JPH0218707A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPH0218707A
JPH0218707A JP16735688A JP16735688A JPH0218707A JP H0218707 A JPH0218707 A JP H0218707A JP 16735688 A JP16735688 A JP 16735688A JP 16735688 A JP16735688 A JP 16735688A JP H0218707 A JPH0218707 A JP H0218707A
Authority
JP
Japan
Prior art keywords
layer
gap
thickness
filmed
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16735688A
Other languages
Japanese (ja)
Inventor
Hiromi Nakajima
中嶋 啓視
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP16735688A priority Critical patent/JPH0218707A/en
Publication of JPH0218707A publication Critical patent/JPH0218707A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To cause the value of a gap length to be constant and to attain manufacture with satisfactory reproductivity by measuring the thickness of a gap layer before filming an upper magnetic substance layer and executing the filming with overlapping a gap control layer, which has thickness to correspond to a measured value, on the gap layer. CONSTITUTION:A lower magnetic substance layer 2, which is composed of a magnetic substance, is formed on a substrate 1 and next, a gap layer 3 to be composed of an insulator is successively filmed and formed. Here, a lowest layer 5a of an insulator layer 5 to surround a coil 4 is filmed and a first conductor layer 4a of the coil 4 is filmed. Further, a second insulator layer 5b, a second conductor layer 4b and a third insulator layer 5c are successively filmed and formed. The thickness of this gap layer 3 is measured and difference between this measured value and target gap thickness is calculated. Then, the filming is executed so as to be the same thickness as the target gap thickness and a gap control layer 6 is obtained. Next, an upper magnetic substance layer 7 is filmed and formed on this gap control layer 6 and a prescribed protecting layer is formed on the layer 7. After that, the substrate 1 is cut in a prescribed position and a cutting surface is ground. Then, a gap surface to slide and contact to a magnetic medium is formed. Then, the magnetic head of high recording and reproducing function can be stably manufactured.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、磁気ディスク装置などにおいて磁気記憶媒
体との間で信号の授受を行うための薄膜磁気ヘッドの製
造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a thin film magnetic head for exchanging signals with a magnetic storage medium in a magnetic disk device or the like.

「従来の技術] 薄膜磁気ヘッドは、従来のバルクのコアを用いた磁気ヘ
ッドに比較して小型であるので、トラック幅を小さくす
ることができるとともに、高周波数帯域での記録が可能
となるから、いずれの場合にも記録の高密度化ができる
。従って、磁気ディスク装置の浮動式磁気ヘッドなどに
おいてその利点を生かして使用されている。
``Prior art'' Thin-film magnetic heads are smaller than conventional magnetic heads using bulk cores, making it possible to reduce the track width and recording in high frequency bands. In either case, high-density recording is possible.Therefore, it is used to take advantage of this advantage in floating magnetic heads of magnetic disk drives.

その構造の一例を第3図に示すが、これは、非磁性基板
1の上に下部磁性体層2を成膜し、その」二にギャップ
層3を介在させてコイル4を構成する導体層を二重に成
膜し、これを絶縁体層5により囲繞するようにした後上
部磁性体層7を成膜している。コイル4は、下部磁性体
R2と上部磁性体層7との間のバックギャップ部(図示
略)を中心に同心的に位置しており、下部磁性体M2と
上部磁性体層7との面部ギャップ8に挟着された上記ギ
ャップ層が磁気ギャップ8を構成している。
An example of the structure is shown in FIG. 3, in which a lower magnetic layer 2 is formed on a non-magnetic substrate 1, and a gap layer 3 is interposed between the lower magnetic layer 2 and a conductive layer constituting the coil 4. A double film is formed, and this is surrounded by an insulating layer 5, and then an upper magnetic layer 7 is formed. The coil 4 is located concentrically around a back gap (not shown) between the lower magnetic body R2 and the upper magnetic layer 7, and is located concentrically around the back gap (not shown) between the lower magnetic body M2 and the upper magnetic layer 7. The above-mentioned gap layer sandwiched between the magnets 8 constitutes the magnetic gap 8.

