JPH02192464A - Production of sintered porous material of silicon carbide - Google Patents

Production of sintered porous material of silicon carbide

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Publication number
JPH02192464A
JPH02192464A JP63273143A JP27314388A JPH02192464A JP H02192464 A JPH02192464 A JP H02192464A JP 63273143 A JP63273143 A JP 63273143A JP 27314388 A JP27314388 A JP 27314388A JP H02192464 A JPH02192464 A JP H02192464A
Authority
JP
Japan
Prior art keywords
silicon carbide
sintering
sintered
hour
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63273143A
Other languages
Japanese (ja)
Inventor
Hidetoshi Yamauchi
山内 英俊
Yoshimi Ohashi
大橋 義美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP63273143A priority Critical patent/JPH02192464A/en
Publication of JPH02192464A publication Critical patent/JPH02192464A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To increase porosity, uniformalize crystal size and pore size, and increase an effective surface area in contact with fluid by molding a mixture of a SiC powder and molding binder and subjecting to primary sintering, de- carbon treating and secondary sintering. CONSTITUTION:A molding binder (e.g. methyl cellulose) is added to a mixture of a SiC powder containing >=70wt.% beta-type SiC and a crystal growth auxiliary (e.g. Al) as necessary and molded to a fixed shape to obtain a raw molded material. Next, the raw molded material is dewaxed by heating by 700-800 deg.C for 1-2 hour in an inert gas atmosphere and sintering at 1500-1900 deg.C for 0.5-2 hour to obtain a first sintered material. Then, said sintered material is subjected to de-carbon treatment by heating at 400-900 deg.C for 1-4 hour, thus to secondary sintering by heating at 2000-2400 deg.C for 2-6 hour to afford aimed SiC sintered porous material having 20-95vol% porosity and 5-50mum pore size.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、炭化ケイ素焼結多孔体の製造方法に関し、さ
らに詳しくは、自動車、発電機等の内燃機関、窯業、金
属工業における工業炉等からの徘ガス中に含まれる微粒
炭素を捕集するフィルターとして用いられる炭化ケイ素
焼結多孔体の製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a sintered silicon carbide porous body, and more specifically, to internal combustion engines such as automobiles and generators, industrial furnaces in the ceramic industry, metal industry, etc. The present invention relates to a method for producing a porous sintered silicon carbide body used as a filter to collect particulate carbon contained in stray gas from.

[従来の技術及び発明が解決しようとする課題]従来、
徘ガス中に含まれる微粒炭素を捕集し除去するために、
排気経路中にセラミック製焼結多孔体をフィルターとし
て用いることが多く試みられている。
[Prior art and problems to be solved by the invention] Conventionally,
In order to capture and remove particulate carbon contained in wandering gas,
Many attempts have been made to use a ceramic sintered porous body as a filter in the exhaust path.

例えば、コージェライトや炭化ケイ素を主成分とするハ
ニカム状のものが多く用いられている。
For example, honeycomb-shaped materials whose main components are cordierite or silicon carbide are often used.

しかし、コージェライトを主成分とするものにあっては
、押出し成形される際にハニカム状焼結多孔体隔壁のセ
ラミック粒子が押出し方向に配向し易いため、流体物が
隔壁を通過し難く圧力損失が大きくなるという問題があ
る。また、セラミック粒子が板状で、かつ、表面が比較
的平滑であるために、流体物との接触表面積が少なく、
隔壁間の熱移動等を効率よく行なうことができないとい
う問題がある。
However, when cordierite is the main component, the ceramic particles in the honeycomb-shaped sintered porous partition walls tend to be oriented in the extrusion direction during extrusion molding, making it difficult for fluid to pass through the partition walls, resulting in pressure loss. The problem is that it becomes large. In addition, since the ceramic particles are plate-shaped and have a relatively smooth surface, the surface area that comes into contact with the fluid is small.
There is a problem in that heat transfer between partition walls cannot be carried out efficiently.

一方、炭化ケイ素を主成分とするものは、コージェライ
トを主成分とするものより融点が高く、フィルター再使
用のための、高温加熱を行なっても、それに耐えること
ができる。しかし、隔壁中に存在する気孔の占める割合
が30〜40%と比較的少ないため、通気抵抗が大きく
、かつ、流体物との接触有効表面積が少な(、触媒坦体
やフィルターなどの用途には適さないものが多いという
問題がある。
On the other hand, those whose main component is silicon carbide have a higher melting point than those whose main component is cordierite, and can withstand high-temperature heating for filter reuse. However, since the proportion of pores in the partition walls is relatively small at 30 to 40%, the ventilation resistance is large and the effective surface area for contact with fluids is small (for applications such as catalyst carriers and filters). The problem is that there are many things that are not suitable.

