JPH0551540B2 - - Google Patents

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Publication number
JPH0551540B2
JPH0551540B2 JP12435985A JP12435985A JPH0551540B2 JP H0551540 B2 JPH0551540 B2 JP H0551540B2 JP 12435985 A JP12435985 A JP 12435985A JP 12435985 A JP12435985 A JP 12435985A JP H0551540 B2 JPH0551540 B2 JP H0551540B2
Authority
JP
Japan
Prior art keywords
gel
particles
glass
dried
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12435985A
Other languages
Japanese (ja)
Other versions
JPS61286230A (en
Inventor
Ichiro Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP12435985A priority Critical patent/JPS61286230A/en
Publication of JPS61286230A publication Critical patent/JPS61286230A/en
Publication of JPH0551540B2 publication Critical patent/JPH0551540B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Silicon Compounds (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ガラスの製造方法に関するものであ
り、詳しくは、シリコンアルコキシドを原料の1
つとしてゾルゲル法によりガラスを製造する方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing glass.
One aspect of the present invention relates to a method for producing glass by a sol-gel method.

〔従来の技術〕[Conventional technology]

現在、光フアイバーのプリフオームを作製する
方法としては、VAD法をはじめとする、SiC4
等を火炎中に導入しガラス微粒子をターゲツト上
に堆積させ、得られたガラス多孔質体を焼結しガ
ラス塊を得る、という方法が主流になつている。
これは高純度の多孔質ガラスを比較的安価に得ら
れる優れた方法である。しかしこの方法は気相反
応であるため、添加物として使える物質がガス化
できるものに限られる、という欠点があつた。
Currently, the methods for producing optical fiber preforms include SiC 4
The mainstream method is to introduce glass particles into a flame, deposit glass particles on a target, and sinter the resulting glass porous body to obtain a glass lump.
This is an excellent method for obtaining high-purity porous glass at a relatively low cost. However, since this method is a gas phase reaction, it has the disadvantage that the substances that can be used as additives are limited to those that can be gasified.

そこで、近年、この欠点を補う方法として、Si
を主体とした金属アルコキシドを加水分解し、シ
リカゲルあるいは添加元素を含むシリカゲルを
得、該シリカゲルを乾燥させた後無孔化処理等を
行い透明ガラスを得る方法が盛んに研究されてい
る。
Therefore, in recent years, Si
A method of obtaining transparent glass by hydrolyzing a metal alkoxide mainly containing silica gel or silica gel containing additive elements, drying the silica gel, and performing a nonporous treatment, etc. is being actively researched.

一例を挙げれば、シリコンテトラメトキシド等
のSiのアルコキシドを、エタノールと充分に攪拌
混合した後、水を加え更に攪拌して加水分解す
る。この時水にはアンモニア等PH調整剤を加えて
おくことが好ましい。加水分解反応の開始と共に
粒子の析出が始まり、該反応溶液を内面にシリコ
ーンを塗つた容器に移し、乾燥時間を長くできる
ようにアルミ箔等で蓋をして例えば60℃程度の恒
温槽中に保つことにより、ゾル液のゲル化および
ゲルの乾燥を行う。乾燥するに従つてゲルは収縮
し、通常数日を経るとほぼ乾燥が終了する。この
ようにして得たゲルを取り出し、例えば酸素を含
むHe雰囲気中にて加熱する等により無孔化処理
を行い、透明ガラス化する方法がすでに知られて
いる。
For example, after a Si alkoxide such as silicon tetramethoxide is thoroughly stirred and mixed with ethanol, water is added and further stirred to hydrolyze it. At this time, it is preferable to add a pH adjuster such as ammonia to the water. Particles begin to precipitate with the start of the hydrolysis reaction, and the reaction solution is transferred to a container coated with silicone on the inside, covered with aluminum foil, etc. to prolong the drying time, and placed in a constant temperature bath at, for example, 60°C. By keeping the sol solution gelled and the gel dried. The gel shrinks as it dries, and drying is usually completed after several days. A method is already known in which the gel thus obtained is taken out and subjected to a porosity treatment such as heating in an oxygen-containing He atmosphere to turn it into transparent glass.

