために、各種の顔料、染料等を使用
することが出来る。これらの例としては、
1)米国特許箱4,436.800号、同4,439.
506号、特開昭47−37543号、同58−123
,541号、同58−192,042号、同58−21
9,263号、同59−78356号、同60−179
,746号、同61148.453号、同61−238
,063号、特公昭60−5941号、同60−45,
664号等に記載されたモノアゾ、ビスアゾ、トリスア
ゾ顔料
2)米国特許箱3.397,086号、同4666.8
02号等に記載の金属フタロシアニンあるいは無金属フ
タロシアニン等のフタロシアニン顔料
3)米国特許箱3,371,884号等に記載のペリレ
ン系顔料
4)英国特許箱2,237,680号等に記載のインジ
ゴ、チオインジゴ誘導体
5)英国特許箱2,237,679号等に記載のキナク
リドン系顔料
6)英国特許箱2,237,678号、特開昭59−1
84,348号、同62−28,738号等に記載の多
環牛ノン系顔料
7)特開昭47−.30,331号等に記載のビスベン
ズイミダゾール系顔料
8)米国特許箱4,396,610号、同4,644.
082号等に記載のスクアリウム塩系顔料9)特開昭箱
5fll−53,850号、同61−212.542号
等に記載のアズレニウム塩系顔料また、増感染料として
は、「増感剤」125頁(講談社819’87)、「電
子写真」 129(1973)r有機合成化学J 2
4 No、111010 (1966)等に記載の公
知の化合物を使用することが出来る。例えば、
10)米国特許箱3,141,770号、同4283.
475号、特公昭第48−25,658号、特開昭62
−71,965号等に記載のピリリウム系染料
11 ) Applied 0ptics Suppl
ement 3 50 (1969)、特開昭50
−39..548号等に記載のトリアリールメタン系染
料
12)米国特許箱3,597,196号等に記載のシア
ニン系染料
13)特開昭60−163,047号、同59164.
588号、同60−252.517号等に記載のスチリ
ル系染料
これらの有機光導電性材料は1種または2種以上を併用
して用いても良い。16> Polyvinylcarbazole and its derivatives described in Japanese Patent Publication No. 34-10.966, 17) Japanese Patent Publication No. 43-1
Polyvinylpyrene, polyvinylanthracene, poly-2-vinyl-4(4'-dimethylaminophenyl)-5-phenyloxasonopeboly-3-vinyl-N described in No. 8,674 and No. 43-19.192 -Vinyl polymers such as ethylcarbazole, 18) Polymers such as polyacenaphthylene, polyindene, and copolymers of acenaphthylene and styrene described in Japanese Patent Publication No. 1988-19193, 19) Japanese Patent Publication No. 1986-19940 Condensation resins such as pyrene-formaldehyde resin, brompyrene-formaldehyde resin, and ethylcarbazole formaldehyde resin described in JP-A-56-90,883 and JP-A-56-161.
The various triphenylmethane polymers described in Publication No. 550, and the use of various pigments, dyes, etc., for purposes such as improving the sensitivity of the photoconductor and giving it a desired photosensitive wavelength range. I can do it. Examples of these are: 1) U.S. Patent No. 4,436.800;
No. 506, JP-A-47-37543, JP-A No. 58-123
, No. 541, No. 58-192,042, No. 58-21
No. 9,263, No. 59-78356, No. 60-179
, No. 746, No. 61148.453, No. 61-238
, No. 063, Special Publication No. 60-5941, No. 60-45,
Monoazo, bisazo, and trisazo pigments described in U.S. Patent No. 664, etc. 2) U.S. Pat.
Phthalocyanine pigments such as metal phthalocyanine or metal-free phthalocyanine described in US Pat. , thioindigo derivatives 5) Quinacridone pigments described in British Patent Box No. 2,237,679 etc. 6) British Patent Box No. 2,237,678, JP-A-59-1
Polycyclic bovine non-based pigments described in No. 84,348, No. 62-28,738, etc. 7) JP-A-47-. 8) Bisbenzimidazole pigments described in U.S. Pat. Nos. 30,331 and 8) U.S. Pat.
Squarium salt pigments described in JP-A No. 082, etc.; 9) Azlenium salt-based pigments, described in JP-A No. 5FLL-53,850, JP-A No. 61-212.542, etc.; "Page 125 (Kodansha 819'87), "Electron Photography" 129 (1973) r Organic Synthetic Chemistry J 2
4 No. 111010 (1966) and the like can be used. For example, 10) U.S. Pat. No. 3,141,770, U.S. Pat. No. 4,283.
No. 475, Special Publication No. 48-25,658, Japanese Patent Application Publication No. 62
Pyrylium-based dyes described in No.-71,965 etc. 11) Applied Optics Supplement
ement 3 50 (1969), Japanese Patent Application Publication No. 1973
-39. .. 12) Cyanine dyes described in U.S. Pat.
Styryl dyes described in No. 588, No. 60-252.517, etc. These organic photoconductive materials may be used alone or in combination of two or more.
