JPH02187190A - Ultrapure water making apparatus - Google Patents
Ultrapure water making apparatusInfo
- Publication number
- JPH02187190A JPH02187190A JP596389A JP596389A JPH02187190A JP H02187190 A JPH02187190 A JP H02187190A JP 596389 A JP596389 A JP 596389A JP 596389 A JP596389 A JP 596389A JP H02187190 A JPH02187190 A JP H02187190A
- Authority
- JP
- Japan
- Prior art keywords
- water
- membrane
- pure water
- ultrapure water
- filtration membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 34
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 34
- 239000012528 membrane Substances 0.000 claims abstract description 102
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 92
- 238000001914 filtration Methods 0.000 claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 claims description 30
- 239000011148 porous material Substances 0.000 claims description 5
- 230000001954 sterilising effect Effects 0.000 abstract description 24
- 238000004659 sterilization and disinfection Methods 0.000 abstract description 22
- 241000894006 Bacteria Species 0.000 abstract description 12
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 6
- 239000010419 fine particle Substances 0.000 abstract description 5
- 238000005406 washing Methods 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 230000001902 propagating effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000001223 reverse osmosis Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000004062 sedimentation Methods 0.000 description 4
- 230000015271 coagulation Effects 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 238000000108 ultra-filtration Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000013067 intermediate product Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 1
- 239000003830 anthracite Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000701 coagulant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000003206 sterilizing agent Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はLSIや超LSIを生産する電子工業において
、その中間製品である半導体ウェハーまたはチップの洗
浄用水として使用される、いわゆる超純水を製造する装
置に関するものである。[Detailed Description of the Invention] <Industrial Application Field> The present invention is directed to the use of so-called ultrapure water, which is used as water for cleaning semiconductor wafers or chips, which are intermediate products, in the electronic industry that produces LSIs and VLSIs. It relates to the equipment to be manufactured.
〈従来の技術〉
LSIや超LSIを生産する電子工業においては、その
中間製品である半導体ウェハーまたはチップ(以下半導
体ウェハーという)の洗浄にあたり、その歩留まりを向
上させるために、イオンの量および微粒子の量をI)I
)bオーダーまで減少させるだけでなく、生菌数を10
−1個/ m lまで減少させた、いわゆる超純水を必
要とする。<Prior art> In the electronics industry that produces LSIs and VLSIs, when cleaning intermediate products such as semiconductor wafers or chips (hereinafter referred to as semiconductor wafers), in order to improve the yield, the amount of ions and the amount of fine particles must be controlled. amount I)I
) Not only does it reduce the number of viable bacteria to the b order, but it also reduces the number of viable bacteria to 10
- Requires so-called ultrapure water, reduced to 1 particle/ml.
従来は、かかる超純水を製造するにあたり、原水を凝集
沈殿装置、砂濾過器、活性炭濾過器、逆浸透膜装置、2
床3塔式純水製造装置、混床式ポリシャー等を組み合わ
せた一次側純水製造装置で処理して純水を得、当該純水
を更に紫外線照射装置、混床式ポリシャー等で処理し、
最終的に半導体ウェハーを洗浄する直前、すなわちユー
スポイント(使用箇所)の直前で精密濾過膜(MF膜)
装置や超濾過膜(UF膜)装置等の、いわゆる末端濾過
膜装置で処理して超純水を得、これを洗浄用水として供
している。Conventionally, in producing such ultrapure water, raw water was processed through a coagulation sedimentation device, a sand filter, an activated carbon filter, a reverse osmosis membrane device, and two
Pure water is obtained by processing with a primary side pure water production device that combines a three-bed pure water production device, a mixed bed polisher, etc., and the purified water is further processed with an ultraviolet irradiation device, a mixed bed polisher, etc.
A microfiltration membrane (MF membrane) is used just before the final cleaning of the semiconductor wafer, that is, just before the point of use.
Ultrapure water is obtained by processing with a so-called terminal filtration membrane device such as a device or an ultrafiltration membrane (UF membrane) device, and this is used as water for washing.