このようないわゆるゾルゲル法は、アルコキシ
ドが多くの金属元素について作製できるので、各
種の物質を容易に添加できる。また、均一性が極
めて高いガラスが得られるという長所がある。し
かしながら一方では、ゲルが乾燥時などに割れや
すいという欠点もある。
In such a so-called sol-gel method, since alkoxides can be prepared for many metal elements, various substances can be easily added. Another advantage is that glass with extremely high uniformity can be obtained. However, on the other hand, it also has the disadvantage that the gel tends to crack when drying.

本発明者らはこのような乾燥、焼結時の割れを
防ぐために、すでに特願昭60−13538号明細書に
て、ゾル液にコロイドになり得ない大きさの粒子
を加える方法を、また特願昭60−96676号明細書
にてはゾル液にガラス原料を含む粉末を混合し
て、ゾル液が増粘剤と粒径1ミクロン以上のガラ
ス原料粒子を含んでなるようにしたものをゲル化
させる方法を提案しているが、いずれの方法も大
きな効果を挙げるものである。
In order to prevent such cracking during drying and sintering, the present inventors have already proposed a method in Japanese Patent Application No. 13538/1983, in which particles of a size that cannot be turned into colloids are added to the sol solution. Japanese Patent Application No. 60-96676 describes a product in which a powder containing a glass raw material is mixed with a sol liquid so that the sol liquid contains a thickener and glass raw material particles with a particle size of 1 micron or more. We have proposed a gelling method, and each method is highly effective.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかるに上記の二方法によつて作られたゲル
は、乾燥、焼結時の割れ防止には効果があるもの
の、これらの方法によつて作られたゲルはすきま
径が大きく、サブミクロンオーダーの均一性が要
求される用途、例えば平面導波路やロツドレンズ
等の微小光学部品をゾルゲル法で製造する場合な
どには、好ましくない場合がある。またフオトレ
ジストでマスクするのもむずかしくなる。
However, although the gels made by the above two methods are effective in preventing cracking during drying and sintering, the gels made by these methods have large gap diameters and are not uniform on the order of submicrons. This may be undesirable in applications where high performance is required, such as when manufacturing microscopic optical components such as planar waveguides and rod lenses using the sol-gel method. It also becomes difficult to mask with photoresist.

本発明は乾燥時に割れにくく、かつ高度の均一
性を有するゲルを得、それにより均一性の高いガ
ラスを焼結時の発泡等がなく効率よく製造する方
法を提供することを目的とするものである。
The object of the present invention is to obtain a gel that is hard to crack when drying and has a high degree of uniformity, thereby providing a method for efficiently producing highly uniform glass without foaming during sintering. be.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は原料の少なくとも1つをシリコンのア
ルコキシドとするゲル化しうるゾル液に、粒径
0.005μ以上0.5μ以下であり、かつコロイド状態に
なり得る程度に小さい粒子を混合した後、ゾル液
をゲル化してこれにより得られたゲルを乾燥し、
該乾燥ゲルを焼結することを特徴とするガラスの
製造方法により上記目的を達成するものである。
The present invention provides a gelatinable sol solution containing silicon alkoxide as at least one of the raw materials.
After mixing particles with a size of 0.005μ or more and 0.5μ or less and small enough to be in a colloidal state, the sol solution is gelled and the resulting gel is dried,
The above object is achieved by a method for manufacturing glass characterized by sintering the dried gel.

本発明者らはすでに特願昭59−192581号明細書
にてアルコキシドの加水分解時またはそれ以前に
液中にコロイド粒子を0.5〜20モル%程度加える
ことを提案している。このようにコロイド粒子を
分散させておいて、なぜかさ密度が制御できるか
についてさらに検討の結果、コロイド粒子はアル
コキシドの加水分解で析出する酸化物の核とな
り、その結果割れにくいゲルを得ることができる
とわかつた。
The present inventors have already proposed in Japanese Patent Application No. 59-192581 to add about 0.5 to 20 mol % of colloidal particles to the solution during or before hydrolysis of the alkoxide. Further investigation into why the bulk density could be controlled by dispersing colloidal particles in this way revealed that colloidal particles serve as the core of oxides that precipitate due to hydrolysis of alkoxides, resulting in a gel that is difficult to break. I knew I could do it.

