JPH0218950B2 - - Google Patents
Info
- Publication number
- JPH0218950B2 JPH0218950B2 JP2576086A JP2576086A JPH0218950B2 JP H0218950 B2 JPH0218950 B2 JP H0218950B2 JP 2576086 A JP2576086 A JP 2576086A JP 2576086 A JP2576086 A JP 2576086A JP H0218950 B2 JPH0218950 B2 JP H0218950B2
- Authority
- JP
- Japan
- Prior art keywords
- bed
- product
- cooling
- heating
- direct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/008—Soldering within a furnace
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Tunnel Furnaces (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明はチツプマウントや部品の接続等の際
に使用されるハンダ付け用還元性雰囲気炉に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a reducing atmosphere furnace for soldering used for chip mounts, connection of parts, etc.
従来ハイブリツドIC等の半導体製品は、まず
熱硬化性樹脂により半導体をプリント基板に固定
してからワイヤボンデイングを行ない、次に抵抗
やコンデンサ等の受動部品をハンダ付けするとい
う作業により製造される。
Traditionally, semiconductor products such as hybrid ICs are manufactured by first fixing the semiconductor to a printed circuit board using thermosetting resin, then performing wire bonding, and then soldering passive components such as resistors and capacitors.
そのうち受動部品のハンダ付けに際しては基板
の金属部分(銅部分)が高温に熱せられるため、
その部分の酸化を防ぐ目的で通常フラツクス入り
のクリームハンダが使用される。 When soldering passive components, the metal parts (copper parts) of the board are heated to high temperatures, so
Cream solder containing flux is usually used to prevent oxidation of that part.
しかし、このような製造方法の問題の一つとし
て、ハンダ付け終了後、フラツクスを取り除くた
めに洗浄作業及び乾燥作業を経なければならず、
生産効率を低化せしめてしまうという問題があつ
た。又、製品に取り付けられた受動部品の中には
可変抵抗のように摺動部があり、洗浄によつてフ
ラツクスをその部分に巻き込むと正常に作動しな
くなつたり、或は塗装を施した部分が洗浄により
消えてしまう等、洗浄に適さないものがある。 However, one of the problems with this manufacturing method is that after soldering, cleaning and drying must be performed to remove flux.
There was a problem that production efficiency was reduced. In addition, some of the passive parts attached to the product have sliding parts, such as variable resistors, and if flux gets caught in those parts during cleaning, they may not function properly, or painted parts may There are some items that are not suitable for cleaning, such as those that disappear when washed.
そこで最近では、フラツクス入りのハンダの代
わりに還元性雰囲気炉を使用して受動部品のハン
ダ付けを行ない、その後に洗浄作業を必要としな
いハンダ付け接着方法が実施されている。即ち、
ワイヤボンデイング終了後、必要箇所に受動部品
を載置した基板をコンベアベルトに載せて還元性
雰囲気炉内に入れ、内部に満たされた高温の還元
性雰囲気により間接加熱し、これによりハンダ付
けを行なおうとするものである。 Therefore, recently, a soldering bonding method has been implemented in which passive components are soldered using a reducing atmosphere furnace instead of flux-cored solder and does not require subsequent cleaning work. That is,
After wire bonding is completed, the board with passive components placed in the required locations is placed on a conveyor belt and placed in a reducing atmosphere furnace, where it is indirectly heated by the high temperature reducing atmosphere that fills the interior, and soldering is performed. This is what we are trying to do.
しかし、このような還元性雰囲気炉を使用して
ハンダ付けを行なおうとする場合、通常還元性雰
囲気として水素ガスが使用されること及びハンダ
接着の際の加熱が雰囲気による間接加熱であるこ
と等が原因で加熱温度のコントロールが難しく、
そのため通常8〜10m位の大きな炉を必要として
いた。又、雰囲気を高温に間接加熱するための設
備が必要となるほか、ハンダ付け終了後、炉内雰
囲気による製品の冷却を行なうため、該雰囲気を
間接冷却する冷却設備も必要となり、付帯設備拡
充によるコスト上昇を招いていた。更に炉内容量
が大きい程、間接加熱及び間接冷却に要する作業
時間が長くなると共にランニングコストも上昇す
るため、生産性を低下せしめることになる。
However, when attempting to solder using such a reducing atmosphere furnace, hydrogen gas is normally used as the reducing atmosphere, and heating during solder bonding is indirect heating by the atmosphere. This makes it difficult to control the heating temperature.