本発明の光導電層には、感度向上などの目的として、例
えば、トリニトロフルオレノン、クロラニル、テトラシ
アノエチレン等の電子吸引性化合物、特開昭58−65
,439号、同58−10n
2.239号、同58−129.439号、同62−7
1,965号等に記載の化合物等を挙げることが出来る
。For the purpose of improving sensitivity, the photoconductive layer of the present invention may contain electron-withdrawing compounds such as trinitrofluorenone, chloranil, tetracyanoethylene, etc.
, No. 439, No. 58-10n 2.239, No. 58-129.439, No. 62-7
Examples include compounds described in No. 1,965 and the like.
電子写真製版用感光体においては、光導電性化合物自体
が皮膜性を有する場合があるが、光導電性化合物が皮膜
性を有さない場合は結合樹脂を用いることが出来る。結
合樹脂としては、電子写真の分野で公知の樹脂を使用す
ることが出来る。電子写真製版用感光体を用いて印刷版
を作成するには、最終的に非画像部の光導電層を除去す
る必要があるが、このプロセスは、光導電層のエツチン
グ液に対する溶解性あるいはトナー像のエツチング液に
対するレジスト性などの相対的な関係によって決まるた
め、−概に言うことは出来ない。結合樹脂としては、前
述のエツチング液に可溶または分散可能な高分子化合物
が好ましい。In a photoreceptor for electrophotographic engraving, the photoconductive compound itself may have film properties, but if the photoconductive compound does not have film properties, a binding resin can be used. As the binding resin, resins known in the field of electrophotography can be used. In order to create a printing plate using a photoreceptor for electrophotographic engraving, it is necessary to finally remove the photoconductive layer in the non-image area, but this process is difficult due to the solubility of the photoconductive layer in the etching solution or the It is impossible to make general statements because it depends on the relative relationship between the image and the etching solution, such as its resistivity. As the binding resin, a polymer compound that is soluble or dispersible in the above-mentioned etching solution is preferred.
具体的には、例えば、スチレンと無水マレイン酸の共重
合体、スチレンと無水マレイン酸モノアルキルエステル
の共重合体、メタクリル酸/メタクリル酸エステル共重
合体、スチレン/メタクリル酸/メタクリル酸エステル
共重合体、アクリル酸/メタクリル酸エステル共重合体
、スチレン/アクリル酸/メタクリル酸エステル共重合
体、酢酸ビニル/クロトン酸共重合体、酢酸ビニル/ク
ロトン酸/メタクリル酸エステル共重合体等のアクリル
酸エステル、メタクリル酸エステル、スチレン、酢酸ビ
ニルなどとアクリル酸、メタクリル酸、イクコン酸、ク
ロトン酸、マレイン酸、無水マレイン酸、フマル酸など
のカルボン酸含有モノマーあるいは酸無水物基含有モノ
マーとの共重合体やメタクリル酸アミド、ビニルピロリ
ドン、フェノール性水酸基、スルホン酸基、スルホンア
ミド基、スルホンイミド基をもつ単量体を含有する共重
合体、フェノール樹脂、部分ケン化酢酸ビニル樹脂、キ
ンレン樹脂、ポリビニルブチラール等のビニルアセクー
ル樹脂をあげることができる。Specifically, for example, a copolymer of styrene and maleic anhydride, a copolymer of styrene and monoalkyl maleic anhydride, a methacrylic acid/methacrylic ester copolymer, a styrene/methacrylic acid/methacrylic ester copolymer Acrylic acid esters such as acrylic acid/methacrylic acid ester copolymer, styrene/acrylic acid/methacrylic acid ester copolymer, vinyl acetate/crotonic acid copolymer, vinyl acetate/crotonic acid/methacrylic acid ester copolymer, etc. , methacrylic acid esters, styrene, vinyl acetate, etc., and copolymers with carboxylic acid-containing monomers or acid anhydride group-containing monomers such as acrylic acid, methacrylic acid, iconic acid, crotonic acid, maleic acid, maleic anhydride, fumaric acid, etc. and methacrylic acid amide, vinylpyrrolidone, copolymers containing monomers with phenolic hydroxyl groups, sulfonic acid groups, sulfonamide groups, and sulfonimide groups, phenolic resins, partially saponified vinyl acetate resins, quinolene resins, polyvinyl butyral Examples include vinyl acecool resins such as
酸無水物基またはカルボン酸基を有するモノマーを共重
合成分として含有する共重合体、およびフェノール樹脂
は、電子写真製版用感光体としたときの光導電層の電荷
保持力が高く、好結果をもって使用することができる。A copolymer containing a monomer having an acid anhydride group or a carboxylic acid group as a copolymerization component, and a phenol resin have a high charge retention ability of the photoconductive layer when used as a photoreceptor for electrophotolithography, and have good results. can be used.
酸無水物基を有するモノマーを共重合成分として含有す
る共重合体としては、スチレンと無水マレイン酸の共重
合体が好ましい。また、この共重合体のハーフエステル
も使用することができる。As the copolymer containing a monomer having an acid anhydride group as a copolymerization component, a copolymer of styrene and maleic anhydride is preferable. Half esters of this copolymer can also be used.