このような用途の末端に使用される濾過膜装置において
は、その被処理水が一次側純水製造装置で得られる純水
であるにもかかわらず、また直前で紫外線照射を行って
いるにもかかわらず、長時間の超純水製造を続行すると
透過水である超純水中に生菌や微粒子の漏洩量が増加し
、許容限度を超えてしまう。In the filtration membrane equipment used at the end of such applications, even though the water to be treated is pure water obtained from the primary water purification equipment, and even though it is irradiated with ultraviolet rays immediately beforehand, Regardless, if ultrapure water production continues for a long time, the amount of viable bacteria and particles leaking into the ultrapure water that is permeated water will increase and exceed the permissible limit.
この原因は、当該濾過膜装置の被処理水である純水中に
わずかに存在する紫外線に耐性を有する一般細菌が膜面
等に繁殖するためと考えられる。The reason for this is thought to be that general bacteria that are resistant to ultraviolet rays and exist in a small amount in the pure water that is the water to be treated by the filtration membrane device propagate on the membrane surface and the like.
従って、使用する濾過膜が上述のような汚染を受けた場
合、何らかの殺菌処理を施す必要がある。Therefore, if the filtration membrane used is contaminated as described above, it is necessary to perform some kind of sterilization treatment.
従来から行われている上記濾過膜の殺菌処理は、1〜5
%過酸化水素水、または次亜塩素酸ソーダ溶液等の酸化
剤溶液、あるいは酸、アルカリ等の溶液に浸漬したりも
しくは通液洗浄する、いわゆる化学薬品を用いる殺菌処
理や濾過膜をたとえば70℃以上の熱水で洗浄して殺菌
する熱水殺菌処理等であり、このような殺菌処理を定期
的に行いながら超純水製造を行っていた。The conventional sterilization treatment for the filtration membrane is 1 to 5.
% hydrogen peroxide solution, or an oxidizing agent solution such as a sodium hypochlorite solution, or a sterilization treatment using so-called chemicals, such as immersion in an acid, alkali solution, etc., or a filtration membrane at 70°C. This is a hot water sterilization treatment in which water is washed and sterilized using hot water as described above, and ultrapure water has been produced while performing such sterilization treatment periodically.
〈発明が解決しようとする問題点〉
上述した末端濾過膜装置に使用されている従来の精密濾
過膜や超濾過膜は、たとえばポリスルホン、ポリ塩化ビ
ニール、ポリビニルアルコール等の合成高分子、あるい
は酢酸セルロース等の天然高分子を素材とするもので、
要するに有機物を素材とするものであった。<Problems to be Solved by the Invention> The conventional microfiltration membranes and ultrafiltration membranes used in the above-mentioned terminal filtration membrane devices are made of synthetic polymers such as polysulfone, polyvinyl chloride, polyvinyl alcohol, or cellulose acetate. It is made from natural polymers such as
In short, it was made from organic matter.
従って、耐熱性あるいは耐薬品性の点でやや難があり、
そのため上述のような殺菌処理を行った場合に濾過膜が
劣化し、殺菌処理後の超純水製造の際に透過水である超
純水中の生菌数や微粒子数が増加したり、あるいは膜自
身から有機物が溶出するようになったり、更には膜の交
換頻度が多くなったりするという問題点があった。また
、膜の劣化を防ぐために熱水の温度や使用薬品の濃度も
制限され、そのために殺菌効果が不十分となって良質の
超純水が得られないという問題を生じることもあった。Therefore, there are some difficulties in terms of heat resistance or chemical resistance.
Therefore, when the above-mentioned sterilization treatment is performed, the filtration membrane deteriorates, and when producing ultrapure water after sterilization treatment, the number of viable bacteria and particles in the ultrapure water that is permeated increases, or There were problems in that organic matter began to be eluted from the membrane itself and that the membrane had to be replaced more frequently. Furthermore, in order to prevent membrane deterioration, the temperature of the hot water and the concentration of the chemicals used are also limited, which sometimes results in insufficient sterilizing effects and the inability to obtain high-quality ultrapure water.