このようなパターンの形成の方法は、周知のとおり、ス
パッタリングや蒸着により一たん全面に成膜した後に不
要部分を除去する方法と、予め不要部分をマスキングし
ておき必要部分のみにめっきなどにより成膜する方法と
がある。
As is well known, there are two methods for forming such a pattern: one is to first form a film on the entire surface by sputtering or vapor deposition, and then remove unnecessary parts, and the other is to mask the unnecessary parts in advance and then form a film only on the necessary parts, such as by plating. There is a method of coating.

そして、上記のような成膜工程が終了した後、切断及び
研磨を行なって磁気ギャップ8を露出させる工程となる
After the film forming process as described above is completed, cutting and polishing are performed to expose the magnetic gap 8.

[発明が解決しようとする課題] ところで、上記のような磁気ヘッドにおいてはギャップ
長すなわちギャップ層3の厚さを周波数に対応した適当
な値に設定することが記録密度や精度を向上する上で重
要となる。従って、ギャップ層3を成膜する際に、スパ
ッタリング、蒸着あるいはめっきなどの成膜条件を厳密
に制御することによりギャップ層3の模りが一定の範囲
に収まるように管理している。しかしながら、上述した
ように、ギャップ層3を形成した後」二部磁性体層7を
成膜する間にコイル4や絶縁体層5を成膜する工程が入
るから、その工程でギャップ層3がエツチングやマスキ
ング、スパッタリングや蒸着にさらされる。そこで、ギ
ャップ層3は全面的にあるいは部分的に厚さが変化する
可能性があり、その厚さの精度が低下する結果、ギャッ
プ長が所定の値とならずヘッドの磁気特性が低下する。
[Problems to be Solved by the Invention] By the way, in the magnetic head as described above, setting the gap length, that is, the thickness of the gap layer 3 to an appropriate value corresponding to the frequency, improves the recording density and accuracy. becomes important. Therefore, when forming the gap layer 3, the patterning of the gap layer 3 is managed to fall within a certain range by strictly controlling the film forming conditions such as sputtering, vapor deposition, or plating. However, as mentioned above, after forming the gap layer 3, there is a step of forming the coil 4 and the insulating layer 5 while forming the two-part magnetic layer 7. Exposure to etching, masking, sputtering, and vapor deposition. Therefore, the thickness of the gap layer 3 may vary entirely or partially, and as a result, the accuracy of the thickness decreases, and as a result, the gap length does not reach a predetermined value and the magnetic characteristics of the head deteriorate.

この発明は、ギャップ長の値を一定として再現性の良い
薄膜磁気ヘッドを製造することができるような薄膜磁気
ヘッドの製造方法を提供することを目的とするものであ
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a thin film magnetic head that can manufacture a thin film magnetic head with good reproducibility while maintaining a constant gap length value.

[課題を解決するための手段] 上記のような課題を解決するために、この発明は、上部
磁性体層を成膜する的にギャップ層の厚さを測定し、ギ
ャップ層の上に測定値に応じた厚さを持つギャップ調整
層を重ねて成膜することにより、ギャップ層の厚さを正
確にするようにしたしのである。厚さの測定方法は、分
光反射干渉法等の原理による非接触型膜厚計の採用が好
適である。
[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention measures the thickness of the gap layer before forming the upper magnetic layer, and displays the measured value on the gap layer. The thickness of the gap layer can be made accurate by depositing gap adjustment layers with thicknesses corresponding to the thickness of the gap layer. As a method for measuring the thickness, it is preferable to employ a non-contact film thickness meter based on the principle of spectral reflection interferometry or the like.

