JPH02199033A - Production of optical glass - Google Patents

Production of optical glass

Info

Publication number
JPH02199033A
JPH02199033A JP2035489A JP2035489A JPH02199033A JP H02199033 A JPH02199033 A JP H02199033A JP 2035489 A JP2035489 A JP 2035489A JP 2035489 A JP2035489 A JP 2035489A JP H02199033 A JPH02199033 A JP H02199033A
Authority
JP
Japan
Prior art keywords
fine particles
average particle
sol solution
particle size
sio2
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2035489A
Other languages
Japanese (ja)
Other versions
JP2832213B2 (en
Inventor
Takeshi Kitagawa
毅 北川
Hisaaki Okazaki
岡崎 久晃
Takao Kimura
隆男 木村
Shuichi Shibata
修一 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1020354A priority Critical patent/JP2832213B2/en
Publication of JPH02199033A publication Critical patent/JPH02199033A/en
Application granted granted Critical
Publication of JP2832213B2 publication Critical patent/JP2832213B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

PURPOSE:To obtain optically uniform and large-sized optical glass in good dimensional accuracy by adding fine particles of SiO2 having larger particle diameter to a sol solution prepared by hydrolyzing a silicon alkoxide, then gelatinizing the sol solution, drying to give porous gel material and heat-treating the material. CONSTITUTION:A silicon alkoxide Si(OR)4 (R is alkyl group) is hydrolyzed to give a sol solution containing fine particles of SiO2 having <=0.005mu-<0.03mum average particle diameter, the sol solution is mixed with fine particles of SiO2 having >=0.03mum average particle diameter, successively gelatinized and dried to give a porous gel material. Then the porous gel material is treated at high temperature to give a transparent glass material. When the sol solution after being blended with the fine particles of SiO2 having >=0.03mum average particle diameter is mixed with an alkoxide: Si(OR)4-nFn (0<n<=4) wherein at least one alkoxy group of the silicon alkoxide is replaced with fluorine, gel strength can be raised. The amount of the fine particles of SiO2 having >=0.03mum average particle diameter added is preferably >=10mol% (upper limit is about 70mol%) based on the whole silicon atoms.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学ガラスを製造する方法に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a method of manufacturing optical glass.

さらに詳しくは、割れや気泡などの不整がなく光学的に
均質な大型のフッ素添加石英ガラス体を製造する方法に
関する。
More specifically, the present invention relates to a method for manufacturing a large fluorine-doped quartz glass body that is optically homogeneous and free from irregularities such as cracks and bubbles.

(従来技術) 高純度なガラスの製造方法として、シリコンアルコキシ
ドの加水分解、縮合により溶液中でSi02ガラス重合
体を生成する、ゾルゲル法が知られている。ゾルゲル法
では、適当な触媒の元で加水分解することにより、異な
る構造のガラス重合体を得ることができる0例えば、塩
酸などの酸性触媒を添加した場合には、線形ポリマ状の
重合体が生成する。一方、アンモニアなどの塩基性触媒
を用いた場合には、平均粒径が0.001〜0.3μm
の広い範囲で単一な粒度分布を有する微粒子状の重合体
を得ることができる。ゾルゲル法によるフッ素添加石英
ガラスの製造方法として、液相フッ素添加法が本発明者
らにより提案されている。
(Prior Art) As a method for producing high-purity glass, a sol-gel method is known in which a Si02 glass polymer is produced in a solution by hydrolysis and condensation of silicon alkoxide. In the sol-gel method, glass polymers with different structures can be obtained by hydrolysis under an appropriate catalyst. For example, when an acidic catalyst such as hydrochloric acid is added, a linear polymer is produced. do. On the other hand, when a basic catalyst such as ammonia is used, the average particle size is 0.001 to 0.3 μm.
It is possible to obtain a finely divided polymer having a uniform particle size distribution over a wide range of . As a method for producing fluorine-doped quartz glass using a sol-gel method, a liquid phase fluorine addition method has been proposed by the present inventors.

