JPH0220548A - Sealing resin composition - Google Patents
Sealing resin compositionInfo
- Publication number
- JPH0220548A JPH0220548A JP16932788A JP16932788A JPH0220548A JP H0220548 A JPH0220548 A JP H0220548A JP 16932788 A JP16932788 A JP 16932788A JP 16932788 A JP16932788 A JP 16932788A JP H0220548 A JPH0220548 A JP H0220548A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- silicon nitride
- nitride powder
- resin composition
- sealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title claims abstract description 19
- 239000011342 resin composition Substances 0.000 title claims abstract description 15
- 239000000843 powder Substances 0.000 claims abstract description 30
- 239000003822 epoxy resin Substances 0.000 claims abstract description 20
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 20
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 19
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000002245 particle Substances 0.000 claims abstract description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010703 silicon Substances 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000010680 novolac-type phenolic resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 abstract description 17
- 239000011347 resin Substances 0.000 abstract description 17
- 229920003986 novolac Polymers 0.000 abstract description 14
- 239000005011 phenolic resin Substances 0.000 abstract description 9
- 239000003795 chemical substances by application Substances 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 7
- 239000008188 pellet Substances 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000012778 molding material Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 229910002026 crystalline silica Inorganic materials 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 239000005350 fused silica glass Substances 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 4
- 239000006082 mold release agent Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- QSSXJPIWXQTSIX-UHFFFAOYSA-N 1-bromo-2-methylbenzene Chemical compound CC1=CC=CC=C1Br QSSXJPIWXQTSIX-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical class [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000005480 straight-chain fatty acid group Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Sealing Material Composition (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は、熱伝導率が大きく、熱膨脂係数が小さく、成
形性・耐湿性に優れた、特性バランスのよい封止用樹脂
組成物に関する。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Field of Application) The present invention provides a seal with a good balance of properties, which has high thermal conductivity, low thermal expansion coefficient, and excellent moldability and moisture resistance. The present invention relates to a resin composition for stopping use.
(従来の技術)
従来、ダイオード、トランジスタ、集積回路等の電子部
品を熱硬化性樹脂を用いて樹脂封止する方法が行われて
きた。 この樹脂封止は、ガラス、金属、セラミックを
用いたハーメチックシール方式に比較して経済的に有利
なため、広く実用化されている。 封止用樹脂としては
、熱硬化性樹脂の中でも信頼性および価格の点からエポ
キシ樹脂が最も一般的に用いられている。 エポキシ樹
脂には、酸無水物、芳香族アミン、ノボラック型フェノ
ール樹脂等の硬化剤が用いられている。 これらの中で
もノボラック型フェノール樹脂を硬化剤としたエポキシ
樹脂は、他の硬化剤を使用したものに比べて、成形性、
耐湿性に優れ、毒性がなく、かつ安価であるため、半導
体封止用樹脂として広く使用されている。 一方、充填
剤としては溶融シリカ粉末や結晶性シリカ粉末が前述の
硬化剤と共に最も一般的に使用されている。 近年、半
導体部品の高集積化に伴って熱膨脂係数の小さい、また
大電力化に伴って熱放散性のより優れた半導体封止用樹
脂が要望されてきた。(Prior Art) Conventionally, a method has been used in which electronic components such as diodes, transistors, and integrated circuits are sealed with a thermosetting resin. This resin sealing is economically advantageous compared to hermetic sealing methods using glass, metal, or ceramic, and is therefore widely put into practical use. Among thermosetting resins, epoxy resin is most commonly used as the sealing resin in terms of reliability and cost. For epoxy resins, curing agents such as acid anhydrides, aromatic amines, and novolac-type phenolic resins are used. Among these, epoxy resins using novolac type phenolic resin as a curing agent have better moldability and better moldability than those using other curing agents.
It is widely used as a resin for semiconductor encapsulation because it has excellent moisture resistance, is nontoxic, and is inexpensive. On the other hand, as a filler, fused silica powder or crystalline silica powder is most commonly used together with the above-mentioned curing agent. In recent years, as semiconductor components have become more highly integrated, there has been a demand for resins for semiconductor encapsulation that have a small coefficient of thermal expansion and that have better heat dissipation properties as electric power increases.
