JPH0219942B2 - - Google Patents

Info

Publication number
JPH0219942B2
JPH0219942B2 JP55083872A JP8387280A JPH0219942B2 JP H0219942 B2 JPH0219942 B2 JP H0219942B2 JP 55083872 A JP55083872 A JP 55083872A JP 8387280 A JP8387280 A JP 8387280A JP H0219942 B2 JPH0219942 B2 JP H0219942B2
Authority
JP
Japan
Prior art keywords
group
formula
phase
optical recording
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55083872A
Other languages
Japanese (ja)
Other versions
JPS5710135A (en
Inventor
Kyoshi Chiba
Kaoru Iwata
Yoichi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP8387280A priority Critical patent/JPS5710135A/en
Publication of JPS5710135A publication Critical patent/JPS5710135A/en
Publication of JPH0219942B2 publication Critical patent/JPH0219942B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Holo Graphy (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

本発明は新芏な光蚘録䜓及びその材料に関し、
曎に詳しくはシンナミリデン基を偎鎖に有する感
光性重合䜓を甚いた光蚘録䜓及びその材料及びそ
の材料から光蚘録䜓を圢成させる方法に関する。 光照射により屈折率倉化を惹起せしめるこずを
利甚し、光信号を蚘録する䜍盞型光蚘録䜓特に䜍
盞型ホログラムメモリ䜓は読み出し時に光の吞収
による損倱が少ない為光の利甚効率が高い。この
秀れた特性を掻かし䞀般的なメモリ及びホログラ
ムデむスプレヌ等ずしお倚くの応甚が提案されお
いる。䟋えばリチりムニオベむトに代衚される単
結晶、カルコゲナむト膜に代衚される非晶質無機
薄膜材料、れラチンや増感したポリメチルメタク
リレヌト或いは光重合型のアクリレヌト組成物で
代衚されるホトポリマヌ材料等が有る。この䞭で
ホトポリマヌ膜は倧面積化が可胜なこずから、ホ
トポリマヌを利甚した䜍盞型光蚘録材料の開発が
切望されおいる。しかし感床、解像床、回折効
率、保存安定性等の基本特性を満足に兌ね備えた
光蚘録材料が無いため未だ実甚化には至぀おいな
い。 本発明者等はレゞスト甚或いは平版甚感光性暹
脂ずしお実甚化されおいるケむヒ酞系重合䜓が光
二量化反応により架橋するこずに着目し、光蚘録
材料ずしお応甚すべく鋭意研究した結果、ポリビ
ニルシンナミリデンアセテヌト類が玫倖及び可芖
のレヌザヌ光線の照射で架橋されるこずにより、
高感床に屈折率が倉化し、か぀党䜓ずしお透明性
を維持しお䜍盞型光蚘録像を圢成するこずを芋出
し本発明に到達した。 即ち本発明は  䞋蚘䞀般匏〔〕 〔䜆し、匏䞭R1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基を衚わし、
R2は氎玠原子、メチル基又はプニル基を衚わ
す。は
The present invention relates to a novel optical recording medium and its material,
More specifically, the present invention relates to an optical recording medium using a photosensitive polymer having a cinnamylidene group in its side chain, its material, and a method for forming an optical recording medium from the material. Phase-type optical recording bodies, particularly phase-type hologram memory bodies, which record optical signals by utilizing a change in refractive index caused by light irradiation, have high light utilization efficiency because there is little loss due to absorption of light during readout. Taking advantage of this excellent property, many applications have been proposed for general memories, hologram displays, etc. Examples include single crystals such as lithium niobate, amorphous inorganic thin film materials such as chalcogenite films, and photopolymer materials such as gelatin, sensitized polymethyl methacrylate, or photopolymerizable acrylate compositions. Among these, since photopolymer films can be made to have a large area, there is a strong desire to develop phase-type optical recording materials using photopolymers. However, since there is no optical recording material that satisfactorily combines basic characteristics such as sensitivity, resolution, diffraction efficiency, and storage stability, it has not yet been put into practical use. The present inventors focused on the fact that cinnamic acid-based polymers, which have been put into practical use as photosensitive resins for resists and lithography, crosslink due to photodimerization reactions, and as a result of intensive research to apply them as optical recording materials, they discovered that polyvinyl thinner By crosslinking mylidene acetates by irradiation with ultraviolet and visible laser beams,
The present invention was achieved by discovering that a phase-type optical recording image can be formed while the refractive index changes with high sensitivity and the transparency is maintained as a whole. That is, the present invention has the following general formula [] [However, in the formula, R 1 represents a hydrogen atom, a methyl group, a phenyl group, a phenoxy group or a cyano group,
R 2 represents a hydrogen atom, a methyl group or a phenyl group. X is

【匏】又は[Formula] or

【匏】で衚わされる 基を衚わす。〕 で衚わされるシンナミリデン基を偎鎖に有する感
光性重合䜓が屈折率分垃蚘録局ずしお基䜓䞊に積
局されおなる䜍盞型光蚘録材料、  䞋蚘䞀般匏〔〕 〔䜆し、匏䞭R1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基を衚わし、
R2は氎玠原子、メチル基又はプニル基を衚わ
す。は
Represents a group represented by [Formula]. ] A phase-type optical recording material comprising a photosensitive polymer having a cinnamylidene group in its side chain, which is represented by the following formula, laminated on a substrate as a refractive index distribution recording layer, 2. [However, in the formula, R 1 represents a hydrogen atom, a methyl group, a phenyl group, a phenoxy group or a cyano group,
R 2 represents a hydrogen atom, a methyl group or a phenyl group. X is