本発明はこのような問題点を解決するもので、末端濾過
膜装置の濾過膜として耐熱性および耐薬品性に極めて優
れた膜を使用することによって上述したような殺菌処理
時における膜の劣化をなくすとともに、従来より苛酷な
条件での殺菌処理を可能とし、故に生菌数や微粒子数の
極めて少ない良質の超純水を常に安定して得ることの出
来る超純水製造装置を提供することを目的とするもので
ある。The present invention solves these problems by using a membrane with extremely excellent heat resistance and chemical resistance as the filtration membrane of the terminal filtration membrane device, thereby preventing the deterioration of the membrane during sterilization treatment as described above. It is our aim to provide an ultrapure water production device that eliminates the need for sterilization, enables sterilization under harsher conditions than conventional methods, and can therefore always stably obtain high quality ultrapure water with extremely low numbers of viable bacteria and particles. This is the purpose.
〈問題点を解決するための手段〉
本発明は一次側純水製造装置と1、当該純水製造装置で
得られる純水をユースポイントの直前で再度濾過処理す
る末端濾過膜装置とを備えてなり、当該濾過膜装置は濾
過膜として無機性多孔質膜を用いたものであることを特
徴とする超純水製造装置である。<Means for Solving the Problems> The present invention comprises a primary side pure water production device, 1, and an end filtration membrane device for refiltering the pure water obtained by the pure water production device immediately before the point of use. The filtration membrane device is an ultrapure water production device characterized by using an inorganic porous membrane as the filtration membrane.
以下に本発明を図面に基づいて詳細に説明する。The present invention will be explained in detail below based on the drawings.
第1図は本発明の実施態様の一例を示すフローの説明図
であり、Aの部分は一次側純水製造装置、Bの部分は末
端濾過膜装置を含む二次側純水製造装置を指し、また−
点鎖線で囲んだ部分は半導体ウェハーの洗浄用水として
採水する、いわゆるユースポイントを指している。FIG. 1 is an explanatory diagram of a flow showing an example of an embodiment of the present invention, where part A indicates a primary pure water production device, and part B indicates a secondary pure water production device including a terminal filtration membrane device. , again-
The area surrounded by the dotted chain line indicates the so-called use point where water is collected for cleaning semiconductor wafers.
当該−次側純水製造装置Aは、たとえば凝集沈殿装置2
、砂やアンスラサイト等による濾過装置3、孔径10μ
程度のカートリッジフィルタ4、逆浸透膜装置5.2床
3塔式純水製造装置6、混床式純水製造装置7.0゜4
5〜0.8μ程度のカートリッジフィルタ8等によって
構成され、原水1を処理してイオン、微粒子等を可及的
に除去したいわゆる一次側純水9を製造するものである
。The next-side pure water production device A is, for example, a coagulation sedimentation device 2.
, filtration device 3 using sand, anthracite, etc., pore size 10μ
Cartridge filter 4, reverse osmosis membrane device 5.2-bed 3-column pure water production device 6, mixed bed pure water production device 7.0゜4
It is composed of a cartridge filter 8 and the like having a diameter of about 5 to 0.8 microns, and processes the raw water 1 to produce so-called primary pure water 9 in which ions, fine particles, etc. are removed as much as possible.
なお、原水1の水質によっては、凝集沈殿装置2と、濾
過装置3とを省略して両装置が一体となった凝集剤ボデ
ィーフィード式濾過装置やマイクロフロック式・濾過装
置等のいわゆる簡易除濁装置を設置してもよく、更に水
質がよい場合は直接カートリッジフィルタ4に原水を通
してもよく、逆に原水1中に多量の有機物が存在する場
合は、濾過装置3以降に活性炭濾過器が設置されること
もある。Depending on the water quality of the raw water 1, the coagulation-sedimentation device 2 and the filtration device 3 may be omitted and both devices may be integrated into a so-called simple turbidity filtration device such as a coagulant body feed type filtration device or a micro floc type filtration device. Further, if the water quality is good, the raw water may be passed directly to the cartridge filter 4. Conversely, if a large amount of organic matter is present in the raw water 1, an activated carbon filter may be installed after the filtration device 3. Sometimes.
また、原水のイオン量が少ない場合は逆浸透膜装置5が
省略される場合もあり、あるいは当該逆浸透膜装置5の
後段に設置される2床3塔式純水製造装置6が省略され
る場合もある。Furthermore, if the amount of ions in the raw water is small, the reverse osmosis membrane device 5 may be omitted, or the two-bed, three-column pure water production device 6 installed after the reverse osmosis membrane device 5 may be omitted. In some cases.
