JPH02201899A - Bending electromagnet for charged particle devices - Google Patents
Bending electromagnet for charged particle devicesInfo
- Publication number
- JPH02201899A JPH02201899A JP1969889A JP1969889A JPH02201899A JP H02201899 A JPH02201899 A JP H02201899A JP 1969889 A JP1969889 A JP 1969889A JP 1969889 A JP1969889 A JP 1969889A JP H02201899 A JPH02201899 A JP H02201899A
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- Prior art keywords
- coil
- main
- main coil
- balanced
- magnetic field
- Prior art date
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Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、荷電粒子装置用偏向、t&a石に関し、特
に、主コイルが発生する誤差磁界の補正手段を備^た荷
電粒子装置用偏向電磁石に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a deflection magnet for a charged particle device, and in particular to a deflection electromagnet for a charged particle device that is equipped with means for correcting an error magnetic field generated by a main coil. It is related to.
[従来の技術]
第3図は、例えば、日本化学技術情報センター1984
年9月発行の、ヨシカズ ミャハラ(Yoshikaz
u Miyaharal 、コーリ クカタ(Koji
Takatalおよびテツヤ ナカニシ(Tetsuy
a Naka−nishi)によるl5SPの技術報告
(TechnicalReportof l5SPIN
o、21. rシンクロトロン放射のための超f!14
レーストラック電子蓄積リングおよび共存インジェクタ
・マイクロトロン(SuperconductingR
acetrack Electron Strag
e Ring and Coexistent
Tnject、or Microtron for 5
ynchrotron RadiaLionlJに記載
された従来の荷電粒子装置を示し、図において、(1)
は荷電粒子をM晴する荷電粒子装置としての蓄積リング
、矢印(2)は荷電粒子(例えば電子)を蓄積リング(
1)内に導くための入射部ビームラインである。超電導
の偏向電磁石(3)は荷電粒子を偏向して平衡軌道(4
)を形成するためおものであり、後述する偏向コイルの
組合わせからなっている。[Prior art] Figure 3 shows, for example, the Japan Chemical Technology Information Center 1984
Yoshikaz Myahara, published in September.
u Miyaharal, Koji Kukata
Takatal and Tetsuya Nakanishi
Technical Report of l5SPIN by Naka-nishi
o, 21. Super f! for r synchrotron radiation! 14
Racetrack Electron Storage Ring and Coexisting Injector Microtron (Superconducting®
acetrack Electron Strag
e Ring and Coexistent
Tnject, or Microtron for 5
The conventional charged particle device described in ynchrotron RadiaLionlJ is shown, and in the figure (1)
indicates a storage ring as a charged particle device that removes charged particles, and arrow (2) indicates a storage ring that stores charged particles (e.g. electrons).
1) An entrance beam line for guiding the beam into the center. A superconducting bending electromagnet (3) deflects charged particles into an equilibrium orbit (4).
), and consists of a combination of deflection coils, which will be described later.
矢印(5)は荷電粒子を陥向電磁石(3)で偏向する際
に発生する放射光を取出すための放射光ビームラインで
ある。この放射光は、シンクロトロン放射光、または5
OR(Synchrotron 0rbitalRad
iaLion)と呼ばれ、外部に取出されてすνグラフ
ィなどに利用される2一般に、放射光ビームライン(5
)は、装置の利用効率を高めるため、偏向電磁石(3)
に沿って多数設けられているが。The arrow (5) is a synchrotron radiation beam line for extracting the synchrotron radiation generated when charged particles are deflected by the recessed electromagnet (3). This synchrotron radiation is synchrotron radiation, or
OR(Synchrotron 0rbitalRad
It is called a synchrotron radiation beamline (IALion) and is taken out to the outside and used for
) is a bending electromagnet (3) in order to increase the utilization efficiency of the device.
There are many locations along the way.
ここでは各偏向電磁石(3)にそれぞれ1本のみを示し
、他は省略している。Here, only one bending electromagnet (3) is shown, and the others are omitted.