カルボン酸基を有するモノマーを共重合成分として含有
する共重合体としては、アクリル酸もしくはメタクリル
酸と、アクリル酸もしくはメタクリル酸のアルキルエス
テル、アリールエステルもしくはアラルキルエステルと
の2元以上の共重合体が好ましい。また、酢酸ビニルと
クロトン酸共重合体、酢酸ビニルと炭素数2〜18のカ
ルボン酸のビニルエステルとクロトン酸との3元共重合
体も好ましい例である。フェノール樹脂の中で特に好ま
しいものとしては、フェノール、O−クレゾール、m−
クレゾールまたはp−クレゾールとホルムアルデヒドま
たはアセトアルデヒドとを酸性条件下で縮合させて得ら
れるノボラック樹脂をあげることができる。結合樹脂は
単独で、あるいは2種以上混合して用いても良い。As a copolymer containing a monomer having a carboxylic acid group as a copolymerization component, a copolymer of two or more elements of acrylic acid or methacrylic acid and an alkyl ester, aryl ester or aralkyl ester of acrylic acid or methacrylic acid is used. preferable. Further, preferable examples include a copolymer of vinyl acetate and crotonic acid, and a terpolymer of vinyl acetate, a vinyl ester of a carboxylic acid having 2 to 18 carbon atoms, and crotonic acid. Particularly preferred among the phenolic resins are phenol, O-cresol, m-
Examples include novolac resins obtained by condensing cresol or p-cresol with formaldehyde or acetaldehyde under acidic conditions. The binding resin may be used alone or in combination of two or more.
光導電性化合物と結合樹脂を用いる場合は、光導電性化
合物の含有量が少ないと感度が低下するため、結合樹脂
1重量部に対して光導電性化合物は、0.05重量部以
上、より好ましくは0.1重量部以上の範囲で使用する
ことが出来る。また光導電層の膜厚は、薄すぎると現像
に必要な電荷が帯電できず、厚すぎるとエンチングの際
にザイドエツチと称する平面方向のエンチングを起こし
て良好な画像を得られず、0.1〜30μ、より好まし
くは05〜10μで使用できる。When using a photoconductive compound and a binding resin, the sensitivity decreases if the content of the photoconductive compound is small, so the amount of the photoconductive compound should be 0.05 part by weight or more per 1 part by weight of the binding resin. Preferably, it can be used in an amount of 0.1 part by weight or more. Furthermore, if the thickness of the photoconductive layer is too thin, it will not be able to charge the charge necessary for development, and if it is too thick, etching in the plane direction called "Zide etch" will occur during etching, making it impossible to obtain a good image. -30μ, more preferably 05-10μ can be used.
本発明の電子写真製版用印刷版は常法に従って光導電層
を導電性基板上に塗布することによって得られる。光導
電層の作成に当たっては、光導電層を構成する成分を同
一層中に含有させる方法、あるいは二層以上の層に分離
して含有させる方法、例えば電荷担体発生物質と電荷担
体輸送物質を異なる層に分離して用いる方法等が知られ
ており、いずれの方法にても作成することが出来る。塗
布液は、光導電層を構成する各成分を適当な溶媒に溶解
し、作成するが、顔料などの溶媒に不溶な成分を用いる
ときは、ボールミル、ペイントシェーカー、グイノミノ
ベアトライター等の分散機により粒径5μ〜0.1μに
分散して用いる。光導電層に使用する結合樹脂、その他
の添加剤は顔料などの分散時、あるいは分散後に添加す
ることが出来る。この様にして作成した塗布液を回転塗
布、ブレード塗布、ナイフ塗布、リバースロール塗布、
デイツプ塗布、ロッドバー塗布、スプレー塗布の様な公
知の方法で基体上に塗布乾燥して電子写真製版用印刷版
を得ることが出来る。塗布液を作成する溶媒としては、
ジクロロメタン、ジクロロエタン、クロロフォルム等の
ハロゲン化炭化水素類、メタノーノペエタノール等のア
ルコール類、アセトン、メチルエチルケトン、シクロヘ
キサノン等のケトン類、エチレングリコールモノメチル
エーテル、2−メトキシエチルアセテート等のグリコー
ルエーテル類、テトラヒドロフラン、ジオキサン等のエ
ーテル類、酢酸エチル、酢酸ブチル等のエステル類等が
挙げられる。The electrophotographic printing plate of the present invention can be obtained by coating a photoconductive layer on a conductive substrate according to a conventional method. When creating a photoconductive layer, the components constituting the photoconductive layer can be contained in the same layer, or they can be contained separately in two or more layers, for example, by using different charge carrier generating substances and charge carrier transporting substances. There are known methods for separating the layer into layers, and it can be produced by any of these methods. The coating solution is prepared by dissolving each component constituting the photoconductive layer in an appropriate solvent, but when using components that are insoluble in solvents such as pigments, use a dispersion machine such as a ball mill, paint shaker, or Guinino Beat Lighter. It is used after being dispersed to a particle size of 5 μm to 0.1 μm. The binding resin and other additives used in the photoconductive layer can be added during or after dispersing the pigment. The coating liquid prepared in this way can be applied by spin coating, blade coating, knife coating, reverse roll coating,
A printing plate for electrophotolithography can be obtained by coating and drying on a substrate by a known method such as dip coating, rod bar coating, or spray coating. As a solvent for creating a coating solution,
Halogenated hydrocarbons such as dichloromethane, dichloroethane and chloroform, alcohols such as methanol, ketones such as acetone, methyl ethyl ketone and cyclohexanone, glycol ethers such as ethylene glycol monomethyl ether and 2-methoxyethyl acetate, tetrahydrofuran, Examples include ethers such as dioxane, and esters such as ethyl acetate and butyl acetate.