Therefore, a large furnace of about 8 to 10 meters was usually required. Additionally, in addition to requiring equipment to indirectly heat the atmosphere to a high temperature, after soldering is completed, the product is cooled by the atmosphere in the furnace, so cooling equipment is also required to indirectly cool the atmosphere. This led to an increase in costs. Furthermore, the larger the furnace capacity, the longer the working time required for indirect heating and indirect cooling, and the higher the running cost, which leads to a decrease in productivity.
本発明は以上のような問題に鑑み創案されたも
のであつて、上記還元性雰囲気炉を根本的に改良
することにより上記問題の解決を図つたものであ
る。 The present invention was devised in view of the above-mentioned problems, and aims to solve the above-mentioned problems by fundamentally improving the above-mentioned reducing atmosphere furnace.
第1図は本発明のハンダ付け用還元性雰囲気炉
の基本構成を示す概略図である。ここで本発明の
炉は直接加熱床1と、これに連続する直接冷却床
2と、前記直接加熱床1上方に設けられた還元ボ
ツクス3と、直接加熱床1入側に設けられている
プツシヤー4とから成る。
FIG. 1 is a schematic diagram showing the basic configuration of a reducing atmosphere furnace for soldering according to the present invention. Here, the furnace of the present invention includes a direct heating bed 1, a direct cooling bed 2 continuous to the direct heating bed 1, a reduction box 3 provided above the direct heating bed 1, and a pusher provided on the inlet side of the direct heating bed 1. It consists of 4.
前記直接加熱床1は、電気ヒータ等、製品10
0の直接加熱ができ、且つ加熱温度のコントロー
ルが可能なものを用い、その上で製品100の載
置及び移動ができる床状の構成としたものであ
る。 The direct heating bed 1 includes a product 10 such as an electric heater.
A device that can directly heat the product 100 and control the heating temperature is used, and has a floor-like structure on which the product 100 can be placed and moved.
又、直接冷却床2は、水冷装置のように製品1
00の直接冷却ができ且つ冷却温度のコントロー
ルが可能なものを用い、上記加熱床1と同じくそ
の上で製品100の載置及び移動ができる床状の
構成としたものである。 In addition, the direct cooling bed 2 is used to cool the product 1 like a water cooling device.
00, which can be directly cooled and whose cooling temperature can be controlled, has a floor-like structure on which the product 100 can be placed and moved, similar to the heating bed 1 described above.
更に還元ボツクス3は、直接加熱床1上方を覆
うように設置され、内部を還元性雰囲気で満た
し、製品100加熱中に酸化を阻止する設備であ
る。 Furthermore, the reduction box 3 is installed so as to directly cover the heating bed 1, and is a facility that fills the inside with a reducing atmosphere and prevents oxidation while the product 100 is being heated.
前記プツシヤー4は、製品100の載置及び移
動路として前記直接加熱床1及び直接冷却床2が
設けられたため、従来のコンベアベルトの代わり
に製品100を直接加熱床1入側から還元ボツク
ス3内を通つて直接冷却床2出側方向へ押し出す
ものである。 Since the pusher 4 is provided with the direct heating bed 1 and the direct cooling bed 2 as a path for placing and moving the product 100, the product 100 is directly transferred from the input side of the heating bed 1 into the reduction box 3 instead of using the conventional conveyor belt. It is directly pushed out toward the exit side of the cooling bed 2 through the cooling bed 2.
以上のような構成を有する炉では、ワイヤボン
デイング終了後、受動部品及びこれを接着するハ
ンダ等の搭載せしめられた半導体製品100が前
記プツシヤー4により直接加熱床1の入側から還
元ボツクス3内に押し出され、そして還元性雰囲
気中で直接加熱床1により直接加熱される。この
時、該直接加熱床1はその加熱温度をコントロー
ルしながら加熱を行なう。このようにして製品1
00のハンダ付けがなされた後は、更にプツシヤ
ー4により該製品100は直接冷却床2側に押し
出され、その冷却が行なわれる。
In the furnace having the above configuration, after wire bonding is completed, the semiconductor product 100 mounted with passive components and solder for bonding them is directly transferred from the entry side of the heating bed 1 into the reduction box 3 by the pusher 4. It is extruded and directly heated by a heating bed 1 in a reducing atmosphere. At this time, the direct heating bed 1 performs heating while controlling its heating temperature. In this way product 1
After the product 100 is soldered, the pusher 4 pushes the product 100 directly to the cooling bed 2, where it is cooled.