V3極′R磁石(6)は蓄積リング(1)内の荷電粒子
を集束させる。Am電磁石(7)は偏向電磁石(3)の
非線形磁場またはクロマティシティを補正する。高周波
空洞(8)は放射光の放出にょ浴
る荷電粒子の工髪1ルギ損失を補い、所定のエネルギに
加速する。ギッヵ(9)はr′R電粒子粒子射ビームラ
イン(2)から入射させる際に平衡軌道(4)をずらせ
て入射を助けるためのものである。真空ドーナツ(10
)は荷電粒子の通路となる。The V3 pole'R magnet (6) focuses the charged particles in the storage ring (1). The Am electromagnet (7) corrects the nonlinear magnetic field or chromaticity of the bending electromagnet (3). The radio frequency cavity (8) compensates for the loss of the charged particles exposed to the emission of synchrotron radiation and accelerates them to a predetermined energy. Gicca (9) is for assisting the injection by shifting the equilibrium trajectory (4) when the beam is introduced from the r'R electron beam beam line (2). Vacuum donuts (10
) becomes a path for charged particles.
インフレクタ(11)は荷°電粒子を入射部ビームライ
ン(2)から蓄積リング(1)内に入射させるためのも
のであり、真空ポンプ(12)は真空ドーナツ(10)
内を高真空に保つ。以上の各成分は平衡軌道(4)に沿
って配設されている。The inflector (11) is for injecting charged particles from the entrance beam line (2) into the storage ring (1), and the vacuum pump (12) is for injecting charged particles into the storage ring (1).
Maintain a high vacuum inside. Each of the above components is arranged along the equilibrium trajectory (4).
なお、真空ドーナツ(10)は機械的強度が高く。Note that the vacuum donut (10) has high mechanical strength.
かつ、ベーキングが容易なステンレス材で形成さエネル
ギを失いその寿命が短くなることを防止している。In addition, it is made of stainless steel material that can be easily baked to prevent energy loss and shorten its lifespan.
第4図〜第8図は上記の偏向電磁石(3)を示し、第4
図において、(13)郁よび(14)は偏向電磁石(3
)を形成する1対の超電導の偏向主コイルであり、(1
3)は上皇コイル、(14)は下止コイルで、レースト
ラックコイルを偏向曲率で曲げたバナナ形になっている
。なお、上、下止コイル+131. (141は高起磁
力を有しているので、鉄心を用いない空心構造となって
いる。矢印m H、m zは上、下止コイル(131,
f14)にそれぞれ流れる電流の方向、矢印Sは平衡軌
i!(4)上の電子ビームの進行方向を示している。Figures 4 to 8 show the above bending electromagnet (3), and the fourth
In the figure, (13) and (14) are bending electromagnets (3).
) is a pair of superconducting deflection main coils forming (1
3) is the Emperor coil, and (14) is the bottom stop coil, which is shaped like a banana by bending the racetrack coil with the deflection curvature. In addition, the upper and lower stop coils +131. (Since 141 has a high magnetomotive force, it has an air-core structure without using an iron core. Arrows m H and m z indicate upper and lower stop coils (131,
f14), the arrow S indicates the direction of the current flowing in each direction, and the arrow S indicates the equilibrium trajectory i! (4) Shows the traveling direction of the upper electron beam.
また、第5図および第6図から明らかなように、平衡軌
道(4)は、横座fiRθ(Z=01のP。Furthermore, as is clear from FIGS. 5 and 6, the equilibrium orbit (4) is horizontal fiRθ (P with Z=01).
平面上に半径−の半円と、この半円の前徨にっながる直
線とで示される。ρ1.ρ瀧は、バナナ形状の上、下止
コイルf131. +141$それぞれ内側半径と外側
半径である。It is shown on a plane as a semicircle with a radius of - and a straight line leading to the front end of this semicircle. ρ1. ρtaki is a banana-shaped upper and lower stop coil f131. +141$ are the inner radius and outer radius, respectively.
さらに、第7図は、主コイルflll 、 口4)、主
コイルが発生する」差磁界を発生する四極シムコイル(
15)、六(シムコイル(2o)の形状を示し、flG
l、 H71は四極シムコイル(15)のうち、」二
側コイル巻線、 +181. +191は下側コイル
巻線を示す。Furthermore, FIG.
15), 6 (shows the shape of shim coil (2o), flG
1, H71 is the second side coil winding of the quadrupole shim coil (15), +181. +191 indicates the lower coil winding.