しかしながら、ノボラック型フェノール樹脂を硬化剤と
したエポキシ樹脂と溶融シリカ粉末からなる封止用樹脂
は、比較的に熱膨張係数が小さく、そのため耐湿性、ま
た吸湿に関連する温寒サイクル試験によるボンディング
ワイヤのオープン、樹脂クラック、ペレットクラック等
に耐える特性に優れているという特長を有するものの、
熱伝導率が小さいために熱放散が悪く、消gt電力の大
きいパワー半導体ではその機能が果せな゛くなる欠点が
ある。 一方、ノボラック型フェノール樹脂を硬化剤と
したエポキシ樹脂と、結晶性シリカ粉末とからなる封止
用樹脂は、結晶性シリカ粉末の配合割合を上げると熱伝
導率が大きくなり、熱放散も良好となるが、熱膨張係数
が大きく、また耐湿性に対する信頼性が低下する欠点が
ある。 さらに、後者の封止用樹脂から得られる成形品
は、機械的特性や成形性が悪くなる傾向がある。 従っ
て、結晶性シリカ粉末を用いる封止用樹脂の高熱伝導化
にはおのずから限界があった。However, sealing resins made of epoxy resins using novolac-type phenolic resin as a curing agent and fused silica powder have a relatively small coefficient of thermal expansion, and therefore have poor moisture resistance, as well as bonding wires that have been tested in hot and cold cycle tests related to moisture absorption. Although it has the feature of being excellent in resisting cracks in plastics, resin cracks, pellet cracks, etc.
Since the thermal conductivity is low, heat dissipation is poor, and a power semiconductor with a large dissipated power cannot perform its function. On the other hand, for sealing resins made of epoxy resins using novolac-type phenolic resin as a curing agent and crystalline silica powder, increasing the blending ratio of crystalline silica powder increases thermal conductivity and improves heat dissipation. However, it has the drawbacks of a large coefficient of thermal expansion and reduced reliability in moisture resistance. Furthermore, molded products obtained from the latter sealing resin tend to have poor mechanical properties and moldability. Therefore, there is a natural limit to increasing the thermal conductivity of a sealing resin using crystalline silica powder.
(発明が解決しようとする課題)
本発明は上記の事情に鑑みてなされたもので、その目的
は、熱伝導率が大きくて熱放散性に優れ、その一方で熱
膨張係数が小さく、成形性、111湿性に優れた、特性
バランスのよい高信頼性の封止用樹脂組成物を提供しよ
うとするものである。(Problems to be Solved by the Invention) The present invention has been made in view of the above circumstances, and its purpose is to have high thermal conductivity and excellent heat dissipation, while having a small coefficient of thermal expansion and good moldability. , 111 aims to provide a highly reliable sealing resin composition with excellent moisture properties and well-balanced properties.
[発明の構成]
(課題を解決するための手段)
本発明者らは、上記の目的を達成しようと鋭意研究を重
ねた結果、平均粒径60メツシユ以下の細粒で金属ケイ
素の含有率が1%以下の窒化ケイ素粉末を配合すること
によって上記目的が達成されることを見いだし、本発明
を完成したものである。[Structure of the Invention] (Means for Solving the Problems) As a result of intensive research to achieve the above object, the present inventors have developed a fine grain with an average grain size of 60 mesh or less and a metal silicon content. It was discovered that the above object could be achieved by blending 1% or less of silicon nitride powder, and the present invention was completed.
即ち、本発明は
(A)エポキシ樹脂、
(B)ノボラック型フェノール樹脂および(C)平均粒
径60メツシュ以上の細粒で金属ケイ素の含有率が1%
以下の窒化ケイ素粉末を必須成分とし、前記(C)窒化
ケイ素粉末を全体の樹脂組成物に対して25〜90重量
%の割合で含有することを特徴とする封止用樹脂組成物
である。That is, the present invention uses (A) an epoxy resin, (B) a novolac type phenolic resin, and (C) fine particles with an average particle size of 60 mesh or more and a metal silicon content of 1%.
This is a sealing resin composition characterized in that the following silicon nitride powder is an essential component, and the silicon nitride powder (C) is contained in a proportion of 25 to 90% by weight based on the entire resin composition.