第2図は本発明の還元性雰囲気炉の一実施例を
示す側面図である。そのうち、10は直接加熱床
を、20は直接冷却床を、30は還元ボツクス
を、40はプツシヤーを各示している。
FIG. 2 is a side view showing an embodiment of the reducing atmosphere furnace of the present invention. Of these, 10 indicates a direct heating bed, 20 indicates a direct cooling bed, 30 indicates a reduction box, and 40 indicates a pusher.
上記直接加熱床10は、第3図に示すように、
ステンレス製フレーム11内幅方向に複数本の電
気ヒータ12を設置すると共に、これらの電気ヒ
ータ12上面に接するように同図に示す孔開きス
テンレス板13を配したもので構成され、更にそ
のステンレス板13上に敷設された製品移動用ガ
イドレール14a,14bの上に製品100が移
送された時に、該製品100を電気ヒータ12に
より直接加熱する。このように直接加熱床10は
電気ヒータ12を利用して製品100を直接加熱
するため、加熱温度を最適温度(約350℃)に速
やかに調整することができる。 The above-mentioned directly heated bed 10, as shown in FIG.
A plurality of electric heaters 12 are installed in the inner width direction of a stainless steel frame 11, and a perforated stainless steel plate 13 shown in the figure is arranged so as to be in contact with the upper surface of these electric heaters 12. When the product 100 is transferred onto the product movement guide rails 14a and 14b laid on the product movement guide rails 14a and 14b, the product 100 is directly heated by the electric heater 12. In this way, since the direct heating bed 10 directly heats the product 100 using the electric heater 12, the heating temperature can be quickly adjusted to the optimum temperature (approximately 350° C.).
又、直接冷却床20は、前記直接加熱床10に
連続して設けられており、その構造は第4図aに
示すように、アルミ製容器21内にS字状に蛇行
し、上方が開放している冷却水路22が設けら
れ、その上方開放側にシリコンゴム(図示なし)
を介して製品移動用ガイドレール24a,24b
の敷設された同図bに示す孔開きステンレス板2
3が搭載されている。そして前記冷却水路22内
にはポンプ25によりラジエタ26で冷却された
水冷水が循環せしめられ、前記ステンレス板23
上にハンダ付けの終了した製品100が移送され
た時にこれを冷却せしめる。このように直接冷却
床20は、冷却水をラジエタ26で冷却しながら
循環せしめて製品100を直接冷却するため、速
やかな冷却ができる。 Further, the direct cooling bed 20 is provided continuously with the direct heating bed 10, and its structure is as shown in FIG. A cooling water channel 22 is provided, and silicon rubber (not shown) is provided on the upper open side of the cooling water channel 22.
Guide rails 24a, 24b for moving products through
The perforated stainless steel plate 2 shown in Fig. b is laid with
3 is installed. Cooling water cooled by a radiator 26 is circulated in the cooling water channel 22 by a pump 25.
When the product 100 on which soldering has been completed is transferred, it is cooled. In this way, the direct cooling bed 20 directly cools the product 100 by circulating the cooling water while being cooled by the radiator 26, so that rapid cooling can be achieved.
更に前記還元ボツクス30は、直接加熱床10
上方を覆うように配置された密閉箱状のものであ
つて、その上部に水素ガス注入口31が設けら
れ、且つそこへ水素ガス源(図示なし)から導入
管32がつなげられているため、水素ガスの注入
によりボツクス30内部が還元性雰囲気で満たさ
れた状態になつている。又、還元ボツクス30の
側壁面には直接加熱床10及び直接冷却床20の
長さ方向に沿つて製品100の搬送のための出入
口33,34が設けられており、そこにエアカー
テン状にN2ガスが流れてガスシールドし、内部
に大気が侵入しないようにしている。 Further, the reduction box 30 is directly connected to the heating bed 10.