【匏】又は[Formula] or

【匏】で衚わされる 基を衚わす。〕 で衚わされるシンナミリデン基を偎鎖に有する感
光性重合䜓が䞍均䞀に又は分垃をも぀お架橋し、
しかしお屈折率分垃を有した架橋重合䜓局が圢成
されおなる䜍盞型光蚘録䜓、及び  䞋蚘䞀般匏〔〕 〔䜆し、匏䞭R1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基を衚わし、
R2は氎玠原子、メチル基又はプニル基を衚わ
す。は
Represents a group represented by [Formula]. ] A photosensitive polymer having a cinnamylidene group in its side chain represented by is crosslinked non-uniformly or in a distributed manner,
A phase-type optical recording medium formed with a crosslinked polymer layer having a refractive index distribution, and 3. The following general formula [] [However, in the formula, R 1 represents a hydrogen atom, a methyl group, a phenyl group, a phenoxy group or a cyano group,
R 2 represents a hydrogen atom, a methyl group or a phenyl group. X is

【匏】又は[Formula] or

【匏】で衚わされる 基を衚わす。〕 で衚わされるシンナミリデン基を偎鎖に有する重
合䜓を屈折率分垃蚘録局ずしお甚い、圓該局をレ
ヌザヌ照射にしお架橋せしめ照射レヌザヌ匷床分
垃に察応した屈折率分垃を蚘録するこずを特城ず
する䜍盞型光蚘録䜓の補造方法である。 本発明における前蚘匏〔〕で衚わされるシン
ナミリデン基のR1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基であり、R2
は氎玠原子、メチル基又はプニル基であり、
は
Represents a group represented by [Formula]. ] A phase characterized in that a polymer having a cinnamylidene group represented by the following in its side chain is used as a refractive index distribution recording layer, the layer is crosslinked by laser irradiation, and a refractive index distribution corresponding to the irradiated laser intensity distribution is recorded. This is a method for manufacturing a molded optical recording medium. In the present invention, R 1 of the cinnamylidene group represented by the above formula [] is a hydrogen atom, a methyl group, a phenyl group, a phenoxy group, or a cyano group, and R 2
is a hydrogen atom, a methyl group or a phenyl group, and
teeth

【匏】又は[Formula] or

【匏】である。が[Formula]. X is

【匏】の堎合は、シンナミリデンアセチル基類 であり、In the case of [Formula], cinnamylidene acetyl groups and

【匏】の堎合はシンナミリデンピ ルビル基類になる。これらの䞭で、感床、感光波
長及び原料の入手の容易さ等を勘案するず、シン
ナミリデンアセチル基R1R2
In the case of [Formula], it becomes a cinnamylidenepyruvyl group. Among these, cinnamylidene acetyl group (R 1 = H, R 2 = H,

【匏】、α―メチルシンナミリデンアセ チル基R1CH3R2[Formula]), α-methylcinnamylideneacetyl group (R 1 = CH 3 , R 2 = H,

【匏】、 αγ―ゞメチルシンナミリデンアセチル基
R1CH3R2CH3
[Formula]), α,γ-dimethylcinnamylideneacetyl group (R 1 = CH 3 , R 2 = CH 3 ,

【匏】、α―プ ニルシンナミリデンアセチル基

[Formula]), α-phenylcinnamylideneacetyl group (

【匏】R2[Formula] R 2 = H,

【匏】、α ―シアノシンナミリデンアセチル基R1CN
R2
[Formula]), α-cyanocinnamylideneacetyl group ((R 1 = CN,
R 2 =H,

【匏】等のシンナミリデンアセ チル基類及びシンナミリデンピルビル基R1
R2
[Formula]) and cinnamylideneacetyl groups and cinnamylidenepyruvyl groups (R 1 =
H, R 2 = H,

【匏】、γ―メチルシン ナミリデンアセチル基R1R2CH3
[Formula]), γ-methylcinnamylideneacetyl group (R 1 = H, R 2 = CH 3 ,