光導電層には光導電性化合物、結合樹脂の他に光導電層
の柔軟性、塗布面状などの膜物性を改良する目的で、必
要に応じて、可塑剤、界面活性剤、その他の添加剤を加
えることが出来る。可塑剤としては、ビフェニル、塩化
ビフェニル、0−テルフェニノベp−テルフェニル、ジ
ブチルフタレート、ジメチルグリコールフタレート、ジ
オクチルフタレート、トリフェニル燐酸等が挙げられる
。In addition to the photoconductive compound and the binding resin, the photoconductive layer may contain plasticizers, surfactants, and other additives as necessary to improve the film properties such as flexibility and coating surface condition of the photoconductive layer. agent can be added. Examples of the plasticizer include biphenyl, biphenyl chloride, 0-terphenyl p-terphenyl, dibutyl phthalate, dimethyl glycol phthalate, dioctyl phthalate, triphenyl phosphoric acid, and the like.
画像部を形成するトナーは前記エツチング液に対してレ
ジスト性を有する樹脂成分を含有していることが好まし
い。樹脂成分としては例えば、メタクリル酸、メタクリ
ル酸エステルなどを用いたアクリル樹脂、酢酸ビニル樹
脂、酢酸ビニルとエチレン又は塩化ビニルなどの共重合
体、塩化ビニル樹脂、塩化ビニリデン樹脂、ポリビニル
ブチラールのようなビニルアセクール樹脂、ポリスチレ
ン、スチレンとブタジェン、メタクリル酸エステルなど
の共重合物、ポリエチレン、ポリプロピレン及びその塩
素化物、ポリエステル樹脂(例、ポリエチレンテレフタ
レート、ポリエチレンイソフタレート、ビスフェノール
Aのポリカルボネート)、ポリアミド樹脂(例、ポリカ
プラミド、ポリへキサメチレンアジボアミド、ポリへキ
サメチレンセバカミド)、フェノール樹脂、キシレン樹
脂、アルキッド樹脂、ビニル変性アルキッド樹脂、ゼラ
チン、カルボキシメチルセルロースなどのセルロースエ
ステル誘導体、ワックス、ポリオレフィン、ろうなどが
ある。It is preferable that the toner forming the image area contains a resin component having resist properties to the etching solution. Examples of resin components include acrylic resins using methacrylic acid, methacrylic acid esters, etc., vinyl acetate resins, copolymers of vinyl acetate and ethylene or vinyl chloride, vinyl chloride resins, vinylidene chloride resins, and vinyls such as polyvinyl butyral. Acecool resin, polystyrene, copolymers of styrene and butadiene, methacrylic esters, etc., polyethylene, polypropylene and its chlorinated products, polyester resins (e.g., polyethylene terephthalate, polyethylene isophthalate, polycarbonate of bisphenol A), polyamide resins ( e.g., polycapramide, polyhexamethylene adiboamide, polyhexamethylene sebamide), phenolic resins, xylene resins, alkyd resins, vinyl-modified alkyd resins, gelatin, cellulose ester derivatives such as carboxymethyl cellulose, waxes, polyolefins, and waxes. and so on.