(21)〜(23)は大極シムコイル(2o)のうち、
上側コイル巻線、 1241〜(26)は下側コイル巻
線を示す。(21) to (23) are among the large shim coils (2o),
Upper coil winding, 1241 to (26) indicate lower coil winding.
第8図は主コイルf131. +141に四極シムコ
イル(I5)を組み込んだ図である。六陽シムコイルは
図が複雑になるため省略した。第8図(al に示す1
13a+ は主コイル巻線のうら主コイル巻線端部を示
す。FIG. 8 shows the main coil f131. It is a diagram in which a quadrupole shim coil (I5) is installed in +141. The Rokuyo shim coil has been omitted because it complicates the diagram. Figure 8 (1 shown in al.
13a+ indicates the end of the main coil winding behind the main coil winding.
以上の構成により、入射面ビームライン(2)から蓄積
リング(1)内に入射された荷電粒子は、インフレクタ
(111によりパルス的に偏向され、かつ、キッカ(9
)により軌道がずらされる。従って7荷電粒子は、最初
に平衡軌道(4)になる、この平衡軌道(4)は、偏向
電磁石(3)および四極電磁石(6)の配置により決定
される。With the above configuration, charged particles incident into the storage ring (1) from the entrance plane beam line (2) are deflected in a pulsed manner by the inflector (111) and are deflected in a pulsed manner by the inflector (111).
), the trajectory is shifted. Therefore, the 7-charged particle initially finds itself in an equilibrium orbit (4), which is determined by the arrangement of the bending magnet (3) and the quadrupole magnet (6).
なお、ml、m、方向の電流により、上、下止コイルf
131. +141で発生する主磁場は−zf−y1
方向となり、平衡軌道(4)に流れる電流は、電子ビー
ム方向Sとは逆方向となる。従って1、F、下止コイル
f131.1141間を通過する荷M拉子、すなわち電
子ビームは、フレミングの左手の法則により−R1゜
の方向にtFii力を受け、これにより弔径−の曲率で
曲げられる。この平衡軌道(4)の半径−は以下の0式
で惇えられる。Note that due to the current in the ml and m directions, the upper and lower stop coils f
131. The main magnetic field generated at +141 is -zf-y1
The current flowing in the equilibrium orbit (4) is in the opposite direction to the electron beam direction S. Therefore, the load M, that is, the electron beam, passing between 1, F, and the bottom coil f131. Can be bent. The radius - of this equilibrium orbit (4) is determined by the following equation 0.
P。P.
一=P/(e・By l ・・■
ただし、P・電子の運動麗
e:電子の電荷
By二上、下主コイルf131. +141のy軸方向
における発生磁界
ここで、y軸は、平衡軌道(4)に関するZ軸と平行な
軸であり、X軸は平衡軌道(4)に関する曲座標の半径
Rと同方向の軸である。1=P/(e・By l ・・■ However, P・Electron motion Rei e: Electron charge By 2 Upper and lower main coils f131. +141 Generated magnetic field in the y-axis direction Here, the y-axis is the equilibrium It is an axis parallel to the Z axis regarding the orbit (4), and the X axis is an axis in the same direction as the radius R of the curved coordinate regarding the equilibrium orbit (4).
一方、高周波空洞(8)は荷電粒子を加速し。On the other hand, the high frequency cavity (8) accelerates charged particles.
大極@磁石(7)は、偏向tM1石(3)の半径方向の
1ifl場の不均一を補正したり、クロマティシティの
補正を行う。The large pole@magnet (7) corrects the non-uniformity of the 1ifl field in the radial direction of the deflection tM1 stone (3) and corrects chromaticity.
こうして平衡軌道(4)に沿って周回する荷電粒子は、
偏向電磁石(3)の磁界により偏向を受けると、制動放
射による電磁波を放射光とし、放射光ビームライン(5
)から平衡軌道(4)の接線方向に放射される。In this way, the charged particles orbiting along the equilibrium orbit (4) are
When deflected by the magnetic field of the bending electromagnet (3), the electromagnetic waves due to bremsstrahlung radiation become synchrotron radiation, and the synchrotron beam line (5)
) in the tangential direction of the equilibrium trajectory (4).