本発明はコロイド粒子を加える時期が、ゾル液
のゲル化前であれば、加水分解が終了していても
良いこと、コロイド粒子の量がアルコキシドの大
むね100モル%以上が好ましいこと、などの点で
前記の発明と異なる。より本質的には、本発明で
はコロイド粒子は加水分解とは関係なくゲル中に
存在することにより、ゲルのすきま径を均一性を
損なわない範囲で大きくし、乾燥時のひずみに対
して割れにくいゲルを得るものである。
In the present invention, the colloid particles may be added after hydrolysis has been completed as long as the sol solution is not gelled, and the amount of colloid particles is preferably approximately 100 mol% or more of the alkoxide. This invention differs from the above invention in this respect. More essentially, in the present invention, colloidal particles exist in the gel regardless of hydrolysis, so that the gap size of the gel can be increased within a range that does not impair uniformity, and it is difficult to crack due to strain during drying. This is what gives you the gel.

このとき加えるコロイド粒子の径が小さいと、
割れを防ぐ効果が少ないので0.005μ以上の粒径が
必要である。粒径が大きいとすきま径がますます
大きくなり割れを防ぐ効果は増すが、均一性が損
なわれる。本発明の目的である、乾燥時に割れに
くくかつ均一性の高いゲルを得るためには、粒子
はコロイドになり得る程度に小さいことが好まし
く、その径は0.5μ以下である。また粒子は適当な
増粘作用を持つことが好ましい。
If the diameter of the colloid particles added at this time is small,
Since it is less effective in preventing cracking, a particle size of 0.005μ or more is required. If the particle size is large, the gap size will become larger and the effect of preventing cracking will increase, but uniformity will be impaired. In order to obtain a highly uniform gel that is hard to crack during drying, which is the objective of the present invention, the particles are preferably small enough to form a colloid, and have a diameter of 0.5 μm or less. It is also preferable that the particles have an appropriate thickening effect.

以上の理由から粒子は粒径0.05μ以上でありコ
ロイド状態になり得る程度に小さいサイズ、特に
好ましい粒径としては0.005μ以上0.5μ以下が挙げ
られる。
For the above reasons, the particles have a particle size of 0.05μ or more, which is small enough to be in a colloidal state, and a particularly preferable particle size is 0.005μ or more and 0.5μ or less.

また、加える粒子の量はアルコキシドの濃度、
加える粒子の粒径・組成・OH基密度、その他の
条件により大きく異なるが、一般にはアルコキシ
ドを原料とするガラス成分の100モル%以上加え
ることが好ましい。粉末がそれ以上まざりにくく
なるほどなるべく多くまぜるのが好ましい結果を
もたらすことが多い。
Also, the amount of particles added depends on the concentration of alkoxide,
Although it varies greatly depending on the particle size, composition, OH group density, and other conditions of the particles to be added, it is generally preferable to add 100 mol% or more of the glass component made of alkoxide as a raw material. Mixing as much powder as possible to prevent further mixing often yields favorable results.

本発明方法に用いられる粒子の成分はガラス原
料であれば良い。例えばSiO2、もしくは、SiO2
にGe,P,A,Ti,Zr,Sn,Pb,Csなどの酸
化物を加えたものなどを用いることができるがこ
れに限定されない。
The components of the particles used in the method of the present invention may be any glass raw material. For example, SiO 2 or SiO 2
A material obtained by adding an oxide such as Ge, P, A, Ti, Zr, Sn, Pb, or Cs to the material can be used, but the material is not limited thereto.

本発明においては、原料の少なくとも一つをシ
リコンのアルコキシド例えばシリコンのメトキシ
ド、エトキシド等とし、これを加水分解してシリ
カゲルあるいは添加元素を含むシリカゲルを得る
が、加水分解条件は特に限定されるところはな
く、例えばエタノールと混合後に水を加える。ま
たはPH調製剤としてのアンモニア等を加えた水を
加える等の方法による。また得られたゲルを乾燥
し焼結することも常法による。
In the present invention, at least one of the raw materials is a silicon alkoxide, such as silicon methoxide, ethoxide, etc., and this is hydrolyzed to obtain silica gel or silica gel containing additive elements, but the hydrolysis conditions are not particularly limited. For example, add water after mixing with ethanol. Alternatively, a method such as adding water to which ammonia or the like as a PH adjusting agent is added is used. Further, the obtained gel may be dried and sintered using a conventional method.