第5図に、このフッ素添加石英ガラス製造方法の工程を
示す、この方法は、シリコンアルコキシドを加水分解し
たゾル溶液1に、フッ素添加剤として、アルコキシ基の
一部をフッ素で置換したアルコキシド4を加えてフッ素
添加SiO2ゾル溶液5とし、続いてゲル6化し、乾燥
し、多孔質ゲル体7とし、これを高温処理して透明なフ
ッ素添加石英ガラス体8を得る方法である。
FIG. 5 shows the steps of this fluorine-added quartz glass manufacturing method. In this method, alkoxide 4, in which some of the alkoxy groups are substituted with fluorine, is added as a fluorine additive to sol solution 1 obtained by hydrolyzing silicon alkoxide. In addition, a fluorine-doped SiO2 sol solution 5 is formed, which is then converted into a gel 6 and dried to form a porous gel body 7, which is then treated at high temperature to obtain a transparent fluorine-doped quartz glass body 8.

この方法によれば、金属やOH基などの不純物が少なく
、また、気泡などの不整のない均質なフッ素添加石英ガ
ラス体を、屈折率の制御性よく製造することができる。
According to this method, a homogeneous fluorine-doped quartz glass body containing few impurities such as metals and OH groups and free from irregularities such as bubbles can be manufactured with good controllability of the refractive index.

(発明の解決しようとする問題点) 従来、この方法では、粒度分布の侠いSiO2微粒子を
含むゾル溶液を用いていたため、以下の問題点が生じて
いた。5102微粒子の平均粒径が0.03μm以下の
場合には、ゲルの気孔径が小さいため、乾燥工程におい
て溶媒や水分を蒸発させる際、ゲル体の内部に大きな応
力が生じ、ゲル体の割れが発生し易かった。このため、
直径20mm、長さ50mm程度以上の寸法を持ったガ
ラス体は得られていなかった。一方、平均粒径が0.0
3μm以上のSiO2微粒子を用いた場合には、ゲル体
が柔弱であり、乾燥工程においてゲル体の変形が生じる
ため、所定の形状のガラス体を、寸法精度よく製造する
ことは困難であった。
(Problems to be Solved by the Invention) Conventionally, this method uses a sol solution containing SiO2 fine particles with a narrow particle size distribution, which has caused the following problems. When the average particle size of the 5102 fine particles is 0.03 μm or less, the pore size of the gel is small, so when the solvent and water are evaporated in the drying process, a large stress is generated inside the gel body, causing cracks in the gel body. It was easy to occur. For this reason,
A glass body having dimensions of approximately 20 mm in diameter and 50 mm or more in length has not been obtained. On the other hand, the average particle size is 0.0
When SiO2 fine particles of 3 μm or more are used, the gel body is soft and deformed during the drying process, making it difficult to manufacture a glass body of a predetermined shape with good dimensional accuracy.

本発明は、上記の問題点に鑑みなされたものであり、光
学的に均質な大型のフッ素添加石英ガラス体を、寸法精
度よく製造する方法を提供するものである。
The present invention has been made in view of the above-mentioned problems, and provides a method for manufacturing an optically homogeneous large-sized fluorine-doped quartz glass body with high dimensional accuracy.

(問題を解決するための手段) 本発明の製造方法は、シリコンのアルコキシドSi (
OR)4 (Rはアルキル基)を加水分解した平均粒径
が0.005μm以上0.03μm未満のSiO2微粒
子を含むゾル溶液と、平均粒径が0.03μm以上のS
 i 02微粒子を混合し、続いてゲル化、乾燥して、
多孔質ゲル体とし、これを高温処理して、透明なガラス
体を得ることを特徴とする。
(Means for solving the problem) The manufacturing method of the present invention includes silicon alkoxide Si (
OR) 4 (R is an alkyl group) sol solution containing SiO2 fine particles with an average particle size of 0.005 μm or more and less than 0.03 μm by hydrolysis, and S with an average particle size of 0.03 μm or more.
i02 microparticles are mixed, followed by gelation and drying,
It is characterized by forming a porous gel body and treating it at high temperature to obtain a transparent glass body.

また、本発明の第2の製造方法は、上記0.03μm以
上のSiO2微粒子を混合した後のゾル溶液にシリコン
アルコキシドのアルコキシ基の少なくとも一つをフッ素
で置換したアルコキシドSi (OR)4−nFn (
0<n≦4)を加えたことを特徴としている。
Further, in the second manufacturing method of the present invention, an alkoxide Si (OR)4-nFn in which at least one of the alkoxy groups of silicon alkoxide is substituted with fluorine is added to the sol solution after mixing the SiO2 fine particles of 0.03 μm or more. (
0<n≦4).