本発明に用いる(A)エポキシ樹脂は、その分子中にエ
ポキシ基を少なくとも2個有する化合物である限り、分
子構造、分子量等に特に制限はなく、一般に使用されて
いるものを広く包含することができる。 例えば、ビス
フェノール型の芳香族系、シクロヘキサン誘導体等の脂
環族系、さらに次の一般式で示されるエポキシノボラッ
ク系のエポキシ樹脂が挙げられる。The epoxy resin (A) used in the present invention is not particularly limited in molecular structure, molecular weight, etc., as long as it is a compound having at least two epoxy groups in its molecule, and can include a wide range of commonly used epoxy resins. can. Examples include aromatic resins such as bisphenol type, alicyclic resins such as cyclohexane derivatives, and epoxy novolac type epoxy resins represented by the following general formula.
(但し、式中R1は水素原子、ハロゲン原子又はアルキ
ル基を、R2は水素原子又はアルキル基を、nは1以上
の整数を表す)、 これらのエポキシ樹脂は単独又は2
種以上混合して使用することができる。(However, in the formula, R1 represents a hydrogen atom, a halogen atom, or an alkyl group, R2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) These epoxy resins may be used alone or in combination.
Can be used in combination of more than one species.
本発明に用いる(B)ノボラック型フェノール樹脂とし
ては、フェノール、アルキルフェノール等のフェノール
類と、ホルムアルデヒドあるいはパラホルムアルデヒド
を反応させて得られるノボラック型フェノール樹脂およ
びこれらの変性樹脂、例えばエポキシ化もしくはブチル
化ノボラック型フェノール樹脂等が挙げられ、これらは
単独又は2種以上混合して用いることができる。 ノボ
ラック型フェノール樹脂の配合割合は、前記(A)エポ
キシ樹脂のエポキシ基(a )と(B)ノボラック型フ
ェノール樹脂のフェノール性水酸基(b )とのモル比
[(a)/(b)]が0.1〜10の範囲内であること
が必要である。 モル比が0.1未満もしくは10を超
えると耐湿性、成形性および硬化物の電気特性が悪くい
ずれの場合も好ましくないからである。The novolak phenolic resin (B) used in the present invention includes novolak phenolic resins obtained by reacting phenols such as phenol and alkylphenols with formaldehyde or paraformaldehyde, and modified resins thereof, such as epoxidized or butylated novolaks. Examples include type phenol resins, and these can be used alone or in a mixture of two or more. The blending ratio of the novolac type phenolic resin is such that the molar ratio [(a)/(b)] of the epoxy group (a) of the epoxy resin (A) and the phenolic hydroxyl group (b) of the novolac type phenol resin (B) is It is necessary that it be within the range of 0.1 to 10. This is because if the molar ratio is less than 0.1 or more than 10, the moisture resistance, moldability, and electrical properties of the cured product will be poor, which is undesirable in either case.
本発明に用いる(C)窒化ケイ素粉末は、平均粒径が6
0メツシュ以上の細粒で、未反応金属ケイ素の含有率が
1%以下のものである。 窒化ケイ素粉末の平均粒径が
60メツシュ未満の粗粒の場合は、成形時にゲート詰り
ゃワイヤー流れ、金型鷹耗等が生じて好ましくないから
である。 また窒化ケイ素粉末中の未反応金属ケイ素の
含有率が1%を超えると絶縁破壊の低下や製品でのリー
ク不良が発生するので好ましくない、 窒化ケイ素の具
体的なものとしては三方晶系(α−3i 3N、)ある
いは六方晶系(β−3i3N4)等が挙げられ、これら
は単独又は2種以上混合して使用することができる。
窒化ケイ素粉末の配合割合は、全体の樹脂組成物に対し
て25〜90重量%含有することが好ましい、 その配
合割合が25重量%未満では、熱膨張係数が大きく、熱
伝導率が小さいので好ましくない、 また90重量%を
超えると、カサバリが大きく、かつ成形性が悪く実用に
適さない、 従って上記の範囲に限定される。The silicon nitride powder (C) used in the present invention has an average particle size of 6
Fine particles with a mesh size of 0 or more and a content of unreacted metal silicon of 1% or less. If the silicon nitride powder is coarse particles with an average particle size of less than 60 mesh, it is not preferable because gate clogging during molding may cause wire flow, die erosion, etc. Furthermore, if the content of unreacted metallic silicon in the silicon nitride powder exceeds 1%, it is undesirable because it will reduce dielectric breakdown and cause leakage defects in products. -3i 3N, ) or hexagonal system (β-3i3N4), and these can be used alone or in a mixture of two or more.