また、炭化ケイ素を主成分とするものは、焼結条件や助
剤などの影響を受けやすく、特に、形状が大きくなると
よりその影響が大きくなり、結晶形状や気孔率の均一性
に欠けるという問題がある。
In addition, silicon carbide as a main component is easily affected by sintering conditions and auxiliary agents, and this effect becomes especially large as the shape becomes larger, resulting in a lack of uniformity in crystal shape and porosity. There is.

本発明は、上記問題点を解消し、高い気孔率と均一な結
晶径と気孔径を有し、流体(排ガス)との接触有効表面
積が大きく、効率よく流体中の微粒炭素を捕集し除去す
ることができる炭化ケイ素焼結多孔体の製造方法の提供
を目的とする。
The present invention solves the above problems, has high porosity, uniform crystal size and pore size, has a large effective surface area for contact with fluid (exhaust gas), and efficiently collects and removes particulate carbon from fluid. The purpose of the present invention is to provide a method for manufacturing a sintered silicon carbide porous body that can be used to produce a silicon carbide sintered porous body.

[課題を解決するための手段] 本発明の炭化ケイ素焼結多孔体の製造方法は、炭化ケイ
素粉末を出発原料とし、必要により結晶成長助剤を添加
し混合物を得る第1工程;該混合物に成形用結合剤を添
加し所定の形状に成形した生成形体を得る第2工程:該
生成形体を、不活性ガス雰囲気下において、脱脂処理後
1500〜1900℃の温度範囲内で一次焼結する第3
工程;該一次焼結体を、不活性ガス雰囲気下において、
2000〜2400℃の温度範囲内で二次焼結する第4
工程:よりなる炭化ケイ素焼結多孔体の製造方法におい
て、該第4工程における二次焼結前に、第3工程で得ら
れた一次焼結体を、酸化雰囲気下、400〜900℃の
温度範囲内で加熱する脱炭処理を行なうことを特徴とす
る。
[Means for Solving the Problems] The method for producing a sintered silicon carbide porous body of the present invention includes a first step of using silicon carbide powder as a starting material and adding a crystal growth aid if necessary to obtain a mixture; A second step of adding a molding binder to obtain a green body molded into a predetermined shape: A first step in which the green body is primarily sintered within a temperature range of 1500 to 1900°C after degreasing in an inert gas atmosphere. 3
Step: The primary sintered body is placed in an inert gas atmosphere,
The fourth step is secondary sintering within a temperature range of 2000 to 2400°C.
Step: In the method for producing a sintered silicon carbide porous body, the primary sintered body obtained in the third step is heated at a temperature of 400 to 900°C in an oxidizing atmosphere before the secondary sintering in the fourth step. It is characterized by performing decarburization treatment by heating within a range.

まず、第1工程においては、β型の炭化ケイ素粉末を出
発原料とすることが好ましい。その理由は、β型の炭化
ケイ素結晶は比較的低温で合成される低温安定型結晶で
あり、焼結に際し、その−部が4日、6Hあるいは15
R型等の高温安定型のα型結晶に相転移して板状結晶を
形成し易いからである。また、結晶の成長性にも優れて
いるからである。特に、β型炭化ケイ素を60重量%以
上含有する出発原料を用いることにより、本発明の目的
とする焼結多孔体を好適に製造することができる。なか
でも、β型炭化ケイ素を70重量%以上含有する出発原
料を使用することが有利である。
First, in the first step, it is preferable to use β-type silicon carbide powder as a starting material. The reason for this is that β-type silicon carbide crystals are low-temperature stable crystals that are synthesized at relatively low temperatures, and during sintering, the − part of the β-type silicon carbide crystal is synthesized at a relatively low temperature.
This is because it easily undergoes a phase transition to a high-temperature stable α-type crystal such as the R-type and forms a plate-like crystal. This is also because it has excellent crystal growth properties. In particular, by using a starting material containing 60% by weight or more of β-type silicon carbide, the sintered porous body targeted by the present invention can be suitably produced. Among these, it is advantageous to use a starting material containing 70% by weight or more of β-type silicon carbide.

結晶成長助剤としては、例えば、アルミニウム、ホウ素
、鉄、炭素等が挙げられる。
Examples of crystal growth aids include aluminum, boron, iron, carbon, and the like.