さらに本発明によれば、上記平均粒径が0.03μm以
上のSi02微粒子の添加量が、全シリコン原子に対し
、10モル%以上であることを特徴とする。
Further, according to the present invention, the amount of Si02 fine particles having an average particle size of 0.03 μm or more added is 10 mol % or more based on the total silicon atoms.

本発明をさらに詳しく説明する。The present invention will be explained in more detail.

本発明の光学ガラスの製造方法を第1図に示す。The method for manufacturing optical glass of the present invention is shown in FIG.

この第1図より明らかなように、本発明による光学ガラ
スの製造方法によれば、Si(OR)4(Rはアルキル
基)を加水分解してえた平均粒径が0.005μm以上
0.03ttm未満のSiO2微粒子を含むゾル溶液1
と、平均粒径が0.03μm以上のSi02微粒子2を
混合し、このSiO2溶液3に任意にSi (OR)4
−nFn4を添加混合する。このような任意にフッ素置
換アルコキシドを添加したフッ素添加Si02ゾル溶液
5を静置してゲル6としたのち、乾燥して多孔質ゲル体
7とする。これを高温処理して透明ガラス体8を得る。
As is clear from FIG. 1, according to the method for producing optical glass according to the present invention, the average particle size obtained by hydrolyzing Si(OR)4 (R is an alkyl group) is 0.005 μm or more and 0.03 ttm. Sol solution containing SiO2 fine particles of less than 1
and Si02 fine particles 2 with an average particle size of 0.03 μm or more, and optionally add Si (OR)4 to this SiO2 solution 3.
- Add and mix nFn4. The fluorine-added Si02 sol solution 5 to which a fluorine-substituted alkoxide is optionally added is left to stand to form a gel 6, and then dried to form a porous gel body 7. This is subjected to high temperature treatment to obtain a transparent glass body 8.

上述のようなS i 02ゾル溶液に含まれる5t02
微粒子の平均粒径は0.005μm以上0゜03μm未
満である。このSi02微粒子の平均粒径が0.005
μm未満であると、後述の実施例より明らかなように均
質で、気泡などの不整のないガラスの作製が困難である
どう欠点を生じる。
5t02 contained in the S i 02 sol solution as described above
The average particle diameter of the fine particles is 0.005 μm or more and less than 0.03 μm. The average particle size of this Si02 fine particles is 0.005
If it is less than .mu.m, it is difficult to produce a glass that is homogeneous and free from irregularities such as bubbles, as is clear from the examples described later.

このようなゾル溶液に平均粒径が0.03μm以上のS
 i 02微粒子を添加する。この微粒子は乾燥工程な
どにおいて、割れなどを防止するために添加され、0.
03μm未満の平均粒径であると、割れ防止などの効果
が発揮しにくい、一方この粒子の平均粒径の上限は好ま
しくは0.1μmである。0.1μmを越えるとゾル溶
液中で微粒子が沈殿してしまい恐れを生じるからである
In such a sol solution, S with an average particle size of 0.03 μm or more is added.
Add i02 microparticles. These fine particles are added to prevent cracking during the drying process, etc.
If the average particle size is less than 0.03 μm, it is difficult to exhibit effects such as crack prevention, but on the other hand, the upper limit of the average particle size of the particles is preferably 0.1 μm. This is because if it exceeds 0.1 μm, there is a risk that fine particles will precipitate in the sol solution.

この微粒子の添加量は好ましくは10モル%以上である
。10モル%未満であると、乾燥工程において割れを生
じる恐れがある。一方、好ましい添加量の上限は70モ
ル%である。70モル%を越えて添加しても改良効果は
変化しないからである。
The amount of the fine particles added is preferably 10 mol % or more. If it is less than 10 mol%, cracks may occur during the drying process. On the other hand, the preferable upper limit of the amount added is 70 mol%. This is because the improvement effect does not change even if it is added in an amount exceeding 70 mol%.

