JPH021976A - Color solid-state image sensor - Google Patents

Color solid-state image sensor

Info

Publication number
JPH021976A
JPH021976A JP63141831A JP14183188A JPH021976A JP H021976 A JPH021976 A JP H021976A JP 63141831 A JP63141831 A JP 63141831A JP 14183188 A JP14183188 A JP 14183188A JP H021976 A JPH021976 A JP H021976A
Authority
JP
Japan
Prior art keywords
light
layer
filter layer
filter
imaging device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63141831A
Other languages
Japanese (ja)
Inventor
Kenichi Kondo
健一 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63141831A priority Critical patent/JPH021976A/en
Publication of JPH021976A publication Critical patent/JPH021976A/en
Pending legal-status Critical Current

Links

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  • Solid State Image Pick-Up Elements (AREA)
  • Color Television Image Signal Generators (AREA)

Abstract

PURPOSE:To eliminate a color mixture due to an obliquely incident light to improve an image sensing device provided with this device in reproducibility of image colors so as to obtain an image of high quality by a method wherein two or more light shielding layers are provided above a channel stopper of a CCD and between filter layers. CONSTITUTION:For instance, an obliquely incident light (a), which has penetrated through a third filter layer 12 of blue dye permissible only to a blue light wavelength, hits inevitably shielding layers 6 provided between the upside of a channel stopper of a CCDE and a filter layer D and is absorbed or reflected by the light shielding layer 6, so that the above incident light a is prevented from being incident on an adjacent channel b section, where only a blue light is incident, to be photoelectrically converted.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明はカラー固体撮像装置に関するものである。[Detailed description of the invention] (Industrial application field) The present invention relates to a color solid-state imaging device.

(従来の技術) 第2図および第3図は従来例のカラー固体撮像装置であ
るフレームトランスファをCCD撮像装置の二個の要部
側断面IJである。この種の従来のフレームトランスフ
ァ型CCDI最像装置のカラー化には、第2171に示
すように、ガラス板1トにあらかしめ所望の色フィルタ
配列を形成したガラスフィルタA1CCD等から成るセ
ンサーチップ81−に位置合せして貼り合せる方式と、
第31’E4に示亀すように、通常のIcの製造工程と
同しように、CCO等のデバイスを形成したウェハ状態
で直接ウェハLに順次フィルタ層りを形成するオンウニ
八方式とかあり、又この従来例のフレームトランスファ
の場合、画素か密着していることから、色配列としては
縦のストライブとすることが多い。
(Prior Art) FIGS. 2 and 3 are side cross-sectional views IJ of two main parts of a frame transfer CCD imaging device, which is a conventional color solid-state imaging device. In order to colorize this kind of conventional frame transfer type CCDI imager, as shown in No. 2171, a sensor chip 81-- which consists of a glass filter A1CCD or the like formed with a desired color filter array on a glass plate. A method of aligning and bonding,
As shown in No. 31'E4, there is an on-one method in which a filter layer is sequentially formed directly on the wafer L with devices such as CCO formed on the wafer, as in the normal IC manufacturing process, and In the case of this conventional frame transfer, since the pixels are in close contact with each other, the color arrangement is often a vertical stripe.

図面について、第2図中、lはガラス板、2は中間層、
3はフィルタ保護服、4は接着剤の層、5は保護11q
(酸化1112)、6は隣り1合せの画素gaと8aと
の中間のチャネルストッパ8の1−JTで色、iB、G
、Rのそれぞれの中間部分に返光のために、クロム、シ
リサイド等によって形成された遮光層、8は各画素に蓄
えられた信号電荷か隣へ拡散するのを防止するチャネル
ストッパ、9はポリシリコンゲート電極、10は酸化膜
、11は赤の色素(R)、12は青の色素(B)、13
は緑の色素(G)であり、第3図中、6は半導体ウニ八
〇のチャネルストッパ8の上方とフィルタ層りの間でチ
ャネルストッパ8に近接して配設された1層のみの遮光
層、7は平坦層である。
Regarding the drawings, in Fig. 2, l is a glass plate, 2 is an intermediate layer,
3 is filter protective clothing, 4 is adhesive layer, 5 is protection 11q
(oxidation 1112), 6 is the color, iB, G at 1-JT of the channel stopper 8 between the adjacent pixels ga and 8a.
, R is a light-shielding layer formed of chromium, silicide, etc. in order to return light; 8 is a channel stopper that prevents signal charges stored in each pixel from diffusing to the neighboring pixels; 9 is a polyester layer; Silicon gate electrode, 10 is an oxide film, 11 is a red dye (R), 12 is a blue dye (B), 13
is a green pigment (G), and in FIG. 3, 6 is a light-shielding layer of only one layer disposed close to the channel stopper 8 between the filter layer and above the channel stopper 8 of the semiconductor sea urchin 80. Layer 7 is a flat layer.