更に、必要に応じ一次側純水製造装置A内に紫外線照射
装置が設置される場合もあり、かつ脱酸素の目的で真空
脱気器が設置されることもある。Furthermore, if necessary, an ultraviolet irradiation device may be installed in the primary side pure water production apparatus A, and a vacuum deaerator may be installed for the purpose of deoxidizing.
次に、二次側純水製造装置Bは、前述したような−次側
純水製造装置Aで得た一次側純水9を貯留する純水槽1
0、当該純水9を更に処理する混床式ポリシャー11、
紫外線照射装置12、および−点鎖線で囲んだユースポ
イント部14の直前に設置した、濾過膜として無機性多
孔質膜を用いた末端濾過膜装置13で構成される。Next, the secondary deionized water production device B includes a deionized water tank 1 that stores the primary deionized water 9 obtained in the secondary deionized water production device A as described above.
0, a mixed bed polisher 11 that further processes the pure water 9;
It is composed of an ultraviolet irradiation device 12 and a terminal filtration membrane device 13 using an inorganic porous membrane as a filtration membrane, which is installed just before the point-of-use portion 14 surrounded by a dashed line.
本発明の特徴は、末端濾過膜装置13の濾過膜として、
上述の如く無機性多孔質膜を用いる点にあるが、当該無
機性多孔質膜とは、たとえば5tO2ガラス、アルミナ
質、ケイ酸アルミ等の無機物を素材とする、いわゆるセ
ラミック膜であり、かつポアサイズがたとえば0.1〜
数10μというような、一般に精密濾過膜の範祷に属す
るもの、あるいはポアサイズが数10人というような、
−般に限外濾過膜の範晴に属する多孔質膜を指し、膜形
状としては中空状(管状)に成形したものを用いるのが
よい。このような微細孔を有する中空状セラミック膜は
最近になって開発されたものであり、直径数1量という
ような従来の中空糸状膜に近い径のものも既に実用化さ
れている。The feature of the present invention is that as a filtration membrane of the terminal filtration membrane device 13,
As mentioned above, an inorganic porous membrane is used, and the inorganic porous membrane is a so-called ceramic membrane made of an inorganic material such as 5tO2 glass, alumina, or aluminum silicate. For example, 0.1~
Those with a pore size of several tens of microns, which generally belong to the category of precision filtration membranes, or those with a pore size of several tens of microns,
- It generally refers to a porous membrane that belongs to the category of ultrafiltration membranes, and it is preferable to use a membrane shaped into a hollow (tubular) shape. Hollow ceramic membranes having such fine pores have been developed recently, and membranes with diameters close to those of conventional hollow fiber membranes, such as a diameter of several digits, have already been put into practical use.
なお、図中15は紫外線照射装置12と末端濾過膜装置
13との間に設置した熱交換器を、16は当該熱交換器
15に熱水、スチーム等の熱媒を供給する熱媒供給管を
示しているが、当該熱交換器15は前記末端濾過膜装置
13を熱水によって殺菌処理する際に用いるもので、通
常の処理においては当該熱交換器15に熱媒を通流させ
ない。In addition, in the figure, 15 is a heat exchanger installed between the ultraviolet irradiation device 12 and the terminal filtration membrane device 13, and 16 is a heat medium supply pipe that supplies a heat medium such as hot water or steam to the heat exchanger 15. However, the heat exchanger 15 is used when the terminal filtration membrane device 13 is sterilized with hot water, and no heat medium is allowed to flow through the heat exchanger 15 in normal processing.
また、17は末端濾過膜装置13の透過水である超純水
をユースポイント部に移送するためのユースポイント配
管、18は当該濾過膜装置13の非透過水を排出するた
めの非透過木管、19は前記ユースポイント配管17の
適所に付設したブロー管をそれぞれ示している。Further, 17 is a use point piping for transferring ultrapure water, which is permeated water of the terminal filtration membrane device 13, to the use point section, 18 is a non-permeable wood pipe for discharging non-permeated water of the filtration membrane device 13, Reference numeral 19 indicates blow pipes attached to appropriate positions of the use point piping 17, respectively.