The blending ratio of silicon nitride powder is preferably 25 to 90% by weight based on the entire resin composition. If the blending ratio is less than 25% by weight, the coefficient of thermal expansion is large and the thermal conductivity is low, so it is preferable. If it exceeds 90% by weight, the coverage is large and the moldability is poor, making it unsuitable for practical use. Therefore, it is limited to the above range.
本発明の封止用樹脂組成物は、エポキシ樹脂、ノボラッ
ク型フェノール樹脂、窒化ケイ素粉末を必須成分とする
が、本発明の目的に反しない限り必要に応じて、例えば
、天然ワックス類、合成ワックス類、直鎖脂肪酸の金属
塩、酸アミド類、エステル類、パラフィン類等の離型剤
、塩素化パラフィン、ブロムトルエン、ヘキサブロムベ
ンゼン、三酸化アンチモン等の難燃剤、カーボンブラッ
ク、ベンガラ等の着色剤、シランカップリング剤、種々
の硬化促進剤などを適宜添加配合することができる。The sealing resin composition of the present invention contains an epoxy resin, a novolac type phenolic resin, and a silicon nitride powder as essential components, but may optionally include natural waxes, synthetic waxes, etc., as long as it does not contradict the purpose of the present invention. metal salts of straight-chain fatty acids, acid amides, esters, mold release agents such as paraffins, flame retardants such as chlorinated paraffin, bromotoluene, hexabromobenzene, antimony trioxide, and coloring such as carbon black and red iron. Agents, silane coupling agents, various curing accelerators, etc. can be added and blended as appropriate.
本発明の封止用樹脂組成物を成形材料として製造する場
合の一般的な方法として、エポキシ樹脂、ノボラック型
フェノール樹脂、窒化ケイ素粉末、その他を所定の組成
比に選択した原料組成分をミキサー等によって十分均一
に混合した後、更に熱ロールによる溶融混合処理、又は
ニーダ等による混合処理を行い、次いで冷却固化させ、
適当な大きさに粉砕して成形材料とすることができる。As a general method for manufacturing the sealing resin composition of the present invention as a molding material, raw material compositions containing epoxy resin, novolak type phenol resin, silicon nitride powder, and others selected at a predetermined composition ratio are mixed using a mixer or the like. After sufficiently uniformly mixing the mixture, the mixture is further melted and mixed using hot rolls, or mixed using a kneader, etc., and then cooled and solidified.
It can be crushed into a suitable size and used as a molding material.
こうして製造した成形材料は、電子部品或いは電気部品
の封止用として、また被覆や絶縁等に適用すれば優れた
特性と信顆性を付与することができる。The molding material produced in this manner can be used for sealing electronic or electrical parts, and when applied to coatings, insulation, etc., can provide excellent properties and reliability.
(作用)
本発明の封止用樹脂組成物は、特定のサイズで、未反応
金属ケイ素含有量の少ない窒化ケイ素粉末を所定量配合
することによって目的を達したものである。 すなわち
、窒化ケイ素粉末の平均粒径60メツシュ以上の細粒の
ために成形時の流れが良好となり金型の磨耗等が生じな
くなる。 また未反応金属ケイ素1%未満であるため絶
縁破壊が低下することがない、 更に全体の樹脂組成物
の25〜90重量%配合することによって熱伝導率が大
きく、熱膨張係数を小さくすることができる。(Function) The sealing resin composition of the present invention achieves its purpose by blending a predetermined amount of silicon nitride powder with a specific size and low content of unreacted metal silicon. That is, since the silicon nitride powder has fine particles with an average particle size of 60 mesh or more, the flow during molding is good, and wear of the mold does not occur. In addition, since the unreacted metal silicon content is less than 1%, dielectric breakdown does not decrease.Furthermore, by incorporating 25 to 90% by weight of the entire resin composition, the thermal conductivity is high and the coefficient of thermal expansion can be reduced. can.