本発明に使用する電子写真製版用感光体においては、前
記導電性基板と光導電層の間に必要によりカゼイン、ポ
リビニルアルコーノペエチルセルロース、フェノール樹
脂、スチレン−無水マレイン酸共重合体、ポリアクリル
酸、モノエタノールアミン、ジェタノールアミン、トリ
メタノールアミン、トリプロパツールアミン、トリエタ
ノールアミン及びそれらの塩酸塩、蓚酸塩、燐酸塩、ア
ミノ酢酸、アラニン等のモノアミノモノカルボン酸;例
えばセリン、スレオニン、ジヒドロキシエチルグリシン
等のオキシアミノ酸;例えばシスティン、シスチン等の
硫黄を含むアミノ酸;例えばアスパラギン酸、グルタミ
ン酸等のモノアミノジカルボン酸;例えばリシン等のジ
アミノモノカルボン酸;例えばp−ヒドロキシフェニル
グリシン、フェニルアラニン、アントラニル酸等の芳香
族核をもつアミノ酸;例えばトリプトファン、ゾロリン
等の複素環をもつアミノ酸;例えばスルファミン酸、シ
クロへキシルスルファミン酸等の脂肪族アミノスルホン
酸;例えばエチレンジアミン四酢酸、ニトリロ三酢酸、
イミノニ酢酸、ヒドロキシエチルイミノニ酢酸、ヒドロ
キシエチルエチレンジアミン三酢酸、エチレンジアミン
ニ酢酸、シクロヘキサンジアミン四酢酸、ジエチレント
リアミン五酢酸、グリコールエーテルジアミン四酢酸等
の(ポリ)アミノポリ酢酸;およびこれらの化合物の酸
基の1部又は全部がす) IJウム塩、カリウム塩、ア
ンモニウム塩などからなる中間層を前記基板と光導電層
との接着性、光導電層の静電特性、溶出性および/又は
印刷特性を改良する目的で設けることができる。In the electrophotographic photoreceptor used in the present invention, casein, polyvinylalconopethyl cellulose, phenol resin, styrene-maleic anhydride copolymer, polyacrylic acid, etc. are optionally added between the conductive substrate and the photoconductive layer. , monoethanolamine, jetanolamine, trimethanolamine, tripropaturamine, triethanolamine and their hydrochlorides, oxalates, phosphates, aminoacetic acid, monoamino monocarboxylic acids such as alanine; for example, serine, threonine, Oxyamino acids such as dihydroxyethylglycine; Sulfur-containing amino acids such as cysteine and cystine; Monoamino dicarboxylic acids such as aspartic acid and glutamic acid; Diaminomonocarboxylic acids such as lysine; such as p-hydroxyphenylglycine, phenylalanine, anthranils Amino acids with an aromatic nucleus such as acids; Amino acids with a heterocycle such as tryptophan and zololine; Aliphatic aminosulfonic acids such as sulfamic acid and cyclohexylsulfamic acid; For example, ethylenediaminetetraacetic acid, nitrilotriacetic acid,
(Poly)aminopolyacetic acids such as iminodiacetic acid, hydroxyethyliminodiacetic acid, hydroxyethylethylenediaminetriacetic acid, ethylenediaminediacetic acid, cyclohexanediaminetetraacetic acid, diethylenetriaminepentaacetic acid, glycol etherdiaminetetraacetic acid; and one of the acid groups of these compounds (Partial or total removal) An intermediate layer made of IJum salt, potassium salt, ammonium salt, etc. is used to improve the adhesion between the substrate and the photoconductive layer, the electrostatic properties, elution properties, and/or printing properties of the photoconductive layer. It can be provided for any purpose.
また、光導電層上に必要により光導電層の静電\
特性、トナー現像時の現像特性、あるいは画像部性を改
良する目的で光導電層除去時に溶解し得るオーバーコー
ト層を設けることができる。このオーバーコート層は、
機械的にマット化されたもの、あるいはマット剤が含有
される樹脂層であってもよい。マット剤としては二酸化
珪素、酸化亜鉛、酸化チタン、酸化ジルコニウム、ガラ
ス粒子、アルミナ、澱粉、重合体粒子(たとえばポリメ
チルメタアクリレート、ポリスチレン、フェノール樹脂
などの粒子)及び米国特許第2. 710. 245号
明細書、米国特許第2,992,101号明細書に記載
されているマット剤が含まれる。これらは二種以上併用
することができる。マット剤を含有する樹脂層に使用さ
れる樹脂は使用されるエツチング液との組み合わせによ
り、適宜選択される。具体的には例えばアラビアゴム、
ニカワ、ゼラチン、カゼイン、セルローズ類(たとえば
ビスコース、メチルセルローズ、エチルセルローズ、ヒ
ドロキシエチルセルローズ、ヒドロキンプロピルメチル
セルローズ、カルボキンメチルセルローズ等)、澱粉類
(例えば可溶性澱粉、変性澱粉等)、ポリビニルアルコ
ーノペポリエチレンオキシド、ポリアクリル酸、ポリア
クリルアミド、ポリビニルメチルエーテル、エポキシ樹
脂、フェノール樹脂(特にノボラック型フェノール樹脂
が好ましい)、ポリアミド、ポリビニルブチラール等が
ある。これらは二種以上併用することができる。Furthermore, an overcoat layer that can be dissolved when the photoconductive layer is removed can be provided on the photoconductive layer, if necessary, for the purpose of improving the electrostatic properties of the photoconductive layer, the development properties during toner development, or the image quality. . This overcoat layer is
It may be a mechanically matted layer or a resin layer containing a matting agent. As matting agents, silicon dioxide, zinc oxide, titanium oxide, zirconium oxide, glass particles, alumina, starch, polymer particles (for example, particles of polymethyl methacrylate, polystyrene, phenolic resin, etc.) and US Pat. 710. 245 and U.S. Pat. No. 2,992,101. Two or more of these can be used in combination. The resin used in the resin layer containing the matting agent is appropriately selected depending on the combination with the etching solution used. Specifically, for example, gum arabic,
Glue, gelatin, casein, celluloses (e.g., viscose, methylcellulose, ethylcellulose, hydroxyethylcellulose, hydroquinepropylmethylcellulose, carboxylmethylcellulose, etc.), starches (e.g., soluble starch, modified starch, etc.), polyvinyl alcohol Examples include polyethylene oxide, polyacrylic acid, polyacrylamide, polyvinyl methyl ether, epoxy resin, phenol resin (novolak type phenol resin is particularly preferred), polyamide, polyvinyl butyral, and the like. Two or more of these can be used in combination.