上記した物質のうち、アルミニウム、ホウ素、鉄は、炭
化ケイ素の結晶粒成長の速度を速(する働きを有してい
る。したがって、これらの物質の存在する箇所では極め
て多くの板状結晶の核が生成される。そして、それぞれ
の部分で板状結晶の発達が起こる結果、形成される板状
結晶の大きさが制限されるので、これらの物質が多く存
在する箇所はど細かい組織の三次元網目構造とすること
ができる。
Among the above-mentioned substances, aluminum, boron, and iron have the function of accelerating the growth rate of crystal grains of silicon carbide. Therefore, in areas where these substances exist, a large number of plate-like crystal nuclei are generated. As a result of the development of plate-like crystals in each part, the size of the plate-like crystals that are formed is limited, so the areas where many of these substances exist have fine three-dimensional structures. It can have a mesh structure.

これに対し、炭素は上記物質とは逆に炭化ケイ素の結晶
粒成長の速度を遅くする働きを有している。したがって
、これらの物質の存在する箇所では板状結晶の核生成が
抑制されるので、形成される板状結晶の数は相対的に少
なくなる。その結果、それぞれの板状結晶が比較的大き
く成長するので、これらの物質が多く存在する箇所はど
大きな組織の三次元網目構造とすることができる。
On the other hand, carbon has the function of slowing down the growth rate of silicon carbide crystal grains, contrary to the above-mentioned substances. Therefore, nucleation of plate crystals is suppressed at locations where these substances exist, so the number of plate crystals formed becomes relatively small. As a result, each plate-shaped crystal grows relatively large, so that a large three-dimensional network structure can be formed in areas where many of these substances are present.

次に、第2工程において、第1工程において得られた混
合物にメチルセルロース、ポリビニルアルコール、水ガ
ラス等の成形用結合剤を添加し、押出し成形、シート成
形、プレス成形等の方法により所定の形状1例えばハニ
カム状に成形した生成形体とする。
Next, in the second step, a molding binder such as methyl cellulose, polyvinyl alcohol, or water glass is added to the mixture obtained in the first step, and the mixture is formed into a predetermined shape 1 by extrusion molding, sheet molding, press molding, etc. For example, it is a formed body formed into a honeycomb shape.

第3工程においては、まず、第2工程で得られた生成形
体を不活性ガス雰囲気下、700〜800℃で1〜2時
間加熱して脱脂処理を行なう。しかる後、同じく不活性
ガス雰囲気下、1500〜1900℃の温度範囲内で0
.5〜2時間焼結して一次焼結体とする。
In the third step, first, the formed body obtained in the second step is degreased by heating at 700 to 800° C. for 1 to 2 hours in an inert gas atmosphere. After that, it was heated to 0 within the temperature range of 1500 to 1900°C under the same inert gas atmosphere.
.. Sinter for 5 to 2 hours to obtain a primary sintered body.

後述する二次焼結処理の温度より低温で一次焼結するの
は、多孔体の加工あるいは表面処理等を容易にするため
である。また、焼結温度を1500〜1900℃の温度
範囲とするのは、多孔体の加工をする上において容易な
強度とするとともに生成形体中の炭素に影響のない温度
とするためである。
The reason why the primary sintering is performed at a lower temperature than the temperature of the secondary sintering treatment described later is to facilitate processing or surface treatment of the porous body. Further, the reason why the sintering temperature is set in the range of 1500 to 1900°C is to obtain strength that is easy to process into the porous body, and to set the temperature at a temperature that does not affect the carbon in the formed body.

例えば、コーティング処理や連続生成形した後、切断あ
るいは充填等により成形加工を行なう場合において、生
成形体の状態では処理および加工が困難であり、また、
後加工処理が必要な場合に、二次焼結した後に後加工を
施そうとすると、セラミック材質のため硬くて機械加工
等を施すことが非常に困難となりコストの面より経済的
でない。
For example, when forming by cutting or filling after coating or continuous forming, processing and processing are difficult in the formed form, and
If post-processing is required, if post-processing is attempted after secondary sintering, the ceramic material is hard and difficult to perform machining, making it uneconomical in terms of cost.