ところで、電子ビームは平面軌道(4)の周囲にベータ
トロン振動をしているので、一般に、電子ビームの進行
方向Sに直交する方向(主としてR方向、すなわちX軸
方向)に関し、中心軌道の周囲に数(4以上の範囲にわ
たってio−’へlO程度の均一な磁界分布(良磁界領
域)が必要となる。超電導偏向主コイルでなるし、下止
コイル目3)、(目)の磁界分布が不均一の場合、電子
ビームの平衡軌道(4)は上、下主コイル(131,[
141の中心からずれるが、このずれ量が所定値より太
き(なると、電子ビームが真空ドーナツ(10)当たり
電子ビームが失われてしまうことになる。この均一な磁
界分布はビーム進行方向に対しても必要である。By the way, since the electron beam is undergoing betatron oscillation around the planar orbit (4), generally speaking, in the direction perpendicular to the traveling direction S of the electron beam (mainly the R direction, that is, the X-axis direction), the oscillation around the central orbit is A uniform magnetic field distribution (good magnetic field region) of the order of io-' to lO is required over a range of 4 or more.It consists of the superconducting deflection main coil, and the magnetic field distribution of the bottom coil (3) and (3). is non-uniform, the equilibrium trajectory (4) of the electron beam is the upper and lower main coils (131, [
141, but this deviation is larger than a predetermined value (if this happens, the electron beam will hit the vacuum donut (10) and be lost. This uniform magnetic field distribution is It is also necessary.
そこで、均一な磁界分布を得るために、主コイルの作る
1次成分、2次成分等の誤差磁界を補正するためのシム
コイルが使用される。第7図において、 +151は四
極シムコイルであり、X(またはR)の増加とともに上
記1次成分に比例して増加するY軸方向の磁界を発生す
る。 +201は内極シムコイルであり、X(またはR
〕の増加とともに上記2次成分に比例して増加するY軸
方向の磁界を発生する。Therefore, in order to obtain a uniform magnetic field distribution, a shim coil is used to correct error magnetic fields such as primary components and secondary components produced by the main coil. In FIG. 7, +151 is a quadrupole shim coil, which generates a magnetic field in the Y-axis direction that increases in proportion to the first-order component as X (or R) increases. +201 is the inner shim coil, and
] is generated in the Y-axis direction, which increases in proportion to the second-order component.
第8図は主コイル[131,口4)に四極シムコイル(
15)を組込んだ態様を示し、コイルのスペースを小さ
くするために、シムコイルを主コイルの間、すなわち第
8図fbl に斜線で示す部位に配置することが望まし
い、内極シムコイル(20)は第8図で省略したか、且
コイルf131. +141の発生する1次、2次成
分を打消すように、各シムコイルの出力Un界、すなわ
ちシムコイル電流値を決めてやることにより、均一な磁
界分布を得ることが可能となる。Figure 8 shows the main coil [131, port 4] and the quadrupole shim coil (
15), and in order to reduce the coil space, it is desirable to arrange the shim coil between the main coils, that is, in the area shown by diagonal lines in FIG. It is omitted in FIG. 8, and the coil f131. By determining the output Un field of each shim coil, that is, the shim coil current value, so as to cancel the generated primary and secondary components of +141, it becomes possible to obtain a uniform magnetic field distribution.
ところで、ビームの進行方向をS方向とし、第8図に示
す主コイル+1:11. +14)および四極シムコ
イル(15)の、平行軌道上での1次成分のS方向分布
をOに関して示したものが第9図fal fblである
。この図の例では、θ=0において主コイルと四極シム
コイルの1次成分が同じになるように四極シムコイル(
15)の電流値を決めた。同図fatに示すように、θ
=0°からθ=01の範囲では、主コイルの1次成分は
ほぼ一定の値であるが、θ=01〜90°の範囲では、
第8図の主コイル4部(i3a)の作る磁界が第8図i
al に示すO=0°〜θ1の範囲の主コイルの作る磁
界と異なるため、1次成分は一定でなくなる。第9図f
alの例では、θ=01〜90′の間に大きな負の1次
成分をもつ、一方、第9図fbl に示す四極シムコイ
ル(+5)のS方向分布では、θ=0°〜θ、の範囲で
ほぼ一定の1次成分をもつが、0201以上になると四
極シムコイル(15)は存在しないため、四極シムコイ
ル(15)の出力磁界、すなわち1次成分は零になる。By the way, assuming that the traveling direction of the beam is the S direction, the main coil +1:11. +14) and the quadrupole shim coil (15), the S-direction distribution of the first-order component on parallel orbits is shown with respect to O in Fig. 9 fal fbl. In the example in this figure, the quadrupole shim coil (
15) was determined. As shown in the figure fat, θ
In the range of = 0° to θ = 01, the primary component of the main coil is almost a constant value, but in the range of θ = 01 to 90°,
The magnetic field created by the main coil 4 part (i3a) in Fig. 8 is shown in Fig. 8 i.