(実施例)
次に本発明を実施例により具体的に説明するが、本発明
は以下の実施例に限定されるものではない。(Examples) Next, the present invention will be specifically explained using Examples, but the present invention is not limited to the following Examples.
実施例および比較例において「%」とあるのは「重量%
」を意味する。In Examples and Comparative Examples, "%" means "% by weight"
” means.
実施例 1
クレゾールノボラックエポキシ樹脂(エポキシ当量21
5) 18%に、ノボラック型フェノール樹脂(フェノ
ール当量107) 9%、六方晶型窒化ケイ素粉末(
平均粒径7μl、未反応金属ケイ素含有率0.5%)7
0%、離型剤等3%を常温で混合し、更に90〜95℃
で混練し、冷却した後粉砕して成形材料(A>を製造し
な。Example 1 Cresol novolak epoxy resin (epoxy equivalent weight 21
5) 18%, novolac type phenolic resin (phenol equivalent: 107), 9% hexagonal silicon nitride powder (
Average particle size 7μl, unreacted metal silicon content 0.5%)7
0%, mold release agent, etc. 3% are mixed at room temperature, and further heated to 90-95℃
The molding material (A>) is produced by kneading, cooling and pulverizing.
実施例 2
実施例1において用いた六方晶型窒化ケイ素粉末の代わ
りに、六方晶型窒化ケイ素粉末(平均粒径7μm、未反
応金属ケイ素含有率0.9%> 30%と結晶性シリカ
粉末(平均粒径38μm)40%を用いた以外は、すべ
て実施例1と同一にして成形材料(B)を製造した。Example 2 Instead of the hexagonal silicon nitride powder used in Example 1, hexagonal silicon nitride powder (average particle size 7 μm, unreacted metal silicon content 0.9% > 30%) and crystalline silica powder ( A molding material (B) was produced in the same manner as in Example 1 except that 40% (average particle size: 38 μm) was used.
比較例 1
クレゾールノボラックエポキシ樹脂(エポキシ当量)1
8%に、ノボラック型フェノール樹脂(フェノール当量
107) 9%、溶融シリカ粉末70%、離型剤等3
%を実施例1と同様にして成形材料(C)を製造した。Comparative example 1 Cresol novolak epoxy resin (epoxy equivalent) 1
8%, novolak type phenolic resin (phenol equivalent: 107) 9%, fused silica powder 70%, mold release agent, etc. 3
A molding material (C) was produced using the same percentage as in Example 1.
比較例 2
比較例1において溶融シリカ粉末の代わりに結晶性シリ
カ粉末(平均粒径28μm)を用いた以外はすべて比較
例1と同一にして成形材料(D)を製造した。Comparative Example 2 A molding material (D) was produced in the same manner as in Comparative Example 1 except that crystalline silica powder (average particle size 28 μm) was used instead of fused silica powder.
比較例 3
クレゾールノボラックエポキシ樹脂(エポキシ当量21
5) 10%に、ノボラック型フェノール樹脂(フェノ
ール当i 107) 5%、結晶性シリカ粉末(平均
粒径28μ■)85%を用いた以外はすべて比較例1と
同一にして成形材料(E)を製造した。Comparative Example 3 Cresol novolak epoxy resin (epoxy equivalent: 21
5) Molding material (E) was made in the same manner as in Comparative Example 1, except that 5% of novolac type phenol resin (i 107 per phenol) and 85% of crystalline silica powder (average particle size 28μ■) were used for 10%. was manufactured.
比較例 4
クレゾールノボラックエポキシ樹脂(エポキシ当量21
5) 18%に、ノボラック型フェノール樹脂9%、六
方晶型窒化ケイ素粉末(平均粒径7μl、未反応金属ケ
イ素含有率1.5%)70%、離型剤3%を用いた以外
はすべて比較例1と同一にして成形材料(F)を製造し
た。Comparative Example 4 Cresol novolak epoxy resin (epoxy equivalent: 21
5) All except that 18%, 9% novolac type phenolic resin, 70% hexagonal silicon nitride powder (average particle size 7 μl, unreacted metal silicon content 1.5%), and 3% mold release agent were used. A molding material (F) was produced in the same manner as in Comparative Example 1.