【匏】が奜適に、シンナミリデンアセ チル基、α―シアノシンナミリデンアセチル基及
びシンナミリデンピルビル基が特に奜適に甚いら
れる。 本発明に斌ける感光性重合䜓の幹ポリマヌ即
ち、匏〔〕で衚わされる基が結合しおいるポリ
マヌずしおはポリビニルアルコヌル、プノキシ
暹脂、ポリビニルプノヌル、ポリビニルベンゞ
ルアルコヌル、ポリヒドロキシ゚チルビニル゚ヌ
テル、ポリヒドロキシ゚チルメタアクリレヌ
トやポリヒドロキシプロピルメタアクリレヌ
ト等の氎酞基を有する重合䜓である。奜適なポリ
マヌずしおはポリビニルアルコヌル、プノキシ
暹脂、ポリヒドロキシ゚チルビニル゚ヌテル等が
挙げられる。 勿論、偎鎖の前蚘匏〔〕で瀺されるシンナミ
リデン基は幹ポリマヌの氎酞基ず゚ステル結合に
より結合しおいる。 かかる感光性重合䜓類は察応するシンナミリデ
ン酢酞類或いはシンナミリデンピルビン酞類の掻
性誘導䜓、䟋えば酞クロリドず幹ポリマヌをピリ
ゞン䞭で脱塩酞反応したり、或いはシペツテンバ
りマン反応により工業的に補造するこずが可胜で
ある。又あらかじめ単量䜓に前蚘匏〔〕で瀺さ
れる偎鎖基を導入しおおいお、ラゞカル重合法や
カチオン重合法により重合しお埗るこずも可胜で
ある。 本発明の䜍盞型光蚘録材料は原則ずしお、䞊蚘
重合䜓が屈折率分垃蚘録局ずしお基䜓䞊に積局さ
れおいるものであるが、もちろん特殊な圢態ずし
お基䜓を甚いず䞊蚘重合䜓自身のみであるこずも
可胜である。䞊蚘屈折率分垃蚘録局は䞊蚘重合䜓
のみから成るこずもできるが、感床向䞊の目的
や、感光波長領域を長波長の可芖レヌザヌの領域
たで広げる等の目的の為に増感剀を加えるこずが
奜たしい。かかる増感剀ずしおは、―プニル
チオアクリドン、―プニル――ニトロチオ
アクリドン等のアクリドン系増感剀ロヌダミン
、゚リスロシン、゚オシン等のキサンテン系染
料チオミヒラヌズケトン、ミヒラヌズケトン等
のミヒラヌズケトン類―トリプニ
ルピリリりムパヌクロレヌト、―アニシル―
―ビプニルピリリりムパヌクロレヌト、
――アミロキシプニル――ビス
アニシルピリリりムパヌクロレヌト、――
アミロキシプニル――ビスアニシルチ
アピリリりムパヌクロレヌト等のピリリりム塩
その他ロヌズ・ベンガル、10―プナンスロ
キノン、―ニトロアセナフテン、ベンズアント
ラセン等が奜適に甚いられる。これらの䞭でも感
光性重合䜓ずの盞溶性の点より―プニルチオ
アクリドン、ロヌズベンガル、゚リスロシン、゚
オシン、ベンズアントラセン、――アミロ
キシプニル――ビスアニシルピリリり
ムパヌクロレヌト、――アミロキシプニ
ル――ビスアニシルチアピリリりム、パ
ヌクロレヌトが特に奜たしい。勿論これらは単独
で甚いおも良いし、混合しお甚いおも良い。 増感剀の䜿甚量は、増感の目的、感光性重合䜓
ずの盞溶性或いは溶剀を甚いお膜圢成する堎合に
は䜿甚する溶剀に察する溶解性等により巊右され
るが、䞀般には感光性重合䜓に察しお0.01重量
〜20重量、奜たしくは0.1重量〜15重量の
範囲で甚いられる。それ以䞋では増感剀の効果を
瀺さなくなり、加えた意味が無くなるし、それ以
䞊では増感剀の析出により奜たしくない散乱を生
じたり、衚面局での吞収が光の内郚ぞの到達を劚
げる為奜たしくない。 䞊蚘材料が積局される基䜓は有機や無機のフむ
ルム状又はシヌト状、或いは板状の基板が奜たし
く、䟋えば有機高分子フむルムやシヌト及びガラ
ス板などが挙げられ、透明なものがホログラフむ
ヌ甚途には奜たしい。 屈折率分垃蚘録局ずしおの膜厚は䜿甚目的によ
り倉るが、䜍盞型光蚘録材料ずしお有効な䜍盞倉
化を埗る為には0.01ÎŒm以䞊が必芁であり、曎に
読み出し時の比をあげる為には1ÎŒm以䞊の
膜厚が奜たしい。膜厚の䞊限は特にないが䞀般的
にはmm皋床で十分である。 かかる屈折率分垃蚘録局の積局方法に぀いお
は、埓来公知の積局方法を適宜遞択しお採甚すれ
ば良いが、䟋えば前蚘玠材を適圓な溶剀に溶解
し、基䜓䞊に塗垃し溶剀を也燥陀去するこずによ
り、容易に達成するこずができる。甚いる溶媒
は、ポリビニルシンナミリデンアセテヌト類等及
び必芁なら加える増感剀共に溶解するものであれ
ば特に限定するものではない。ゞメチルホルムア
ミド、ゞメチルアセトアミド、―メチルピロリ
ドン、ヘキサメチルホフホルアミド、テトラメチ
ル尿玠等の高沞点極性溶媒、シクロヘキサノン、
メチル゚チルケトン、メチルむ゜ブチルケトン等
のケトン類、゚チレングリコヌルモノメチル゚ヌ
テル、゚チレングリコヌルゞメチル゚ヌテル、テ
トラヒドロフラン、ゞオキサン等の゚ヌテル類、
及びこれらの混合物等が奜たしくあげられる。 塗垃方法及び也燥条件は特に限定されるもので
はない。 本発明の新芏な䜍盞圢光蚘録材料は、光情報の
曞き蟌みにより1/1000皋床の屈折率倉化を起す。
この倉化は情報を䜍盞倉化の圢で蚘憶させる為
に、十分な特性である。 本発明の光蚘録材料は、光情報の曞き蟌みによ
぀おも、驚くべきこずに散乱雑音の増加は、ほず
んど芳枬されない。該特性は䜍盞圢光蚘録材料ず
しお秀れた信号察雑音比を持぀こずを
瀺す。―ベンゟキノンで増感したポリメチルメ
タクリレヌト材料は露光量の増加により倧巟な散
乱雑音の増加によりの䜎䞋を瀺す事実を考
えれば、本発明の光蚘録材料の䜍盞圢材料ずしお
の有効性は明らかである。 光情報の曞き蟌みにより起る反応が、光量化
によるものず考えられ、散乱雑音の原因ずなる媒
質内の歪みができにくいために䞊蚘特性が埗られ
るものず考えられる。 該特性は媒質の厚み方向の情報容量を利甚した
䜓積ホログラムの倚重床を増加した堎合に極めお
秀れたが埗られるこずを瀺唆しおいる。 本発明における䜍盞圢光蚘録材料は、䞀般的な
光メモリ甚、及びホログラムデむスプレむ甚、ホ
ログラム干枉蚈枬甚等に秀れた特性を発揮するも
のである。 光信号はビツト、ハむビツト又はホログラフむ
ツクな圢で䞎える。 本発明における新芏な䜍盞圢蚘録材料は、感光
波長域が玫倖から可芖域にかけお感床をも぀。特
に増感剀ずの組み合せによ぀おは、600mΌ以䞋の
光に察し高い感床をも぀。色玠レヌザ、N2レヌ
ザ、Krむオンレヌザ、He―Cdレヌザ、Arむオ
ンレヌザ、He―Neレヌザ、Ndガラスレヌザの
高調波、ルピヌレヌザ等各皮レヌザに感床をも
぀、特に、Krむオンレヌザ、Arむオンレヌザ等
゚タロンを䜵甚するこずにより、ホログラフむツ
クな情報の蚘憶に適したレヌザ光に察しお、高い
感床をも぀。䟋えば、適圓な増感剀ずの組み合せ
によ぀おArむオンレヌザの514mΌの光に察し、
―ベンゟキノンで増感したポリメチルメタクリ
レヌトの10倍以䞊の感床をも぀。 以䞊、詳述した䜍盞型光蚘録材料は、基䜓の有
無に拘らず、屈折率分垃蚘録局にレヌザヌ光を照
射するこずにより、前蚘した劂くその照射匷床に
応じた架橋反応を生起せしめるこずが出来、それ
によ぀お屈折率においお分垃を有する䜍盞型光蚘
録䜓ずするこずができる。ポリシンナミリデンア
セテヌト自䜓は、䟋えばホトレゞスト等に䜿甚さ
れおおり光照射により、架橋するこずは知られお
いたが、本発明の劂く、その架橋反応の皋床の差
によ぀お、䜍盞型光蚘録䜓を圢成しうるほど屈折
率に倉化が生じるこずは知られおいなか぀た。
又、本発明の䜍盞型光蚘録䜓は特定の架橋重合䜓
を䜿甚しおいる為に、読み出し時におけるノむズ
が少いこずに特城を有する。䟋えば添付図第図
乃至第図で理解される劂く、本発明の䜍盞型光
蚘録䜓はポリメチルメタアクリレヌト系䜍盞型光
蚘録䜓に比范しお読み出しがシダヌプである。 本発明の䜍盞型光蚘録材料を構成しおいる前蚘
重合䜓のレヌザヌ照射による架橋反応の構造的特
定は孊問的に明確に特定するこずは難しいが、前
述した劂く前蚘匏〔〕で衚わされるシンナミリ
デン基が光二量化反応をおこしお架橋しおいるも
のず掚定する。䜍盞蚘録䜓は光信号を照射しおも
よい。かかる埌凊理ずしおの党面照射を行぀おも
圓初圢成された屈折率分垃蚘録は消倱するこずは
ない。 以䞋、実斜䟋により本発明を曎に説明する。 実斜䟋  前蚘匏〔〕においおR1R2に察応
するポリビニルシンナミリデンアセテヌト100郚
に察し、色玠増感剀ずしお゚リスロシン9.1郚を
1000郚のゞメチルアセトアミドに溶解する。該溶
液をmm厚のガラス板䞊にドクタヌナむフで塗垃
し補膜した。也燥は、mmHgの枛圧䞋で40℃で
10時間行぀た。膜厚は150ÎŒmであ぀た。 波長514.5mΌのArむオンレヌザを光束干枉法
により膜面に垂盎に±6゜の入射角で入射させ、膜
䞭に䜍盞型回折栌子を䜜成した。Arむオンレヌ
ザはmmのビヌム埄で5mWの出力に調節し䜿甚
した。読み出しは、He―Neレヌザの632.8mΌの
光を甚いブラツク角で入射させ回折効率を枬定し
た。ビヌム埄は0.8mmで出力は0.05mWに調節し
た。 100mJcm2の露光量の照射により、、
500mJcm2の露光量で、1Jcm2で20の回折
効率を埗た。 さらに露光量を250Jcm2たで増加させたが、散
乱雑音の増加は芳枬されなか぀た。 実斜䟋  前蚘匏〔〕においおR1R2に察応
するポリビニルシンナミリデンアセテヌト100郚
及び色玠増感剀ずしお゚リスロシン郚ずを1000
郚のゞメチルホルムアミドに溶解した。該溶液を
軞延䌞した厚さ75ÎŒmのポリ゚チレンテレフタ
レヌトフむルム䞊にドクタヌナむフで塗垃した。
也燥はmmHgの枛圧䞋で100℃30分、匕き続き40
℃で15時間行぀た。膜厚は50ÎŒmであ぀た。 該フむルムに実斜䟋ず同じ方法で回折栌子を
曞き蟌み回折効率を枬定した。150mJcm2の露光
量で、1Jcm2での回折効率を埗た。 実斜䟋  前蚘匏〔〕においおR1R2に察応
するポリビニルシンナミリデンアセテヌト100郚
及び色玠増感剀ずしお゚オシンむ゚ロヌ1.1郚を
1000郚のゞメチルアセトアミドに溶解した。該溶
液をmm厚のガラス板䞊にドクタヌナむフで塗垃
し補膜した。也燥はmmHgの枛圧䞋で100℃30
分、匕き続き40℃で10時間行぀た。膜厚は400ÎŒm
であ぀た。 波長530.9mΌのKrむオンレヌザを甚い、写真の
解像力解像パタヌンを ラりンホヌフア圢ホログ
ラムずしお蚘録した。 回折効率はであ぀た。次に、参照光を1゜づ
぀ずらし、20倚重のホログラムを膜内に蚘録し
た。この倚重化によ぀おも散乱雑音の増加は芳枬
されなか぀た。 実斜䟋  前蚘匏〔〕においお、R1CNR2に察
応するポリビニルα―シアノ―シンナミリデン
アセテヌト100郚ず――アミロキシプ
ニル――ビスアニシルチアピリリりムパ
ヌクロレヌト郚をゞメチルアセトアミド1000重
量郚に溶解した。補膜、也燥は実斜䟋ず同じ方
法で行぀た。膜厚は100ÎŒmであ぀た。実斜䟋ず
同じ方法で回折栌子を䜜成し、回折効率を枬定し
たずころ、90mJcm2で、2.5Jcm2で25の
回折効率が埗られた。 実斜䟋  前蚘匏〔〕においおR1CH3R2に察
応するポリビニルα―メチル―シンナミリデン
アセテヌト100郚ず―プニルチオアクリド
ン郚をゞメチルアセトアミド1000郚に溶解し
た。補膜、也燥は実斜䟋ず同じ方法で行぀た。
膜厚は80ÎŒmであ぀た。実斜䟋ず同じ方法で䜍
盞圢回折栌子を䜜成し、回折効率を枬定したずこ
ろ、250mJcm2で、2.5Jcm2での回折効
率が埗られた。 実斜䟋  次匏に瀺す幹ポリマヌがビスプノヌル―ゞ
グリシゞ゚ル゚ヌテルから埗られるプノキシ暹
脂の氎酞基にシンナミリデンピリビル基を導入し
た感光性重合䜓100郚ず――アシロキシフ
゚ニル――ビスアニシルチアピリリりム
パヌクロレヌト10郚を実斜䟋の方法に埓぀お補
膜した。膜厚は100ÎŒmであた。 このものを甚いお実斜䟋ず同じように䜍盞圢
回折栌子を䜜成し、回折効率を枬定したずころ、
400mJcm2で、1Jcm2での回折効率が埗
られた。 実斜䟋  次匏で瀺されるピニロキシ゚チル、α―シアノ
シンナミリデンアセヌト重合䜓100郚ずチオミヒ
ラヌズケトン10郚の塗膜を実斜䟋の方法に埓぀
お䜜成した。膜厚は100ÎŒmであ぀た。 このものを甚いお実斜䟋ず同じ方法で䜍盞圢
回析栌子を䜜成し回折効率を枬定したずころ
400mJcm2で0.7、1Jcm2での回折効率が
埗られた。 実斜䟋  ポリビニルシンナミリデンアセテヌト―゚リス
ロシン系の100ÎŒm膜ずPMMA――ベンゟキノ
ン系の200ÎŒm膜ずをそれぞれガラス板䞊に蚭けた
䜍盞型光蚘録材料を甚意した。 (A) これらを甚いお第図に瀺す劂くしお均䞀
露光による曞き蟌みを行぀た。曞き蟌みはAr+
むオンレヌザ波長514.5nmの10mW光を甚
い、ビヌム埄mmで詊料に垂盎な軞より玄1.5°
傟けお入射した。露光時間は300secである。 かくしお、曞き蟌みされた詊料を甚いお、第
図に瀺す劂くしおHe―Neレヌザ波長
632.8nmを詊料に察し垂盎に入射しお読み出し
を行い、写真撮圱した。ビヌム埄は0.8mmである。