本発明においては、第4工程において、二次焼結処理を
行なう前に、−次焼結体を、酸化雰囲気下、400〜9
00℃の温度範囲内で1〜4時間加熱し脱炭処理を行な
うことを最大の特徴とする。これは、均一な結晶径と気
孔径並びに高い気孔率を有する多孔体とするために、−
次焼結で残留した炭素を除去するために行なう処理であ
る6すなわち、上記したように、−次焼結後に残留した
炭素は、二次焼結時に結晶成長抑制剤として作用し、均
一な気孔径や高い気孔率の多孔体とすることが困難とな
る。
In the present invention, in the fourth step, before performing the secondary sintering treatment, the secondary sintered body is heated to a temperature of 40 to 9
The biggest feature is that the decarburization treatment is performed by heating within the temperature range of 00°C for 1 to 4 hours. This is done in order to create a porous body with uniform crystal size and pore size as well as high porosity.
This is a treatment performed to remove carbon remaining after the secondary sintering.6 In other words, as mentioned above, the carbon remaining after the secondary sintering acts as a crystal growth inhibitor during the secondary sintering, creating a uniform atmosphere. It becomes difficult to form a porous body with a high pore size and high porosity.

特に、形状が大きい、例えば、外径50mm以上の多孔
体においては、残留炭素濃度が部分により異なり、結晶
成長速度に相違が生じるので、均一で大きな気孔径とす
ることが困難となる。
In particular, in a porous body having a large shape, for example, an outer diameter of 50 mm or more, the residual carbon concentration differs from part to part, causing a difference in crystal growth rate, making it difficult to obtain uniform and large pore diameters.

そこで本発明の製造方法は、この脱炭処理を行なうこと
により多孔体全体にわたって均一な結晶径と気孔径とを
有する焼結多孔体を製造しようとするものである。脱炭
処理の温度が400℃より低いと脱炭速度が遅く実質的
に脱炭が困難となる。また、900℃を超えると炭素と
ともにマドフックスの炭化ケイ素が酸化するおそれがあ
る。
Therefore, the manufacturing method of the present invention attempts to manufacture a sintered porous body having uniform crystal diameter and pore diameter throughout the porous body by performing this decarburization treatment. If the decarburization temperature is lower than 400° C., the decarburization rate is slow and decarburization becomes substantially difficult. Moreover, if the temperature exceeds 900°C, there is a possibility that the silicon carbide of Madfuchs will be oxidized together with the carbon.

好ましくは500〜750℃の範囲である。酸化雰囲気
としては、通常、空気中や酸素中を利用することができ
るが、CO□ガスを含んだ雰囲気はマイルドな酸化が進
みマトリックスの炭化ケイ素の酸化を抑えられる。
Preferably it is in the range of 500 to 750°C. Generally, air or oxygen can be used as the oxidizing atmosphere, but an atmosphere containing CO□ gas allows mild oxidation to proceed and suppresses oxidation of silicon carbide in the matrix.

かかる処理を施すことにより、本発明により製造される
炭化ケイ素焼結多孔体の平均電孔径な5〜50μmの範
囲とすることができる。5μm未満の場合には、炭化ケ
イ素結晶によって構成される気孔が、結晶の占める容積
に比べて小さくなり、高い気孔率と大きな気孔径を有す
ることが困難となる。また通気抵抗も高くなる。一方、
50μmを超えた場合には、板状結晶の接合部の強度が
低くなるため、焼結多孔体自体の強度が著しく低いもの
となり、その結果、焼結多孔体の保形をも困難にする。
By performing such a treatment, the average pore diameter of the silicon carbide sintered porous body produced by the present invention can be in the range of 5 to 50 μm. If it is less than 5 μm, the pores formed by the silicon carbide crystals will be smaller than the volume occupied by the crystals, making it difficult to have high porosity and large pore diameter. In addition, ventilation resistance also increases. on the other hand,
If it exceeds 50 μm, the strength of the bonded portion of the plate crystals will be low, and the strength of the sintered porous body itself will be extremely low, making it difficult to maintain the shape of the sintered porous body.

平均気孔径を25〜30μmの範囲とすることがより好
ましい。
It is more preferable that the average pore diameter is in the range of 25 to 30 μm.

次に、脱炭処理を行なった一次焼結体を不活性ガス雰囲
気下、2000〜2400℃の温度範囲内で2〜6時間
二次焼結処理を行なう。
Next, the primary sintered body subjected to the decarburization treatment is subjected to a secondary sintering treatment in an inert gas atmosphere within a temperature range of 2000 to 2400° C. for 2 to 6 hours.

なお、ハニカム構造体の場合には、通常、ハニカム状の
生成形体を成形した後、あるいは脱炭処理を行なった後
、所定の貫通孔の端部に例えば該生成形体と同材料から
成る封止剤を充填して、焼結処理を行なうことになる。
In the case of a honeycomb structure, after the honeycomb-shaped formed body is formed or after decarburization treatment, a seal made of the same material as the formed body is usually placed at the end of a predetermined through hole. The material will be filled with a sintering agent and the sintering process will be performed.