実施例1〜2、比較例1〜4で製造した成形材料(A)
〜(F)を用いて、170℃に加熱した金型内にトラン
スファー成形し硬化させて成形品(封止品)を得た。
得られた成形品について、熱伝導率、熱膨張係数、成形
性、耐湿性、絶縁破壊の試験を行ったので、その結果を
第1表に示した。 いずれも本発明の著しい効果が確認
された。Molding material (A) manufactured in Examples 1-2 and Comparative Examples 1-4
- (F) was transfer-molded in a mold heated to 170°C and cured to obtain a molded product (sealed product).
The obtained molded product was tested for thermal conductivity, coefficient of thermal expansion, moldability, moisture resistance, and dielectric breakdown, and the results are shown in Table 1. In all cases, the remarkable effects of the present invention were confirmed.
*1 :得られた成形品を迅速熱伝導針(昭和電工社製
、商品名QTM−MD)を用いて室温下で測定した。*1: The obtained molded product was measured at room temperature using a rapid heat conduction needle (manufactured by Showa Denko K.K., trade name: QTM-MD).
*2:120キャビティ取り16ビンDIP金型を用い
て、170℃で3分間トランスファー成形し充填性を評
価した。*2: Using a 16-bin DIP mold with 120 cavities, transfer molding was performed at 170° C. for 3 minutes to evaluate filling properties.
*3:成形材料を用いて、2本のアルミニウム配線を有
する電気部品を170℃で3分間トランスファー成形し
、その後180℃で8時間硬化させた。 こうして得た
封止電気部品100個について 120℃の高圧水蒸気
中で耐湿試験を行い、アルミニウム腐食による50%の
断線(不良発生)の起こる時間を判定する。*3: Using the molding material, an electrical component having two aluminum wirings was transfer molded at 170°C for 3 minutes, and then cured at 180°C for 8 hours. The 100 sealed electrical components thus obtained were subjected to a moisture resistance test in high-pressure steam at 120° C., and the time required for 50% disconnection (defect generation) due to aluminum corrosion to occur was determined.
[発明の効果]
以上の説明および第1表からも明らかなように、本発明
の封止用樹脂組成物は、熱伝導率が大きく、熱膨脂係数
が小さく、成形性、耐湿性に優れているためボンディン
グワイヤーのオーブン、樹脂クラ・ツク、ペレットクラ
ックがなく特性バランスのよい信頼性の高いものであり
電子・電気部品の封止用として好適なものである。[Effects of the Invention] As is clear from the above explanation and Table 1, the encapsulating resin composition of the present invention has high thermal conductivity, low thermal expansion coefficient, and excellent moldability and moisture resistance. Because of this, it is free from bonding wire ovens, resin cracks, and pellet cracks, and is highly reliable with well-balanced properties, making it suitable for sealing electronic and electrical parts.
Claims (1)
含有率が1%以下の窒化ケイ素 粉末 を必須成分とし、前記(C)窒化ケイ素粉末を全体の樹
脂組成物に対して25〜90重量%の割合で含有するこ
とを特徴とする封止用樹脂組成物。[Claims] 1. Essential components: (A) epoxy resin, (B) novolac type phenolic resin, and (C) fine grained silicon nitride powder with an average particle size of 60 mesh or more and a metal silicon content of 1% or less A sealing resin composition characterized in that the silicon nitride powder (C) is contained in a proportion of 25 to 90% by weight based on the entire resin composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16932788A JPH0220548A (en) | 1988-07-07 | 1988-07-07 | Sealing resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16932788A JPH0220548A (en) | 1988-07-07 | 1988-07-07 | Sealing resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0220548A true JPH0220548A (en) | 1990-01-24 |
Family
ID=15884493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16932788A Pending JPH0220548A (en) | 1988-07-07 | 1988-07-07 | Sealing resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0220548A (en) |
-
1988
- 1988-07-07 JP JP16932788A patent/JPH0220548A/en active Pending
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