(実施例)
本発明を実施例により更に具体的に説明するが、本発明
はその主旨を越えない限り以下の実施例に限定されるも
のではない。なお、実施例において部又は%はすべで重
量部又は重量%を示す。(Examples) The present invention will be explained in more detail by Examples, but the present invention is not limited to the following Examples unless the gist thereof is exceeded. In addition, in the examples, all parts or % indicate parts by weight or % by weight.
実施例I
JIS1050アルミニウムシートをパミス水懸濁液を
研磨剤として、回転ナイロンブラシで表面を砂目立てし
た。この時の表面粗さ(中心線平均粗さ)は0. 5μ
であった。水洗後、70℃の10%苛性ソーダ水溶液に
浸漬しアルミニウムの溶解予が6 g / m’になる
ようにエツチングした。Example I The surface of a JIS1050 aluminum sheet was grained using a rotating nylon brush using a pumice water suspension as an abrasive. The surface roughness (center line average roughness) at this time is 0. 5μ
Met. After washing with water, it was immersed in a 10% caustic soda aqueous solution at 70°C and etched so that the aluminum dissolution rate was 6 g/m'.
水洗後、30%硝酸水溶液に1分間浸漬することにより
中和し、十分水洗した。その後、0. 7%硝酸水溶液
中で、陽極特電圧13ボルト、陰極特電圧6ポルトの矩
形波交番波形を用いて(特公昭55−19.191号に
記載>20秒間電電解面化を行い、20%硫酸の50℃
溶液中に浸漬して表面を洗浄した後、水洗した。更に、
20%硫酸水溶液中で陽極酸化皮膜重量が3.Og/m
’となるように陽極酸化処理を施して、水洗、乾燥する
ことにより、基板を作成した。After washing with water, it was neutralized by immersing it in a 30% nitric acid aqueous solution for 1 minute, and was thoroughly washed with water. Then 0. In a 7% nitric acid aqueous solution, electrolytic surface treatment was performed for 20 seconds using a square wave alternating waveform with an anode special voltage of 13 volts and a cathode special voltage of 6 volts (described in Japanese Patent Publication No. 1987-19191), and 20% sulfuric acid. 50℃
After washing the surface by immersing it in a solution, it was washed with water. Furthermore,
The weight of the anodized film in 20% sulfuric acid aqueous solution is 3. Og/m
A substrate was prepared by performing anodizing treatment so that the result was ', washing with water, and drying.
この基板上に下記の光導電層用塗布液をバーコーターで
塗布、120℃、10分間乾燥し電子写真製版用感光体
を作成した。The following photoconductive layer coating solution was applied onto this substrate using a bar coater and dried at 120° C. for 10 minutes to prepare a photoreceptor for electrophotographic engraving.
光導電層用塗布液
下記に示すヒドラゾン
化合物
25部
ベンジルメタクリレートと
メタクリル酸の共重合体
(メタクリル酸30モル%) 75部下記
のチオピIJ IJウム塩化合物 1.18部ut
\
メチレンクロライド 510部メチルセ
ルンルフアセテート 150部このようにして作
成した電子写真製版用感光体の乾燥膜厚は4μであった
。Coating liquid for photoconductive layer 25 parts of the hydrazone compound shown below 75 parts of a copolymer of benzyl methacrylate and methacrylic acid (30 mol% methacrylic acid) 1.18 parts of the following thiopi-IJ salt compound \ 510 parts of methyl Cerunulf acetate 150 parts The dry film thickness of the electrophotographic photoreceptor thus prepared was 4 μm.
次に、この試料を暗所でコロナ帯電機により表面電位+
400Vに帯電した後タングステン光で露光し、液体現
像剤リコーMRP(IJコー■)で現像することにより
、鮮明なポジ画像を得る事が出来た。更に、作成した画
像を120℃で2分間加熱し、トナー画像を定着した。Next, this sample was charged with a surface potential of ++ using a corona charger in a dark place.
After being charged to 400 V, it was exposed to tungsten light and developed with a liquid developer Ricoh MRP (IJ Co.), making it possible to obtain a clear positive image. Further, the created image was heated at 120° C. for 2 minutes to fix the toner image.
次に下記に示すような自動処理機、エツチング液および
水洗水によりエツチング処理を行った。Next, an etching process was performed using an automatic processing machine as shown below, an etching solution, and washing water.