䞀方、Ar+むオンレヌザで露光、曞き蟌みされお
いない詊料に察しおも同様にしおHe―Neレヌザ
を照射し写真撮圱した。 第図はPMMA――ベンゟキノン系詊料に
぀いおの結果であり、(a)は露光曞き蟌みがな
されおいない詊料に぀いお、(b)は曞き蟌みがなさ
れおいる詊料に぀いおの写真である。 第図は、本発明に係るポリビニルシンナミリ
デンアセテヌト―゚リスロシン系詊料に぀いおの
同様の結果である。 (B) 前蚘詊料を甚いお、第図に瀺す劂き方法
で回折栌子の䜜成を行぀た。曞き蟌みはAr+ã‚€
オンレヌザ波長514.5nmの光束干枉法
5mW×、入射角±6゜で行い、露光時間は
60secであ぀た。 かくしお蚘録された詊料を甚い、第図〜に
瀺す劂き方法で読み出しを行぀た。読み出しは
He―Neレヌザ波長632.8nmで回折栌子に察
しブラツグ角で入射した。次光盎進光及び
次回折光をスクリヌン䞊にう぀し、撮圱した。
第図はPMMA――ベンゟキノン系詊料に぀
いお、第図はポリビニルシンナミリデンアセテ
ヌト―゚リスロシン系詊料に぀いおの撮圱結果で
ある。いずれも、巊偎が次光、右偎が次回折
光である。
[Formula]) is preferably used, and cinnamylideneacetyl group, α-cyanocinnamylideneacetyl group and cinnamylidenepyruvyl group are particularly preferably used. Examples of the backbone polymer of the photosensitive polymer in the present invention, that is, the polymer to which the group represented by the formula [] is bonded include polyvinyl alcohol, phenoxy resin, polyvinylphenol, polyvinylbenzyl alcohol, polyhydroxyethyl vinyl ether, polyhydroxyethyl It is a polymer having a hydroxyl group such as (meth)acrylate or polyhydroxypropyl (meth)acrylate. Suitable polymers include polyvinyl alcohol, phenoxy resin, polyhydroxyethyl vinyl ether, and the like. Of course, the cinnamylidene group represented by the above formula [] in the side chain is bonded to the hydroxyl group of the backbone polymer through an ester bond. Such photosensitive polymers can be produced industrially by dehydrochlorination reaction of the corresponding active derivatives of cinnamylidene acetic acids or cinnamylidene pyruvic acids, such as acid chloride, and the backbone polymer in pyridine, or by Schotten-Baumann reaction. is possible. It is also possible to obtain the monomer by introducing a side chain group represented by the above formula [] into the monomer in advance and then polymerizing it by a radical polymerization method or a cationic polymerization method. In principle, the phase-type optical recording material of the present invention is one in which the above-mentioned polymer is laminated on a substrate as a refractive index distribution recording layer, but of course, in a special form, only the above-mentioned polymer itself is used without using a substrate. It is also possible. The refractive index distribution recording layer can be made of only the above polymer, but a sensitizer may be added for the purpose of improving sensitivity or expanding the sensitive wavelength range to the long wavelength visible laser range. preferable. Such sensitizers include acridone sensitizers such as N-phenylthioacridone and N-phenyl-3-nitrothioacridone; xanthene dyes such as rhodamine B, erythrosin, and eosin; thiomihirazketone, Michler's ketones such as Michler's ketone; 2,4,6-triphenylpyrylium perchlorate, 4-anisyl-
2,6-biphenylpyrylium perchlorate,
4-(4-amyloxyphenyl)-2,6-bisanisylpyrylium perchlorate, 4-(4-
pyrylium salts such as amyloxyphenyl)-2,6-bisanisylthiapyrylium perchlorate;
In addition, rose bengal, 9,10-phenanthroquinone, 5-nitroacenaphthene, benzanthracene and the like are preferably used. Among these, N-phenylthioacridone, rose bengal, erythrosin, eosin, benzanthracene, 4-(4-amyloxyphenyl)-2,6-bisanisylpi Particularly preferred are lylium perchlorate, 4-(4-amyloxyphenyl)-2,6-bisanisylthiapyrylium, and perchlorate. Of course, these may be used alone or in combination. The amount of sensitizer used depends on the purpose of sensitization, compatibility with the photosensitive polymer, and solubility in the solvent used when forming a film using a solvent. 0.01% by weight for combined
It is used in a range of 20% by weight, preferably 0.1% by weight to 15% by weight. If it is less than that, the sensitizer will not be effective and its addition will be meaningless, and if it is more than that, the sensitizer will precipitate, causing undesirable scattering, or absorption in the surface layer will prevent light from reaching the interior. Undesirable. The substrate on which the above materials are laminated is preferably an organic or inorganic film, sheet, or plate substrate, such as an organic polymer film, sheet, or glass plate, and a transparent substrate is preferable for holographic applications. preferable. The thickness of the refractive index distribution recording layer varies depending on the purpose of use, but it is required to be 0.01 ÎŒm or more in order to obtain an effective phase change as a phase-type optical recording material, and to further increase the S/N ratio during readout. The film thickness is preferably 1 ÎŒm or more. There is no particular upper limit to the film thickness, but generally about 1 mm is sufficient. As for the lamination method of such a refractive index distribution recording layer, any conventionally known lamination method may be selected and adopted as appropriate; for example, the material may be dissolved in a suitable solvent, applied onto a substrate, and the solvent removed by drying. This can be easily achieved. The solvent used is not particularly limited as long as it dissolves the polyvinyl cinnamylidene acetate and the sensitizer added if necessary. High-boiling polar solvents such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone, hexamethylphoforamide, and tetramethylurea, cyclohexanone,
Ketones such as methyl ethyl ketone and methyl isobutyl ketone, ethers such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, tetrahydrofuran, and dioxane,
and mixtures thereof are preferred. The coating method and drying conditions are not particularly limited. The novel phase-forming optical recording material of the present invention causes a refractive index change of about 1/1000 when optical information is written.