第1図に示した二次側純水製造装置Bにおいては、混床
式ポリシャー11が前段に、紫外線照射装置12が後段
に設置されているが、場合によっては紫外線照射装置1
2を前段に、混床式ポリシャー11を後段に設置しても
差し支えない。In the secondary side pure water production apparatus B shown in FIG.
2 at the front stage and the mixed bed polisher 11 at the rear stage.
く作用〉
本発明は上述のような構成からなり、超純水を製造する
通常の処理においては、従来と同じように原水1を先ず
−1次側純水製造装置Aで処理し、イオン、微粒子等を
可及的に除去した一次側純水9を得て当該純水9を純水
槽10に一旦貯留する。Effect> The present invention has the above-mentioned configuration, and in a normal process for producing ultrapure water, raw water 1 is first treated in the -primary side pure water production apparatus A in the same way as in the past, and ions, Primary pure water 9 from which fine particles and the like have been removed as much as possible is obtained, and the pure water 9 is temporarily stored in a pure water tank 10.
次いで、純水槽10内に貯留した一次側純水9を、混床
式ポリシャー11、紫外線照射装置12、および濾過膜
として前述した中空状の無機性多孔質膜を用いた末端濾
過膜装置13でこの順に処理し、−次側純水9中に残留
するイオン、微粒子、生菌、TOC等を可及的に除去し
た、いわゆる超純水を末端濾過膜装置13の透過側から
得る。得られた超純水はユースポイント配管17によっ
てユースポイント部14まで移送し、ここで必要な超純
水を半導体ウェハーの洗浄用水として使用し、残余の超
純水は純水槽10に循環する。Next, the primary pure water 9 stored in the pure water tank 10 is passed through a mixed bed polisher 11, an ultraviolet irradiation device 12, and a terminal filtration membrane device 13 using the hollow inorganic porous membrane described above as a filtration membrane. The treatment is performed in this order to obtain so-called ultrapure water from the permeation side of the terminal filtration membrane device 13, in which ions, particulates, live bacteria, TOC, etc. remaining in the downstream pure water 9 are removed as much as possible. The obtained ultrapure water is transferred to the use point section 14 through the use point piping 17, where the necessary ultrapure water is used as water for cleaning semiconductor wafers, and the remaining ultrapure water is circulated to the pure water tank 10.
なお、末端濾過膜装置13の非透過側から得られる非透
過水は、非透過水配管18を介して一次側純水製造装置
Aあるいは純水槽10に循環して回収する。The non-permeated water obtained from the non-permeated side of the terminal filtration membrane device 13 is circulated through the non-permeated water piping 18 to the primary pure water production device A or the pure water tank 10 for recovery.
上述のような超純水製造を続行するうちに、末端濾過膜
装置13に使用している無機性多孔質膜の膜面に細菌類
が繁殖するので、末端濾過膜装置13を定期的に殺菌処
理する。たとえば、当該濾過膜装置13を熱水によって
殺菌する場合は以下のようにして行う。As the production of ultrapure water as described above continues, bacteria will grow on the membrane surface of the inorganic porous membrane used in the terminal filtration membrane device 13, so the terminal filtration membrane device 13 must be sterilized periodically. Process. For example, when the filtration membrane device 13 is sterilized with hot water, it is carried out as follows.
すわなち、熱交換器15に熱媒供給管16を介して熱水
、スチーム等の熱媒を供給し、末端濾過膜装置13の供
給水を熱交換器15によって間接的に加熱してたとえば
90℃前後の熱水とし、当該熱水を末端濾過膜装置13
に濾過処理と同じ方向に供給する。次いでその熱透過水
をユースポイント配管17に流し、ユースポイント14
を通過させた後にブロー管19より糸外にブローする。That is, a heat medium such as hot water or steam is supplied to the heat exchanger 15 through the heat medium supply pipe 16, and the water supplied to the terminal filtration membrane device 13 is indirectly heated by the heat exchanger 15, for example. The hot water is heated to around 90°C, and the hot water is passed through the terminal filtration membrane device 13.
feed in the same direction as the filtration process. Next, the heat permeated water is passed through the use point piping 17, and the heat permeated water is passed through the use point piping 17.
After passing through the yarn, the yarn is blown out from the blow tube 19.
また、末端濾過膜装置13に供給した熱水の一部は、非
透過熱水として非透過木管18よりブローする。Further, a part of the hot water supplied to the terminal filtration membrane device 13 is blown from the non-permeable wood pipe 18 as non-permeable hot water.
