JPH02189986A - ニオブ膜または窒化ニオブ膜の加工方法 - Google Patents

ニオブ膜または窒化ニオブ膜の加工方法

Info

Publication number
JPH02189986A
JPH02189986A JP1008567A JP856789A JPH02189986A JP H02189986 A JPH02189986 A JP H02189986A JP 1008567 A JP1008567 A JP 1008567A JP 856789 A JP856789 A JP 856789A JP H02189986 A JPH02189986 A JP H02189986A
Authority
JP
Japan
Prior art keywords
aluminum
niobium
film
mask
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1008567A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0578197B2 (2
Inventor
Mutsuo Hidaka
睦夫 日高
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP1008567A priority Critical patent/JPH02189986A/ja
Publication of JPH02189986A publication Critical patent/JPH02189986A/ja
Publication of JPH0578197B2 publication Critical patent/JPH0578197B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP1008567A 1989-01-19 1989-01-19 ニオブ膜または窒化ニオブ膜の加工方法 Granted JPH02189986A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1008567A JPH02189986A (ja) 1989-01-19 1989-01-19 ニオブ膜または窒化ニオブ膜の加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1008567A JPH02189986A (ja) 1989-01-19 1989-01-19 ニオブ膜または窒化ニオブ膜の加工方法

Publications (2)

Publication Number Publication Date
JPH02189986A true JPH02189986A (ja) 1990-07-25
JPH0578197B2 JPH0578197B2 (2) 1993-10-28

Family

ID=11696640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1008567A Granted JPH02189986A (ja) 1989-01-19 1989-01-19 ニオブ膜または窒化ニオブ膜の加工方法

Country Status (1)

Country Link
JP (1) JPH02189986A (2)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58125884A (ja) * 1982-01-22 1983-07-27 Hitachi Ltd ジヨセフソン集積回路の作製法
JPS62183577A (ja) * 1986-02-07 1987-08-11 Fujitsu Ltd ジヨセフソン素子の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58125884A (ja) * 1982-01-22 1983-07-27 Hitachi Ltd ジヨセフソン集積回路の作製法
JPS62183577A (ja) * 1986-02-07 1987-08-11 Fujitsu Ltd ジヨセフソン素子の製造方法

Also Published As

Publication number Publication date
JPH0578197B2 (2) 1993-10-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term