本発明において上記した少なくともシリコンの
アルコキシドを含む原料には、シリコンのアルコ
キシド以外に他のアルコキシド、例えばGe,B,
P,A,Ti,Zr,Sn,などのアルコキシドを
加えておいても良い。またゾル液中にアルコキシ
ド以外の形、例えば塩の水溶液などの形で各種ド
ーパント元素を含ませておいても良い。
In the present invention, the above-mentioned raw material containing at least silicon alkoxide may include other alkoxides other than silicon alkoxide, such as Ge, B,
Alkoxides such as P, A, Ti, Zr, Sn, etc. may be added. Further, various dopant elements may be included in the sol liquid in a form other than alkoxide, for example, in the form of an aqueous salt solution.

ソル液に粒子を混合した後、ゾル液を常法によ
り乾燥して乾燥ゲルとする。
After the particles are mixed into the sol solution, the sol solution is dried by a conventional method to form a dry gel.

このようにして得たゲルにドーパント分布をつ
け、焼結することにより各種の微小光学部品を得
ることができる。微小光学部品としては例えば平
面導波路等の光回路、ロツドレンズなどが挙げら
れる。
By imparting a dopant distribution to the thus obtained gel and sintering it, various microscopic optical components can be obtained. Examples of micro optical components include optical circuits such as planar waveguides, rod lenses, and the like.

本発明方法に従つて平面導波路を製造する工程
は例えば次のようなものである。上記の本発明方
法により得られた平板上のゲルにアルコールをし
みこませ、次に数十秒間Geのアルコキシドのア
ルコール溶液につける。これにより表面にGeの
アルコキシドを含む層ができる。これをアルコー
ルでうすめた水につけることにより、表面のGe
のアルコキシドが加水分解をおこし、該ゲルの表
面にGeO2を含む層ができる。これを乾燥させ、
焼結し、エツチングすることにより、平面導波路
を得ることができる。平板状のゲルにフオトレジ
ストでパターンをつくつてから上の工程を行なえ
ばうめこみ型の導波路が得られ、エツチングは不
要となる。
For example, the steps for manufacturing a planar waveguide according to the method of the present invention are as follows. The gel on the flat plate obtained by the method of the present invention described above is impregnated with alcohol, and then immersed in an alcohol solution of Ge alkoxide for several tens of seconds. This creates a layer containing Ge alkoxide on the surface. By soaking this in water diluted with alcohol, the surface Ge
The alkoxide causes hydrolysis, and a layer containing GeO 2 is formed on the surface of the gel. Let this dry,
A planar waveguide can be obtained by sintering and etching. By creating a pattern on a flat gel using photoresist and performing the above steps, a recessed waveguide can be obtained, eliminating the need for etching.

また本発明方法に従つてロツドレンズを製造す
る工程は例えば次のようなものである。本発明方
法により得られたロツド状のゲルにCsNO3水溶
液をしみこませる。これをH3BO3の水溶液に数
分つけ、周辺部に向かつてCsNO3濃度はなだら
かに減少し、H3BO3の濃度はなだらかに上昇す
るゲルを得る。これを低温で短時間で乾燥するよ
う、真空乾燥し、焼結する。これにより径方向に
屈折率分布を持つロツドレンズが得られる。
Further, the steps for manufacturing a rod lens according to the method of the present invention are, for example, as follows. The rod-shaped gel obtained by the method of the present invention is impregnated with a CsNO 3 aqueous solution. This is soaked in an aqueous solution of H 3 BO 3 for several minutes to obtain a gel in which the CsNO 3 concentration gradually decreases and the H 3 BO 3 concentration gradually increases toward the periphery. This is vacuum dried and sintered to dry at low temperatures and in a short time. As a result, a rod lens having a refractive index distribution in the radial direction is obtained.

本発明によつて得られるゲルは乾燥時、ドープ
時に割れにくくかつ、均一性が高く精密なドーパ
ント分布をつくることが容易に可能である。この
ため、上記の微小光学部品の製造に特に適してい
る。
The gel obtained by the present invention does not easily crack during drying or doping, has high uniformity, and can easily create a precise dopant distribution. Therefore, it is particularly suitable for manufacturing the above-mentioned micro optical components.