以上述へたように、第2図の従来例における遮光層6は
、VAり合せの画J8aと8aの中間のチャネルストッ
パ8の上方で、このチャネルストッパ8より遠く躍れて
いる色J (B) 、色素(G)1色素(R)のそわぞ
わの中間部分に形成されており、チャネルストッパ8の
上方とフィルタ層りの中間には遮光層か無かったために
、例えば色素(B)部に入射した斜入射光aは色素(B
)12を通り、遮光されないで色素(G)!3のチャネ
ルb部に達し色素(G)に対応した光電変換をする。又
、第3図の従来例における遮光層6は゛1jA体ウェハ
Cのチャネルストッパ8の1−力に近接してフィルタ層
りとの間に1層のみで形成されているため、遮光層6は
チャネルストッパ8に近接した1層のみてあり、チャネ
ルストッパ8とフィルタ層の中間には無かったので、例
えば色素(B)12部に入射した斜入射光aは色素(B
)12を通り、1層の遮光層6て遮光されない大部分の
光は色素(G)13のチャネルb部に達し、色素(G)
に対応した光電変換をする。
As mentioned above, the light-shielding layer 6 in the conventional example shown in FIG. B), dye (G) 1 is formed in the middle part of dye (R), and since there was no light-shielding layer above the channel stopper 8 and between the filter layer, for example, dye (B) The oblique incident light a incident on the part is the pigment (B
) Pigment (G) passes through 12 and is not blocked by light! It reaches the channel b section of No. 3 and performs photoelectric conversion corresponding to the dye (G). In addition, the light shielding layer 6 in the conventional example shown in FIG. Since there was only one layer close to the channel stopper 8, and there was no layer between the channel stopper 8 and the filter layer, for example, obliquely incident light a incident on the dye (B) 12 part
) 12, most of the light that is not blocked by the one-layer light-shielding layer 6 reaches channel b of the dye (G) 13, and the dye (G)
Performs photoelectric conversion compatible with

以上はフレームトランスファ型CCD撮像装置に関する
ものであるか、同し〈従来例としてインターライントラ
ンスファ型CCD撮像装置およびX−Yアドレス型固体
撮像装置においても同様のフィルタ方式か使用されてい
る。
The above description relates to a frame transfer type CCD image pickup device, or similar filter systems are also used in interline transfer type CCD image pickup devices and X-Y address type solid-state image pickup devices as conventional examples.

〔発明か解決しようとする課題〕[Invention or problem to be solved]

以上のように、従来例のフレームトランスファ型CCD
固体撮像装置では、第2図および第3図の点線で示すよ
うに、斜入射光aが例えば青果の波長のみを透過するフ
ィルタである青の色素(B)12を通って、縁糸の光の
み入射するはずのチャネルb部に入射することになり、
青と緑の混色となる。このため、このデバイスを使った
撮像装置の映像系の色再現性を悪化させるという問題点
かあった。
As mentioned above, the conventional frame transfer type CCD
In the solid-state imaging device, as shown by the dotted lines in FIGS. 2 and 3, obliquely incident light a passes through a blue pigment (B) 12, which is a filter that transmits only the wavelength of fruits and vegetables, for example, and then passes through the edge thread light. It will be incident on the channel b part where it should be incident only.
The color is a mixture of blue and green. For this reason, there was a problem in that the color reproducibility of the image system of an imaging apparatus using this device was deteriorated.