It is a closed box-shaped thing arranged to cover the upper part, and a hydrogen gas inlet 31 is provided at the top, and an introduction pipe 32 is connected to it from a hydrogen gas source (not shown). The interior of the box 30 is filled with a reducing atmosphere due to the injection of hydrogen gas. In addition, entrances and exits 33 and 34 for conveying the product 100 are provided on the side wall surface of the reduction box 30 along the length direction of the direct heating bed 10 and the direct cooling bed 20, and an air curtain-like N 2 gas flows and creates a gas shield, preventing atmospheric air from entering the interior.
そして前記プツシヤー40は、直接加熱床10
入側外部に設けられ、ロツド42先端に当接面4
3を有する油圧シリンダ41からなり、前記製品
100を直接加熱床10入側から還元ボツクス3
0内を通つて直接冷却床20出側方向へ押し出す
装置である。 The pusher 40 is directly connected to the heating bed 10.
Provided on the outside of the entry side, the contact surface 4 is provided at the tip of the rod 42.
The product 100 is directly transported from the input side of the heating bed 10 to the reduction box 3.
This is a device that directly pushes the cooling bed 20 toward the exit side through the interior of the cooling bed 20.
以上のような構成からなる本実施例の還元性雰
囲気炉は次のようにして使用される。まずワイヤ
ボンデイング終了後、受動部品及びこれを接着す
るハンダ等の搭載せしめられた半導体製品100
を直接加熱床10入側のガイドレール14a,1
4b上に置く。そして該プツシヤー40の当接面
43を製品100に当てて前記ガイドレール14
a,14bに沿つて押し出し、入口34から還元
ボツクス30内にゆつくり移送する。すると水素
ガスの満たされた還元ボツクス30内部で製品1
00は、直接加熱床10のステンレス板13上を
移動するため、該直接加熱床10の電気ヒータ1
2により、直接加熱され、速やかに350℃程度に
昇温する。このようにして直接加熱床10上を移
動する間に製品100のハンダ付けがなされ、そ
の間に該ハンダ付け部分は水素ガスにより還元さ
れることになるため、速やかに且つ確実に受動部
品の接続がなされる。更にプツシヤー40により
該製品100が出口35を通つて還元ボツクス3
0外部に押し出されると、製品100はガイドレ
ール24a,24bに沿つて直接冷却床20上に
移動し、そこで速やかに冷却される。 The reducing atmosphere furnace of this embodiment having the above configuration is used in the following manner. First, after wire bonding is completed, a semiconductor product 100 is mounted with passive components and solder for bonding them.
The guide rails 14a, 1 on the inlet side of the directly heated bed 10
Place it on 4b. Then, the contact surface 43 of the pusher 40 is applied to the product 100 and the guide rail 14 is pressed against the product 100.
a, 14b, and slowly transferred into the reduction box 30 from the inlet 34. Then, product 1 is removed inside the reduction box 30 filled with hydrogen gas.
00 moves on the stainless steel plate 13 of the direct heating bed 10, so the electric heater 1 of the direct heating bed 10
2, it is directly heated and the temperature quickly rises to about 350°C. In this way, the product 100 is soldered while moving directly on the heating bed 10, and during this time the soldered part is reduced by hydrogen gas, so that passive components can be connected quickly and reliably. It will be done. Further, the product 100 is passed through the outlet 35 by the pusher 40 to the return box 3.
Once pushed outside, the product 100 moves directly onto the cooling bed 20 along the guide rails 24a, 24b, where it is rapidly cooled.