本発明の超純水製造装置においては、上記末端濾過膜装
置13に用いている濾過膜が、前述したようなガラス等
の無機物を素材としたいわゆるセラミック膜であるので
、有機物を素材とした従来の濾過膜に比べて耐熱性の点
で格段に優れており、通常900℃程度の耐熱温度を有
している。従って、上述した程度の温度の熱水による殺
菌処理では、当該処理を定期的に繰り返しても濾過膜は
材質的にまた性能的に全く劣化しない。故に、前述した
超純水製造に際し、−次側純水中に残留する生菌や微粒
子等を長期間良好に除去することが出来、よって良質の
超純水を安定して製造することが出来る。In the ultrapure water production apparatus of the present invention, the filtration membrane used in the terminal filtration membrane device 13 is a so-called ceramic membrane made of an inorganic material such as glass as described above, so it is different from the conventional one made of an organic material. It has much better heat resistance than other filtration membranes, and usually has a heat resistance temperature of about 900°C. Therefore, in the sterilization treatment using hot water at the above-mentioned temperature, the filtration membrane does not deteriorate at all in terms of material or performance even if the treatment is repeated periodically. Therefore, during the production of ultrapure water as described above, viable bacteria and fine particles remaining in the downstream pure water can be effectively removed for a long period of time, and high quality ultrapure water can be stably produced. .
なお、上述の実施態様では濾過膜装置13を熱水によっ
て殺菌する場合について説明したが、本発明装置におい
ては当該濾過膜装置13に、上記熱水よりも更に温度の
高い100℃以上の高温スチームを直接供給して殺菌処
理することも出来、その場合は上記熱水殺菌に比べてよ
り完全な殺菌を行うことが出来る。In addition, in the above-mentioned embodiment, the case where the filtration membrane device 13 is sterilized with hot water was explained, but in the device of the present invention, the filtration membrane device 13 is heated with high-temperature steam of 100° C. or higher, which is higher than the hot water. It is also possible to sterilize by directly supplying sterilization, and in that case, more complete sterilization can be achieved than with the above-mentioned hot water sterilization.
また、本発明に用いるいわゆるセラミック膜の場合、耐
薬品性においても一般的に従来の有機性膜に比べて優れ
ており、従って殺菌処理を酸化剤、酸、アルカリ等の化
学薬品を含有する溶液を用いて行うことも出来、更にこ
のような殺菌処理に際して前記溶液を加温して用いるこ
とも可能である。Furthermore, in the case of the so-called ceramic membrane used in the present invention, it is generally superior in chemical resistance compared to conventional organic membranes, and therefore sterilization treatment is carried out using solutions containing chemicals such as oxidizing agents, acids, and alkalis. It is also possible to carry out the sterilization using a sterilizing agent, and furthermore, it is also possible to use the solution by heating it during such sterilizing treatment.
なお、上記高温スチームによる熱殺菌、あるいは上記化
学薬品による殺菌を行う場合は、濾過膜を装着する容器
等の、膜以外の濾過膜装置13構成部材も耐熱性あるい
は耐薬品性に優れたものを使用しなければならないこと
は言うまでもないことである。In addition, when heat sterilization using the above-mentioned high-temperature steam or sterilization using the above-mentioned chemicals is performed, the constituent members of the filtration membrane device 13 other than the membrane, such as the container in which the filtration membrane is attached, must also have excellent heat resistance or chemical resistance. It goes without saying that it must be used.
く効果〉
以上説明した如く、本発明の超純水製造装置は一次側純
水製造装置で得られる純水をユースポイントの直前で最
終的に濾過処理する末端濾過膜装置の濾過膜として、ガ
ラス、アルミナ等を素材とする耐熱性および耐薬品性に
優れた無機性多孔質膜、いわゆるセラミック膜を用いる
ので、当該膜を従来から行われているような熱水や化学
薬品による殺菌方法によって殺菌しても膜が劣化するよ
うなことは全くなく、よって生菌数や微粒子数の極めて
少ない超純水を長期間安定して得ることが出来る。Effect> As explained above, the ultrapure water production device of the present invention uses glass as the filtration membrane of the terminal filtration membrane device that finally filters the pure water obtained in the primary side pure water production device just before the point of use. Since we use an inorganic porous membrane made of materials such as alumina with excellent heat and chemical resistance, so-called ceramic membranes, the membrane can be sterilized by conventional sterilization methods using hot water or chemicals. However, the membrane does not deteriorate at all, and ultrapure water with an extremely low number of viable bacteria and particles can be stably obtained for a long period of time.