上述のようなゾル溶液に本発明においては任意にS i
 (OR)4−nFnで示されるアルコキシドを添加す
る。このフッ素置換アルコキシドはゲル強度を高くする
ために添加され、その好ましい添加量は1〜70モル%
である。1モル%未満であると添加効果がなく、一方7
0モル%を越えるとフッ素の触媒効果によって縮重合を
生じ、2次粒子を生成する。このため粒子の粒径が大き
くなって1500’C未満で透明ガラス化できなくなる
という欠点を生じる。
In the present invention, Si
Add an alkoxide represented by (OR)4-nFn. This fluorine-substituted alkoxide is added to increase gel strength, and its preferred amount is 1 to 70 mol%.
It is. If it is less than 1 mol%, there is no effect of addition, while 7
If it exceeds 0 mol%, polycondensation occurs due to the catalytic effect of fluorine, producing secondary particles. This results in the disadvantage that the particle size becomes large and transparent glass cannot be formed at temperatures below 1500'C.

上述のアルコキシドおよびフッ素置換アルコキシドにお
いて、Rはアルキル基であり、好ましくはメチル、エチ
ル、プロピル、ブチル等低級アルキル基であるのがよい
In the alkoxides and fluorine-substituted alkoxides mentioned above, R is an alkyl group, preferably a lower alkyl group such as methyl, ethyl, propyl, butyl.

(作用) 本発明の方法は、ゾル溶液中に、より粒径の大きいSi
02微粒子を添加することにより、ゲルの機械的強度を
高めることができ、乾燥工程における割れを発生するこ
となく、寸法精度の高い大型フッ素添加石英ガラス体の
製造を可能とするものである0本方法で得られるガラス
には、気泡などの不整の残留がなく、光学的な均質性が
非常に高いという特徴がある。
(Function) The method of the present invention includes Si having a larger particle size in the sol solution.
By adding 02 fine particles, the mechanical strength of the gel can be increased, making it possible to manufacture large fluorine-doped quartz glass bodies with high dimensional accuracy without cracking during the drying process. The glass obtained by this method is characterized by having no residual irregularities such as bubbles and having very high optical homogeneity.

以下、実施例により詳細に説明する。Hereinafter, this will be explained in detail using examples.

(実施例1) テトラエトキシシランSl(OC2H3)4をアンモニ
ア触媒の元に加水分解し、平均粒径が0゜01μmのS
 i 02微粒子を含有するゾル溶液を作製した。この
ゾル溶液に、気相法により作製した平均粒径が0,01
μm、0.03μm、0゜1μmのSi02微粒子粉末
を加え、フッ素添加剤として Si (OC2H5)3Fを2モル%添加し、十分混合
した後、容器中でゲル化し、ゆっくりと乾燥して、多孔
質ゲル体(直径12mm、長さ50mm)を得た。
(Example 1) Tetraethoxysilane Sl(OC2H3)4 was hydrolyzed under an ammonia catalyst to form S with an average particle size of 0°01 μm.
A sol solution containing i02 fine particles was prepared. This sol solution has an average particle size of 0.01
Add Si02 microparticle powder of μm, 0.03 μm, 0°1 μm, add 2 mol% of Si (OC2H5)3F as a fluorine additive, mix well, gel in a container, slowly dry, and create a porous A gel body (diameter 12 mm, length 50 mm) was obtained.

作製した乾燥ゲル体の曲げ強度を、三点曲げ試験により
評価した。第2図に結果を示す、アルコキシドから作製
したSi02微粒子の粒径と等しい0.01μmの微粒
子を添加した場合には、ゲルの強度は一定であるのに対
し、平均粒径が0.03μm、0.1μmの微粒子を添
加した場合には、添加量の増加と共に乾燥ゲル体の強度
が大きくなることが明らかとなった。平均粒径0゜1μ
mの微粒子を10モル%以上添加した場合には、曲げ強
度は添加しない場合の2倍となった。
The bending strength of the produced dried gel body was evaluated by a three-point bending test. The results are shown in Figure 2. When fine particles of 0.01 μm, which are equal to the particle size of SiO2 particles made from alkoxide, were added, the strength of the gel was constant, but the average particle size was 0.03 μm, It was found that when fine particles of 0.1 μm were added, the strength of the dried gel body increased as the amount added increased. Average particle size 0゜1μ
When 10 mol % or more of m fine particles were added, the bending strength was twice that of the case without addition.