尚、而記従来例のインターライントランスファ型、もし
くはX−Yアドレス型固体撮像素子においても、画素寸
法か小さくなるに従って面述と同様の問題点か生じた。
Incidentally, even in conventional interline transfer type or XY address type solid-state image sensing devices, problems similar to those described above occur as the pixel size becomes smaller.

この発明は上記のような問題点を解消するためになされ
たもので斜入射光による混色をなくし、このデバイスを
使った撮像装置の映像系の色再現性を高くし、良質の画
像を得ることを目的とする。
This invention was made to solve the above-mentioned problems, and aims to eliminate color mixing due to obliquely incident light, improve color reproducibility of the video system of an imaging device using this device, and obtain high-quality images. With the goal.

〔課題を解決するための手段〕[Means to solve the problem]

このため、この発明においては、CCD等を几備して成
るイメージエリア上部に所望の色フィルタ層を設けた固
体撮像装置において、首記CCDのチャネルストッパの
上方と曲尾フィルタ層間に2層以上の遮光層を設けるこ
とにより0「記[]的を達成しようとするものである。
Therefore, in the present invention, in a solid-state imaging device equipped with a CCD etc. and provided with a desired color filter layer above the image area, two or more layers are provided between the above channel stopper of the CCD and the curved filter layer. By providing a light-shielding layer, the objective is to achieve the above objectives.

尚、又、画素の光電変換領域に隣接する不感光部上とフ
ィルタ層間に2層以Fの遮光層を設けることにより、首
記目的を達成しようとする乙のである。
In addition, the above objective is also achieved by providing two or more light-shielding layers between the filter layer and on the light-insensitive area adjacent to the photoelectric conversion region of the pixel.

(作用) この発明におけるカラー固体撮像装置は、CCDのチャ
ネルストッパのに方とフィルタ層間に2層以上の遮光層
を設け、又は、固体撮像装置の画素の光電変換領域に隣
接する不感光部上とフィルタ層間に2層以上の遮光層を
設けたので、例えば、If系の波長のみを透過する計の
色素を通った斜入射光は遮光され、隣の縁糸のチャネル
に入射しない。
(Function) The color solid-state imaging device of the present invention is provided with two or more light-shielding layers between the side of the channel stopper of the CCD and the filter layer, or on the light-shielding layer adjacent to the photoelectric conversion region of the pixel of the solid-state imaging device. Since two or more light-shielding layers are provided between the filter layer and the filter layer, for example, obliquely incident light that has passed through the dye that transmits only If-based wavelengths is blocked and does not enter the channel of the adjacent edge thread.

〔実施例〕〔Example〕

以下この発明の一実施例を図面に基づいて説明する。 An embodiment of the present invention will be described below based on the drawings.

第1図はこの発明の一実施例であるカラー固体撮像装置
の主要部の側断面図であり、図中、前記従;に例におけ
ると同一または相当構成要素は同一・符号で表わす。
FIG. 1 is a side sectional view of the main parts of a color solid-state imaging device according to an embodiment of the present invention, and in the figure, the same or equivalent components as in the above-described embodiments are denoted by the same symbols.

次にこの一実7iK例の構成をその積層順に説明する。Next, the structure of this 7iK example will be explained in the order of its lamination.