Since it is different from the magnetic field generated by the main coil in the range O=0° to θ1 shown in al, the first-order component is no longer constant. Figure 9 f
In the example of al, there is a large negative first-order component between θ=01 and 90', while in the S direction distribution of the quadrupole shim coil (+5) shown in Fig. 9fbl, there is a large negative first-order component between θ=0° and θ. Although it has a nearly constant first-order component over a range of 0201 or more, since the quadrupole shim coil (15) does not exist, the output magnetic field of the quadrupole shim coil (15), that is, the first-order component, becomes zero.
したがって、θ=01〜90°の範囲では、1次成分の
補正は全くできず、大きな誤差磁界が依然として存在す
ることになる。Therefore, in the range of θ=01 to 90°, the first-order component cannot be corrected at all, and a large error magnetic field still exists.
内極シムコイルについても全く同様に考えることができ
る。The inner shim coil can be considered in exactly the same way.
[発明が解決しようとする課題1
従来の荷電粒子装置用偏向電磁石は以上のように構成さ
れているので、主コイル端部に大きな誤差磁界成分が発
生するという問題慨があった。[Problem to be Solved by the Invention 1] Since the conventional bending electromagnet for a charged particle device is configured as described above, there has been a problem in that a large error magnetic field component is generated at the end of the main coil.
この発明は上記のような問題点を解消するためになされ
たもので、主コイル端部に均一な&a磁界分布発生でき
る荷電粒子装置用偏向電磁石を得る1:とを目的とする
。This invention has been made to solve the above-mentioned problems, and has the following objects: 1. To obtain a deflecting electromagnet for a charged particle device that can generate a uniform &a magnetic field distribution at the end of a main coil.
[課題を解決するための手段]
この発明に係る荷電粒子装置用偏向電磁石は主コイル巻
線を上下方向に分割し、分割された主コイルのうち平衡
軌道面に近い主コイルの開き角を小さく、平衡軌道面か
ら遠い主コイルの開き角を大きくとることにより、平衡
軌道面から遠い主コイルと平衡軌道面の間に空間を設け
、この空間に端部補正用シムコイルを設置したものであ
る。[Means for Solving the Problems] A bending electromagnet for a charged particle device according to the present invention divides the main coil winding in the vertical direction, and reduces the opening angle of the main coil close to the equilibrium orbital plane among the divided main coils. By increasing the opening angle of the main coil that is far from the balanced raceway surface, a space is created between the main coil that is far from the balanced raceway surface and the balanced raceway surface, and the end correction shim coil is installed in this space.
[作用]
この発明においては、端部補正用シムコイルにより主コ
イル端部が生じる1次成分・2次成分等の誤差磁界成分
を補正する。[Operation] In the present invention, error magnetic field components such as primary components and secondary components generated at the ends of the main coil are corrected by the end correction shim coil.
[実施例]
以下、この発明の一実施例を図について説明する。第1
図において、(4)は平衡軌道、 +271は2分割さ
れた上皇コイル巻線のうち平衡軌道面に近い主コイル巻
線、 (28)は平衡軌道面から遠い主コイル巻線、(
29)は同様に2分割されたT1コイル巻線のうち平衡
軌道面に近い主コイル巻線。[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. 1st
In the figure, (4) is the balanced orbit, +271 is the main coil winding that is closer to the balanced raceway plane among the two divided Emperor coil windings, (28) is the main coil winding that is far from the balanced raceway plane, (
29) is the main coil winding close to the balanced raceway plane among the T1 coil windings that are similarly divided into two.
(30)は平衡軌道面から遠い主コイル巻線である。(30) is the main coil winding far from the balanced raceway plane.
(31)は端部補正用四極シムコイルで、コイル巻線(
32)〜(35)からなっている。(31) is a four-pole shim coil for end correction, and the coil winding (
32) to (35).