(1)自動処理機
エツチング浴とそれに続く2つのリンス浴からなり、電
子写真現像処理済みの平版印刷版を水平搬送する駆動装
置と、各処理浴の処理液を貯溜槽→ポンプ→スプレー→
ノズル貯溜槽と循環させる装置および各処理浴への補充
装置を有する自動処理機であり、各処理浴の貯溜槽はオ
ーバーフローにより過剰の処理液を排出する機構となっ
ている。(1) Automatic processing machine Consists of an etching bath and two subsequent rinsing baths; a drive device that horizontally transports the electrophotographically developed lithographic printing plate; and a storage tank for transporting the processing liquid from each processing bath → pump → spray →
This is an automatic processing machine that has a nozzle storage tank, a circulation device, and a replenishment device for each processing bath, and the storage tank of each processing bath has a mechanism to discharge excess processing liquid by overflow.
(2)エツチング液 下記エツチング液をエツチング浴槽に投入した。(2) Etching liquid The following etching solution was put into an etching bath.
ケイ酸カリウム 40部水酸化カ
リウム 10部エタノール
100部純水 80
0部
(3)第一リンス液
下記組成からなるリンス液(pH10,7)81を第一
リンス浴に仕込み1003mmX800mmの印刷版を
1版処理する毎に40m1のリンス液を補充した(第一
リンス浴の貯溜槽は81でオーバーフローする構造にな
っている)。Potassium silicate 40 parts Potassium hydroxide 10 parts Ethanol
100 parts pure water 80
0 parts (3) First rinsing solution A rinsing solution (pH 10,7) 81 consisting of the following composition was put into the first rinsing bath, and 40 ml of the rinsing solution was replenished every time one 1003 mm x 800 mm printing plate was processed. The bath storage tank is designed to overflow at 81).
(組 成)
リン酸−水酸化ナトリウム
(pH10,7の緩衝液) ・・・・・・・・・100
0gドデシルジフェニルエーテル
ジスルホン酸ナトリウム ・・・・・・・・・ 10
g(4)第二リンス液
下記組成からなるリンス液(pH6,5)8βを第二リ
ンス液に仕込み1003mmX800+n+nの印刷版
を1版処理する毎に40rrlの第二リンス液を補充し
た(第二リンス浴も8f!、でオーバーフローする構造
を有する)。(Composition) Phosphoric acid-sodium hydroxide (buffer solution of pH 10.7) ・・・・・・・・・100
0g Sodium dodecyl diphenyl ether disulfonate 10
g (4) Second rinsing solution A rinsing solution (pH 6,5) 8β having the following composition was added to the second rinsing solution, and 40 rrl of the second rinsing solution was replenished every time a 1003 mm x 800 + n + n printing plate was processed. The rinse bath also has a structure that overflows at 8f!).
(組 成)
ドデシルフェニルエーテルジスルホン
酸ナトリウム(40重量%水溶液)
・ 10g
燐酸−水酸化ナトリウム水溶液
(pH6,5の緩衝液) ・・・・・・1000g
以上の条件で1003mmX800+++n+のサイズ
の平版印刷版60枚を連続して処理しても第1.2リン
ス浴共に異常なカスやゲルを生ずることはなく、1板目
から60版口の印刷版すべてにわたって非画像部汚れな
どの故障はみられなかった。(Composition) Sodium dodecyl phenyl ether disulfonate (40% by weight aqueous solution) 10 g Phosphoric acid-sodium hydroxide aqueous solution (buffer solution with pH 6.5) 1000 g
Even when 60 lithographic printing plates of size 1003mm x 800+++n+ were processed continuously under the above conditions, no abnormal scum or gel was produced in the 1st and 2nd rinsing baths, and all printing plates from the 1st plate to the 60th plate opening were processed. Over the years, no malfunctions such as stains in non-image areas were observed.
尚、80枚処理した後の、第1および第2リンス液のp
Hはそれぞれ12.2.7.3であった。In addition, after processing 80 sheets, the p of the first and second rinsing liquids
H was 12.2.7.3, respectively.
比較例1
第一リンス浴、第二リンス浴ともに、水道水を各8βず
つ仕込み、処理に応じた補充をしなかった他は全て実施
例1と同じ条件で処理したところ、10枚処理したとこ
ろで第一リンス液に異常な不溶物が浮遊しはじめ、15
枚目の印刷版上の非画像部に付着し、オフセット印刷機
にかけて印刷したところその部分に汚れを生じた。Comparative Example 1 Both the first rinsing bath and the second rinsing bath were treated under the same conditions as in Example 1, except that 8β of tap water was added to each and no replenishment was made depending on the treatment. After 10 sheets were processed, Abnormal insoluble matter began to float in the first rinsing solution, and 15
It adhered to the non-image area on the printing plate, and when it was printed on an offset printing machine, stains appeared in that area.
更に続けて処理を行ったところ、70枚目ごろから印刷
開始時画線部へのインキ着肉性が徐々に劣るようになり
、また、非画像部にもインキが薄く付着して印刷物に薄
汚れを生じた。When the process was continued, the ink adhesion to the image area at the start of printing gradually deteriorated from around the 70th sheet, and a thin layer of ink also adhered to the non-image area, causing the printed matter to become thin. It caused stains.
尚この時の第二リンス液のpHは9.9であった。Note that the pH of the second rinsing liquid at this time was 9.9.