以上説明したように本発明の還元性雰囲気炉に
よれば、製品の加熱・冷却が還元性雰囲気による
間接加熱・間接冷却に代わり、直接加熱床及びび
直接冷却床による直接加熱・直接冷却によつてな
されるため、加熱温度のコントロールが容易にな
ると共に加熱・冷却が速やかになされ、更に装置
全体が1m位にコンパクト化することができると
いう優れた効果を有している。又、上述のように
雰囲気による間接加熱・間接冷却の代わりに、直
接加熱床及び直接冷却床による加熱・冷却がなさ
れるため、雰囲気加熱・冷却設備が必要なくなつ
て設備コストの低減を図ることができると共に、
加熱・冷却に要する作業時間の短縮及びランニン
グコストの低減がなされ、それにより生産性を向
上せしめることができるという利点も有してい
る。
As explained above, according to the reducing atmosphere furnace of the present invention, heating and cooling of the product is performed by direct heating and cooling using a direct heating bed and a direct cooling bed, instead of indirect heating and cooling using a reducing atmosphere. Since the heating temperature is easily controlled, heating and cooling can be performed quickly, and the entire device can be made compact to about 1 m, which is an excellent effect. In addition, as mentioned above, instead of indirect heating and cooling using the atmosphere, heating and cooling are performed using a direct heating bed and a direct cooling bed, which eliminates the need for atmosphere heating and cooling equipment, reducing equipment costs. Along with being able to
It also has the advantage that the working time required for heating and cooling can be shortened and running costs can be reduced, thereby improving productivity.
尚、本発明の還元性雰囲気炉は、大容量のダイ
オードやサイリスタ等大きな接着面積を必要とす
るもののハンダ付けを行なう際にも、その接着面
の気泡の発生を防止するために使用することがで
きる。 The reducing atmosphere furnace of the present invention can also be used to prevent bubbles from forming on the bonding surface when soldering items that require a large bonding area, such as large-capacity diodes and thyristors. can.
第1図は本発明の基本構成を示す概略図、第2
図は本発明の一実施例を示す側面図、第3図は該
実施例における直接加熱床の構成を示す説明図、
第4図a,bは同じく直接冷却床の構成を示す説
明図である。
図中、1,10は直接加熱床、2,20は直接
冷却床、3,30は還元ボツクス、4,40はプ
ツシヤー、100は半導体製品を各示す。
Figure 1 is a schematic diagram showing the basic configuration of the present invention, Figure 2 is a schematic diagram showing the basic configuration of the present invention.
The figure is a side view showing an embodiment of the present invention, and FIG. 3 is an explanatory diagram showing the configuration of a direct heating bed in the embodiment.
FIGS. 4a and 4b are explanatory diagrams similarly showing the structure of the direct cooling bed. In the figure, 1 and 10 are direct heating beds, 2 and 20 are direct cooling beds, 3 and 30 are reduction boxes, 4 and 40 are pushers, and 100 is a semiconductor product.
Claims (1)
接冷却床と、前記直接加熱床上方に設置され内部
が還元性雰囲気で満たされた還元ボツクスと、製
品を直接加熱床入側から還元ボツクス内を通つて
直接冷却床出側方向へ押し出すプツシヤーとを有
することを特徴とするハンダ付け用還元性雰囲気
炉。1. A direct heating bed, a direct cooling bed provided in continuation with the direct heating bed, a reduction box installed above the direct heating bed and filled with a reducing atmosphere, and a reduction box for transporting the product from the entry side of the direct heating bed. A reducing atmosphere furnace for soldering, characterized in that it has a pusher that pushes the cooling bed directly through the interior toward the exit side of the cooling bed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2576086A JPS62183960A (en) | 1986-02-10 | 1986-02-10 | Reducing atmosphere furnace for soldering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2576086A JPS62183960A (en) | 1986-02-10 | 1986-02-10 | Reducing atmosphere furnace for soldering |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62183960A JPS62183960A (en) | 1987-08-12 |
| JPH0218950B2 true JPH0218950B2 (en) | 1990-04-27 |
Family
ID=12174785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2576086A Granted JPS62183960A (en) | 1986-02-10 | 1986-02-10 | Reducing atmosphere furnace for soldering |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62183960A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0753807Y2 (en) * | 1990-08-13 | 1995-12-13 | 千住金属工業株式会社 | Reflow furnace |
| JPH0739483Y2 (en) * | 1990-11-15 | 1995-09-13 | 千住金属工業株式会社 | Reflow furnace |
| JP2000263223A (en) * | 1999-03-18 | 2000-09-26 | Japan Unix Co Ltd | Gas jet type soldering method |
| JP2007012840A (en) * | 2005-06-30 | 2007-01-18 | Honda Motor Co Ltd | Soldering equipment |
-
1986
- 1986-02-10 JP JP2576086A patent/JPS62183960A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62183960A (en) | 1987-08-12 |
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