以上の構成において、主コイル端部に生じろ誤差磁界成
分を減少させるには、誤差磁界を発生するt要因である
1主コイル端部(2月およびT1コイル端111S 1
281の巻線を分散させることが効果的である。端部巻
線を分散させることにより、端部巻線の作る磁界強度の
絶対値(即ち、これは誤MFa界の強度に比例する)を
減少させることが可能である。ただし、誤差磁界が生じ
る範囲が広がる。In the above configuration, in order to reduce the error magnetic field component generated at the main coil end, the main coil end (February and T1 coil end 111S 1
It is effective to disperse the 281 windings. By dispersing the end windings, it is possible to reduce the absolute value of the magnetic field strength produced by the end windings (ie, this is proportional to the strength of the false MFa field). However, the range in which the error magnetic field occurs increases.
具体的には、第1図に示すように、主コイルを上下方向
に分割しく図の例では2分割)、平衡軌道面に近い主コ
イル127) (291の開き角θ1を小さく取り、平
衡軌道面から遠い主コイル+281 +301の開き角
θ、を大き(とることにより可能である。このタイプの
主コイルの平衡軌道(4)上の1次成分S方向分布は第
2図falのようになる。第9図talの従来のものの
1次成分S方向分布と比較すると、θ=θ、〜90°間
の負方向の1次成分の絶対値が減少していることがわか
る。ただし、範囲は広がっている。ところで、主コイル
端部での1次成分をさらに減少させるには、端部の誤差
磁界を補正するためのシムコイル(本例では端部補正用
四極シムコイル+311 )を端部に設置することが必
要である。この端部補正用四極シムコイルには、少ない
アンペアターンで大きな出力磁界(大きな1次成分)を
得ることが望まれるが、これにはコイル巻!11 +3
21〜(35)を平衡軌道面に極力近づけることが必要
である。主コイルは小さなアンペアターンで大きな磁界
を得るため、平衡軌道面に最も近い位置に設置されてい
る。ただし、ビームが通る真空ドーナツ(10)等を設
置するために上止コイル下面と平衡軌道との間に、第1
図に示すdだけの間隔がおいている。端部補正用シムコ
イルにおいてもシムコイル巻!ji +321 (33
)下面と平衡軌道面との距離を最小間隔dにすることが
望まれるが、従来は主コイル端部が存在するため8面上
にシムコイル巻線(32)(33)下面を設置できなか
った。しかし、この実施例においては、主コイルを上下
方向に分割し、さらに平衡軌道面に近い主コイル(27
)(29)の開き角を小さくとっているため。Specifically, as shown in Fig. 1, the main coil is divided vertically (in the example shown, it is divided into two parts), and the main coil 127) (291) close to the balanced orbital plane is made small in opening angle θ1, and the balanced orbit is This is possible by increasing the opening angle θ of the main coils +281 +301 that are far from the plane.The distribution of the first-order component S direction on the equilibrium trajectory (4) of this type of main coil is as shown in Figure 2 fal. .Comparing with the conventional linear component S direction distribution in Figure 9, it can be seen that the absolute value of the negative direction primary component between θ=θ and 90° has decreased.However, the range is By the way, in order to further reduce the primary component at the end of the main coil, a shim coil (quadrupole shim coil +311 for end correction in this example) is installed at the end to correct the error magnetic field at the end. It is necessary to obtain a large output magnetic field (large primary component) with a small number of ampere turns for this quadrupole shim coil for end correction, but this requires coil winding!11 +3
21 to (35) must be brought as close to the equilibrium orbital surface as possible. The main coil is placed closest to the balanced raceway to obtain a large magnetic field with a small ampere turn. However, in order to install a vacuum donut (10) etc. through which the beam passes, the first
There is an interval d shown in the figure. Shim coil winding is also used for end correction shim coils! ji +321 (33
) It is desirable to make the distance between the lower surface and the balanced raceway surface the minimum distance d, but in the past, it was not possible to install the lower surface of the shim coil windings (32) and (33) on the 8th surface because of the presence of the main coil end. . However, in this embodiment, the main coil is divided vertically, and the main coil (27
) (29) because the opening angle is small.
第112(b)でわかるように、平拘軌道面から遠い!