また、上記セラミック膜は特にその耐熱性において極め
て優れており、通常900℃程度の耐熱温度を有してい
るので、従来の有機性膜においては適用出来ないような
高温条件での殺菌処理を施すことが出来、従ってより効
果的な殺菌を行うことが可能となる。In addition, the above-mentioned ceramic membrane is particularly excellent in its heat resistance, and can usually withstand a temperature of about 900 degrees Celsius, so it can be sterilized under high-temperature conditions that cannot be applied to conventional organic membranes. Therefore, it becomes possible to perform more effective sterilization.
更に、従来の超純水製造装置においては上述の如く末端
濾過膜装置に有機性膜を使用していたので、殺菌処理に
より膜の劣化が進行するにつれて膜自身から有機物が溶
出するようになり、従って得られる超純水の水質が悪化
するという問題もあったが、本発明装置においては無機
性膜を用いるのでこのような心配は全くない。Furthermore, in conventional ultrapure water production equipment, organic membranes were used in the terminal filtration membrane devices as described above, so as the membranes deteriorated due to sterilization treatment, organic substances began to be eluted from the membranes themselves. Therefore, there was a problem that the quality of the obtained ultrapure water deteriorated, but the apparatus of the present invention uses an inorganic membrane, so there is no such concern at all.
第1図は本発明の実施態様の一例を示すフローの説明図
である。
1・・・原水 2・・・凝集沈殿装置3
・・・濾過装置
4.8・・・カートリッジフィルタ
5・・・逆浸透膜装置
6・・・2床3塔式純水製造装置
7・・・混床式純水製造装置
9・・・−次側純水 10・・・純水槽11・・
・混床式ポリシャー 12・・・紫外線照射装置13・
・・末端濾過膜装置
14・・・ユースポイント部 15・・・熱交換器16
・・・熱媒供給管
17・・・ユースポインl−配管FIG. 1 is an explanatory diagram of a flow showing an example of an embodiment of the present invention. 1...Raw water 2...Coagulation sedimentation device 3
...Filtering device 4.8...Cartridge filter 5...Reverse osmosis membrane device 6...Two-bed, three-column type pure water production device 7...Mixed bed type pure water production device 9...- Next side pure water 10...Pure water tank 11...
・Mixed bed polisher 12...UV irradiation device 13・
...Terminal filtration membrane device 14...Use point section 15...Heat exchanger 16
...Heating medium supply pipe 17...Use point l-piping
Claims (1)
水をユースポイントの直前で再度濾過処理する末端濾過
膜装置とを備えてなり、当該濾過膜装置は濾過膜として
無機性多孔質膜を用いたものであることを特徴とする超
純水製造装置。It is equipped with a primary side pure water production device and a terminal filtration membrane device that refilters the pure water obtained by the pure water production device just before the point of use, and the filtration membrane device is made of inorganic porous material as a filtration membrane. An ultrapure water production device characterized by using a membrane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP596389A JPH02187190A (en) | 1989-01-17 | 1989-01-17 | Ultrapure water making apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP596389A JPH02187190A (en) | 1989-01-17 | 1989-01-17 | Ultrapure water making apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02187190A true JPH02187190A (en) | 1990-07-23 |
Family
ID=11625538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP596389A Pending JPH02187190A (en) | 1989-01-17 | 1989-01-17 | Ultrapure water making apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02187190A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012086763A1 (en) * | 2010-12-24 | 2012-06-28 | 東レ株式会社 | Method for sterilizing separation membrane modules, sterilization device and apparatus for producing chemicals |
-
1989
- 1989-01-17 JP JP596389A patent/JPH02187190A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012086763A1 (en) * | 2010-12-24 | 2012-06-28 | 東レ株式会社 | Method for sterilizing separation membrane modules, sterilization device and apparatus for producing chemicals |
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