This change is a sufficient property to store information in the form of a phase change. Surprisingly, in the optical recording material of the present invention, almost no increase in scattering noise is observed even when optical information is written. This characteristic indicates that it has an excellent signal-to-noise ratio (S/N) as a phase-type optical recording material. Considering the fact that the polymethyl methacrylate material sensitized with p-benzoquinone exhibits a decrease in S/N due to a large increase in scattering noise as the exposure amount increases, it is effective as a phase forming material for the optical recording material of the present invention. The gender is obvious. It is thought that the reaction that occurs when optical information is written is due to light dimerization, and that the above characteristics are obtained because distortion in the medium that causes scattering noise is less likely to occur. This characteristic suggests that an extremely excellent S/N ratio can be obtained when the multiplicity of the volume hologram using the information capacity in the thickness direction of the medium is increased. The phase-forming optical recording material of the present invention exhibits excellent properties for use in general optical memories, hologram displays, hologram interference measurements, and the like. The optical signal is provided in bit, high bit or holographic form. The novel phase recording material of the present invention has sensitivity in the wavelength range from ultraviolet to visible. In particular, depending on the combination with a sensitizer, it has high sensitivity to light of 600 mΌ or less. Sensitive to various lasers such as dye lasers, N2 lasers, Kr ion lasers, He-Cd lasers, Ar ion lasers, He-Ne lasers, harmonics of Nd glass lasers, and Rupee lasers, especially Kr ion lasers and Ar ion lasers. By using an etalon such as a laser, it has high sensitivity to laser light, which is suitable for storing holographic information. For example, by combining with an appropriate sensitizer, the 514 mΌ light of an Ar ion laser can be
It has more than 10 times the sensitivity of polymethyl methacrylate sensitized with p-benzoquinone. As described above, the phase-type optical recording material described in detail can cause a crosslinking reaction depending on the irradiation intensity by irradiating the refractive index distribution recording layer with laser light, regardless of the presence or absence of a substrate. , thereby making it possible to obtain a phase-type optical recording medium having a distribution in refractive index. Polycinnamylidene acetate itself is used, for example, in photoresists, and it is known that it crosslinks when irradiated with light. It was not known that the refractive index could change enough to form a body.
Furthermore, since the phase-type optical recording medium of the present invention uses a specific crosslinked polymer, it is characterized by low noise during reading. For example, as can be understood from FIGS. 3 to 6 of the accompanying drawings, the phase-type optical recording medium of the present invention has a sharper readout compared to the polymethyl methacrylate-based phase-type optical recording medium. Although it is difficult to clearly specify the structure of the crosslinking reaction caused by laser irradiation of the polymer constituting the phase-type optical recording material of the present invention, as mentioned above, cinnamylidene represented by the above formula [] It is presumed that the groups undergo a photodimerization reaction and are crosslinked. The phase recorder may be irradiated with an optical signal. Even if the entire surface is irradiated as such post-processing, the initially formed refractive index distribution record will not disappear. The present invention will be further explained below with reference to Examples. Example 1 9.1 parts of erythrosine was added as a dye sensitizer to 100 parts of polyvinyl cinnamylidene acetate corresponding to R 1 =H, R 2 =H in the above formula [].
Dissolve in 1000 parts of dimethylacetamide. The solution was applied onto a 2 mm thick glass plate using a doctor knife to form a film. Drying at 40℃ under 1mmHg vacuum.
I went there for 10 hours. The film thickness was 150 Όm. An Ar ion laser with a wavelength of 514.5 mΌ was incident perpendicularly to the film surface at an incident angle of ±6° using two-beam interferometry to create a phase-type diffraction grating in the film. The Ar ion laser was used with a beam diameter of 2 mm and an output adjusted to 5 mW. For reading, the diffraction efficiency was measured using 632.8 mΌ light from a He--Ne laser, which was incident at a black angle. The beam diameter was 0.8 mm and the output was adjusted to 0.05 mW. By irradiation with an exposure dose of 100mJ/ cm2 , 1%,
A diffraction efficiency of 5% was obtained at an exposure dose of 500 mJ/cm 2 and 20% at an exposure dose of 1 J/cm 2 . Although the exposure amount was further increased to 250 J/cm 2 , no increase in scattering noise was observed. Example 2 In the above formula [], 100 parts of polyvinyl cinnamylidene acetate corresponding to R 1 = H, R 2 = H and 5 parts of erythrosine as a dye sensitizer were added to 1000 parts.
of dimethylformamide. The solution was applied using a doctor knife onto a biaxially stretched polyethylene terephthalate film having a thickness of 75 ÎŒm.