主コイル巻線端部下にす態量が生じる。このすき間に端
部補正用四極シムコイル(31)をに設置てきる。、t
52図(b)に、Vq極クシムコイルθ=o”の1次成
分を主コイルのθ=0°の1次成分と等しくなるよう、
四極シムコイルの電流を:A整した場合の四極シムコイ
ル及び端部補正用四極シムコイルの1次成分合計出力の
S方向分布を示す。実際の補正では、第2図(b)に示
す1次成分とは絶対イ直
位置の大きさか回し・て逆の符号を持つ1次成分を主コ
イルに加える。補正後の1次成分を第2図((:)に示
す。@2図(a)に比べ良・ぐ1次成分が補正されてい
ることかわかる。As you can see in No. 112(b), it is far from the flat orbital surface! A residual quantity is generated under the end of the main coil winding. A quadrupole shim coil (31) for edge correction is installed in this gap. ,t
In Fig. 52(b), the first-order component of the Vq pole comb coil θ=o'' is made equal to the first-order component of the main coil at θ=0°.
The S-direction distribution of the total output of the primary components of the quadrupole shim coil and the quadrupole shim coil for end correction when the current of the quadrupole shim coil is set to A is shown. In actual correction, a first-order component having a sign opposite to that of the first-order component shown in FIG. 2(b) is added to the main coil by turning the magnitude of the absolute straight position. The corrected first-order component is shown in Figure 2 ((:). @2 It can be seen that the first-order component has been corrected compared to Figure 2 (a).
なお、上記実施例では主コイルか上下方向に2分割され
た場合について述べたか、主コイルかn分割された場合
においてもよく、同様の効果を奏する。また、上記実施
例では四極シムコイルの例について述べたか、大極シム
コイル巻ル他の高次のシムコイルでもよく、同様の効果
を奏する。さらに、上記実施例では上下方向に分割され
た主コイルのうち平衡軌道面に近い方の主コイルの開き
角をより小さくすると述べたが、逆に平衡軌道面に遠い
方の主コイルの開き角をより小さくすることも可能であ
る。この場合、端部補正用シムコイルは下面軌道面に近
い主コイルの上に端部補正用シムコイルがのることにな
る。そうして、端部補正用シムコイルの出力磁界は多少
減少することになるが、均一磁界を得ることは可能であ
る。また、上記実施例では、コイル線材について特に指
定しなかったが、JTJ材を用いれば簡単に強力な磁界
を発生できる偏向電磁石を得ることが可能である。In the above embodiment, the main coil is divided into two parts in the vertical direction, but the main coil may be divided into n parts, and the same effect can be obtained. Furthermore, in the above embodiments, the four-pole shim coil was used as an example, but a high-order shim coil such as a large-pole shim coil may be used, and similar effects can be obtained. Furthermore, in the above embodiment, it was stated that among the main coils divided in the vertical direction, the opening angle of the main coil that is closer to the balanced raceway surface is made smaller, but conversely, the opening angle of the main coil that is farther from the balanced raceway surface is made smaller. It is also possible to make it smaller. In this case, the end correction shim coil is placed on top of the main coil near the lower raceway surface. In this way, the output magnetic field of the end correction shim coil will decrease somewhat, but it is possible to obtain a uniform magnetic field. Further, although the coil wire material was not specified in the above embodiments, it is possible to easily obtain a bending electromagnet that can generate a strong magnetic field by using JTJ material.
[発明の効果1
以りのように5この発明によれば、主コイルを上下方向
に分割し1分割された主コイルのうち平衡軌道面に近い
主コイルの開き角をより小さ(することにより、芋衡軌
道面から遠い主コイルと平衡軌道面との間に空間を設け
、この空間に端部補正用シムコイルを設置するようにし
たので、端部補正用シムコイルの出力磁界が大きくなり
1.端部にSける主コイルの発生する誤差磁界を容易に
補正することかできる。[Effects of the Invention 1 As described below] 5 According to the present invention, the main coil is divided in the vertical direction, and among the divided main coils, the opening angle of the main coil near the equilibrium raceway surface is made smaller (by Since a space is provided between the main coil far from the balance raceway surface and the balance raceway surface, and the end correction shim coil is installed in this space, the output magnetic field of the end correction shim coil becomes large.1. The error magnetic field generated by the main coil at the end S can be easily corrected.