不活性ガス雰囲気下、外気の侵入を遮断しつつ焼結する
ことにより、隣接する炭化ケイ素結晶同士を融合させ、
かつ、炭化ケイ素の板状結晶の成長を促進させることが
できる。したがって、焼結多孔体を、板状結晶が複雑な
状態で絡み合った三次元の網目構造とすることができる
。その結果、流体(排ガス)と接触する有効表面積が太
き(なり、微粒炭素の捕集効率を高めることができる。
By sintering in an inert gas atmosphere while blocking the intrusion of outside air, adjacent silicon carbide crystals are fused together,
Moreover, the growth of plate-like crystals of silicon carbide can be promoted. Therefore, the sintered porous body can have a three-dimensional network structure in which plate crystals are entangled in a complicated state. As a result, the effective surface area that comes into contact with the fluid (exhaust gas) becomes larger, and the efficiency of collecting particulate carbon can be increased.

また、ハニカム構造体の場合には、ハエカムの軸方向か
らの流れを隔壁内に取り込み易くなる。
In addition, in the case of a honeycomb structure, the flow from the axial direction of the honeycomb structure is easily taken into the partition walls.

さらに、隔壁表面で生じる流体の流れが乱流となるため
、流れ内における拡散、撹拌等による均一化が促進され
、隔壁表面で生じる熱移動、化学反応、物質移動等が有
効に行なわれるようになる。
Furthermore, since the fluid flow generated on the partition wall surface becomes turbulent, uniformity through diffusion, stirring, etc. within the flow is promoted, and heat transfer, chemical reactions, mass transfer, etc. that occur on the partition wall surface are carried out effectively. Become.

本発明において、上記した各工程における焼結処理を行
なう場合、雰囲気や焼結温度等の焼結条件が変わるたび
に多孔体を容器から取り出し雰囲気や温度を変えて焼結
処理してもよく、また、そのつど外部に取り出すのでは
なく同じ容器内に多孔体を入れたまま雰囲気や温度を変
化させる連続焼結処理してもよい、なお、連続焼結を行
なう場合は、酸化雰囲気で行なう脱炭処理を行なっても
容器が燃焼しないように炭化ケイ素、炭化チタン、炭化
ホウ素等からなる容器を用いる必要がある。
In the present invention, when performing the sintering treatment in each of the above steps, the porous body may be removed from the container and sintered while changing the atmosphere and temperature each time the sintering conditions such as the atmosphere and sintering temperature are changed. In addition, continuous sintering treatment may be performed in which the atmosphere and temperature are changed while the porous body is kept in the same container, instead of being taken out to the outside each time.In addition, when performing continuous sintering, desorption performed in an oxidizing atmosphere may be used. It is necessary to use a container made of silicon carbide, titanium carbide, boron carbide, etc. so that the container will not burn even after charcoal treatment.

このようにして得られた炭化ケイ素焼結多孔体は、多孔
体全体にわたって高い気孔率(20〜95容量%)と大
きな気孔径(5〜50μm)を有しながら十分な強度を
有する。また、ハニカム状焼結多孔体の隔壁等の微粒炭
素捕集部位は、炭化ケイ素の板状結晶により構成される
三次元網目構造となっており、効率よく微粒炭素を捕集
して除去することができる。
The silicon carbide sintered porous body thus obtained has sufficient strength while having a high porosity (20 to 95% by volume) and a large pore diameter (5 to 50 μm) throughout the porous body. In addition, the particulate carbon collecting parts such as the partition walls of the honeycomb-shaped sintered porous body have a three-dimensional network structure composed of plate-shaped crystals of silicon carbide, and can efficiently collect and remove particulate carbon. Can be done.

なお、このようにして得られた焼結多孔体を、さらに、
200〜1O−3torrの減圧下、1700〜230
0℃の温度範囲内で焼結処理してもよい。
In addition, the sintered porous body obtained in this way is further
Under reduced pressure of 200-1O-3 torr, 1700-230
The sintering treatment may be carried out within a temperature range of 0°C.

かかる処理を施すと、10−1〜10−3Ω・Cmとい
う低い比抵抗を有する焼結多孔体とすることができる。
When such a treatment is performed, a sintered porous body having a low specific resistance of 10 −1 to 10 −3 Ω·Cm can be obtained.

したがって、フィルター再使用時の加熱の際に、直接通
電により、しかも低電圧で全体を均一に加熱することが
できる。
Therefore, when heating the filter for reuse, the entire filter can be uniformly heated by direct current application and at low voltage.