本実施例により、アルコキシドの加水分解により作製し
たSiO2微粒子を含むゾル溶液に、より粒径の大きい
S i 02微粒子粉末を添加することにより、ゲル体
の機械的強度が高まることが明らかとなった。
This example revealed that the mechanical strength of the gel body was increased by adding SiO2 fine particles powder with a larger particle size to a sol solution containing SiO2 fine particles prepared by hydrolysis of alkoxide. .

(実施例2) テトラエトキシシランSi (OC2H5)4をアンモ
ニア触媒の元に加水分解し、平均粒径が0.01μmの
Si02微粒子を含有するゾル溶液を作製した。このゾ
ル溶液に、気相法により作製した平均粒径が0.1μm
のSi02微粒子粉末を加え、フッ素添加剤として Si (OC2H5)3Fを10モル%添加し、十分混
合した後、容器中でゲル化し、ゆっくりと乾燥して、多
孔質ゲル体を得た。このゲル体を1350°Cで高温処
理して、透明なフッ素添加石英ガラス体(直径45〜5
5mm、長さ135〜160mm)を得た。
(Example 2) Tetraethoxysilane Si (OC2H5)4 was hydrolyzed under an ammonia catalyst to prepare a sol solution containing Si02 fine particles with an average particle size of 0.01 μm. This sol solution has an average particle size of 0.1 μm produced by a gas phase method.
After adding 10 mol % of Si (OC2H5)3F as a fluorine additive and thoroughly mixing, the mixture was gelled in a container and slowly dried to obtain a porous gel body. This gel body was treated at a high temperature of 1350°C to create a transparent fluorine-doped quartz glass body (diameter 45 to 5 mm).
5 mm, length 135-160 mm).

第3図に、透明ガラス体に発生した割れの密度(ガラス
体中に生じた割れの総数をガラス体の体積で除した値)
と、気相法で作製したSiO2微粒子の添加量との関係
を示す0図に示すように、添加量が増すと共に割れの密
度が減少し、添加量10モル%以上で全く割れのないフ
ッ素添加石英ガラス棒が得られることが判明した。
Figure 3 shows the density of cracks that occurred in the transparent glass body (the value obtained by dividing the total number of cracks that occurred in the glass body by the volume of the glass body).
As shown in Figure 0, which shows the relationship between the amount of SiO2 particles added and the amount of SiO2 particles added using the vapor phase method, the density of cracks decreases as the amount added increases, and fluorine addition causes no cracks at all when the amount added is 10 mol% or more. It turned out that a quartz glass rod was obtained.

本実施例により、アルコキシドの加水分解により作製し
たSiO2微粒子を含むゾル溶液に、より粒径の大きい
SiO2微粒子粉末を添加することにより、割れのない
フッ素添加石英ガラス体を作製できることが明らかとな
った。実施例1で示したように、ゲルの機械的強度が高
まり、割れの発生を防ぐことができたものと考えられる
This example revealed that a crack-free fluorine-doped silica glass body can be produced by adding SiO2 fine particle powder with a larger particle size to a sol solution containing SiO2 fine particles prepared by hydrolysis of alkoxide. . As shown in Example 1, it is considered that the mechanical strength of the gel was increased and cracking could be prevented.

(実施例3) テトラエトキシシランSi (OC2H5)4をアンモ
ニア触媒の元に加水分解し、平均粒径が0.003.0
.005.0.01μmのSiO2微粒子を含有する3
種類のゾル溶液を作製した。これらのゾル溶液それぞれ
70モル%に、気相法により作製した平均粒径が0.1
μmのSiO2微粒子粉末20モル%を加え、フッ素添
加剤として Si(OC2H3)3Fを10モル%添加し、十分混合
した後、容器中でゲル化し、ゆっくりと乾燥して、3種
類の多孔質ゲル体を得た。これらのゲル体を1350℃
で高温処理して、フッ素添加石英ガラス体く直径10m
m、長さ80mm)を得た。
(Example 3) Tetraethoxysilane Si (OC2H5)4 was hydrolyzed under an ammonia catalyst, and the average particle size was 0.003.0.
.. 005.3 containing SiO2 fine particles of 0.01 μm
Various types of sol solutions were prepared. Each of these sol solutions had an average particle size of 0.1% by 70 mol% and was prepared by a gas phase method.
Add 20 mol% of μm SiO2 fine particle powder, add 10 mol% of Si(OC2H3)3F as a fluorine additive, mix thoroughly, gel in a container, and slowly dry to form three types of porous gels. I got a body. These gel bodies were heated to 1350℃
After high temperature treatment, a fluorine-doped quartz glass body with a diameter of 10 m is produced.
m, length 80 mm) was obtained.