第1図において、CCD  Eは、通常用いられる光電
変換と転送チャネルを兼ねた領域、信号電荷か電子の場
合P9領域であるチャネルストッパ領域8.信号電荷を
蓄積する蓄積領域、水平読出しレジスタおよび出力アン
プ等(以上チャネルストッパ以外図示せず)を公知のイ
オン注入法等で作り込み、その上部に酸化IIA 10
 、ポリシリコン、アルミニウム等でケート電極9等を
積層し、そのトに保護膜としての酸化11Q 5を形成
して構成されている。このようなCCD  Hのチャネ
ルストッパ8の上方に2層以上、この場合は2層の遮光
層6か、その間隙に保護膜としての酸化膜5をはさんで
形成され、その−に部を最上層の保護膜としての酸化1
1!25が形成される。次にこの酸化IIQ 5の上部
に透明な樹脂等による平坦化層7か形成され、CCD 
 EのイメージエリアF上部に所望のフィルタ層りか設
けられる。該フィルタ層りは。
In FIG. 1, CCD E is a channel stopper region 8. which is a region that serves as a commonly used photoelectric conversion and transfer channel, and a region P9 in the case of signal charges or electrons. An accumulation region for accumulating signal charges, a horizontal readout register, an output amplifier, etc. (not shown except for the channel stopper) are fabricated by a known ion implantation method, and oxidized IIA 10 is placed on top of them.
, polysilicon, aluminum, etc. are laminated, and an oxide 11Q 5 is formed as a protective film on top of the gate electrode 9 . Above the channel stopper 8 of such a CCDH, two or more layers, in this case two layers of light shielding layer 6, or an oxide film 5 as a protective film is formed in the gap between them, and the - part is the most Oxidation 1 as upper protective film
1!25 is formed. Next, a flattening layer 7 made of transparent resin or the like is formed on top of this oxidized IIQ 5, and the CCD
A desired filter layer is provided above the image area F of E. The filter layer.

たとえば緑(G)の波長のみを透過する第1のフィルタ
13.透明の中間層2.たとえば赤(R)の波長のみを
透過する第2のフィルタ11、透明の中間層2.青(B
)の波長のみを透過する第3のフィルタ層12の順に作
られ、その1−に保護膜3か積層されることにより形成
される。
For example, the first filter 13 transmits only the green (G) wavelength. Transparent intermediate layer 2. For example, a second filter 11 that transmits only red (R) wavelengths, a transparent intermediate layer 2. Blue (B
), and the protective film 3 is laminated on top of the third filter layer 12, which transmits only the wavelengths of the filter layer 12.

次にこの一実施例の動作を第1図を用いて説明する。Next, the operation of this embodiment will be explained using FIG.

第1図において、例えば時運のように前糸の波1(のみ
を透過する青の色素である第3のフィルタ層12を通っ
た斜めの入射光aは必ず、CCDEのチャネルストッパ
8のl―方とフィルタ層りの間に配設した遮光層6のい
ずれかに当り、遮光層6で吸収又は反射さね、この斜め
の入射光aか隣接する縁糸の光のみ入射するチャネル6
部に入射し、光電変換することはない。
In FIG. 1, the oblique incident light a that passes through the third filter layer 12, which is a blue pigment that only transmits the wave 1 of the front thread, always passes through the channel stopper 8 of the CCDE. - A channel 6 that hits either of the light-shielding layers 6 disposed between the filter layer and the light-shielding layer 6, is absorbed or reflected by the light-shielding layer 6, and only the obliquely incident light a or the light from the adjacent edge thread enters the channel 6.
The light enters the area and is not photoelectrically converted.

以上は、フレームトランスファ51ICCD固体撮像装
置について述へたか、インターライントランスファキノ
もしくはX−Yアドレス型固体撮像装置の場合は、固体
撮像装置の画素の光電変換領域、例えば感光部に隣接す
る不感光部、例えば通常チャネルスト・Iパを有する転
送部の−F方とフィルタ層間に2層以上の遮光層を設け
ることにより、首記フレームトランスファ型と同様の構
成と作用を得ることかできる。
The above has described the frame transfer 51 ICCD solid-state imaging device, or in the case of an interline transfer or X-Y address type solid-state imaging device, the photoelectric conversion area of the pixel of the solid-state imaging device, for example, the non-photosensitive area adjacent to the photosensitive area. For example, by providing two or more light-shielding layers between the -F side of the transfer section, which usually has a channel striker, and the filter layer, it is possible to obtain the same structure and operation as the above-mentioned frame transfer type.