本発明によつて製造されるガラスは塊状のもの
にかぎらず、膜状、フアイバー状であつても良
い。例えばガラス基板上に本発明により得られる
ゾル液をぬりそのまま乾燥させると数μ以上の厚
みのゲル膜が得られる。これを焼結すれば数μ以
上の厚みのガラス膜も得ることができる。アルコ
キシドのみを原料とし、本発明のように粉末を加
えてないゾル液では同じ方法で1μ以上の膜をつ
くるのは、膜が割れてしまうため困難である。
The glass produced according to the present invention is not limited to a lump, but may also be in the form of a film or fiber. For example, if the sol obtained according to the present invention is applied onto a glass substrate and then dried, a gel film with a thickness of several microns or more can be obtained. If this is sintered, a glass film with a thickness of several microns or more can be obtained. With a sol solution that uses only alkoxide as a raw material and does not contain powder as in the present invention, it is difficult to create a film of 1μ or more using the same method because the film will break.

〔実施例〕〔Example〕

以下、実施例及び比較例によつて本発明の方法
を具体的に説明する。
The method of the present invention will be specifically explained below using Examples and Comparative Examples.

実施例 1 Si(OCH341/8モルとエタノール1/2モルをマ
グネチツクスターラで混合し、該混合液の中にほ
う酸1/50モルを含む、1.9%アンモニア水1モル
を加えさらに混合した。これをミキサーに入れ、
粒径0,05μ程度のシリカ粒子(市販品、商品名
アエロジルOX−50)40gを加え、激しくかきま
ぜた。これをビーカーに移し、60Torr程度の圧
力で脱気した後、内径10mmφのパイプに入れた。
Example 1 1/8 mole of Si(OCH 3 ) 4 and 1/2 mole of ethanol were mixed using a magnetic stirrer, and 1 mole of 1.9% ammonia water containing 1/50 mole of boric acid was added to the mixture. Mixed. Put this in a mixer
40 g of silica particles (commercial product, trade name Aerosil OX-50) with a particle size of about 0.05 μm were added and stirred vigorously. This was transferred to a beaker, degassed at a pressure of about 60 Torr, and then placed in a pipe with an inner diameter of 10 mmφ.

これを室温でゲル化させた後、水中で押し出
し、アルミ箔の上で室温で乾燥した。これを500
℃空気中で仮焼後1450℃He中で焼結したところ、
割れることなくガラスを得ることができた。
After gelling at room temperature, it was extruded in water and dried on aluminum foil at room temperature. 500 of this
After calcination in ℃ air and sintering in He at 1450℃,
I was able to get the glass without breaking it.

実施例 2 コロイド粒子として、VADスス付けの際マツ
フルについた粉末40gを用い、原料にほう酸を加
えず、アンモニア水を0.3%にして、他は実施例
1と同様にして乾燥ゲルを得た。このゲルを、
900℃で仮焼後、ゲルに10%ほう酸水溶液をしみ
こませ再び乾燥した。900℃の仮焼はほう酸水溶
液をしみこませる際の割れを防ぐために行つた。
こうして得られたゲルを温度500℃の空気中で仮
焼後1450℃He中で焼結し割れることなくガラス
を得ることができた。
Example 2 A dry gel was obtained in the same manner as in Example 1, except that 40 g of the powder attached to Matsufuru during VAD soot application was used as colloidal particles, no boric acid was added to the raw materials, and aqueous ammonia was reduced to 0.3%. This gel
After calcining at 900°C, the gel was impregnated with a 10% boric acid aqueous solution and dried again. Calcining at 900°C was performed to prevent cracking when impregnated with boric acid aqueous solution.
The thus obtained gel was calcined in air at a temperature of 500°C and then sintered in He at 1450°C to obtain glass without cracking.

実施例 3 コロイド粒子として粒径0.012μ程度のシリカ粒
子(アエロジルの商品名で市販されている)15g
を加えほう酸の量を1/100モル、アンモニア水を
1%にしたことの他は実施例1と同様にして10mm
φのパイプに入つたゲルを得た。
Example 3 15 g of silica particles (commercially available under the trade name Aerosil) with a particle size of approximately 0.012μ as colloid particles
10 mm in the same manner as in Example 1 except that the amount of boric acid was 1/100 mol and the aqueous ammonia was 1%.
A gel in a φ pipe was obtained.