その結果、平均粒径0.003μmの微粒子を含有する
ゾル溶液に微粒子粉末を添加して作製したガラスには、
気泡の残留が認められた。一方、平均粒径0.005μ
m以上のゾル溶液に微粒子粉末を添加して作製したガラ
スは、非常に均質であり、気泡などの不整は全く見られ
なかった。
As a result, glass made by adding fine particle powder to a sol solution containing fine particles with an average particle size of 0.003 μm has the following properties:
Remaining air bubbles were observed. On the other hand, the average particle size is 0.005μ
The glass produced by adding fine particle powder to a sol solution of m or more was extremely homogeneous, and no irregularities such as bubbles were observed at all.

本実施例より、平均粒径が0.005μm以上のSiO
2微粒子を含むゾル溶液に、より粒径の大きいS i 
02微粒子を添加することにより、気泡や割れのない非
常に均質なフッ素添加石英ガラス体を作製できることが
明らかとなった。
From this example, SiO with an average particle size of 0.005 μm or more
2. S i with larger particle size is added to the sol solution containing fine particles.
It has become clear that by adding 02 fine particles, a very homogeneous fluorine-doped quartz glass body without bubbles or cracks can be produced.

(実施例4) 気相法で作製したSiO2微粒子粉末に変えて、アルコ
キシドをアンモニア触媒の元に加水分解した、平均粒径
が0.03μmのS i 02微粒子を含むゾル溶液を
添加し、実施例2と同様の実験を行なった。
(Example 4) In place of the SiO2 fine particle powder produced by the gas phase method, a sol solution containing Si02 fine particles with an average particle size of 0.03 μm, which was obtained by hydrolyzing alkoxide under an ammonia catalyst, was added. An experiment similar to Example 2 was conducted.

第4図に、フッ素添加石英ガラス体(直径43〜48m
m、長さ130〜150mm)に発生した割れの密度と
、平均粒径0.03μmのSiO2微粒子の添加量との
関係を示す、実施例2の場合と同様に、添加量が増すと
共に割れの密度が減少し、添加量40モル%以上で全く
割れのないフッ素添加石英ガラス棒が得られることが判
明した。
Figure 4 shows a fluorine-doped quartz glass body (43 to 48 m in diameter).
This graph shows the relationship between the density of cracks (with a length of 130 to 150 mm) and the amount of SiO2 fine particles added with an average particle size of 0.03 μm, as in Example 2. It has been found that a fluorine-doped quartz glass rod with a reduced density and no cracking can be obtained when the addition amount is 40 mol% or more.

本実施例より、アルコキシドの加水分解により作製した
、より粒径の大きいSiO2微粒子を含むゾル溶液を添
加することにより、気相法で作製した微粒子粉末を添加
した場合と同様に、割れのないフッ素添加石英ガラス体
を作製できることが明らかとなった。
From this example, by adding a sol solution containing SiO2 fine particles with a larger particle size prepared by hydrolysis of alkoxide, it was found that crack-free fluorine was produced in the same manner as when fine particle powder prepared by a vapor phase method was added. It has become clear that a doped silica glass body can be produced.

(実施例5) 実施例4と同様にして、平均粒径が0.01μmの微粒
子を50モル%、平均粒径が0.03μmの微粒子を4
0モル%含有するSiO2ゾル溶液に、フッ素添加剤S
i (OC2H5)3Fを10モル%添加し、十分混合
した後、シャーレ内でゲル化し、ゆっくりと乾燥して、
多孔質ゲル板を得た。このゲル板を1350℃で高温処
理して、割れや気泡の全くない透明なフッ素添加石英ガ
ラス板(直径60mm、厚さ10mm)を得た。
(Example 5) In the same manner as in Example 4, 50 mol% of fine particles with an average particle size of 0.01 μm and 4 mol% of fine particles with an average particle size of 0.03 μm were prepared.
Fluorine additive S is added to the SiO2 sol solution containing 0 mol%.
i (OC2H5)3F was added in an amount of 10 mol%, mixed thoroughly, gelled in a petri dish, and slowly dried.
A porous gel plate was obtained. This gel plate was subjected to high temperature treatment at 1350° C. to obtain a transparent fluorine-doped quartz glass plate (diameter 60 mm, thickness 10 mm) with no cracks or bubbles.