[実施例] 実施例1 出発原料として使用した炭化ケイ素微粉末は、80重量
%がβ型結晶からなるものを用いた。この出発原料には
不純物としてBが0.01.Cが0、5. Anが0.
01. Nが0.2. Feが0.08原子量部、その
他の元素は痕跡量含まれており、これらの不純物総量は
0.81原子量部であった。また、この出発原料の平均
粒径は0.3um、比表面積は1B、7rn’/gであ
った。
[Example] Example 1 The silicon carbide fine powder used as a starting material was one in which 80% by weight consisted of β-type crystals. This starting material contains 0.01% of B as an impurity. C is 0, 5. An is 0.
01. N is 0.2. It contained 0.08 atomic weight part of Fe and trace amounts of other elements, and the total amount of these impurities was 0.81 atomic weight part. Moreover, the average particle diameter of this starting material was 0.3 um, and the specific surface area was 1B, 7rn'/g.

この出発原料に成形用結合剤としてメチルセルロースを
10重量部、水分を20重量部添加した。これを混練し
て、押出し成形法により直径140nv+、長さ140
++us、貫通孔の隔壁の厚さ0.3n+m、1平方イ
ンチ当りの貫通孔数的200のハニカム状の生成形体を
得た。
To this starting material were added 10 parts by weight of methylcellulose as a molding binder and 20 parts by weight of water. This was kneaded and extrusion molded to create a mold with a diameter of 140nv+ and a length of 140nm.
++us, the thickness of the partition walls of the through-holes was 0.3n+m, and a honeycomb-like product shape was obtained with 200 through-holes per square inch.

この生成形体を、黒鉛ルツボに入れ、Arガス雰囲気中
で0.5℃/分の昇温速度で750”Cまで昇温し最高
温度で1時間脱脂処理を行なった。
This formed body was placed in a graphite crucible, heated to 750''C at a rate of 0.5°C/min in an Ar gas atmosphere, and degreased at the maximum temperature for 1 hour.

その後、この成形体を気孔率20%の黒鉛ルツボに入れ
、1気圧のArガス雰囲気中で一次焼結した。
Thereafter, this compact was placed in a graphite crucible with a porosity of 20%, and primary sintered in an Ar gas atmosphere at 1 atm.

焼結は、2℃/分で1700℃まで昇温し、i&高温度
で1時間保持した。
For sintering, the temperature was increased to 1700°C at 2°C/min and held at i&high temperature for 1 hour.

ついで、−次焼結体を黒鉛ルツボから取り出して、貫通
孔の一方の端部に縦横−つおきに生成形体と同一の組成
より成る封止材を充填し、また。
Next, the secondary sintered body is taken out from the graphite crucible, and a sealing material having the same composition as the formed body is filled in one end of the through hole in every vertical and horizontal direction.

該封止材が充填されていない貫通孔の他方の端部にも同
じ(封止材を充填した。しかる後、酸化雰囲気下、1℃
/分の昇温速度で700℃まで加熱する脱炭処理を行な
った。
The same goes for the other end of the through-hole that is not filled with the sealing material (the sealing material is filled with it. After that, the temperature is set at 1°C in an oxidizing atmosphere.
Decarburization treatment was carried out by heating to 700° C. at a heating rate of /min.

その後、この脱炭処理された一次焼結体を再び気孔率2
0%の黒鉛ルツボに入れ、1気圧のArガス雰囲気中で
二次焼結した。焼結は1.5℃/分で2200℃まで昇
温し最高温度で4時間保持した。
After that, this decarburized primary sintered body is reused with a porosity of 2.
It was placed in a 0% graphite crucible and subjected to secondary sintering in an Ar gas atmosphere of 1 atm. For sintering, the temperature was raised to 2200°C at a rate of 1.5°C/min and held at the maximum temperature for 4 hours.

得られたハニカム状の炭化ケイ素焼結多孔体は板状結晶
構造であり、板状結晶の平均アスペクト比が1.3、開
放気孔径が30μm、開放気孔率が48容量%であった
。
The obtained honeycomb-shaped sintered silicon carbide porous body had a plate-like crystal structure, and the average aspect ratio of the plate-like crystals was 1.3, the open pore diameter was 30 μm, and the open porosity was 48% by volume.

実施例2 本実施例では、生成形体を同一ルツボ内に入れたまま、
雰囲気と温度を変化させる連続焼結処理で行なった。
Example 2 In this example, while the formed bodies were kept in the same crucible,
This was done using a continuous sintering process that changes the atmosphere and temperature.