このゲルを水中で押しだし、半分はゆつくり乾
燥させるため20mmφのパイプに入れ、半分はアル
ミ箔の上にのせ共に室温で乾燥した。前者は割れ
無しに乾燥し、500℃空気中で仮焼後1450℃He中
で焼結しガラスを得ることができた。後者は乾燥
中割れたが、かけらは比較的大きく4〜5mm程度
であつた。
This gel was extruded in water, half was placed in a 20 mm diameter pipe to slowly dry it, and the other half was placed on aluminum foil and both were dried at room temperature. The former dried without cracking, was calcined in air at 500°C, and then sintered in He at 1450°C to obtain glass. The latter cracked during drying, but the pieces were relatively large, measuring about 4 to 5 mm.

比較例 1 シリカ粒子を加えなかつたことの他は実施例3
と同様にした。20mmφのパイプ中で乾燥したもの
はクラツクが入つており、焼結を試みると発泡し
た。アルミ箔の上で乾燥したものは粉々になりか
けらは1〜2mm程度で小さかつた。
Comparative Example 1 Example 3 except that no silica particles were added
I did the same thing. The material dried in a 20mmφ pipe contained cracks and foamed when sintering was attempted. When dried on aluminum foil, the pieces were small, about 1 to 2 mm in size.

実施例 4 フツ素を含む石英ガラス(屈折率1.453)の板
を実施例1と同様にして得たゾル液につけ、ひき
上げた後、シヤーレに入れフタをして、ゆつくり
乾燥した。これを温度500℃の空気中で仮焼後、
1450℃にてHe中で焼結し、得られたものを酸水
素炎であぶり透明なガラス膜を得た。この膜厚は
50μ程度であり、平面導波路等の用途に十分使用
できるものであつた。
Example 4 A plate of fluorine-containing quartz glass (refractive index 1.453) was immersed in the sol solution obtained in the same manner as in Example 1, pulled up, placed in a shear dish, covered with a lid, and slowly dried. After calcining this in air at a temperature of 500℃,
The material was sintered in He at 1450°C, and the resulting material was sintered in an oxyhydrogen flame to obtain a transparent glass film. This film thickness is
The thickness was about 50μ, and it could be used for applications such as planar waveguides.

比較例 2 フツ素を含む石英ガラスの板を比較例1と同様
にして得たゾル液につけ、ひき上げた後、シヤー
レに入れフタをしてゆつくり乾燥した。得られた
ゲルの膜は0.3μ程度であつた。膜厚を厚くするた
めゾル液につけ乾燥することを2回行つたもので
はゲル膜は割れていた。
Comparative Example 2 A fluorine-containing quartz glass plate was immersed in the sol solution obtained in the same manner as in Comparative Example 1, pulled up, placed in a shear dish, covered with a lid, and slowly dried. The resulting gel film had a thickness of about 0.3μ. When the gel film was soaked in a sol solution and dried twice to increase the film thickness, the gel film was cracked.

実施例 5 実施例2で得たゲルを板状に研摩した後900℃
で仮焼した。これにエタノールをしみこませた
後、Ge(OC2H54の3%エタノール液に30秒つけ
すぐにエタノールに1秒つけた。さらに続いてエ
タノールの50%水溶液20gに13%アンモニア水1
滴を加えたものにつけ60分放置した。これをとり
だして乾燥した後10%のほう酸水溶液をしみこま
せ、再び乾燥した。これを500℃空気中で仮焼後
1450℃He中で焼結し、表面に屈折率の高い層を
持つ平面導波路母材を得た。
Example 5 The gel obtained in Example 2 was polished into a plate shape and then heated to 900°C.
It was calcined in After impregnating it with ethanol, it was immersed in a 3% ethanol solution of Ge(OC 2 H 5 ) 4 for 30 seconds, and then immediately immersed in ethanol for 1 second. Furthermore, add 13% ammonia water to 20g of 50% aqueous solution of ethanol.
I added the drops and left it for 60 minutes. After taking it out and drying it, it was impregnated with a 10% boric acid aqueous solution and dried again. After calcining this in air at 500℃
A planar waveguide base material with a high refractive index layer on the surface was obtained by sintering in He at 1450℃.