Drying at 100℃ for 30 minutes under reduced pressure of 1 mmHg, followed by 40 minutes
℃ for 15 hours. The film thickness was 50 ÎŒm. A diffraction grating was written on the film in the same manner as in Example 1, and the diffraction efficiency was measured. A diffraction efficiency of 1% was obtained at an exposure dose of 150 mJ/cm 2 and 7% at an exposure dose of 1 J/cm 2 . Example 3 In the above formula [], 100 parts of polyvinyl cinnamylidene acetate corresponding to R 1 =H, R 2 =H and 1.1 parts of eosin yellow as a dye sensitizer were added.
Dissolved in 1000 parts of dimethylacetamide. The solution was applied onto a 2 mm thick glass plate using a doctor knife to form a film. Drying at 100℃30 under a reduced pressure of 1mmHg
The temperature was then maintained at 40°C for 10 hours. Film thickness is 400Όm
It was hot. Using a Kr ion laser with a wavelength of 530.9 mΌ, the resolution pattern of the photograph was recorded as a Raunhofer-shaped hologram. The diffraction efficiency was 1%. Next, the reference beam was shifted by 1° and 20 multiplexed holograms were recorded in the film. Even with this multiplexing, no increase in scattering noise was observed. Example 4 In the above formula [], 100 parts of polyvinyl (α-cyano-cinnamylidene acetate) corresponding to R 1 =CN, R 2 =H and 4-(4-amyloxyphenyl)-2,6- 8 parts of bisanisylthiapyrylium perchlorate were dissolved in 1000 parts by weight of dimethylacetamide. Film formation and drying were performed in the same manner as in Example 1. The film thickness was 100 Όm. A diffraction grating was prepared using the same method as in Example 1, and the diffraction efficiency was measured. As a result, a diffraction efficiency of 1% at 90 mJ/cm 2 and 25% at 2.5 J/cm 2 was obtained. Example 5 In the above formula [], 100 parts of polyvinyl (α-methyl-cinnamylidene acetate) corresponding to R 1 =CH 3 , R 2 =H and 8 parts of N-phenylthioacridone were added to 1000 parts of dimethylacetamide. Dissolved. Film formation and drying were performed in the same manner as in Example 1.
The film thickness was 80 ÎŒm. A phase-type diffraction grating was prepared in the same manner as in Example 1, and the diffraction efficiency was measured. As a result, a diffraction efficiency of 1% at 250 mJ/cm 2 and 7% at 2.5 J/cm 2 was obtained. Example 6 The backbone polymer shown in the following formula was composed of 100 parts of a photosensitive polymer in which a cinnamylidene pyribyl group was introduced into the hydroxyl group of a phenoxy resin obtained from bisphenol-A diglycidyl ether and 4-(4-acyloxyphenyl ether). A film was formed from 10 parts of enyl)-2,6-bisanisylthiapyrylium perchlorate in accordance with the method of Example 1. The film thickness was 100 ÎŒm. Using this material, a phase-type diffraction grating was created in the same manner as in Example 1, and the diffraction efficiency was measured.
A diffraction efficiency of 1% at 400 mJ/cm 2 and 7% at 1 J/cm 2 was obtained. Example 7 A coating film of 100 parts of a pinyloxyethyl, α-cyanocinnamylidene acetate polymer represented by the following formula and 10 parts of thiomihirazketone was prepared according to the method of Example 1. The film thickness was 100 Όm. A phase-type diffraction grating was created using this material in the same manner as in Example 1, and the diffraction efficiency was measured.
Diffraction efficiencies of 0.7% at 400 mJ/cm 2 and 6% at 1 J/cm 2 were obtained. Example 8 A phase type optical recording material was prepared in which a 100 ÎŒm film of polyvinylcinnamylidene acetate-erythrosine and a 200 ÎŒm film of PMMA-p-benzoquinone were respectively provided on glass plates. (A) Using these, writing was performed by uniform exposure as shown in FIG. 1a. Writing is Ar +
Ion laser (uses 10mW light with a wavelength of 514.5nm, beam diameter is 2mm, and is approximately 1.5° from the axis perpendicular to the sample)
It was incident at an angle. Exposure time was 300 seconds. Thus, using the written sample, the first
As shown in Figure b, a He-Ne laser (wavelength
632.8 nm) was incident perpendicularly to the sample, readout was performed, and a photograph was taken. The beam diameter is 0.8mm.
On the other hand, a sample that had not been exposed or written with the Ar + ion laser was similarly irradiated with the He--Ne laser and photographed. Figure 3 shows the results for PMMA-p-benzoquinone samples, with (a) being a photograph of a sample that has not been exposed (written), and (b) being a photograph of a sample that has been written. FIG. 4 shows similar results for polyvinylcinnamylidene acetate-erythrosine based samples according to the present invention. (B) Using the sample described above, a diffraction grating was prepared by the method shown in FIG. 2a. Writing is performed using two-beam interferometry (5 mW x 2, incident angle ±6°) using an Ar + ion laser (wavelength 514.5 nm), and the exposure time is
It was hot in 60 seconds. Using the thus recorded sample, reading was carried out in the manner shown in FIG. 2b. Reading is
A He--Ne laser (wavelength: 632.8 nm) was incident on the diffraction grating at a Bragg angle. The 0th order light (directly traveling light) and the 1st order diffracted light were projected onto a screen and photographed.
FIG. 5 shows the photographic results of a PMMA-p-benzoquinone-based sample, and FIG. 6 shows the photographic results of a polyvinylcinnamylidene acetate-erythrosine-based sample. In both cases, the left side is the 0th-order light, and the right side is the 1st-order diffracted light.