実施例2
実施例1の電子写真製版用感光体およびエツチング液、
第一リンス液と第二リンス液を仕込んだ自動処理機を準
備した。Example 2 Electrophotographic photoreceptor and etching solution of Example 1,
An automatic processing machine containing the first rinsing liquid and the second rinsing liquid was prepared.
更に下記組成のエツチング補充液を調整した。Furthermore, an etching replenisher having the following composition was prepared.
(エツチング補充液組成)
ケイ酸カリウム 40部水酸化
カリウム 20部エタノール
100部純水 8
00部
実施例1と同様に電子写真現像処理した1003mmx
810O3の版を1版処理する毎に、エツチング補充液
を50mβずつ補充した。更に、第二リンス浴にも1版
処理する毎に第2リンス液を40 m R/ m’補充
し、第一リンス浴には第二リンス浴のオーバーフロー液
をそのまま補充した。(Etching replenisher composition) Potassium silicate 40 parts Potassium hydroxide 20 parts Ethanol
100 parts pure water 8
00 copies 1003 mm x electrophotographically developed in the same manner as in Example 1
Each time one 810O3 plate was processed, 50 mβ of etching replenisher was added. Further, the second rinsing bath was also replenished with the second rinsing liquid at a rate of 40 mR/m' every time one plate was processed, and the first rinsing bath was directly replenished with the overflow liquid of the second rinsing bath.
以上の条件で毎日60枚ずつ印刷版を処理したところ、
5日後に第一および第二リンス液のpHはそれぞれ11
.0.7.2に達した後はほとんど変化せずに、しかも
、第一、第二リンス浴とも異常なカスやゲルを生ずるこ
となく、安定して約1ケ月間処理を続けることができた
。印刷結果も全て良好であった。When 60 printing plates were processed every day under the above conditions,
After 5 days, the pH of the first and second rinse solutions was 11.
.. After reaching 0.7.2, there was almost no change, and the treatment could be continued stably for about 1 month without producing abnormal scum or gel in either the first or second rinsing bath. . All printing results were also good.
本発明によれば、エッチンク処理後の水洗浴中で、異常
な不溶物やゲルを生じることがないので、長期間にわた
り多量の電子写真プロセスによる印刷版を安定に製造す
ることができる。According to the present invention, since no abnormal insoluble matter or gel is generated in the water washing bath after etching treatment, printing plates can be stably produced in large quantities by electrophotographic processes over a long period of time.
代理人弁理士(8107)佐々木 清隆(ほか3名) 手続補正書 1、 事件の表示 昭和63イ4−特許願第166850号発明の名称 平版印刷版の製版方法 3、 補正をする老 事件との関係: 特許出願人Representative Patent Attorney (8107) Kiyotaka Sasaki (and 3 others) Procedural amendment 1. Display of incident 1986-4 - Title of invention of Patent Application No. 166850 Plate making method for lithographic printing plates 3. Older people who make corrections Relationship to the case: Patent applicant
Claims (2)
に電子写真プロセスにより形成されたトナー像からなる
平版印刷版において、非画像部の除去の後にリンス処理
する平版印刷版の製版方法において、リンス処理を複数
のリンス浴で行ない、該リンス浴のpHを後段になるほ
ど低くなるようにしたことを特徴とする平版印刷版の製
版方法。(1) In a lithographic printing plate in which the image area consists of a toner image formed by an electrophotographic process on a photoconductor layer provided on a conductive substrate, the lithographic printing plate is rinsed after removing the non-image area. 1. A method for making a lithographic printing plate, characterized in that rinsing is carried out in a plurality of rinsing baths, and the pH of the rinsing baths is made lower toward later stages.
最終のリンス浴のpHが3〜9であることを特徴とする
請求項(1)記載の製版方法。(2) The plate-making method according to claim (1), wherein the pH of the initial rinsing bath is 10 to 13, and the pH of the final rinsing bath is 3 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16685088A JPH0218571A (en) | 1988-07-06 | 1988-07-06 | Plate making method for planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16685088A JPH0218571A (en) | 1988-07-06 | 1988-07-06 | Plate making method for planographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0218571A true JPH0218571A (en) | 1990-01-22 |
Family
ID=15838807
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16685088A Pending JPH0218571A (en) | 1988-07-06 | 1988-07-06 | Plate making method for planographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0218571A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5825477A (en) * | 1981-08-10 | 1983-02-15 | Konishiroku Photo Ind Co Ltd | Etching method for lithographic printing plate |
| JPS62211669A (en) * | 1986-03-13 | 1987-09-17 | Fuji Photo Film Co Ltd | Photoengraving method |
-
1988
- 1988-07-06 JP JP16685088A patent/JPH0218571A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5825477A (en) * | 1981-08-10 | 1983-02-15 | Konishiroku Photo Ind Co Ltd | Etching method for lithographic printing plate |
| JPS62211669A (en) * | 1986-03-13 | 1987-09-17 | Fuji Photo Film Co Ltd | Photoengraving method |
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