実施例 6 実施例5と同様にして得た仮焼後のゲルをフオ
トレジストでマスクし、幅30μ程度のみぞを切つ
た後、エタノールをしみこませた。以下実施例5
と同様にしてチヤネル型の平面導波路を得ること
ができた。
Example 6 The calcined gel obtained in the same manner as in Example 5 was masked with a photoresist, a groove with a width of about 30 μm was cut, and then ethanol was impregnated. Example 5 below
A channel-type planar waveguide was obtained in the same manner.

比較例 7 粒径約0.012μのシリカ粒子120gと、水300gと
をミキサーで混合した後、乾燥機で乾燥すること
により、シリカ粒子を造粒した。
Comparative Example 7 Silica particles were granulated by mixing 120 g of silica particles with a particle size of about 0.012 μm and 300 g of water using a mixer, and then drying the mixture using a drier.

Si(OCH341/8モルと、エタノール1/2モルを
マグネチツクスターラで混合し、その中に0.3%
のアンモニア水1モルを加え、さらに混合した
後、これをミキサーに入れた。その中に造粒した
シリカ粒子25gを加え、激しくかきまぜた。これ
をビーカーに移し、60Torr程度の圧力で脱気し
た後、内径10mmのパイプにこれを室温でゲル化さ
せた後、水中で押し出した後アルミ箔の上で乾燥
させた。このゲルを板状に研摩し、フオトレジス
トでマスクしようとしたが、すきま径が大きいた
め、フオトレジストはゲルにしみこみ、マスクす
ることができなかつた。
Mix 1/8 mol of Si(OCH 3 ) 4 and 1/2 mol of ethanol in a magnetic stirrer, and add 0.3%
After adding 1 mol of ammonia water and further mixing, this was placed in a mixer. 25g of granulated silica particles were added to it and stirred vigorously. This was transferred to a beaker, degassed at a pressure of about 60 Torr, gelled in a pipe with an inner diameter of 10 mm at room temperature, extruded in water, and dried on aluminum foil. An attempt was made to polish this gel into a plate shape and mask it with photoresist, but the gap was so large that the photoresist soaked into the gel and could not be masked.

(発明の効果) 本発明の方法は乾燥時割れにくく、焼結時発泡
しにくく、かつ均一性の高いゲルを得ることがで
き、それにより、均一性の高いガラスを効率良く
製造することのできる優れた効果を有する。
(Effects of the Invention) The method of the present invention makes it possible to obtain a gel that is difficult to crack during drying, difficult to foam during sintering, and has high uniformity, thereby making it possible to efficiently manufacture highly uniform glass. Has excellent effects.

Claims (1)

【特許請求の範囲】[Claims] 1 原料の少なくとも1つをシリコンのアルコキ
シドとするゲル化しうるゾル液に、粒径0.005μ以
上0.5μ以下であり、かつコロイド状態になり得る
程度に小さい粒子を混合した後、ゾル液をゲル化
して、これにより得られたゲルを乾燥し、該乾燥
ゲルを焼結することを特徴とするガラスの製造方
法。
1. Particles having a particle size of 0.005μ or more and 0.5μ or less and small enough to be in a colloidal state are mixed into a gelatable sol solution in which at least one of the raw materials is silicon alkoxide, and then the sol solution is gelled. A method for producing glass, which comprises: drying the resulting gel; and sintering the dried gel.
JP12435985A 1985-06-10 1985-06-10 Glass manufacturing method Granted JPS61286230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12435985A JPS61286230A (en) 1985-06-10 1985-06-10 Glass manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12435985A JPS61286230A (en) 1985-06-10 1985-06-10 Glass manufacturing method

Publications (2)

Publication Number Publication Date
JPS61286230A JPS61286230A (en) 1986-12-16
JPH0551540B2 true JPH0551540B2 (en) 1993-08-02

Family

ID=14883446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12435985A Granted JPS61286230A (en) 1985-06-10 1985-06-10 Glass manufacturing method

Country Status (1)

Country Link
JP (1) JPS61286230A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0686288B2 (en) * 1985-09-09 1994-11-02 多摩化学工業株式会社 Method for producing silica

Also Published As

Publication number Publication date
JPS61286230A (en) 1986-12-16

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