【図面の簡単な説明】[Brief explanation of drawings]

第図は均䞀露光・曞き蟌み及びその読み出し
の光孊系を瀺し、第図は回折栌子䜜成ずその読
み出しのための光孊系を瀺すものである。第図
〜第図は、PMMA――ベンゟキノン系及び
ポリシンナミリデンアセテヌト―゚リスロシン系
の䜍盞型光蚘録材料に䜍盞型光蚘録を行い屈折率
分垃を生起せしめた材料の組織埮现構造を瀺
すものであ぀お、それを均䞀露光・読み出し、ホ
ログラフむツクな回折栌子読み出しで衚わしたも
のである。第図はPMMA――ベンゟキノン
系の、第図はポリシンナミリデンアセテヌト―
゚リスロシン系の均䞀露光・読み出しの図であ
る。第図はPMMA――ベンゟキノン系の回
折栌子の読み出し図、第図はポリシンナミリデ
ンアセテヌト―゚リスロシン系の回折栌子の読み
出し図である。
FIG. 1 shows an optical system for uniform exposure/writing and reading thereof, and FIG. 2 shows an optical system for producing a diffraction grating and reading it. Figures 3 to 6 show the microstructures (microstructures) of PMMA-p-benzoquinone-based and polycinnamylidene acetate-erythrosine-based phase-based optical recording materials that have been subjected to phase-based optical recording to produce a refractive index distribution. ), which is expressed by uniform exposure and readout and holographic diffraction grating readout. Figure 3 shows PMMA - p-benzoquinone type, Figure 4 shows polycinnamylidene acetate -
FIG. 3 is a diagram of uniform exposure and readout of erythrosine. FIG. 5 is a read-out diagram of a PMMA-p-benzoquinone-based diffraction grating, and FIG. 6 is a read-out diagram of a polycinnamylidene acetate-erythrosine-based diffraction grating.