出発原料として使用した炭化ケイ素微粉末は、80重量
%がβ型結晶からなるものを用いた。
The silicon carbide fine powder used as a starting material consisted of 80% by weight β-type crystals.

この出発原料には不純物としてBが0.01゜Cが0.
5. 、lが0.01. Nが0.2. Feが0.0
8原子量部、その他の元素は痕跡量含まれており、これ
らの不純物総量は0.81原子量部であった。また、こ
の出発原料の平均粒径は0.3gm、比表面積は18.
7rn”/gであった。
This starting material contains 0.01°C and 0.01°C of B as impurities.
5. , l is 0.01. N is 0.2. Fe is 0.0
8 parts by atomic weight, trace amounts of other elements were included, and the total amount of these impurities was 0.81 parts by atomic weight. Moreover, the average particle size of this starting material is 0.3 gm, and the specific surface area is 18.
It was 7rn”/g.

この出発原料に成形用結合剤としてメチルセルロースを
10重量部、水分を20重量部添加した。これを混線し
て、押出し成形法により直径140m■、長さ140■
■0貫通孔の隔壁の厚さ0.5mm、1平方インチ当り
の貫通孔数的150のハニカム状の生成形体を得た。こ
の生成形体の貫通孔の一方の端部に縦横−つおきに生成
形体と同一の組成より成る封止材を充填し、また、該封
止材が充填されていない貫通孔の他方の端部にも同じく
封止材を充填した。
To this starting material were added 10 parts by weight of methylcellulose as a molding binder and 20 parts by weight of water. This was mixed and extruded to a diameter of 140 m and a length of 140 m.
(2) A honeycomb-shaped product was obtained, with a partition wall having 0 through-holes having a thickness of 0.5 mm and having 150 through-holes per square inch. One end of the through-hole of this formed body is filled with a sealing material having the same composition as that of the formed body in every vertical and horizontal direction, and the other end of the through-hole is not filled with the sealing material. was also filled with sealing material.

その後、この生成形体を気孔率2%のSiCルツボに入
れ1気圧のArガス雰囲気中で0.5℃/分の昇温速度
で700℃まで昇温し最高温度で1時間脱脂を行なった
。
Thereafter, this formed body was placed in a SiC crucible with a porosity of 2%, and the temperature was raised to 700° C. at a rate of 0.5° C./min in an Ar gas atmosphere of 1 atm, and degreasing was performed at the maximum temperature for 1 hour.

つづいて、2℃/分で1900℃まで昇温し、最高温度
で1時間保持して一次焼結を行なった。
Subsequently, the temperature was raised to 1900°C at a rate of 2°C/min and held at the maximum temperature for 1 hour to perform primary sintering.

つづいて、SiCルツボ内を5℃/分の冷却速度で30
0℃まで冷却した後、ルツボ内雰囲気を酸化雰囲気とし
た。
Next, the inside of the SiC crucible was cooled for 30 minutes at a cooling rate of 5°C/min.
After cooling to 0° C., the atmosphere inside the crucible was made into an oxidizing atmosphere.

しかる後、1℃/分の昇温速度で700℃まで酸化雰囲
気中で加熱する脱炭処理を行なった。
Thereafter, a decarburization treatment was performed in which the material was heated to 700° C. in an oxidizing atmosphere at a temperature increase rate of 1° C./min.

次に、ルツボ内雰囲気をArガス雰囲気として二次焼結
した。焼結は2℃/分で2200℃まで昇温し最高温度
で4時間保持した。
Next, secondary sintering was performed using an Ar gas atmosphere in the crucible. For sintering, the temperature was raised to 2200°C at a rate of 2°C/min and held at the maximum temperature for 4 hours.

得られたハニカム状の炭化ケイ素焼結多孔体は板状結晶
構造であり、板状結晶の平均アスペクト比が1.3.開
放気孔径が32μm、開放気孔率が49容量%であった
。
The obtained honeycomb-shaped sintered silicon carbide porous body has a plate-like crystal structure, and the average aspect ratio of the plate-like crystals is 1.3. The open pore diameter was 32 μm and the open porosity was 49% by volume.

比較例 脱炭処理を行なわなかった他は、実施例1と同様とし、
ハニカム状の炭化ケイ素焼結多孔体を製造した。
Comparative Example Same as Example 1 except that decarburization treatment was not performed.
A honeycomb-shaped sintered silicon carbide porous body was manufactured.