(実施例6) 作製したフッ素添加石英ガラスの光学的な品質を評価す
るため、光ファイバの作製を行なった。
(Example 6) In order to evaluate the optical quality of the produced fluorine-doped silica glass, an optical fiber was produced.

実施例5と全く同様にして作製したゾル溶液を、円筒状
の容器中でゲル化し、乾燥後、1350℃で高温処理し
て、透明なフッ素添加石英ガラス管(石英ガラスに対す
る比屈折率差−0,38%、外径25mm、内径15m
m、長さ200mm)を得た。このフッ素添加石英ガラ
ス管を加熱し、表面よりフッ素を蒸発させ、管内表面に
フッ素濃度の小さい拡散層を生じせしめ、続いてこのガ
ラス管を中実化して、中心軸に高屈折率部(コア)を有
する光フアイバ母材を得た。この母材を高温で線引きし
て、シングルモード光ファイバを得た。
A sol solution prepared in exactly the same manner as in Example 5 was gelled in a cylindrical container, dried, and then treated at a high temperature of 1350°C to form a transparent fluorine-doped quartz glass tube (relative refractive index difference with respect to quartz glass). 0.38%, outer diameter 25mm, inner diameter 15m
m, length 200 mm) was obtained. This fluorine-doped quartz glass tube is heated to evaporate fluorine from the surface, creating a diffusion layer with a low fluorine concentration on the inner surface of the tube.Then, this glass tube is solidified and a high refractive index region (core ) was obtained. This base material was drawn at high temperature to obtain a single mode optical fiber.

得られたフッ素添加石英ガラス管は、均一な内径、外径
、肉厚を持ち、本方法により、寸法精度の高いガラス管
を製造できることが判明した0作製した光ファイバの損
失は、波長1.60μmにおいて0.3dB/kmと小
さく、作製したガラスが光学的に均質であることが明ら
かとなった。
The obtained fluorine-doped quartz glass tube has a uniform inner diameter, outer diameter, and wall thickness, and it has been found that this method can produce a glass tube with high dimensional accuracy.The optical fiber produced has a loss of 1. It was as small as 0.3 dB/km at 60 μm, and it became clear that the produced glass was optically homogeneous.

(発明の効果) 以上説明したように、アルコキシドの加水分解により作
製した、平均粒径が0.005μm以上0.03μm未
満のSi02微粒子を含有するゾル溶液に、より粒径に
大きいSi02微粒子を加えることにより、従来法で得
られるガラス体と比較して2倍以上寸法の大きい、光学
的に均質なフッ素添加石英ガラス体を、寸法精度よく、
製造することができる。
(Effect of the invention) As explained above, Si02 fine particles having a larger particle size are added to a sol solution containing Si02 fine particles with an average particle size of 0.005 μm or more and less than 0.03 μm, which is prepared by hydrolyzing alkoxide. As a result, an optically homogeneous fluorine-doped silica glass body, which is more than twice as large as the glass body obtained by conventional methods, can be produced with high dimensional accuracy.
can be manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の光学ガラス製造方法の工程を示した図
、第2図は気相法で作製したS i 02微粒子の添加
量と乾燥ゲル体の曲げ強度の関係を示す図、第3図はフ
ッ素添加石英ガラス体に発生した割れの密度と、平均粒
径0.1μmの5102微粒子の添加量との関係を示す
図、第4図はフッ素添加石英ガラス体に発生した割れの
密度と、平均粒径0.03μmのS i 02微粒子の
添加量との関係を示す図、第5図は従来のフッ素添加石
英ガラスの製造方法の工程を示した図である。
FIG. 1 is a diagram showing the steps of the optical glass manufacturing method of the present invention, FIG. 2 is a diagram showing the relationship between the amount of S i 02 fine particles added and the bending strength of the dry gel body produced by the vapor phase method, and FIG. The figure shows the relationship between the density of cracks occurring in a fluorine-doped quartz glass body and the amount of 5102 fine particles added with an average particle size of 0.1 μm. Figure 4 shows the relationship between the density of cracks occurring in a fluorine-doped quartz glass body and , a diagram showing the relationship between the amount of S i 02 fine particles added having an average particle diameter of 0.03 μm, and FIG. 5 is a diagram showing the steps of a conventional method for manufacturing fluorine-doped silica glass.