Claims (1)

【特蚱請求の範囲】  䞋蚘䞀般匏 䜆し、匏䞭R1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基を衚わし、
R2は氎玠原子、メチル基たたはプニル基を衚
わす。は【匏】又は【匏】で衚わされ る基を衚わす。 で衚わされるシンナミリデン基を偎鎖に有する感
光性重合䜓が屈折率分垃蚘録局ずしお基䜓䞊に積
局されおなる䜍盞型光蚘録材料。  䞋蚘䞀般匏 䜆し、匏䞭R1は氎玠原子、メチル基、プ
ニル基、プノキシ基又はシアノ基を衚わし、
R2は氎玠原子、メチル基たたはプニル基を衚
わす。は【匏】又は【匏】で衚わされ る基を衚わす。 で衚わされるシンナミリデン基を偎鎖に有する重
合䜓を屈折率分垃蚘録局ずしお甚い、圓該局をレ
ヌザヌ照射しお架橋せしめ照射レヌザヌ匷床分垃
に察応した屈折率分垃を蚘録するこずを特城ずす
る䜍盞型光蚘録䜓の補造方法。
[Claims] 1. The following general formula [] [However, in the formula, R 1 represents a hydrogen atom, a methyl group, a phenyl group, a phenoxy group or a cyano group,
R 2 represents a hydrogen atom, a methyl group or a phenyl group. X represents [Formula] or a group represented by [Formula]. ] A phase type optical recording material comprising a photosensitive polymer having a cinnamylidene group in its side chain, which is laminated on a substrate as a refractive index distribution recording layer. 2 General formula below [] [However, in the formula, R 1 represents a hydrogen atom, a methyl group, a phenyl group, a phenoxy group or a cyano group,
R 2 represents a hydrogen atom, a methyl group or a phenyl group. X represents [Formula] or a group represented by [Formula]. ] A phase characterized in that a polymer having a cinnamylidene group represented by the following in its side chain is used as a refractive index distribution recording layer, and the layer is crosslinked by laser irradiation to record a refractive index distribution corresponding to the irradiated laser intensity distribution. A method for manufacturing a molded optical recording medium.
JP8387280A 1980-06-23 1980-06-23 Phase type optical recording material and phase type optical recording body Granted JPS5710135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8387280A JPS5710135A (en) 1980-06-23 1980-06-23 Phase type optical recording material and phase type optical recording body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8387280A JPS5710135A (en) 1980-06-23 1980-06-23 Phase type optical recording material and phase type optical recording body

Publications (2)

Publication Number Publication Date
JPS5710135A JPS5710135A (en) 1982-01-19
JPH0219942B2 true JPH0219942B2 (en) 1990-05-07

Family

ID=13814740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8387280A Granted JPS5710135A (en) 1980-06-23 1980-06-23 Phase type optical recording material and phase type optical recording body

Country Status (1)

Country Link
JP (1) JPS5710135A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04193693A (en) * 1990-11-27 1992-07-13 Honda Motor Co Ltd Front fork

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59218440A (en) * 1983-05-25 1984-12-08 Agency Of Ind Science & Technol Photosensitive resin for plate-making
CN103773057B (en) * 2014-01-08 2015-07-29 西安瑞联近代电子材料有限莣任公叞 A kind of new type solar energy dye sensitization material, intermediate and its preparation method and application

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
APPLIED OPTICS=1974 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04193693A (en) * 1990-11-27 1992-07-13 Honda Motor Co Ltd Front fork

Also Published As

Publication number Publication date
JPS5710135A (en) 1982-01-19

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