得られた焼結多孔体は板状結晶構造であり、板状結晶の
平均アスペクト比が1.3、開放気孔径が2μm、開放
気孔率が46容量%であった。
The obtained sintered porous body had a plate-like crystal structure, and the average aspect ratio of the plate-like crystals was 1.3, the open pore diameter was 2 μm, and the open porosity was 46% by volume.

[発明の効果] 本発明の炭化ケイ素焼結多孔体の製造方法によれば、脱
炭処理を施すことにより、多孔体全体にわたって均一で
高い気孔率と大きな気孔径を有し、微粒炭素の捕集効率
が高く、しかも高強度の炭化ケイ素焼結多孔体を製造す
ることができる。
[Effects of the Invention] According to the method for producing a sintered silicon carbide porous body of the present invention, by performing decarburization treatment, the porous body has a uniformly high porosity and large pore diameter, and can trap fine carbon. A silicon carbide sintered porous body with high collection efficiency and high strength can be manufactured.

Claims (1)

【特許請求の範囲】 炭化ケイ素粉末を出発原料とし、必要により結晶成長助
剤を添加し混合物を得る第1工程;該混合物に成形用結
合剤を添加し所定の形状に成形した生成形体を得る第2
工程; 該生成形体を、不活性ガス雰囲気下において、脱脂処理
後1500〜1900℃の温度範囲内で一次焼結する第
3工程; 該一次焼結体を、不活性ガス雰囲気下において、200
0〜2400℃の温度範囲内で二次焼結する第4工程; よりなる炭化ケイ素焼結多孔体の製造方法において、 該第4工程における二次焼結前に、第3工程で得られた
一次焼結体を、酸化雰囲気下、400〜900℃の温度
範囲内で加熱する脱炭処理を行なうことを特徴とする炭
化ケイ素焼結多孔体の製造方法。
[Claims] The first step is to obtain a mixture using silicon carbide powder as a starting material and adding a crystal growth aid if necessary; a molding binder is added to the mixture to obtain a product molded into a predetermined shape. Second
Step: A third step of primary sintering the formed body under an inert gas atmosphere within a temperature range of 1500 to 1900°C after degreasing; The primary sintered body is sintered under an inert gas atmosphere at
A fourth step of performing secondary sintering within a temperature range of 0 to 2400°C; A method for producing a porous sintered silicon carbide body, which comprises decarburizing a primary sintered body by heating it within a temperature range of 400 to 900°C in an oxidizing atmosphere.
JP63273143A 1988-10-01 1988-10-31 Production of sintered porous material of silicon carbide Pending JPH02192464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63273143A JPH02192464A (en) 1988-10-01 1988-10-31 Production of sintered porous material of silicon carbide

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63-245884 1988-10-01
JP24588488 1988-10-01
JP63273143A JPH02192464A (en) 1988-10-01 1988-10-31 Production of sintered porous material of silicon carbide

Publications (1)

Publication Number Publication Date
JPH02192464A true JPH02192464A (en) 1990-07-30

Family

ID=26537454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63273143A Pending JPH02192464A (en) 1988-10-01 1988-10-31 Production of sintered porous material of silicon carbide

Country Status (1)

Country Link
JP (1) JPH02192464A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0692753A (en) * 1992-09-11 1994-04-05 Ibiden Co Ltd Production of silicon carbide sintered porous body
US5422322A (en) * 1993-02-10 1995-06-06 The Stackpole Corporation Dense, self-sintered silicon carbide/carbon-graphite composite and process for producing same
JP2001524451A (en) * 1997-12-02 2001-12-04 コーニング インコーポレイテッド Method for firing ceramic honeycomb body
KR100379744B1 (en) * 2000-06-19 2003-04-11 (주)글로벌코센테크 Process for Preparing Porous Silicon Carbide Body Employing Methylcellulose Polymer Containing Forming Agent

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0692753A (en) * 1992-09-11 1994-04-05 Ibiden Co Ltd Production of silicon carbide sintered porous body
US5422322A (en) * 1993-02-10 1995-06-06 The Stackpole Corporation Dense, self-sintered silicon carbide/carbon-graphite composite and process for producing same
JP2001524451A (en) * 1997-12-02 2001-12-04 コーニング インコーポレイテッド Method for firing ceramic honeycomb body
JP4771590B2 (en) * 1997-12-02 2011-09-14 コーニング インコーポレイテッド Method for firing ceramic honeycomb body
KR100379744B1 (en) * 2000-06-19 2003-04-11 (주)글로벌코센테크 Process for Preparing Porous Silicon Carbide Body Employing Methylcellulose Polymer Containing Forming Agent

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