[作用] このような薄膜磁気ヘッドの製造方法においては、ギヤ
ツブ層を形成した後、コイル層や絶縁体層を成膜形成す
る過程でギャップ層が減厚されるが、」二部磁性体層を
成膜する曲にギャップ層の厚さを測定し、その測定値に
応じて目的とする厚さに満たない厚さだけ新たに成膜を
行なうことにより、細かい厚さの微調整がなされる。
[Function] In the manufacturing method of such a thin film magnetic head, after forming the gear layer, the thickness of the gap layer is reduced in the process of forming the coil layer and the insulator layer. Fine adjustments to the thickness can be made by measuring the thickness of the gap layer at the same time as the film is being deposited, and then depositing a new film to a thickness that is less than the desired thickness according to the measured value. .

[実施例j 以下、第1図(イ)ないしくチ)の図面を参照してこの
発明の詳細な説明する。
[Embodiment j] Hereinafter, the present invention will be described in detail with reference to the drawings in FIGS.

第1図(イ)は、基板1の」二に磁性体からなる下部磁
性体層2を形成し、次に絶縁体からなるギヤ、ツブ層3
を順次成膜形成した状態を示している。
In FIG. 1(A), a lower magnetic layer 2 made of a magnetic material is formed on the second part of the substrate 1, and then a gear and a knob layer 3 made of an insulating material are formed.
This figure shows a state in which the films are sequentially formed.

ここで、コイル4を囲繞する絶縁体層5の最下層5aを
成膜しく同図(ロ))、コイル4の第1導体層4aを成
膜しく同図(ハ))、さらに第2絶縁体層5b(同図(
ニ))、第2導体層4b(同図(ホ))、第3絶縁体層
5c(同図(へ))を順次成膜形成する。これらの工程
は、スパッタリングや蒸着などの成膜工程と、エツチン
グやマスキングなどのパターン形成工程とを交互に行な
うことによりなされる。
Here, the lowermost layer 5a of the insulating layer 5 surrounding the coil 4 is formed (FIG. 2 (B)), the first conductor layer 4a of the coil 4 is formed (FIG. 3 (C)), and then the second insulating layer 5 is formed (FIG. Body layer 5b (same figure (
d)), the second conductor layer 4b (FIG. 4(E)), and the third insulating layer 5c (FIG. 1(F)) are sequentially formed. These steps are performed by alternately performing film forming steps such as sputtering and vapor deposition, and pattern forming steps such as etching and masking.

本発明では、ここでギャップ層3の厚さを分光反射干渉
法等の原理による非接触型膜厚計で測定する。そして、
この測定値と目標とするギャップ厚との差を算出し、そ
れと同じ厚さになるように成膜を行ない(同図(ト))
、ギャップ調整層6とする。このギャップ調整層6は当
然にコイル4を囲繞する絶縁体層5を覆っている。次に
、このギャップ調整層6の−Fに上部磁性体層7を成膜
形成L (同図(ヂ))、さらにその上に所定の保護膜
(図示路)を形成した後、基板1を所定の位置で切断す
るとともにその切断面を研磨して、磁気媒体に摺接する
ギャップ面(図示路)を形成する。
In the present invention, the thickness of the gap layer 3 is measured here using a non-contact film thickness meter based on the principle of spectral reflection interferometry or the like. and,
The difference between this measured value and the target gap thickness is calculated, and the film is deposited to the same thickness (see figure (G)).
, gap adjustment layer 6. This gap adjustment layer 6 naturally covers the insulator layer 5 surrounding the coil 4. Next, the upper magnetic layer 7 is formed on -F of the gap adjustment layer 6 (FIG. 1(D)), and a prescribed protective film (as shown in the figure) is formed thereon, and then the substrate 1 is It is cut at a predetermined position and the cut surface is polished to form a gap surface (the path shown in the figure) that slides into contact with the magnetic medium.

第2図はこの発明の他の実施例であり、絶縁体層5のエ
ツチングが過剰でコイル4の導体層=1 bが絶縁体層
5より突出している場合を示している。
FIG. 2 shows another embodiment of the present invention, in which the insulator layer 5 is etched excessively and the conductor layer 1b of the coil 4 protrudes from the insulator layer 5.