Claims (3)

【特許請求の範囲】[Claims] (1)シリコンのアルコキシドSi(OR)_4(Rは
アルキル基)を加水分解した平均粒径が0.005μm
以上0.03μm未満のSiO_2微粒子を含むゾル溶
液と、平均粒径が0.03μm以上のSiO_2微粒子
を混合し、続いてゲル化、乾燥して、多孔質ゲル体とし
、これを高温処理して、透明なガラス体を得ることを特
徴とする光学ガラスの製造方法。
(1) The average particle size of hydrolyzed silicon alkoxide Si(OR)_4 (R is an alkyl group) is 0.005 μm
A sol solution containing SiO_2 fine particles with a size of less than 0.03 μm and SiO_2 fine particles with an average particle size of 0.03 μm or more are mixed, and then gelled and dried to form a porous gel body, which is then treated at high temperature. , a method for producing optical glass characterized by obtaining a transparent glass body.
(2)平均粒径が0.03μm以上のSiO_2微粒子
を混合したゾル溶液はシリコンアルコキシドのアルコキ
シ基の少なくとも一つをフッ素で置換したアルコキシド Si(OR)_4_−_nF_n(0<n≦4)を添加
したものであることを特徴とする特許請求の範囲第1項
記載の光学ガラスの製造方法。
(2) The sol solution containing SiO_2 fine particles with an average particle size of 0.03 μm or more is alkoxide Si(OR)_4_−_nF_n (0<n≦4) in which at least one of the alkoxy groups of silicon alkoxide is replaced with fluorine. The method for producing optical glass according to claim 1, wherein the optical glass is added.
(3)平均粒径が0.03μm以上のSiO_2微粒子
の添加量が、全シリコン原子に対し、10モル%以上で
あることを特徴とする特許請求の範囲第1項または第2
項記載の記載の光学ガラスの製造方法。
(3) Claim 1 or 2, characterized in that the amount of SiO_2 fine particles with an average particle size of 0.03 μm or more is 10 mol% or more based on the total silicon atoms.
A method for producing optical glass as described in Section 1.
JP1020354A 1989-01-30 1989-01-30 Manufacturing method of optical glass Expired - Lifetime JP2832213B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1020354A JP2832213B2 (en) 1989-01-30 1989-01-30 Manufacturing method of optical glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1020354A JP2832213B2 (en) 1989-01-30 1989-01-30 Manufacturing method of optical glass

Publications (2)

Publication Number Publication Date
JPH02199033A true JPH02199033A (en) 1990-08-07
JP2832213B2 JP2832213B2 (en) 1998-12-09

Family

ID=12024779

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Application Number Title Priority Date Filing Date
JP1020354A Expired - Lifetime JP2832213B2 (en) 1989-01-30 1989-01-30 Manufacturing method of optical glass

Country Status (1)

Country Link
JP (1) JP2832213B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1081103A1 (en) * 1999-09-03 2001-03-07 Heraeus Quarzglas GmbH & Co. KG Process for making molded glass and ceramic articles
US7059153B2 (en) 2000-06-05 2006-06-13 Murata Manufacturing Co., Ltd. Method for producing glass powders
US8121072B2 (en) 2002-07-30 2012-02-21 Fujitsu Limited Adaptive modulation and coding

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1081103A1 (en) * 1999-09-03 2001-03-07 Heraeus Quarzglas GmbH & Co. KG Process for making molded glass and ceramic articles
US7059153B2 (en) 2000-06-05 2006-06-13 Murata Manufacturing Co., Ltd. Method for producing glass powders
US8121072B2 (en) 2002-07-30 2012-02-21 Fujitsu Limited Adaptive modulation and coding
US8488520B2 (en) 2002-07-30 2013-07-16 Fujitsu Limited Adaptive modulation and coding
US8576771B2 (en) 2002-07-30 2013-11-05 Fujitsu Limited Adaptive modulation and coding
US8665781B2 (en) 2002-07-30 2014-03-04 Fujitsu Limited Adaptive modulation and coding

Also Published As

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