〔発明の効果〕〔Effect of the invention〕

以−1−説明したように、この発明によれば、CCD等
を具備して成るイメージエリア上部に所望のフィルタ層
を設けた固体撮像装置において、CCDのチャネルスト
ッパの上方とフィルタ層間に2層以上の遮光層を設ける
か、又は固体撮像装置の光電変換領域に隣接する不感光
部−上方とフィルタ層間に2層以上の遮光層を設けたの
で、斜め入射光による混色をなくし、このテバイスを使
った撮像装置の映像系の色再現性を高くし、良質の画像
か得られる効果がある。。
As described above-1-, according to the present invention, in a solid-state imaging device including a CCD and the like and provided with a desired filter layer above an image area, two layers are provided above the channel stopper of the CCD and between the filter layer. By providing the above light-shielding layer, or by providing two or more light-shielding layers between the upper part of the light-insensitive area adjacent to the photoelectric conversion region of the solid-state imaging device and the filter layer, color mixing due to obliquely incident light is eliminated, and this device can be This has the effect of increasing the color reproducibility of the video system of the imaging device used and producing high-quality images. .

【図面の簡単な説明】 第1図はこの発明の一実施例であるカラー固体撮像装置
の主要部の側断面図、第2図および第3図は従来例のカ
ラー固体撮像装置の要部側断面図である。 A・・・・・・ガラスフィルタ B・・・・・・センサーチップ C・・・・・・半導体ウェハ D・・・・・・フィルタ層 E・・・・・・CCD F・・・・・・イメージエリア 6・・・・・・遮光層 8・・・・・・チャネルストッパ 11・・・・・・第2フイルタ(赤) 12・・・・・・第3フイルタ(I”f )13・・・
・・・第1フイルタ(緑) [i願人 キャノン株式会社 く の
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a side cross-sectional view of the main parts of a color solid-state imaging device according to an embodiment of the present invention, and FIGS. 2 and 3 are side sectional views of main parts of a conventional color solid-state imaging device. FIG. A... Glass filter B... Sensor chip C... Semiconductor wafer D... Filter layer E... CCD F...・Image area 6... Light shielding layer 8... Channel stopper 11... Second filter (red) 12... Third filter (I"f) 13 ...
...First filter (green)

Claims (2)

【特許請求の範囲】[Claims] (1)CCD等を具備して成るイメージエリア上部に所
望のフィルタ層を設けた固体撮像装置において、前記C
CDのチャネルストッパの上方と前記フィルタ層間に2
層以上の遮光層を設けたことを特徴とするカラー固体撮
像装置。
(1) In a solid-state imaging device equipped with a CCD or the like and provided with a desired filter layer above an image area, the CCD
2 between the channel stopper of the CD and the filter layer.
A color solid-state imaging device characterized by having more than one light-shielding layer.
(2)画素の光電変換領域に隣接する不感光部の上方と
フィルタ層間に2層以上の遮光層を設けことを特徴とす
る請求項1記載のカラー固体撮像装置。
(2) The color solid-state imaging device according to claim 1, characterized in that two or more light-shielding layers are provided above the light-insensitive portion adjacent to the photoelectric conversion region of the pixel and between the filter layer.
JP63141831A 1988-06-10 1988-06-10 Color solid-state image sensor Pending JPH021976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63141831A JPH021976A (en) 1988-06-10 1988-06-10 Color solid-state image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63141831A JPH021976A (en) 1988-06-10 1988-06-10 Color solid-state image sensor

Publications (1)

Publication Number Publication Date
JPH021976A true JPH021976A (en) 1990-01-08

Family

ID=15301148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63141831A Pending JPH021976A (en) 1988-06-10 1988-06-10 Color solid-state image sensor

Country Status (1)

Country Link
JP (1) JPH021976A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH022169A (en) * 1988-06-14 1990-01-08 Fuji Photo Film Co Ltd Solid state image pickup device
JPH04199875A (en) * 1990-11-29 1992-07-21 Nec Corp Solid state image sensing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH022169A (en) * 1988-06-14 1990-01-08 Fuji Photo Film Co Ltd Solid state image pickup device
JPH04199875A (en) * 1990-11-29 1992-07-21 Nec Corp Solid state image sensing device

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