第1図(a)はこの発明の一実施例の1部平面図、同図
(b) (c)はそれぞれ同図(a)のB−B線および
C−C線に沿う平面による断面図、第213?lは第1
図のものの磁界分布特性線図である。第3図〜第9図は
従来の技術に関するもので、第3図は荷電粒子装置の概
略平面図、第4図は主コイルの斜視図、第5図および第
6図は第4図のものの平面図およ正面図、第7[Aは主
ソイルとシムコーイルを分解して示した斜視図、第8図
は第7図のものの組み立て平面図、第9図は磁界分布特
性線図である。
(3)・・・・偏向電磁石、(4)・・・・平衡軌道、
(I5)・・・・シムコイル、(27)(29)・・・
・上下方向に分割された主コイルのうち平衡軌道面に近
い主コイル、(28)(:1(1)・・・・上下方向に
分割された主コイルのうち7衡軌道面に遠い主コイル、
(311・・・・端部補正用シムコイル。
なお、各図中、同一符号は同−又は相当部分を示す。
代 理
人
四
我
道
照
4 子衝allFIG. 1(a) is a partial plan view of an embodiment of the present invention, and FIGS. 1(b) and 1(c) are cross-sectional views taken along lines B-B and C-C in FIG. 1(a), respectively. , 213th? l is the first
FIG. 2 is a magnetic field distribution characteristic diagram of the one shown in FIG. Figures 3 to 9 relate to the conventional technology; Figure 3 is a schematic plan view of a charged particle device, Figure 4 is a perspective view of the main coil, and Figures 5 and 6 are similar to those in Figure 4. 7A is an exploded perspective view showing the main soil and shimcoil, FIG. 8 is an assembled plan view of the one shown in FIG. 7, and FIG. 9 is a magnetic field distribution characteristic diagram. (3)...Bending electromagnet, (4)...Equilibrium orbit,
(I5)...Shim coil, (27)(29)...
・Of the main coils divided in the vertical direction, the main coil closest to the balanced raceway surface, (28) (: 1 (1)... Among the main coils divided in the vertical direction, the main coil far from the balanced raceway surface ,
(311... Shim coil for end correction. In each figure, the same reference numerals indicate the same or equivalent parts. Agent Shiga Dosho 4 Shiga all
Claims (1)
対の上下主コイルと、これらの主コイルが発生する誤差
磁界成分を補正する端部補正用シムコイルとを備えた荷
電粒子装置用偏向電磁石において、前記主コイルの巻線
を上下方向に分割し、分割された前記主コイルのうち平
衡軌道面に近い前記主コイルの開き角を小さく、前記平
衡軌道面から遠い前記主コイルの開き角を大きくとるこ
とにより、前記平衡軌道面から遠い前記主コイルと前記
平衡軌道面の間に空間を設け、この空間に配設された前
記端部補正用シムコイルを備えてなることを特徴とする
荷電粒子装置用偏向電磁石。1 placed across the equilibrium orbit of charged particles
In a deflecting electromagnet for a charged particle device comprising a pair of upper and lower main coils and an end correction shim coil for correcting error magnetic field components generated by these main coils, the winding of the main coil is divided in the vertical direction, Among the divided main coils, the opening angle of the main coil close to the balanced raceway plane is made small, and the opening angle of the main coil far from the balanced raceway plane is made large, so that the main coil far from the balanced raceway plane and A deflecting electromagnet for a charged particle device, characterized in that a space is provided between the balanced orbital surfaces, and the end correction shim coil is disposed in the space.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1969889A JPH02201899A (en) | 1989-01-31 | 1989-01-31 | Bending electromagnet for charged particle devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1969889A JPH02201899A (en) | 1989-01-31 | 1989-01-31 | Bending electromagnet for charged particle devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02201899A true JPH02201899A (en) | 1990-08-10 |
Family
ID=12006486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1969889A Pending JPH02201899A (en) | 1989-01-31 | 1989-01-31 | Bending electromagnet for charged particle devices |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02201899A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7982416B2 (en) | 2008-04-15 | 2011-07-19 | Mitsubishi Electric Corporation | Circular accelerator |
-
1989
- 1989-01-31 JP JP1969889A patent/JPH02201899A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7982416B2 (en) | 2008-04-15 | 2011-07-19 | Mitsubishi Electric Corporation | Circular accelerator |
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