このような場合には、ギャップ調整層6が無いときは上
部磁性体層7とコイル4とが直接接触して短絡してしま
うが、本発明の場合にはギャップ調整層6が電気的絶縁
層として作用するので製品として採用でき、歩留りを向
−卜させろことができる。
In such a case, if there is no gap adjustment layer 6, the upper magnetic layer 7 and the coil 4 will come into direct contact and short circuit, but in the case of the present invention, the gap adjustment layer 6 is an electrically insulating layer. Since it acts as a catalyst, it can be used as a product, and the yield can be improved.

「発明の効果」 以十詳述したように、この発明は、下部磁性体層の」二
に非磁性体からなるキャップ層、導体からなるコイル層
、絶縁体からなる絶縁層皮び上部磁性体層を順次成膜形
成するようにした薄膜磁気ヘッドの製造方法において、
上記上部磁性体層を成膜する前にギャップ層の厚さを測
定し、ギャップ層の上に測定値に応じた厚さを持つギャ
ップ調整層を重ねて成膜するようにしたことにより、そ
れぞれのギャップ厚を厳密に精度良く設定することがで
き、それにより、記録及び再生機能の高い磁気ヘッドを
安定的?こ製造せしめるという優れた効果を奏するもの
である。
``Effects of the Invention'' As described in detail above, the present invention provides a cap layer made of a non-magnetic material, a coil layer made of a conductor, an insulating layer made of an insulator, and a top magnetic material layer. In a method for manufacturing a thin film magnetic head in which layers are sequentially formed,
By measuring the thickness of the gap layer before forming the above-mentioned upper magnetic layer, and forming a gap adjustment layer with a thickness according to the measured value on top of the gap layer, each The gap thickness can be set strictly and accurately, thereby creating a stable magnetic head with high recording and playback functions. This has an excellent effect of allowing the production of this product.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(イ)ないしくヂ)はこの発明の一実施例の工程
を示す断面図、第2図はこの発明の他の実施例を示す断
面図、第3図は従来例を示す断面図である。 2・・・・・・下部磁性体層、3・・・・・・ギャップ
層、4・・・・・・コイル、5・・・・・絶縁体層、6
・・・・・ギャップ調整層、7・・・・・・上部磁性体
層。
Figures 1 (a) to 3) are cross-sectional views showing the steps of one embodiment of the present invention, Figure 2 is a cross-sectional view showing another embodiment of the present invention, and Figure 3 is a cross-sectional view showing a conventional example. It is. 2... Lower magnetic layer, 3... Gap layer, 4... Coil, 5... Insulator layer, 6
... Gap adjustment layer, 7 ... Upper magnetic layer.

Claims (1)

【特許請求の範囲】[Claims] 下部磁性体層の上に非磁性体からなるギャップ層、導体
からなるコイル層、絶縁体からなる絶縁層及び上部磁性
体層を順次成膜形成するようにした薄膜磁気ヘッドの製
造方法において、上記上部磁性体層を成膜する前にギャ
ップ層の厚さを測定し、ギャップ層の上に測定値に応じ
た厚さを持つギャップ調整層を重ねて成膜することを特
徴とする薄膜磁気ヘッドの製造方法。
In a method for manufacturing a thin film magnetic head in which a gap layer made of a non-magnetic material, a coil layer made of a conductor, an insulating layer made of an insulator, and an upper magnetic layer are sequentially formed on a lower magnetic layer, the above A thin film magnetic head characterized in that the thickness of the gap layer is measured before forming the upper magnetic layer, and a gap adjustment layer having a thickness according to the measured value is layered and formed on the gap layer. manufacturing method.
JP16735688A 1988-07-05 1988-07-05 Manufacture of thin film magnetic head Pending JPH0218707A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16735688A JPH0218707A (en) 1988-07-05 1988-07-05 Manufacture of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16735688A JPH0218707A (en) 1988-07-05 1988-07-05 Manufacture of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPH0218707A true JPH0218707A (en) 1990-01-23

Family

ID=15848203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16735688A Pending JPH0218707A (en) 1988-07-05 1988-07-05 Manufacture of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPH0218707A (en)

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